JP2017503923A5 - - Google Patents

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Publication number
JP2017503923A5
JP2017503923A5 JP2016541544A JP2016541544A JP2017503923A5 JP 2017503923 A5 JP2017503923 A5 JP 2017503923A5 JP 2016541544 A JP2016541544 A JP 2016541544A JP 2016541544 A JP2016541544 A JP 2016541544A JP 2017503923 A5 JP2017503923 A5 JP 2017503923A5
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JP
Japan
Prior art keywords
fastener
pad
head
diameter
hole
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JP2016541544A
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JP2017503923A (ja
JP6662780B2 (ja
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Priority claimed from US14/182,831 external-priority patent/US9960021B2/en
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図２Ｃおよび図２Ｄはそれぞれ、締め具２４０を介してバッキング板１０２に固定することができる例示的なパッド２１０の上面図および横断面（線Ｄ−Ｄに沿って）側面図である。図２Ｃに示すように、パッド２１０は、支承表面２１２と、パッド２１０の本体内へ部分的に延びる第１の直径を有する皿穴付き凹み２５０と、第１の直径より小さい第２の直径を有する貫通孔２５２とを含む。締め具２４０は、締め具２４０のヘッドが、支承表面２１２の下で皿穴に埋められるように（すなわち、締め具２４０のヘッドが、図４に関して以下で論じる密封リング４８１に接触しないように）、または締め具２４０のヘッドが、支承表面２１２と平面になるように、皿穴付き凹み２５０および貫通孔２５２内に配置することができる。締め具２４０のヘッドは、パッド２１０の表面２５６と接触する。締め具２４０のシャフトは、パッド２１０をバッキング板１０２に固定するように、貫通孔２５２を通して配置される。パッド２１０の設置表面２１４は、凹み１２０の底面２０２と接触する。
JP2016541544A 2013-12-18 2014-11-11 低摩擦パッドを有する物理的気相堆積（ｐｖｄ）ターゲット Active JP6662780B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201361917630P 2013-12-18 2013-12-18
US61/917,630 2013-12-18
US14/182,831 2014-02-18
US14/182,831 US9960021B2 (en) 2013-12-18 2014-02-18 Physical vapor deposition (PVD) target having low friction pads
PCT/US2014/065023 WO2015094515A1 (en) 2013-12-18 2014-11-11 Physical vapor deposition (pvd) target having low friction pads

Publications (3)

Publication Number Publication Date
JP2017503923A JP2017503923A (ja) 2017-02-02
JP2017503923A5 true JP2017503923A5 (ja) 2017-12-14
JP6662780B2 JP6662780B2 (ja) 2020-03-11

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ID=53369351

Family Applications (1)

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JP2016541544A Active JP6662780B2 (ja) 2013-12-18 2014-11-11 低摩擦パッドを有する物理的気相堆積（ｐｖｄ）ターゲット

Country Status (6)

Country Link
US (1) US9960021B2 (ja)
JP (1) JP6662780B2 (ja)
KR (1) KR102208950B1 (ja)
CN (2) CN105874565A (ja)
TW (1) TWI648419B (ja)
WO (1) WO2015094515A1 (ja)

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USD851613S1 (en) 2017-10-05 2019-06-18 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD868124S1 (en) 2017-12-11 2019-11-26 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD877101S1 (en) 2018-03-09 2020-03-03 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD888903S1 (en) 2018-12-17 2020-06-30 Applied Materials, Inc. Deposition ring for physical vapor deposition chamber
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USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD1037954S1 (en) 2020-10-23 2024-08-06 Applied Materials, Inc. Self-retained low friction pad
US11618943B2 (en) * 2020-10-23 2023-04-04 Applied Materials, Inc. PVD target having self-retained low friction pads
USD940765S1 (en) 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
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USD1007449S1 (en) 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target

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