JP2012221942A5 - - Google Patents
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- Publication number
- JP2012221942A5 JP2012221942A5 JP2011183390A JP2011183390A JP2012221942A5 JP 2012221942 A5 JP2012221942 A5 JP 2012221942A5 JP 2011183390 A JP2011183390 A JP 2011183390A JP 2011183390 A JP2011183390 A JP 2011183390A JP 2012221942 A5 JP2012221942 A5 JP 2012221942A5
- Authority
- JP
- Japan
- Prior art keywords
- particle beam
- charged particle
- secondary charged
- particles
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002245 particle Substances 0.000 claims 58
- 230000003287 optical effect Effects 0.000 claims 10
- 238000000034 method Methods 0.000 claims 9
- 230000003796 beauty Effects 0.000 claims 3
- 230000005540 biological transmission Effects 0.000 claims 3
- 239000011163 secondary particle Substances 0.000 claims 2
- 230000000903 blocking effect Effects 0.000 claims 1
- 230000009191 jumping Effects 0.000 claims 1
- 238000000926 separation method Methods 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP11162291.6A EP2511939B1 (en) | 2011-04-13 | 2011-04-13 | Arrangement and method for the contrast improvement in a charged particle beam device for inspecting a specimen |
| EP11162291.6 | 2011-04-13 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012221942A JP2012221942A (ja) | 2012-11-12 |
| JP2012221942A5 true JP2012221942A5 (cg-RX-API-DMAC7.html) | 2014-10-09 |
| JP5791028B2 JP5791028B2 (ja) | 2015-10-07 |
Family
ID=44533263
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011183390A Expired - Fee Related JP5791028B2 (ja) | 2011-04-13 | 2011-08-25 | 試料を検査する荷電粒子ビーム装置のコントラストを向上させる装置及び方法 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US8530837B2 (cg-RX-API-DMAC7.html) |
| EP (1) | EP2511939B1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP5791028B2 (cg-RX-API-DMAC7.html) |
| TW (1) | TWI488212B (cg-RX-API-DMAC7.html) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2879155B1 (en) * | 2013-12-02 | 2018-04-25 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Multi-beam system for high throughput EBI |
| CN106165054B (zh) * | 2014-04-28 | 2018-08-28 | 株式会社日立高新技术 | 电子线装置 |
| TWI685012B (zh) * | 2014-12-22 | 2020-02-11 | 美商卡爾蔡司顯微鏡有限責任公司 | 帶電粒子束系統、用以處理樣品的方法、用以製造約瑟夫接面的方法與用以產生複數個約瑟夫接面的方法 |
| KR20170110601A (ko) * | 2015-02-05 | 2017-10-11 | 몰레큘러 템플레이츠, 인코퍼레이션. | 시가 독소 a 서브유닛 작동체 영역을 포함하는 다가 cd20 결합 분자 및 이들의 강화된 조성물 |
| JP2017135218A (ja) | 2016-01-26 | 2017-08-03 | 株式会社アドバンテスト | 荷電粒子ビームレンズ装置、荷電粒子ビームカラム、および荷電粒子ビーム露光装置 |
| JP6967340B2 (ja) * | 2016-09-13 | 2021-11-17 | 株式会社日立ハイテクサイエンス | 複合ビーム装置 |
| CN107240540A (zh) * | 2017-06-22 | 2017-10-10 | 聚束科技（北京）有限公司 | 一种观察非导电或导电不均匀样品的方法和sem |
| CZ309855B6 (cs) * | 2017-09-20 | 2023-12-20 | Tescan Group, A.S. | Zařízení s iontovým tubusem a rastrovacím elektronovým mikroskopem |
| DE102019203579A1 (de) * | 2019-03-15 | 2020-09-17 | Carl Zeiss Microscopy Gmbh | Verfahren zum Betrieb eines Teilchenstrahlgeräts sowie Teilchenstrahlgerät zur Durchführung des Verfahrens |
| JP7199290B2 (ja) * | 2019-04-08 | 2023-01-05 | 株式会社日立ハイテク | パターン断面形状推定システム、およびプログラム |
| DE102019004124B4 (de) * | 2019-06-13 | 2024-03-21 | Carl Zeiss Multisem Gmbh | Teilchenstrahl-System zur azimutalen Ablenkung von Einzel-Teilchenstrahlen sowie seine Verwendung und Verfahren zur Azimut-Korrektur bei einem Teilchenstrahl-System |
| WO2021204740A1 (en) | 2020-04-10 | 2021-10-14 | Asml Netherlands B.V. | Charged particle beam apparatus with multiple detectors and methods for imaging |
| CN113035675A (zh) * | 2021-02-26 | 2021-06-25 | 中国科学院生物物理研究所 | 带电粒子束设备 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60189855A (ja) * | 1984-03-12 | 1985-09-27 | Hitachi Ltd | ２次電子検出器 |
| US5644132A (en) | 1994-06-20 | 1997-07-01 | Opan Technologies Ltd. | System for high resolution imaging and measurement of topographic and material features on a specimen |
| WO1999050446A1 (de) | 1998-04-01 | 1999-10-07 | Wolfrum Juergen | Verfahren und vorrichtung zur quantifizierung von dna und rna |
| DE19828476A1 (de) | 1998-06-26 | 1999-12-30 | Leo Elektronenmikroskopie Gmbh | Teilchenstrahlgerät |
| US7135676B2 (en) * | 2000-06-27 | 2006-11-14 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
| JP2003331770A (ja) * | 2002-05-15 | 2003-11-21 | Seiko Instruments Inc | 電子線装置 |
| US7138629B2 (en) * | 2003-04-22 | 2006-11-21 | Ebara Corporation | Testing apparatus using charged particles and device manufacturing method using the testing apparatus |
| EP1703537B9 (en) | 2005-03-17 | 2008-10-22 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Analysing system and charged particle beam device |
| EP2219204B1 (en) * | 2009-02-12 | 2012-03-21 | ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Arrangement and method for the contrast improvement in a charged particle beam device for inspecting a specimen |
-
2011
- 2011-04-13 EP EP11162291.6A patent/EP2511939B1/en active Active
- 2011-07-29 TW TW100127092A patent/TWI488212B/zh not_active IP Right Cessation
- 2011-08-05 US US13/204,528 patent/US8530837B2/en active Active
- 2011-08-25 JP JP2011183390A patent/JP5791028B2/ja not_active Expired - Fee Related
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