JP2017522447A5 - - Google Patents

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Publication number
JP2017522447A5
JP2017522447A5 JP2016565413A JP2016565413A JP2017522447A5 JP 2017522447 A5 JP2017522447 A5 JP 2017522447A5 JP 2016565413 A JP2016565413 A JP 2016565413A JP 2016565413 A JP2016565413 A JP 2016565413A JP 2017522447 A5 JP2017522447 A5 JP 2017522447A5
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JP
Japan
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gas
mixing chamber
cvd
gas flow
flow
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JP2016565413A
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English (en)
Japanese (ja)
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JP6796491B2 (ja
JP2017522447A (ja
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Priority claimed from DE102014106523.9A external-priority patent/DE102014106523A1/de
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JP2016565413A 2014-05-09 2015-05-07 Ｃｖｄ又はｐｖｄコーティング装置にプロセスガス混合物を供給するための装置及び方法 Active JP6796491B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102014106523.9A DE102014106523A1 (de) 2014-05-09 2014-05-09 Vorrichtung und Verfahren zum Versorgen einer CVD- oder PVD-Beschichtungseinrichtung mit einem Prozessgasgemisch
DE102014106523.9 2014-05-09
PCT/EP2015/060017 WO2015169882A1 (de) 2014-05-09 2015-05-07 Vorrichtung und verfahren zum versorgen einer cvd- oder pvd-beschichtungseinrichtung mit einem prozessgasgemisch

Publications (3)

Publication Number Publication Date
JP2017522447A JP2017522447A (ja) 2017-08-10
JP2017522447A5 true JP2017522447A5 (enExample) 2018-06-14
JP6796491B2 JP6796491B2 (ja) 2020-12-09

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JP2016565413A Active JP6796491B2 (ja) 2014-05-09 2015-05-07 Ｃｖｄ又はｐｖｄコーティング装置にプロセスガス混合物を供給するための装置及び方法

Country Status (6)

Country Link
JP (1) JP6796491B2 (enExample)
KR (1) KR102413577B1 (enExample)
CN (1) CN106457168A (enExample)
DE (1) DE102014106523A1 (enExample)
TW (1) TWI694168B (enExample)
WO (1) WO2015169882A1 (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2020020532A (ja) * 2018-08-01 2020-02-06 三菱電機株式会社 温度均一化装置、構造物およびパラボラアンテナ装置
CN110237734A (zh) * 2019-06-10 2019-09-17 中国石油大学(北京) 气体混合器及废气处理装置
US11772058B2 (en) 2019-10-18 2023-10-03 Taiwan Semiconductor Manufacturing Company Limited Gas mixing system for semiconductor fabrication
DE102019129176A1 (de) * 2019-10-29 2021-04-29 Apeva Se Verfahren und Vorrichtung zum Abscheiden organischer Schichten
CN110773061B (zh) * 2019-11-05 2021-09-21 浙江工业职业技术学院 一种搅拌装置
CN110917914B (zh) * 2019-12-19 2022-09-16 北京北方华创微电子装备有限公司 气体混合装置及半导体加工设备
DE102020112568A1 (de) 2020-02-14 2021-08-19 AIXTRON Ltd. Gaseinlassorgan für einen CVD-Reaktor
CN111744340A (zh) * 2020-07-02 2020-10-09 天津市英格环保科技有限公司 一种在低温环境下脱硫脱硝的方法
CN111804453B (zh) * 2020-07-21 2021-10-12 宁波诺歌休闲用品有限公司 一种用于铝合金型材的表面喷涂机中的喷涂机构
KR102635385B1 (ko) * 2020-11-23 2024-02-14 세메스 주식회사 기판 처리 장치
CN112973483A (zh) * 2021-03-29 2021-06-18 深圳市科曼医疗设备有限公司 一种气体混合装置
CN113430502B (zh) * 2021-06-18 2022-07-22 北京北方华创微电子装备有限公司 半导体工艺设备及其混合进气装置
CN113813858B (zh) * 2021-11-10 2023-01-31 西安国际医学中心有限公司 一种治疗癌症疼痛膏药制作的混料装置
CN116949392A (zh) * 2022-04-18 2023-10-27 中微半导体设备(上海)股份有限公司 一种气体混合器、气体喷淋装置及使用方法
KR102831131B1 (ko) * 2022-05-18 2025-07-04 한화모멘텀 주식회사 기판 처리 장치
CN114768578B (zh) * 2022-05-20 2023-08-18 北京北方华创微电子装备有限公司 混气装置及半导体工艺设备
KR102828639B1 (ko) * 2022-10-31 2025-07-02 주식회사 에스지에스코리아 기판 처리 장치의 가스 공급 기구 및 이를 구비한 기판 처리 장치
WO2025029735A1 (en) * 2023-08-01 2025-02-06 Lam Research Corporation Processing tool showerhead with integrated static mixer
US20250277307A1 (en) * 2024-03-01 2025-09-04 Applied Materials, Inc. 3d printed integrated gas mixer
CN119132927B (zh) * 2024-11-11 2025-03-14 无锡尚积半导体科技有限公司 一种晶圆表面预清洁的装置及方法

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4408893A (en) * 1982-04-28 1983-10-11 Luwa A.G. Motionless mixing device
JPS5949829A (ja) * 1982-09-14 1984-03-22 Matsushita Electric Ind Co Ltd 流体混合器およびこれを用いた薄膜装置
US4850705A (en) * 1987-11-18 1989-07-25 Horner Terry A Motionless mixers and baffles
JP3609329B2 (ja) * 1992-09-07 2005-01-12 三菱電機株式会社 窒化膜形成方法
AU2339497A (en) 1996-03-18 1997-10-10 Theodore Yi-Tze Cheng Gas swirling device for internal combustion engine
JP3360539B2 (ja) * 1996-07-12 2002-12-24 信越半導体株式会社 ガス供給装置及び気相成長用設備
US6068703A (en) * 1997-07-11 2000-05-30 Applied Materials, Inc. Gas mixing apparatus and method
JPH11293465A (ja) * 1998-04-15 1999-10-26 Ebara Corp Ｃｖｄ装置
US6495233B1 (en) * 1999-07-09 2002-12-17 Applied Materials, Inc. Apparatus for distributing gases in a chemical vapor deposition system
ATE249532T1 (de) 2000-02-04 2003-09-15 Aixtron Ag Vorrichtung und verfahren zum abscheiden einer oder mehrerer schichten auf ein substrat
US20030019428A1 (en) 2001-04-28 2003-01-30 Applied Materials, Inc. Chemical vapor deposition chamber
US6601986B2 (en) * 2001-08-29 2003-08-05 Taiwan Semiconductor Manufacturing Co., Ltd Fluid mixing apparatus
JP2003142473A (ja) * 2001-10-31 2003-05-16 Tokyo Electron Ltd ガス供給装置及びガス供給方法、及び成膜装置及び成膜方法
EP1452626B9 (en) * 2001-12-03 2012-01-18 Ulvac, Inc. Mixer, and device and method for manufacturing thin film
US6758591B1 (en) * 2002-03-22 2004-07-06 Novellus Systems, Inc. Mixing of materials in an integrated circuit manufacturing equipment
WO2004073850A1 (en) 2003-02-14 2004-09-02 Tokyo Electron Limited Gas feeding apparatus
KR101309334B1 (ko) * 2004-08-02 2013-09-16 비코 인스트루먼츠 인코포레이티드 화학적 기상 증착 반응기용 멀티 가스 분배 인젝터
DE102005003984A1 (de) * 2005-01-28 2006-08-03 Aixtron Ag Gaseinlassorgan für einen CVD-Reaktor
GB0603917D0 (en) * 2006-02-28 2006-04-05 Stein Peter Gas retention vessel
CN201086001Y (zh) * 2007-08-22 2008-07-16 张国栋 静态混合器及其螺旋式混合元件
US8440259B2 (en) * 2007-09-05 2013-05-14 Intermolecular, Inc. Vapor based combinatorial processing
US20090120364A1 (en) 2007-11-09 2009-05-14 Applied Materials, Inc. Gas mixing swirl insert assembly
CN101371975B (zh) * 2008-09-26 2010-06-09 沈阳化工学院 多流道螺旋静态混合器
KR101810532B1 (ko) 2010-03-12 2017-12-19 어플라이드 머티어리얼스, 인코포레이티드 다중 인젝트를 이용하는 원자 층 증착 챔버
CN202052481U (zh) * 2010-04-30 2011-11-30 中国人民解放军总装备部后勤部防疫大队 肼类推进剂标准气体发生装置
JP2012030207A (ja) * 2010-08-03 2012-02-16 Soken Kogyo Kk 流体混合器、流体混合輸送路および流体混合方法
KR101829669B1 (ko) * 2011-01-04 2018-02-19 주식회사 원익아이피에스 박막 증착 방법 및 박막 증착 장치
US8485230B2 (en) * 2011-09-08 2013-07-16 Laor Consulting Llc Gas delivery system
US10232324B2 (en) * 2012-07-12 2019-03-19 Applied Materials, Inc. Gas mixing apparatus
CN102974257B (zh) * 2012-12-03 2014-09-17 山西新华化工有限责任公司 动活性检测混合器
DE102013113817A1 (de) * 2012-12-14 2014-06-18 Aixtron Se Gasmischvorrichtung
CN203484064U (zh) * 2013-08-14 2014-03-19 新密港华燃气有限公司 四种气体均匀混合装置

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