JP2017045790A5 - - Google Patents

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Publication number
JP2017045790A5
JP2017045790A5 JP2015165771A JP2015165771A JP2017045790A5 JP 2017045790 A5 JP2017045790 A5 JP 2017045790A5 JP 2015165771 A JP2015165771 A JP 2015165771A JP 2015165771 A JP2015165771 A JP 2015165771A JP 2017045790 A5 JP2017045790 A5 JP 2017045790A5
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JP
Japan
Prior art keywords
plasma
processing chamber
processing apparatus
disposed
plasma processing
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JP2015165771A
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English (en)
Japanese (ja)
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JP2017045790A (ja
JP6546041B2 (ja
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Priority to JP2015165771A priority Critical patent/JP6546041B2/ja
Priority claimed from JP2015165771A external-priority patent/JP6546041B2/ja
Publication of JP2017045790A publication Critical patent/JP2017045790A/ja
Publication of JP2017045790A5 publication Critical patent/JP2017045790A5/ja
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JP2015165771A 2015-08-25 2015-08-25 プラズマ処理装置 Active JP6546041B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2015165771A JP6546041B2 (ja) 2015-08-25 2015-08-25 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015165771A JP6546041B2 (ja) 2015-08-25 2015-08-25 プラズマ処理装置

Publications (3)

Publication Number Publication Date
JP2017045790A JP2017045790A (ja) 2017-03-02
JP2017045790A5 true JP2017045790A5 (https=) 2018-09-06
JP6546041B2 JP6546041B2 (ja) 2019-07-17

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ID=58211753

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JP2015165771A Active JP6546041B2 (ja) 2015-08-25 2015-08-25 プラズマ処理装置

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JP (1) JP6546041B2 (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2024089806A (ja) * 2022-12-22 2024-07-04 株式会社日立ハイテク プラズマ処理装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5438680Y2 (https=) * 1976-06-11 1979-11-16
JPS56123738U (https=) * 1980-02-18 1981-09-21
JPH06216042A (ja) * 1993-01-18 1994-08-05 Hitachi Ltd プラズマプロセシング装置及びその運転方法
JP3432720B2 (ja) * 1997-09-12 2003-08-04 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理方法
JP2000173986A (ja) * 1998-12-01 2000-06-23 Hitachi Ltd エッチング装置
US7558045B1 (en) * 2008-03-20 2009-07-07 Novellus Systems, Inc. Electrostatic chuck assembly with capacitive sense feature, and related operating method
JP5756974B2 (ja) * 2011-12-06 2015-07-29 株式会社デンソー 半導体装置の製造方法、半導体エッチングプロセスにおける計測方法
JP2015138931A (ja) * 2014-01-24 2015-07-30 株式会社日立ハイテクノロジーズ 真空処理装置および真空処理方法

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