CL2016002707A1 - System and method for the treatment of water systems - Google Patents

System and method for the treatment of water systems

Info

Publication number
CL2016002707A1
CL2016002707A1 CL2016002707A CL2016002707A CL2016002707A1 CL 2016002707 A1 CL2016002707 A1 CL 2016002707A1 CL 2016002707 A CL2016002707 A CL 2016002707A CL 2016002707 A CL2016002707 A CL 2016002707A CL 2016002707 A1 CL2016002707 A1 CL 2016002707A1
Authority
CL
Chile
Prior art keywords
high voltage
plasma
water
treatment
discharge
Prior art date
Application number
CL2016002707A
Other languages
Spanish (es)
Inventor
Adrian J Denvir
David F Vela
Matthew C Holloway
William P Boesch
Jose E Evaro
Original Assignee
Nch Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US14/695,519 external-priority patent/US9932252B2/en
Application filed by Nch Corp filed Critical Nch Corp
Publication of CL2016002707A1 publication Critical patent/CL2016002707A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/72—Treatment of water, waste water, or sewage by oxidation
    • C02F1/78—Treatment of water, waste water, or sewage by oxidation with ozone
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/4608—Treatment of water, waste water, or sewage by electrochemical methods using electrical discharges
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/02—Non-contaminated water, e.g. for industrial water supply
    • C02F2103/023—Water in cooling circuits
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/46—Apparatus for electrochemical processes
    • C02F2201/461—Electrolysis apparatus
    • C02F2201/46105—Details relating to the electrolytic devices
    • C02F2201/4616—Power supply
    • C02F2201/46175—Electrical pulses
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2209/00—Controlling or monitoring parameters in water treatment
    • C02F2209/05—Conductivity or salinity

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Water Supply & Treatment (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Electrochemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Treatment Of Water By Oxidation Or Reduction (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Physical Water Treatments (AREA)
  • Plasma Technology (AREA)

Abstract

<p>SISTEMA Y METODO PARA EL TRATAMIENTO DE SISTEMAS DE AGUA CIRCULANTE CON UNA DESCARGA DE PLASMA PARA ELIMINAR O CONTROLAR EL CRECIMIENTO DE ESPECIES MICROBIOLOGICAS, LOS COMPONENTES DEL SISTEMA DE AGUA ESTAN PROTEGIDOS CONTRA DAÑOS CAUSADOS POR EXCESOS DE ENERGIA DEL TRATAMIENTO ELECTROHIDRAULICO, EL GAS OZONO GENERADO POR UN GENERADOR DE ALTO VOLTAJE QUE ALIMENTA LA DESCARGA DE PLASMA ES RECICLADO PARA EL TRATAMIENTO ADICIONAL DEL AGUA, SE PUEDE USAR UN SISTEMA DE INFUSION DE GAS PARA CREAR BURBUJAS FINAS DE OZONO, AIRE U OTROS GASES EN EL AGUA OBJETO DE TRATAMIENTO PARA APOYAR LA GENERACION DE PLASMA, PARTICULARMENTE CUANDO LA CONDUCTIVIDAD DEL AGUA ES ALTA, UN CONJUNTO DE INSTALACION DE ELECTRODOS MANTIENE SEPARADOS UN ELECTRODO DE ALTO VOLTAJE Y UN ELECTRODO DE TIERRA A UNA DISTANCIA FIJA PARA OPTIMIZAR LA GENERACION DE PLASMA, UNA ESTRUCTURA DE APOYO ABIERTA PARA EL CIRCUITO DEL GENERADOR DE ALTO VOLTAJE SEPARA FISICAMENTE LOS ELECTRODOS DE CHISPA Y CONTRARRESTA LOS DEPOSITOS DE METAL QUE PUDIERAN PERTURBAR LA DESCARGA DE UN PULSO DE ALTO VOLTAJE DESTINADO A CREAR EL PLASMA.</p><p> SYSTEM AND METHOD FOR THE TREATMENT OF CIRCULATING WATER SYSTEMS WITH A PLASMA DISCHARGE TO ELIMINATE OR CONTROL THE GROWTH OF MICROBIOLOGICAL SPECIES, THE COMPONENTS OF THE WATER SYSTEM ARE PROTECTED AGAINST DAMAGES CAUSED BY EXCESSES OF THE ENERGY OF THE GATE OZONE GENERATED BY A HIGH VOLTAGE GENERATOR THAT FEEDS THE PLASMA DISCHARGE IS RECYCLED FOR ADDITIONAL WATER TREATMENT, A GAS INFUSION SYSTEM CAN BE USED TO CREATE FINE BUBBLES OF OZONE, AIR OR OTHER GASES IN THE WATER TREATMENT OBJECT SUPPORT THE PLASMA GENERATION, PARTICULARLY WHEN THE WATER CONDUCTIVITY IS HIGH, AN ELECTRODE INSTALLATION ASSEMBLY KEEPS A HIGH VOLTAGE ELECTRODE SEPARATED AND A GROUND ELECTRODE AT A FIXED DISTANCE TO OPTIMIZE THE PLASTER OPENING GENERATION. THE HIGH VOLTAGE GENERATOR CIRCUIT PHYSICALLY SEPARATES THE SPARK ELECTRODES PHYSICALLY AND COUNTERS DEPOSITS D AND METAL THAT MAY DISTURB THE DISCHARGE OF A HIGH VOLTAGE PULSE INTENDED TO CREATE THE PLASMA. </p>

CL2016002707A 2014-04-24 2016-10-24 System and method for the treatment of water systems CL2016002707A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201461983678P 2014-04-24 2014-04-24
US201461983685P 2014-04-24 2014-04-24
US14/695,519 US9932252B2 (en) 2013-05-01 2015-04-24 System and method for treating water systems with high voltage discharge and ozone

Publications (1)

Publication Number Publication Date
CL2016002707A1 true CL2016002707A1 (en) 2017-01-20

Family

ID=54333278

Family Applications (1)

Application Number Title Priority Date Filing Date
CL2016002707A CL2016002707A1 (en) 2014-04-24 2016-10-24 System and method for the treatment of water systems

Country Status (15)

Country Link
JP (1) JP2017521229A (en)
KR (1) KR102109641B1 (en)
AU (1) AU2015249391B2 (en)
BR (1) BR112016023566A2 (en)
CA (1) CA2942402C (en)
CL (1) CL2016002707A1 (en)
CR (1) CR20160474A (en)
EA (1) EA201692138A1 (en)
IL (1) IL247680B (en)
MX (1) MX366516B (en)
MY (1) MY191061A (en)
PE (1) PE20161512A1 (en)
PH (1) PH12016501746B1 (en)
SG (2) SG11201607477TA (en)
WO (1) WO2015164760A1 (en)

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WO2013088291A1 (en) 2011-12-15 2013-06-20 Ramot At Tel-Aviv University Ltd. Submerged arc removal of contaminants from liquids
RU2734221C2 (en) 2016-03-29 2020-10-13 3П Текнолоджи Корп. Apparatus and methods of separating hydrocarbons from solid particles using a shock wave generator
DE102017118652A1 (en) 2017-08-16 2019-02-21 Hochschule Für Angewandte Wissenschaft Und Kunst Hildesheim/Holzminden/Göttingen Plasma generator module and its use
CN114173907A (en) * 2019-03-11 2022-03-11 南加利福尼亚大学 Systems and methods for plasma-based remediation of SOx and NOx
CN112152592B (en) * 2020-09-23 2024-03-29 西安交通大学 High repetition frequency fast pulse generating circuit based on magnetic bead isolation
KR102564892B1 (en) * 2020-12-16 2023-08-11 주식회사 골든타임세이퍼 electric water purification apparatus
KR102347348B1 (en) * 2021-03-02 2022-01-06 재단법인 사천시친환경미생물발효연구재단 Biofilm removal system in water supply pipe
CN115093061B (en) * 2022-07-25 2023-04-07 安徽久吾天虹环保科技有限公司 Plasma sewage treatment system
CN115974221B (en) * 2022-12-28 2024-04-26 西安电子科技大学 Plasma sewage treatment device and method

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JPS57148335A (en) * 1981-03-10 1982-09-13 Matsushita Electric Ind Co Ltd Capacitor
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US6562386B2 (en) * 2001-05-07 2003-05-13 Regents Of The University Of Minnesota Method and apparatus for non-thermal pasteurization
US20040000475A1 (en) * 2002-06-27 2004-01-01 Cho Byong Kwon Plasma reactor having regions of active and passive electric field
CN101702901A (en) * 2007-04-10 2010-05-05 株式会社21世纪造船 Underwater plasma processing apparatus and system and method for processing ballast water of ship using the same
AU2008243862B2 (en) * 2007-04-26 2012-11-22 Resource Ballast Technologies (Proprietary) Limited Water treatment system
US8926914B2 (en) * 2009-09-02 2015-01-06 Korea Basic Science Institute Liquid medium plasma discharge generating apparatus
KR101214441B1 (en) * 2010-12-07 2012-12-21 한국전기연구원 Apparatus of spark discharge for water cleaning
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US8912460B2 (en) * 2011-05-23 2014-12-16 The Curators Of The University Of Missouri Dielectric loaded fluids for high voltage switching

Also Published As

Publication number Publication date
WO2015164760A8 (en) 2016-09-22
PH12016501746A1 (en) 2017-02-06
SG11201607477TA (en) 2016-11-29
CA2942402C (en) 2019-12-24
PE20161512A1 (en) 2017-01-18
IL247680B (en) 2018-12-31
AU2015249391B2 (en) 2018-07-12
AU2015249391A1 (en) 2016-09-08
BR112016023566A2 (en) 2017-08-15
CA2942402A1 (en) 2015-10-29
KR102109641B1 (en) 2020-05-29
JP2017521229A (en) 2017-08-03
MY191061A (en) 2022-05-30
WO2015164760A1 (en) 2015-10-29
MX2016012347A (en) 2016-12-02
SG10201902301QA (en) 2019-04-29
EA201692138A1 (en) 2017-03-31
MX366516B (en) 2019-07-08
PH12016501746B1 (en) 2017-02-06
CR20160474A (en) 2017-02-01
KR20160146922A (en) 2016-12-21

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