JP2016535299A5 - - Google Patents

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Publication number
JP2016535299A5
JP2016535299A5 JP2016525042A JP2016525042A JP2016535299A5 JP 2016535299 A5 JP2016535299 A5 JP 2016535299A5 JP 2016525042 A JP2016525042 A JP 2016525042A JP 2016525042 A JP2016525042 A JP 2016525042A JP 2016535299 A5 JP2016535299 A5 JP 2016535299A5
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JP
Japan
Prior art keywords
substrate
processing
alignment
web
distortion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2016525042A
Other languages
English (en)
Japanese (ja)
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JP2016535299A (ja
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Publication date
Application filed filed Critical
Priority claimed from PCT/US2014/057348 external-priority patent/WO2015060983A1/en
Publication of JP2016535299A publication Critical patent/JP2016535299A/ja
Publication of JP2016535299A5 publication Critical patent/JP2016535299A5/ja
Pending legal-status Critical Current

Links

JP2016525042A 2013-10-22 2014-09-25 ウェブベース処理用のマスクレスリソグラフィ Pending JP2016535299A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361894328P 2013-10-22 2013-10-22
US61/894,328 2013-10-22
PCT/US2014/057348 WO2015060983A1 (en) 2013-10-22 2014-09-25 Maskless lithography for web based processing

Publications (2)

Publication Number Publication Date
JP2016535299A JP2016535299A (ja) 2016-11-10
JP2016535299A5 true JP2016535299A5 (enExample) 2017-11-02

Family

ID=52993357

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016525042A Pending JP2016535299A (ja) 2013-10-22 2014-09-25 ウェブベース処理用のマスクレスリソグラフィ

Country Status (7)

Country Link
US (1) US10073350B2 (enExample)
EP (1) EP3060961A4 (enExample)
JP (1) JP2016535299A (enExample)
KR (1) KR20160077116A (enExample)
CN (2) CN106896647B (enExample)
TW (1) TWI659269B (enExample)
WO (1) WO2015060983A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI753865B (zh) * 2015-11-03 2022-02-01 以色列商奧寶科技有限公司 用於高解析度電子圖案化的無針跡直接成像
CA2924160A1 (en) * 2016-03-18 2017-09-18 Chaji, Reza Maskless patterning
JP6832170B2 (ja) * 2017-01-20 2021-02-24 旭化成株式会社 可撓性基板の歪量検出方法
US10585360B2 (en) * 2017-08-25 2020-03-10 Applied Materials, Inc. Exposure system alignment and calibration method

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5691541A (en) * 1996-05-14 1997-11-25 The Regents Of The University Of California Maskless, reticle-free, lithography
US6246064B1 (en) * 1997-09-03 2001-06-12 Hitachi, Ltd. Electron beam drawing apparatus
TWI230837B (en) 2002-12-16 2005-04-11 Asml Netherlands Bv Lithographic apparatus with alignment subsystem, device manufacturing method using alignment, and alignment structure
JP2005003799A (ja) 2003-06-10 2005-01-06 Fuji Photo Film Co Ltd 感光性板状部材吸着機構及び画像記録装置
JP4612412B2 (ja) * 2004-08-06 2011-01-12 富士通セミコンダクター株式会社 半導体装置の製造方法
US7102733B2 (en) * 2004-08-13 2006-09-05 Asml Holding N.V. System and method to compensate for static and dynamic misalignments and deformations in a maskless lithography tool
JP2006098719A (ja) * 2004-09-29 2006-04-13 Fuji Photo Film Co Ltd 露光装置
JP2006098725A (ja) * 2004-09-29 2006-04-13 Fuji Photo Film Co Ltd 描画位置の補正方法と、描画位置を補正可能な描画装置
JP2006098727A (ja) * 2004-09-29 2006-04-13 Fuji Photo Film Co Ltd 伸縮状態の検出手段を設けた長尺の可撓性記録媒体と、この可撓性記録媒体に伸縮状態を補正して画像を描画可能な描画方法及び装置
KR20060051977A (ko) 2004-09-30 2006-05-19 후지 샤신 필름 가부시기가이샤 묘화 방법 및 장치
JP4491311B2 (ja) * 2004-09-30 2010-06-30 富士フイルム株式会社 画像記録装置及び画像記録方法
JP2006235448A (ja) * 2005-02-28 2006-09-07 Fuji Photo Film Co Ltd 画像記録システム、画像記録方法、プログラムおよび画像形成方法
JP2006349945A (ja) * 2005-06-15 2006-12-28 Fujifilm Holdings Corp 露光装置
US7368207B2 (en) 2006-03-31 2008-05-06 Eastman Kodak Company Dynamic compensation system for maskless lithography
US20090042139A1 (en) 2007-04-10 2009-02-12 Nikon Corporation Exposure method and electronic device manufacturing method
JP2010122526A (ja) * 2008-11-20 2010-06-03 Shinko Electric Ind Co Ltd マスクレス露光方法
CN102301280B (zh) * 2008-12-23 2014-11-26 3M创新有限公司 卷到卷数字光刻法
WO2010134018A2 (en) * 2009-05-20 2010-11-25 Mapper Lithography Ip B.V. Pattern data conversion for lithography system
JP2013045815A (ja) * 2011-08-23 2013-03-04 Nikon Corp 露光方法及びデバイス製造方法
JP5874126B2 (ja) * 2011-08-24 2016-03-02 株式会社ブイ・テクノロジー フィルム露光装置
TWI641915B (zh) * 2012-01-12 2018-11-21 尼康股份有限公司 基板處理裝置、基板處理方法、及圓筒狀光罩

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