JP2016518698A5 - - Google Patents

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Publication number
JP2016518698A5
JP2016518698A5 JP2016500127A JP2016500127A JP2016518698A5 JP 2016518698 A5 JP2016518698 A5 JP 2016518698A5 JP 2016500127 A JP2016500127 A JP 2016500127A JP 2016500127 A JP2016500127 A JP 2016500127A JP 2016518698 A5 JP2016518698 A5 JP 2016518698A5
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JP
Japan
Prior art keywords
aperture
image
light source
numerical aperture
numerical
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JP2016500127A
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English (en)
Japanese (ja)
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JP6346263B2 (ja
JP2016518698A (ja
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Priority claimed from PCT/US2013/076175 external-priority patent/WO2014143298A1/en
Publication of JP2016518698A publication Critical patent/JP2016518698A/ja
Publication of JP2016518698A5 publication Critical patent/JP2016518698A5/ja
Application granted granted Critical
Publication of JP6346263B2 publication Critical patent/JP6346263B2/ja
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JP2016500127A 2013-03-12 2013-12-18 レーザアニールシステムにおいてエッジプロファイルを制御するためのカスタマイズされた瞳ストップ形状 Active JP6346263B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361777531P 2013-03-12 2013-03-12
US61/777,531 2013-03-12
PCT/US2013/076175 WO2014143298A1 (en) 2013-03-12 2013-12-18 Customized pupil stop shape for control of edge profile in laser annealing systems

Publications (3)

Publication Number Publication Date
JP2016518698A JP2016518698A (ja) 2016-06-23
JP2016518698A5 true JP2016518698A5 (https=) 2017-02-09
JP6346263B2 JP6346263B2 (ja) 2018-06-20

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ID=51526290

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016500127A Active JP6346263B2 (ja) 2013-03-12 2013-12-18 レーザアニールシステムにおいてエッジプロファイルを制御するためのカスタマイズされた瞳ストップ形状

Country Status (7)

Country Link
US (2) US9395545B2 (https=)
EP (1) EP2969368A4 (https=)
JP (1) JP6346263B2 (https=)
KR (3) KR102091652B1 (https=)
CN (4) CN107577056B (https=)
TW (2) TWI645457B (https=)
WO (1) WO2014143298A1 (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102091652B1 (ko) * 2013-03-12 2020-03-20 어플라이드 머티어리얼스, 인코포레이티드 레이저 어닐링 시스템들에서의 에지 프로파일의 제어를 위한 맞춤화된 퍼필 스톱 장치
CN110133772B (zh) * 2019-06-25 2024-06-11 南京溯远基因科技有限公司 光阑装置及基因测序仪
CN111921174A (zh) * 2020-06-19 2020-11-13 合肥润成体育用品有限公司 一种羽毛球拍手柄制作方法
CN112355488B (zh) * 2020-11-05 2021-12-03 中国工程物理研究院激光聚变研究中心 一种抗激光损伤的软边光阑制备方法

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US4912321A (en) * 1987-03-26 1990-03-27 Texas Instruments Incorporated Radiation scanning system with pupil control
US5059013A (en) 1988-08-29 1991-10-22 Kantilal Jain Illumination system to produce self-luminous light beam of selected cross-section, uniform intensity and selected numerical aperture
US5305054A (en) * 1991-02-22 1994-04-19 Canon Kabushiki Kaisha Imaging method for manufacture of microdevices
US5473408A (en) * 1994-07-01 1995-12-05 Anvik Corporation High-efficiency, energy-recycling exposure system
US5642287A (en) 1995-03-02 1997-06-24 Sotiropoulos; Nicholas Sculpturing device for laser beams
JPH09326343A (ja) * 1996-06-04 1997-12-16 Nikon Corp 露光方法及び装置
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US6813003B2 (en) * 2002-06-11 2004-11-02 Mark Oskotsky Advanced illumination system for use in microlithography
JP3760235B2 (ja) * 2003-04-04 2006-03-29 独立行政法人 宇宙航空研究開発機構 半導体レーザ及び半導体レーザの発振方法
JP4323903B2 (ja) * 2003-09-12 2009-09-02 キヤノン株式会社 照明光学系及びそれを用いた露光装置
US7176405B2 (en) 2005-04-22 2007-02-13 Ultratech, Inc. Heat shield for thermal processing
WO2007077875A1 (ja) * 2005-12-28 2007-07-12 Nikon Corporation 露光装置及び露光方法、並びにデバイス製造方法
JP4698460B2 (ja) * 2006-03-27 2011-06-08 オムロンレーザーフロント株式会社 レーザアニーリング装置
JP5191674B2 (ja) * 2007-03-05 2013-05-08 株式会社アルバック レーザーアニール装置及びレーザーアニール方法
CA2684602A1 (en) 2007-04-23 2008-11-06 California Institute Of Technology Single-lens, 3-d imaging device using polarization-coded aperture masks combined with a polarization-sensitive sensor
JP2009072789A (ja) * 2007-09-18 2009-04-09 Hamamatsu Photonics Kk レーザ加工装置
TWI566051B (zh) * 2008-01-21 2017-01-11 尼康股份有限公司 照明裝置、曝光裝置、曝光方法以及元件製造方法
JP4655136B2 (ja) * 2008-10-28 2011-03-23 ソニー株式会社 対物レンズ、これを用いた光学ピックアップ装置、光記録再生装置及び収差補正方法
JP5385652B2 (ja) * 2009-03-24 2014-01-08 キヤノン株式会社 位置検出装置、露光装置、位置検出方法、露光方法及びデバイス製造方法
CN102063014A (zh) * 2009-11-13 2011-05-18 上海微电子装备有限公司 一种用于微光刻的照明光学系统
JP5595021B2 (ja) * 2009-12-03 2014-09-24 住友重機械工業株式会社 レーザ処理装置
DE102010029089B4 (de) * 2010-05-18 2019-08-29 Carl Zeiss Ag Optisches System zur Kalibrierung einer Lichtquelle
TWI448671B (zh) * 2011-05-05 2014-08-11 Sunplus Technology Co Ltd 溫度感測裝置
US20120325784A1 (en) 2011-06-24 2012-12-27 Applied Materials, Inc. Novel thermal processing apparatus
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KR102091652B1 (ko) * 2013-03-12 2020-03-20 어플라이드 머티어리얼스, 인코포레이티드 레이저 어닐링 시스템들에서의 에지 프로파일의 제어를 위한 맞춤화된 퍼필 스톱 장치

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