JP2016174758A - Slit lamp microscope - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a novel technology on a slit lamp microscope for observing various illumination positions of slit light in various observation directions.SOLUTION: A slit lamp microscope includes an illumination system and an imaging system. The illumination system includes a slit light generation part. The slit light generation part generates slit light. The illumination system can change an illumination position of the slit light for an eye to be examined. The imaging system guides the return light of the slit light from the eye to be examined to an imaging device.SELECTED DRAWING: Figure 2

Description

  The present invention relates to a slit lamp microscope.

  The slit lamp microscope is an ophthalmologic apparatus for observing a cross section of a target region by cutting out a light section of the target region of a subject's eye using slit light and acquiring an image of the cross section. A slit lamp microscope is used for diagnosing the cornea and the crystalline lens.

  In general, a slit lamp microscope includes an illumination system and an imaging system (observation system). The illumination system is configured to illuminate the illumination position fixed on the eye to be examined with slit light whose slit width is adjusted by a user such as an examiner. The illumination system and the imaging system are configured to be independently rotatable around a predetermined rotation axis by a rotation mechanism. The user can illuminate various illumination positions with slit light while maintaining the focused state of the illumination system by rotating the illumination system. Similarly, the user can image (observe) the region of interest illuminated with the slit light from various observation directions by rotating the imaging system. The illumination system and the imaging system are configured to be integrally movable in the lateral direction and the front-rear direction by a slide mechanism, and can illuminate an arbitrary position with a slit light from an arbitrary angle, allowing observation from a desired observation direction. It is configured as follows.

JP 2014-217440 A

  However, the conventional slit lamp microscope is configured to include a rotation mechanism for rotating the illumination system and the imaging system, a slide mechanism for moving in the lateral direction, etc. There is a problem of inviting. Further, if the rotation mechanism and the slide mechanism are eliminated, there is a problem that it is impossible to observe various illumination positions of slit light from various observation directions.

  The present invention has been made to solve such problems, and its purpose is to develop a new technique of a slit lamp microscope for observing illumination positions of various slit lights from various observation directions. It is to provide.

  The slit lamp microscope according to the embodiment includes an illumination system and an imaging system. The illumination system includes a slit light generation unit. The slit light generation unit generates slit light. The illumination system can change the illumination position of the eye to be examined by the slit light. The imaging system guides the return light of the slit light from the eye to be examined to the imaging device.

  According to the present invention, it is possible to provide a new technique of a slit lamp microscope for observing illumination positions of various slit lights from various observation directions.

It is the schematic which shows the structural example of the slit lamp microscope which concerns on embodiment. It is the schematic which shows the structural example of the optical system of the slit lamp microscope which concerns on embodiment. It is operation | movement explanatory drawing of the optical system of the slit lamp microscope which concerns on embodiment. It is operation | movement explanatory drawing of the optical system of the slit lamp microscope which concerns on embodiment. It is operation | movement explanatory drawing of the optical system of the slit lamp microscope which concerns on embodiment. It is operation | movement explanatory drawing of the optical system of the slit lamp microscope which concerns on embodiment. It is the schematic which shows the structural example of the control system of the slit lamp microscope which concerns on embodiment. It is a flowchart of the operation example of the slit lamp microscope which concerns on embodiment. It is a flowchart of the operation example of the slit lamp microscope which concerns on embodiment. It is a flowchart of the operation example of the slit lamp microscope which concerns on embodiment.

  An example of an embodiment of a slit lamp microscope according to the present invention will be described in detail with reference to the drawings. In addition, it is possible to use suitably the description content of the literature described in this specification as the content of the following embodiment.

  First, the direction is defined. The direction from the optical element located closest to the subject in the apparatus optical system toward the subject is defined as the front direction, and the opposite direction is defined as the rear direction. The horizontal direction orthogonal to the front direction is the left-right direction. Furthermore, the direction orthogonal to both the front-rear direction and the left-right direction is defined as the up-down direction.

  FIG. 1 shows a block diagram of a configuration example of a slit lamp microscope according to this embodiment. The slit lamp microscope 1 is provided with, for example, a jaw holder and a forehead for stably arranging the face of the subject. The slit lamp microscope 1 observes a cross section of the target region by cutting out a light section of the target region of the subject's eye (test eye) stably arranged using the slit light, or displays an image of the cross section. It is a device that can be acquired.

  A controller 100 is connected to the slit lamp microscope 1. The control unit 100 performs various control processes and arithmetic processes. In addition, instead of providing the control unit 100 separately from the main body of the slit lamp microscope 1 (a housing for storing an optical system or the like), a configuration in which the same control unit is mounted on the main body of the slit lamp microscope 1 is applied. Is also possible.

  The slit lamp microscope 1 includes an illumination system 10, an imaging system (observation system) 20, a fixation system 30, an objective lens 40, and an operation unit 50. In addition, the slit lamp microscope 1 may further include a display unit (not shown) for displaying an image of the eye to be examined photographed by the photographing system 20.

  The illumination system 10 includes an optical system for generating slit light and illuminating the subject's eye with the generated slit light. The slit light is illumination light whose slit width can be changed at least. The imaging system 20 includes an optical system for guiding the return light of the slit light from the eye to be examined to the imaging device. The imaging system 20 may be configured including an imaging device. The fixation system 30 includes an optical system for projecting a fixation target on the fundus of the subject's eye. The objective lens 40 is disposed in the slit light path. The illumination system 10 illuminates the subject's eye with slit light through the objective lens 40. The imaging system 20 guides the return light of the slit light from the eye to be examined via the objective lens 40 to the imaging device. The fixation system 30 projects a fixation target on the fundus of the eye to be examined via the objective lens 40. A common objective lens 40 is provided for the illumination system 10, the imaging system 20, and the fixation system 30. The operation unit 50 includes an operation device that receives an operation input for controlling the slit lamp microscope 1.

  For example, at least the illumination system 10 and the imaging system 20 are mounted on a base (not shown). The base is configured to be movable in the horizontal direction and the front-rear direction by a slide mechanism. The base is moved when a user such as an examiner operates the operation unit 50. For example, when the operation unit 50 includes an operation handle, the base is moved by tilting the operation handle.

  The illumination system 10 illuminates the subject's eye with slit light that can change the illumination position with respect to the subject's eye. The illumination system 10 may or may not be configured to be rotatable about a predetermined rotation axis. The illumination system 10 may be configured to swing in the vertical direction. In other words, the elevation angle and depression angle of the slit light may be changed.

  Similarly to the illumination system 10, the imaging system 20 may or may not be configured to be rotatable about a predetermined rotation axis. If it can be rotated, the photographing system 20 rotates together with the illumination system 10. For example, a support arm that supports the integrated illumination system 10 and photographing system 20 is provided on a base or a support portion provided on the base so as to be rotatable about a predetermined rotation axis in a horizontal plane. Therefore, the moving mechanism is provided with an actuator that generates a driving force for rotating the support arm, and a transmission mechanism that transmits the driving force to the support arm. The actuator is constituted by, for example, a stepping motor (pulse motor). The transmission mechanism is constituted by, for example, a combination of gears, a rack and pinion, or the like. In addition, you may move by rotating a support arm manually.

  The imaging system 20 includes, for example, an optical system that guides reflected light from the eye to be examined to the imaging device. As described above, the orientation of the illumination system 10 and the imaging system 20 (the direction of the optical axis) relative to the eye to be examined can be changed by rotating the support arm. Note that the reflected light of the slit light includes various kinds of light that pass through the eye to be examined, such as scattered light, and these various kinds of light are referred to as “return light” or “reflected light”. To do. Further, in fluorescence contrast imaging or fluorescence contrast observation using illumination light as excitation light, fluorescence emitted by excitation light is included in “return light”.

[Configuration of optical system]
In FIG. 2, the structural example of the optical system of the slit lamp microscope 1 is shown typically. In FIG. 2, for convenience of explanation, an optical member such as a lens disposed between the slit light generation unit 11 and the optical scanner 12 is appropriately omitted. In FIG. 2, the same parts as those in FIG.

[Lighting system]
The illumination system 10 includes a slit light generation unit 11, an optical scanner 12, a collimator lens 13, a first optical path coupling member 14, and a second optical path coupling member 15. Reference symbol O <b> 1 indicates the optical axis (illumination optical axis) of the illumination system 10.

  The slit light generation unit 11 generates slit light. The slit light generation unit 11 generates slit light having a slit width specified by using the operation unit 50. The slit light generation unit 11 further includes the direction of the slit, the length of the slit light, the shape of the slit light (shape on the predetermined irradiation surface), and the irradiation position of the slit light (irradiation position on the predetermined irradiation surface). ), A slit light that can change at least one of them may be generated. The user can specify the direction of the slit, the length, shape, and irradiation position of the slit light by using the operation unit 50.

  The slit light generation unit 11 is disposed at a position optically conjugate with the illumination position (observation surface) of the slit light with respect to the eye E.

  The slit light generation unit 11 includes, for example, a projector. The projector can output light having a preset illumination pattern based on control by the control unit 100. Accordingly, the projector can output slit light that can arbitrarily change the slit width, slit direction, slit light length, shape, and irradiation position. For example, the projector can arbitrarily change the entrance position of the slit light in the optical scanner 12 by changing the irradiation position on a predetermined irradiation surface by changing the position of the illumination pattern.

  The illumination pattern can be set by the user using the operation unit 50, for example. When the user designates, for example, a shape pattern, an outer shape, a size, and the like using the operation unit 50, the control unit 100 identifies an illumination pattern based on the designated shape pattern and the like, and based on the identified illumination pattern. It is possible to control the projector.

  The projector may be a known projector using a digital micromirror device. The projector may further include a light source. Examples of the light source include an LED (Light Emitting Diode) light source and a light source capable of outputting light of each color component of RGB. The projector may further include a relay optical system, a collimator lens, a projection lens, and the like.

  Further, the projector may be one using LCoS (Liquid Crystal on Silicon) or MEMS (Micro Electro Mechanical Systems). Furthermore, the projector may use a liquid crystal display (LCD) (transmission type, reflection type). Since such a configuration is known, detailed description thereof is omitted. Any projector can be used as long as it can output illumination light corresponding to an illumination pattern whose shape and irradiation position can be arbitrarily changed.

  The slit light generation unit 11 may change the illumination position of the slit light by changing the illumination pattern. In this case, the slit light generation unit 11 may include a projector similar to that described above. Moreover, the slit light generation part 11 may be comprised including the illumination light source and the slit formation part. The illumination light source irradiates the slit forming part with illumination light. The slit light generation unit 11 may be configured to include a plurality of light sources as illumination light sources. For example, both a light source (halogen lamp, LED, etc.) that outputs steady light and a light source (xenon lamp, LED, etc.) that outputs flash light can be provided as illumination light sources. Further, a light source for corneal observation and a light source for fundus observation may be provided separately. The illumination light source includes at least a visible light source that outputs visible light. The illumination light source may include, for example, a light source that outputs infrared light (for example, the center wavelength is 800 nm to 1000 nm), and may output infrared light as illumination light. The slit forming part is used to generate slit light. The slit forming part has, for example, a pair of slit blades. The width of the slit light is changed by changing the interval between the slit blades (slit width).

  The optical scanner 12 deflects the slit light in one or two dimensions. The optical scanner 12 can change the direction of the slit of the incident slit light by changing the direction of the deflection surface of the deflection member. The user can specify the deflection direction of the slit light by the optical scanner 12 by using the operation unit 50. The optical scanner 12 is disposed at a position optically conjugate with the illumination position (observation surface) of the slit light with respect to the eye E. For example, the deflection surface of the slit light in the optical scanner 12 is disposed at a position optically conjugate with the illumination position of the slit light with respect to the eye E. In other words, the illumination position of the slit light with respect to the slit light generation unit 11, the optical scanner 12, and the eye E is disposed at a substantially optically conjugate position.

  When the slit light is deflected one-dimensionally, it is possible to use a uniaxial deflecting member as the optical scanner 12. For example, the deflection direction of the slit light by the deflecting member is set to a direction substantially orthogonal (crossing) to the slit direction of the slit light. When the slit light is deflected two-dimensionally, a first deflecting member that deflects in the first direction and a second deflecting member that deflects in the second direction can be used as the optical scanner 12. The first direction is a direction substantially orthogonal (crossing) to the second direction. Examples of the deflecting member used in the optical scanner 12 include a galvanometer mirror, a polygon mirror, and a rotating mirror. Further, a dowel prism, a double dove prism, a rotation prism, a MEMS mirror scanner, or the like may be used.

  The collimating lens 13 converts the slit light deflected by the optical scanner 12 into a parallel light beam.

  The first optical path coupling member 14 couples the optical path of the fixation system 30 to the optical path of the illumination system 10. The slit light that has been converted into a parallel light beam by the collimating lens 13 passes through the first optical path coupling member 14. Light for fixing the eye to be examined generated by the fixation system 30 described later is reflected toward the objective lens 40 by the first optical path coupling member 14. For the first optical path coupling member 14, for example, a dichroic mirror or a half mirror is used.

  The second optical path coupling member 15 couples the optical path of the imaging system 20 to the optical path of the illumination system 10. The slit light that has passed through the first optical path coupling member 14 passes through the second optical path coupling member 15. The return light of the slit light from the eye E is reflected toward the imaging system 20 by the second optical path coupling member 15. As the second optical path coupling member 15, for example, a dichroic mirror or a half mirror is used.

  The illumination system 10 can be configured to change the focus position of the slit light. For example, the illumination system 10 includes one or more optical elements for changing the focus position of the slit light. Further, the entire slit light generation unit 11 or the illumination system 10 may be configured to be movable along the optical axis O <b> 1 of the illumination system 10.

  FIG. 3 is an explanatory diagram of the optical system of the illumination system 10 of the slit lamp microscope 1. In FIG. 3, it is assumed that a collimating lens 11 a and a condensing lens 11 b are disposed between the slit light generation unit 11 and the optical scanner 12. The collimating lens 11 a and the condensing lens 11 b may be included in the slit light generation unit 11. In FIG. 3, the optical scanner 12 deflects the slit light two-dimensionally by two deflecting members, and the illustration of the axes of the deflecting members is simplified. Further, in FIG. 3, the illumination position of the slit light in the eye E is shown as an observation plane M. In FIG. 3, the same parts as those in FIG.

  As described above, the slit light generating unit 11, the optical scanner 12, and the observation surface M are disposed at optically substantially conjugate positions. In the illumination system 10, the slit light generation unit 11 generates slit light. The slit light irradiated to the irradiation position Q of the predetermined irradiation surface by the slit light generation unit 11 is converted into a parallel light beam by the collimating lens 11a, and then is set to a predetermined position on the deflection surface of the optical scanner 12 by the condenser lens 11b. To converge. The optical scanner 12 deflects the slit light one-dimensionally or two-dimensionally. The slit light deflected by the optical scanner 12 is converted into a parallel light beam by the collimating lens 13. The slit light converted into a parallel light beam by the collimator lens 13 passes through the first optical path coupling member 14, the second optical path coupling member 15, and the objective lens 40, and passes through the observation surface M. It converges again at the illumination position P.

  The light from the fixation system for fixing the eye E is reflected by the first optical path coupling member 14, passes through the second optical path coupling member 15 and the objective lens 40, and the fundus oculi Ef of the eye E to be examined. Projected on. The return light of the slit light from the eye E is reflected toward the imaging system 20 by the second optical path coupling member 15.

[Shooting system]
As shown in FIG. 2, the imaging system 20 is configured to include an imaging device 21. A symbol O2 indicates an optical axis (imaging optical axis, observation optical axis) of the imaging system 20.

  The imaging device 21 includes an imaging element. The imaging element is a photoelectric conversion element that detects light and outputs an image signal (electric signal). The image signal is input to the control unit 100. As the imaging element, for example, a CCD (Charge Coupled Device) image sensor or a CMOS (Complementary Metal Oxide Semiconductor) image sensor is used.

  In the imaging system 20, the return light of the slit light from the eye E is reflected by the second optical path coupling member 15 and guided to the imaging element of the imaging device 21. The image sensor detects this return light and generates an image signal.

  The imaging system 20 may include a pair of left and right optical systems, for example. In this case, the left and right optical systems have substantially the same configuration, and the optical path of one of the optical systems is divided by a beam splitter or the like, and the divided optical paths are guided to the imaging device 21. Thereby, the user can observe the eye E to be examined with binocular eyes using the pair of left and right optical systems.

  The imaging system 20 can be configured so that the focus position of the return light of the slit light from the eye E can be changed. For example, the photographing system 20 is configured to include one or more optical elements for changing the focus position of the return light of the slit light. Further, the entire imaging device 21 or the imaging system 20 may be configured to be movable along the optical axis O2 of the imaging system 20.

[Fixation system]
The fixation system 30 includes an LCD 31. Reference symbol O <b> 3 indicates the optical axis (fixation optical axis) of the fixation system 30.

  An internal fixation target or the like is displayed on the LCD 31. The light from the LCD 31 is reflected by the first optical path coupling member 14 toward the second optical path coupling member 15 and enters the fundus oculi Ef of the eye E through the objective lens 40. Thereby, an internal fixation target or the like is projected onto the fundus oculi Ef of the eye E to be examined.

  The LCD 31 is configured to be able to change the display position of the fixation target on the screen. By changing the display position of the fixation target on the LCD 31, the projection position of the fixation target on the fundus oculi Ef of the eye E can be changed. The display position of the fixation target on the LCD 31 can be designated by the user by using the operation unit 50.

  Note that the fixation system 30 may be configured to include, for example, a panel in which a plurality of LEDs are arranged instead of the LCD 31 and project a fixation target by turning on any of the LEDs.

  Further, since the fixation can be induced by changing the projection position of the fixation index on the fundus oculi Ef of the eye E to be examined, the observation direction can be changed.

  The slit lamp microscope 1 having the optical system as described above can change the illumination angle and the illumination position of the slit light as follows.

  FIG. 4 shows a first operation explanatory diagram of the slit lamp microscope 1. FIG. 4 is an operation explanatory diagram when the slit light deflection direction is changed by the optical scanner 12 while the slit light irradiation position Q on the predetermined irradiation surface by the slit light generation unit 11 is fixed. In FIG. 4, the imaging system 20, the fixation system 30, the first optical path coupling member 14, and the second optical path coupling member 15 are not shown. 4, parts that are the same as those in FIG. 3 are given the same reference numerals, and descriptions thereof will be omitted as appropriate.

  In the slit lamp microscope 1, the optical system is configured so as to have the above-described conjugate relationship. Therefore, when the slit light is deflected one-dimensionally or two-dimensionally by the optical scanner 12, The illumination position P of the gap light does not change, but the illumination angle of the slit light on the observation surface M changes. Accordingly, the illumination angle of the slit light on the observation surface M can be changed by the optical scanner 12 without changing the positional relationship between the eye E to be examined and the illumination system 10. That is, the illumination angle of the slit light that illuminates the eye E can be changed by changing the deflection direction of the slit light by the optical scanner 12.

  FIG. 5 shows a second operation explanatory view of the slit lamp microscope 1. FIG. 5 is an operation explanatory diagram when the irradiation position of the slit light is changed by the slit light generation unit 11 while the deflection direction of the slit light by the optical scanner 12 is fixed. 5, the imaging system 20, the fixation system 30, the first optical path coupling member 14, and the second optical path coupling member 15 are omitted, as in FIG. In FIG. 5, the same components as those in FIG.

  In the slit lamp microscope 1, when the irradiation position Q of the slit light on the predetermined irradiation surface is changed to the irradiation position Q ′, the illumination position P of the slit light on the observation surface M changes to the illumination position P ′, and the observation surface The illumination angle of the slit light at M changes. Accordingly, it is possible to change the illumination position and the illumination angle of the slit light on the observation surface M by the slit light generation unit 11 without changing the relative positional relationship between the eye E and the illumination system 10. That is, by changing the irradiation position of the slit light on the predetermined irradiation surface by the slit light generation unit 11, the illumination position and the illumination angle of the slit light that illuminates the eye E can be changed.

  As described above, the rotation of the illumination system 10 and the deflection by the optical scanner 12 may be combined. Thereby, for example, in the state where the illumination system 10 is arranged at a desired rotation position and the irradiation angle of the slit light is fixed, the eye E to be examined is changed by the slit light generation unit 11 while changing the irradiation position of the slit light. By taking pictures at various illumination positions, images at various illumination positions can be acquired. When the slit light generation unit 11 changes the irradiation position of the slit light on the predetermined irradiation surface, the change of the illumination angle of the slit light in the eye E due to the change of the irradiation position is deflected by the optical scanner 12. You may cancel by control.

  FIG. 6 shows a third operation explanatory diagram of the slit lamp microscope 1. FIG. 6 is an operation explanatory diagram when the display position r of the fixation index on the LCD 31 of the fixation system 30 is changed to the display position r ′. In FIG. 6, the projection position of the fixed index on the observation surface M ′ corresponding to the fundus oculi Ef of the eye E is shown. In FIG. 6, the same parts as those in FIG.

  In the slit lamp microscope 1, when the display position r of the fixed index on the LCD 31 is changed to the display position r ′, the projection position R of the fixed index on the observation surface M ′ is changed to the projection position R ′. Therefore, by changing the display position of the fixed index on the LCD 31, it is possible to change the projection position of the fixed index projected on the fundus oculi Ef of the eye E to be examined. That is, the fixation of the eye E can be induced by changing the display position of the fixation index on the LCD 31.

[Control system configuration]
A control system of the slit lamp microscope 1 will be described with reference to FIG. As shown in FIG. 7, the control system of the slit lamp microscope 1 is configured around a control unit 100. Note that at least a part of the configuration of the control system may be included in the slit lamp microscope 1.

(Control part)
The control unit 100 controls each unit of the slit lamp microscope 1. The control unit 100 performs control of the illumination system 10, control of the imaging system 20, control of the fixation system 30, control of the display unit 60, and the like.

  Control of the illumination system 10 includes control of the slit light generation unit 11 and control of the optical scanner 12. Further, the focusing position of the slit light may be performed. Control of the slit light generation unit 11 includes switching on and off of the slit light, control of the slit light slit width, and control of changing the light amount of the slit light. As control of the slit width of the slit light, there is control of the direction of the slit, the length, shape, and irradiation position of the slit light. When the slit light generation unit 11 includes a projector, the slit light generation unit 11 is controlled by switching on / off the slit light, controlling the shape of the slit light based on the illumination pattern, and the amount of the slit light. Change control.

  Control of the imaging system 20 includes control of the image sensor 21A included in the imaging device 21 and control for changing the in-focus position of the imaging system 20. Control of the image sensor 21A includes control for changing the charge accumulation time, sensitivity, frame rate, and the like of the image sensor 21A. Further, the control of the imaging system 20 may include control for receiving an image signal obtained by the imaging element 21A and generating an image of the eye E based on the image signal.

[Storage section]
The storage unit 110 stores various computer programs and data. The computer program includes a calculation program and a control program for causing the slit lamp microscope 1 to execute various inspections. The data includes data used in various tests.

  The control unit 100 includes a microprocessor, a RAM (Random Access Memory), a ROM (Read Only Memory), a hard disk drive, and the like. A control program is stored in advance in a storage device such as a ROM or a hard disk drive. The operation of the control unit 100 is realized by the cooperation of this control program and hardware. The control unit 100 may include a storage unit 110. The control unit 100 may be arranged in an apparatus main body (for example, in the base) of the slit lamp microscope 1 or in a housing different from the apparatus main body.

[Display section]
The display unit 60 displays various information under the control of the control unit 100. The display unit 60 includes a display device such as a flat panel display such as an LCD (Liquid Crystal Display). The display unit 60 may be provided in the apparatus main body of the slit lamp microscope 1 or may be provided in the control unit 100.

(Operation section)
The operation unit 50 includes an operation device and an input device. The operation unit 50 includes buttons and switches (for example, an operation handle and an observation magnification operation knob) provided on the slit lamp microscope 1 and operation devices (a mouse, a keyboard, etc.) provided on the control unit 100. The operation unit 50 may include any operation device or input device such as a trackball, an operation panel, a switch, a button, or a dial.

  In FIG. 7, the operation unit 50 and the display unit 60 are separately illustrated, but at least a part of them can be configured integrally. As a specific example, a touch screen can be used.

[Operation]
The operation of the slit lamp microscope 1 will be described. Examples of operation of the slit lamp microscope 1 are shown in FIGS.

(S1)
When the user turns on the slit lamp microscope 1 and puts the subject's face on the chin rest, the control unit 100 displays a fixed index at the preset center position of the LCD 31. As a result, the fixed index is projected at a predetermined projection position on the fundus oculi Ef of the eye E corresponding to the center position of the LCD 31.

(S2)
Next, for example, in order to observe a desired observation site, the illumination system 10 and the imaging system 20 are aligned with respect to the eye E to be examined. The alignment may be performed manually by the user or automatically.

(S3)
Subsequently, the user uses the operation unit 50 to adjust the shape such as the slit width of the slit light. In the slit lamp microscope 1, in response to an operation on the operation unit 50, the control unit 100 changes the shape of the slit light. The slit lamp microscope 1 illuminates the illumination position determined in S2 with this slit light.

(S4)
Upon receiving an instruction from the user using the operation unit 50, the control unit 100 captures an image of the eye E by controlling the image sensor 21A. The control unit 100 stores the captured image of the eye E in the storage unit 110.

(S5)
The control unit 100 determines whether to change the shooting condition. For example, when the change of the shooting condition is designated by the user using the operation unit 50, the control unit 100 determines to change the shooting condition. For example, when the user does not specify a change in the shooting condition using the operation unit 50, the control unit 100 determines that the shooting condition is not changed. When it is determined by the control unit 100 that shooting conditions are set (S5: Y), the operation of the slit lamp microscope 1 proceeds to S6. When it is determined by the control unit 100 that the imaging conditions are not changed (S5: N), the operation of the slit lamp microscope 1 proceeds to S8.

(S6)
When it is determined by the control unit 100 that the shooting condition is to be changed (S5: Y), the control unit 100 changes the shooting condition as specified by the user using the operation unit 50. In S6, for example, as described later, the illumination position, illumination angle, observation direction, light amount of the slit light, and the shape of the slit light are changed as described later.

(S7)
Next, similarly to S4, upon receiving an instruction from the user or the like using the operation unit 50, the control unit 100 captures an image of the eye E under the imaging conditions changed in S6 by controlling the image sensor 21A. To do. The control unit 100 stores the captured image of the eye E in the storage unit 110.

(S8)
When it is determined in S5 that the imaging condition is not changed by the control unit 100 (S5: N), the control unit 100 determines whether or not the imaging of the eye E to be examined by the slit lamp microscope 1 is ended. For example, when the end of shooting is designated by the user using the operation unit 50, the control unit 100 determines to end shooting. For example, when the end of shooting is not specified by the user using the operation unit 50, the control unit 100 determines that shooting is not ended. When it is determined that the imaging of the eye E to be examined by the slit lamp microscope 1 is not completed (S8: N), the operation of the slit lamp microscope 1 proceeds to S5. When it is determined that the photographing of the eye E to be examined by the slit lamp microscope 1 is finished (S8: Y), the operation of the slit lamp microscope 1 is finished (END).

  In S6 of FIG. 8, the slit lamp microscope 1 operates as shown in FIGS. 9 and 10, for example.

(S10)
The control unit 100 determines whether to change the illumination position of the slit light. For example, the change of the illumination position of the slit light is instructed by the user using the operation unit 50. The control unit 100 can determine whether or not to change the illumination position of the slit light based on the user's operation content on the operation unit 50. When it is determined that the illumination position of the slit light is to be changed (S10: Y), the operation of the slit lamp microscope 1 proceeds to S11. When it is determined not to change the illumination position of the slit lamp (S10: N), the operation of the slit lamp microscope 1 proceeds to S12.

(S11)
When it is determined in S10 that the illumination position of the slit light is changed (S10: Y), the control unit 100 controls the slit light generation unit 11 so that the slit on the predetermined irradiation surface is at the designated position. Change the light irradiation position. Thereby, the illumination position of the slit light in the eye E is changed.

  When the change of the illumination position of the slit light is accompanied by the change of the illumination angle of the slit light as described above, the control unit 100 determines the illumination angle of the slit light accompanying the change of the illumination position of the slit light. It is possible to control the optical scanner 12 so as to cancel the changed portion. The operation of the slit lamp microscope 1 proceeds to S20.

(S12)
When it is determined in S10 that the illumination position of the slit light is not changed (S10: N), the control unit 100 determines whether or not to change the illumination angle of the slit light. For example, the change of the illumination angle of the slit light is instructed by the user using the operation unit 50. The control unit 100 can determine whether or not to change the illumination angle of the slit light based on the user's operation content on the operation unit 50. When it is determined that the illumination angle of the slit light is to be changed (S12: Y), the operation of the slit lamp microscope 1 proceeds to S13. When it is determined not to change the illumination angle of the slit lamp (S12: N), the operation of the slit lamp microscope 1 proceeds to S14.

(S13)
When it is determined that the illumination angle of the slit light is changed in S12 (S12: Y), the control unit 100 changes the illumination angle of the slit light in the eye E by controlling the optical scanner 12. The operation of the slit lamp microscope 1 proceeds to S20.

(S14)
When it determines with not changing the illumination angle of slit light in S12 (S12: N), the control part 100 determines whether an observation direction is changed. For example, the change of the observation direction is instructed by the user using the operation unit 50. The control unit 100 can determine whether or not to change the observation direction based on the user's operation content on the operation unit 50. When it is determined that the observation direction is changed (S14: Y), the operation of the slit lamp microscope 1 proceeds to S15. When it is determined that the observation direction is not changed (S14: N), the operation of the slit lamp microscope 1 proceeds to S16.

(S15)
When it is determined in S14 that the observation direction is changed (S14: Y), the control unit 100 controls the display position of the fixation index on the LCD 31 of the fixation system 30 to project the fixation index on the fundus oculi Ef of the eye E to be examined. Change the position. Thereby, fixation guidance is performed and the observation direction is changed. The operation of the slit lamp microscope 1 proceeds to S20.

(S16)
When it is determined in S14 that the observation direction is not changed (S14: N), the control unit 100 determines whether or not to change the light amount of the slit light (illumination light amount). For example, a change in the amount of slit light is instructed by the user using the operation unit 50. The control unit 100 can determine whether or not to change the amount of the slit light based on the user's operation content on the operation unit 50. When it is determined to change the amount of slit light (S16: Y), the operation of the slit lamp microscope 1 proceeds to S17. When it is determined not to change the amount of the slit light (S16: N), the operation of the slit lamp microscope 1 proceeds to S18.

(S17)
When it is determined in S16 that the amount of slit light is to be changed (S16: Y), the control unit 100 controls the slit light generation unit 11 to change the amount of slit light. For example, when the slit light generation unit 11 includes a projector, the control unit 100 changes the on / off duty ratio of the light source with respect to the light source of the projector. The operation of the slit lamp microscope 1 proceeds to S20.

(S18)
When it is determined in S16 that the amount of the slit light is not changed (S16: N), the control unit 100 determines whether or not to change the shape of the slit light. For example, the change of the shape of the slit light is instructed by the user using the operation unit 50. The control unit 100 can determine whether or not to change the shape of the slit light based on the user's operation content on the operation unit 50. When it is determined that the shape of the slit light is to be changed (S18: Y), the operation of the slit lamp microscope 1 proceeds to S19. When it is determined not to change the shape of the slit light (S18: N), the operation of the slit lamp microscope 1 proceeds to S20.

(S19)
When it is determined in S18 that the shape of the slit light is to be changed (S18: Y), the control unit 100 changes the illumination pattern and controls the slit light generation unit 11 based on the changed illumination pattern. Change the shape of the slit light. The illumination pattern is designated by the user using the operation unit 50, for example. The operation of the slit lamp microscope 1 proceeds to S20.

(S20)
The control unit 100 determines whether or not to finish changing the shooting conditions. For example, the end of changing the photographing condition is instructed by the user using the operation unit 50. The control unit 100 can determine whether or not to end the change of the imaging condition based on the user operation content on the operation unit 50. When it is determined that the change of the imaging condition is not finished (S20: N), the operation of the slit lamp microscope 1 proceeds to S10. When it is determined that the change of the imaging condition is to be ended (S20: Y), the operation of the slit lamp microscope 1 proceeds to S7 in FIG.

[Action / Effect]
The operation and effect of the slit lamp microscope according to the embodiment will be described.

  The slit lamp microscope (for example, the slit lamp microscope 1) according to the embodiment includes an illumination system (for example, the illumination system 10) and an imaging system (for example, the imaging system 20). The illumination system includes a slit light generation unit (for example, a slit light generation unit 11). The slit light generation unit generates slit light. The illumination system can change the illumination position of the eye to be examined (for example, eye E to be examined) by the slit light. The imaging system guides the return light of the slit light from the eye to be examined to the imaging device (for example, the imaging device 21).

  According to such a configuration, it is possible to change at least the illumination position of the slit light by controlling only the illumination system without changing the positional relationship between the eye to be examined and the illumination system. Accordingly, it is possible to provide a new technique for the slit lamp microscope while simplifying the apparatus and reducing the size of the apparatus.

  The slit light generation unit may be disposed at a position that is optically substantially conjugate with the illumination position.

  According to such a configuration, even if the illumination position of the slit light is changed by the slit light generation unit, the slit lamp generation unit and the illumination position are in a conjugate relationship. It becomes possible to change the accuracy and efficiently illuminate the eye to be examined with slit light.

  The slit light generation unit may include a projector that can output light having a preset pattern.

  According to such a configuration, the illumination position of the slit light can be changed with high accuracy and simply.

  The illumination system may include an optical scanner (for example, the optical scanner 12) that deflects the slit light in one dimension or two dimensions.

  According to such a configuration, the illumination angle of the slit light in the eye to be examined can be changed by the optical scanner. Thereby, while maintaining the function of observing the illumination position of various slit lights from various observation directions, the rotation mechanism of the illumination system is unnecessary, and the apparatus can be miniaturized.

  The optical scanner may be disposed at a position that is optically conjugate with the illumination position.

  According to such a configuration, even if the slit light is deflected by the optical scanner, since the optical scanner and the illumination position are in a conjugate relationship, the illumination angle in the eye to be examined can be changed with high accuracy and efficiently reduced. It becomes possible to illuminate the eye to be examined with gap light.

  The slit lamp microscope according to the embodiment includes an objective lens (for example, the objective lens 40) arranged in the path of the slit light, and illuminates the eye to be examined with the slit light through the objective lens. The return light may be guided to the imaging device via the lens.

  According to such a configuration, at least the illumination system becomes an infinite system, and optical design can be facilitated.

  In addition, the slit lamp microscope according to the embodiment includes a fixation system (for example, fixation system 30) for projecting the fixation target onto the eye to be examined, and projects the fixation target onto the eye to be examined via the objective lens. May be.

  According to such a configuration, since the position of the objective lens is fixed with respect to the eye to be examined by maintaining the positional relationship between the eye to be examined and the illumination system, internal fixation is possible, and the configuration of the apparatus is simplified. Is possible.

  Moreover, the slit lamp microscope according to the embodiment may include a first optical path coupling member (for example, the first optical path coupling member 14) that couples the optical path of the fixation system to the optical path of the illumination system.

  According to such a configuration, since the optical path of the fixation system is coupled to the optical path of the illumination system, the apparatus can be reduced in size.

  The slit lamp microscope according to the embodiment may include a second optical path coupling member (for example, the second optical path coupling member 15) that couples the optical path of the imaging system to the optical path of the illumination system.

  According to such a configuration, since the optical path of the photographing system is coupled to the optical path of the illumination system, the apparatus can be reduced in size.

(Modification)
The embodiment described above is merely an example for carrying out the present invention. A person who intends to implement the present invention can make arbitrary modifications, omissions, additions and the like within the scope of the present invention.

  In the above embodiment, the case where the position of the illumination system 10 is fixed with respect to the eye E has been described, but the embodiment according to the present invention is not limited to this. For example, the illumination system 10 may be configured to be rotatable with respect to the eye E. In this case, the illumination system 10 may be configured to be rotatable about the rotation axis of the imaging system 20.

  Although the slit lamp microscope has been described in the above embodiment, an apparatus to which the present invention can be applied is not limited to this. For example, an apparatus having any function that can be used in the ophthalmic field, such as an axial length measurement function, an intraocular pressure measurement function, a fundus imaging function, an optical coherence tomography (OCT) function, and an ultrasonic examination function, is a function of the present invention. It is possible to comprise. The axial length measurement function is realized by an optical coherence tomometer or the like. The axial length measurement function projects light onto the eye to be examined and detects return light from the fundus while adjusting the position of the optical system in the Z direction (front-rear direction) with respect to the eye to be examined. Alternatively, the axial length of the eye may be measured. The intraocular pressure measurement function is realized by a tonometer or the like. The fundus photographing function is realized by a fundus camera, a scanning ophthalmoscope (SLO), or the like. The OCT function is realized by an optical coherence tomograph or the like. The ultrasonic inspection function is realized by an ultrasonic diagnostic apparatus or the like. In addition, the present invention can be applied to an apparatus (multifunction machine) having two or more of such functions.

1 slit lamp microscope 10 illumination system 11 slit light generation unit 11a, 13 collimating lens 11b condenser lens 12 optical scanner 14 first optical path coupling member 15 second optical path coupling member 20 imaging system 21 imaging device 21A imaging element 30 fixation Series 31 LCD
40 objective lens 50 operation unit 60 display unit 100 control unit 110 storage unit E eye Ef fundus M observation surface

Claims (9)

An illumination system comprising a slit light generating unit for generating slit light, and capable of changing the illumination position of the eye to be examined by the slit light;
An imaging system that guides the return light of the slit light from the eye to the imaging device;
Including slit lamp microscope.   The slit lamp microscope according to claim 1, wherein the slit light generation unit is arranged at a position optically conjugate with the illumination position.   The slit lamp microscope according to claim 1, wherein the slit light generation unit includes a projector capable of outputting a preset pattern of light.   The slit lamp microscope according to any one of claims 1 to 3, wherein the illumination system includes an optical scanner that deflects the slit light in a one-dimensional or two-dimensional manner.   The slit lamp microscope according to claim 4, wherein the optical scanner is disposed at a position substantially optically conjugate with the illumination position. An objective lens disposed in the path of the slit light,
The said eye to be examined is illuminated with the slit light via the objective lens, and the return light is guided to the imaging device via the objective lens. The slit lamp microscope according to Item. A fixation system for projecting a fixation target on the eye to be examined;
The slit lamp microscope according to claim 6, wherein the fixation target is projected onto the eye to be examined through the objective lens.   The slit lamp microscope according to claim 7, further comprising a first optical path coupling member coupling the optical path of the fixation system to the optical path of the illumination system.   The slit lamp microscope according to any one of claims 1 to 8, further comprising a second optical path coupling member that couples the optical path of the photographing system to the optical path of the illumination system.

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