JP2017513188A5 - - Google Patents

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Publication number
JP2017513188A5
JP2017513188A5 JP2016557932A JP2016557932A JP2017513188A5 JP 2017513188 A5 JP2017513188 A5 JP 2017513188A5 JP 2016557932 A JP2016557932 A JP 2016557932A JP 2016557932 A JP2016557932 A JP 2016557932A JP 2017513188 A5 JP2017513188 A5 JP 2017513188A5
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JP
Japan
Prior art keywords
radiation
vuv
duv
visible
euv
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2016557932A
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English (en)
Japanese (ja)
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JP2017513188A (ja
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Publication date
Priority claimed from US14/660,849 external-priority patent/US9530636B2/en
Application filed filed Critical
Publication of JP2017513188A publication Critical patent/JP2017513188A/ja
Publication of JP2017513188A5 publication Critical patent/JP2017513188A5/ja
Priority to JP2019238419A priority Critical patent/JP6891261B2/ja
Pending legal-status Critical Current

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JP2016557932A 2014-03-20 2015-03-19 ナノ構造の反射防止層を有する光源 Pending JP2017513188A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2019238419A JP6891261B2 (ja) 2014-03-20 2019-12-27 ナノ構造の反射防止層を有する光源、装置、及び方法

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201461968161P 2014-03-20 2014-03-20
US61/968,161 2014-03-20
US14/660,849 US9530636B2 (en) 2014-03-20 2015-03-17 Light source with nanostructured antireflection layer
US14/660,849 2015-03-17
PCT/US2015/021460 WO2015143150A1 (en) 2014-03-20 2015-03-19 Light source with nanostructured antireflection layer

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2019238419A Division JP6891261B2 (ja) 2014-03-20 2019-12-27 ナノ構造の反射防止層を有する光源、装置、及び方法

Publications (2)

Publication Number Publication Date
JP2017513188A JP2017513188A (ja) 2017-05-25
JP2017513188A5 true JP2017513188A5 (enExample) 2018-04-26

Family

ID=54143490

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2016557932A Pending JP2017513188A (ja) 2014-03-20 2015-03-19 ナノ構造の反射防止層を有する光源
JP2019238419A Active JP6891261B2 (ja) 2014-03-20 2019-12-27 ナノ構造の反射防止層を有する光源、装置、及び方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2019238419A Active JP6891261B2 (ja) 2014-03-20 2019-12-27 ナノ構造の反射防止層を有する光源、装置、及び方法

Country Status (4)

Country Link
US (1) US9530636B2 (enExample)
JP (2) JP2017513188A (enExample)
DE (1) DE112015001355B4 (enExample)
WO (1) WO2015143150A1 (enExample)

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Publication number Priority date Publication date Assignee Title
US9723703B2 (en) * 2014-04-01 2017-08-01 Kla-Tencor Corporation System and method for transverse pumping of laser-sustained plasma
US10840051B2 (en) 2015-09-22 2020-11-17 Lightlab Sweden Ab Extraction structure for a UV lamp
SE542334C2 (en) * 2016-05-23 2020-04-14 Lightlab Sweden Ab Method for manufacturing a light extraction structure for a uv lamp
WO2019113379A1 (en) 2017-12-06 2019-06-13 California Institute Of Technology System for analyzing a test sample and method therefor
US10109473B1 (en) 2018-01-26 2018-10-23 Excelitas Technologies Corp. Mechanically sealed tube for laser sustained plasma lamp and production method for same
US10714327B2 (en) * 2018-03-19 2020-07-14 Kla-Tencor Corporation System and method for pumping laser sustained plasma and enhancing selected wavelengths of output illumination
DE102018221189A1 (de) 2018-12-07 2020-06-10 Carl Zeiss Smt Gmbh Verfahren zum Bilden von Nanostrukturen an einer Oberfläche und optisches Element
US12382748B2 (en) * 2021-01-04 2025-08-05 Saudi Arabian Oil Company Nanostructures to reduce optical losses
US11887835B2 (en) * 2021-08-10 2024-01-30 Kla Corporation Laser-sustained plasma lamps with graded concentration of hydroxyl radical
DE102022206465A1 (de) 2022-06-27 2023-06-29 Carl Zeiss Smt Gmbh Entspiegelung von optischen elementen für lithographiesysteme über einen grossen lichteinfallswinkelbereich mittels einer nanostrukturierung der oberfläche
US20240276625A1 (en) * 2023-02-14 2024-08-15 Kla Corporation Vuv laser-sustained plasma light source with long-pass filtering
US12520413B2 (en) 2023-09-21 2026-01-06 Kla Corporation Sapphire lamp for laser sustained plasma broadband light source

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US6897609B2 (en) 2001-03-30 2005-05-24 Advanced Lighting Technologies, Inc. Plasma lamp and method
US7026076B2 (en) 2003-03-03 2006-04-11 Freescale Semiconductor, Inc. Method of patterning photoresist on a wafer using a reflective mask with a multi-layer ARC
US7377670B2 (en) * 2003-03-24 2008-05-27 Seiko Epson Corporation Illumination device and projector equipping the same
US20050168148A1 (en) * 2004-01-30 2005-08-04 General Electric Company Optical control of light in ceramic arctubes
DE102005000660A1 (de) * 2005-01-04 2006-11-09 Schott Ag Leuchtvorrichtung mit einem strukturierten Körper
EP1935035A2 (de) 2005-10-10 2008-06-25 X-FAB Semiconductor Foundries AG Herstellung von selbstorganisierten nadelartigen nano-strukturen und ihre recht umfangreichen anwendungen
US7435982B2 (en) 2006-03-31 2008-10-14 Energetiq Technology, Inc. Laser-driven light source
JP4986138B2 (ja) * 2006-11-15 2012-07-25 独立行政法人産業技術総合研究所 反射防止構造を有する光学素子用成形型の製造方法
KR101254161B1 (ko) 2007-12-14 2013-04-18 지고 코포레이션 주사 간섭계를 사용해서 표면 구조를 분석하는 방법 및 장치
CN101990695A (zh) * 2008-04-02 2011-03-23 奥斯兰姆有限公司 高效投影系统
US8553333B2 (en) 2009-01-23 2013-10-08 State Of Oregon Acting By And Through The State Board Of Higher Education On Behalf Of Oregon State University Nanostructured anti-reflective coatings for substrates
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US9099292B1 (en) 2009-05-28 2015-08-04 Kla-Tencor Corporation Laser-sustained plasma light source
EP2428825B1 (en) 2009-06-12 2016-05-11 Sharp Kabushiki Kaisha Antireflection film, display device and light transmissive member
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US8643840B2 (en) * 2010-02-25 2014-02-04 Kla-Tencor Corporation Cell for light source
JP6132762B2 (ja) 2010-04-16 2017-05-24 フレックス ライティング ２，エルエルシー フィルムベースのライトガイドを備える前面照射デバイス
US20120057235A1 (en) * 2010-09-03 2012-03-08 Massachusetts Institute Of Technology Method for Antireflection in Binary and Multi-Level Diffractive Elements
WO2012032162A1 (de) 2010-09-09 2012-03-15 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V. Verfahren zur reduzierung der grenzflächenreflexion einer glasoberfläche
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US9097577B2 (en) * 2011-06-29 2015-08-04 KLA—Tencor Corporation Adaptive optics for compensating aberrations in light-sustained plasma cells
US9318311B2 (en) 2011-10-11 2016-04-19 Kla-Tencor Corporation Plasma cell for laser-sustained plasma light source
US9927094B2 (en) 2012-01-17 2018-03-27 Kla-Tencor Corporation Plasma cell for providing VUV filtering in a laser-sustained plasma light source
JP6035841B2 (ja) * 2012-04-24 2016-11-30 三浦工業株式会社 紫外線照射装置
US9775226B1 (en) 2013-03-29 2017-09-26 Kla-Tencor Corporation Method and system for generating a light-sustained plasma in a flanged transmission element
US9390902B2 (en) 2013-03-29 2016-07-12 Kla-Tencor Corporation Method and system for controlling convective flow in a light-sustained plasma

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