JP2017193691A5 - - Google Patents

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JP2017193691A5
JP2017193691A5 JP2016086586A JP2016086586A JP2017193691A5 JP 2017193691 A5 JP2017193691 A5 JP 2017193691A5 JP 2016086586 A JP2016086586 A JP 2016086586A JP 2016086586 A JP2016086586 A JP 2016086586A JP 2017193691 A5 JP2017193691 A5 JP 2017193691A5
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resin composition
thermosetting resin
resin film
multilayer
printed wiring
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JP2016086586A
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JP2017193691A (en
JP6897008B2 (en
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Claims (21)

(a)エポキシ樹脂、(b)硬化剤、(c)無機充填材及び(d)ポリシロキサン骨格を有する樹脂を含有する熱硬化性樹脂組成物であって、A thermosetting resin composition comprising (a) an epoxy resin, (b) a curing agent, (c) an inorganic filler, and (d) a resin having a polysiloxane skeleton,
前記(c)無機充填材の含有量が、熱硬化性樹脂組成物の固形分に対して50〜90質量%であり、  The content of the (c) inorganic filler is 50 to 90% by mass with respect to the solid content of the thermosetting resin composition,
前記(d)ポリシロキサン骨格を有する樹脂の含有量が、熱硬化性樹脂組成物の固形分に対して0.01〜1質量%である、熱硬化性樹脂組成物。  Thermosetting resin composition whose content of resin which has said (d) polysiloxane structure is 0.01-1 mass% with respect to solid content of a thermosetting resin composition.
前記(b)硬化剤が、(b1)活性エステル系硬化剤及び(b2)シアネート系硬化剤からなる群から選択される少なくとも1種を含有する、請求項1に記載の熱硬化性樹脂組成物。The thermosetting resin composition according to claim 1, wherein the (b) curing agent contains at least one selected from the group consisting of (b1) an active ester curing agent and (b2) a cyanate curing agent. . 前記(b)硬化剤が、(b3)トリアジン環を含有するフェノールノボラック系硬化剤を含有する、請求項1又は2に記載の熱硬化性樹脂組成物。The thermosetting resin composition according to claim 1, wherein the curing agent (b) contains a phenol novolac curing agent containing a (b3) triazine ring. 前記(a)エポキシ樹脂が、ビスフェノールA型エポキシ樹脂、ナフタレン型エポキシ樹脂、ビフェニル骨格を有するアラルキルノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂からなる群から選択される少なくとも1種を有する、請求項1〜3のいずれか1項に記載の熱硬化性樹脂組成物。The (a) epoxy resin has at least one selected from the group consisting of bisphenol A type epoxy resin, naphthalene type epoxy resin, aralkyl novolac type epoxy resin having a biphenyl skeleton, and cresol novolac type epoxy resin. The thermosetting resin composition of any one of -3. 前記(c)無機充填材がシリカを含有する、請求項1〜4のいずれか1項に記載の熱硬化性樹脂組成物。The thermosetting resin composition according to any one of claims 1 to 4, wherein the (c) inorganic filler contains silica. 前記(c)無機充填材が、表面処理されたシリカを含有する、請求項1〜5のいずれか1項に記載の熱硬化性樹脂組成物。The thermosetting resin composition according to any one of claims 1 to 5, wherein the (c) inorganic filler contains surface-treated silica. 前記(c)無機充填材が、アミノシラン系カップリング剤で表面処理されたシリカを含有する、請求項1〜6のいずれか1項に記載の熱硬化性樹脂組成物。The thermosetting resin composition according to any one of claims 1 to 6, wherein the (c) inorganic filler contains silica surface-treated with an aminosilane coupling agent. さらに(e)フェノキシ樹脂を含有する、請求項1〜7のいずれか1項に記載の熱硬化性樹脂組成物。The thermosetting resin composition according to any one of claims 1 to 7, further comprising (e) a phenoxy resin. さらに(f)硬化促進剤を含有する、請求項1〜8のいずれか1項に記載の熱硬化性樹脂組成物。The thermosetting resin composition according to any one of claims 1 to 8, further comprising (f) a curing accelerator. 前記(f)硬化促進剤が、有機リン化合物、イミダゾール化合物及びアミン系化合物からなる群から選択される少なくとも1種の有機系硬化促進剤を含有する、請求項9に記載の熱硬化性樹脂組成物。The thermosetting resin composition according to claim 9, wherein the curing accelerator (f) contains at least one organic curing accelerator selected from the group consisting of organic phosphorus compounds, imidazole compounds and amine compounds. object. 前記(f)硬化促進剤が、金属系硬化促進剤を含有する、請求項9又は10に記載の熱硬化性樹脂組成物。The thermosetting resin composition according to claim 9, wherein the curing accelerator (f) contains a metal-based curing accelerator. 請求項1〜11のいずれか1項に記載の熱硬化性樹脂組成物を用いて形成される層間絶縁層用樹脂フィルム。The resin film for interlayer insulation layers formed using the thermosetting resin composition of any one of Claims 1-11. 多層プリント配線板のビルドアップ層形成用である、請求項12に記載の層間絶縁層用樹脂フィルム。The resin film for interlayer insulation layers according to claim 12, which is for forming a buildup layer of a multilayer printed wiring board. 請求項1〜11のいずれか1項に記載の熱硬化性樹脂組成物からなる層間絶縁層用樹脂組成物層と、接着補助層とを含有する、多層樹脂フィルム。The multilayer resin film which contains the resin composition layer for interlayer insulation layers which consists of a thermosetting resin composition of any one of Claims 1-11, and an adhesion auxiliary layer. 請求項12に記載の層間絶縁層用樹脂フィルム又は請求項14に記載の多層樹脂フィルムと、離型処理が施された有機樹脂フィルムと、を含有する、多層樹脂フィルム。A multilayer resin film comprising the resin film for an interlayer insulating layer according to claim 12 or the multilayer resin film according to claim 14, and an organic resin film subjected to a mold release treatment. 請求項12に記載の層間絶縁層用樹脂フィルム、並びに請求項14又は15に記載の多層樹脂フィルムからなる群から選択される少なくとも1種を用いて得られる、多層プリント配線板。A multilayer printed wiring board obtained using at least one selected from the group consisting of the resin film for an interlayer insulating layer according to claim 12 and the multilayer resin film according to claim 14 or 15. 請求項15に記載の多層樹脂フィルムを用いた多層プリント配線板の製造方法であって、以下の工程を有する、多層プリント配線板の製造方法。It is a manufacturing method of the multilayer printed wiring board using the multilayer resin film of Claim 15, Comprising: The manufacturing method of the multilayer printed wiring board which has the following processes.
(1)支持体付き層間絶縁層用樹脂フィルム及び支持体付き多層樹脂フィルムからなる群から選択される少なくとも1種を、回路基板の片面又は両面にラミネートする工程。(1) A step of laminating at least one selected from the group consisting of a resin film for an interlayer insulating layer with a support and a multilayer resin film with a support on one side or both sides of a circuit board.
(2)工程(1)でラミネートされた樹脂フィルムを熱硬化し、絶縁層を形成する工程。(2) A step of heat curing the resin film laminated in the step (1) to form an insulating layer.
(3)工程(2)で絶縁層を形成した回路基板に穴あけする工程。(3) A step of drilling a circuit board on which the insulating layer is formed in the step (2).
(4)絶縁層の表面を酸化剤によって粗化処理する工程。(4) A step of roughening the surface of the insulating layer with an oxidizing agent.
(5)粗化された絶縁層の表面にめっきにより導体層を形成する工程。(5) A step of forming a conductor layer by plating on the surface of the roughened insulating layer.
(6)セミアディティブ法により、導体層に回路形成する工程。(6) A step of forming a circuit on the conductor layer by a semi-additive method.
前記支持体が、離型処理が施された支持体である、請求項17に記載の多層プリント配線板の製造方法。The method for manufacturing a multilayer printed wiring board according to claim 17, wherein the support is a support subjected to release treatment. 前記工程(2)において、工程(1)でラミネートされた樹脂フィルムを、離型処理が施された支持体が付いた状態のまま熱硬化する、請求項18に記載の多層プリント配線板の製造方法。19. The multilayer printed wiring board according to claim 18, wherein the resin film laminated in step (1) is thermally cured in the step (2) with the support subjected to the release treatment being attached. Method. 前記工程(2)〜(5)のいずれかの前に、離型処理が施された支持体を剥離除去する、請求項18に記載の多層プリント配線板の製造方法。The manufacturing method of the multilayer printed wiring board of Claim 18 which peel-removes the support body to which the mold release process was performed before any of the said process (2)-(5). 前記工程(3)〜(5)のいずれかの前に、離型処理が施された支持体を剥離除去する、請求項19に記載の多層プリント配線板の製造方法。The manufacturing method of the multilayer printed wiring board of Claim 19 which peel-removes the support body to which the mold release process was performed before any of the said process (3)-(5).
JP2016086586A 2016-04-22 2016-04-22 Thermosetting resin composition for interlayer insulation layer, resin film for interlayer insulation layer, multilayer resin film, multilayer printed wiring board and its manufacturing method Active JP6897008B2 (en)

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Application Number Priority Date Filing Date Title
JP2016086586A JP6897008B2 (en) 2016-04-22 2016-04-22 Thermosetting resin composition for interlayer insulation layer, resin film for interlayer insulation layer, multilayer resin film, multilayer printed wiring board and its manufacturing method

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JP2016086586A JP6897008B2 (en) 2016-04-22 2016-04-22 Thermosetting resin composition for interlayer insulation layer, resin film for interlayer insulation layer, multilayer resin film, multilayer printed wiring board and its manufacturing method

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JP2017193691A JP2017193691A (en) 2017-10-26
JP2017193691A5 true JP2017193691A5 (en) 2019-04-18
JP6897008B2 JP6897008B2 (en) 2021-06-30

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JP6765215B2 (en) * 2016-04-27 2020-10-07 デンカ株式会社 Resin composition for circuit board and metal base circuit board using it
JP6563158B1 (en) * 2018-02-08 2019-08-21 関西ペイント株式会社 Resist composition and resist film
JP2019157027A (en) * 2018-03-15 2019-09-19 日立化成株式会社 Thermosetting resin composition, resin film for interlayer insulation, composite film, printed wiring board and method for producing the same
JP2020050797A (en) * 2018-09-27 2020-04-02 パナソニックIpマネジメント株式会社 Resin composition, prepreg, film with resin, metal foil with resin, metal-clad laminate, and printed wiring board
JP7020378B2 (en) * 2018-11-20 2022-02-16 味の素株式会社 Resin composition
JP6897895B1 (en) * 2019-08-08 2021-07-07 住友ベークライト株式会社 Thermosetting resin composition
JP7452028B2 (en) * 2020-01-23 2024-03-19 株式会社レゾナック Encapsulating resin composition, electronic component device, and method for manufacturing electronic component device

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JP3714377B2 (en) * 1997-05-23 2005-11-09 信越化学工業株式会社 Flame retardant epoxy resin composition
JP2006282824A (en) * 2005-03-31 2006-10-19 Somar Corp Epoxy resin composition for protecting electronic component, and semiconductor device using the same
JP5090635B2 (en) * 2005-09-20 2012-12-05 住友ベークライト株式会社 Resin composition, insulating sheet with substrate, and multilayer printed wiring board
JP2010090237A (en) * 2008-10-07 2010-04-22 Ajinomoto Co Inc Epoxy resin composition
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