JP2016522734A - プラズマシステムを用いる高処理量粒子産生 - Google Patents

プラズマシステムを用いる高処理量粒子産生 Download PDF

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Publication number
JP2016522734A
JP2016522734A JP2016501681A JP2016501681A JP2016522734A JP 2016522734 A JP2016522734 A JP 2016522734A JP 2016501681 A JP2016501681 A JP 2016501681A JP 2016501681 A JP2016501681 A JP 2016501681A JP 2016522734 A JP2016522734 A JP 2016522734A
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JP
Japan
Prior art keywords
production system
nanoparticle production
plasma gun
pressure
nanoparticle
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JP2016501681A
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English (en)
Japanese (ja)
Inventor
マクシミリアン エー. ビーバーガー,
マクシミリアン エー. ビーバーガー,
デイビッド リーモン,
デイビッド リーモン,
フレデリック ピー. レイマン,
フレデリック ピー. レイマン,
ポール レフィブレ,
ポール レフィブレ,
Original Assignee
エスディーシーマテリアルズ, インコーポレイテッド
エスディーシーマテリアルズ, インコーポレイテッド
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Application filed by エスディーシーマテリアルズ, インコーポレイテッド, エスディーシーマテリアルズ, インコーポレイテッド filed Critical エスディーシーマテリアルズ, インコーポレイテッド
Publication of JP2016522734A publication Critical patent/JP2016522734A/ja
Pending legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches
    • H05H1/32Plasma torches using an arc
    • H05H1/42Plasma torches using an arc with provisions for introducing materials into the plasma, e.g. powder, liquid

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
  • Manufacture Of Metal Powder And Suspensions Thereof (AREA)
JP2016501681A 2013-03-14 2014-03-12 プラズマシステムを用いる高処理量粒子産生 Pending JP2016522734A (ja)

Applications Claiming Priority (13)

Application Number Priority Date Filing Date Title
US201361784299P 2013-03-14 2013-03-14
US61/784,299 2013-03-14
US201361864350P 2013-08-09 2013-08-09
US61/864,350 2013-08-09
US201361885998P 2013-10-02 2013-10-02
US201361885990P 2013-10-02 2013-10-02
US201361885996P 2013-10-02 2013-10-02
US201361885988P 2013-10-02 2013-10-02
US61/885,996 2013-10-02
US61/885,990 2013-10-02
US61/885,998 2013-10-02
US61/885,988 2013-10-02
PCT/US2014/024933 WO2014159736A1 (en) 2013-03-14 2014-03-12 High-throughput particle production using a plasma system

Publications (1)

Publication Number Publication Date
JP2016522734A true JP2016522734A (ja) 2016-08-04

Family

ID=51625239

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016501681A Pending JP2016522734A (ja) 2013-03-14 2014-03-12 プラズマシステムを用いる高処理量粒子産生

Country Status (13)

Country Link
EP (1) EP2974560A4 (ru)
JP (1) JP2016522734A (ru)
KR (1) KR20150128732A (ru)
CN (1) CN105284193B (ru)
AU (1) AU2014244509A1 (ru)
BR (1) BR112015022424A2 (ru)
CA (1) CA2903449A1 (ru)
HK (1) HK1220857A1 (ru)
IL (1) IL241205A0 (ru)
MX (1) MX2015011656A (ru)
RU (1) RU2015143900A (ru)
TW (1) TW201446325A (ru)
WO (1) WO2014159736A1 (ru)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106378460A (zh) * 2016-09-22 2017-02-08 成都优材科技有限公司 制备纯钛或钛合金粉末的等离子雾化方法及设备
US10124406B2 (en) 2017-04-05 2018-11-13 Panasonic Intellectual Property Management Co., Ltd. Production apparatus and production method for fine particles
JP2019122925A (ja) * 2018-01-17 2019-07-25 太平洋セメント株式会社 噴霧熱分解による微粒子製造装置
JPWO2020217466A1 (ru) * 2019-04-26 2020-10-29
WO2021119863A1 (es) * 2019-12-19 2021-06-24 Universidad De Concepcion Sistema de descarga de arco en atmósfera controlable de electrodo variable consumible y electrodo fijo, con precipitador electrostático diferencial de descarga de corona, útil para la síntesis y recolección de material nanométrico de naturaleza metálica y de óxido metálico
WO2024009422A1 (ja) * 2022-07-06 2024-01-11 株式会社Fuji プラズマヘッド及びプラズマ発生装置

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017157298A (ja) * 2016-02-29 2017-09-07 シャープ株式会社 プラズマ生成装置
WO2018202827A1 (en) * 2017-05-04 2018-11-08 Umicore Ag & Co. Kg Plasma gun and plasma system for low melting point or low boiling point materials

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51100996A (ru) * 1975-02-03 1976-09-06 Ppg Industries Inc
JPS6023999A (ja) * 1983-07-19 1985-02-06 三協電業株式会社 活性化装置
JPH06269659A (ja) * 1993-03-17 1994-09-27 Nissin Electric Co Ltd 微粒子発生方法及び装置
JPH08319553A (ja) * 1995-02-14 1996-12-03 General Electric Co <Ge> 基材への皮膜の結合性を改良したプラズマ被覆法
JP2005097654A (ja) * 2003-09-24 2005-04-14 National Institute For Materials Science 超微粒子作製装置
JP2008517147A (ja) * 2004-08-04 2008-05-22 ノバセントリックス コーポレイション 炭素と金属とのナノ材料組成物および合成
JP2010526661A (ja) * 2007-05-11 2010-08-05 エスディーシー マテリアルズ インコーポレイテッド 急冷チャンバ、凝縮装置及び冷却方法
US20110143041A1 (en) * 2009-12-15 2011-06-16 SDCmaterials, Inc. Non-plugging d.c. plasma gun

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1571153A1 (de) * 1962-08-25 1970-08-13 Siemens Ag Plasmaspritzpistole
US4780591A (en) * 1986-06-13 1988-10-25 The Perkin-Elmer Corporation Plasma gun with adjustable cathode
US5225656A (en) * 1990-06-20 1993-07-06 General Electric Company Injection tube for powder melting apparatus
US6452338B1 (en) * 1999-12-13 2002-09-17 Semequip, Inc. Electron beam ion source with integral low-temperature vaporizer
CN100441501C (zh) * 2002-09-09 2008-12-10 张芬红 制备纳米氮化硅粉体的系统
EP1810001A4 (en) * 2004-10-08 2008-08-27 Sdc Materials Llc DEVICE AND METHOD FOR SAMPLING AND COLLECTING POWDERS FLOWING IN A GASSTROM
US7601294B2 (en) * 2006-05-02 2009-10-13 Babcock & Wilcox Technical Services Y-12, Llc High volume production of nanostructured materials
JP5161241B2 (ja) * 2007-02-02 2013-03-13 プラズマ スルギカル インベストメントス リミテッド プラズマスプレー装置および方法
WO2011019988A2 (en) * 2009-08-14 2011-02-17 The Regents Of The University Of Michigan DIRECT THERMAL SPRAY SYNTHESIS OF Li ION BATTERY COMPONENTS
US8895962B2 (en) * 2010-06-29 2014-11-25 Nanogram Corporation Silicon/germanium nanoparticle inks, laser pyrolysis reactors for the synthesis of nanoparticles and associated methods
US8669202B2 (en) * 2011-02-23 2014-03-11 SDCmaterials, Inc. Wet chemical and plasma methods of forming stable PtPd catalysts

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51100996A (ru) * 1975-02-03 1976-09-06 Ppg Industries Inc
JPS6023999A (ja) * 1983-07-19 1985-02-06 三協電業株式会社 活性化装置
JPH06269659A (ja) * 1993-03-17 1994-09-27 Nissin Electric Co Ltd 微粒子発生方法及び装置
JPH08319553A (ja) * 1995-02-14 1996-12-03 General Electric Co <Ge> 基材への皮膜の結合性を改良したプラズマ被覆法
JP2005097654A (ja) * 2003-09-24 2005-04-14 National Institute For Materials Science 超微粒子作製装置
JP2008517147A (ja) * 2004-08-04 2008-05-22 ノバセントリックス コーポレイション 炭素と金属とのナノ材料組成物および合成
JP2010526661A (ja) * 2007-05-11 2010-08-05 エスディーシー マテリアルズ インコーポレイテッド 急冷チャンバ、凝縮装置及び冷却方法
US20110143041A1 (en) * 2009-12-15 2011-06-16 SDCmaterials, Inc. Non-plugging d.c. plasma gun

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106378460A (zh) * 2016-09-22 2017-02-08 成都优材科技有限公司 制备纯钛或钛合金粉末的等离子雾化方法及设备
CN106378460B (zh) * 2016-09-22 2018-05-11 成都优材科技有限公司 制备球形纯钛或钛合金粉末的等离子雾化方法及设备
US10124406B2 (en) 2017-04-05 2018-11-13 Panasonic Intellectual Property Management Co., Ltd. Production apparatus and production method for fine particles
JP2019122925A (ja) * 2018-01-17 2019-07-25 太平洋セメント株式会社 噴霧熱分解による微粒子製造装置
JP6997633B2 (ja) 2018-01-17 2022-01-17 太平洋セメント株式会社 噴霧熱分解による微粒子製造装置
JPWO2020217466A1 (ru) * 2019-04-26 2020-10-29
WO2020217466A1 (ja) * 2019-04-26 2020-10-29 株式会社Fuji プラズマ処理装置
JP7158379B2 (ja) 2019-04-26 2022-10-21 株式会社Fuji プラズマ処理装置
WO2021119863A1 (es) * 2019-12-19 2021-06-24 Universidad De Concepcion Sistema de descarga de arco en atmósfera controlable de electrodo variable consumible y electrodo fijo, con precipitador electrostático diferencial de descarga de corona, útil para la síntesis y recolección de material nanométrico de naturaleza metálica y de óxido metálico
WO2024009422A1 (ja) * 2022-07-06 2024-01-11 株式会社Fuji プラズマヘッド及びプラズマ発生装置

Also Published As

Publication number Publication date
HK1220857A1 (zh) 2017-05-12
MX2015011656A (es) 2015-12-16
CN105284193B (zh) 2018-03-09
AU2014244509A1 (en) 2015-09-17
BR112015022424A2 (pt) 2017-07-18
IL241205A0 (en) 2015-11-30
TW201446325A (zh) 2014-12-16
WO2014159736A1 (en) 2014-10-02
CN105284193A (zh) 2016-01-27
EP2974560A4 (en) 2016-12-07
CA2903449A1 (en) 2014-10-02
EP2974560A1 (en) 2016-01-20
RU2015143900A (ru) 2017-04-19
KR20150128732A (ko) 2015-11-18

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