JPH0841649A - Surface treating device - Google Patents

Surface treating device

Info

Publication number
JPH0841649A
JPH0841649A JP9366793A JP9366793A JPH0841649A JP H0841649 A JPH0841649 A JP H0841649A JP 9366793 A JP9366793 A JP 9366793A JP 9366793 A JP9366793 A JP 9366793A JP H0841649 A JPH0841649 A JP H0841649A
Authority
JP
Japan
Prior art keywords
support shaft
surface treatment
disks
processed
holding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9366793A
Other languages
Japanese (ja)
Other versions
JP2877217B2 (en
Inventor
Genichi Nakanishi
玄一 中西
Takeshi Wada
健史 和田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Light Metal Co Ltd
Original Assignee
Nippon Light Metal Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Light Metal Co Ltd filed Critical Nippon Light Metal Co Ltd
Priority to JP9366793A priority Critical patent/JP2877217B2/en
Publication of JPH0841649A publication Critical patent/JPH0841649A/en
Application granted granted Critical
Publication of JP2877217B2 publication Critical patent/JP2877217B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Chemically Coating (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

PURPOSE:To improve the treatment efficiency and treatment accuracy of works and to lessen adhesion of impurities, etc., on the work so as to improve a yield. CONSTITUTION:Rotating holders 10 rotatable in a perpendicular direction are mounted at opposite hanging members 2 and a sun gear 30 concentrical with these rotating holders 10 is fixed thereto. The outer peripheral parts of the rotating holders 10 are provided with supporting shaft holding grooves 12 which open radially and supporting shafts 1 which perpendicularly support plural disks D apart with spaced intervals are removably and rotatably inserted into these holding grooves 12. Planetary gears 31 fixed to the supporting shafts 1 are meshed with the sun gear 30. As a result, the disks D are set by fitting the supporting shafts 1 into the holding grooves 12 of the rotating holders 10. While the disks D are rotated according to the revolution of the rotating holders 10 after setting the disks, the disks are moved in a treating liquid, by which the disks are subjected to the uniform surface treatment.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は表面処理装置に関する
もので、更に詳細には、例えば磁気ディスク等の被処理
体を無電解メッキ処理する表面処理装置に関するもので
ある。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface treatment apparatus, and more particularly to a surface treatment apparatus for subjecting an object to be treated such as a magnetic disk to electroless plating.

【0002】[0002]

【従来の技術】従来、アルミニウム製の磁気ディスクの
表面に例えばニッケル燐を被覆する場合、図7に示すよ
うに、被処理体であるドーナツ状のディスク基板D(以
下にディスクという)を適宜間隔をおいて支持軸1に垂
直状に支持し、この支持軸1を対峙する吊持部材2間に
横架させ、そして、吊持部材2を下降させて処理槽であ
るメッキ槽3内のメッキ液4にディスクDを浸漬して、
ディスクDの表面にメッキ処理を施している。このよう
な表面処理によれば、一度に多数枚のディスクDを同時
に表面処理することができ、また、吊持部材2を図示し
ない駆動手段にて上下(あるいは水平)に振動させるこ
とにより、ディスク表面に均一なメッキ膜を形成するこ
とができる。更に、複数本の支持軸1を同時に吊持部材
間に横架して、上述と同様に処理を行うことにより、更
に効率良く多数枚のディスクDを処理することができ
る。
2. Description of the Related Art Conventionally, when a surface of an aluminum magnetic disk is coated with, for example, nickel phosphorus, a donut-shaped disk substrate D (hereinafter referred to as a disk), which is an object to be processed, is appropriately spaced as shown in FIG. The supporting shaft 1 is vertically supported on the supporting shaft 1, and the supporting shaft 1 is laid horizontally between the supporting members 2 facing each other. Then, the supporting member 1 is lowered to perform plating in the plating tank 3 which is a processing tank. Immerse disk D in liquid 4
The surface of the disk D is plated. According to such surface treatment, a large number of discs D can be surface-treated at the same time at the same time, and the suspension member 2 is vibrated vertically (or horizontally) by a driving means (not shown), thereby A uniform plating film can be formed on the surface. Furthermore, a plurality of disks D can be processed more efficiently by horizontally suspending a plurality of support shafts 1 between the suspension members and performing the same processing as described above.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、従来の
この種の表面処理装置においては、支持軸1を対峙する
吊持部材2の対向する取付面に設けられた軸受5にスプ
リング6を介在させて取付けるか、あるいは、吊持部材
2の一方に保持孔を設け、支持軸1の端部を一端保持孔
に嵌挿した後、支持軸1の他端を軸受5に係合させるな
どの方法で支持軸1を吊持部材2間に横架するため、メ
ッキ処理中にスプリング6や保持孔等にもメッキされ
る。したがって、繰返して表面処理を行う間にスプリン
グ6等のメッキ部が剥離して粒子状不純物(パーティク
ル)が発生し、この不純物がディスクDに付着した化学
反応(ケミカルコンタミネーション)を起こして、磁気
ディスクの特性や歩留まりの悪化を招くという問題があ
った。
However, in the conventional surface treatment apparatus of this type, the spring 6 is interposed between the bearings 5 provided on the opposing mounting surfaces of the suspension member 2 facing the support shaft 1. By attaching, or by providing a holding hole in one of the suspension members 2 and inserting one end of the support shaft 1 into the one holding hole, the other end of the support shaft 1 is engaged with the bearing 5. Since the support shaft 1 is laid horizontally between the suspension members 2, the spring 6 and the holding holes are also plated during the plating process. Therefore, during repeated surface treatment, the plated portion such as the spring 6 is peeled off to generate particulate impurities (particles), and the impurities cause a chemical reaction (chemical contamination) attached to the disk D, resulting in a magnetic field. There is a problem that the characteristics of the disk and the yield are deteriorated.

【0004】また、吊持部材2を上下動(あるいは水平
動)することによってディスクDを固定した場合に較べ
てディスク表面とメッキ液との接触を多くすることがで
きるが、方向が一定な上下動(あるいは水平動)である
ため、ディスクDの全面に均一にメッキを施しがたいと
いう問題があった。更には、支持軸1及びディスクDの
セットが面倒であるという問題があった。
Further, by moving the suspension member 2 up and down (or horizontally), the contact between the disk surface and the plating liquid can be increased as compared with the case where the disk D is fixed, but the up and down direction is constant. Since it is dynamic (or horizontal), it is difficult to uniformly plate the entire surface of the disk D. Further, there is a problem that setting the support shaft 1 and the disk D is troublesome.

【0005】この発明は上記事情に鑑みなされたもの
で、被処理体への不純物等の付着を低減して歩留まりの
向上を図れるようにし、かつ被処理体の表面処理を均一
に行えるようにした表面処理装置を提供することを目的
とするものである。
The present invention has been made in view of the above circumstances, and it is possible to reduce the adhesion of impurities and the like to the object to be processed to improve the yield and to uniformly perform the surface treatment of the object to be processed. An object is to provide a surface treatment device.

【0006】[0006]

【課題を解決するための手段】上記目的を達成するため
に、この発明の表面処理装置は、複数の被処理体を間隔
をおいて垂直状に支持する支持軸を、対峙する吊持部材
に横架して処理液内に浸漬することにより、上記被処理
体の表面を処理する表面処理装置を前提とし、上記吊持
部材に固定される円形案内体と、上記円形案内体と同心
上にあって回転可能な回転保持体とを具備し、上記回転
保持体の外周部に、上記支持軸を着脱及び回転可能に嵌
挿すべく放射方向に開口する保持溝を形成し、上記支持
軸に上記円形案内体に係合して転動する回転子を固着し
てなることを特徴とするものである。
In order to achieve the above object, the surface treating apparatus of the present invention has a supporting member that vertically supports a plurality of objects to be processed at intervals with a suspension member facing each other. Assuming a surface treatment device for treating the surface of the object to be treated by laterally immersing it in the treatment liquid, a circular guide body fixed to the suspension member and concentric with the circular guide body. A rotatable holding body, and a holding groove is formed on the outer peripheral portion of the rotating holding body, the holding groove opening in a radial direction so that the supporting shaft can be detachably and rotatably fitted. It is characterized in that a rotor that engages with a circular guide and rolls is fixed.

【0007】この発明において、上記円形案内体と回転
子とは互いに係合して回転子が転動するものであれば、
例えば円形案内体と回転子とを互いに接触して摩擦力に
よって回転する摩擦円盤等にて形成することも可能であ
るが、好ましくは円形案内体を太陽歯車にて形成し、回
転子を太陽歯車に噛合する遊星歯車にて形成する方がよ
い。
In the present invention, if the circular guide body and the rotor are engaged with each other and the rotor rolls,
For example, it is possible to form the circular guide body and the rotor by a friction disk or the like that is brought into contact with each other and is rotated by a frictional force, but preferably the circular guide body is formed by a sun gear and the rotor is formed by a sun gear. It is better to use a planetary gear that meshes with.

【0008】また、上記保持溝に着脱及び回転可能に嵌
挿される補助支持軸の軸方向に、被処理体を間隔をおい
て保持する間隔保持溝を列設することにより、被処理体
を間隔をおいて確実に支持することができる点で好まし
い。
In addition, by arranging spacing holding grooves for holding the objects to be processed at intervals in the axial direction of the auxiliary support shaft that is rotatably fitted in the holding grooves, the objects to be processed are spaced. It is preferable in that it can be surely supported.

【0009】[0009]

【作用】上記のように構成されるこの発明の表面処理装
置によれば、回転可能な回転保持体の外周方向に設けら
れた保持溝に支持軸を回転可能に嵌挿し、支持軸に固着
される回転子を回転保持体と同心上に固定された回転案
内体に係合することにより、多数枚の被処理体を支持し
た支持軸を容易にセットすることができる。また、回転
保持体の回転(公転)に伴って支持軸が回転(自転)す
ることができ、支持軸の回転に伴って回転(自転)する
被処理体の表面に処理液が均一に接触されて処理するこ
とができる。この場合、円形案内体を太陽歯車にて形成
し、回転子を太陽歯車に噛合する遊星歯車にて形成する
ことにより、支持軸の回転(自転)を更に確実にするこ
とができ、被処理体の表面処理を更に均一にすることが
できる。
According to the surface treatment apparatus of the present invention configured as described above, the support shaft is rotatably fitted in the holding groove provided in the outer peripheral direction of the rotatable rotary holder and is fixed to the support shaft. The support shaft supporting a large number of objects to be processed can be easily set by engaging the rotor with the rotation guide body which is fixed concentrically with the rotation holder. Further, the support shaft can rotate (spin) with the rotation (revolution) of the rotary holder, and the treatment liquid is uniformly contacted with the surface of the object to be processed (spin) that rotates with the rotation of the support shaft. Can be processed. In this case, by forming the circular guide body by the sun gear and forming the rotor by the planetary gear that meshes with the sun gear, the rotation (rotation) of the support shaft can be further ensured, and the object to be processed can be processed. The surface treatment can be made more uniform.

【0010】また、保持溝に着脱及び回転可能に嵌挿さ
れる補助支持軸の軸方向に、被処理体を間隔をおいて保
持する間隔保持溝を列設することにより、被処理体を間
隔をおいて確実に支持することができるので、小径で軽
量な被処理体であっても、処理液内の移動中に浮遊して
隣接間で接触することがなく、表面処理を確実に行うこ
とができる。
In addition, by arranging space holding grooves for holding the object to be processed at intervals in the axial direction of the auxiliary support shaft which is detachably and rotatably fitted in the holding groove, the objects to be processed are spaced apart. Since it can be reliably supported, even if it is a small-diameter and lightweight object to be processed, it can be reliably surface-treated without floating during the movement in the processing liquid and coming into contact with each other. it can.

【0011】[0011]

【実施例】以下にこの発明の実施例を図面に基いて詳細
に説明する。ここでは、この発明の表面処理装置をアル
ミニウム製磁気ディスクの無電解メッキ装置に適用した
場合について説明する。また、従来の表面処理装置と同
じ部分には同一符号を付して説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described below in detail with reference to the drawings. Here, a case where the surface treatment apparatus of the present invention is applied to an electroless plating apparatus for an aluminum magnetic disk will be described. Further, the same parts as those of the conventional surface treatment apparatus will be described with the same reference numerals.

【0012】◎第一実施例 図1はこの発明の表面処理装置の第一実施例の概略側断
面図、図2は図1のA−A断面図、図3は第一実施例の
要部の概略斜視図が示されている。
First Embodiment FIG. 1 is a schematic side sectional view of a first embodiment of the surface treatment apparatus of the present invention, FIG. 2 is a sectional view taken along the line AA of FIG. 1, and FIG. 3 is a main part of the first embodiment. A schematic perspective view of is shown.

【0013】この発明の表面処理装置は、図示しない搬
送機構から垂下されて対峙する一対の吊持部材2の対向
する面に取付けられる垂直方向に回転可能な回転保持体
10と、吊持部材2に固定される回転保持体10と同軸
上の円形案内体である太陽歯車30と、両回転保持体1
0に略等間隔に設けられた支持軸保持溝12に着脱及び
回転可能に嵌挿されると共に多数の被処理体であるディ
スクDを適宜間隔をおいて垂直状に支持する支持軸1
と、この支持軸1に固着されると共に太陽歯車30に係
合(噛合)する回転子である遊星歯車31と、回転保持
体10の外周近傍位置に配設されて支持軸1の落下を防
止するためのガイド20とを具備してなる。なお、吊持
部材2、回転保持体10及びガイド20はメッキされ難
い合成樹脂製部材にて形成されており、支持軸1はステ
ンレス鋼製軸の表面を合成樹脂にて被覆した構造となっ
ている。
The surface treatment apparatus of the present invention is a vertically rotatable holder 10 mounted on the opposing surfaces of a pair of suspension members 2 that are suspended from a transport mechanism (not shown) and face each other. The sun gear 30 which is a circular guide coaxial with the rotary holder 10 fixed to the rotary holder 10 and the rotary holder 1
A support shaft 1 which is detachably and rotatably fitted in support shaft holding grooves 12 provided at substantially equal intervals in 0 and which vertically supports a large number of disks D, which are objects to be processed, at appropriate intervals.
The planetary gear 31, which is a rotor that is fixed to the support shaft 1 and that engages with (engages with) the sun gear 30, and is disposed near the outer periphery of the rotary holder 10 to prevent the support shaft 1 from falling. And a guide 20 for The suspension member 2, the rotary holder 10, and the guide 20 are made of a synthetic resin member that is difficult to be plated, and the support shaft 1 has a structure in which the surface of a stainless steel shaft is covered with a synthetic resin. There is.

【0014】この場合、上記回転保持体10は、外周面
に歯部11が設けられており、吊持部材2に貫通固定さ
れる軸13にベアリング14を介して回転可能に装着さ
れている。この回転保持体10には第1の伝達歯車15
が噛合し、この第1の伝達歯車15に第2の伝達歯車1
6を介して駆動モータ17の駆動軸18に装着された駆
動歯車19が噛合されている。したがって、駆動モータ
17の回転により、駆動歯車19、第2の伝達歯車16
及び第1の伝達歯車15を介して回転保持体10が垂直
方向に回転することができる。また、回転保持体10の
外周部には放射方向に開口する複数(図面では8個の場
合を示す)の支持軸保持溝12が設けられており、この
保持溝12内に支持軸1が着脱及び回転可能に嵌挿され
るようになっている。
In this case, the rotary holder 10 is provided with teeth 11 on its outer peripheral surface and is rotatably mounted on a shaft 13 penetratingly fixed to the suspension member 2 via a bearing 14. This rotary holder 10 has a first transmission gear 15
Mesh with each other, and the first transmission gear 15 and the second transmission gear 1
The drive gear 19 mounted on the drive shaft 18 of the drive motor 17 is meshed with the drive gear 19. Therefore, the rotation of the drive motor 17 causes the drive gear 19 and the second transmission gear 16 to rotate.
Also, the rotary holder 10 can rotate in the vertical direction via the first transmission gear 15. Further, a plurality of (8 in the drawing shows the case of eight) support shaft holding grooves 12 which are opened in the radial direction are provided on the outer peripheral portion of the rotary holder 10, and the support shaft 1 is detachably mounted in the holding grooves 12. And is rotatably fitted.

【0015】また、上記軸13の先端は吊持部材2の対
向する面側に突出する断面四角形状に形成されており、
この断面四角部13aに太陽歯車30が回転が阻止され
た状態で固着されており、この太陽歯車30に、支持軸
1に固着された遊星歯車31が噛合し得るようになって
いる。なおこの場合、軸13の断面四角部13aの辺を
垂直方向に傾斜させることによって、軸13に対するメ
ッキ液4の液切れを良好にすることができる。
Further, the tip of the shaft 13 is formed in a quadrangular cross section protruding toward the facing surface of the suspension member 2.
The sun gear 30 is fixed to the cross-section square portion 13a in a state where rotation is blocked, and the planetary gear 31 fixed to the support shaft 1 can be meshed with the sun gear 30. In this case, by tilting the sides of the square section 13a of the shaft 13 in the vertical direction, it is possible to make the plating liquid 4 drain well on the shaft 13.

【0016】上記支持軸1には軸方向に沿って等間隔に
小径部1aが設けられており、この小径部1aにディス
クDが係止されることにより、複数のディスクDを間隔
をおいて垂直状に支持することができる(図4参照)。
The support shaft 1 is provided with small-diameter portions 1a at equal intervals along the axial direction, and the discs D are locked to the small-diameter portions 1a, so that a plurality of discs D are arranged at intervals. It can be supported vertically (see FIG. 4).

【0017】また、上記ガイド20は、図2に示すよう
に、上部左右に90°の角度をおいて上記保持溝12と
合致する位置に開口溝21を設け、それ以外の部分が回
転保持体10の外周部近傍位置に配設されるように吊持
部材2に固定ピン22をもって固定される(図2参
照)。したがって、回転保持体10の回転に伴って垂直
方向に移動する支持軸1が下方に位置した際に保持溝1
2から脱落するのをガイド20によって防止することが
できる。なおこの場合、開口溝21が左右2箇所に設け
られているが、必ずしも開口溝21は左右2箇所に設け
る必要はなく、少なくとも1箇所設けておけばよい。ま
た、ガイド20は少なくとも回転保持体10の下方部に
配設しておけばよい。
Further, as shown in FIG. 2, the guide 20 is provided with an opening groove 21 at a position matching the holding groove 12 at an angle of 90 ° to the left and right of the upper part, and the other portion is a rotary holder. It is fixed to the suspension member 2 with a fixing pin 22 so as to be arranged in the vicinity of the outer peripheral portion of 10 (see FIG. 2). Therefore, when the support shaft 1 that moves vertically in accordance with the rotation of the rotary holder 10 is positioned below, the holding groove 1
It can be prevented from falling off from the guide 2 by the guide 20. In addition, in this case, the opening grooves 21 are provided at two places on the left and right, but the opening grooves 21 do not necessarily have to be provided on two places on the left and right, and at least one place may be provided. Further, the guide 20 may be arranged at least in the lower part of the rotary holder 10.

【0018】次に、この発明の表面処理装置の動作態様
について説明する。まず、支持軸1に所定枚数のディス
クDを予め支持しておき、このディスクDを支持した支
持軸1をガイド20の開口溝21から回転保持体10の
保持溝に落し込むように嵌挿すると共に、遊星歯車31
を太陽歯車30に係合(噛合)した後、回転保持体10
を所定角度(45°)回転しながら、順次他の支持軸1
を保持溝12に嵌挿して、両回転保持体10間に8本の
支持軸1を横架してディスクDのセットを行う。
Next, an operation mode of the surface treatment apparatus of the present invention will be described. First, a predetermined number of disks D are previously supported on the support shaft 1, and the support shaft 1 supporting the disks D is inserted so as to be dropped from the opening groove 21 of the guide 20 into the holding groove of the rotary holder 10. Together with the planetary gear 31
After engaging (engaging) with the sun gear 30, the rotary holder 10
While rotating the other by a predetermined angle (45 °), the other support shaft 1
Is inserted into the holding groove 12, and eight supporting shafts 1 are horizontally mounted between the both rotary holding bodies 10 to set the disk D.

【0019】上記のようにしてディスクDをセットした
ものを図示しない搬送機構によって洗浄槽あるいは所定
の薬品槽に浸漬して前処理を行った後、メッキ槽3の上
方へ移動する。そして、吊持部材2を下降させて回転保
持体10、支持軸1及びディスクDをメッキ槽3内のメ
ッキ液4中に浸漬した後、駆動モータ17を駆動する
と、駆動モータ17の回転が駆動歯車19、第2の伝達
歯車16及び第1の伝達歯車15を介して回転保持体1
0に伝達されて回転保持体10が垂直方向に回転(公
転)する。この回転保持体10の回転(公転)に伴って
支持軸1に固着された遊星歯車31が太陽歯車30上を
転動して回転(自転)する。したがって、支持軸1に支
持されているディスクDは公転しながら自転してメッキ
液4中を移動するので、ディスクDの表面に均一な膜厚
のメッキを施すことができる。
The disk D set as described above is immersed in a cleaning tank or a predetermined chemical tank by a transport mechanism (not shown) for pretreatment, and then moved to above the plating tank 3. Then, the suspension member 2 is lowered to immerse the rotary holder 10, the support shaft 1, and the disk D in the plating solution 4 in the plating tank 3 and then the drive motor 17 is driven, whereby the rotation of the drive motor 17 is driven. Through the gear 19, the second transmission gear 16 and the first transmission gear 15, the rotary holder 1
When transmitted to 0, the rotary holder 10 rotates (revolves) in the vertical direction. Along with the rotation (revolution) of the rotation holder 10, the planetary gear 31 fixed to the support shaft 1 rolls on the sun gear 30 to rotate (spin). Therefore, since the disk D supported by the support shaft 1 revolves around its axis and moves in the plating solution 4, the surface of the disk D can be plated with a uniform film thickness.

【0020】上記のようにして、メッキ処理が行われた
後、吊持部材2が上昇してメッキ槽3から引き上げら
れ、次の処理工程へ搬送される。なおこの際、吊持部材
2の下端面に設けられた傾斜面2aによってメッキ槽3
から吊持部材2が引上げられるときのメッキ液の液切れ
を良好にすることができる。そして、最終処理が施され
た後、上述した支持軸1のセットの手順と逆の手順にて
支持軸1が回転保持体10から取外される。
After the plating process is performed as described above, the suspension member 2 is lifted and pulled up from the plating tank 3 and conveyed to the next processing step. At this time, the plating tank 3 is formed by the inclined surface 2a provided on the lower end surface of the suspension member 2.
Therefore, it is possible to favorably run out of the plating liquid when the suspension member 2 is pulled up. Then, after the final processing is performed, the support shaft 1 is removed from the rotary holder 10 in the reverse order of the procedure for setting the support shaft 1 described above.

【0021】◎第二実施例 図5はこの発明の表面処理装置の第二実施例の要部の概
略側面図、図6は図5のB−B線に沿う拡大断面図が示
されている。
Second Embodiment FIG. 5 is a schematic side view of the essential parts of a second embodiment of the surface treatment apparatus of the present invention, and FIG. 6 is an enlarged sectional view taken along the line BB of FIG. .

【0022】第二実施例における表面処理装置は被処理
体であるディスクDが小径かつ軽量のときの表面処理を
確実に行えるようにした場合である。すなわち、ディス
クDが小径で軽量の場合に、上記第一実施例と同様にデ
ィスクDをメッキ液4中を公転及び自転させながら移動
すると、ディスクDが浮遊して支持軸1の小径部1aか
ら外れて隣接するディスク同士が接触する虞れがあるの
で、このディスク同士の接触を防止するために隣接する
支持軸11間に補助支持軸40を配設し、この補助支持
軸40の軸方向に列設された間隔保持溝41内に各ディ
スクDを位置させて、ディスクD間の間隔を保持させな
がらディスクDを公転及び自転させる。なおこの場合、
保持溝12は処理するディスクDを支持する支持軸1の
本数の2倍の数が設けられている(本実施例では16×
2=32(個)の保持溝12が設けられている)。
The surface treatment apparatus in the second embodiment is a case where the surface treatment can be surely performed when the disk D as the object to be treated has a small diameter and a light weight. That is, when the disk D has a small diameter and is lightweight, when the disk D is moved while revolving and rotating in the plating solution 4 as in the first embodiment, the disk D floats from the small diameter portion 1a of the support shaft 1. There is a possibility that the discs may come apart and come into contact with each other. Therefore, in order to prevent the discs from coming into contact with each other, the auxiliary support shaft 40 is disposed between the adjacent support shafts 11, and the auxiliary support shaft 40 is arranged in the axial direction. The disks D are positioned in the space holding grooves 41 arranged in rows, and the disks D are revolved and rotated while maintaining the distance between the disks D. In this case,
The number of holding grooves 12 is twice as many as the number of support shafts 1 for supporting the disk D to be processed (16 × in this embodiment).
2 = 32 (pieces) of holding grooves 12 are provided).

【0023】この場合、補助支持軸40は上記支持軸1
と同様に回転保持体10の保持溝12内に着脱及び回転
可能に嵌挿されるのであるが、予め隣接する支持軸1を
保持溝12を1つあけて嵌挿してディスクDを垂直状に
配置した後に、その間の保持溝12に補助支持軸40を
嵌挿すると共に、間隔保持溝41内に各ディスクDを位
置させることにより、ディスクDの間隔を確実に保持す
ることができる。
In this case, the auxiliary support shaft 40 is the support shaft 1 described above.
Similarly to the above, it is removably and rotatably fitted into the holding groove 12 of the rotary holder 10, but the supporting shaft 1 adjacent to the rotary holding body 10 is inserted in advance by inserting one holding groove 12 and the disc D is arranged vertically. After that, the auxiliary support shaft 40 is fitted into the holding groove 12 between them, and the discs D are positioned in the gap holding grooves 41, whereby the gap between the discs D can be reliably held.

【0024】なお、第二実施例において、その他の部分
は上記第一実施例と同じであるので、同一部分には、同
一符号を付してその説明は省略する。
Since the other parts of the second embodiment are the same as those of the first embodiment, the same parts are designated by the same reference numerals and the description thereof will be omitted.

【0025】なお、上記実施例では、回転保持体10の
回転を駆動モータ17から歯車伝達機構を介して回転保
持体10に回転を伝達する場合について説明したが、回
転手段は必ずしも歯車伝達機構である必要はなく、例え
ばワイヤ等の索条を用いて回転を行うようにしてもよ
い。また、上記実施例では、この発明の表面処理装置を
磁気ディスクの無電解メッキ処理の場合について説明し
たが、磁気ディスク以外のドーナツ状のディスク等の被
処理体のメッキ処理あるいはメッキ以外の表面処理にお
いても適用できることは勿論である。
In the above embodiment, the rotation of the rotary holder 10 is transmitted from the drive motor 17 to the rotary holder 10 via the gear transmission mechanism, but the rotation means is not necessarily the gear transmission mechanism. It does not have to be provided, and for example, the wire may be used for the rotation. Further, in the above embodiment, the surface treatment apparatus of the present invention has been described for the case of electroless plating of a magnetic disk. However, the surface treatment other than the plating or the surface treatment other than the plating of the object to be processed such as a donut-shaped disk other than the magnetic disk is performed. Of course, it can be applied to.

【0026】[0026]

【発明の効果】以上に説明したように、この発明の表面
処理装置によれば、上記のにように構成されているの
で、以下のような効果が得られる。
As described above, according to the surface treatment apparatus of the present invention, which is configured as described above, the following effects can be obtained.

【0027】1)請求項1記載の表面処理装置によれ
ば、回転可能な回転保持体の外周方向に設けられた保持
溝に支持軸を回転可能に嵌挿し、支持軸に固着された回
転子を回転保持体と同心上に固定された回転案内体に係
合するので、多数枚の被処理体を支持した支持軸を容易
にセットすることができる。また、支持軸の支持部の接
触面積を少なくすることができるので、被処理体へのパ
ーティクル等の不純物の付着を少なくすることができ、
歩留まりの向上を図ることができる。更に、被処理体を
公転しつつ自転することができるので、被処理体の表面
に処理液を均一に接触して処理することができると共
に、処理精度の向上を図ることができる。
1) According to the surface treatment apparatus of the first aspect, the rotor is fixed to the support shaft by rotatably inserting the support shaft into the holding groove provided in the outer circumferential direction of the rotatable rotary holder. Is engaged with the rotation guide body which is fixed concentrically with the rotation holding body, so that the support shaft supporting a large number of objects to be processed can be easily set. Further, since the contact area of the support portion of the support shaft can be reduced, it is possible to reduce the adhesion of impurities such as particles to the object to be processed,
The yield can be improved. Further, since the object to be processed can revolve while revolving around, the processing liquid can be uniformly contacted with the surface of the object to be processed, and the processing accuracy can be improved.

【0028】2)請求項2記載の表面処理装置によれ
ば、円形案内体を太陽歯車にて形成し、回転子を太陽歯
車に噛合する遊星歯車にて形成するので、被処理体の回
転(自転)を更に確実にして被処理体の表面処理を更に
均一にすることができる。
2) According to the surface treatment apparatus of the second aspect, since the circular guide body is formed by the sun gear and the rotor is formed by the planetary gear that meshes with the sun gear, the rotation of the object to be treated ( The surface treatment of the object can be made more uniform by further ensuring the rotation.

【0029】3)請求項3記載の表面処理装置によれ
ば、保持溝に着脱及び回転可能に嵌挿される補助支持軸
の軸方向に、被処理体を間隔をおいて保持する間隔保持
溝を列設するので、被処理体を間隔をおいて確実に支持
することができ、小径で軽量な被処理体の表面処理を確
実に行うことができる。
3) According to the surface treatment apparatus of the third aspect, the space holding groove for holding the object to be processed at intervals is provided in the axial direction of the auxiliary support shaft which is detachably and rotatably fitted in the holding groove. Since the objects to be processed are arranged in a row, the objects to be processed can be reliably supported at intervals, and the surface treatment of the objects to be processed having a small diameter and light weight can be reliably performed.

【図面の簡単な説明】[Brief description of drawings]

【図1】この発明の表面処理装置の第一実施例の概略側
断面図である。
FIG. 1 is a schematic side sectional view of a first embodiment of a surface treatment apparatus of the present invention.

【図2】図1のA−A断面図である。FIG. 2 is a sectional view taken along line AA of FIG.

【図3】この発明の要部を示す概略斜視図である。FIG. 3 is a schematic perspective view showing a main part of the present invention.

【図4】第一実施例における被処理体と支持軸を示す斜
視図である。
FIG. 4 is a perspective view showing an object to be processed and a support shaft in the first embodiment.

【図5】この発明の表面処理装置の第二実施例の概略側
面図である。
FIG. 5 is a schematic side view of a second embodiment of the surface treatment apparatus of the present invention.

【図6】図5のB−B線に沿う拡大断面図である。6 is an enlarged cross-sectional view taken along the line BB of FIG.

【図7】従来の表面処理装置の一例を示す概略断面図で
ある。
FIG. 7 is a schematic sectional view showing an example of a conventional surface treatment apparatus.

【符号の説明】[Explanation of symbols]

D ディスク(被処理体) 1 支持軸 2 吊持部材 3 メッキ槽(処理槽) 4 メッキ液(処理液) 10 回転保持体 12 支持軸保持溝 20 支持軸落下防止用ガイド 30 太陽歯車(円形案内体) 31 遊星歯車(回転子) 40 補助支持軸 41 間隔保持溝 D disk (object to be treated) 1 support shaft 2 suspension member 3 plating tank (treatment tank) 4 plating liquid (treatment liquid) 10 rotation holder 12 support shaft holding groove 20 support shaft drop prevention guide 30 sun gear (circular guide) Body 31 Planetary gear (rotor) 40 Auxiliary support shaft 41 Spacing groove

【図1】 FIG.

【図2】 [Fig. 2]

【図3】 [Figure 3]

【図4】 [Figure 4]

【図5】 [Figure 5]

【図6】 [Figure 6]

【図7】 [Figure 7]

─────────────────────────────────────────────────────
─────────────────────────────────────────────────── ───

【手続補正書】[Procedure amendment]

【提出日】平成5年10月12日[Submission date] October 12, 1993

【手続補正1】[Procedure Amendment 1]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】図面の簡単な説明[Name of item to be corrected] Brief description of the drawing

【補正方法】変更[Correction method] Change

【補正内容】[Correction content]

【図面の簡単な説明】[Brief description of drawings]

【図1】この発明の表面処理装置の第一実施例の概略側
断面図である。
FIG. 1 is a schematic side sectional view of a first embodiment of a surface treatment apparatus of the present invention.

【図2】図1のA−A断面図である。FIG. 2 is a sectional view taken along line AA of FIG.

【図3】この発明の要部を示す概略斜視図である。FIG. 3 is a schematic perspective view showing a main part of the present invention.

【図4】第一実施例における被処理体と支持軸を示す斜
視図である。
FIG. 4 is a perspective view showing an object to be processed and a support shaft in the first embodiment.

【図5】この発明の表面処理装置の第二実施例の概略側
面図である。
FIG. 5 is a schematic side view of a second embodiment of the surface treatment apparatus of the present invention.

【図6】図5のB−B線に沿う拡大断面図である。6 is an enlarged cross-sectional view taken along the line BB of FIG.

【図7】従来の表面処理装置の一例を示す概略断面図で
ある。
FIG. 7 is a schematic sectional view showing an example of a conventional surface treatment apparatus.

【符号の説明】 D ディスク(被処理体) 1 支持軸 2 吊持部材 3 メッキ槽(処理槽) 4 メッキ液(処理液) 10 回転保持体 12 支持軸保持溝 20 支持軸落下防止用ガイド 30 太陽歯車(円形案内体) 31 遊星歯車(回転子) 40 補助支持軸 41 間隔保持溝[Explanation of reference symbols] D disk (object to be processed) 1 support shaft 2 suspension member 3 plating tank (processing tank) 4 plating liquid (processing liquid) 10 rotation holder 12 support shaft holding groove 20 support shaft drop prevention guide 30 Sun gear (circular guide) 31 Planetary gear (rotor) 40 Auxiliary support shaft 41 Spacing holding groove

【手続補正2】[Procedure Amendment 2]

【補正対象書類名】図面[Document name to be corrected] Drawing

【補正対象項目名】全図[Correction target item name] All drawings

【補正方法】追加[Correction method] Added

【補正内容】[Correction content]

【図1】 FIG.

【図2】 [Fig. 2]

【図3】 [Figure 3]

【図4】 [Figure 4]

【図6】 [Figure 6]

【図5】 [Figure 5]

【図7】 [Figure 7]

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 複数の被処理体を間隔をおいて垂直状に
支持する支持軸を、対峙する吊持部材に横架して処理液
内に浸漬することにより、上記被処理体の表面を処理す
る表面処理装置において、 上記吊持部材に固定される円形案内体と、 上記円形案内体と同心上にあって回転可能な回転保持体
とを具備し、 上記回転保持体の外周部に、上記支持軸を着脱及び回転
可能に嵌挿すべく放射方向に開口する保持溝を形成し、 上記支持軸に上記円形案内体に係合して転動する回転子
を固着してなることを特徴とする表面処理装置。
1. A surface of the object to be processed is obtained by horizontally supporting a plurality of objects to be processed with a support shaft vertically supported by a suspension member facing each other and immersing the supporting shaft in the processing solution. In the surface treatment device for processing, a circular guide body fixed to the suspension member and a rotatable holding body concentric with the circular guide body are provided, and an outer peripheral portion of the rotating holding body, A holding groove that is opened in the radial direction is formed so that the support shaft can be detachably and rotatably fitted, and a rotor that engages with the circular guide and rolls is fixed to the support shaft. Surface treatment equipment.
【請求項2】 円形案内体を太陽歯車にて形成し、回転
子を上記太陽歯車に噛合する遊星歯車にて形成してなる
ことを特徴とする請求項1記載の表面処理装置。
2. The surface treatment apparatus according to claim 1, wherein the circular guide body is formed of a sun gear, and the rotor is formed of a planetary gear that meshes with the sun gear.
【請求項3】 保持溝に着脱及び回転可能に嵌挿される
補助支持軸の軸方向に、被処理体を間隔をおいて保持す
る間隔保持溝を列設してなることを特徴とする請求項1
記載の表面処理装置。
3. An interval holding groove for holding an object to be processed at intervals is arranged in a row in the axial direction of an auxiliary support shaft that is rotatably fitted in the holding groove. 1
The surface treatment device described.
JP9366793A 1993-03-29 1993-03-29 Surface treatment equipment Expired - Lifetime JP2877217B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9366793A JP2877217B2 (en) 1993-03-29 1993-03-29 Surface treatment equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9366793A JP2877217B2 (en) 1993-03-29 1993-03-29 Surface treatment equipment

Publications (2)

Publication Number Publication Date
JPH0841649A true JPH0841649A (en) 1996-02-13
JP2877217B2 JP2877217B2 (en) 1999-03-31

Family

ID=14088756

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9366793A Expired - Lifetime JP2877217B2 (en) 1993-03-29 1993-03-29 Surface treatment equipment

Country Status (1)

Country Link
JP (1) JP2877217B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001152388A (en) * 1999-09-07 2001-06-05 Sumitomo Special Metals Co Ltd Surface treatment device
JP2005320569A (en) * 2004-05-07 2005-11-17 Murata Mfg Co Ltd Plating apparatus
JP2005336612A (en) * 2004-05-26 2005-12-08 Komag Inc Method and apparatus for applying voltage to substrate during plating
WO2018083914A1 (en) * 2016-11-07 2018-05-11 鋼鈑工業株式会社 Plating treatment tool and plating treatment device

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001152388A (en) * 1999-09-07 2001-06-05 Sumitomo Special Metals Co Ltd Surface treatment device
JP4734697B2 (en) * 1999-09-07 2011-07-27 日立金属株式会社 Surface treatment equipment
JP2005320569A (en) * 2004-05-07 2005-11-17 Murata Mfg Co Ltd Plating apparatus
JP2005336612A (en) * 2004-05-26 2005-12-08 Komag Inc Method and apparatus for applying voltage to substrate during plating
WO2018083914A1 (en) * 2016-11-07 2018-05-11 鋼鈑工業株式会社 Plating treatment tool and plating treatment device
JPWO2018083914A1 (en) * 2016-11-07 2019-09-19 鋼鈑工業株式会社 Plating processing jig and plating processing apparatus

Also Published As

Publication number Publication date
JP2877217B2 (en) 1999-03-31

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