JP2017106106A - スパッタ装置、膜の製造方法及び電子デバイスの製造方法 - Google Patents
スパッタ装置、膜の製造方法及び電子デバイスの製造方法 Download PDFInfo
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Abstract
【解決手段】真空チャンバ内で被成膜部材に膜を形成するスパッタ装置であって、ターゲットが設けられるカソードと、真空チャンバ内にガスを供給するガス供給部と、膜を形成する際に発生させるプラズマの発光強度を検出する発光強度検出器と、前記プラズマの光を前記発光強度検出器に導入する複数の光導入部と、前記発光強度検出器を、前記複数の光導入部のいずれか1つと選択的に接続するための切替スイッチ部とを備える。
【選択図】図2
Description
ターゲットが設けられるカソードと、
真空チャンバ内にガスを供給するガス供給部と、
膜を形成する際に発生させるプラズマの発光強度を検出する発光強度検出器と、
前記プラズマの光を前記発光強度検出器に導入する複数の光導入部と、
前記発光強度検出器を、前記複数の光導入部のいずれか1つと選択的に接続するための切替スイッチ部と、を具備することを特徴とするスパッタ装置に係るものである。
2 被成膜部材
3 カソード
4 ガス供給部
5 発光強度検出器
6 光導入部
7 切替スイッチ部
8 CPU部
14 較正光源
15 パージガス導入部
16 制御機構
Claims (12)
- 真空チャンバ内で被成膜部材に膜を形成するスパッタ装置であって、
ターゲットが設けられるカソードと、
真空チャンバ内にガスを供給するガス供給部と、
膜を形成する際に発生させるプラズマの発光強度を検出する発光強度検出器と、
前記プラズマの光を前記発光強度検出器に導入する複数の光導入部と、
前記発光強度検出器を、前記複数の光導入部のいずれか1つと選択的に接続するための切替スイッチ部と、を備えることを特徴とするスパッタ装置。 - 前記発光強度検出器で検出される発光強度が予め設定された発光強度となるように前記ガス供給部からのガスの供給量を制御する制御機構を備えることを特徴とする請求項1に記載のスパッタ装置。
- 前記発光強度検出器が周期的に複数の前記光導入部のいずれか1つと順次接続するように前記切替スイッチ部を制御するスイッチ制御機構を備えることを特徴とする請求項1,2のいずれか1項に記載のスパッタ装置。
- 前記光導入部が、コリメータ構造を有していることを特徴とする請求項1〜3のいずれか1項に記載のスパッタ装置。
- 前記光導入部が、貫通孔を有する導入部材と、前記貫通孔に設けられたコリメータレンズと、を備えることを特徴とする請求項4に記載のスパッタ装置。
- 前記光導入部が、貫通孔を有する導入部材と、前記プラズマの光を前記発光強度検出部へと導く光ファイバーに接続される接続部と、を備えており、
前記貫通孔の前記接続部側の径が前記プラズマの光が入射する側の径よりも小さいことを特徴とする請求項4に記載のスパッタ装置。 - 前記導入部材と前記接続部との間に防着部材を備えることを特徴とする請求項6に記載のスパッタ装置。
- 前記光導入部が、前記導入部材の内部にパージガスを導入するためのパージガス導入部を備えることを特徴とする請求項4〜7のいずれか1項に記載のスパッタ装置。
- 前記切替スイッチ部が、前記発光強度検出器を較正光源に接続するための切替端子を有していることを特徴とする請求項1〜8のいずれか1項に記載のスパッタ装置。
- 前記制御機構が、自動的にガスを増減してその際の指定波長の発光強度を自動取得し、制御機構のCPU部に接続したモニター上にグラフ化して表示するヒステリシス特性取得手段を備えることを特徴とする請求項1〜9のいずれか1項に記載のスパッタ装置。
- 被成膜部材にスパッタ法を用いて膜を形成する膜の製造方法であって、
被成膜部材を真空チャンバ内に設置する工程と、
前記真空チャンバ内に導入するガス流量を調整する工程と、
ターゲットが設けられるカソードに電圧を印加してプラズマを発生させる工程と、を含んでおり、
1つの発光強度検出器で前記プラズマの発光強度を複数個所にて順次検出し、検出結果が所定の発光強度となるよう前記ガス流量を調整することを特徴とする膜の製造方法。 - 真空チャンバ内でスパッタ法を用いて膜を形成する工程と、蒸着、CVD、塗布からなる群から選ばれる少なくとも1つの方法で膜を形成する工程と、を少なくとも有する電子デバイスの製造方法であって、
前記スパッタ法を用いて膜を形成する工程中に、
1つの発光強度検出器でプラズマの発光強度を複数個所にて順次検出し、検出結果が所定の発光強度となるよう前記真空チャンバへの導入ガス流量を調整することを特徴とする電子デバイスの製造方法。
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Application Number | Priority Date | Filing Date | Title |
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TW105138893A TW201739942A (zh) | 2015-12-01 | 2016-11-25 | 濺鍍裝置、膜的製造方法及電子裝置的製造方法 |
KR1020160161438A KR20170064485A (ko) | 2015-12-01 | 2016-11-30 | 스퍼터 장치, 막의 제조 방법 및 전자 디바이스의 제조 방법 |
CN201611095077.7A CN106811727A (zh) | 2015-12-01 | 2016-12-01 | 溅射装置、膜的制造方法和电子器件的制造方法 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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US10871396B2 (en) | 2019-04-05 | 2020-12-22 | Samsung Electronics Co., Ltd. | Optical emission spectroscopy calibration device and system including the same |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08106992A (ja) * | 1994-03-24 | 1996-04-23 | Hitachi Ltd | プラズマ処理方法およびその装置 |
JP2005228727A (ja) * | 2003-04-24 | 2005-08-25 | Tokyo Electron Ltd | プラズマモニタリング方法、プラズマモニタリング装置及びプラズマ処理装置 |
JP2006219753A (ja) * | 2005-02-14 | 2006-08-24 | Shincron:Kk | 薄膜形成装置 |
JP2010262887A (ja) * | 2009-05-11 | 2010-11-18 | Konica Minolta Holdings Inc | プラズマ測定装置 |
JP2014201800A (ja) * | 2013-04-05 | 2014-10-27 | リンテック株式会社 | 透明導電フィルム、および透明導電フィルムの形成方法 |
-
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- 2016-11-11 JP JP2016220821A patent/JP2017106106A/ja active Pending
- 2016-11-25 TW TW105138893A patent/TW201739942A/zh unknown
- 2016-11-30 KR KR1020160161438A patent/KR20170064485A/ko unknown
- 2016-12-01 CN CN201611095077.7A patent/CN106811727A/zh active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08106992A (ja) * | 1994-03-24 | 1996-04-23 | Hitachi Ltd | プラズマ処理方法およびその装置 |
JP2005228727A (ja) * | 2003-04-24 | 2005-08-25 | Tokyo Electron Ltd | プラズマモニタリング方法、プラズマモニタリング装置及びプラズマ処理装置 |
JP2006219753A (ja) * | 2005-02-14 | 2006-08-24 | Shincron:Kk | 薄膜形成装置 |
JP2010262887A (ja) * | 2009-05-11 | 2010-11-18 | Konica Minolta Holdings Inc | プラズマ測定装置 |
JP2014201800A (ja) * | 2013-04-05 | 2014-10-27 | リンテック株式会社 | 透明導電フィルム、および透明導電フィルムの形成方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10871396B2 (en) | 2019-04-05 | 2020-12-22 | Samsung Electronics Co., Ltd. | Optical emission spectroscopy calibration device and system including the same |
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CN106811727A (zh) | 2017-06-09 |
KR20170064485A (ko) | 2017-06-09 |
TW201739942A (zh) | 2017-11-16 |
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