JP2017534461A - ベルヌーイプロセスヘッド - Google Patents
ベルヌーイプロセスヘッド Download PDFInfo
- Publication number
- JP2017534461A JP2017534461A JP2017517271A JP2017517271A JP2017534461A JP 2017534461 A JP2017534461 A JP 2017534461A JP 2017517271 A JP2017517271 A JP 2017517271A JP 2017517271 A JP2017517271 A JP 2017517271A JP 2017534461 A JP2017534461 A JP 2017534461A
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- JP
- Japan
- Prior art keywords
- substrate
- bernoulli
- process head
- pack
- processing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 89
- 239000000758 substrate Substances 0.000 claims abstract description 153
- 230000003287 optical effect Effects 0.000 claims abstract description 85
- 239000012530 fluid Substances 0.000 claims abstract description 31
- 230000007613 environmental effect Effects 0.000 claims description 10
- 239000000463 material Substances 0.000 description 9
- 230000007423 decrease Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000005484 gravity Effects 0.000 description 4
- 238000013459 approach Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000002679 ablation Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 238000007665 sagging Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/14—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
- B23K26/1435—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor involving specially adapted flow control means
- B23K26/1438—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor involving specially adapted flow control means for directional control
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67092—Apparatus for mechanical treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/04—Automatically aligning, aiming or focusing the laser beam, e.g. using the back-scattered light
- B23K26/046—Automatically focusing the laser beam
- B23K26/048—Automatically focusing the laser beam by controlling the distance between laser head and workpiece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/0869—Devices involving movement of the laser head in at least one axial direction
- B23K26/0876—Devices involving movement of the laser head in at least one axial direction in at least two axial directions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/14—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/14—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
- B23K26/1435—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor involving specially adapted flow control means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K37/00—Auxiliary devices or processes, not specially adapted to a procedure covered by only one of the preceding main groups
- B23K37/02—Carriages for supporting the welding or cutting element
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
- B23Q1/00—Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
- B23Q1/25—Movable or adjustable work or tool supports
- B23Q1/26—Movable or adjustable work or tool supports characterised by constructional features relating to the co-operation of relatively movable members; Means for preventing relative movement of such members
- B23Q1/38—Movable or adjustable work or tool supports characterised by constructional features relating to the co-operation of relatively movable members; Means for preventing relative movement of such members using fluid bearings or fluid cushion supports
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Mechanical Engineering (AREA)
- Plasma & Fusion (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- High Energy & Nuclear Physics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Electromagnetism (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Laser Beam Processing (AREA)
Abstract
Description
図6Bは、2つの流入ダクト31Aと1つの流出ダクト31Bを有する装置を示している。正圧源(図示されていない)は流入ダクト31Aの側に供されてよく、かつ/あるいは、負圧源(図示されていない)は流入ダクト31Bの側に供されてよい。この実施形態では、流体がXY平面内のある方向で処理領域Pへ実質的に流入し、かつ、Z軸の正の方向(上方)に処理領域Pから実質的に流出するように、圧力勾配は供される。この実施形態では、2つの流入ダクト31Aは処理領域Pの対向する側に存在する一方で、流出ダクト31Bは流入ダクト31Aの高さよりも上に位置する。
Claims (10)
- レーザービームを用いて基板を処理するプロセスヘッドであって、
前記レーザービームを向ける少なくとも1つの光学素子を含む光学ユニット、
前記光学素子の光軸を取り囲むように配置される複数のベルヌーイ空気ベアリング、
を有し、
前記複数のベルヌーイ空気ベアリングの各々は、前記光学素子と前記基板との間の間隔を実質的に一定に維持するように、ベルヌーイの原理によって前記ベルヌーイ空気ベアリングと前記基板との間に引力を生じさせるために第1流体流を排出するように構成される、プロセスヘッド。 - 前記複数のベルヌーイ空気ベアリングの各々は、
平坦面、及び、
前記第1流体流が排出される実質的に中心のオリフィス、
を有する、
請求項1に記載のプロセスヘッド。 - 前記複数のベルヌーイ空気ベアリングの各々の前記平坦面が円形である、請求項2に記載のプロセスヘッド。
- 前記複数のベルヌーイ空気ベアリングの各々の前記平坦面が多角形又は正方形である、請求項2に記載のプロセスヘッド。
- 前記オリフィスが、前記平坦面に対して垂直な方向において前記ベルヌーイ空気ベアリング及び前記平坦面の中心から前記流体流を排出するように配置される、請求項2乃至4のいずれか一項に記載のプロセスヘッド。
- 3つ、4つ、又はそれ以上の空気ベアリングを有する請求項1乃至5のいずれか一項に記載のプロセスヘッド。
- 前記基板が前記レーザービームによって処理されているときに前記処理が行われ得る、前記光軸を取り囲み、かつ、前記基板によって境界が定められる処理領域、及び、
前記処理領域内の環境を制御するために前記処理領域を流れる第2流体流を供するように構成される環境制御ユニット、
をさらに有する請求項1乃至6のいずれか一項に記載のプロセスヘッド。 - 前記環境制御ユニットは、前記処理の結果生じるデブリを前記処理領域から除去するように構成される、請求項7に記載のプロセスヘッド。
- レーザービームを用いて基板を処理する装置であって、
前記基板を該基板の第1位置で支持する支持部材、及び、
前記第1位置とは異なる第2位置で前記基板を支持するように構成される請求項1に記載のプロセスヘッド、
を有する装置。 - 請求項1に記載のベルヌーイプロセスヘッドを用いた引力によって前記基板の第1部分を支持する段階を有する、レーザー処理のために基板を支持する方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1417261.3 | 2014-09-30 | ||
GB1417261.3A GB2530982B (en) | 2014-09-30 | 2014-09-30 | Bernoulli process head |
PCT/GB2015/052667 WO2016051132A1 (en) | 2014-09-30 | 2015-09-15 | Bernoulli process head |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2017534461A true JP2017534461A (ja) | 2017-11-24 |
JP6701183B2 JP6701183B2 (ja) | 2020-05-27 |
Family
ID=51901373
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2017517271A Expired - Fee Related JP6701183B2 (ja) | 2014-09-30 | 2015-09-15 | ベルヌーイプロセスヘッド |
Country Status (8)
Country | Link |
---|---|
US (1) | US20170216970A1 (ja) |
EP (1) | EP3201943A1 (ja) |
JP (1) | JP6701183B2 (ja) |
KR (1) | KR20170067778A (ja) |
CN (1) | CN107078078A (ja) |
GB (1) | GB2530982B (ja) |
TW (1) | TW201622864A (ja) |
WO (1) | WO2016051132A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11839933B2 (en) | 2020-02-27 | 2023-12-12 | Honda Motor Co., Ltd. | Laser processing apparatus |
US11858056B2 (en) | 2020-02-27 | 2024-01-02 | Honda Motor Co., Ltd. | Laser processing apparatus |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4550241A (en) * | 1982-06-14 | 1985-10-29 | W. A. Whitney Corp. | Metal melting tool with improved stand-off means |
JPS6356391A (ja) * | 1986-08-25 | 1988-03-10 | Mitsubishi Electric Corp | レ−ザ加工用非接触倣い装置 |
US5834731A (en) * | 1997-06-04 | 1998-11-10 | Hmt Technology Corporation | Laser texturing apparatus with bernoulli holder |
US6806544B2 (en) * | 2002-11-05 | 2004-10-19 | New Wave Research | Method and apparatus for cutting devices from conductive substrates secured during cutting by vacuum pressure |
GB2414954B (en) * | 2004-06-11 | 2008-02-06 | Exitech Ltd | Process and apparatus for ablation |
GB0427104D0 (en) * | 2004-12-10 | 2005-01-12 | Exitech Ltd | Positioning device |
CN101189502A (zh) * | 2005-06-06 | 2008-05-28 | 粒子监测系统有限公司 | 具有改进的图像传感器阵列的粒子计数器 |
US8104752B2 (en) * | 2006-03-20 | 2012-01-31 | Boaz Eidelberg | Integrated large XY rotary positioning table with virtual center of rotation |
TW200950914A (en) * | 2008-06-06 | 2009-12-16 | Contrel Technology Co Ltd | Air-floating-type laser repairing device |
KR20120108324A (ko) * | 2011-03-23 | 2012-10-05 | 한국기초과학지원연구원 | 중성 입자빔을 이용한 발광 소자 제조 방법 및 그 장치 |
JP2013052400A (ja) * | 2011-09-01 | 2013-03-21 | Honda Motor Co Ltd | レーザ加工方法 |
WO2013069155A1 (ja) * | 2011-11-11 | 2013-05-16 | 日本車輌製造株式会社 | レーザ加工装置の加工ヘッド |
US20130156530A1 (en) * | 2011-12-14 | 2013-06-20 | Intermolecular, Inc. | Method and apparatus for reducing contamination of substrate |
EP2950329B1 (en) * | 2012-11-30 | 2022-01-05 | Nikon Corporation | Carrier system, exposure apparatus, and device manufacturing method |
-
2014
- 2014-09-30 GB GB1417261.3A patent/GB2530982B/en active Active
-
2015
- 2015-09-15 KR KR1020177010075A patent/KR20170067778A/ko unknown
- 2015-09-15 CN CN201580052930.4A patent/CN107078078A/zh active Pending
- 2015-09-15 US US15/515,104 patent/US20170216970A1/en not_active Abandoned
- 2015-09-15 EP EP15770592.2A patent/EP3201943A1/en not_active Withdrawn
- 2015-09-15 WO PCT/GB2015/052667 patent/WO2016051132A1/en active Application Filing
- 2015-09-15 JP JP2017517271A patent/JP6701183B2/ja not_active Expired - Fee Related
- 2015-09-30 TW TW104132259A patent/TW201622864A/zh unknown
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11839933B2 (en) | 2020-02-27 | 2023-12-12 | Honda Motor Co., Ltd. | Laser processing apparatus |
JP7402081B2 (ja) | 2020-02-27 | 2023-12-20 | 本田技研工業株式会社 | レーザ加工装置 |
US11858056B2 (en) | 2020-02-27 | 2024-01-02 | Honda Motor Co., Ltd. | Laser processing apparatus |
Also Published As
Publication number | Publication date |
---|---|
CN107078078A (zh) | 2017-08-18 |
GB2530982A (en) | 2016-04-13 |
JP6701183B2 (ja) | 2020-05-27 |
GB2530982B (en) | 2018-10-24 |
TW201622864A (zh) | 2016-07-01 |
US20170216970A1 (en) | 2017-08-03 |
KR20170067778A (ko) | 2017-06-16 |
GB201417261D0 (en) | 2014-11-12 |
WO2016051132A1 (en) | 2016-04-07 |
EP3201943A1 (en) | 2017-08-09 |
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