KR20160146922A - A system and method for treating water systems with high voltage discharge and ozone - Google Patents

Abstract

Systems and methods are disclosed for treating effluent systems with plasma discharges to remove microbiological species or to control their growth. The components of the water system are protected from being damaged by excessive energy from the electrohydraulic treatment. The ozone gas generated by the high voltage generator that powers the plasma discharge is recycled to further treat the water. The gas injection system can be used to produce fine bubbles of ozone, air, or other gases in the water being treated to aid in plasma generation, especially when the conductivity of the water is high. The electrode mounting assemblies maintain a high voltage electrode and a ground electrode at a fixed distance from each other to optimize plasma generation. The open support structure for the high voltage generator circuit physically isolates the spark gap electrodes and blocks metal deposits that can interfere with the discharge of high voltage pulses to create a plasma.

Description

FIELD OF THE INVENTION [0001] The present invention relates to a system and method for treating water systems having high voltage discharge and ozone,

Cross-references to related applications

This application claims priority from U.S. Provisional Serial Nos. 61 / 983,678 and 61 / 983,685, both filed on April 24, 2014, and U.S. Serial No. Serial No. 14 / 695,519.

The present invention relates to systems and methods for treating effluent systems using ozone byproducts from high voltage generation for enhanced treatment of water, using high voltage discharges to generate the plasma. The systems and methods of the present invention are particularly useful when processing cooling towers or other recirculating or closed-loop systems.

Artificial water systems are a significant component that are commonly found in most of the world's energy production facilities, industrial and manufacturing plants, hospitals, and other institutional complexes and buildings. These systems consume about 70 trillion gallons of water at a cost of $ 1.8 billion annually for both supply and sewage treatment costs alone. All of these artificial water systems require some form of treatment, either chemical or non-chemical, to control the build up of scale, biofilm and other corrosion byproducts on critical heat transfer surfaces that are required for efficient system operation.

For water systems with heat exchange, such as cooling towers and boilers, effective treatment to remove these contaminants and to prolong the amount of time before systems are re-contaminated can save a considerable amount of money . Effective and thorough treatment can save on labor and processing chemistry costs by reducing the frequency of periodic treatments or by reducing the amount of chemical required for regular maintenance and / or periodic treatments. This process can also save on energy costs through the operation of clean heat exchange surfaces. Fouling of heat exchange surfaces costs millions of dollars annually to the US industry and is directly related to an increase in energy consumption of nearly 3,000 trillion Btus (quads) per year.

To maximize water use and minimize waste, many of these systems use a series of chemical treatments to protect the system against scaling, biofilm formation, and corrosion. These chemical treatments allow water to be reused and recycled many times before it is needed to release water and replace it with fresh water. Increasing the duration that water can circulate significantly reduces the amount of water that is discharged to the sewage system and minimizes the amount of water required to replace the bleed off. However, many chemical treatment arrangements and methods can damage the components of the water system being treated because the chemicals used are highly corrosive. Environmental concerns for harsh chemical treatments, including a growing concern for the formation of toxic disinfection byproducts, such as trihalomethanes, haloacetonitriles, and halophenols, identified in the effluent discharged into the environment There is also this. Water treatment of 536 billion pounds per year released as a result of cooling tower treatments that could affect the bacterial components of the sewage treatment plants receiving the various species or discharges in or near the areas receiving the emissions It is presumed that there is a chemical agent.

In an attempt to minimize the environmental impact associated with some chemical treatments, many water treatment companies, and more importantly their customers, are considering using non-chemical based water treatment techniques to maintain the performance of their systems . There are currently about 30 non-chemical processing devices or water conditioning techniques commercially available for use in both commercial and residential water systems. These systems can be divided into three categories: (1) Indirect chemical producers using positive or safe chemical additives, such as air or salt, to produce biocides. These systems include ozone generators and electrochemical hypochlorite generators and mixed oxidant generators. (2) Direct chemical producers that generate active species from direct interaction in water. These devices use mechanical processes, such as hydrodynamic cavitation or sonar cavitation, to generate hydroxy radicals with localized regions of high temperatures and pressures in water. Other types of devices that fit this category are ultraviolet light systems. (3) Electrical and magnetic devices, including plasma generation, can be used for cell death through electroporation, or for induction of ionospheric and motion induced ionic cyclotron resonance effects within the cell wall, use. Among all of these techniques, electrical and magnetic devices are the most common; They are technologies with the least rigorous scientific backing. Direct and indirect chemical approaches have more scientific credibility; This greater understanding limits their potential applications and therefore they can not account for a larger share of market share.

Application of high voltage discharge and generating plasma in water is known in the prior art. For example, B.R. A paper published by Locke et al. (Ind Eng. Chem Res 2006, 45, 882-905) describes electrode configurations and structures formed during electrohydraulic discharge and non-thermal plasma in a water discharge process, pulsed arc versus pulsed corona, do. Although the paper deals with a number of basic issues related to the use of this technology for water treatment, it is important to minimize the effects of electromagnetic radiation on water treatment, particularly in water and the surrounding atmosphere, in industrial, commercial or residential environments Fail to deal with practical applications related to the demand for multiple grounding points.

In a more recent publication, Bruggeman et al disclose an extensive review of non-thermal plasmas in contact with and in liquids that outlines 14 different reactor configurations, including many electrode structures as outlined in his paper by Locke. (P. Brggeman, and C. Leys, J. Phys. D. Appl. Phys, 2009, 1-28). In most of these reactor types, the fluid treated by the plasma discharge is a flow-free bulk discharge system (such as a bubble corona discharge reactor, a discharge reactor with a submerged liquid jet, an electrolysis discharge reactor or a capillary needle discharge reactor system) There is also a description of a dielectric barrier discharge (DBD) reactor in which fluid and air streams are introduced on either side of the barrier in the bubble discharge reactor. Note that even when the bubbles are not in contact with the electrodes, the article is likely to generate plasma in the bubbles, and that the spark voltage of the system decreases with increasing bubble rate. There is no mention of the effect of bubble size on flame voltage. In fact, it has also been noted that when positioned along the surface of the insulator, the bubbles form molded and positioned streamers along the bubble surface, and the discharge always occurs at the triple junction between the electrode, the bubble wall and the insulator.

It is also known to use ozone gas to treat water. For example, in a paper by Gupta et al. (S. B. Gupta, IEEE Transactions on Plasma Science, 2008, 36, 40, 1612-163), the use of an improved oxidation process due to pulsing discharges in water is described. The process described by Gupta uses oxygen gas or ozone gas supplied to the discharge reactor from the secondary independent sources (and not from the high voltage generator). They also report that system power and performance are highly dependent on solution conductivity. For systems with high water conductivities, such as in cooling towers and closed loop applications, higher voltage discharges are required and this results in problems with increased electromagnetic radiation.

In a water system, especially in a water system where water chemistry (conductivity, chemical composition, dissolved solids, planktonic bacterial counts, pH, etc.) can change over time, a plasma is generated between the high voltage electrode and the ground electrode, - To generate hydraulic discharges, a high voltage power supply is required that can generate up to and above a potential difference of more than 200 kV between two electrodes. One known system for generating voltages sufficient to generate a plasma in water or to generate an electro-hydraulic discharge is the Marx generator or the Marx ladder. Max generator uses a circuit that generates a high voltage pulse by changing the set of capacitors in parallel and then using a spark gap trigger to discharge the capacitors in series suddenly. Typically, the components are supported by a frame in a housing containing pressurized gas. Many of these high voltage generators are designed with the maximum energy density as their ultimate goal and are thus designed using gases such as SF ₆ and increased pressure in the spark gap chamber to enable higher breakdown voltages. As a result of these high breakdown voltages, each time the spark gap is activated, there is some metallic loss because a portion of the spark gap electrode is vaporized. The vaporized metal may then settle on the components of the high voltage generator and may interfere with the timing of the spark gap discharge after some accumulation. This is not a problem for high voltage systems running for short time periods, such as for use with static water treatment operations; For systems designed to run for months to years at a time, such as for the processing of prospective systems, this is very problematic.

U.S. Patent Application Publication No. 2009/0297409 (the generation of flow discharge plasmas at atmospheric or higher pressures), U.S. Patent Application Publication No. 2006/0060464 (especially in aqueous media and formed in bubbles contained therein) The generation of plasma in fluids, which describes a number of electrode configurations, including a configuration for capturing bubbles and causing them to act as dielectric barriers to increase the voltage across the electrodes), U.S. Patent No. 6,558,638 (Using high voltage discharge to treat liquids, incorporating gas delivery means to generate bubbles in the discharge zone), and U.S. Patent Application Publication No. 2010/0219136 (which consumes only 120-150 watts Such as a pulsed plasma discharge to treat fluids such as water at a flow rate of 5 gpm, That, there are patents or published patent application as prior art to deal with the number of plasma generation for various purposes.

There are also a number of patents disclosing Marx generator designs. For example, U.S. Patent No. 3,505,533 discloses a Maxx generator combined with a Blumlein transmission line (voltage dual line). Marx's flame gaps are in a sealed housing filled with pressurized inert gas (CO2 and argon) and the entire device is immersed in oil. U.S. Patent No. 7,498,697 discloses a Maxx generator having a conductive plastic connection structure mounted on an insulating layer for mechanical retention. Conductive plastics will replace the bond and charge resistors and will have long term resistance to high voltages.

Known prior art discloses systems and methods for generating chemically active species, exhibiting physical effects, and generating high voltage discharges to generate plasma to control water chemistry. However, the known prior art does not impair other components of the water system, including the controls and monitors required for scale and corrosion control, blowdown, and water conservation measures, Or how to apply such a technique that uses plasma discharge to handle the flow of larger volumes in a residential setting. Additionally, the known prior art does not address the use of such techniques in recirculating water systems with varying conductivity over time. Finally, the known prior art does not disclose the capture and use of ozone generated by the Maxx generator as an additional water treatment.

The present invention is directed to processing systems and methods that use non-chemical techniques to treat effluent systems, such as cooling towers and closed-loop or recirculating water systems. Such processing systems and methods involve generating high frequency and high voltage discharges between two water immersed electrodes to be treated. (Ozone, hydrogen peroxide) and long-lasting oxidation chemistries (superoxides, hydroxyl radicals, and hydrogen radicals), each with a respective discharge between the electrodes, And UV radiation is also generated, along with sonic shock waves. These effects are well known in the art and have been used for periodic treatment of static water systems, but have not been used to effectively treat previously flowing or recirculating water systems. According to one preferred embodiment of the present invention, a processing system and method are provided for generating a high voltage to generate a plasma to process water in a flowing or recirculating water system. The processing system and method provide substantially continuous processing of water flowing through the reaction chamber that occurs repeatedly at predetermined time intervals over long periods of operation of the plasma without damaging the components of the water system .

According to one preferred embodiment, the processing system and method utilizes a plasma reaction chamber or reactor unit that allows long-term plasma or electro-hydraulic discharge to occur at varying levels of conductivity, temperature and dissolved solids. One preferred embodiment of the reactor unit according to the present invention comprises parts which allow water and optionally gases to be introduced and removed from the reactor body and allow electrical connections to be made with high voltage and ground electrodes, And includes a capped body. According to another preferred embodiment, the reactor unit comprises an electrode mount assembly disposed within the reactor unit. The electrode mount assembly preferably includes a reactor or plasma discharge zone and a configuration for reducing gas choke points and moving gas bubbles to the plasma discharge zone to assist in generating plasma as the conductivity of water increases.

According to another preferred embodiment of the treatment system and method of the present invention, the ozone gas produced as a by-product of high voltage generation is captured and used to enhance the water treatment. To maximize the reaction area for high voltage discharges in high conductivity discharges found in flowing and re-circulating water systems, power supplies with the ability to generate more than 200 kV are preferred. The by-product in the operation of these power supplies may be the generation of ozone gas to be removed or it may damage the components of the high voltage generating system such as the supporting structure. In this embodiment, the ozone is introduced into the water to be captured and treated in order to enhance the water treatment, preferably in a plasma reaction chamber.

According to another preferred embodiment, the gas injection system is provided for introducing ozone byproducts or other gases, such as air or reactive gases, into the treated water to further enhance the treatment. These gases are preferably added to the water before entering the reaction chamber where plasma generation takes place or are generated in situ in the reaction chamber. Preferred embodiments of the gas injection system include microbubbles, Venturi inputs or venturi injectors, hydrodynamic cavitation systems, sonic processing probes, or a combination thereof. The gas injection system preferably introduces a fine dispersion of the bubbles into the water to be treated, which further aids in generating plasma since the dielectric breakdown strength of the air / gas is less than that of water. As the plasma breakdown is initiated in air or gas molecules, ionized electrons from air or gas molecules will then carry over and begin electron ionization in water molecules.

According to another preferred embodiment of the processing system and method according to the present invention, a continuous use high voltage generator is provided. A preferred high voltage generator has a Max generator or Marx ladder configuration. A known problem with the prior art Marx generators is that the metal from the spark gap electrodes is deposited on the sides of the walls of the Marx ladder closure support structure and other components of the high voltage generator system that interfere with the timing of the spark gap discharge , Which will prevent or hinder the formation of plasma. A preferred embodiment of the Maxx generator support structure according to the present invention comprises an open frame of increased height and width to increase the distance between the spark gap electrodes. With increased spacing between the spark gap electrodes, the metal deposits have a narrower support enclosure and do not bridge the gap as quickly. According to another preferred embodiment of the Max generator support structure, the lower connection portion of the frame is submerged in the furnace to electrically isolate it from the capacitor bank. Another preferred embodiment provides a support that is coated with mineral oil to prevent or inhibit metal deposits from being formed on the surfaces of the support structure surface and to allow for easy removal of any deposits that form on the surfaces. Structure. According to another preferred embodiment, the support structure is made of internal ozone materials, since it is known that ozone weakens some materials that can cause mechanical failure of the support structure. According to another preferred embodiment, the housing or the cover is located above the Maxx generator support structure to capture ozone for use in enhanced water treatment and to facilitate operation of the Maxx generator at reduced or negative pressures .

According to another preferred embodiment of the present invention, a system and method for treating water comprises one or more control systems connected to one or more components. According to a preferred embodiment, the control system controls the time of the high voltage discharge pulsed to occur at specific time increments or intervals to prevent overheating of the water, wiring, or other significant power supply components of the processing system and the water system It adjusts. According to another embodiment, the control system includes a feedback loop for recording water conductivity, the water increasing with cycles of recirculation as the water flows through the water system and the treatment system. As the conductivity increases, the controller increases the flow of air or other gases into the reaction chamber (such as through a gas injection system) to aid in plasma discharge.

According to another preferred embodiment of the present invention, various protection devices, such as a separate power supply, grounded metal components, and electromagnetic interference devices, are used to protect the components of the water system from the generated excess voltage Processing systems and / or water systems. According to another preferred embodiment, the excess energy (typically wasted) produced by the high voltage discharge is captured to further regulate and process the water. The current is allowed to flow through the wire loops connecting the water system piping to ground to generate a magnetic field in the water. These magnetic fields have been shown to have beneficial effects in water treatment, and the damaging effects of large amounts of electromagnetic radiation throughout the entire water system can be used for measuring conductivity, pH, biological activity, as well as for high- And on electronic control systems used to control other important system components. ≪ RTI ID = 0.0 > [0002] < / RTI > The use of high voltage discharges that do not have adequate shielding around multiple grounding points or other protective devices or high voltage components in water severely limits the applicability of existing prior art techniques.

The treatment systems and methods according to the present invention effectively remove biofilms and algae from the water in the water system with other deposits without requiring the use of harsh chemicals and without damaging the components of the water system. The processing systems and methods of the present invention are also useful in the present invention because significant sediments and algae are present in the present invention even when the water flowing through the water system is considered clean (based on previous chemical treatments, Is more effective than the processes of the prior art since it was observed to be discharged from the treated water system. When the treatments according to the invention are used, increased copper corrosion rates are also observed, indicating that the heat exchanger tubes cause biofilm growth and other deposits to be effectively removed resulting in increased heat exchange efficiency.

The apparatus of the present invention is further described and illustrated with reference to the following drawings.

1 is a schematic diagram of one preferred embodiment of a system according to the invention;
Figures 2a and 2b are graphs of electromagnetic fields measured in one experiment when the embodiment of the present invention is not applied.
3 is a graph showing electromagnetic fields measured in another experiment using the preferred embodiment of the present invention.
4 is a schematic diagram of another preferred embodiment of a system according to the invention;
5 is a schematic diagram of another preferred embodiment of a system according to the invention;
Figure 6 is a front view of a preferred embodiment of a reaction chamber and electrode mount assembly in accordance with the present invention;
Figure 7 is a front view of an alternative preferred embodiment of the electrode mount assembly and ground electrode of Figure 6;
8 is a bottom perspective view of a preferred embodiment of a high voltage mounting base according to the present invention;
Figure 9a is a bottom perspective view of another preferred embodiment of a high voltage mounting base in accordance with the present invention;
Figure 9b is a top plan view of the high voltage mounting base of Figure 9a.
10 is a top plan view of a preferred embodiment of a ground electrode mounting base according to the present invention;
Figure 11 is a bottom perspective view of the grounded electrode mounting base of Figure 9;
Figure 12 is a front view of the ground electrode mounting base of Figure 9;
Figure 13 is a bottom plan view of the ground electrode mounting base of Figure 9;
Figure 14 is a bottom perspective view of another preferred embodiment of a ground electrode mounting base according to the present invention;
15 is a perspective view of a preferred embodiment of a Marx ladder support structure in accordance with the present invention.
Figure 16 is a top plan view of the Marx ladder support structure of Figure 15;
Figure 17 is a side view of the Marx ladder support structure of Figure 15;
Figure 18 is another perspective view of the Marx ladder support structure of Figure 15;
19 is a cross-sectional, front view of a preferred embodiment of a high voltage generator system, showing an outer housing, a spark gap chamber, and a Marx ladder support structure.
Figure 20 is a top plan view of a portion of the high voltage generator system of Figure 19;
Figure 21 is a perspective view of a portion of the high voltage generator system of Figure 19;
Figure 22 is a circuit layout for the Marx ladder of Figure 15;

A preferred embodiment of the treatment system according to the present invention is depicted in Fig. The processing system 10 preferably includes a gas injection system 28, a plasma reaction chamber 36, a high voltage generator system 40, a power system 46, and various component protection devices. The processing system 10 is easily added to the existing water system 12. The water system 12 may be any residential, commercial or industrial water system, especially those used for cooling applications and recycled water systems, such as cooling towers. The water system 12 includes well known components not depicted in FIG. The water stream 14 from the treated water system 12 passes through various sensors 16 that are commonly used in monitoring water systems, such as pH sensors, temperature, and conductivity. Depending on the size of the water system 12 and the amount of water flowing through the water system 12, all the water in the system may pass through the processing system 10, or only a portion or side stream may pass through the processing system 10, Lt; / RTI > Most preferably, the treatment system 10 also includes a shut-down (not shown) system for bypassing the treatment system, such as when the treatment system is stopped for maintenance, without having to stop or reduce the flow of water through the water system. A valve or a diverter.

The water stream 18 preferably flows through the gas injection system 28, which injects the water stream 18 with fine bubbles of air and / or gas. Preferably, the gas injection system 28 comprises one or more micro-bubbling devices 20 wherein the air or gas 22, the reactive gas 26, and / or the ozone 30 are subjected to a plasma reaction Is introduced into the water stream as a micro-bubble upstream of the chamber 36. Reactive gases such as ozone, mono-atomic oxygen, quasi-stable monodentate-delta oxygen, gaseous hydrogen peroxide, chlorine gas, chlorine dioxide gas can also be used to achieve maximum removal of microbial species from the water system 12 have. The use and selection of these gases will depend on the water conditions within the water system 12. [ It is not required to add air, ozone, or other gas streams to the water stream 18, or to be added as micro-bubbles, but the micro-bubbles aid in plasma generation and ozone gas or reactive gas is also added to the water Lt; / RTI > If bubbles are added, the stream 24, which is injected with bubbles, feeds the plasma reaction chamber 36, otherwise the stream 18 feeds the plasma reaction chamber 36.

In another preferred embodiment, the gas injection system 28 includes a venturi for injecting the air / gas, reactive gas, and / or microbubble dispersion of ozone into the water stream 18 to produce the water stream 24. System. The Venturi input is located upstream of the high voltage reaction chamber 36 and introduces one or more micro-bubbles of these gases into the high voltage discharge region within the reaction chamber 36. In another preferred embodiment, the micro-bubbles are created by incorporating a hydrodynamic cavitation system that introduces a highly dispersed suspension of micro-bubbles produced by the hydrodynamic cavitation process into the reaction zone in the reaction chamber 36. In a fourth preferred embodiment, a Venturi system and a hydrodynamic cavitation system are used together. The combination has the advantage of creating an optimized kinetics and a rising environment for active species generation. In the fifth preferred embodiment, the high-voltage reaction chamber 36 can be combined with a plurality of sonic processing probes capable of generating micro-bubbles in-situ within the high-voltage discharge region within the chamber 36, And provides a rising reaction performance again. Finally, in a sixth preferred embodiment, one or more of these gases may be ventilated into the high-voltage reaction zone with the micro-bubbles generated by the sonic processing probes. The introduction of micro-bubbles using any of these systems or devices, or any combination of these systems and devices, whose components and applications are well known in the art, The intensity is further smaller than that of water, thus further helping to generate plasma. As the plasma breakdown is initiated in air or other gas molecules, ionized electrons from air or other gases will then carry over and initiate electron ionization in the water molecules.

According to another preferred embodiment, one or more components of the gas injection system 28 are connected to a controller (which may be a controller for the water system or a separate controller for the treatment system). The controller is operative to increase the flow of air or other gases to the reaction chamber 36 in response to increased measurements of conductivity in water (typically measured as part of the water system control function). The increased airflow helps to ensure that plasma discharge occurs even when the conductivity of the water is high.

The reaction chamber 36 preferably includes a sealed, watertight housing 35 surrounded by and shielded by an inner dielectric barrier layer 34a and an outer ground shield 34b. The dielectric barrier 34a is a non-conductive layer that prevents arcing to the ground layer 34b, which is a conductive outer layer associated with the ground. The dielectric barrier 34a and the grounding shield 34b reduce the electromagnetic interference emanating from the reaction chamber 36. [ If the reaction chamber 36 is not shielded, the sensitive electronic equipment can be damaged by the plasma generated in the chamber 36. As a result of the voltage generated in the high voltage generator system 40 being transmitted to the high voltage electrode in the chamber 36, a high voltage electrode and a ground electrode that generate a plasma discharge in the chamber 36 are placed in the reaction chamber 36 do. These components for generating a plasma discharge are well known to those skilled in the art. The shape and configuration of the high voltage and ground electrodes in the reaction chamber 36, the housing 35, and the reaction chamber 36 are not critical and any known shapes and configurations may be used, And the preferred embodiment of the electrode mount assembly and reaction chamber as discussed below is most preferably used. Another ground 48 is also placed in contact with the ground layer 34b surrounding the housing 35, which is required to generate a plasma discharge in the reaction chamber 36. The ground 48 may operate as a ground electrode or may be connected to a thicker rod or other conductor to act as a ground electrode. A highly insulated high voltage wire 38 connects the high voltage generator system 40 to the high voltage electrode in the reaction chamber 36. The wire 38 is preferably insulated with a high-strength dielectric to prevent arcing against other electronic devices, metal structures, or people / operators. The wire 38 may operate as a high voltage electrode or may be connected to a thicker rod or other conductor to act as an electrode. The treated water stream 50 exits the reaction chamber 36 and passes through the sump 54 (particularly if the water system 12 is a cooling tower) or other components of the water system 12 . The inlet and outlet connections for the water streams 24 and 50 into and out of the chamber 36 must be grounded.

The high voltage generator system 40 can generate high frequency, high voltage pulses in excess of 200 kV at each discharge stage. The high voltage generator system 40 preferably separates the Marx ladder 42 from the surrounding environment and is adapted to isolate the dielectric from internal components and to prevent arcing by nearby metallic structures, Includes a Max ladder or Maxx generator 42 disposed in a flame gap chamber 41 within an outer housing 43 (such as in the preferred embodiment shown in FIG. 19) that includes a barrier. The high voltage generator system 40 is preferably located in the reaction chamber 36 between the high voltage discharge electrode and the ground electrode so as to be effective when processing conductive materials similar to those shown in conventional cooling towers or closed loop systems A voltage output of 200 kV is possible for an electrode gap of approximately 5 mm. Gap distances of about 5 mm are preferred, although other gap distances may be used with modifications that will be understood by those skilled in the art. This requires an increase in the output voltage, where a larger gap distance may introduce additional issues, such as component failure in the high voltage generator system 40, and a smaller gap distance is required for the water to be exposed to the plasma discharge It is preferred because it reduces the amount.

In one preferred embodiment, the high voltage generator system 40 is a stage 1 low voltage component that takes a 110V output from a typical wall attachment port and generates a 40 kV DC signal (as shown in Figures 19 and 22, Driver circuit 39). This is accomplished by a zero volts switching circuit that pulses the input from the flyback transformer. The number of turns for the transformer may be increased or decreased to change the output voltage of the flyback transformer. The advantage of using a zero volt switching driver circuit is that it features a high noise margin, which is not sensitive to electromagnetic interference generated in pulsed power systems. Although digital or other circuits may also be used, they are more susceptible to external interference generated by the plasma reaction chamber 36 than a zero volt switching driver. To protect the electronic device from the high voltage output, it is configured as a separate shielded entity. The signal from the stage 1 low voltage component (driver circuit 39) is used to charge the capacitor bank in Maxx generator 42, with the capacitors assembled in parallel. When the capacitor bank reaches the discharge limit, it triggers a cascading discharge event between the spark gaps in the Marx ladder such that the terminal voltage is greater than 200 kV between the discharge and the ground electrode.

The air pumps 44 or other devices for pressurizing or spraying air are preferably integrated into the high voltage generator system 40 but are also external to the generator 40 and allow air flow to the generator 40 To the appropriate conduit. Air pumps 44 inject air through high voltage generator system 40 to quantify the electrodes of Maxl ladder 42, which helps to increase electrode life. Air pumps 44 push air across the electrodes and out of the flame gap chamber 41. The ozone gas 30 generated from the flame gap chamber 41 is withdrawn from the high voltage generator system 40 and is recycled back into the water system 18 to be preferably added or processed to provide additional water treatment. Ozone gas generated from the Marx ladder is typically considered waste, but it is advantageously used according to the present invention as a source of water treatment. Most preferably, the ozone gas 30 is ventilated to the water stream 18 at or near the inlet to the reaction chamber 36. This permits the introduction of ozone (and other constituents of air, such as nitrogen) into the water feeder and also allows the water stream 18 to flow with micro-micro-bubbles to form a feed stream 24. The use of ozone byproducts from a high voltage generator system 40 in combination with plasma discharge has been found to be particularly effective in reducing planktonic bacteria in synergistic and treated water.

The processing system 10 also includes a power system 46 and various protection devices to protect the components of the water system from the generated excess voltage. The power system 46 preferably includes an uninterruptible power supply or isolation transformer which reduces any transient voltage spikes from entering the power supply of the building in which the water system 12 is housed. It also includes a high voltage generator system 40 (not shown) from other electronic components of the building and water system 12, such as a separate non-interruptible power supply or sensors 16 with isolation transformer 60 . The grounded metal component 56 is preferably located in a water reservoir for the water system 12 (such as a sump 54 in the case of a cooling tower). The grounded metal component 56 is preferably a piece of metal or mesh having a large surface area, although other shapes and configurations may be used. These grounded components reduce or eliminate electromagnetic interference through water. Electromagnetic interference suppressors 58 preferably include any of the sensors (sensors 16) to be used to monitor water quality, such as electrical components, particularly conductivity, temperature, and pH, Or the like). Other grounding devices, such as 52, may be added to other reservoirs or piping in the water system 12 as needed or may connect the treatment system 10 and the water system 12. In one preferred embodiment, the grounding device 52 has a length of wire which is connected to the head of the screw at one end and which has another end connected to the ground and which is wrapped around the pipe several times, And screws inserted into the wall of the flowing pipe. Other grounding devices or configurations may also be used as will be understood by those skilled in the art. Typically, these grounding devices will be located on or near certain types of equipment, such as a corrater (corrosion monitoring system), a chemical controller, a flow controller, a conductive probe, Lt; RTI ID = 0.0 > 2 < / RTI > These grounding devices serve to protect the components of the water system 12 and also allow energy from multiple ground points to be captured and stored in a capacitor or inductor. The captured and stored energy can be used to generate low-level energy fields (electromagnetic or electrochemical) that provide additional benefits to the water treatment process. Electromagnetic fields have been used to prevent chemical scale formation and have been used to induce electroporation and ion cyclotron resonance which have been shown to have antibacterial properties. Electrochemical reactions can produce regions of localized high and low pH and can also induce electroporation. They can also generate low-level electromagnetic fields locally in the water system without storing energy. For example, with a wire device wrapped around a pipe in a water system as described above, each time a pulse (from a plasma) sinks to ground, the current will flow from the water flowing through the pipe at that location into a magnetic field Will flow through the wire loops around the pipe to generate.

The processing system 10 also preferably includes a controller or timer for activating the processing system 10 at periodic intervals. The controller or timer may include a power system 46 for charging the components of the gas injection system 28, such as a high voltage generator system 40, air pumps 44, The various components will be periodically turned on. Once a high voltage is discharged from the high voltage generator system 40 to the reaction chamber 36 and a plasma discharge is generated in the reactor housing 35 the components of the processing system are shut off until a time for the next cycle Will be. The activation / deactivation cycle repeats at periodic intervals, preferably at intervals of about 15 minutes, during a substantially continuous treatment cycle that lasts from weeks to months during normal operations of the water system and the treatment system. Periodic activation / deactivation reduces overall system heating and increases efficiency. As the system gets hotter, more energy will be dissipated in the Max generator 40, causing more charge losses and less energy available for plasma generation within the reactor housing 35. Allowing the system to cool down during periodic deactivation reduces charge losses and increases efficiency. Periodic activation / deactivation is also carried out in the reactor housing where ozone from the spark gap chamber is regularly removed (and preferably supplied to the reactor housing to enhance the water treatment) and an electrode gap of at least 5 mm between the high voltage electrode and the ground electrode RTI ID = 0.0 > pulsed < / RTI > In order to operate the system safely, it is preferred to provide power to the system via a switch box 45 featuring a ground fault circuit interrupt. Such an emergency stop system will trigger if the current flowing from the device does not match the current poured into the device.

The following are examples in which the processing system 10 is tested according to various embodiments of the present invention.

Example 1A. Direct Discharge to Unprotected System: In the first set of experiments, a pilot cooling tower was used. The components of this experimental system consistent with the systems depicted in FIG. 1 are labeled according to the reference numbers in FIG. The cooling tower (total volume 100 L) water system 12 was filled with water and the system was set to circulate. The water chemistry was monitored using an Advantage Control system as performed using two internal biological monitoring systems and a ChemTrak biological monitor. These systems are typically found in large commercial or industrial cooling tower operations or similar to those commonly found in it. To incorporate the high voltage generator system into the cooling tower, the sidestream flow (stream 18) is withdrawn from the heat exchanger rack via a mechanical ball valve and 12 ft. 0.75 inch diameter transparent flexible PVC tubing. These valves allow the system to change flow dynamics based on the particular composition of the water being treated. For example, changing the flow rate through the venturi changes how the gas bubbles are dispensed into the water, which can consequently change the shape of the plasma generated at the high voltage discharge electrode. Also, the amount and flow rate are important for the treatment of the entire system water for biological control using directional high-voltage discharges, since the successful treatment is also dependent on the amount of energy delivered as well as the treatment time. Because the bacteria are constantly replicating in a conventional system in large quantities of water, the total amount of system water is increased to increase the total treatment time (the total amount of time the column of water with biological components contacts the high voltage discharge) It is important to achieve a sufficiently high flow rate through the reaction chamber 36 to ensure that it is repeatedly processed or circulated through the high voltage discharge zone.

Using this setup on pilot cooling towers allows a maximum of 2 gpm sidestream flow. This tubing was connected to the plasma chamber 36 via a threaded polyethylene visible component. At the outlet of the reaction chamber, 5 feet of clear PVC tubing is used to drain water (stream 50) exiting the reaction chamber to the sump 54. None of the ground points (such as grounds 52 and 56) described with respect to the preferred embodiment are implemented. The reaction chamber 36 is connected to the high voltage generator system 40. The unit was activated and the pulsing spark discharge in water with a 1,500 μmhos conductivity was observed through a 1 cm electrode gap. As soon as the high voltage generator system 40 is activated, the flow control relays of the water system 12 start off and on to activate and shut off the power to the water system 12. The electronics in the advantage controller are overloaded and the system shuts down and the biological monitor output (located on the other side of the room from the high voltage generator system 40) is overloaded and shut down. Figures 2a and 2b show the electromagnetic fields measured in water with the plasma unit in this test embodiment, with and without water flow, with the electromagnetic fields traveling through water in both cases. It can be seen that when water flows (Figure 2a) there are high resonant electromagnetic pulses through the water circulating through the system. When water does not flow (Figure 2b), it can be seen that there is still a measurable electromagnetic field due to the high voltage discharge.

Example 1B. Direct discharge to protection system: 1A experience, however, has been repeated with multiple ground protection systems in place. The grounds were placed in the sump 54 and portions of the tubing throughout the system (using screw and wire wrapping as discussed above). Figure 3 shows that there is a significant reduction in the electromagnetic field in water. Using multiple grounding systems it is now possible to continue operating the high voltage discharge system for several hours without causing problems for the electronic control and monitoring equipment used as part of the water system 12.

Example 2. Bench trials for removal of microorganisms : Four bench-level studies were conducted to determine the efficiency of non-thermal plasma discharges in water to inactivate microorganisms. It is known that plasma discharges in water will all generate reactive oxygen species, UV radiation, and pressure field shock waves that can deactivate microorganisms. Plasma discharges can be achieved by increasing the electric field in the solution beyond its breakdown voltage. The breakdown voltage is dependent on the conductivity and dielectric properties of the solution. It has been observed that there is a relationship between log reduction of microbes and input energy in the system. It has also been documented that the input energy required to achieve one log reduction (known as the D-value) in E. coli can vary from 14 J / L to 366 J / L or more. For experiments with certain species of pseudomonas, 85 kJ / L has been reported to be the average input energy required to achieve one log reduction.

In the first set of experiments, the rod-to-cylinder electrode configuration was placed in a beaker containing 1,600 mL of water (800 mL of tap water and 800 mL of distilled water). Ozone generated from the Max generator (from the voltage multiplier of the non-thermal plasma) is vented to a secondary beaker (Beaker # 2) containing 1,600 mL of water (800 mL tap water and 800 mL distilled water). In these tests, E. coli was used because of its high sensitivity to inactivation by direct energy methods. For each of the beakers containing 1,600 ml of the described water, 2 ml of TSB stock solution with a known concentration of suspended E. coli was stored at 4.65 x 10 ⁶ cfu / ml (test # 1) and 4.5 x 10 ⁶ cfu / was used to inject each of the filled beakers with water for final E. coli concentration. For the plasma only beaker test (Beaker # 1), the cylinder electrode diameter was increased to 1 inch size from ¼ inch (which caused the arc discharge) to occur during pulsing corona discharge. The purpose of these tests was to determine whether arc discharge (which adds more energy to the system, is preferred) or pulsing corona causes most of the biological inactivation.

For ozone-only beakers, ozone was pushed through the maks generator chamber and bubbled into the beaker by the use of air stones. During the experiments, 25 mL samples were collected independently from each beaker at 0 min, 2 min, 4 min, 10 min, 20 min, and 30 min and biologically analyzed for cfu / mL determination. The results of the pulsed corona discharge plasma dedicated test are shown in Table 1 below under test # 1.

The second experiment combines the vented ozone and rod-to-cylinder electrode setup with a single beaker containing 1,600 mL of water (800 mL of tap water and 800 mL of distilled water) (test # 2). For this test, 2 mL of TSB stock solution with a known concentration of suspended E. coli was used to inject water-filled beakers for a final E. coli concentration of 6.10 × 10 ⁶ cfu / mL. The diameter of the cylinder electrode, which caused the pulsing flame (pulsed arc discharge) to develop in solution during discharge, was ¼ inch and the ozone generated by the MaxS generator was bubbled into the beaker below the electrode setup. During the experiment, 25 mL samples were collected at 0 min, 10 min, 30 min, 45 min and 60 min and biologically analyzed for cfu / mL determination. The results are shown in Table 1 below under test # 2.

The third experiment is characterized by a rod-to-cylinder electrode configuration (Test # 3) located in a beaker containing 1,600 mL of water (800 mL of tap water and 800 mL of distilled water). Ozone generated from the Max generator (from the voltage multiplier of the non-thermal plasma) is vented to a secondary beaker containing 1,600 mL of water (800 mL of tap water and 800 mL of distilled water). For this study, E. coli was exploited because of its high sensitivity to inactivation by directional energy methods. For each of the beakers containing 1,600 mL of the described water, 2 mL of the TSB stock solution with a known concentration of suspended E. coli was diluted to 3.05 × 10 ⁶ cfu / mL and 3.40 × 10 ⁶ cfu / mL final E was used to infuse water filled beakers for coli concentration. Similar to the second experiment, the cylinder electrode diameter was lowered so that the pulsing flame (pulsed arc discharge) was generated in solution during discharge. For ozone-only beakers, ozone was pushed through the maks generator chamber and bubbled into the beaker by the use of air stones. During the experiment, 25 mL samples were collected independently from each beaker at 0 min, 10 min, 15 min, 30 min and 45 min and biologically analyzed for cfu / mL determination. The results are shown in Table 1 below under test # 3.

In the fourth experiment, the vented ozone was combined with a rod-to-cylinder electrode setup with a single beaker containing 2,000 mL of water (1,000 mL of tap water and 1,000 mL of distilled water) (test # 4). For this test, 5 mL of TSB stock solution with a known concentration of suspending Pseudomonas putida was used to inject a water filled beaker for a final Pseudomonas putida concentration of 7.00 × 10 ⁷ cfu / mL. Unlike the first experiment, the cylinder electrode diameter is lowered so that the pulsing flame (pulsed arc discharge) is generated in solution during discharge and the ozone generated by the Maxs generator is bubbled into the beaker below the electrode set-up. During the experiment, 25 mL samples were collected at 0 min, 15 min, 30 min, 45 min, and 60 min and biologically analyzed for cfu / mL determination. The results are shown in Tables 1 and 2.

Referring to Figure 4, a field test was also performed using the preferred embodiment of the system and method of the present invention. The goal for such a field test was to install the plasma water treatment system 110 in the cooling tower water system 112 using oxidizing fungicides to control the microbial population in water. The cooling tower water system 112 has a total volume of 1,400 gallons and is located at a street level outside the administrative buildings of the provincial colleges. The control unit 115, which monitored the water flow and water conductivity, was used to control the chemical injection into the sump 154 and the water system blowdown. These units maintained water conductivity between 900 and 1500 μmhos. The plasma processing system 110 includes a high voltage generator 140 and a plasma reaction chamber 136. The high voltage generator includes a Max ladder or Maxx generator 142 disposed in a spark gap chamber 141 within an outer housing 143 that includes a dielectric barrier. The ozone gas stream 130 is withdrawn from the flame gap chamber 141 and injected into the influent stream 114 through the venturi 121. Although not initially used in this test, air 122 and / or reactive gas 126 may also be injected into the water stream through a micro-bubble or similar device 120. A tee, mixer, or similar connecting device 129 injects stream 124 (including ozone) with micro-bubbles of air and / or reactive gas from micro-bubbler 120 into reaction chamber 136 , ≪ / RTI > The reaction chamber 136 includes a sealed, watertight housing 135 surrounded by a dielectric barrier layer 134a and an outer ground shield 134b. Dielectric barrier 134a is a non-conductive layer that prevents arcing to ground layer 134b, which is a conductive outer layer associated with ground. A high voltage electrode in the reaction chamber 136 and a voltage generated in the high voltage generator 140 are transmitted through the wire 138 to the high voltage electrode in the chamber 136 to generate a plasma discharge in the chamber 136 A ground electrode is disposed. Wire 138 may operate as a high voltage electrode or may be connected to a thicker rod or other conductor to act as an electrode. Another ground 148 is also placed in contact with the ground layer 134b surrounding the housing 135. [ The ground 148 may operate as a ground electrode or may be connected to a thicker rod or other conductor to act as an electrode. In this field test, the reaction chamber 136 was about 4 inches in diameter. In this field test, the reaction chamber 136 was plumbed directly into the existing water lines of the water system 112. The reactor inlet 129 was connected to the waterline 114 from the high pressure side of the pump 113 to remove water from the cooling tower sump 154. The venturi 121 inserted into the line between the pump 113 and the reactor 136 was used to direct the ozone gas 130 generated by the Max ladder 142 to the treated water. The treated water (150) exiting the reaction chamber (136) was returned to the output side of the refrigerator where it circulated back to the cooling tower.

When the system 110 was initially installed, none of the recommended precautionary measures or protective measures mentioned with reference to Figure 1 and the processing system 10 remained intact. The system 110 was installed in close proximity to the water system master control system, which was not grounded, had no shielding of the controller unit, and had no ferrite beads around the sensor leads for EMI suppression. The high voltage generator 140 was plugged directly from the wall to the mains outlet.

To begin the process, the water stream 114 was introduced into the reaction chamber 136 and the high voltage system 140 was activated. Immediate electromagnetic feedback through the water causes the conductivity meter on the water system 112 to jump to 6000 쨉 mhos, pushing the water system 112 into an immediate blowdown mode causing water to dump into the drain. Without the system 10 of FIG. 1 and without more than one of the protection schemes mentioned, it would be impossible to effectively operate the high-voltage discharge processing system in the cooling water system.

The set-up of the systems 110 and 112 then has a water control unit 170 (used to control the various components of the water system 112) that is separated in the housing 172 and a conductivity sensor 116 by clamping the ferrite beads 158 around the wires. The housing 172 surrounds the water system control unit 170 during operation of the system 110, but includes a door or detachable cover that is openable so that the interior can be accessed for service. The housing 172 is preferably a metal box, but other shielding materials such as plastics, concrete, or metal plastic composites may also be used. The high voltage generator 140 has been moved from the controller to the opposite side of the room (approximately 12 feet away, and preferably at least 6 feet away) and the power supply 146 is driven from the UPS directly through the mains Respectively. The sump 154 in the cooling tower was ground 156 (156) as is the returned (treated) water level 150 grounded by 151. Alternatively, the ferrite beads 153 may also be wrapped around the treated water level 150. When the system 110 is activated, there is no negative effect on the control system 170 or the sensor 116, allowing the cooling tower system 112 to operate normally.

Using this setup, the water treatment system 110 was driven for six months without the addition of insecticide. During the process, the ozone gas 130 generated in the Max ladder 142 is introduced into the water and enters the reaction chamber 136. This produced a fine stream of bubbles at the surface of the high voltage electrode. When water has a low conductivity of about 900 [mu] mhos, this will be sufficient to generate a plasma discharge, but as conductivity increases with increasing number of cycles of concentration, it causes more plasma discharge in the reaction chamber It was not appropriate. As water conductivity increases, parasitic electrochemical reactions become a preferred mechanism for the discharge of electrons, and the ability to generate plasma is weakened. Additional air 122 is introduced into the reaction chamber, which provides a stronger air curtain between the ground electrode and the high voltage discharge electrode, allowing the plasma to be generated in water with a conductivity in excess of 1500 mu mhos. Once the conductivity reaches a predetermined threshold, typically about 1500 μmhos, the cooling tower or other water system enters the blowdown mode, dumping the high conductivity water to the drain and replacing it with fresh water (fresh water from normal supply, but Other water sources having lower conductivity levels may be used).

Referring to FIG. 5, another preferred embodiment of the plasma processing system 210 has been tested in a second field trial. The system 210 was installed to process a 2,200 gallon stainless steel / zinc plated cooling tower water system 212. During this installation, the high voltage generator 240 and the plasma reactor chamber 26 are shielded within the housing 260 and away from the water control unit 270 and sensors 216 of the water system 212, Respectively. The housing 260 is preferably at least six feet away from the water control unit 270 and the sensors 216. The housing 260 is preferably made of metal, but other materials such as plastic or metal-plastic composites may also be used. The housing 260 includes a door or a removable cover that surrounds the system 210 during operation, but is openable so that the interior can be accessed for service. It is not necessary to surround control unit 170 in housing (such as housing 172 used with system 110) when housing 260 is used, but such housing also provides additional protection of the control unit Lt; / RTI > The water 214 from the sump 254 has been circulated through the plasma reactor using a pump 213 located directly in the sump 254 to ground 256. The high voltage generator 240 was directly connected to the mains outlet as the power supply 246, but the socket was on its own circuit breaker circuit. With this set-up, the system 210 could continue to operate for six months without any electrical or EMI issues interfering with the operation of the water system 212 (where the cooling system was shut down during winter, Is believed to be able to continue to operate with this embodiment of the invention for a longer period of time if cooling is required).

A grounded piece of metal or mesh 56 having a large surface area located in the sump, electromagnetic interference suppressors 58, grounded wire wrapping pipe segments or ferrite beads 52 or 158 or 258, (Such as the protective housing 260 around the high voltage generator and the plasma reaction chamber), the water control unit, and the protection around the water control unit in which the high voltage supply and the reaction chamber are located at a sufficient distance from the sensors A separate power supply for the high voltage generator (its own breaker circuit or UPS or isolation transformer), and / or a separate power supply for the water control unit or sensors (separate UPS Or isolation transformer) may be used to protect the water system components from any interference or damage, This may be used in combination with any of the processing system according to the present invention to allow to continue to operate during an extended time period. Any combination of grounding devices may also be used to provide low-level energy fields (for example, for storing using capacitors or inductors) and for collecting excess energy generated by the processing system, Or < / RTI > electrochemistry).

The ability to control the pressure drop across the reactor housing in which a plasma discharge occurs is ensured, particularly if ozone, air or other gases are added to the inlet stream to compensate for the dielectric barrier of the high voltage discharge electrode It is important. Paschen's law is an equation describing the breakdown voltage required to initiate the discharge between two electrodes as a function of pressure and gap length (distance between the high voltage electrode and the ground electrode). At the onset of the plasma discharge, the first ionization energy of the electrons must be reached in order to free and free the electrons causing the chain reaction electron avalanche as the electrons freed upon impingement collide with the atoms when accelerated. The higher the pressure of the discharge medium is, the more collisions that occur as electrons travel from the discharge electrode to ground, which randomize the electron direction, which results in an electron deceleration which causes a failed discharge between the electrodes can do. Since water can be seen as a highly condensed gas, the pressure drop across the electrode is a major contributor to its ability to successfully generate electrohydraulic discharges in the reactor housing.

Additionally, as the flow rate through the reactor housing increases, bottleneck points can occur in certain areas of the flow through the reactor housing and these bottlenecks cause pressure increases that affect the pressure drop across the reactor housing . In order to successfully discharge the plasma in the reactor housing, it is desirable to minimize these potential bottlenecks. As such, the processing systems (such as system 10, 110, or 210) according to the present invention are configured such that the treated water stream on the outlet end of the reactor housing is configured to have the highest possible flow coefficient, desirable:

C _V = Flow coefficient or flow capacity rating of the valve. (amount of water in flow to gpm)

F = rate of flow (US gallons per minute)

SG = specific gravity of fluid (water = 1)

△ P = pressure drop across the body (psi).

There are a number of factors that can be manipulated individually or together and optimize the pressure drop across the body and the flow rate of fluid through the reactor. Lowering the flow rate is not preferable because it lowers the flow coefficient and the flow coefficient on the discharge end is preferably as high as possible. Lowering the flow rate also minimizes contact time and reduces efficiency, which is undesirable. Additionally, it is desirable to minimize the pressure drop across the reactor housing 135 to increase the flow coefficient. In experiments conducted using processing systems according to the present invention, it has been determined that minimizing the pressure on the discharge end of the reaction chamber helps to form the plasma by lowering the breakdown voltage. Lowering the breakdown voltage in high conductivity, such as water, which is frequently encountered when recirculating a water system, results in less parasitic current losses (V = iR) and therefore more energy is input into the water treated through the plasma Will be.

In addition to minimizing the pressure on the discharge end, the weakened plasma generation associated with the increased conductivity in the treated water also (1) moves the high voltage electrode and the ground electrode close to each other (2) increase the voltage between the ground and the high voltage electrode (but this has the disadvantage of possible component failure at the high voltage generator), or (3) Lt; RTI ID = 0.0 > barrier < / RTI > The treatment systems and methods according to the present invention are most preferably used to increase the gas phase dielectric barrier through the use of a gas injection system to add bubbles to the water being treated as the most beneficial way to assist in plasma generation in high conductivity water .

Referring to Figures 6 and 7, a preferred embodiment of the reaction chamber 136 and electrode mount assembly 80 is shown. The reaction chamber 136 is similar to that shown in FIG. 4 and can be used with the processing system 10, 110, or 210. The reaction chamber 136 is capped at both ends 137 and 139 so that water and gases are introduced and removed from the reactor housing 135 and electrical connections are made to the high voltage electrode 138 and the ground electrode 148 Watertight housing 135 having parts 129, 133 that allow it to pass therethrough. In this embodiment, a continuous stream of water 114 is pumped from the source in the treated water system to the reactor housing 135 and then to the top as treated water 150. Ozone gas 130 (preferably generated in high voltage power supply 140 (not shown in FIG. 6)) is supplied to venturi 121 or other type Of gas injector / diffuser. The water / ozone mixture 124 then enters an inlet port (not shown) that is optionally mixed with compressed air 122 or other gases (such as 120 can be bubbled through microbubbles) prior to entering the reactor housing 135 129). An electrode mount assembly 80 connected to the high voltage electrode 138 at one end and to the ground electrode 148 at the opposite end is disposed within the reactor housing 135. The potential difference between the high voltage electrode and the ground electrode is such that in the region referred to herein as a high voltage discharge region or region or a plasma discharge region or region (shown as 101 in FIG. 6), the high voltage base 82 and the ground base Thereby causing a plasma discharge in the water between the electrodes 92.

Referring to Figs. 6-14, an electrode mount assembly 80 is disposed within the reactor housing 135. Fig. The electrode mount assembly 80 preferably includes a high voltage base 82, a ground base 92, and a grounded electrode tube 147. The high voltage base 82 and the ground base 92 are configured to hold the high voltage electrode and the ground electrode at a fixed distance from each other and thus the electrode gap is about 1 to 10 mm and most preferably about 5 mm . This distance does not require an increase in the output voltage from the high voltage generator, while allowing a sufficient amount of water to be exposed to the plasma, particularly when the preferred ground electrode configuration is used, as discussed below. The high voltage base 82 preferably includes a central hub 88 and a plurality of spokes 86 extending radially outwardly from the hub 88 and terminating in an outer ring or rim 84. The wheel- . The hub 88 preferably has a slightly tapered or truncated conical configuration (as shown in Figure 8), but may also be substantially cylindrical. The opening 90 is disposed past the hub 88 and the high voltage wire 138 (or a thicker rod or conductive material connected to the wire 138) is aligned within the opening 90 to act as a high voltage electrode. Most preferably, the high voltage wire 138 has a dielectric coating on its entire length to minimize parasitic electrochemical reactions.

The spokes 86 are preferably angled with respect to the hub 88 and rim 84 (as shown in Figures 6 and 7), which minimizes the contact area of the hub with respect to the high voltage wire electrode Thereby increasing the charge density on the electrode by reducing conduction through the plastic material of the hub. The rim 84 preferably has a shape and dimensions configured to match the shape and size of the reactor housing 135 (or 35 or 235). The reactor housing is most preferably cylindrical so that the rim 84 is also preferably positioned such that the high voltage base 82 can be inserted into the reactor housing 135 and aligned with the inner wall of the housing 135. [ And has a diameter slightly smaller than the inner diameter of the housing 135. The open wheel-like configuration of the high voltage base 82 helps to remove any pressure bottleneck points that can retard plasma generation.

Another preferred embodiment of a high voltage base 182 for use with the electrode mounting assembly 80 is shown in Figures 9a and 9b. The high voltage base 182 preferably includes a central hub 188 and a plurality of spokes 186 extending radially outwardly from the hub 188 and terminating in a rim 184. The high voltage base 182 is similar to the base 182 except that the hub 188 in this embodiment is preferably substantially cylindrical and the spokes 186 are not angled relative to the hub 188 and the rim 184. [ (82). A substantially cylindrical hub provides greater precision at the gap distance between the high voltage wire / electrode and the ground electrode. Substantially cylindrical hub 188 may also be used with angled spokes similar to those of Figs.

7 and 10-13, the ground base 92 preferably includes a rim 94, a body 96 extending from the rim 94, and a collar 98 extending from the body 96, . The aperture 100 is disposed beyond the collar 98. The rim 94 preferably has a shape and dimensions configured to match the shape and size of the reactor housing 135 (or 35 or 235). The reactor housing is most preferably cylindrical so that the rim 94 also preferably includes a ground base 92 that can be inserted into the reactor housing 135 and is adapted to fit into the reactor housing Which is slightly smaller than the inner diameter of the inner tube 135. The body 96 preferably has a closed, truncated, conical or dome shape, which helps move any added gas bubbles toward the plasma discharge zone 101 and toward the high voltage electrode 138.

Another preferred embodiment of the ground base 192 is shown in Fig. The ground base 192 preferably includes a rim 194, a body 196 extending from the rim 194 and a collar 198 extending from the body 196 all of which are connected to a ground base 92 similar. The opening 200 is disposed beyond the collar 198. Unlike the ground base 92, the ground base 192 has an added wheel-like structure (similar to the high voltage base 182). The ground base 192 also includes a central hub 204, a plurality of spokes 202 extending radially outwardly from the hub 204 and terminated at the rim 194 and an opening 206 ).

The ground wire 148 is disposed past the opening 100 and is connected to the ground electrode tube 147. A tab with an aperture may be provided at the end of the ground electrode tube 147 to facilitate connection to the ground wire 148. Most preferably, the grounding electrode tube 147 (as shown in FIGS. 6 and 7) includes a substantially cylindrical body (or other configuration configured to be inserted in the collar 198) or a plurality Lt; RTI ID = 0.0 > 149 < / RTI > The ground electrode tube 147 may preferably be constructed of titanium, but other conductive materials, such as stainless steel or copper, may also be used. The openings 149 are preferably circular with a diameter between about 4 mm and 8 mm, although other shapes may also be used. The size of the openings 149 is large enough to allow excess gas to escape and avoid pressure bottlenecks within the plasma discharge zone 101. The openings 149 have the advantage of greater field enhancement around the edges of the openings, which creates unformed field lines that enhance the effect of the field. The openings 149 also have the advantage of allowing the plasma discharges to be visible (as bright light) when the reactor housing 135 is transparent or has a viewing window. The outer sidewall of the grounded electrode tube 147 preferably has a non-conductive (not shown) surface to reduce parasitic electrochemical reactions on the outer surface of the grounded electrode tube 147 and to maximize the potential for generating plasma in the plasma discharge zone 101. [ Such as ceramics or glass.

The ground electrode tube 147 is most preferably configured to fit within the collar 98 and into the hub 88 (as shown in Figure 7) for connecting the high voltage base 82 and the ground base 92 do. The ground electrode tube 147 may be releasably attached to the collar 98 and / or the hub 88, such as by screws. Alternatively, the ground electrode tube 147 may not extend to reach the hub 88 (as shown in FIG. 6). The high voltage base 80 and the ground base 92 are spaced by their relative positions within the reactor body 135 and the high voltage electrode 138 is positioned relative to the ground electrode tube 147 Or by other means, such as ribs or other protrusions within the reactor body 135 that are configured to coincide with the rims 94 and 84, or other structure extending from the ground electrode base to the high voltage base, Lt; / RTI > The lower end of the high voltage electrode 138 is disposed through the hub 88 to the ground electrode tube 147. The high voltage electrode 138 may extend to reach the ground electrode base 92 or substantially beyond the length of the ground electrode tube 147 (as shown in FIG. 6), but most preferably, The electrode 138 extends to the tube 147 at a short distance of only about 4 to 30 mm (as shown in Figure 7) to avoid the high voltage electrode from interfering with the flow of water through the reactor body 135 . The high voltage electrode 138 and the ground electrode tube 147 are preferably sized and configured to provide a gap between the two electrodes of about 1 to 10 mm and most preferably about 5 mm. 6 and 7, when the high-voltage electrode 138 is partially disposed in the turn-on electrode tube 147 and is substantially centrally located within it, And the inner wall of the ground electrode tube 147. [ The ground electrode tube 147 is most preferably 2 to 4 inches long. Having a relatively shorter electrode allows a greater charge concentration, which helps discharge.

The high voltage wire 138 and the ground wire 148 preferably comprise a solid metal rather than a braided wire. This facilitates connections because the solid wire is easier to seal at the end pieces 137, 139 or the ports 129, 133. Solid wiring also eliminates potential problems with water wicking from the reactor housing 135 to the inner wire core, which can be dangerous.

Any modifications to the electrode mounting assembly 80 and components of the assembly 80 can be made in any of the processing systems and methods in accordance with the present invention, including reactor housings 35, 135, and 235 Chamber / housing. The preferred electrode mount and ground electrode configurations, as shown in Figures 6 and 7, allow plasma to be generated under a series of hydrochemical conditions. For example, as the conductivity of water increases with cycles of re-circulation, the amount of air / gas / ozone that can be delivered to the plasma discharge zone 101 can be increased by simply changing the gas flow rate. The increased gas flow rate corresponds to an increase in the gaseous dielectric barrier to achieve a greater plasma discharge under high conductivity conditions or to increase the voltage between the ground and the high voltage electrode without the need to change the distance between the electrodes do.

A series of tests were performed with a gas injection system, a reaction chamber, and an electrode mount assembly similar to that shown in FIG. The water system used was a cooling tower located at a provincial college and the water had a conductivity range of 980 mmhos to 1900 mmhos. The treatment system continued to operate over a four month period. The discharge voltage was set at 240 kV and the electrode gap between the high voltage and the ground electrodes was 5 mm. The reactor housing was made of a transparent material, so the inside of the housing was visible. During operation, both the plasma discharge between the ground and the high voltage electrode, and the air bubbles that were pushed into the space between the ground and the high voltage electrode were observed. Once the conductivity increased beyond 1000 mmhos, the plasma discharge was not observed with the use of bubbles introduced through venturi alone; The plasma discharge was again observed if additional compressed air was introduced into the space between the ground and high voltage electrodes.

A preferred embodiment of a support structure 62 for a Max generator used in any high voltage generator according to the present invention, such as a high voltage generator system 40, 140, or 240, is shown in Figures 15-18 . The support structure 62 preferably includes an upper support arm 66T and a lower support arm 66B and one or more end support arms 66E extending between the lower support arm 66B and the upper support arm 66T. . The upper support arm 66T preferably forms a substantially rectangular shape with an open center portion. Similarly, the lower support arm 66B preferably forms a substantially rectangular shape with an open center portion. The vertical end support arms 66E generally connect the upper and lower support arms 66T and 66B at one end of the support structure 62 to form a U-shaped frame. The other end of the support structure 62 does not have any vertical connectors to engage the arms 66T and 66B, and is preferably substantially open. Attachment tabs 64 are preferably disposed at one end of the support structure 62 and extend outwardly from each of the top and bottom support arms 66T and 66B. The apertures 65 are disposed past the tabs 64. Taps 64 and apertures 65 may be formed on the bottom surface of spark gap chamber 41 or outer housing 43 or on the bottom surface of spark gap chamber 41 or outer housing 43 depending on the configuration of chamber 41 and housing 43. [ Or to secure the support structure 52 to the capacitor bank housing 77 disposed within the outer housing 43. [ The support structure 62 may also have a flame gap chamber 41 or an outer housing 43 and may be integrally formed from a single portion.

A plurality of paired posts 70A-71A, 70B-71B, and 70C-71C extend upwardly from each lower support arm 66B. The plurality of first posts 70A, 70B and 70C extend from the first side (front side) of the lower support arm 66B and the plurality of second posts 71A, 71B and 71C extend from the lower support And extends from the second (rear) side of the arm 66B. 20 and 21 (showing the Marx ladder support structure 62 on the capacitor bank housing 77, with connections between the two), and the circuit diagram of FIG. 22 (which may be connected to the support structure 62, Generators, or Marx ladders), a spark gap switch (S1, S2, etc.), including two spaced electrodes 76, is disposed between each pair of posts, S1 is between 70A and 71A, S2 is between 70B and 71B, and so on. An aperture 72 is disposed across each post, over which a spark gap electrode mount 73 is disposed. The spark gap electrode 76 is attached to the end of the spark gap electrode mount 73 disposed within the support structure 62. This forms a plurality of pairs of spark gap electrodes between each pair of posts (70A-71A, 70B-71B, etc.). The electrodes 76 and mounts 73 are preferably configured to allow the electrodes to laterally move along the mount to selectively adjust the gap distance between each pair of spark gap electrodes. Most preferably, the flamegap electrode mounts 73 include screws in which each electrode 76 is attached to the threaded engagement on the end of the mount 73 disposed within the Maxx ladder support structure 62. This preferred configuration allows the relative positions of each pair of electrodes 76 to be increased by increasing the distance between the lumped lumped elements 62 and the lumped lumped elements 62 in order to increase or decrease the spark gap distance by simply rotating the electrodes 76 along the length of the mount 73 To move closer to or farther from each other. Most preferably, the spark gap distance between each pair of electrodes 76 is about 15 to 40 mm. Alternatively, each spark gap electrode 76 may be secured to the end of each mount 73 within the structure 62 and the mounts 73 may be attached to the posts 70 , ≪ / RTI > 71). A combination of adjustable electrodes and adjustable mounts may also be used.

Most preferably, the Max ladder structure 62 is based on the capacitor bank housing 77. A plurality of capacitors and resistors coupled together in accordance with a well-known Marx ladder circuit are in the capacitor bank housing 77. The plurality of apertures are disposed past the upper end of the housing 77 or the removable cover to allow the wiring 75 to pass through to connect the capacitors to the flame gap switches. The end of each mount 73 disposed outside of the Max ladder structure 62 is connected to the capacitors in the capacitor bank housing 77 by the wiring 75 so that the capacitor C1 is connected to the post pair 70A -71A and the capacitor C2 is connected to the mounts 73 on the post pair 70B-71B. Most preferably, three to six pairs of posts are provided for structure 62, but additional pairs may be provided as required to generate sufficient voltage as will be appreciated by those skilled in the art. For example, there may be five pairs of posts for the circuit as shown in Fig. 22, one pair for each spark gap switch (S1 to S5). Variations in these arrangements can be made, as will be appreciated by those skilled in the art.

The dimensions of structure 62 are preferably about 2 inches wide by about 2 inches high and about 3 inches wide by 3 inches high, for a 14 inch length. As described herein, the width is substantially the dimension between the pair of posts 70-71 and the height is the height of the vertical support arms 66E in the direction from the lower support arm 66B toward the upper support arm 66T. And the length is a longer dimension of the support arms 66T, 66B in the direction from the vertical support arms 66E toward the taps 64. [ These dimensions are preferred for physically separating the spark gap electrodes to help prevent spark gaps from being bridged by metal deposits, which would hinder the generation of high voltage pulses in the Max ladder. Most preferably, the gap distance between the spark gaps 76 (G, as shown in Figure 20, the distance between pairs of electrodes 73 on each pair 70-71 of posts) About 15 mm to about 40 mm, and preferably about about 27 mm. The gap distance can be selectively increased or decreased by moving the electrodes 76 on the electrode mounts 73, which alters the voltage generated by the high voltage generator. Additionally, other sizes for the support structure 72 may be used to scale the flame gap dimensions, particularly if a larger gap is required than is achievable by deformation of the distance on the mounts 73. In addition, although larger widths and heights can be used, much greater than 3x3 can result in any significant advantage to overall system operation because metal deposition in the channel is no longer a factor in system failure at larger dimensions Is not provided.

The support arms 66T, 66B, and 66E form a substantially open support structure frame. Many prior art Marx ladders are in closed structures, which can cause problems such as parasitic discharges as a result of metal depositing on the walls of the Marx chamber or support structure. By having a substantially open structure for the support frame 62, these problems are avoided. For example, by moving away from the closed support structure and moving to an open support system that physically separates the spark gap electrodes from each other. Any metal deposits that have the configuration of the preferred support structure 62, including preferred dimensions, that are sputtered in the spark gap discharge can not bridge between the electrodes and therefore can not interfere with the discharge timing.

The support structure 62 preferably comprises ozone resistant materials, such as Teflon, ABS, or glass fiber. Since ozone is generated by the Max ladder, it is desirable to use such resistance materials to fabricate the support structure 62 to avoid damaging the structure. The use of materials susceptible to attack by ozone can weaken the support structure of the spark gap electrodes and have the repeated, substantially continuous, non-use required to treat the effluent systems according to the invention, The structure may experience mechanical failure and damage. It is also desirable to coat the surfaces of the support structure 62 with an oil, such as mineral oil or silicone oil. The oil will help prevent any metal from the spark gap electrodes from depositing on the surfaces of the support structure 62. When sediments are observed, they can be easily removed by removing the oil layer and reapplying the new coating. In addition, the lower support arm 66B, the lower portion of the posts 70, 71, and the lower portion of the vertical end support arms 66E are dipped in the oil bath 74, as shown in FIG.

Referring to Figures 19-21, a preferred housing configuration for high voltage generator system 40 is shown. The high voltage generator system 40 preferably includes an outer housing 43, a spark gap chamber 41, and a Marx ladder 42. The Max ladder 42 preferably includes a support structure 62, a capacitor bank housing 77, a low voltage driver circuit 39, a plurality of capacitors C, resistors R, and spark gap electrodes 76). Connections through the outer housing 43 are used to connect an external power supply (such as a wall mount connection) to the driver circuit 39 and to connect the air pumps 44 to the spark gap chamber 41, (And other constituents of the air) from within the chamber 41.

The outer housing 43 is preferably constructed to surround the flame gap chamber 41 and the Maxx ladder 42. It preferably has a removable cover or top or openable door to allow access to the interior of the housing 43 and access to the flame gap chamber 41. The outer housing 43 is preferably made of polycarbonate, Lexan, or another rigid polymer, but other materials may be used. The outer housing 43 also preferably separates the Marx ladder 42 from the surrounding environment and includes a dielectric body 42 to prevent arcing from nearby components to nearby metal structures, receptacles, and other monitoring and control systems. Barrier. This dielectric barrier may be a separate layer of coating or material on the inside of or outside the housing 43.

The capacitor bank housing 77 preferably has a removable top cover or openable door to allow access to the capacitors C and resistors R in the housing. The apertures are provided in the top cover of the housing 77 to allow the wires to connect the capacitors to the flame gap electrodes 76 through the flame gap electrode mounts 73. [ Another aperture is placed through the housing to connect the capacitor bank to the low voltage driver circuit 39. [ The housing 77 is preferably configured to include an oil reservoir 74 having sufficient capacity to at least partially immerse the capacitors. Mineral oil or silicone oil may be used for oil bath 74. The capacitor bank housing 77 may be disposed in the flame gap chamber 41 or may be external to the flame gap chamber 41. [

The flame gap chamber 41 may include at least another structure to surround at least the lid ladder support structure 62 and may surround other components of the ladder 42. The flame gap chamber 41 preferably includes a removable top or cover such that the support structure 62 (or other components of the Marx ladder 42 within the flame gap chamber 41) can be accessed, It has a door. In this configuration, the lower support arm 66B of the Max ladder support structure 62 will be based on the lowermost surface of the flame gap chamber 41. Alternatively, the spark gap chamber may be a removable cover that fits over the support structure 62, but does not have a substructure. The lower support arm 66B of the support structure 62 for the high voltage generator 42 is connected to the upper surface of the capacitor bank housing 77 (or alternatively to the lower surface of the outer housing 43) Will be based. If a removable cover is used, the seal is provided to allow ozone to be pumped out or inhaled out of the flame gap chamber 41. The inner surface of the flame gap chamber 41 used to transport ozone generated by the high voltage generator 42 to the reaction chamber 36 and any plumbing or conduit are preferably made of Teflon, Like ozone materials. The use of these resistance materials to make these parts is preferred to avoid damaging them by exposure to ozone. The second oil vat 74 may be selectively disposed under the flame gap chamber 41 or the outer housing 43 or disposed in a separate tray or other container (not shown) for the Maxx ladder support structure 62 . The oil reservoir 74 preferably has a sufficient volume so that the lower support arm 66B, the lower portion of the posts 70, 71, and the lower portion of the vertical end support arms 66E are immersed in the oil. Mineral oil or silicone oil may be used for oil bath 74. The support structure 62 is also preferably coated in oil. The outer housing 43 can be configured to operate as a housing and a spark gap chamber for the high voltage generator system 40 so that the separate spark gap chamber 41 can have modifications as required by those skilled in the art, It does not. The configuration without a separate spark gap chamber includes both the primary outer housing and the high voltage generator system and the reaction chamber (such as housing 260, including high voltage generator system 240 and reaction chamber 236) ≪ / RTI >

To allow the voltage to be carried from the Max ladder 42 to the reaction chamber 36 in order to allow various apertures or ports to be supplied from the power system 46 to the Marx ladder 42, The outer housing 43, the flame gap chamber 41, and the flame gap chamber 41, to blow air from the air pumps / compressors 44 into the flame gap chamber 41 through the flame 47 and allow the ozone 30 to be removed. And the sidewalls on the capacitor bank housing 77. Air pumps 44 may be used to cool the high voltage generator 42 and pressurize the flame gap chamber 41 and / or remove ozone through conduits or piping ) Can be used. Venturi or vacuum pump can also be used to remove ozone from the flame gap chamber by suction and to pressurize the flame gap chamber.

Most preferably, the flame gap chamber 41 (or the outer housing 43 if a separate flame gap chamber is not used) is maintained at a reduced or negative pressure of less than one atmosphere pressure, It supports intermittent burning of flame gaps to occur periodically. Typical Max ladder generators operate at pressures above one atmosphere. The processing systems and methods in accordance with the present invention can be used to process a substantially continuous high voltage generation (preferably having several periods of inactivity for cooling between each repeated cycle, for charging and discharging Repeated cycles). In this substantially continuous mode of operation, it is desirable to reduce the pressure or operate in vacuum to operate the Marx ladder according to the present invention, such as 42, 142, or 242, Lt; / RTI >

Any of the components of the processing systems according to the present invention described herein, including various gas injection system components, electrode mount assembly 80, and Marx ladder support structure 62, are within the scope of the present invention May be used in combination with other components or other embodiments in any combination. Any particular processing system embodiment, such as processing systems 10, 110, and 210, is not limited solely to these components and configurations specifically described in connection with the embodiment.

A preferred method of treating water in a flow or recirculating water system comprises generating a high voltage pulse in a high voltage generator, preferably comprising a Max ladder, with a flow of water to be passed between the ground and high voltage electrodes, Directing the high voltage pulse to a high voltage electrode disposed in close proximity to the high voltage electrode and generating a plasma discharge in the water flow in the plasma discharge region disposed between and around the high voltage and ground electrodes. Most preferably, water continues to flow through the discharge zone, and the plasma is periodically generated (every about 15 minutes) based on the periodic operation of the Max ladder. According to another preferred embodiment, the method of treating water further comprises the step of injecting air or other gas into the plasma discharge zone. According to another preferred embodiment, the method includes trapping the ozone gas, which is produced as a by-product in generating a high voltage pulse in the Max ladder, and injecting ozone into the plasma discharge zone. Most preferably, the injection of air or gas increases as the level of conductivity in water increases with repeated cycles of recirculation. The preferred method further comprises pumping or sucking air through the housing to the Max ladder to help cool components of the Max ladder, flushing ozone from within the housing, and pressing the housing The Max ladder is preferably operated under reduced pressure or vacuum conditions. The preferred method further comprises protecting various components of the water system from interference or damage that may be caused by high voltage pulse generation or plasma discharge. Additionally, the excess energy generated by the high voltage discharge is captured and used to further regulate the water in the water system. Most preferably, the methods of treating water in accordance with the present invention employ components of the water treatment systems described herein.

According to another preferred method, the conductivity of water is periodically measured (measurements may be performed by existing equipment in the water system or by equipment integrated into the treatment system). One or more parameters of the process may be determined by measuring the conductivity Or is adjusted when it reaches. These operating parameters include: (1) moving the high voltage electrode and the ground electrode close to each other; (2) increasing the voltage of the high voltage pulse supplied to the high voltage electrode; (3) increasing the rate at which bubbles are added to the effluent stream; Or (4) by reducing the pressure of the water stream at the outlet of the reaction chamber. Any combination of steps may be used to assist in generating plasma under high water conductivity conditions.

References to water systems herein include any type of runoff system, including industrial, commercial, and residential, requiring periodic treatment to control or eliminate the growth of microorganism species. Water flowing through the water system may include contaminants or chemical or biological treatment agents. Herein, references to continuous or substantially continuous, etc., occur during normal operating periods of the water system and the treatment system, and may include downtime (such as interruption of the water system or treatment system for seasonal interruption or maintenance of the water system) And which has repeated cycles of activation / deactivation of the processing system components, and which represents the operations of the processing system according to the present invention over an extended period of time. The components depicted in the figures are not drawn to scale and are merely intended as representations of the various components used in the preferred embodiments of the processing systems according to the present invention and the water systems in which these processing systems are used. Additionally, certain components of the water systems depicted in the drawings may be at different locations relative to those depicted in the drawings and other components of the systems and water systems of the present invention. Those of ordinary skill in the art, upon reading the present disclosure, understand that modifications and variations to the systems and methods for treating effluents with plasma discharge and ozone while protecting the components of the water systems can be made within the scope of the present invention And it is intended that the scope of the invention disclosed herein be limited only by the broadest interpretation of the appended claims, which the present inventors are legally qualified to do.

10: processing system 12: water system
16, 216: sensor
20: micro-bubbling devices 22: air or gas
26: Reactive gas 30: Ozone
28: gas injection system 35, 135: waterproof housing
36, 136: Plasma reaction chamber 38: High voltage wire
39: Driver circuit
40: high voltage generator system 41, 141: flame gap chamber
42, 142: Max ladder 43, 143: Outer housing
44: air pump 46: power system
48, 148, 256: ground 52: grounding device
54, 154, 254: Sump 58: Electromagnetic Interference Suppressor
60: Isolation transformer 62: Support frame
64: Tab 65: Aperture
66B: lower support arm 66E: end support arm
66T: upper support arm 70, 71: post
73: Mount 74: Oiler
75: Wiring 76: Spark gap electrode
77: Housing of capacitor bank
80: Electrode mounting assembly 82, 182: High voltage base
84, 194: rim 86, 186, 202: spoke
88, 188, 204: hub 90, 100, 200, 206: opening
92, 192: ground base 96, 196: body
98, 198: Color
110: Plasma water treatment system
112, 212: cooling tower water system 113: pump
114: water level 115: control unit
116: Conductivity sensor 121: Venturi
126: reactive gas 129: connecting device
130: ozone gas stream 138: wire
140, 240: High voltage generator 147: Ground electrode tube
158: ferrite bead
170, 270: water control unit 172, 260: housing
182: High voltage base
210: plasma processing system 236: reaction chamber
246: Power supply

Claims (32)

1. A treatment system for treating water in an effluent system having plasma discharge and ozone,
A high voltage generator comprising a plurality of capacitors, resistors, and spark gap electrodes configured in a Marx ladder circuit, a support structure for the spark gap electrodes, and a housing;
An inlet configured to receive at least a portion of the water flowing through the water system as the water to be treated, an outlet configured to return a portion of the water back to the water system after being treated with the plasma discharge and ozone, chamber;
A gas injection system disposed above the inlet or within the reaction chamber to add bubbles of one or more gases to the water to be treated;
A high voltage electrode and a ground electrode disposed at least partially in the reaction chamber and configured to generate a plasma discharge in the reactor body when a high voltage pulse is generated by the high voltage generator; And
And a conduit configured to transfer ozone gas produced in the high voltage generator from the housing to the gas injection system. The method according to claim 1,
Further comprising an electrode mounting assembly disposed within the reaction chamber, the electrode mounting assembly including a high voltage mounting base coupled to the high voltage electrode and a ground mounting base coupled to the ground electrode. 3. The method of claim 2,
Wherein the high voltage mounting base comprises a wheel-shaped body. The method of claim 3,
Wherein the ground electrode mounting base comprises a funnel or dome-shaped body. 3. The method of claim 2,
Wherein the high voltage mounting base and the ground mounting base are configured to hold the high voltage electrode at a fixed gap distance between about 1 and 10 mm from the ground electrode. 6. The method of claim 5,
Wherein the ground electrode comprises a substantially cylindrical and conductive tube having a plurality of apertures disposed through a sidewall of the tube, the tube being disposed between the ground electrode mounting base and the high voltage mounting base. The method according to claim 6,
Wherein the high voltage electrode comprises a rod that is at least partially disposed within and substantially centered within the ground electrode tube and wherein the gap distance is a radial distance between an outer surface of the rod and an inner surface of the tube. 8. The method of claim 7,
Wherein the rod of about 4 to 30 mm is disposed within the ground electrode tube. The method according to claim 6,
Wherein the outer surface of the tube is coated with a dielectric barrier material. The method according to claim 1,
The support structure for the spark gap electrodes comprises:
An upper support arm having a substantially rectangular configuration with an open center portion,
A lower support arm having a substantially rectangular configuration with an open center portion,
One or more vertical support arms connecting the upper support arm to the lower support arm in spaced relation;
A plurality of spaced-apart post pairs, each pair comprising a first post vertically extending from a first side of the lower support arm and a second post extending vertically from a second side of the lower support arm substantially opposite the first side And a plurality of spaced pairs of posts, each of the plurality of spaced pairs including an extended second post. 11. The method of claim 10,
Wherein the upper support arm, the lower support arm, and the vertical support arms form an open, substantially U-shaped frame. 11. The method of claim 10,
Wherein the support structure has dimensions of about 2 inches wide by about 2 inches high by 3 inches wide by 3 inches high. 11. The method of claim 10,
The support structure further comprising a plurality of electrode mounts, each mount extending inwardly from each of the first posts and the second posts of the spaced pairs of posts,
Each electrode mount being attached to one of said spark gap electrodes to form a plurality of pairs of electrodes between each pair of spaced posts;
Wherein the gap distance between the spark gap electrodes in each pair of electrodes is from about 15 mm to about 40 mm. 14. The method of claim 13,
Wherein the spark gap electrodes are configured to move laterally along the electrode mounts to selectively adjust the gap distance. 15. The method of claim 14,
Wherein the electrode mounts comprise screws configured to mate with threads on the spark gap electrodes such that the spark gap electrodes can be rotated to achieve lateral movement along the electrode mounts. 14. The method of claim 13,
Wherein the electrode mounts are configured to move laterally relative to the posts to selectively adjust the gap distance. The method according to claim 1,
Further comprising a vat disposed within the housing. 18. The method of claim 17,
Wherein the support structure comprises a lower support arm disposed below the spark gap electrodes and the lower support arm is immersed in the oil tank. 18. The method of claim 17,
Wherein the capacitors are at least partially dipped in the oil. The method according to claim 1,
Wherein the surfaces of the support structure are coated with oil. The method according to claim 1,
Further comprising a Venturi or vacuum pump to direct ozone generated in the high voltage generator to the conduit for delivery to the gas injection system. The method according to claim 1,
Further comprising an air pump for injecting air through the high voltage generator. A method for treating an effluent stream,
Generating high voltage pulses and ozone using a Maxth ladder circuit comprising a plurality of capacitors, resistors, and spark gap switches, wherein the spark gap switches comprise a high voltage pulse and a high voltage pulse, An ozone generating step;
Operating the Marx ladder circuit at reduced pressure or under negative pressure;
Contacting at least a portion of the support structure with the oil to reduce metal deposits on the support structure; And
And supplying ozone to said water stream. 24. The method of claim 23,
Further comprising the step of periodically cleaning the support structure to remove the oil and supplying fresh oil to contact at least a portion of the support structure. 24. The method of claim 23,
Each flame gap switch comprising a pair of electrodes separated by a gap distance and the open support structure being configured to support the plurality of flame gap switches such that the gap distance is between about 15 mm and 40 mm, How to process. 24. The method of claim 23,
Supplying the high voltage pulse to a high voltage electrode at least partially disposed in a reaction chamber, the reaction chamber having an inlet and an outlet through which the water stream flows;
Further comprising generating a plasma discharge in the water stream between the high voltage electrode and the ground electrode at least partially disposed in the reaction chamber. 27. The method of claim 26,
Further comprising the step of adding bubbles of one or more gases to the effluent stream in a region where the plasma discharge occurs. 28. The method of claim 27,
Periodically measuring the conductivity of the water stream and adjusting one or more operating parameters when the conductivity is above a predetermined threshold. 29. The method of claim 28,
Wherein the one or more operational parameters comprise:
Moving the high voltage electrode and the ground electrode close to each other;
Increasing the voltage of the high voltage pulse supplied to the high voltage electrode;
Increasing the rate at which bubbles are added to the water stream; And
And reducing the pressure of the effluent stream at the outlet of the reaction chamber. 26. The method of claim 25,
Further comprising adjusting the voltage of the high voltage post by increasing or decreasing the gap distance. 31. The method of claim 30,
The open support structure includes a frame, a plurality of posts supported by the frame, and a plurality of electrode mounts supported by the posts, each electrode mount supporting one of the spark gap electrodes;
Wherein said gap distance is increased or decreased by laterally moving said spark gap electrodes relative to said electrode mounts or by laterally moving said electrode mounts relative to said posts. 24. The method of claim 23,
Periodically measuring the conductivity of the water stream and adjusting one or more operating parameters when the conductivity is above a predetermined threshold.

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