JP2016207695A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2016207695A5 JP2016207695A5 JP2015083450A JP2015083450A JP2016207695A5 JP 2016207695 A5 JP2016207695 A5 JP 2016207695A5 JP 2015083450 A JP2015083450 A JP 2015083450A JP 2015083450 A JP2015083450 A JP 2015083450A JP 2016207695 A5 JP2016207695 A5 JP 2016207695A5
- Authority
- JP
- Japan
- Prior art keywords
- region
- alkali metal
- cell according
- atomic cell
- internal space
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 150000001340 alkali metals Chemical group 0.000 claims description 15
- 229910052783 alkali metal Inorganic materials 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 9
- 150000001875 compounds Chemical class 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims 5
- 239000000463 material Substances 0.000 claims 5
- 238000002360 preparation method Methods 0.000 claims 3
- 239000007787 solid Substances 0.000 claims 2
- 230000000903 blocking effect Effects 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 239000007788 liquid Substances 0.000 claims 1
- 238000007789 sealing Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 description 4
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015083450A JP2016207695A (ja) | 2015-04-15 | 2015-04-15 | 原子セル、原子セルの製造方法、量子干渉装置、原子発振器、電子機器および移動体 |
| CN201610220612.0A CN106059580A (zh) | 2015-04-15 | 2016-04-11 | 原子室及其制造方法、量子干涉装置、原子振荡器、电子设备和移动体 |
| US15/097,659 US10033394B2 (en) | 2015-04-15 | 2016-04-13 | Atom cell, method of manufacturing atom cell, quantum interference device, atomic oscillator, electronic apparatus, and moving object |
| US15/867,969 US20180212613A1 (en) | 2015-04-15 | 2018-01-11 | Atom cell, method of manufacturing atom cell, quantum interference device, atomic oscillator, electronic apparatus, and moving object |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015083450A JP2016207695A (ja) | 2015-04-15 | 2015-04-15 | 原子セル、原子セルの製造方法、量子干渉装置、原子発振器、電子機器および移動体 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2016207695A JP2016207695A (ja) | 2016-12-08 |
| JP2016207695A5 true JP2016207695A5 (enExample) | 2018-04-26 |
Family
ID=57130044
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2015083450A Withdrawn JP2016207695A (ja) | 2015-04-15 | 2015-04-15 | 原子セル、原子セルの製造方法、量子干渉装置、原子発振器、電子機器および移動体 |
Country Status (3)
| Country | Link |
|---|---|
| US (2) | US10033394B2 (enExample) |
| JP (1) | JP2016207695A (enExample) |
| CN (1) | CN106059580A (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR3038892B1 (fr) * | 2015-07-16 | 2017-08-11 | Centre Nat Rech Scient | Cellule a gaz pour un capteur atomique et procede de remplissage d'une cellule a gaz |
| WO2017018846A1 (ko) * | 2015-07-30 | 2017-02-02 | 한국과학기술원 | 칩 스케일 원자시계를 위한 전기 광학 기능이 구비된 증기셀 및 칩 스케일 기기를 위한 밀폐용기 제작 방법 |
| JP6891760B2 (ja) * | 2017-10-27 | 2021-06-18 | セイコーエプソン株式会社 | 周波数信号生成装置および周波数信号生成システム |
| JP7024337B2 (ja) * | 2017-11-14 | 2022-02-24 | セイコーエプソン株式会社 | 原子発振器、および周波数信号生成システム |
| CN108107707B (zh) * | 2017-11-22 | 2020-12-25 | 北京无线电计量测试研究所 | 一种原子气体腔室以及制备方法 |
| CN108681616B (zh) * | 2018-03-28 | 2022-05-17 | 中国电子科技集团公司第三十六研究所 | 一种选取飞机舱外天线安装点的方法、装置和智能终端 |
| JP2019193238A (ja) | 2018-04-27 | 2019-10-31 | セイコーエプソン株式会社 | 原子発振器および周波数信号生成システム |
| CN113371675B (zh) * | 2020-02-25 | 2025-02-14 | 中国科学院苏州纳米技术与纳米仿生研究所 | 一种原子气室及其制作方法 |
| US20220262929A1 (en) * | 2021-02-17 | 2022-08-18 | ColdQuanta, Inc. | Pulsed-laser modification of quantum-particle cells |
| US11997780B2 (en) | 2020-06-26 | 2024-05-28 | ColdQuanta, Inc. | Vacuum cell with electric-field control |
| WO2022097557A1 (ja) * | 2020-11-06 | 2022-05-12 | 国立大学法人京都大学 | 金属ガス封入セル及びその製造方法 |
| US20240150229A1 (en) * | 2021-03-11 | 2024-05-09 | National Institute Of Information And Communications Technology | Substrate, method for producing substrate, and method for producing unit cell |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ITMI20070301A1 (it) * | 2007-02-16 | 2008-08-17 | Getters Spa | Supporti comprendenti materiali getter e sorgenti di metalli alcalini o alcalino-terrosi per sistemi di termoregolazione basati su effetto tunnel |
| JP2009283526A (ja) | 2008-05-20 | 2009-12-03 | Epson Toyocom Corp | ガスセルの製造方法及びガスセル |
| US20110187464A1 (en) | 2010-02-04 | 2011-08-04 | Honeywell International Inc. | Apparatus and methods for alkali vapor cells |
| US8067991B2 (en) | 2010-02-04 | 2011-11-29 | Honeywell International Inc. | Chip-scale atomic clock with two thermal zones |
| US8941442B2 (en) | 2010-02-04 | 2015-01-27 | Honeywell International Inc. | Fabrication techniques to enhance pressure uniformity in anodically bonded vapor cells |
| US8218590B2 (en) | 2010-02-04 | 2012-07-10 | Honeywell International Inc. | Designs and processes for thermally stabilizing a vertical cavity surface emitting laser (vcsel) in a chip-scale atomic clock |
| US8299860B2 (en) | 2010-02-04 | 2012-10-30 | Honeywell International Inc. | Fabrication techniques to enhance pressure uniformity in anodically bonded vapor cells |
| US8242851B2 (en) | 2010-02-04 | 2012-08-14 | Honeywell International Inc. | Processes for stabilizing a VCSEL in a chip-scale atomic clock |
| JP5821439B2 (ja) * | 2011-02-16 | 2015-11-24 | セイコーエプソン株式会社 | ガスセルの製造方法 |
| JP5712066B2 (ja) | 2011-06-27 | 2015-05-07 | 株式会社日立製作所 | 磁場計測装置、磁場計測装置製造方法 |
| JP6031787B2 (ja) | 2011-07-13 | 2016-11-24 | 株式会社リコー | 原子発振器の製造方法 |
| JP6036230B2 (ja) | 2012-11-30 | 2016-11-30 | 株式会社リコー | アルカリ金属セルの製造方法及び原子発振器の製造方法 |
| JP6119295B2 (ja) * | 2013-02-18 | 2017-04-26 | セイコーエプソン株式会社 | 量子干渉装置、原子発振器および移動体 |
| JP6179277B2 (ja) * | 2013-08-29 | 2017-08-16 | 株式会社リコー | アルカリ金属セルの製造方法及び原子発振器の製造方法 |
| JP6171748B2 (ja) * | 2013-09-05 | 2017-08-02 | セイコーエプソン株式会社 | 原子セル、量子干渉装置、原子発振器、電子機器および移動体 |
| US9312869B2 (en) * | 2013-10-22 | 2016-04-12 | Honeywell International Inc. | Systems and methods for a wafer scale atomic clock |
-
2015
- 2015-04-15 JP JP2015083450A patent/JP2016207695A/ja not_active Withdrawn
-
2016
- 2016-04-11 CN CN201610220612.0A patent/CN106059580A/zh not_active Withdrawn
- 2016-04-13 US US15/097,659 patent/US10033394B2/en not_active Expired - Fee Related
-
2018
- 2018-01-11 US US15/867,969 patent/US20180212613A1/en not_active Abandoned
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2016207695A5 (enExample) | ||
| JP2016205984A5 (ja) | 原子発振器、および原子発振器の製造方法 | |
| RU2018135021A (ru) | Картридж, карман и способ изготовления кармана для использования с устройством для нагревания материала, который возможно курить | |
| WO2013140177A3 (en) | Etched silicon structures, method of forming etched silicon structures and uses thereof | |
| GB201209024D0 (en) | Method of handling a substrate | |
| WO2012150278A9 (en) | Hierarchical carbon nano and micro structures | |
| WO2016133571A3 (en) | Laser induced graphene hybrid materials for electronic devices | |
| JP2015503223A5 (enExample) | ||
| JP2015154297A5 (enExample) | ||
| EP3167982A3 (en) | Additive manufacturing method for making complex film holes | |
| WO2015103394A3 (en) | A metal thin film resistor and process | |
| WO2012106600A3 (en) | In situ vapor phase surface activation of sio2 | |
| JP2018507097A5 (enExample) | ||
| JP2015079946A5 (enExample) | ||
| JP2015053452A5 (enExample) | ||
| JP2010186988A5 (ja) | 結晶性半導体膜の作製方法 | |
| JP2016081987A5 (ja) | 原子セル、原子セルの製造方法、量子干渉装置、原子発振器、および電子機器 | |
| JP2015079945A5 (enExample) | ||
| WO2015017069A3 (en) | Mechanical joining using additive manufacturing process | |
| WO2015038267A3 (en) | Graphene synthesis by suppressing evaporative substrate loss during low pressure chemical vapor deposition | |
| WO2015036287A3 (de) | Verfahren zum herstellen eines bauelementes | |
| WO2016104871A8 (ko) | 열 복원성이 우수한 fe-ni계 합금 금속박 및 그 제조방법 | |
| JP2017228580A5 (enExample) | ||
| WO2015122953A3 (en) | Use of spark plasma sintering for manufacturing superalloy compound components | |
| JP2012103248A5 (enExample) |