JP2017512741A - 積層されたグラフェン層を含む粒子 - Google Patents
積層されたグラフェン層を含む粒子 Download PDFInfo
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- JP2017512741A JP2017512741A JP2016560424A JP2016560424A JP2017512741A JP 2017512741 A JP2017512741 A JP 2017512741A JP 2016560424 A JP2016560424 A JP 2016560424A JP 2016560424 A JP2016560424 A JP 2016560424A JP 2017512741 A JP2017512741 A JP 2017512741A
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- C01P2004/80—Particles consisting of a mixture of two or more inorganic phases
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10S977/847—Surface modifications, e.g. functionalization, coating
Abstract
Description
プラズマ処理は、開始材料を剥離するための剥離プラズマ工程を含み得る。剥離プラズマ工程は、希ガスプラズマを用い得る。希ガスとは、周期表の第18族のガスであると理解される。剥離プラズマ工程は、アルゴンプラズマを用い得る。
プラズマ処理は、クリーニングプラズマ工程を含み得る。クリーニングプラズマ工程は、酸素含有ガス中のプラズマ(例えば酸素プラズマ等)を用い得る。不活性ガスとの混合物が用いられてもよい。
本発明は、粒子の容易なプラズマ官能化を可能にする。サブ構造間へのインターカレーションが可能である。粒子のバルク構造内にドーパントを導入するために、ドーピングが行われ得る。粒子には、被検物質種がドーピングされ得る。適切な前駆体ガスまたは1または適切な前駆体ガスを含むガス状混合物を用いて、プラズマが発生され得る。適切な前駆体ガスとしては、酸素、水、過酸化水素、例えばメタノール等のアルコール、窒素、アンモニア、有機アミン、例えばフッ素および塩素等のハロゲン、並びに、例えばCF4等の過ハロゲン化炭化水素を含むハロゲン化炭化水素が挙げられる。水素キャリアガス中のB2H6の蒸気を用いてBドーピングが行われ得る。プラズマを用いない官能化およびドーピング手順を用いることも、本発明の範囲内である。官能化は、例えばシラン化、アミド化、エステル化、置換、および付加環化等の適切な化学的反応を用いて進み得る。酸素を用いた最初の官能化工程は、後続の官能化反応のための部位として用いられ得る比較的反応性の高い酸素官能性が生じるので、有益であり得る。
この処理は、粒子の表面を修飾材料で修飾するために行われ得る。修飾材料は金属であり得る。金属は、銀、白金、または金であり得る。金属修飾は、修飾物質金属で形成またはコーティングされた電極を用いてプラズマを発生させることによって行われ得る。或いは、公知のスパッタリング技術が用いられ得る。
本発明は、粒子を修復する工程を含み得る。修復は、粒子の構造から1以上の原子が失われたことによって形成された例えば単原子空孔または多原子空孔等の欠陥を修復することを含み得る。
Stone-Wales欠陥は、サブ構造を更に押し広げて、破砕性を高め得る。Stone-Wales欠陥は、官能化、修飾、およびドーピングのための固定点として作用し得る。
粒子の製造
図6〜図8に関して説明した装置を用いた。粉砕したグラファイトを反応器に入れた。例えばグラフェン積層体、CNT、フラーレン(例えばバッキーボール等)、またはそれらの混合物等の他のグラファイト材料が用いられてもよい。処理は、最小10分〜最大60分にわたって、酸素プラズマを用いて、反応器のバレルを30rpmを超える速度で回転させながら行われた。これに続き、類似の処理条件下でアルゴン剥離処理を行った。高々2000Wまでの出力を用いた。0.4〜1.5mBarの範囲内の反応器圧力、および高々1500sccmまでのガス流量を用いた。これにより、図2および図3に示されるような粒子が形成された。この酸素サイクル中、UV光子および/またはイオンが表面を照射して、酸素基のための場所を提供する単原子空孔、二原子空孔、および三原子空孔を生じた。アルゴン剥離サイクルは、酸素基を除去して、更なる処理段階において表面に所望の基を結合させるための場所を残す効果も有する。
ケイ素修飾
実施例1に従って粒子を製造した。アルゴン剥離工程の後、アルゴンキャリアガス中のヘキサメチルジシロキサンが、気泡形成システムを介してチャンバー内に導入された。処理中、10〜60分にわたってプラズマを発生させた。粒子をプラズマに均等に露出しつつ、UV光子への過剰な露出を回避するために、反応器を1rpmで回転させるのが有利であることが見出された。
ケイ素ナノポッドで修飾された粒子
実施例2のケイ素でコーティングされた粒子は、マイクロ波処理を用いた更なる処理工程を受ける。最も具体的には、材料は、マイクロ波によるプラズマを受けた。この結果、図4に示されるように、粒子の表面にケイ素のナノポッドが形成された。
金属修飾
実施例1で製造した粒子に更なる処理工程を施した。図6〜図8に関して説明した装置を用いた。電極アレイは、選択された1または複数の金属でコーティングされた複数の電極で構成した。適切な金属の例としては、Au、Pt、Ag、Cu、およびFeが挙げられる。10〜180分の処理時間が用いられ得る。バレルは1rpmで回転され得る。アルゴン雰囲気中でプラズマを維持した。これにより、図5に示されるように、金属でコーティングされた粒子が形成された。
金属修飾および官能化
窒素官能基または酸素官能基を用いた官能化に加えて、金属修飾を行った。アルゴン中でプラズマを維持する代わりに、窒素ガスまたは酸素ガス中でプラズマを維持して、実施例4に記載した方法を行った。
硫黄インターカレーション
実施例1に記載した方法を行ったが、但し、開始材料はグラファイト開始材料だけでなく乾燥硫黄粉末も含んだ。20重量%の硫黄/80重量%のグラファイト開始材料の混合物が良好な結果を生じたが、50重量%前後の硫黄/50重量%前後のグラファイト開始材料までの割合が用いられ得る。
32 電極
Claims (36)
- 複数の積層されたサブ構造を含む粒子であって、各サブ構造がグラフェン層の積層体を含み、連続する積層された前記サブ構造間の分離が、各前記サブ構造内の連続する前記グラフェン層間の分離より大きいことを特徴とする粒子。
- 連続する積層された前記サブ構造間の分離が、2〜100nm、好ましくは5〜50nm、より好ましくは10〜30nm、最も好ましくは10〜20nmの範囲内である、請求項1記載の粒子。
- 前記サブ構造の各々が、0.7〜15nm、好ましくは0.7〜4nmの範囲内の積層厚さを有する、請求項1または2記載の粒子。
- 前記サブ構造の各々が2〜12層のグラフェン層の積層体を含む、請求項1〜3のいずれか一項に記載の粒子。
- 前記サブ構造の各々が積層厚さを有し、該積層厚さが、連続する積層された前記サブ構造間の分離より小さい、請求項1〜4のいずれか一項に記載の粒子。
- 0.7〜5マイクロメートル、好ましくは1〜5マイクロメートル、より好ましくは1.5〜3マイクロメートルの範囲内の厚さを有する、請求項1〜5のいずれか一項に記載の粒子。
- 1〜15マイクロメートル、好ましくは2〜5マイクロメートルの範囲内の幅を有する、請求項1〜6のいずれか一項に記載の粒子。
- 前記サブ構造が正味の負電荷を有する、請求項1〜7のいずれか一項に記載の粒子。
- Stone-Wales欠陥を有する、請求項1〜8のいずれか一項に記載の粒子。
- 80重量%を超える、好ましくは90重量%を超える炭素含有量を有する、請求項1〜9のいずれか一項に記載の粒子。
- 10重量%未満、好ましくは5重量%未満、最も好ましくは1重量%未満の酸素含有量を有する、請求項1〜10のいずれか一項に記載の粒子。
- 前記サブ構造内の前記グラフェン層の少なくとも一部が、ドーピングおよび/または表面修飾された、請求項1〜11のいずれか一項に記載の粒子。
- 前記グラフェン層の少なくとも一部が、官能化によって表面修飾された、請求項12記載の粒子。
- 前記グラフェン層の少なくとも一部が、その上にカルボキシル、カルボニル、ヒドロキシル、アミン、アミド、またはハロゲン官能基を形成することによって表面修飾された、請求項13記載の粒子。
- 前記グラフェン層の少なくとも一部が、材料で修飾することによって表面修飾された、請求項12記載の粒子。
- 前記材料がケイ素である、請求項15記載の粒子。
- 前記材料が硫黄またはセレンである、請求項15記載の粒子。
- 前記材料が例えば遷移金属等の金属である、請求項15記載の粒子。
- 前記金属が、銀、金、白金、銅、および鉄のうち1以上である、請求項18記載の粒子。
- 前記グラフェン層の少なくとも一部がドーパント種でドーピングされ、該ドーパント種が、N、B、S、Se、および好ましくはFであるハロゲン原子のうち1以上である、請求項12〜19のいずれか一項に記載の粒子。
- 連続する積層された前記サブ構造間にインターカレートされたインターカレート物質を更に含む、請求項1〜20のいずれか一項に記載の粒子。
- 前記インターカレート物質が硫黄である、請求項21記載の粒子。
- 前記インターカレート物質が水素である、請求項21記載の粒子。
- 請求項1記載の粒子を複数含むことを特徴とする粒子状材料。
- 15〜70m2g−1の範囲内の表面積を有する、請求項24記載の粒子状材料。
- 結晶質である、請求項24または25記載の粒子状材料。
- 開始材料にプラズマ処理を施すことによって製造される、請求項24〜26のいずれか一項に記載の粒子状材料。
- 請求項24記載の粒子状材料を製造する方法であって、開始材料にプラズマ処理を施す工程を含むことを特徴とする方法。
- 前記プラズマ処理が、該プラズマ処理中に前記開始材料および/または前記粒子状材料を撹拌するために移動される複数の電極を用いてプラズマを発生させることを含む、請求項28記載の方法。
- 前記プラズマ処理が、好ましくは酸素含有ガス中のプラズマを用いた、最も好ましくは酸素プラズマを用いたクリーニングプラズマ工程を含む、請求項28または29記載の方法。
- 前記プラズマ処理が、好ましくは希ガスプラズマを用いて、最も好ましくはアルゴンプラズマを用いて前記開始材料を剥離する剥離プラズマ工程を含む、請求項28〜30のいずれか一項に記載の方法。
- マイクロ波による仕上げ処理、好ましくはマイクロ波によるプラズマ処理を含む、請求項28〜31のいずれか一項に記載の方法。
- マトリックス材料中に分散された請求項24記載の粒子状材料を含むことを特徴とする複合材料。
- 前記マトリックス材料がポリマーである、請求項33記載の複合材料。
- 液状媒体中に分散された請求項24記載の粒子状材料を含むことを特徴とする粒子分散物。
- 請求項24記載の粒子状材料を含むことを特徴とする物品。
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JPWO2019168206A1 (ja) * | 2018-03-01 | 2021-04-22 | 国立研究開発法人科学技術振興機構 | 表面修飾炭素材料及び表面修飾炭素材料の製造方法 |
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EP3129323A1 (en) | 2017-02-15 |
JP6606511B2 (ja) | 2019-11-13 |
GB201405614D0 (en) | 2014-05-14 |
WO2015145172A1 (en) | 2015-10-01 |
EP3129323B1 (en) | 2019-11-20 |
KR20170004980A (ko) | 2017-01-11 |
US20170174520A1 (en) | 2017-06-22 |
US10220366B2 (en) | 2019-03-05 |
CN106458594B (zh) | 2019-12-27 |
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US20190201864A1 (en) | 2019-07-04 |
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