JP2001152388A - Surface treatment device - Google Patents

Surface treatment device

Info

Publication number
JP2001152388A
JP2001152388A JP2000269986A JP2000269986A JP2001152388A JP 2001152388 A JP2001152388 A JP 2001152388A JP 2000269986 A JP2000269986 A JP 2000269986A JP 2000269986 A JP2000269986 A JP 2000269986A JP 2001152388 A JP2001152388 A JP 2001152388A
Authority
JP
Japan
Prior art keywords
surface treatment
treated
support member
treatment apparatus
present
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000269986A
Other languages
Japanese (ja)
Other versions
JP4734697B2 (en
Inventor
Masayuki Yoshimura
吉村  公志
Takeshi Nishiuchi
武司 西内
Fumiaki Kikui
文秋 菊井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Metals Ltd
Original Assignee
Sumitomo Special Metals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Special Metals Co Ltd filed Critical Sumitomo Special Metals Co Ltd
Priority to JP2000269986A priority Critical patent/JP4734697B2/en
Publication of JP2001152388A publication Critical patent/JP2001152388A/en
Application granted granted Critical
Publication of JP4734697B2 publication Critical patent/JP4734697B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide the subject device that can be applicable to a member to be surface treated, which is light weight and not having high strength like a bond magnet, and allows an uniform surface treatment not having a contact trace. SOLUTION: In a surface treatment device to conduct a surface treatment to a member to be surface treated having the inner peripheral face of a cylindrical shape, etc., support members to conduct a revolution motion are arranged around a rotary shaft, the member to be surface treated is turnably supported by the support members from an inner peripheral face side.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、円筒形状等の内周
面を有する被表面処理部材に、表面処理を施す表面処理
装置に関し、特にR−Fe−B系永久磁石、とりわけ、
リング状ボンド磁石や円筒状ボンド磁石に対して電気め
っきを施す際に有用な表面処理装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a surface treatment apparatus for performing a surface treatment on a surface-treated member having an inner peripheral surface such as a cylindrical shape, and more particularly to an R-Fe-B-based permanent magnet,
The present invention relates to a surface treatment apparatus useful for performing electroplating on a ring-shaped bonded magnet or a cylindrical bonded magnet.

【0002】[0002]

【従来の技術】Nd−Fe−B系永久磁石に代表される
R−Fe−B系などの希土類系永久磁石は、資源的に豊
富で安価な材料が用いられ、かつ、高い磁気特性を有し
ていることから、今日様々な分野で使用されている。し
かしながら、希土類系永久磁石は大気中で酸化腐食され
やすいRとFeを含むため、何の表面処理をも行わずに
使用した場合には、わずかな酸やアルカリや水分などの
存在によって表面から腐食が進行して錆が発生し、それ
に伴って、磁石特性の劣化やばらつきを生じるという問
題点を有している。
2. Description of the Related Art Rare-earth permanent magnets such as R-Fe-B permanent magnets represented by Nd-Fe-B-based permanent magnets use abundant and inexpensive materials as resources and have high magnetic properties. Therefore, it is used in various fields today. However, since rare-earth permanent magnets contain R and Fe, which are susceptible to oxidative corrosion in the atmosphere, if they are used without any surface treatment, they will corrode from the surface due to the presence of a slight amount of acid, alkali or moisture. Has progressed and rust is generated, and accordingly, there is a problem that magnet characteristics are degraded or varied.

【0003】上記の問題点を解消すべく、従来から磁石
表面に耐酸化性皮膜として金属めっき皮膜や樹脂塗装を
施す方法などが採用されており、例えば、R−Fe−B
系永久磁石表面に電気めっきによって耐食性皮膜を形成
する方法として、網籠の中に被めっき部材を入れ、該網
籠を回転しながらめっきを行う方法(バレル方式)や、
被めっき部材を陰電極に接続した導電性支持部材に支持
させてめっきを行う方法(ラック方式)などが採用され
ている。
[0003] In order to solve the above problems, a method of applying a metal plating film or a resin coating as an oxidation-resistant film on the magnet surface has conventionally been adopted. For example, R-Fe-B
As a method of forming a corrosion-resistant film on the surface of a system-based permanent magnet by electroplating, a method of placing a member to be plated in a mesh basket and performing plating while rotating the mesh basket (barrel method),
A method (rack method) of performing plating by supporting a member to be plated on a conductive support member connected to a negative electrode has been adopted.

【0004】[0004]

【発明が解決しようとする課題】上記のバレル方式によ
る電気めっきやラック方式による電気めっきは汎用性に
すぐれているものの、前者の方法では、磁石自体の強度
が必ずしも高くないボンド磁石に適用した場合、磁石の
割れや欠けを生じることがあるという問題点を有してい
る。また、後者の方法では、めっき工程中の磁石の位置
が一定なので、位置によって陽極からの距離が違い、膜
厚にばらつきが生じる。また、近年、希土類永久磁石が
使用される電子業界や家電業界では、部品の小型化、精
密化が進んでおり、それに対応して磁石自体もより小型
化が要求されている。特にリング状等の内周面を有する
ボンド磁石の場合、小型リング状磁石の表面処理を高い
寸法精度で、更に低コストで効率よく行うことは、従来
の技術では非常に困難である。例えば、特開昭60−1
90599号公報では、代表的なバレル方式で小型の部
材にめっきする方法が提案されている。しかしながら、
この方法では、前述の通り磁石に割れや欠けが生じやす
いばかりでなく、磁石が小さくて軽いため、めっき工程
中、常にすべての磁石に導通を確保することは困難で、
めっき効率が悪い。一方、特開昭61−52367号公
報では、板状ワークの孔にシャフトを通して、該シャフ
トを回転させることによりワーク自体が回転するめっき
装置が提案されている。しかしながら、この装置におい
て、ワークを回転させるためには、直径が大きなシャフ
トを用いなければならないので、ワークとシャフトとの
接点近傍へのめっき液のまわり込みが悪くなり、内側表
面に対するめっき効率が悪いという問題点を有してい
る。
Although the above-mentioned barrel plating and rack plating are excellent in versatility, the former method is applied to a bonded magnet in which the strength of the magnet itself is not necessarily high. However, there is a problem that the magnet may be cracked or chipped. In the latter method, since the position of the magnet during the plating step is constant, the distance from the anode differs depending on the position, and the film thickness varies. Further, in recent years, in the electronics industry and the home appliance industry in which rare-earth permanent magnets are used, miniaturization and precision of parts have been advanced, and correspondingly, the magnets themselves have been required to be further miniaturized. Particularly, in the case of a bonded magnet having an inner peripheral surface such as a ring shape, it is extremely difficult with the conventional technology to efficiently perform surface treatment of a small ring-shaped magnet with high dimensional accuracy at a low cost. For example, JP-A-60-1
No. 90599 proposes a method of plating a small member by a typical barrel method. However,
In this method, not only is the magnet prone to cracking and chipping as described above, but also the magnet is small and light, so it is difficult to always maintain conduction to all magnets during the plating process.
Poor plating efficiency. On the other hand, Japanese Patent Application Laid-Open No. 61-52367 proposes a plating apparatus in which a shaft is passed through a hole of a plate-shaped work, and the work itself is rotated by rotating the shaft. However, in this apparatus, in order to rotate the work, a shaft having a large diameter must be used, so that the plating solution is hardly wrapped around the contact point between the work and the shaft, and the plating efficiency on the inner surface is poor. There is a problem that.

【0005】そこで、本発明においては、ボンド磁石の
ような軽くて強度が必ずしも高くない被表面処理部材に
対しても適用でき、接点跡のない均一な表面処理を行う
ことを目的とする。
[0005] In view of the above, an object of the present invention is to apply the present invention to a light-weight and not necessarily high-strength surface-treated member such as a bonded magnet, and to perform a uniform surface treatment without contact marks.

【0006】[0006]

【課題を解決するための手段】請求項1記載の本発明の
表面処理装置は、円筒形状等の内周面を有する被表面処
理部材に、表面処理を施す表面処理装置であって、回転
軸を中心に公転動作を行う支持部材を設け、前記支持部
材は、前記被表面処理部材を内周面側から回動自在に支
持することを特徴とする。請求項2記載の本発明は、請
求項1に記載の表面処理装置において、前記支持部材
を、該支持部材の軸が略水平となるように配設し、複数
の前記被表面処理部材を、前記支持部材に並べて配設す
ることを特徴とする。請求項3記載の本発明は、請求項
1に記載の表面処理装置において、前記支持部材を導電
性部材で構成し、前記支持部材によって前記被表面処理
部材にめっき電流を流すことを特徴とする。請求項4記
載の本発明は、請求項3に記載の表面処理装置におい
て、前記支持部材に絶縁スペーサーを設け、前記被表面
処理部材を前記絶縁スペーサー間に配置することを特徴
とする。請求項5記載の本発明は、請求項4に記載の表
面処理装置において、前記被表面処理部材が等間隔に配
置されるように前記絶縁スペーサーを配置することを特
徴とする。請求項6記載の本発明は、請求項1に記載の
表面処理装置において、前記支持部材を螺旋状部材で構
成したことを特徴とする。請求項7記載の本発明は、請
求項2に記載の表面処理装置において、前記支持部材の
軸に対して平行に電極を配置したことを特徴とする。請
求項8記載の本発明は、請求項7に記載の表面処理装置
において、複数の前記支持部材を、該支持部材のそれぞ
れの軸が平行になるように配置し、それぞれの前記支持
部材の回転軸を共通としたことを特徴とする。請求項9
記載の本発明は、請求項8に記載の表面処理装置におい
て、それぞれの前記支持部材は、前記回転軸から等距離
に配置していることを特徴とする。請求項10記載の本
発明の電気めっき装置は、請求項1から請求項9のいず
れかに記載の表面処理装置を処理槽内に複数個配置して
用いる表面処理装置であって、各々の前記表面処理装置
の回転軸が平行になるように配置したことを特徴とす
る。請求項11記載の本発明のボンド磁石の電気めっき
装置は、請求項1から請求項10のいずれかに記載の表
面処理装置を用いて、ボンド磁石に電気めっきを行うこ
とを特徴とする。請求項12記載の本発明のR−Fe−
B系永久磁石は、請求項11に記載の電気めっき装置を
用いて電気めっき処理が施され、表面に耐食性皮膜を形
成していることを特徴とする。請求項13記載の本発明
の被表面処理部材の表面処理方法は、請求項1から請求
項10のいずれかに記載の表面処理装置を用いて表面処
理を施すことを特徴とする。請求項14記載の本発明の
被表面処理部材は、請求項13に記載の被表面処理部材
の表面処理方法によって、表面に皮膜を形成しているこ
とを特徴とする。
According to a first aspect of the present invention, there is provided a surface treatment apparatus for performing a surface treatment on a surface-treated member having an inner peripheral surface such as a cylindrical shape. And a support member that performs a revolving operation around the support member, and the support member rotatably supports the surface-treated member from the inner peripheral surface side. According to a second aspect of the present invention, in the surface treatment apparatus according to the first aspect, the support member is disposed such that an axis of the support member is substantially horizontal, and a plurality of the surface treatment members are provided. It is characterized by being arranged side by side on the support member. According to a third aspect of the present invention, in the surface treatment apparatus according to the first aspect, the support member is formed of a conductive member, and a plating current is applied to the surface-treated member by the support member. . According to a fourth aspect of the present invention, in the surface treatment apparatus according to the third aspect, an insulating spacer is provided on the support member, and the surface-treated member is disposed between the insulating spacers. According to a fifth aspect of the present invention, in the surface treatment apparatus according to the fourth aspect, the insulating spacers are arranged such that the surface-treated members are arranged at equal intervals. According to a sixth aspect of the present invention, in the surface treatment apparatus of the first aspect, the support member is formed of a spiral member. According to a seventh aspect of the present invention, in the surface treatment apparatus according to the second aspect, an electrode is arranged in parallel with an axis of the support member. According to an eighth aspect of the present invention, in the surface treatment apparatus according to the seventh aspect, a plurality of the support members are arranged such that respective axes of the support members are parallel to each other, and rotation of each of the support members is performed. It is characterized by having a common axis. Claim 9
According to the present invention, in the surface treatment apparatus according to the eighth aspect, each of the support members is arranged at an equal distance from the rotation axis. An electroplating apparatus according to a tenth aspect of the present invention is a surface treatment apparatus using a plurality of the surface treatment apparatuses according to any one of the first to ninth aspects arranged in a treatment tank. It is characterized in that the rotation axes of the surface treatment devices are arranged in parallel. According to an eleventh aspect of the present invention, there is provided an electroplating apparatus for bonded magnets, wherein the surface treatment apparatus according to any one of the first to tenth aspects is used to perform electroplating on the bonded magnet. The R-Fe- according to the present invention according to claim 12.
The B-based permanent magnet is characterized by being subjected to an electroplating process using the electroplating apparatus according to claim 11 and forming a corrosion-resistant film on the surface. According to a thirteenth aspect of the present invention, there is provided a surface treatment method for a surface-treated member, wherein the surface treatment is performed using the surface treatment apparatus according to any one of the first to tenth aspects. According to a fourteenth aspect of the present invention, there is provided a member to be surface-treated, wherein a film is formed on the surface by the surface treatment method for a member to be surface-treated according to the thirteenth aspect.

【0007】[0007]

【発明の実施の形態】本発明の第1の実施の形態による
表面処理装置は、回転軸を中心に公転動作を行う支持部
材を設け、支持部材は、被表面処理部材を内周面側から
回動自在に支持するものである。本実施の形態によれ
ば、被表面処理部材は、支持部材とともに公転動作を行
うことになる。従って、例えば電気めっき処理の場合に
は、その公転動作によってめっき液を攪拌する効果があ
るので、常に新鮮なめっき液が被表面処理部材の周辺に
供給されることとなり、効率のよいめっきができると共
に、被表面処理部材の内周面にもめっき液を回り込ませ
ることができるので、内周面側にも効率よく膜厚が均一
な表面処理を行うことができる。また、被表面処理部材
は、その内周面側から回動自在に支持されているので、
被表面処理部材は支持部材の公転によって回動動作を行
い、支持部材との当接位置は移動する。従って、支持部
材との接点跡が残らない均一な表面処理を行うことがで
きる。さらに、被表面処理部材は支持部材によって内周
面側から1点で支持されているので、処理可能な被表面
処理部材の径に制限が少なく、従来の技術では非常に困
難であった小型リング状部材に対しても効率よく、膜厚
が均一で接点跡が残らない均一な表面処理を行うことが
できる。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A surface treatment apparatus according to a first embodiment of the present invention is provided with a support member that performs a revolving operation around a rotation axis, and the support member moves a member to be surface-treated from an inner peripheral surface side. It is rotatably supported. According to the present embodiment, the surface-treated member performs a revolving operation together with the support member. Therefore, in the case of electroplating, for example, the revolving operation has the effect of stirring the plating solution, so that a fresh plating solution is always supplied to the periphery of the surface-treated member, and efficient plating can be performed. At the same time, since the plating solution can flow around the inner peripheral surface of the member to be surface-treated, it is possible to efficiently perform a uniform surface treatment on the inner peripheral surface side. Further, since the surface-treated member is rotatably supported from its inner peripheral surface side,
The surface-treated member rotates by the revolution of the support member, and the contact position with the support member moves. Therefore, it is possible to perform a uniform surface treatment without leaving traces of contact with the support member. Furthermore, since the surface-treated member is supported at one point from the inner peripheral surface side by the support member, the diameter of the surface-treated member that can be treated is small, and a small ring that is extremely difficult with the conventional technology. A uniform surface treatment with a uniform film thickness and no contact marks can be efficiently performed on the shaped member.

【0008】本発明の第2の実施の形態は、第1の実施
の形態による表面処理装置において、支持部材を軸が略
水平となるように配設し、複数の被表面処理部材を支持
部材に並べて配設するものである。本実施の形態によれ
ば、複数の被表面処理部材を、支持部材とともに公転動
作させることができる。従って、均一な表面処理を、同
時に多くの被表面処理部材に対して行うことができる。
According to a second embodiment of the present invention, there is provided a surface treatment apparatus according to the first embodiment, wherein a support member is disposed so that an axis thereof is substantially horizontal, and a plurality of surface treatment members are connected to the support member. Are arranged side by side. According to the present embodiment, a plurality of surface-treated members can be revolved with the support member. Therefore, uniform surface treatment can be performed on many surface-treated members at the same time.

【0009】本発明の第3の実施の形態は、第1の実施
の形態による表面処理装置において、支持部材を導電性
部材で構成し、支持部材によって被表面処理部材にめっ
き電流を流すものである。本実施の形態によれば、電気
めっき処理を効果的に行うことができる。特に複数の被
表面処理部材を、同時にめっき処理する場合にも、すべ
ての被表面処理部材に対して確実に電気を流すことがで
きる。
A third embodiment of the present invention is directed to a surface treatment apparatus according to the first embodiment, wherein the supporting member is formed of a conductive member, and a plating current is applied to the surface-treated member by the supporting member. is there. According to the present embodiment, the electroplating process can be effectively performed. In particular, even when a plurality of surface-treated members are subjected to plating at the same time, electricity can be reliably supplied to all the surface-treated members.

【0010】本発明の第4の実施の形態は、第3の実施
の形態による表面処理装置において、支持部材に絶縁ス
ペーサーを設け、被表面処理部材を絶縁スペーサー間に
配置するものである。本実施の形態によれば、絶縁スペ
ーサーによって、被表面処理部材同士の接触を防止する
ことができるので、接触によって電気めっきが不均一に
生じることを防止することができる。
In a fourth embodiment of the present invention, in the surface treatment apparatus according to the third embodiment, an insulating spacer is provided on a support member, and a surface-treated member is disposed between the insulating spacers. According to the present embodiment, since the contact between the members to be surface-treated can be prevented by the insulating spacer, it is possible to prevent the nonuniform electroplating due to the contact.

【0011】本発明の第5の実施の形態は、第4の実施
の形態による表面処理装置において、被表面処理部材が
等間隔に配置されるように絶縁スペーサーを配置するも
のである。本実施の形態によれば、スペーサーの位置ま
たは軸方向の幅寸法を調節し、被表面処理部材同志の間
隔を所定寸法で等間隔にすることによって、被表面処理
部材のエッジ部分への電気力線の集中を緩和し、さらに
めっきの均一性を向上させることができる。各々の間隔
は被表面処理部材のエッジ部分への電気力線の集中が緩
和され、エッジ部分の膜厚が均一になるような適正値を
選定するのが望ましい。また、スペーサーは、あらかじ
め所定寸法に間隔が調整され支持部材と一体になったも
のでもよいし、位置の調節が可能なものでもよい。
According to a fifth embodiment of the present invention, in the surface treatment apparatus according to the fourth embodiment, insulating spacers are arranged so that members to be surface-treated are arranged at equal intervals. According to this embodiment, the position or axial width of the spacer is adjusted, and the distance between the surface-treated members is made equal to each other at a predetermined size, so that the electric force to the edge portion of the surface-treated member is adjusted. The concentration of lines can be reduced, and the uniformity of plating can be further improved. It is desirable to select an appropriate value for each interval such that concentration of lines of electric force on the edge of the surface-treated member is reduced and the film thickness at the edge is uniform. Further, the spacer may be one in which the interval is adjusted to a predetermined dimension in advance and integrated with the support member, or one that can be adjusted in position.

【0012】本発明の第6の実施の形態は、第1の実施
の形態による表面処理装置において、支持部材を螺旋状
部材で構成したものである。本実施の形態によれば、被
表面処理部材は、螺旋状部材の下部毎に吊り下げること
ができ、被表面処理部材同士の接触を防止することがで
きるので、接触によって表面処理が不均一になることを
防止することができる。なお、被表面処理部材同志の間
隔が所定寸法で等間隔になるような螺旋状部材を使用す
ることによって、被表面処理部材のエッジ部分への電気
力線の集中を緩和し、さらにめっきの均一性を向上させ
ることができる。
According to a sixth embodiment of the present invention, in the surface treatment apparatus according to the first embodiment, the support member is formed by a spiral member. According to the present embodiment, the member to be surface-treated can be hung at each lower portion of the spiral member, and the contact between the members to be surface-treated can be prevented. Can be prevented. In addition, by using a helical member in which the intervals between the surface-treated members are equal to each other at a predetermined dimension, the concentration of lines of electric force on the edge portion of the surface-treated member is reduced, and the uniformity of plating is further improved. Performance can be improved.

【0013】本発明の第7の実施の形態は、第2の実施
の形態による表面処理装置において、支持部材の軸に対
して平行に電極を配置したものである。本実施の形態に
よれば、複数吊り下げられた被表面処理部材は、いずれ
も電極からの距離が等しいために、すべての被表面処理
部材を膜厚のばらつきなく均一に電気めっき処理を施す
ことができる。
According to a seventh embodiment of the present invention, in the surface treatment apparatus according to the second embodiment, electrodes are arranged in parallel to the axis of the support member. According to the present embodiment, since all of the suspended surface-treated members have the same distance from the electrode, all the surface-treated members are subjected to the electroplating process uniformly without variation in film thickness. Can be.

【0014】本発明の第8の実施の形態は、第7の実施
の形態による表面処理装置において、複数の支持部材
を、この支持部材のそれぞれの軸が平行になるように配
置し、それぞれの前記支持部材の回転軸を共通としたも
のである。本実施の形態によれば、それぞれの支持部材
に吊り下げられた被表面処理部材は、回転軸を中心に公
転動作を行うことによって電極との距離が時間とともに
変化するが、すべて同じ位置履歴で動くので、位置によ
って膜厚のばらつきが生じることなく均一に電気めっき
処理され、また多くの被表面処理部材を同時に処理する
ことができる。
According to an eighth embodiment of the present invention, in the surface treatment apparatus according to the seventh embodiment, a plurality of support members are arranged such that respective axes of the support members are parallel to each other. The support member has a common rotation axis. According to the present embodiment, the surface-treated members suspended from the respective support members perform a revolving operation around the rotation axis, and the distance between the electrodes and the electrodes changes with time. Since it moves, the electroplating process can be performed uniformly without causing a variation in film thickness depending on the position, and a large number of surface-treated members can be processed simultaneously.

【0015】本発明の第9の実施の形態は、第8の実施
の形態による表面処理装置において、それぞれの支持部
材は、回転軸から等距離に配置したものである。本実施
の形態によれば、いずれの支持部材に吊り下げられた被
表面処理部材についても、膜厚のばらつきなく均一に電
気めっき処理される。
According to a ninth embodiment of the present invention, in the surface treatment apparatus according to the eighth embodiment, the respective support members are arranged at an equal distance from the rotation axis. According to the present embodiment, the surface-treated member suspended from any of the support members is uniformly electroplated without a variation in film thickness.

【0016】本発明の第10の実施の形態による電気め
っき装置は、第1から第9の実施の形態による表面処理
装置を処理槽内に複数個配置して用いる表面処理装置で
あって、各々の表面処理装置の回転軸が平行になるよう
に配置したものである。本実施の形態によれば、さらに
多くの被表面処理部材を同時に処理することができ、本
発明の装置が使用されるめっき槽の大きさに応じて、そ
れらを有効に活用することができる。
An electroplating apparatus according to a tenth embodiment of the present invention is a surface treatment apparatus using a plurality of the surface treatment apparatuses according to the first to ninth embodiments arranged in a treatment tank. Are arranged so that their rotation axes are parallel. According to the present embodiment, more members to be treated can be treated simultaneously, and they can be effectively utilized according to the size of the plating tank in which the apparatus of the present invention is used.

【0017】本発明の第11の実施の形態による電気め
っき装置は、第1から第10の実施の形態による表面処
理装置を用いてボンド磁石に電気めっきを行うものであ
る。本実施の形態によれば、ボンド磁石の内周面にも、
膜厚のばらつきなく均一に電気めっきを行うことができ
る。
An electroplating apparatus according to an eleventh embodiment of the present invention performs electroplating on a bonded magnet using the surface treatment apparatus according to the first to tenth embodiments. According to the present embodiment, also on the inner peripheral surface of the bonded magnet,
Electroplating can be performed uniformly without variation in film thickness.

【0018】本発明の第12の実施の形態によるR−F
e−B系永久磁石は、第11の実施の形態による電気め
っき装置を用いて電気めっき処理を施したものである。
本実施の形態によれば、内周面にも、膜厚のばらつきな
く均一に耐食性皮膜を形成したR−Fe−B系永久磁石
を得ることができる。
RF according to a twelfth embodiment of the present invention
The eB-based permanent magnet has been subjected to electroplating using the electroplating apparatus according to the eleventh embodiment.
According to the present embodiment, it is possible to obtain an R-Fe-B-based permanent magnet in which a corrosion-resistant coating is uniformly formed on the inner peripheral surface without variation in film thickness.

【0019】本発明の第13の実施の形態による被表面
処理部材の表面処理方法は、第1から第10の実施の形
態による表面処理装置を用いて表面処理を施すものであ
る。本実施の形態によれば、被表面処理部材の内周面に
も、膜厚のばらつきなく均一に表面処理を行うことがで
きる。
A surface treatment method for a member to be surface-treated according to a thirteenth embodiment of the present invention performs a surface treatment using the surface treatment apparatus according to the first to tenth embodiments. According to the present embodiment, it is possible to uniformly perform the surface treatment on the inner peripheral surface of the member to be treated without variation in the film thickness.

【0020】本発明の第14の実施の形態による被表面
処理部材は、第13の実施の形態による被表面処理部材
の表面処理方法によって、表面に皮膜を形成したもので
ある。本実施の形態によれば、内周面にも、膜厚のばら
つきなく均一に皮膜を形成した被表面処理部材を得るこ
とができる。
The surface-treated member according to the fourteenth embodiment of the present invention has a film formed on the surface by the surface treatment method for the surface-treated member according to the thirteenth embodiment. According to the present embodiment, it is possible to obtain a surface-treated member in which a film is formed evenly on the inner peripheral surface without variation in film thickness.

【0021】[0021]

【実施例】以下に本発明の一実施例による表面処理装置
を図1から図3を用いて説明する。図1は本実施例によ
るボンド磁石の電気めっき装置の概念構成図、図2は図
1の要部拡大斜視図、図3は支持部材とボンド磁石の動
きを説明するための構成図である。図1は、めっき槽の
電解めっき液中に配置される陽電極板10と、被表面処
理部材としてリング状ボンド磁石20を保持する表面処
理用治具30を示している。表面処理用治具30は、リ
ング状ボンド磁石20を内周面側から回動自在に支持す
る支持部材40と、この支持部材40を公転動作させる
ための回転部材50とを備えている。図1に示すよう
に、陽電極11に接続される2枚の陽電極板10は、対
向するように平行に配置され、表面処理用治具30は、
支持部材40の軸が陽極電極10と平行になるようにこ
れら陽極電極10の間に配置される。表面処理用治具3
0は、外部に設置されるモータ31の動力を回転部材5
0に伝達するための歯車32を備えている。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A surface treatment apparatus according to an embodiment of the present invention will be described below with reference to FIGS. FIG. 1 is a conceptual configuration diagram of a bond magnet electroplating apparatus according to the present embodiment, FIG. 2 is an enlarged perspective view of a main part of FIG. 1, and FIG. 3 is a configuration diagram for explaining the movement of a support member and a bond magnet. FIG. 1 shows a positive electrode plate 10 arranged in an electrolytic plating solution in a plating tank and a surface treatment jig 30 for holding a ring-shaped bonded magnet 20 as a surface-treated member. The surface treatment jig 30 includes a support member 40 that rotatably supports the ring-shaped bonded magnet 20 from the inner peripheral surface side, and a rotating member 50 that causes the support member 40 to revolve. As shown in FIG. 1, two positive electrode plates 10 connected to the positive electrode 11 are arranged in parallel so as to face each other, and the surface treatment jig 30
The supporting member 40 is disposed between the anode electrodes 10 so that the axis thereof is parallel to the anode electrodes 10. Jig for surface treatment 3
0 denotes the power of the motor 31 installed outside
It has a gear 32 for transmission to zero.

【0022】特に図2に示すように、支持部材40は、
金属製の支持軸41とこの支持軸41に所定間隔あけて
配置された樹脂製の絶縁スペーサー42とより構成され
ている。回転部材50は、表面処理用治具30に回動自
在に設けられた一対の回転板51と、これら一対の回転
板51を連結するとともに、歯車32の軸と連結されて
回転中心となる回転軸52とより構成されている。な
お、回転部材50は、絶縁材料で構成されるか、又は表
面を絶縁処理している。回転板51は、回転軸52から
等距離で、かつ等間隔に軸受け部53を備えている。そ
して、支持部材40は、この軸受け部53によって保持
されている。本実施例では、8本の支持部材40を備え
ている。また、回転板51は、陰電極33に接続される
陰電極接合部54を内部に備え、この陰電極接合部54
によって支持部材40を陰電極33と接続している。こ
の陰電極接合部54は、回転軸52の中心部から、それ
ぞれの軸受け部53に向かって放射状に設けられてい
る。なお、この陰電極接合部54は、本実施例のように
放射状に設けなくても、円盤状の導電性部材を設けても
よい。
As particularly shown in FIG. 2, the support member 40
It is composed of a metal supporting shaft 41 and a resin insulating spacer 42 arranged at a predetermined interval on the supporting shaft 41. The rotating member 50 is connected to a pair of rotating plates 51 rotatably provided on the surface treatment jig 30 and the pair of rotating plates 51, and is connected to a shaft of the gear 32 to be a rotation center. A shaft 52 is provided. The rotating member 50 is made of an insulating material, or has its surface insulated. The rotating plate 51 has bearings 53 at an equal distance from the rotating shaft 52 and at equal intervals. The support member 40 is held by the bearing 53. In this embodiment, eight support members 40 are provided. Further, the rotating plate 51 includes a negative electrode joint 54 connected to the negative electrode 33 therein.
Thus, the support member 40 is connected to the negative electrode 33. The negative electrode joints 54 are provided radially from the center of the rotating shaft 52 toward the respective bearings 53. The negative electrode bonding portion 54 may not be provided radially as in the present embodiment, but may be provided with a disk-shaped conductive member.

【0023】次に、本実施例によるボンド磁石の電気め
っき装置の使用方法及び動作について説明する。まず、
支持部材40の絶縁スペーサー42の間にリング状ボン
ド磁石20を配設する。このようにリング状ボンド磁石
20を配設した支持部材40を表面処理用治具30に設
置する。図1では、一つのリング状ボンド磁石20を配
設したものを示しているが、絶縁スペーサー42の間毎
にリング状ボンド磁石20を配設することができる。支
持部材40の設置が完了した後に、電気めっきが行われ
る。陽電極11及び陰電極33を導通するとともに、モ
ータ31が駆動される。モータ31の駆動力は、歯車3
2を介して回転部材50に伝達され、回転部材50は、
回転軸52を中心に回転する。従って、それぞれの支持
部材40は、回転軸52を中心に公転動作を行う。以上
においては回転部材50を有する構成において説明した
が、必ずしも回転部材は必要でなく、回転部材50を設
けずに回転板51の片方もしくは両方にモータ31の動
力を伝達して回転板51を回転させる構造であってもよ
い。その他、実施例に限定されることなく、支持部材4
0を所定の回転軸を中心に公転可能に配置する構成で本
発明の目的は達成される。
Next, the method of use and operation of the apparatus for electroplating bonded magnets according to the present embodiment will be described. First,
The ring-shaped bonded magnet 20 is disposed between the insulating spacers 42 of the support member 40. The support member 40 on which the ring-shaped bonded magnets 20 are arranged as described above is placed on the surface treatment jig 30. Although FIG. 1 shows an arrangement in which one ring-shaped bonded magnet 20 is provided, the ring-shaped bonded magnet 20 can be provided between the insulating spacers 42. After the installation of the support member 40 is completed, electroplating is performed. The motor 31 is driven while conducting the positive electrode 11 and the negative electrode 33. The driving force of the motor 31 is the gear 3
2 to the rotating member 50, and the rotating member 50
It rotates around the rotation shaft 52. Accordingly, each support member 40 performs a revolving operation around the rotation shaft 52. In the above description, the configuration having the rotating member 50 has been described. However, the rotating member is not necessarily required, and the power of the motor 31 is transmitted to one or both of the rotating plates 51 without providing the rotating member 50 to rotate the rotating plate 51. The structure may be such that In addition, the support member 4 is not limited to the embodiment.
The object of the present invention is achieved by a configuration in which 0 is revolvably arranged around a predetermined rotation axis.

【0024】ここで、図3を用いて支持部材40とリン
グ状ボンド磁石20の動きについて説明する。図3に示
すように、支持部材40は、回転軸52を中心にして反
時計回りの方向(矢印X)に公転する。すなわち、
(a)の位置にある支持部材40は、(b)の位置に移
動し、(b)の位置にある支持部材40は、(c)の位
置に移動する。ここで、支持部材40は、支持部材40
自身で自転はしない。しかし、支持部材40における回
転軸52から最外周に位置するポイントAに着目する
と、(a)の位置では、最上部に位置するポイントA
は、(c)の位置では、反時計回りの方向に90度、
(e)の位置では、反時計周りの方向に180度回転し
ている。そして(a)の位置に戻ったときには、360
度回転することになる。従って、支持部材40に当接し
ているリング状ボンド磁石20も反時計回りの方向(矢
印Y)に回転する。このとき、リング状ボンド磁石20
の内周径と支持部材40の外周径が等しい場合には、滑
りを無視すれば、支持部材40の1回の公転にともなっ
て、リング状ボンド磁石20は1回転することになる。
このように、支持部材40とリング状ボンド磁石20と
の当接位置は、支持部材40の公転にともなって移動す
るため、リング状ボンド磁石20には、支持部材40と
の接点跡が残ることなく、均一なめっき処理を行うこと
ができる。
Here, the movement of the support member 40 and the ring-shaped bonded magnet 20 will be described with reference to FIG. As shown in FIG. 3, the support member 40 revolves in a counterclockwise direction (arrow X) about the rotation shaft 52. That is,
The support member 40 at the position (a) moves to the position (b), and the support member 40 at the position (b) moves to the position (c). Here, the support member 40 is
It does not rotate on its own. However, focusing on the point A located on the outermost periphery from the rotation shaft 52 in the support member 40, at the position (a), the point A located on the uppermost portion is obtained.
Is 90 degrees counterclockwise in the position (c),
In the position of (e), it is rotated 180 degrees in the counterclockwise direction. Then, when returning to the position (a), 360
Will be rotated by degrees. Therefore, the ring-shaped bonded magnet 20 in contact with the support member 40 also rotates in the counterclockwise direction (arrow Y). At this time, the ring-shaped bonded magnet 20
When the inner diameter of the support member 40 is equal to the outer diameter of the support member 40, the ring-shaped bond magnet 20 makes one revolution with one revolution of the support member 40, if the slip is ignored.
As described above, since the contact position between the support member 40 and the ring-shaped bonded magnet 20 moves with the revolution of the support member 40, a contact mark with the support member 40 remains on the ring-shaped bonded magnet 20. And a uniform plating process can be performed.

【0025】本実施例のように、支持部材40をその軸
が略水平となるように配設し、複数のリング状ボンド磁
石20を支持部材40に並べて配設することで、多くの
リング状ボンド磁石20を、支持部材40とともに公転
動作させることができる。従って、均一な表面処理を、
同時に多くのリング状ボンド磁石20に対して行うこと
ができる。また本実施例のように、支持部材40の軸が
陽極電極10と平行になるようにこれら陽極電極10の
間に配置することで、リング状ボンド磁石20は、いず
れも陽極電極10からの距離が等しいために、すべての
リング状ボンド磁石20を膜厚のばらつきなく均一に電
気めっき処理を施すことができる。また本実施例のよう
に、複数の支持部材40を、支持部材40のそれぞれの
軸が平行になるように配置し、それぞれの支持部材40
の回転軸を共通としたことで、それぞれの支持部材40
に吊り下げられたリング状ボンド磁石20は、膜厚のば
らつきなく均一に電気めっき処理され、また多くのリン
グ状ボンド磁石20を同時に処理することができる。ま
た本実施例のように、それぞれの支持部材40を回転軸
52から等距離に配置することで、いずれの支持部材4
0に吊り下げられたリング状ボンド磁石20について
も、膜厚のばらつきなく均一に電気めっき処理される。
As in the present embodiment, the support member 40 is arranged so that its axis is substantially horizontal, and a plurality of ring-shaped bond magnets 20 are arranged side by side on the support member 40, so that many ring-shaped The bond magnet 20 can revolve with the support member 40. Therefore, a uniform surface treatment
This can be performed on many ring-shaped bonded magnets 20 at the same time. Further, by disposing the support member 40 between the anode electrodes 10 such that the axis of the support member 40 is parallel to the anode electrodes 10 as in the present embodiment, the ring-shaped bonded magnets 20 are all at a distance from the anode electrode 10. Are equal, all the ring-shaped bonded magnets 20 can be uniformly electroplated without variation in film thickness. Further, as in the present embodiment, the plurality of support members 40 are arranged so that the respective axes of the support members 40 are parallel to each other.
The common rotation axis of each support member 40
The ring-shaped bonded magnets 20 suspended in this manner are uniformly electroplated without variation in film thickness, and many ring-shaped bonded magnets 20 can be processed simultaneously. Further, as in this embodiment, by disposing each support member 40 at an equal distance from the rotation shaft 52, any of the support members 4
The ring-shaped bonded magnet 20 hung at 0 is also uniformly electroplated without variation in film thickness.

【0026】図4に他の実施例を示す。図4は、他の実
施例による支持部材の斜視図であり、その他の基本構成
は図1と同様であるので説明を省略する。本実施例に示
す支持部材40Aは、螺旋状部材で構成されている。こ
のように支持部材40Aを螺旋状部材とすることで、リ
ング状ボンド磁石20を螺旋状部材の下部毎に吊り下げ
ることができ、リング状ボンド磁石20同士の接触を防
止することができるので、接触によって表面処理が不均
一になることを防止することができる。なお、上記実施
例では、支持部材40に絶縁スペーサー42を設けて説
明したが、絶縁スペーサー42を設けなくてもよく、ま
た絶縁スペーサー42を設ける場合であっても、実質的
に隣り合うリング状ボンド磁石20同士の接触を防止す
ることができれば、単なる突起であってもよい。また、
回転数をあげれば液流ができボンド磁石同士の接触を防
げるため、スペーサーを省略することが可能となる。ま
た、本発明の表面処理装置は、電気めっき処理に限られ
ず、無電解めっき処理、化成処理、エッチング処理など
を行う装置に使用することもできる。また、本発明の表
面処理装置により効果的に表面処理される被表面処理部
材としては、R−Fe−B系リング状ボンド磁石やR−
Fe−B系円筒状ボンド磁石である。また、上記実施例
では、8つの支持部材40の場合で説明したが、更に多
くても、また少なくてもよい。また、上記実施例では、
8つの支持部材40を回転軸52から等距離に配置した
が、距離を異ならせることで、被表面処理部材同士を接
触させることなく、同時に表面処理できる被表面処理部
材の個数を更に増やすことができる。また、上記実施例
の表面処理用治具30をそれぞれの回転部材50が平行
になるように複数個配置することによってさらに多くの
被表面処理部材を同時に処理することができる。この場
合、それぞれの回転軸を、直接ベルトで連結するか、ま
たはそれぞれの歯車を介して連結する等により、1つの
モータ31によって全ての表面処理用治具30を同時に
動かすことができる。また、本発明の装置によって表面
処理できるボンド磁石としては、液体急冷系等方性Nd
−Fe−B磁石粉末(MQI社製 商品名:MQP−B
等)を用いたボンド磁石、特開平9−92515号公報
に示されるような異方性R−Fe−B系ボンド磁石、特
開平8−203714号公報に示されるようなソフト磁
性相(たとえばFe3B)とハード磁性相(Nd2−F
e14−B)を有するNd−Fe−B系ナノコンポジット
磁石、特公平5−82041号公報に示されるR−Fe
−N系ボンド磁石が挙げられる。これらはいずれも、エ
ポキシ樹脂等のバインダーを用い、所定の形状に成形さ
れたあと、表面に導電処理がなされたあとに、めっき処
理される。また、本発明の装置では、上記ボンド磁石の
他、リング状焼結磁石等にも適用することができる。
FIG. 4 shows another embodiment. FIG. 4 is a perspective view of a support member according to another embodiment, and the other basic configuration is the same as that of FIG. The support member 40A shown in this embodiment is formed by a spiral member. By using the spiral member as the support member 40A, the ring-shaped bonded magnet 20 can be hung at each lower part of the spiral member, and the contact between the ring-shaped bonded magnets 20 can be prevented. Non-uniform surface treatment due to contact can be prevented. In the above embodiment, the support member 40 is provided with the insulating spacer 42. However, the insulating spacer 42 may not be provided, and even when the insulating spacer 42 is provided, substantially the same ring shape may be used. A simple protrusion may be used as long as the contact between the bond magnets 20 can be prevented. Also,
If the number of rotations is increased, a liquid flow can be generated and the contact between the bonded magnets can be prevented, so that the spacer can be omitted. Further, the surface treatment apparatus of the present invention is not limited to the electroplating treatment, and can be used for an apparatus for performing an electroless plating treatment, a chemical conversion treatment, an etching treatment and the like. Examples of the surface-treated member that is effectively surface-treated by the surface treatment apparatus of the present invention include an R—Fe—B-based ring-shaped bonded magnet and
It is a Fe-B based cylindrical bonded magnet. Further, in the above embodiment, the case of eight support members 40 has been described, but the number may be more or less. In the above embodiment,
Although the eight support members 40 are arranged at the same distance from the rotation shaft 52, the distances can be made different to further increase the number of surface-treated members that can be surface-treated at the same time without bringing the surface-treated members into contact with each other. it can. Further, by arranging a plurality of the surface treatment jigs 30 of the above embodiment such that the respective rotating members 50 are parallel to each other, it is possible to simultaneously treat more surface-treated members. In this case, all the surface treatment jigs 30 can be simultaneously moved by one motor 31 by directly connecting the respective rotating shafts with a belt or connecting them via respective gears. The bonded magnet that can be surface-treated by the apparatus of the present invention includes a liquid quenching system isotropic Nd
-Fe-B magnet powder (trade name: MQP-B, manufactured by MQI)
Etc.), an anisotropic R-Fe-B based bond magnet as disclosed in JP-A-9-92515, and a soft magnetic phase (for example, Fe3B) as disclosed in JP-A-8-203714. ) And a hard magnetic phase (Nd2-F)
e14-B) Nd-Fe-B based nanocomposite magnet, R-Fe disclosed in Japanese Patent Publication No. 5-82041
-N-based bonded magnets. All of these are formed into a predetermined shape using a binder such as an epoxy resin, and then subjected to a plating treatment after a surface is subjected to a conductive treatment. Further, the device of the present invention can be applied to a ring-shaped sintered magnet and the like in addition to the above-described bonded magnet.

【0027】[0027]

【発明の効果】本発明によれば、被表面処理部材は、支
持部材とともに公転動作を行うことになる。従って、例
えば電気めっき処理の場合には、めっき液を攪拌し、被
表面処理部材の内周面にもめっき液を回り込ませること
ができるので、均一な表面処理を行うことができる。ま
た、被表面処理部材は、その内周面側から回動自在に支
持されているので、被表面処理部材は支持部材の公転に
よって回動動作を行い、支持部材との当接位置は移動す
る。従って、支持部材との接点跡が残らない均一な表面
処理を行うことができる。
According to the present invention, the surface-treated member performs a revolving operation together with the support member. Therefore, for example, in the case of an electroplating process, the plating solution can be stirred and the plating solution can flow around the inner peripheral surface of the member to be surface-treated, so that a uniform surface treatment can be performed. Further, since the surface-treated member is rotatably supported from its inner peripheral surface side, the surface-treated member rotates by the revolution of the support member, and the contact position with the support member moves. . Therefore, it is possible to perform a uniform surface treatment without leaving traces of contact with the support member.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施例によるボンド磁石の電気めっ
き装置の概念構成図
FIG. 1 is a conceptual configuration diagram of a bond magnet electroplating apparatus according to an embodiment of the present invention.

【図2】図1の要部拡大斜視図FIG. 2 is an enlarged perspective view of a main part of FIG. 1;

【図3】本発明の一実施例による支持部材とボンド磁石
の動きを説明するための構成図
FIG. 3 is a configuration diagram for explaining movements of a support member and a bond magnet according to an embodiment of the present invention.

【図4】本発明の他の実施例による支持部材の要部斜視
FIG. 4 is a perspective view of a main part of a support member according to another embodiment of the present invention.

【符号の説明】[Explanation of symbols]

20 リング状ボンド磁石 40 支持部材 42 絶縁スペーサー 50 回転部材 Reference Signs List 20 ring-shaped bonded magnet 40 support member 42 insulating spacer 50 rotating member

───────────────────────────────────────────────────── フロントページの続き (72)発明者 菊井 文秋 大阪府三島郡島本町江川2丁目15番17号 住友特殊金属株式会社山崎製作所内 Fターム(参考) 4K024 BB14 BC06 CB02 CB04 CB08 CB26  ────────────────────────────────────────────────── ─── Continuing on the front page (72) Fumiaki Kikui 2-15-17 Egawa, Shimamoto-cho, Mishima-gun, Osaka Prefecture F-term in Sumitomo Special Metals Co., Ltd. Yamazaki Works (reference) 4K024 BB14 BC06 CB02 CB04 CB08 CB26

Claims (14)

【特許請求の範囲】[Claims] 【請求項1】 円筒形状等の内周面を有する被表面処理
部材に、表面処理を施す表面処理装置であって、回転軸
を中心に公転動作を行う支持部材を設け、前記支持部材
は、前記被表面処理部材を内周面側から回動自在に支持
することを特徴とする表面処理装置。
1. A surface treatment apparatus for performing a surface treatment on a surface-treated member having an inner peripheral surface such as a cylindrical shape, wherein a supporting member that performs a revolving operation around a rotation axis is provided. A surface treatment apparatus, wherein the surface treatment member is rotatably supported from an inner peripheral surface side.
【請求項2】 前記支持部材を、該支持部材の軸が略水
平となるように配設し、複数の前記被表面処理部材を、
前記支持部材に並べて配設することを特徴とする請求項
1に記載の表面処理装置。
2. The method according to claim 1, wherein the supporting member is disposed such that an axis of the supporting member is substantially horizontal.
The surface treatment device according to claim 1, wherein the surface treatment device is arranged side by side on the support member.
【請求項3】 前記支持部材を導電性部材で構成し、前
記支持部材によって前記被表面処理部材にめっき電流を
流すことを特徴とする請求項1に記載の表面処理装置。
3. The surface treatment apparatus according to claim 1, wherein the support member is formed of a conductive member, and a plating current is applied to the surface-treated member by the support member.
【請求項4】 前期支持部材に絶縁スペーサーを設け、
前記被表面処理部材を前記絶縁スペーサー間に配置する
ことを特徴とする請求項3に記載の表面処理装置。
4. An insulating spacer is provided on the supporting member,
The surface treatment apparatus according to claim 3, wherein the member to be surface treated is arranged between the insulating spacers.
【請求項5】 前記被表面処理部材が等間隔に配置され
るように前記絶縁スペーサーを配置することを特徴とす
る請求項4に記載の表面処理装置。
5. The surface treatment apparatus according to claim 4, wherein the insulating spacers are arranged so that the members to be surface-treated are arranged at equal intervals.
【請求項6】前記支持部材を螺旋状部材で構成したこと
を特徴とする請求項1に記載の表面処理装置。
6. A surface treatment apparatus according to claim 1, wherein said support member is constituted by a spiral member.
【請求項7】 前記支持部材の軸に対して平行に電極を
配置したことを特徴とする請求項2に記載の表面処理装
置。
7. The surface treatment apparatus according to claim 2, wherein an electrode is arranged parallel to an axis of the support member.
【請求項8】 複数の前記支持部材を、該支持部材のそ
れぞれの軸が平行になるように配置し、それぞれの前記
支持部材の回転軸を共通としたことを特徴とする請求項
7に記載の表面処理装置。
8. The apparatus according to claim 7, wherein a plurality of the support members are arranged such that respective axes of the support members are parallel to each other, and a rotation axis of each of the support members is common. Surface treatment equipment.
【請求項9】 それぞれの前記支持部材は、前記回転軸
から等距離に配置していることを特徴とする請求項8に
記載の表面処理装置。
9. The surface treatment apparatus according to claim 8, wherein each of the support members is arranged at an equal distance from the rotation axis.
【請求項10】 請求項1から請求項9のいずれかに記
載の表面処理装置を処理槽内に複数個配置して用いる表
面処理装置であって、各々の前記表面処理装置の回転軸
が平行になるように配置したことを特徴とする表面処理
装置。
10. A surface treatment apparatus comprising a plurality of the surface treatment apparatuses according to claim 1 arranged in a treatment tank, wherein the rotation axes of the respective surface treatment apparatuses are parallel. A surface treatment device, wherein the surface treatment device is arranged so as to be:
【請求項11】 請求項1から請求項10のいずれかに
記載の表面処理装置を用いて、ボンド磁石に電気めっき
を行うことを特徴とするボンド磁石の電気めっき装置。
11. An electroplating apparatus for bonded magnets, wherein electroplating is performed on a bonded magnet using the surface treatment apparatus according to any one of claims 1 to 10.
【請求項12】 請求項11に記載のボンド磁石の電気
めっき装置を用いて電気めっき処理が施され、表面に耐
食性皮膜を形成していることを特徴とするR−Fe−B
系永久磁石。
12. An R-Fe-B, which has been subjected to an electroplating treatment using the apparatus for electroplating a bonded magnet according to claim 11 to form a corrosion-resistant film on a surface thereof.
System permanent magnet.
【請求項13】 請求項1から請求項10のいずれかに
記載の表面処理装置を用いて表面処理を施すことを特徴
とする被表面処理部材の表面処理方法。
13. A surface treatment method for a surface-treated member, wherein the surface treatment is performed using the surface treatment apparatus according to claim 1. Description:
【請求項14】 請求項13に記載の被表面処理部材の
表面処理方法によって、表面に皮膜を形成していること
を特徴とする被表面処理部材。
14. A surface-treated member, wherein a film is formed on the surface by the surface-treating method for a surface-treated member according to claim 13.
JP2000269986A 1999-09-07 2000-09-06 Surface treatment equipment Expired - Lifetime JP4734697B2 (en)

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JP11-253366 1999-09-07
JP25336699 1999-09-07
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