JP2016507158A5 - - Google Patents

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Publication number
JP2016507158A5
JP2016507158A5 JP2015555205A JP2015555205A JP2016507158A5 JP 2016507158 A5 JP2016507158 A5 JP 2016507158A5 JP 2015555205 A JP2015555205 A JP 2015555205A JP 2015555205 A JP2015555205 A JP 2015555205A JP 2016507158 A5 JP2016507158 A5 JP 2016507158A5
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JP
Japan
Prior art keywords
hydrophilic
block
self
block copolymer
region
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JP2015555205A
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English (en)
Japanese (ja)
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JP6383737B2 (ja
JP2016507158A (ja
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Priority claimed from US13/748,840 external-priority patent/US9050621B2/en
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Publication of JP2016507158A publication Critical patent/JP2016507158A/ja
Publication of JP2016507158A5 publication Critical patent/JP2016507158A5/ja
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Publication of JP6383737B2 publication Critical patent/JP6383737B2/ja
Expired - Fee Related legal-status Critical Current
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JP2015555205A 2013-01-24 2014-01-21 ポリマーナノマスクを使用した表面ナノ複製 Expired - Fee Related JP6383737B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/748,840 US9050621B2 (en) 2013-01-24 2013-01-24 Surface nanofabrication methods using self-assembled polymer nanomasks
US13/748,840 2013-01-24
PCT/US2014/012228 WO2014116547A1 (en) 2013-01-24 2014-01-21 Surface nanofabrication methods using self-assembled polymer nanomasks

Publications (3)

Publication Number Publication Date
JP2016507158A JP2016507158A (ja) 2016-03-07
JP2016507158A5 true JP2016507158A5 (https=) 2018-07-12
JP6383737B2 JP6383737B2 (ja) 2018-08-29

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ID=50031633

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015555205A Expired - Fee Related JP6383737B2 (ja) 2013-01-24 2014-01-21 ポリマーナノマスクを使用した表面ナノ複製

Country Status (6)

Country Link
US (1) US9050621B2 (https=)
EP (1) EP2948817B1 (https=)
JP (1) JP6383737B2 (https=)
KR (1) KR20150111967A (https=)
CN (1) CN105229530A (https=)
WO (1) WO2014116547A1 (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
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JP6070964B2 (ja) * 2012-03-27 2017-02-01 日産化学工業株式会社 自己組織化膜の下層膜形成組成物
EP2927747A3 (en) * 2014-03-31 2016-03-09 IMEC vzw Quality assessment of directed self-assembling method
JP6589576B2 (ja) * 2015-11-09 2019-10-16 富士通株式会社 人工指紋液、及び耐指紋性の評価方法
US10163632B2 (en) * 2016-12-15 2018-12-25 Taiwan Semiconductor Manufacturing Co., Ltd. Material composition and process for substrate modification
FI3668927T3 (fi) 2017-09-12 2024-04-05 Eth Zuerich Transmembraaniset ph-gradienttipolymeerit ammoniakin kvantifiointiin kehon nesteissä
JP2019079852A (ja) * 2017-10-20 2019-05-23 東芝メモリ株式会社 パターン形成方法
CN114522746B (zh) * 2020-11-23 2024-07-16 京东方科技集团股份有限公司 一种生物医学微流控芯片及其修饰方法
CN116060274B (zh) * 2021-10-29 2023-12-19 佛山市思博睿科技有限公司 等离子化学气相沉积自修复疏水纳米膜的制备方法
CN117663888A (zh) * 2022-08-31 2024-03-08 美的集团股份有限公司 换热部件及其制造方法、换热器和空调
JP7648919B2 (ja) * 2022-12-22 2025-03-19 ダイキン工業株式会社 処理方法および電子デバイス

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JP3940546B2 (ja) * 1999-06-07 2007-07-04 株式会社東芝 パターン形成方法およびパターン形成材料
JP3874989B2 (ja) * 2000-03-21 2007-01-31 シャープ株式会社 パターンの形成方法
US8133534B2 (en) * 2004-11-22 2012-03-13 Wisconsin Alumni Research Foundation Methods and compositions for forming patterns with isolated or discrete features using block copolymer materials
US7347953B2 (en) * 2006-02-02 2008-03-25 International Business Machines Corporation Methods for forming improved self-assembled patterns of block copolymers
US8361337B2 (en) * 2007-03-19 2013-01-29 The University Of Massachusetts Method of producing nanopatterned templates
US7959975B2 (en) * 2007-04-18 2011-06-14 Micron Technology, Inc. Methods of patterning a substrate
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