JP2017045802A - 光伝導素子 - Google Patents
光伝導素子 Download PDFInfo
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- JP2017045802A JP2017045802A JP2015166053A JP2015166053A JP2017045802A JP 2017045802 A JP2017045802 A JP 2017045802A JP 2015166053 A JP2015166053 A JP 2015166053A JP 2015166053 A JP2015166053 A JP 2015166053A JP 2017045802 A JP2017045802 A JP 2017045802A
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- 239000004065 semiconductor Substances 0.000 claims abstract description 211
- 238000010521 absorption reaction Methods 0.000 claims abstract description 85
- 230000005684 electric field Effects 0.000 claims abstract description 61
- 238000001514 detection method Methods 0.000 claims abstract description 34
- 230000003287 optical effect Effects 0.000 claims abstract description 23
- 230000001902 propagating effect Effects 0.000 claims abstract description 9
- 239000000463 material Substances 0.000 claims description 40
- 239000000758 substrate Substances 0.000 claims description 27
- 238000002198 surface plasmon resonance spectroscopy Methods 0.000 claims description 22
- 238000005259 measurement Methods 0.000 claims description 21
- 238000004519 manufacturing process Methods 0.000 claims description 19
- 238000005530 etching Methods 0.000 claims description 9
- 239000013307 optical fiber Substances 0.000 claims description 9
- 229910001218 Gallium arsenide Inorganic materials 0.000 claims description 8
- 238000009826 distribution Methods 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 4
- 229910000673 Indium arsenide Inorganic materials 0.000 claims description 3
- 239000000284 extract Substances 0.000 claims description 3
- RPQDHPTXJYYUPQ-UHFFFAOYSA-N indium arsenide Chemical compound [In]#[As] RPQDHPTXJYYUPQ-UHFFFAOYSA-N 0.000 claims description 3
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 claims description 2
- WPYVAWXEWQSOGY-UHFFFAOYSA-N indium antimonide Chemical compound [Sb]#[In] WPYVAWXEWQSOGY-UHFFFAOYSA-N 0.000 claims description 2
- 230000009467 reduction Effects 0.000 abstract description 2
- 230000003247 decreasing effect Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 245
- 230000005284 excitation Effects 0.000 description 55
- 239000010931 gold Substances 0.000 description 26
- 238000000034 method Methods 0.000 description 16
- 239000000969 carrier Substances 0.000 description 12
- 239000010936 titanium Substances 0.000 description 11
- 238000010586 diagram Methods 0.000 description 10
- 230000000737 periodic effect Effects 0.000 description 10
- 210000004556 brain Anatomy 0.000 description 8
- 229910004298 SiO 2 Inorganic materials 0.000 description 7
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 239000010453 quartz Substances 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 229910052737 gold Inorganic materials 0.000 description 5
- 230000031700 light absorption Effects 0.000 description 5
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 5
- 238000005086 pumping Methods 0.000 description 5
- 239000000523 sample Substances 0.000 description 5
- 206010028980 Neoplasm Diseases 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000001228 spectrum Methods 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 230000002238 attenuated effect Effects 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 229910052697 platinum Inorganic materials 0.000 description 3
- 230000010287 polarization Effects 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- 229910000980 Aluminium gallium arsenide Inorganic materials 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- 238000004380 ashing Methods 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 230000004807 localization Effects 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 238000000879 optical micrograph Methods 0.000 description 2
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 238000004611 spectroscopical analysis Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 1
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- KXNLCSXBJCPWGL-UHFFFAOYSA-N [Ga].[As].[In] Chemical compound [Ga].[As].[In] KXNLCSXBJCPWGL-UHFFFAOYSA-N 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 210000005013 brain tissue Anatomy 0.000 description 1
- 210000003855 cell nucleus Anatomy 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000002178 crystalline material Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 230000000644 propagated effect Effects 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000002040 relaxant effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
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- H—ELECTRICITY
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Abstract
Description
第1の実施形態の光伝導素子100(以下、「素子100」と呼ぶ)について図1を参照して説明する。図1(a)は素子100の構成を説明する上面図であり、図1(b)は図1(a)のA−A断面図、図1(c)は図1(a)のB−B断面図である。素子100は、半導体層110と、基板111と、複数の電極(バイアスライン)102と、構造部101とを有する。
第2の実施形態の光伝導素子200(以下、「素子200」と呼ぶ)について図3を参照して説明する。第1の実施形態と共通する部分の説明は省略する。図3(a)は、半導体層110の表面において周期方向と直交する方向における素子200の断面図で、図3(b)は、周期方向における素子200の断面図である。第1の実施形態の素子100は、半導体層110の表面は平面であり、その上に構造部101が配置されていた。それに対し、素子200では、半導体層110は、その表面に凹凸を有しており、凹部320に構造部101の格子120が配置されている。
第3の実施形態の光伝導素子300(以下、「素子300」と呼ぶ)について図4を参照して説明する。これまでの説明と共通する部分の説明は省略する。第1の実施形態で説明した通り基板111上に半導体層110を配置する場合には、基板111は、半導体層110のフォノン吸収周波数fFよりも大きい周波数においてフォノン吸収がある、もしくはフォノン吸収がない材料を用いることが望ましい。さらには、広い周波数帯域のテラヘルツ波に対して吸収がなく、できるだけテラヘルツ波に広周波のテラヘルツ波に対して透明なSiを用いることが望ましいことを述べた。
第4の実施形態の光伝導素子400(以下、「素子400」と呼ぶ)について、図5を参照して説明する。これまでの説明と共通する部分の説明は省略する。図5は、素子400の構成を説明する図である。図5(a)は、半導体層110の表面において周期方向と直交する方向における素子200の断面図で、図5(b)は、周期方向における素子200の断面図である。
第5の実施形態の光伝導素子500(以下、「素子500」と呼ぶ)について、図6を参照して説明する。図6は、素子500の構成を説明する図である。本実施形態の素子500は、光ファイバ140が接続されている。その他の構成は、第1の実施形態と同様であるため説明を省略する。
第6の実施形態では、上述の各実施形態に記載の光伝導素子のいずれかを用いた測定装置600(以下、「装置600」と呼ぶ)について、図7を参照して説明する。これまでの説明と共通する部分の説明は省略する。図7は、装置600の構成を説明する図である。装置600は、テラヘルツ波時間領域分光(THz−TDS:THz Time−Domain Spectroscopy)法を用いてテラヘルツ波パルスの時間波形を取得するTHz−TDS装置である。THz−TDS装置の基本的な構成は、従来から知られているものと基本的に同様なので、概要のみを説明する。
101 構造部
102 電極(バイアスライン)
110 半導体層
Claims (22)
- 半導体層と、
前記半導体層と接しており、光により表面プラズモン波を励起する構造部と、
前記構造部と電気的に接続している電極と、を有し、
前記半導体層内を前記半導体層と前記構造部との界面の垂直方向に伝搬する前記表面プラズモン波の電界強度が、前記界面における前記表面プラズモン波の電界強度の1/e倍となる距離を第1の伝搬距離とし、
前記半導体層内を前記垂直方向に伝搬する前記半導体層の光学フォノン吸収周波数のテラヘルツ波の電界強度が、前記界面における前記テラヘルツ波の電界強度の1/e2となる距離を第2の伝搬距離とすると、
前記半導体層の厚さは、前記第1の伝搬距離以上、前記第2の伝搬距離以下である
ことを特徴とする光伝導素子。 - 前記半導体層の厚さは、下記(1)式を満たす
ことを特徴とする請求項1に記載の光伝導素子。
ここで、前記半導体層の厚さをtS、前記光の波長をλ、前記光の波長λにおける前記構造部の材料の複素誘電率をεg、前記構造部と接する物質の複素誘電率の分布で決定される実効複素誘電率をεp、前記テラヘルツ波の吸収係数をαとする。 - 前記半導体層は、凸部と、周期的に配置されている複数の凹部と、を有する面を有し、
前記構造部は、前記複数の凹部のそれぞれに配置されている格子を有する
ことを特徴とする請求項1又は2に記載の光伝導素子。 - 前記半導体層の前記構造部が配置されている領域の厚さは、前記半導体層の前記構造部が配置されていない領域の少なくとも一部の厚さより厚い
ことを特徴とする請求項1又は2に記載の光伝導素子。 - 前記半導体層は、表面プラズモン波を励起し得る領域のみに配置されている
ことを特徴とする請求項1又は2に記載の光伝導素子。 - 前記半導体層は、前記構造部が配置されている光伝導層と、前記光伝導層を挟んで前記構造部が配置されている面の反対側に配置されているバッファ層と、を有する
ことを特徴とする請求項1乃至5のいずれか一項に記載の光伝導素子。 - 前記半導体層を挟んで前記構造部が配置されている面の反対側に配置されているバッファ層を更に有する
ことを特徴とする請求項1乃至6のいずれか一項に記載の光伝導素子。 - 前記構造部は、周期的に配置されている複数の格子を有する
ことを特徴とする請求項1乃至7のいずれか一項に記載の光伝導素子。 - 前記半導体層はGaAs、InGaAs、InAs、InSb、InAsSb、InGaSb、InP、Ge、GaNの少なくともいずれかを含む
ことを特徴とする請求項1乃至8のいずれか一項に記載の光伝導素子。 - 前記半導体層を挟んで前記構造部が配置されている面の反対側に配置されている基板を更に有する
ことを特徴とする請求項1乃至9のいずれか一項に記載の光伝導素子。 - 前記基板は、光学フォノン吸収が起こらない、又は、光学フォノン吸収周波数が前記半導体層の光学フォノン吸収周波数より大きい
ことを特徴とする請求項10に記載の光伝導素子。 - 前記構造部は、前記光が入射する面に配置されている反射防止膜を有する
ことを特徴とする請求項1乃至11のいずれか一項に記載の光伝導素子。 - 前記電極は、前記半導体層と接して配置されている
ことを特徴とする請求項1乃至12のいずれか一項に記載の光伝導素子。 - 前記電極を第1の電極とすると、前記第1の電極と間隙を有して配置されている第2の電極を更に有する
ことを特徴とする請求項1乃至13のいずれか一項に記載の光伝導素子。 - 前記半導体層の前記構造部が配置されている面上に前記第2の電極と電気的に接続されており、前記光により表面プラズモン共鳴を生じる構造部を更に有する
ことを特徴とする請求項14に記載の光伝導素子。 - 前記第2の電極は、前記半導体層と接している
ことを特徴とする請求項14又は15に記載の光伝導素子。 - 下記(2)式を満たす
ことを特徴とする請求項1乃至16のいずれか一項に記載の光伝導素子。
ここで、前記光の速度をc、前記光の波長をλ、前記光の角振動数をω、前記光の入射角をθ、前記光の波長λにおける前記構造部の複素誘電率をεg、前記構造部と接する物質の複素誘電率の分布で決定される実効的複素誘電率をεp、任意の正の整数をm、Re()を括弧内の複素数の実部を取りだす関数とする。 - 前記光を前記構造部に導く光ファイバを更に有する
ことを特徴とする請求項1乃至17のいずれか一項に記載の光伝導素子。 - 前記半導体層のバンドギャップエネルギーに相当する光の波長は、前記光の波長より短い
ことを特徴とする請求項1乃至18のいずれか一項に記載の光伝導素子。 - 光が入射することによりテラヘルツ波を発生する発生部と、
測定物を透過した又は前記測定物で反射したテラヘルツ波を検出部する検出部と、を有し、
前記発生部と前記検出部との少なくとも一方は、請求項1乃至19のいずれか一項に記載の光伝導素子を含む
ことを特徴とする測定装置。 - 光伝導素子の製造方法であって、
半導体層を形成する工程と、
前記半導体層上に第1の層と第2の層と第3の層とをこの順に形成する工程と、
前記第3の層をマスクとして前記第2の層をエッチングする工程と、
前記第3の層を除去する工程と、
前記第2の層をマスクとして前記第1の層のエッチングを行う工程と、
前記第2の層を除去する工程と、を有する
ことを特徴とする製造方法。 - 光伝導素子の製造方法であって、
半導体層を形成する工程と、
前記半導体層上に第1の層と第2の層と第3の層とをこの順に形成する工程と、
前記第3の層をマスクとして前記第2の層をエッチングする工程と、
前記第2の層をマスクとして前記第1の層と前記半導体層とをエッチングする工程と、
前記第3の層を除去する工程と、
前記第2の層をマスクとして前記第1の層と前記半導体層をエッチングする工程と
前記エッチングされた前記半導体層上に第4の層を形成する工程と、
前記第1の層と前記第2の層とをリフトオフする工程と、を有する
ことを特徴とする製造方法。
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