JP2017521229A5

JP2017521229A5 -

Info

Publication number: JP2017521229A5
Application number: JP2016563995A
Authority: JP
Filing date: 2015-04-24
Publication date: 2018-04-12

Claims

A treatment system for treating water in a running water system using plasma discharge and ozone,
A high voltage generator having a plurality of capacitors, resistors and spark gap electrodes incorporated in a Marx ladder circuit, a support structure for the spark gap electrodes, and a housing;
After being treated with an inlet configured to receive at least a portion of the water flowing through the water system as treated water, and plasma discharge and optionally with ozone, said portion of the water into the water system A reaction chamber having an outlet configured to be returnable and a reactor body;
A gas injection system disposed upstream of the inlet or within the reaction chamber for adding one or more gas bubbles to the water to be treated;
A high voltage electrode and a ground electrode configured to be at least partially disposed in the reaction chamber and configured to generate a plasma discharge in the water in the reactor body when the high voltage pulse is generated by the high voltage generator; ,
An electrode mount assembly disposed within the reaction chamber and configured to house a high voltage electrode and a ground electrode within the reactor body;
An optional conduit configured to allow ozone gas generated in the high voltage generator to be transferred from the housing to the gas injection system;
A treatment system configured to contact at least a portion of the high voltage electrode with water in the reactor body while a high voltage pulse is being sent from the high voltage generator .

The electrode mount assembly includes a first central hub configured to receive a high voltage electrode, a first outer rim configured to mate with an inner wall of the reaction chamber, and the first outer rim. A high voltage mounting base including a plurality of spokes extending outwardly from the central hub toward the
A second central hub configured to receive a ground electrode; a second outer rim configured to mate with an inner wall of the reaction chamber; the second hub and the second outer rim; ground mounting comprises a base and, a, according to claim 1 processing system including a main body which is substantially closed deployed during.

Substantially body closed ground electrode mounting base has a funnel shape or dome shape, according to claim 2 processing system.

The processing system of claim 2, wherein the high voltage mounting base and the ground mounting base are configured to hold the high voltage electrode at a fixed gap distance of about 1-10 mm from the ground electrode.

Ground electrode includes a generally cylindrical conductive tube, a plurality of holes opened in the side wall of the tube, the tube extends from the second hub towards the high voltage mounting base, according to claim 4 Processing system.

The high voltage electrode includes a rod at least partially disposed within the ground electrode tube and substantially concentric with the ground electrode tube, wherein the gap distance is a diameter between the outer surface of the rod and the inner surface of the ground electrode tube. 6. The processing system of claim 5 , wherein the processing system is a directional distance.

The processing system of claim 6 , wherein about 4-30 mm of the rod is deployed within the ground electrode tube.

The outer surface of the tube is coated with a dielectric barrier material, processing system of claim 5.

The support structure of the spark gap electrode is
A substantially rectangular upper support arm with an open center;
A substantially rectangular lower support arm with an open center,
One or more vertical support arms connecting the upper support arm to the lower support arm at a predetermined interval;
A plurality of spaced apart columnar body pairs, each columnar body pair substantially extending from a first columnar body extending vertically from a first side of the lower support arm and the first side 2. The processing system of claim 1, further comprising: a pair of columnar bodies including a second columnar body extending vertically from a second side of the opposite lower support arm.

The processing system of claim 9 , wherein the upper support arm, the lower support arm and the vertical system form an open substantially U-shaped frame.

The processing system of claim 9 , wherein the dimensions of the support structure are about 2 inches wide x 2 inches high to 3 inches wide x 3 inches high.

The support structure further includes a plurality of electrode mounts, and each mount extends inwardly from each of the first columnar body and the second columnar body of the columnar body pair formed separately from each other,
Each electrode mount is attached to one of the spark gap electrodes, forming a plurality of electrode pairs between each spaced column,
The processing system of claim 9 , wherein the gap distance between the spark gap electrodes in each electrode pair is about 15 mm to 40 mm.

The processing system of claim 12 , wherein the spark gap electrode is configured to move laterally along the electrode mount to selectively adjust the gap distance.

The electrode mount includes a threaded portion configured to threadably engage a screw on the spark gap electrode, wherein the spark gap electrode is rotated to achieve lateral movement along the electrode mount. 13 processing systems.

The processing system of claim 12 , wherein the electrode mount is configured to move laterally with respect to the column to selectively adjust the gap distance.

The processing system of claim 1, further comprising an oil bath in the housing.

The processing system of claim 16 , wherein the support structure comprises a lower support arm disposed below the spark gap electrode, the lower support arm being immersed in an oil bath.

The processing system of claim 16 , wherein the capacitor is at least partially immersed in an oil bath.

The processing system of claim 1, wherein a surface of the support structure is coated with oil.

The processing system of claim 1, further comprising a venturi or vacuum pump for drawing ozone produced in the high voltage generator into a conduit and delivering it to a gas injection system.

The processing system of claim 1, further comprising an air pump for delivering air through the high voltage generator.

A method for treating a stream of running water,
And a plurality of capacitors, resistors, and by using a Marx ladder circuit including a spark gap switch which is supported by the opening support structure, to generate a high voltage pulse and ozone,
A high voltage electrode is disposed in the vicinity of the ground electrode, and both the high voltage electrode and the ground electrode are at least partially disposed in the stream of flowing water, and the high voltage electrode is provided with a high voltage pulse. Supplying and
Generating a plasma discharge in water near the electrodes;
(A) at a pressure less than one atmosphere, the step of work moving Marx ladder circuit, in contact with the oil at least a portion of (b) a support structure, a step to reduce the metal deposit on the support structure, or ( c) supplying ozone to the next stream of water, performing at least one of the steps .

23. The method of claim 22 , further comprising the steps of periodically cleaning the support structure to remove oil and supplying fresh oil to contact at least a portion of the support structure.

23. The spark gap switch of claim 22 , wherein each spark gap switch includes a pair of electrodes separated by a gap distance, and the open support structure is configured to support a plurality of spark gap switches, the gap distance being between about 15 mm and 40 mm. Method.

23. The method of claim 22 , further comprising adding ozone or one or more other gas bubbles upstream of the flowing water stream or the region in which the plasma discharge occurs.

Measuring the conductivity of the flowing water stream and adjusting one or more operating parameters when the conductivity exceeds a predetermined threshold;
The one or more operating parameters are:
(1) moving the high voltage electrode and the ground electrode in a direction approaching each other;
(2) increasing the voltage of the high voltage pulse supplied to the high voltage electrode;
(3) increasing the speed of adding bubbles to the stream of running water, or
(4) in a reaction chamber having an inlet configured to receive at least a portion of water from a flowing water flow system for treatment with a plasma discharge and configured to return at least a portion of the water to the flowing water system after treatment. plasma is generated, the step of reducing the water flow of the pressure at the outlet of the reaction chamber,
26. The method of claim 25 , adjusted by one or more steps of:

25. The method of claim 24 , further comprising adjusting the voltage of the high voltage column by increasing or decreasing the gap distance.

The open support structure includes a frame, a plurality of pillars supported by the frame, and a plurality of electrode mounts supported by the pillars, each electrode mount supporting one of the spark gap electrodes. 28. The method of claim 27 .

Measuring the conductivity of the flowing water flow periodically, and, when the conductivity exceeds a predetermined threshold, further seen including the adjusting one or more operating parameters,
The one or more operating parameters are (1) moving the high voltage electrode and the ground electrode in a direction approaching each other; (2) increasing the voltage of the high voltage pulse supplied to the high voltage electrode; (3) increasing the rate of adding bubbles to the stream of flowing water, or (4) receiving at least a portion of water from a flowing water flow system for treatment with a plasma discharge, and after treatment, at least a portion of the water. A plasma is generated in a reaction chamber having an inlet configured to return the flowing water to the flowing water system and is adjusted by one or more of the steps of reducing the pressure of the flowing water at the outlet of the reaction chamber. 22 methods.

The treatment system for treating the water in the running water system is a circulating water system, wherein the conductivity level of the water in the circulating water system increases as the water circulates, and the gas injection system starts to supply, Alternatively, the treatment system of claim 1, wherein the treatment system is configured to increase the amount of gas supplied to the reactor body to generate a plasma discharge in the water when the conductivity level increases.

23. The method of claim 22, further comprising: the Marx ladder is housed in a housing and pumping or drawing air through the housing.

23. The method of claim 22, wherein the flowing water system is at least a portion of the water flowing through the cooling tower or boiler system.

Measuring the conductivity of the running water system;
24. The method of claim 23, further comprising initiating a step of adding bubbles or increasing the amount of bubbles when the conductivity exceeds a predetermined threshold.