JP2017519850A5 - - Google Patents

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Publication number
JP2017519850A5
JP2017519850A5 JP2016563955A JP2016563955A JP2017519850A5 JP 2017519850 A5 JP2017519850 A5 JP 2017519850A5 JP 2016563955 A JP2016563955 A JP 2016563955A JP 2016563955 A JP2016563955 A JP 2016563955A JP 2017519850 A5 JP2017519850 A5 JP 2017519850A5
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JP
Japan
Prior art keywords
fluid control
zwitterionic
control film
structured surface
organic
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Granted
Application number
JP2016563955A
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English (en)
Japanese (ja)
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JP6611734B2 (ja
JP2017519850A (ja
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Priority claimed from PCT/US2015/027025 external-priority patent/WO2015164468A1/en
Publication of JP2017519850A publication Critical patent/JP2017519850A/ja
Publication of JP2017519850A5 publication Critical patent/JP2017519850A5/ja
Application granted granted Critical
Publication of JP6611734B2 publication Critical patent/JP6611734B2/ja
Active legal-status Critical Current
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JP2016563955A 2014-04-24 2015-04-22 親水性表面を有する流体制御フィルム、その作製方法、及び構造化表面を洗浄する方法 Active JP6611734B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201461983585P 2014-04-24 2014-04-24
US61/983,585 2014-04-24
US201562150498P 2015-04-21 2015-04-21
US62/150,498 2015-04-21
PCT/US2015/027025 WO2015164468A1 (en) 2014-04-24 2015-04-22 Fluid control films with hydrophilic surfaces, methods of making same, and processes for cleaning structured surfaces

Publications (3)

Publication Number Publication Date
JP2017519850A JP2017519850A (ja) 2017-07-20
JP2017519850A5 true JP2017519850A5 (show.php) 2018-03-29
JP6611734B2 JP6611734B2 (ja) 2019-11-27

Family

ID=53051940

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016563955A Active JP6611734B2 (ja) 2014-04-24 2015-04-22 親水性表面を有する流体制御フィルム、その作製方法、及び構造化表面を洗浄する方法

Country Status (5)

Country Link
US (1) US10378813B2 (show.php)
EP (1) EP3134466B1 (show.php)
JP (1) JP6611734B2 (show.php)
CN (1) CN106232696B (show.php)
WO (1) WO2015164468A1 (show.php)

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WO2022162528A1 (en) 2021-01-28 2022-08-04 3M Innovative Properties Company Microstructured surface with increased microorganism removal when cleaned, articles and methods
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CN113690824B (zh) * 2021-08-10 2024-12-20 中国电力科学研究院有限公司 一种通过降低凝露可能性以提升电晕电压的电力金具
TWI856279B (zh) * 2021-11-25 2024-09-21 國立臺灣科技大學 使用繞射晶片之血液樣本檢測方法、裝置及系統
US20250033319A1 (en) 2021-12-07 2025-01-30 3M Innovative Properties Company Microstructured surface and articles with lower visibility of scratches and methods
CN120112360A (zh) 2022-11-15 2025-06-06 舒万诺知识产权公司 包括连接的井的微结构化基底

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