JP2016183016A - Substrate peeling device and substrate peeling method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a substrate peeling device which smoothly peels a resin substrate from a support medium, and to provide a substrate peeling method.SOLUTION: A substrate peeling device peels a resin substrate having a rectangle planar shape and formed on a support medium and includes: an insertion part which is disposed in at least one corner part of the resin substrate and may be inserted into an interface between the corner part and the resin substrate; a moving mechanism which relatively moves the insertion part and the support medium with the insertion part inserted into the interface; and a peeling mechanism which holds the resin substrate and peels the resin substrate from the support medium with a slit, which is formed on the interface by the insertion part, set as a base point.SELECTED DRAWING: Figure 4

Description

  The present invention relates to a substrate peeling apparatus and a substrate peeling method.

  In recent years, there is a market need for a resin substrate having flexibility instead of a glass substrate as a substrate for an electronic device. As a manufacturing apparatus for manufacturing such a resin substrate, an apparatus including a step of forming a resin substrate on a support substrate (support) and then peeling the support substrate from the resin substrate is known (for example, Patent Document 1). reference).

JP 2004-247721 A

  However, in the conventional manufacturing apparatus, the resin substrate could not be peeled off from the support. Therefore, it is desired to provide a new technique that can favorably peel the resin substrate from the support.

  This invention is made | formed in view of such a subject, and it aims at providing the board | substrate peeling apparatus and board | substrate peeling method which can peel a resin substrate favorably from a support body.

  In order to achieve the above object, a substrate peeling apparatus according to the first aspect of the present invention is a substrate peeling apparatus for peeling a resin substrate having a rectangular planar shape formed on a support, wherein at least one corner of the resin substrate is used. An insertion portion that can be inserted into an interface with the support at the corner portion of the resin substrate, and the insertion portion and the support are relative to each other in a state where the insertion portion is inserted into the interface. And a peeling mechanism that holds the resin substrate and peels from the support using a slit formed at the interface by the insertion portion as a base point.

  According to the structure which concerns on this aspect, a resin substrate can be peeled from a support body simply and reliably on the basis of the slit formed in the interface by the insertion part.

Moreover, in the said board | substrate peeling apparatus, it is preferable that the said insertion part is comprised from a cutter. The blade is preferably composed of a flat blade or a round blade.
According to this configuration, the slit can be easily and reliably formed.

Moreover, in the said board | substrate peeling apparatus, it is preferable that the said insertion part is each arrange | positioned at the four corners of the corner | angular part of the said resin substrate.
According to this configuration, the slits can be formed at the four corners of the resin substrate. Therefore, the resin substrate can be easily peeled off from the slit as a base point.

Moreover, in the said board | substrate peeling apparatus, it is preferable that the said cutter is each arrange | positioned at a pair of corner | angular part on the diagonal of the said resin substrate.
According to this structure, a slit can be formed in a pair of corner | angular part of a resin substrate. Therefore, the resin substrate can be easily peeled off from the slit as a base point.

Moreover, in the said board | substrate peeling apparatus, it is provided in the outer peripheral part of the said support body, has a surface of the same height as the surface in which the said resin substrate was formed in the said support body, and guides insertion operation | movement of the said insertion part. It is preferable to further provide a guide member.
According to this configuration, even when the size of the support and the resin substrate is substantially the same in a plan view, the insertion operation of the insertion portion is guided along the guide member, so that the slit is formed well. can do.

Moreover, in the said board | substrate peeling apparatus, it is preferable that the said moving mechanism moves the said insertion part along the outer periphery of the said resin substrate.
According to this configuration, the slit can be formed along the outer periphery of the resin substrate. Therefore, the peeling operation can be performed satisfactorily.

Moreover, in the said board | substrate peeling apparatus, it is preferable that the said resin substrate is a polyimide substrate.
ADVANTAGE OF THE INVENTION According to this invention, the polyimide substrate optimal as an electronic device use can be favorably peeled from a support body.

Moreover, in the said board | substrate peeling apparatus, it is preferable to use the glass substrate by which the pre-processing layer which consists of a silane coupling agent was previously provided as the said support body in the surface in which the said resin substrate is formed.
According to this configuration, the hydroxy group on the surface of the support is silylated by the pretreatment. For example, when the resin substrate is made of polyimide, the resin substrate is prevented from forming a covalent bond with the support surface. it can. Moreover, since the silyl group derived from a silane coupling agent is formed, the peelability of the resin substrate can be improved.

  The substrate peeling method according to the second aspect of the present invention is a substrate peeling method for peeling a resin substrate having a rectangular planar shape formed on a support, wherein the insertion portion is disposed at at least one corner of the resin substrate. An insertion step of inserting the insertion portion into the interface with the support at the corner of the resin substrate, and a movement step of relatively moving the insertion portion and the support in a state where the insertion portion is inserted into the interface. And a peeling step of peeling the resin substrate from the support using a slit formed at the interface by the insertion portion as a base point.

  According to the substrate peeling method which concerns on this aspect, a resin substrate can be peeled from a support body simply and reliably from the slit formed in the interface by the insertion part as a base point.

Moreover, in the said board | substrate peeling method, it is preferable to use a flat blade or a round blade as said insertion part.
According to this configuration, the slit can be easily and reliably formed.

Moreover, in the said board | substrate peeling method, it is preferable that in the said insertion step, the said insertion part arrange | positioned at the corner | angular part of the four corners of the said resin substrate is inserted in the interface of the said corner | angular part and the said resin substrate.
According to this configuration, the slits can be formed at the four corners of the resin substrate. Therefore, the resin substrate can be easily peeled off from the slit as a base point.

In the substrate peeling method, in the insertion step, the insertion portions respectively arranged at a pair of corner portions on a diagonal line of the resin substrate are inserted into an interface between the corner portion and the resin substrate. preferable.
According to this structure, a slit can be formed in a pair of corner | angular part of a resin substrate. Therefore, the resin substrate can be easily peeled off from the slit as a base point.

Moreover, in the said board | substrate peeling method, in the said insertion step, using the guide member which is provided in the outer peripheral part of the said support body, and has the surface of the same height as the surface in which the said resin substrate in the said support body was formed. It is preferable to guide the insertion operation of the insertion portion.
According to this configuration, even when the size of the support and the resin substrate is substantially the same in a plan view, the insertion operation of the insertion portion is guided along the guide member, so that the slit is formed well. can do.

Moreover, in the said board | substrate peeling method, it is preferable in the said movement step that the said insertion part moves along the outer periphery of the said resin substrate.
According to this configuration, the slit can be formed along the outer periphery of the resin substrate. Therefore, the peeling operation can be performed satisfactorily.

Moreover, in the said board | substrate peeling method, it is preferable that the said resin substrate is a polyimide substrate.
ADVANTAGE OF THE INVENTION According to this invention, the polyimide substrate optimal as an electronic device use can be favorably peeled from a support body.

Moreover, in the said board | substrate peeling method, it is preferable to use the glass substrate by which the pre-processing layer which consists of a silane coupling agent was previously provided as the said support body in the surface in which the said resin substrate is formed.
According to this configuration, the hydroxy group on the surface of the support is silylated by the pretreatment. For example, when the resin substrate is made of polyimide, the resin substrate is prevented from forming a covalent bond with the support surface. it can. Moreover, since the silyl group derived from a silane coupling agent is formed, the peelability of the resin substrate can be improved.

  According to the present invention, the resin substrate can be easily and reliably peeled from the support.

It is process drawing which shows manufacture of a resin substrate. It is the figure which showed the chemical reaction which arises at a pre-processing process. It is the experimental result which showed the effect of the peelability improvement in a process film. It is a figure which shows schematic structure of the board | substrate peeling apparatus which concerns on 1st Embodiment. It is a flowchart which shows the board | substrate peeling method by a board | substrate peeling apparatus. It is a figure which shows a board | substrate peeling process. It is a figure which shows schematic structure of the board | substrate peeling apparatus which concerns on 2nd Embodiment. It is a figure which shows the board | substrate peeling process which concerns on 2nd Embodiment. It is a figure which shows the structure which concerns on a modification.

  Hereinafter, an embodiment of the present invention will be described with reference to the drawings. In this embodiment, a case where a resin substrate used as a substrate for an electronic device is manufactured will be described as an example. In addition, in the drawings used in the following description, in order to make the features easy to understand, there are cases where the portions that become the features are enlarged for the sake of convenience, and the dimensional ratios of the respective components are not always the same as the actual ones. Absent.

  The method for manufacturing a resin substrate according to the present embodiment includes a pretreatment step of treating a silane coupling agent on a support substrate, an application step of applying a resin substrate forming material on a pretreatment surface of the support substrate, and a support substrate. A baking step of heating to form a resin substrate on the support substrate; and a peeling step of peeling the resin substrate from the support substrate.

(First embodiment)
FIG. 1 is a view showing a manufacturing process of a resin substrate according to this embodiment.
First, as shown to Fig.1 (a), the pretreatment which processes a silane coupling agent on the surface (at least one surface) 1a of the support substrate 1 is performed (pretreatment process). In the present embodiment, the support substrate 1 is made of glass.

In the pretreatment, the treatment liquid is applied to the surface 1a of the support substrate (support) 1 by coating. Here, the application includes spraying.
The pretreatment time is preferably 1 to 60 seconds. Instead of applying the treatment liquid, the support substrate 1 may be treated with a silane coupling agent by vapor deposition. The treatment time by the vapor deposition method is preferably, for example, 1 to 15 minutes in an oven at 80 to 120 ° C.

  In the present embodiment, the treatment liquid used for the pretreatment contains a silane coupling agent (hereinafter sometimes referred to as “silylating agent”) and a solvent. Hereinafter, each component will be described in detail.

(Silylating agent)
The silylating agent is not particularly limited, and any conventionally known silylating agent can be used. Specifically, for example, silylating agents represented by the following formulas (1) to (3) can be used. In this specification, an alkyl group has 1 to 5 carbon atoms, a cycloalkyl group has 5 to 10 carbon atoms, an alkoxy group has 1 to 5 carbon atoms, and a heterocycloalkyl group has 5 to 10 carbon atoms. is there.

（式（１）中、Ｒ^１は水素原子、又は飽和若しくは不飽和アルキル基を示し、Ｒ^２は飽和若しくは不飽和アルキル基、飽和若しくは不飽和シクロアルキル基、又は飽和若しくは不飽和ヘテロシクロアルキル基を示す。Ｒ^１及びＲ^２は互いに結合して窒素原子を有する飽和又は不飽和ヘテロシクロアルキル基を形成してもよい。）

(In formula (1), R ¹ represents a hydrogen atom or a saturated or unsaturated alkyl group, and R ² represents a saturated or unsaturated alkyl group, a saturated or unsaturated cycloalkyl group, or a saturated or unsaturated heterocycloalkyl group. R ¹ and R ² may combine with each other to form a saturated or unsaturated heterocycloalkyl group having a nitrogen atom.

（式（２）中、Ｒ^３は水素原子、メチル基、トリメチルシリル基、又はジメチルシリル基を示し、Ｒ^４，Ｒ^５はそれぞれ独立に水素原子、アルキル基、又はビニル基を示す。）

(In Formula (2), R ³ represents a hydrogen atom, a methyl group, a trimethylsilyl group, or a dimethylsilyl group, and R ⁴ and R ⁵ each independently represent a hydrogen atom, an alkyl group, or a vinyl group.)

（式（３）中、ＸはＯ、ＣＨＲ^７、ＣＨＯＲ^７、ＣＲ^７Ｒ^７、又はＮＲ^８を示し、Ｒ^６，Ｒ^７はそれぞれ独立に水素原子、飽和若しくは不飽和アルキル基、飽和若しくは不飽和シクロアルキル基、トリアルキルシリル基、トリアルキルシロキシ基、アルコキシ基、フェニル基、フェネチル基、又はアセチル基を示し、Ｒ８は水素原子、アルキル基、又はトリアルキルシリル基を示す。）

(In the formula (3), X represents O, CHR ⁷ , CHOR ⁷ , CR ⁷ R ⁷ , or NR ⁸ , and R ⁶ and R ⁷ are each independently a hydrogen atom, a saturated or unsaturated alkyl group, saturated or unsaturated. A saturated cycloalkyl group, a trialkylsilyl group, a trialkylsiloxy group, an alkoxy group, a phenyl group, a phenethyl group, or an acetyl group, and R8 represents a hydrogen atom, an alkyl group, or a trialkylsilyl group.

  Examples of the silylating agent represented by the above formula (1) include N, N-dimethylaminotrimethylsilane, N, N-diethylaminotrimethylsilane, t-butylaminotrimethylsilane, allylaminotrimethylsilane, trimethylsilylacetamide, and trimethylsilyl. Examples include piperidine, trimethylsilylimidazole, trimethylsilylmorpholine, 3-trimethylsilyl-2-oxazolidinone, trimethylsilylpyrazole, trimethylsilylpyrrolidine, 2-trimethylsilyl-1,2,3-triazole, 1-trimethylsilyl-1,2,4-triazole and the like.

  Examples of the silylating agent represented by the above formula (2) include hexamethyldisilazane, N-methylhexamethyldisilazane, 1,2-di-N-octyltetramethyldisilazane, 1,2-divinyltetra. Examples include methyldisilazane, heptamethyldisilazane, nonamethyltrisilazane, and tris (dimethylsilyl) amine.

  Examples of the silylating agent represented by the above formula (3) include trimethylsilyl acetate, trimethylsilylpropionate, trimethylsilylbutyrate, trimethylsilyloxy-3-penten-2-one, and the like.

  The content of the silylating agent is preferably 0.1 to 50% by mass, more preferably 0.5 to 30% by mass, and further preferably 1.0 to 20% by mass in the surface treatment liquid. By setting it as the said range, after ensuring the applicability | paintability of a surface treatment liquid, the hydrophobicity of a pattern surface can fully be improved.

(solvent)
As the solvent, any conventionally known solvent can be used as long as it can dissolve the silylating agent and causes little damage to the resin pattern to be surface-treated or the pattern to be etched.
Specifically, sulfoxides such as dimethylsulfoxide; sulfones such as dimethylsulfone, diethylsulfone, bis (2-hydroxyethyl) sulfone, tetramethylenesulfone; N, N-dimethylformamide, N-methylformamide, N, N -Amides such as dimethylacetamide, N-methylacetamide, N, N-diethylacetamide; N-methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, N-propyl-2-pyrrolidone, N-hydroxymethyl-2 -Lactams such as pyrrolidone and N-hydroxyethyl-2-pyrrolidone; 1,3-dimethyl-2-imidazolidinone, 1,3-diethyl-2-imidazolidinone, 1,3-diisopropyl-2-imidazolidi Non-imidazolidinones such as non-dimethyl ether, diethyl ether Dialkyl ethers such as tellurium, methyl ethyl ether, dipropyl ether, diisopropyl ether, dibutyl ether; dialkyl glycol ethers such as dimethyl glycol, dimethyl diglycol, dimethyl triglycol, methyl ethyl diglycol, diethyl glycol; methyl ethyl ketone, cyclohexanone, Ketones such as 2-heptanone and 3-heptanone; terpenes such as p-menthane, diphenylmenthane, limonene, terpinene, bornane, norbornane and pinane;

  By the above pretreatment, as shown in FIG. 1B, a treatment film 2 derived from a silane coupling agent (silylating agent) is formed on the entire surface 1a on the surface 1a of the support substrate 1.

  Here, the chemical reaction that occurs between the treatment film 2 and the surface 1a of the support substrate 1 in the pretreatment step will be described. FIG. 2 is a diagram showing a chemical reaction occurring between the treatment film 2 and the surface 1a of the support substrate 1 in the pretreatment process. In the following description, the silylating agent (HMDS (hexamethyldisilazane)) represented by the above formula (2) will be described as an example.

The support substrate 1 made of glass has an OH group (hydroxy group) on the surface 1a. Therefore, when pretreatment with a silane coupling agent is performed, HMDS is decomposed and bonded to two hydroxyl groups to generate ammonia (NH ₃ ). As a result, the OH group (hydroxy group) on the surface 1a of the support substrate 1 is silylated, and a treatment film 2 containing a silyl group derived from the silylating agent is formed on the surface 1a as shown in FIG. Therefore, the support substrate 1 is in a state where the OH group (hydroxy group) is not present or almost absent due to the formation of the treatment film 2 (silyl group) on the surface 1a.

Subsequently, as shown in FIG. 1C, a solution 3 a containing polyamic acid is applied as a resin substrate forming material on the processing surface that has been subjected to the processing in the preprocessing step, that is, the processing film 2. In the present embodiment, for example, the solution 3a is selectively formed on the treatment film 2 by an inkjet method. Thereby, as described later, the resin substrate 3 on the support substrate 1 can be smaller in size than the support substrate 1 in a plan view.
Hereinafter, the polyamic acid used in this embodiment will be described.

(Polyamic acid)
In this embodiment, the polyamic acid used for the production | generation of the resin substrate which consists of polyimides is not specifically limited, It selects suitably from the polyamic acid conventionally known as a precursor of a polyimide resin.

  As a suitable polyamic acid, for example, a polyamic acid composed of a structural unit represented by the following formula (4) can be mentioned.

（式（４）中、Ｒ^９は４価の有機基であり、Ｒ^１０は２価の有機基であり、ｎは式（１）で表される構成単位の繰り返し数である。）

(In Formula (4), R ⁹ is a tetravalent organic group, R ¹⁰ is a divalent organic group, and n is the number of repeating structural units represented by Formula (1).)

In formula (4), R ⁹ is a tetravalent organic group, R ¹⁰ is a divalent organic group, and their carbon number is preferably 2 to 50, more preferably 2 to 30. R ¹ and R ² may each be an aliphatic group, an aromatic group, or a group obtained by combining these structures. R ⁹ and R ¹⁰ may contain a halogen atom, an oxygen atom, and a sulfur atom in addition to the carbon atom and the hydrogen atom. When R ⁹ and R ¹⁰ contain an oxygen atom, a nitrogen atom, or a sulfur atom, the oxygen atom, nitrogen atom, or sulfur atom is a nitrogen-containing heterocyclic group, —CONH—, —NH—, —N═N—, R ⁹ and R ¹⁰ as a group selected from —CH═N—, —COO—, —O—, —CO—, —SO—, —SO ₂ —, —S—, and —S—S— R ⁹ and R ¹⁰ may be included as a group selected from —O—, —CO—, —SO—, —SO ₂ —, —S—, and —S—S—. More preferred.

  By heating the polyamic acid composed of the structural unit represented by the above formula (4), a polyimide resin composed of the structural unit represented by the following formula (5) is obtained.

（式（５）中、Ｒ^１及びＲ^２は式（４）と同意であり、ｎは式（５）で表される構成単位の繰り返し数である。）

(In Formula (5), R ¹ and R ² are the same as in Formula (4), and n is the number of repeating structural units represented by Formula (5).)

  Hereinafter, the tetracarboxylic dianhydride component, the diamine component, and N, N, N ′, N′-tetramethylurea used for the preparation of the polyamic acid and the method for producing the polyamic acid will be described.

(Tetracarboxylic dianhydride component)
The tetracarboxylic dianhydride component that is a raw material for synthesizing the polyamic acid is not particularly limited as long as it can form a polyamic acid by reacting with the diamine component. The tetracarboxylic dianhydride component can be appropriately selected from tetracarboxylic dianhydrides conventionally used as raw materials for synthesizing polyamic acids. The tetracarboxylic dianhydride component may be an aromatic tetracarboxylic dianhydride or an aliphatic tetracarboxylic dianhydride, but from the viewpoint of the heat resistance of the resulting polyimide resin, it is aromatic. Tetracarboxylic dianhydride is preferred. Two or more tetracarboxylic dianhydride components may be used in combination.

  Preferable specific examples of the aromatic tetracarboxylic dianhydride include pyromellitic dianhydride, 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride, 2,3,3 ′, 4 ′. -Biphenyltetracarboxylic dianhydride, 3,3 ', 4,4'-benzophenonetetracarboxylic dianhydride, 4,4'-oxydiphthalic anhydride, and 3,3', 4,4'-diphenylsulfone Tetracarboxylic dianhydride etc. are mentioned. Among these, 3,3 ′, 4,4′-biphenyltetracarboxylic dianhydride and pyromellitic dianhydride are preferable from the viewpoint of price and availability.

(Diamine component)
The diamine component used as the raw material for synthesizing the polyamic acid is not particularly limited as long as it can form the polyamic acid by reacting with the tetracarboxylic dianhydride component. The diamine component can be appropriately selected from diamines conventionally used as a raw material for synthesizing polyamic acid. The diamine component may be an aromatic diamine or an aliphatic diamine, but an aromatic diamine is preferred from the viewpoint of the heat resistance of the resulting polyimide resin. Two or more diamine components may be used in combination.

  Preferable specific examples of the aromatic diamine include p-phenylenediamine, m-phenylenediamine, 2,4-diaminotoluene, 4,4′-diaminobiphenyl, 4,4′-diamino-2,2′-bis ( Trifluoromethyl) biphenyl, 3,3′-diaminodiphenyl sulfone, 4,4′-diaminodiphenyl sulfone, 4,4′-diaminodiphenyl sulfide, 4,4′-diaminodiphenylmethane, 4,4′-diaminodiphenyl ether, 3 , 4′-diaminodiphenyl ether, 3,3′-diaminodiphenyl ether, 1,4-bis (4-aminophenoxy) benzene, 1,3-bis (4-aminophenoxy) benzene, 1,3-bis (3-amino Phenoxy) benzene, 4,4′-bis (4-aminophenoxy) biphenyl Bis [4- (4-aminophenoxy) phenyl] sulfone, bis [4- (3-aminophenoxy) phenyl] sulfone, 2,2-bis [4- (4-aminophenoxy) phenyl] propane, and 2,2 -Bis [4- (4-aminophenoxy) phenyl] hexafluoropropane and the like. Among these, p-phenylenediamine, m-phenylenediamine, 2,4-diaminotoluene, and 4,4'-diaminodiphenyl ether are preferable from the viewpoint of price and availability.

(N, N, N ′, N′-tetramethylurea)
The tetracarboxylic dianhydride component and the diamine component are synthesized using N, N, N ′, N′-tetramethylurea as a solvent. When a polyamic acid synthesized by using N, N, N ′, N′-tetramethylurea as a solvent is heated to produce a polyimide resin, a polyimide resin excellent in tensile elongation and heat resistance can be easily obtained.

(Synthesis of polyamic acid)
The polycarboxylic acid is synthesized by reacting the tetracarboxylic dianhydride component and the diamine component described above using N, N, N ′, N′-tetramethylurea as a solvent. Although the usage-amount of the tetracarboxylic dianhydride component and diamine component at the time of synthesize | combining a polyamic acid is not specifically limited, diamine component is 0.50-1.50 with respect to 1 mol of tetracarboxylic dianhydride components. It is preferable to use mol, more preferably 0.60 to 1.30 mol, and particularly preferably 0.70 to 1.20 mol.

  The amount of N, N, N ′, N′-tetramethylurea used is not particularly limited as long as the object of the present invention is not impaired. Typically, the amount of N, N, N ′, N′-tetramethylurea used is 100 to 4000 with respect to 100 parts by mass in total of the amount of the tetracarboxylic dianhydride component and the amount of the diamine component. A mass part is preferable and 150-2000 mass parts is more preferable.

  Moreover, when synthesizing a polyamic acid, it is most preferable to use only N, N, N ′, N′-tetramethylurea as a solvent. However, other solvents of N, N, N ′, N′-tetramethylurea can be used together with N, N, N ′, N′-tetramethylurea as long as the object of the present invention is not impaired. The other solvent of N, N, N ′, N′-tetramethylurea can be appropriately selected from solvents conventionally used for the synthesis of polyamic acid. Preferable examples of other solvents of N, N, N ′, N′-tetramethylurea include, for example, N-methyl-2-pyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, hexamethyl Examples include phosphoramide and 1,3-dimethyl-2-imidazolidinone. When other solvents of N, N, N ′, N′-tetramethylurea are used together with N, N, N ′, N′-tetramethylurea, the amount of the other solvent used is used for the synthesis of polyamic acid. 20 mass% or less is preferable with respect to the total mass of a solvent, 10 mass% or less is more preferable, and 5 mass% or less is especially preferable.

  The temperature at which the tetracarboxylic dianhydride component and the diamine component are reacted is not particularly limited as long as the reaction proceeds well. Typically, the reaction temperature between the tetracarboxylic dianhydride component and the diamine component is preferably -5 to 150 ° C, more preferably 0 to 120 ° C, and particularly preferably 0 to 70 ° C. The time for reacting the tetracarboxylic dianhydride component and the diamine component varies depending on the reaction temperature, but typically 1 to 50 hours is preferable, 2 to 40 hours is more preferable, and 5 to 30 Time is particularly preferred.

  A polyamic acid solution is obtained by the method described above. In addition, you may form a polyimide using the solution containing a polyimide powder.

  Subsequently, as illustrated in FIG. 1D, the support substrate 1 to which the solution 3 a is applied is heated and baked to form the laminate 10 in which the resin substrate 3 made of polyimide is formed on the support substrate 1. (Baking process).

  In the firing step, for example, the support substrate 1 is heated to 120 ° C to 350 ° C, preferably 150 ° C to 350 ° C. By heating in such a temperature range, a good quality can be manufactured by suppressing thermal deterioration and thermal decomposition of the produced polyimide (resin substrate 3). In addition, when polyamic acid is heated at a high temperature, consumption of a large amount of energy and deterioration of the treatment equipment over time at a high temperature may be promoted. Therefore, it is preferable to heat the polyamic acid at a low temperature. Specifically, the upper limit of the temperature at which the polyamic acid is heated is preferably 250 ° C. or lower, more preferably 220 ° C. or lower, and particularly preferably 200 ° C. or lower.

  In the present embodiment, the treatment film 2 exists between the surface 1 a of the support substrate 1 and the resin substrate 3. Since silyl groups are formed on the surface 1a by the treatment film 2 and OH groups (hydroxy groups) are not present or hardly exist, the formation of covalent bonds with the polyimide constituting the resin substrate 3 is suppressed. Further, the formation of the silyl group reduces the adhesion between the polyimide and the treatment film 2 and improves the peelability of the resin substrate 3.

  FIG. 3 shows the experimental results showing the effect of improving the peelability in the treated film 2. In FIG. 3, the horizontal axis indicates the time (elapsed days) that has elapsed since the resin substrate was formed on the support substrate, and the vertical axis indicates the adhesion strength (unit: g) between the polyimide (resin substrate) and the support substrate. It is a thing. FIG. 3 shows, as a comparison, a case where a support substrate that was not treated with a silane coupling agent was used as “untreated”, and a case where a support substrate that was treated with a silane coupling agent was used. “Processed 1” and “Processed 2”. Note that “treated 1” and “treated 2” differ in the silane coupling agent used in the treatment. In “treated 1”, the silane coupling agent OAP (manufactured by Tokyo Ohka Kogyo Co., Ltd.), “treated” In "Sai 2", a silane coupling agent OSRA (manufactured by Tokyo Ohka Kogyo Co., Ltd.) was used.

  As shown in FIG. 3, when the treatment with the silane coupling agent is performed (treated 1 and 2) or not (untreated), the resin substrate is formed on the support substrate and then elapses. Adhesion strength decreases. When the elapsed days exceed 3 days, there is no significant difference in adhesion strength between when the treatment with the silane coupling agent is performed and when the treatment is not performed. This is due to the fact that the adhesion strength at the interface of the support substrate has decreased due to the adsorption of moisture by the polyimide constituting the resin substrate over time.

  Usually, peeling from the support substrate is performed immediately after forming the resin substrate. Therefore, it is important to reduce the adhesion strength when the elapsed time is short.

  From FIG. 3, when the treatment with the silane coupling agent was performed (treated 1 and 2), the elapsed time is short, that is, the resin substrate is supported with a low adhesion even when moisture adsorption of polyimide does not occur. It was confirmed that the film was peeled off.

  Subsequently, an electronic device (not shown) corresponding to the application is laminated on the upper surface of the resin substrate 3. For example, it is possible to form a display device such as a liquid crystal display, an organic EL display, and electronic paper, particularly a flexible display device, by forming a TFT element on the resin substrate 3 and further laminating or bonding display elements. .

  After forming an electronic device (not shown), the resin substrate 3 is peeled from the support substrate 1 as shown in FIG. When the resin substrate 3 is peeled from the support substrate 1, the resin substrate 3 can be favorably peeled from the support substrate 1 by using the substrate peeling apparatus of this embodiment.

FIG. 4 is a diagram showing a schematic configuration of the substrate peeling apparatus 100 of the present embodiment.
As shown in FIG. 4, the substrate peeling apparatus 100 includes an insertion unit 20, a moving mechanism 21, and a peeling mechanism 22.

  The insertion portion 20 is disposed at at least one corner of the resin substrate 3 and is inserted into the interface with the support substrate 1 at the corner of the resin substrate 3. In the present embodiment, the insertion unit 20 includes a first insertion unit 30, a second insertion unit 31, a third insertion unit 32, and a fourth insertion unit 33.

  The first insertion portion 30, the second insertion portion 31, the third insertion portion 32, and the fourth insertion portion 33 correspond to the four corner portions 3A, 3B, 3C, 3D of the resin substrate 3 having a rectangular planar shape, respectively. Arranged.

  The first insertion portion 30, the second insertion portion 31, the third insertion portion 32, and the fourth insertion portion 33 have the same configuration. In the present embodiment, the first insertion portion 30 includes a blade 30A and an extrusion portion 30B. The second insertion portion 31 includes a blade 31A and an extrusion portion 31B. The third insertion portion 32 includes a blade 32A and an extrusion portion 32B. The fourth insertion portion 33 includes a blade 33A and an extrusion portion 33B.

As the blades 30A, 31A, 32A, 33A, it is preferable to use either flat blades or round blades. In the present embodiment, as the blades 30A, 31A, 32A, and 33A, for example, flat blades composed of cutter blades are used.
The extruding portions 30B, 31B, 32B, and 33B are composed of, for example, an actuator or the like, and can be inserted into the interface between the support substrate 1 and the resin substrate 3 by extruding the blades 30A, 31A, 32A, and 33A in predetermined directions. .

  The moving mechanism 21 relatively moves the insertion portion 20 and the support substrate 1 in a state where the insertion portion 20 (each blade 30A, 31A, 32A, 33A) is inserted into the interface between the resin substrate 3 and the support substrate 1. Is. The moving mechanism 21 is configured by a driving device such as an actuator, for example. The moving mechanism 21 can move the first insertion portion 30, the second insertion portion 31, the third insertion portion 32, and the fourth insertion portion 33 independently along the outer periphery of the resin substrate 3. A slit is formed at the interface between the substrate 3 and the support substrate 1.

  In this embodiment, the 1st insertion part 30, the 2nd insertion part 31, the 3rd insertion part 32, and the 4th insertion part 33 move independently along the perimeter of resin board 3, respectively, and resin board 3 and A slit is formed at the interface of the support substrate 1 so as to surround the outer periphery of the resin substrate 3 in a frame shape.

  The peeling mechanism 22 holds the resin substrate 3 and peels the resin substrate 3 from the support substrate 1 with a slit formed at the interface by the first insertion portion 30 and the second insertion portion 31 as a base point.

  The peeling mechanism 22 includes a holding unit 40 that holds the resin substrate 3. The holding method of the resin substrate 3 in the holding unit 40 is not particularly limited. For example, an adsorption holding method for adsorbing and holding the resin substrate 3, an adhesion method for adhering and holding the resin substrate 3, or a slit of the resin substrate 3. A gripping method for directly gripping the portion, a winding method for winding the slit portion around the roller member, or the like can be employed.

Here, the board | substrate peeling method by the board | substrate peeling apparatus 100 is demonstrated based on the flowchart shown in FIG.
The substrate peeling method of this embodiment includes an insertion step S1, a moving step S2, and a peeling step S3.

  In the insertion step S <b> 1, the insertion portion 20 is inserted into the interface with the support substrate 1 at the corner portions 3 </ b> A and 3 </ b> B of the resin substrate 3. Specifically, the 1st insertion part 30, the 2nd insertion part 31, the 3rd insertion part 32, and the 4th insertion part 33 are cutting blade 30A, 31B, 32B, and 33B by each extrusion part 30B, 31B, 32B, and 33B. It is inserted into the interface K by gradually pushing in from the corners 3A, 3B.

In the present embodiment, as shown in FIG. 4, the first insertion portion 30 is arranged so that the blade surface of the blade 30A composed of, for example, a flat blade forms an angle of approximately 45 degrees with respect to the corner portion 3A. Has been.
In the present embodiment, the extruding portion 30B extrudes the blade 30A in the direction orthogonal to the blade surface and inserts it into the interface K of the corner portion 3A.

Also in the second insertion portion 31, as shown in FIG. 4, the blade surface of the blade 31A composed of a flat blade is disposed so as to form an angle of about 45 degrees with respect to the corner portion 3B. The extruding portion 31B extrudes the blade 31A in the direction orthogonal to the blade surface and inserts it into the interface of the corner portion 3B.
Also in the third insertion portion 32, as shown in FIG. 4, the blade surface of the blade 32A constituted by a flat blade is disposed so as to form an angle of approximately 45 degrees with respect to the corner portion 3C. The extruding portion 32B extrudes the blade 32A in the direction orthogonal to the blade surface and inserts it into the interface of the corner portion 3C.
Also in the fourth insertion portion 33, as shown in FIG. 4, the blade surface of the blade 33A composed of a flat blade is disposed so as to form an angle of about 45 degrees with respect to the corner portion 3D. The extruding portion 33B extrudes the blade 33A in the direction orthogonal to the blade surface and inserts it into the interface of the corner portion 3D.

  In the present embodiment, the resin substrate 3 is formed smaller than the support substrate 1. Therefore, the blades 30A, 31A, 32A, and 33A are in sliding contact with the surface of the support substrate 1. Therefore, the support substrate 1 can guide the insertion operation in which the blades 30 </ b> A, 31 </ b> A, 32 </ b> A, 33 </ b> A are inserted into the interface of the resin substrate 3.

  In the moving step S2, the moving mechanism 21 moves the blades 30A, 31A, 32A, 33A inserted in the interface independently along the outer periphery of the resin substrate 3, as shown in FIG. The cutters 30 </ b> A, 31 </ b> A, 32 </ b> A, 33 </ b> A can satisfactorily form the slits S by moving while being in sliding contact with the surface of the support substrate 1.

  In this embodiment, the slits S can be uniformly formed so as to surround the outer periphery of the resin substrate 3 by accurately controlling the insertion direction and the insertion amount of the blade at each corner 3A, 3B, 3C, 3D. Is possible.

After forming the slit S, the peeling step S3 is performed.
In the peeling step S3, the peeling mechanism 22 holds a portion (slit forming portion) where the slit S of the resin substrate 3 is formed in the holding unit 40. In the present embodiment, the holding unit 40 holds the slit forming portion by suction.

  The peeling mechanism 22 gradually peels the resin substrate 3 from the support substrate 1 with the slit S formed at the interface K by the insertion portion 20 as a base point.

According to this embodiment, since the treatment film 2 is formed on the surface 1a of the support substrate 1, the adhesion between the polyimide and the treatment film 2 is reduced as described above. Therefore, starting from the slit S, the resin substrate 3 on which the electronic device is formed can be easily and reliably peeled from the support substrate 1.
Therefore, it can peel easily from the support substrate 1 without damaging the resin substrate 3 at the time of peeling.

(Second embodiment)
Next, a second embodiment of the present invention will be described.
The difference between the present embodiment and the first embodiment is the number of insertion portions. Therefore, below, the same code | symbol is attached | subjected about the same structure and member as 1st embodiment, and the detailed description shall be abbreviate | omitted.

FIG. 7 is a diagram showing a schematic configuration of the substrate peeling apparatus 200 of the present embodiment.
As shown in FIG. 7, the substrate peeling apparatus 200 includes an insertion unit 120, a moving mechanism 121, a peeling mechanism 22, and a rotating mechanism 123.

  As shown in FIG. 7, the insertion portion 120 of the present embodiment includes a first insertion portion 130 and a third insertion portion 132 that are respectively disposed at a pair of corner portions 3 </ b> A and 3 </ b> C on a diagonal line of the rectangular resin substrate 3. Contains.

  The first insertion part 130 and the third insertion part 132 have the same configuration. In the present embodiment, the first insertion portion 130 includes a blade 130A and an extrusion portion 130B. The third insertion portion 132 includes a blade 132A and an extrusion portion 132B.

  The moving mechanism 121 has the first insertion portion 130 and the third insertion portion 132 inserted in the interface between the resin substrate 3 and the support substrate 1 along the left-right direction (X direction) in FIG. The part 130 and the third insertion part 132 are moved.

  The rotation mechanism 123 is set in the paper surface penetration direction of FIG. 6 and rotates the support substrate 1 around the rotation axis O passing through the center of the support substrate 1.

Subsequently, a substrate peeling method by the substrate peeling apparatus 200 of the present embodiment will be described with reference to FIG.
First, the insertion part 120 is inserted into the interface with the support substrate 1 at the corners 3 </ b> A and 3 </ b> C of the resin substrate 3. As shown to Fig.8 (a), the 1st insertion part 130 pushes 130A of blades gradually from the corner | angular part 3A, and inserts it in an interface. On the other hand, the third insertion portion 132 inserts the blade 132A into the interface by gradually pushing it in from the corner portion 3C.

  The moving mechanism 121 moves the blade 130A to the corner 3B side (+ X side shown in FIG. 8A) and moves the blade 132A to the corner 3D side (−X side shown in FIG. 8A). . Thereby, two slits S can be formed along the outer periphery of the resin substrate 3.

  Subsequently, the moving mechanism 121 returns the blades 130A and 132A to the initial position as shown in FIG. Thereafter, the rotation mechanism 123 rotates the support substrate 1 by 90 degrees counterclockwise with respect to the rotation axis O. As a result, the first insertion portion 130 faces the corner 3B of the resin substrate 3 and the third insertion portion 132 faces the corner 3D of the resin substrate 3.

  Subsequently, as illustrated in FIG. 8C, the first insertion portion 130 gradually pushes the blade 130 </ b> A into the interface K of the corner portion 3 </ b> B. On the other hand, the third insertion portion 132 gradually pushes the blade 132A into the interface K of the corner portion 3D.

Subsequently, the moving mechanism 121 moves the blade 130A to the corner 3C side (+ X side shown in FIG. 8C) and moves the blade 132A to the corner 3A side (−X side shown in FIG. 8C). Move to. Thereby, two slits S can be formed along the outer periphery of the resin substrate 3.
As described above, the four slits S surrounding the outer periphery of the resin substrate 3 can be formed.

  After forming the slit S, the peeling mechanism 22 holds the portion of the holding portion 40 where the slit S of the resin substrate 3 is formed (slit forming portion). The peeling mechanism 22 gradually peels the resin substrate 3 from the support substrate 1 with the slit S formed at the interface K by the insertion portion 120 as a base point.

  As mentioned above, although one Embodiment of this invention was described, it is not limited to the said content, In the range which does not deviate from the main point of invention, it can change suitably. For example, in the above-described embodiment, the case where the treatment film 2 is formed on the entire surface 1a of the support substrate 1 is described as an example, but the present invention is not limited to this.

  In the above embodiment, the case where the surface of the support substrate 1 is used as a guide for the insertion portions 20 and 120 by forming the resin substrate 3 smaller than the support substrate 1 has been described as an example. Is not limited to this.

  For example, as shown in FIG. 9A, a guide member 80 disposed on the outer peripheral portion of the support substrate 1 may be used. The guide member 80 has a guide surface 80a having the same height as the surface (surface 1a) on which the resin substrate 3 is formed in the support substrate 1.

  If such a guide member 80 is used, even when the support substrate 1 and the resin substrate 3 are approximately the same size in a plan view, as shown in FIG. Since the insertion operation of the insertion portions 20 and 120 is guided along the guide surface 80a, the slit S can be satisfactorily formed at the interface.

  In the present embodiment, the case where the support substrate 1 is rotated using the rotation mechanism 123 in order to change the insertion position of the insertion portion 120 with respect to the resin substrate 3 has been described as an example. However, the present invention is not limited to this. . For example, the slit S may be formed without rotating the support substrate 1 by changing the movement direction of the insertion portion 120 by the moving mechanism 121 by 90 degrees while rotating the insertion portion 120 itself by the rotation mechanism 123. .

DESCRIPTION OF SYMBOLS 1 ... Support substrate (support body), 2 ... Treatment film, 3 ... Resin substrate, 3A, 3B, 3C, 3D ... Corner | angular part, 20 ... Insertion part, 21 ... Moving mechanism, 22 ... Peeling mechanism, 30A, 31A, 32A , 33A, 34A... Cutlery, 80... Guide member, 80a... Guide surface, 100, 200.

Claims (17)

In a substrate peeling apparatus for peeling a resin substrate having a rectangular planar shape formed on a support,
An insertion portion that is disposed at at least one corner of the resin substrate and is insertable at an interface with the support at the corner of the resin substrate;
A moving mechanism for relatively moving the insertion portion and the support in a state where the insertion portion is inserted into the interface;
A peeling mechanism that holds the resin substrate and peels from the support using a slit formed at the interface by the insertion portion,
A substrate peeling apparatus. The board | substrate peeling apparatus of Claim 1. The said insertion part is comprised from a cutter. The substrate peeling apparatus according to claim 2, wherein the blade is configured by a flat blade or a round blade. The board | substrate peeling apparatus as described in any one of Claims 1-3 by which the said insertion part is each arrange | positioned at the four corners of the corner | angular part of the said resin substrate. The board | substrate peeling apparatus as described in any one of Claims 1-3 with which the said cutter is each arrange | positioned at a pair of corner | angular part on the diagonal of the said resin substrate. The guide member which is provided in the outer peripheral part of the said support body, has a surface of the same height as the surface in which the said resin substrate in the said support body was formed, and further guides the insertion operation of the said insertion part. The substrate peeling apparatus according to claim 5. The board | substrate peeling apparatus as described in any one of Claims 1-6 in which the said moving mechanism moves the said insertion part along the outer periphery of the said resin substrate. The said resin substrate is a polyimide substrate, The board | substrate peeling apparatus as described in any one of Claims 1-7. The substrate peeling apparatus as described in any one of Claims 1-8 which uses the glass substrate by which the pre-processing layer which consists of a silane coupling agent was previously provided in the surface in which the said resin substrate is formed as the said support body. In the substrate peeling method for peeling the resin substrate having a rectangular planar shape formed on the support,
An insertion step of inserting an insertion portion disposed at at least one corner of the resin substrate into an interface with the support at the corner of the resin substrate;
A movement step of relatively moving the insertion portion and the support body in a state where the insertion portion is inserted into the interface;
A peeling step of peeling the resin substrate from the support using the slit formed at the interface by the insertion portion as a base point;
A substrate peeling method. The substrate peeling method according to claim 10, wherein a flat blade or a round blade is used as the insertion portion. The substrate peeling method according to claim 10 or 11, wherein, in the insertion step, the insertion portions arranged at four corners of the resin substrate are inserted into an interface between the corner and the resin substrate. The substrate peeling method according to claim 10 or 11, wherein, in the inserting step, the insertion portions respectively disposed at a pair of corner portions on a diagonal line of the resin substrate are inserted into an interface between the corner portion and the resin substrate. . In the insertion step, the insertion operation of the insertion portion is guided using a guide member provided on an outer peripheral portion of the support and having a surface having the same height as the surface on which the resin substrate is formed in the support. The substrate peeling method according to any one of claims 10 to 13. In the said movement step, the said insertion part moves along the outer periphery of the said resin substrate, The board | substrate peeling method as described in any one of Claims 10-14. The substrate peeling method according to any one of claims 10 to 15, wherein the resin substrate is a polyimide substrate. The substrate peeling method according to any one of claims 10 to 16, wherein a glass substrate in which a pretreatment layer made of a silane coupling agent is provided in advance on a surface on which the resin substrate is formed is used as the support.

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