BR112015022424A2 - produção de partícula de alto rendimento utilizando um sistema de plasma - Google Patents

produção de partícula de alto rendimento utilizando um sistema de plasma

Info

Publication number
BR112015022424A2
BR112015022424A2 BR112015022424A BR112015022424A BR112015022424A2 BR 112015022424 A2 BR112015022424 A2 BR 112015022424A2 BR 112015022424 A BR112015022424 A BR 112015022424A BR 112015022424 A BR112015022424 A BR 112015022424A BR 112015022424 A2 BR112015022424 A2 BR 112015022424A2
Authority
BR
Brazil
Prior art keywords
plasma
particle production
high throughput
plasma system
useful gas
Prior art date
Application number
BR112015022424A
Other languages
English (en)
Inventor
Leamon David
P Layman Frederick
A Biberger Maximilian
Lefevre Paul
Original Assignee
Sdcmaterials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sdcmaterials Inc filed Critical Sdcmaterials Inc
Publication of BR112015022424A2 publication Critical patent/BR112015022424A2/pt

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/42—Plasma torches using an arc with provisions for introducing materials into the plasma, e.g. powder, liquid

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
  • Manufacture Of Metal Powder And Suspensions Thereof (AREA)

Abstract

resumo patente de invenção: "produção de partícula de alto rendimento utilizando um sistema de plasma". a presente invenção refere-se a um sistema de produção de nanopartículas e métodos de utilização do sistema. o sistema de produção de nanopartículas inclui um canhão de plasma incluindo um eletrodo macho, eletrodos fêmeas e uma fonte de gás útil configurada para liberar um gás útil em uma direção de fluxo helicoidal em vórtice através de uma região de geração do plasma. o sistema também inclui um sistema de alimentação contínua, uma câmara de arrefecimento brusco, um canal de refrigeração que inclui um desregulador de fluxo laminar, um módulo de sobrepressão de sistema, e um sistema de recirculação e purificação de fluido de condicionamento. 1/1
BR112015022424A 2013-03-14 2014-03-12 produção de partícula de alto rendimento utilizando um sistema de plasma BR112015022424A2 (pt)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US201361784299P 2013-03-14 2013-03-14
US201361864350P 2013-08-09 2013-08-09
US201361885990P 2013-10-02 2013-10-02
US201361885998P 2013-10-02 2013-10-02
US201361885996P 2013-10-02 2013-10-02
US201361885988P 2013-10-02 2013-10-02
PCT/US2014/024933 WO2014159736A1 (en) 2013-03-14 2014-03-12 High-throughput particle production using a plasma system

Publications (1)

Publication Number Publication Date
BR112015022424A2 true BR112015022424A2 (pt) 2017-07-18

Family

ID=51625239

Family Applications (1)

Application Number Title Priority Date Filing Date
BR112015022424A BR112015022424A2 (pt) 2013-03-14 2014-03-12 produção de partícula de alto rendimento utilizando um sistema de plasma

Country Status (13)

Country Link
EP (1) EP2974560A4 (pt)
JP (1) JP2016522734A (pt)
KR (1) KR20150128732A (pt)
CN (1) CN105284193B (pt)
AU (1) AU2014244509A1 (pt)
BR (1) BR112015022424A2 (pt)
CA (1) CA2903449A1 (pt)
HK (1) HK1220857A1 (pt)
IL (1) IL241205A0 (pt)
MX (1) MX2015011656A (pt)
RU (1) RU2015143900A (pt)
TW (1) TW201446325A (pt)
WO (1) WO2014159736A1 (pt)

Families Citing this family (8)

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Publication number Priority date Publication date Assignee Title
JP2017157298A (ja) * 2016-02-29 2017-09-07 シャープ株式会社 プラズマ生成装置
CN106378460B (zh) * 2016-09-22 2018-05-11 成都优材科技有限公司 制备球形纯钛或钛合金粉末的等离子雾化方法及设备
JP6924944B2 (ja) 2017-04-05 2021-08-25 パナソニックＩｐマネジメント株式会社 微粒子製造装置及び微粒子製造方法
WO2018202827A1 (en) * 2017-05-04 2018-11-08 Umicore Ag & Co. Kg Plasma gun and plasma system for low melting point or low boiling point materials
JP6997633B2 (ja) * 2018-01-17 2022-01-17 太平洋セメント株式会社 噴霧熱分解による微粒子製造装置
JP7158379B2 (ja) * 2019-04-26 2022-10-21 株式会社Fuji プラズマ処理装置
CL2019003757A1 (es) * 2019-12-19 2020-07-10 Univ Concepcion Sistema de descarga de arco en atmósfera controlable de electrodo variable consumible y electrodo fijo, con precipitador electrostático diferencial de descarga de corona, útil para la síntesis y recolección de material nanométrico de naturaleza metálica y de óxido metálico.
WO2024009422A1 (ja) * 2022-07-06 2024-01-11 株式会社Fuji プラズマヘッド及びプラズマ発生装置

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JPS6023999A (ja) * 1983-07-19 1985-02-06 三協電業株式会社 活性化装置
US4780591A (en) * 1986-06-13 1988-10-25 The Perkin-Elmer Corporation Plasma gun with adjustable cathode
US5225656A (en) * 1990-06-20 1993-07-06 General Electric Company Injection tube for powder melting apparatus
JP3336665B2 (ja) * 1993-03-17 2002-10-21 日新電機株式会社 微粒子発生方法及び装置
EP0727504A3 (en) * 1995-02-14 1996-10-23 Gen Electric Plasma coating process for improved adhesive properties of coatings on objects
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Also Published As

Publication number Publication date
JP2016522734A (ja) 2016-08-04
HK1220857A1 (zh) 2017-05-12
MX2015011656A (es) 2015-12-16
CN105284193B (zh) 2018-03-09
AU2014244509A1 (en) 2015-09-17
IL241205A0 (en) 2015-11-30
TW201446325A (zh) 2014-12-16
WO2014159736A1 (en) 2014-10-02
CN105284193A (zh) 2016-01-27
EP2974560A4 (en) 2016-12-07
CA2903449A1 (en) 2014-10-02
EP2974560A1 (en) 2016-01-20
RU2015143900A (ru) 2017-04-19
KR20150128732A (ko) 2015-11-18

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Legal Events

Date Code Title Description
B11A Dismissal acc. art.33 of ipl - examination not requested within 36 months of filing
B11Y Definitive dismissal - extension of time limit for request of examination expired [chapter 11.1.1 patent gazette]