JP2017199606A5 - - Google Patents
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- Publication number
- JP2017199606A5 JP2017199606A5 JP2016090682A JP2016090682A JP2017199606A5 JP 2017199606 A5 JP2017199606 A5 JP 2017199606A5 JP 2016090682 A JP2016090682 A JP 2016090682A JP 2016090682 A JP2016090682 A JP 2016090682A JP 2017199606 A5 JP2017199606 A5 JP 2017199606A5
- Authority
- JP
- Japan
- Prior art keywords
- charged particle
- particle beam
- beam apparatus
- detectors
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002245 particle Substances 0.000 claims 42
- 239000011163 secondary particle Substances 0.000 claims 9
- 230000003287 optical effect Effects 0.000 claims 8
- 238000001514 detection method Methods 0.000 claims 5
- 230000001678 irradiating effect Effects 0.000 claims 4
- 230000005684 electric field Effects 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016090682A JP6727024B2 (ja) | 2016-04-28 | 2016-04-28 | 荷電粒子線装置 |
| US15/487,561 US10121632B2 (en) | 2016-04-28 | 2017-04-14 | Charged particle beam apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016090682A JP6727024B2 (ja) | 2016-04-28 | 2016-04-28 | 荷電粒子線装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017199606A JP2017199606A (ja) | 2017-11-02 |
| JP2017199606A5 true JP2017199606A5 (cg-RX-API-DMAC7.html) | 2019-02-07 |
| JP6727024B2 JP6727024B2 (ja) | 2020-07-22 |
Family
ID=60156937
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016090682A Active JP6727024B2 (ja) | 2016-04-28 | 2016-04-28 | 荷電粒子線装置 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US10121632B2 (cg-RX-API-DMAC7.html) |
| JP (1) | JP6727024B2 (cg-RX-API-DMAC7.html) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017216941A1 (ja) * | 2016-06-17 | 2017-12-21 | 株式会社 日立ハイテクノロジーズ | 荷電粒子線装置 |
| WO2019100600A1 (en) * | 2017-11-21 | 2019-05-31 | Focus-Ebeam Technology (Beijing) Co., Ltd. | Low voltage scanning electron microscope and method for specimen observation |
| WO2019207707A1 (ja) * | 2018-04-26 | 2019-10-31 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
| EP3756166A4 (en) * | 2018-04-27 | 2021-10-27 | Hewlett-Packard Development Company, L.P. | IMAGING THREE-DIMENSIONAL VOLUMES |
| WO2020136710A1 (ja) * | 2018-12-25 | 2020-07-02 | 株式会社日立ハイテク | 荷電粒子線装置 |
| US12394586B2 (en) * | 2019-07-02 | 2025-08-19 | Hitachi High-Tech Corporation | Charged particle beam device |
| TWI794767B (zh) * | 2020-03-11 | 2023-03-01 | 荷蘭商Ａｓｍｌ荷蘭公司 | 用於信號電子偵測的系統及方法 |
| JP7364540B2 (ja) * | 2020-08-05 | 2023-10-18 | 株式会社日立ハイテク | 画像処理システム |
| CN114220725B (zh) | 2020-12-02 | 2024-05-07 | 聚束科技（北京）有限公司 | 一种电子显微镜 |
| CN114256043B (zh) | 2020-12-02 | 2024-04-05 | 聚束科技（北京）有限公司 | 一种电子束系统 |
| US12339241B2 (en) * | 2021-05-11 | 2025-06-24 | Nuflare Technology, Inc. | Multiple secondary electron beam alignment method, multiple secondary electron beam alignment apparatus, and electron beam inspection apparatus |
| JP7307768B2 (ja) | 2021-07-08 | 2023-07-12 | 日本電子株式会社 | 走査電子顕微鏡および対物レンズ |
| US20250087442A1 (en) * | 2023-09-07 | 2025-03-13 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Electron beam apparatus, foil or grid lens, and method of operating an electron beam apparatus |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5644132A (en) | 1994-06-20 | 1997-07-01 | Opan Technologies Ltd. | System for high resolution imaging and measurement of topographic and material features on a specimen |
| DE69504294T2 (de) | 1994-12-19 | 1999-04-08 | Opal Technologies Ltd., Nes Ziona | System zur Hochauflösungsbildgebung und Messung von topographischen Characteristiken und Materialcharakteristiken einer Probe |
| JP2001110351A (ja) | 1999-10-05 | 2001-04-20 | Hitachi Ltd | 走査電子顕微鏡 |
| JP2001124713A (ja) * | 1999-10-27 | 2001-05-11 | Hitachi Ltd | 回路パターン検査装置、および回路パターン検査方法 |
| JP5033310B2 (ja) * | 2005-02-18 | 2012-09-26 | 株式会社日立ハイテクノロジーズ | 検査装置 |
| JP4913854B2 (ja) * | 2008-10-08 | 2012-04-11 | アイシーティー インテグレーテッド サーキット テスティング ゲゼルシャフト フィーア ハルプライタープリーフテヒニック エム ベー ハー | 荷電粒子検出装置及び検出方法 |
| US7947953B2 (en) * | 2008-10-08 | 2011-05-24 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Charged particle detection apparatus and detection method |
| JP5386596B2 (ja) * | 2010-01-20 | 2014-01-15 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
| JP5530980B2 (ja) | 2011-06-14 | 2014-06-25 | 株式会社アドバンテスト | パターン測定装置及びパターン測定方法 |
| US9786468B2 (en) * | 2013-02-26 | 2017-10-10 | Hitachi High-Technologies Corporation | Charged particle beam device |
| US20160336143A1 (en) * | 2015-05-15 | 2016-11-17 | Kabushiki Kaisha Toshiba | Charged particle beam apparatus and method of calibrating sample position |
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2016
- 2016-04-28 JP JP2016090682A patent/JP6727024B2/ja active Active
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2017
- 2017-04-14 US US15/487,561 patent/US10121632B2/en active Active