JP2017168706A5 - - Google Patents
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- Publication number
- JP2017168706A5 JP2017168706A5 JP2016053379A JP2016053379A JP2017168706A5 JP 2017168706 A5 JP2017168706 A5 JP 2017168706A5 JP 2016053379 A JP2016053379 A JP 2016053379A JP 2016053379 A JP2016053379 A JP 2016053379A JP 2017168706 A5 JP2017168706 A5 JP 2017168706A5
- Authority
- JP
- Japan
- Prior art keywords
- view
- sectional
- cross
- showing
- liquid crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 description 14
- 239000004973 liquid crystal related substance Substances 0.000 description 13
- 239000000758 substrate Substances 0.000 description 3
Description
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016053379A JP6425676B2 (ja) | 2016-03-17 | 2016-03-17 | 表示装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016053379A JP6425676B2 (ja) | 2016-03-17 | 2016-03-17 | 表示装置の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2017168706A JP2017168706A (ja) | 2017-09-21 |
| JP2017168706A5 true JP2017168706A5 (ja) | 2017-11-09 |
| JP6425676B2 JP6425676B2 (ja) | 2018-11-21 |
Family
ID=59909161
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2016053379A Active JP6425676B2 (ja) | 2016-03-17 | 2016-03-17 | 表示装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6425676B2 (ja) |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001324725A (ja) * | 2000-05-12 | 2001-11-22 | Hitachi Ltd | 液晶表示装置およびその製造方法 |
| US7781850B2 (en) * | 2002-09-20 | 2010-08-24 | Qualcomm Mems Technologies, Inc. | Controlling electromechanical behavior of structures within a microelectromechanical systems device |
| JP4461873B2 (ja) * | 2004-03-29 | 2010-05-12 | カシオ計算機株式会社 | 亜鉛酸化物の加工方法および薄膜トランジスタの製造方法 |
| KR101143005B1 (ko) * | 2004-12-14 | 2012-05-08 | 삼성전자주식회사 | 마스크 및 이를 이용한 반도체 소자의 제조 방법 및 박막트랜지스터 표시판의 제조 방법 |
| JP5377940B2 (ja) * | 2007-12-03 | 2013-12-25 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| JP5308831B2 (ja) * | 2009-01-08 | 2013-10-09 | 三菱電機株式会社 | 積層構造体及びその製造方法 |
| KR101582946B1 (ko) * | 2009-12-04 | 2016-01-08 | 삼성디스플레이 주식회사 | 박막 트랜지스터 표시판 및 그 제조 방법 |
-
2016
- 2016-03-17 JP JP2016053379A patent/JP6425676B2/ja active Active
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