JP2016138985A - Color filter substrate with electrodes, display device using the same, and manufacturing method of these - Google Patents

Abstract

PROBLEM TO BE SOLVED: To form electrodes of a touch sensor on a color filter substrate having liquid crystal encapsulated therein while suppressing a deterioration in liquid crystal due to heating.SOLUTION: There is provided a color filter substrate with electrodes that includes a color filter layer, transparent substrate, curable resin layer, and electrode layer in this order, where the curable resin layer is formed by irradiating a photosensitive resin layer with light to be cured; the electrode layer is formed substantially of bulk metal or conductive metal oxide.SELECTED DRAWING: Figure 1

Description

  The present invention relates to an electrode-equipped color filter substrate, a display device using the same, and a method for manufacturing them. Preferably, the present invention relates to a color filter substrate with an electrode in which a touch sensor operating in a capacitive manner is integrated, a display device using the same, and a method for manufacturing the same.

  In recent years, transparent touch panels have been used as input devices on displays of various electronic devices. Examples of the touch panel system include a resistance film type and a capacitance type. In the resistive film type, the touch position is detected by contacting the upper and lower electrodes. In the capacitance type, the touch position is detected by a change in the surface capacitance when a fingertip or the like touches.

  A sensor for a capacitive touch panel is generally used as an out-cell structure that is manufactured as an electrode pattern on a resin substrate such as a PET film or a glass substrate and is arranged outside the display structure. (Patent Document 1)

  On the other hand, recently, an in-cell structure or an on-cell structure in which a touch sensor is incorporated into a display structure has begun to be adopted, and efforts have been made to make the display with a touch sensor thinner and lighter. (Patent Document 2, Patent Document 3)

JP 2007-178758 A Japanese Patent No. 4816668 Japanese Patent No. 4584342 JP-A-6-273936 Japanese Patent Laid-Open No. 10-98266 Japanese Patent Laid-Open No. 2003-122004 JP 48-89003 A JP 60-3625 A JP 63-27829 A

  However, it has been pointed out that the in-cell structure requires a touch sensor circuit to be incorporated in a TFT substrate which is a display display drive circuit, and has been accompanied by complicated design and process and associated deterioration of good product yield. In the case of the on-cell structure, particularly in the case of a liquid crystal display, the touch sensor is formed in the state of the cell in which the liquid crystal is sealed.

  In particular, in a color filter substrate with an electrode, it is required to further reduce the resistivity of the electrode layer. In addition, in the color filter substrate with electrodes, it is required to further reduce (thinner) the entire film thickness. Furthermore, it is preferable that various types of metal elements can be used for the electrode layer of the color filter substrate with electrodes depending on the application.

  The present invention provides an electrode-equipped color filter substrate that operates stably with high yield and is compatible with various display designs, a display device using the same, and a method of manufacturing the same. Preferably, the present invention is intended to solve the above-described problems of the prior art in manufacturing a display in which a touch sensor is integrated.

An example of means for solving the problems of the present invention includes a color filter layer, a transparent substrate, a cured resin layer, and an electrode layer in this order,
The cured resin layer is formed by irradiating and curing the photosensitive resin layer,
The cured resin layer and the electrode layer have substantially the same predetermined pattern in plan view,
It is a color filter substrate with an electrode in which the electrode layer is formed of a substantially bulk metal or conductive metal oxide.

  Here, the electrode layer is preferably formed of at least one selected from the group consisting of gold, silver, copper, aluminum, iron, titanium, molybdenum, indium, tin, niobium, and oxides thereof. .

  The electrode layer preferably has a resistivity of 0.01Ω / □ or more and 10Ω / □ or less.

  The cured resin layer and the electrode layer have substantially the same predetermined pattern in plan view, and are further provided with a further cured resin layer and a further electrode layer in the order, the further cured resin layer and The further electrode layer may have substantially the same further predetermined pattern, and the further predetermined pattern may intersect the predetermined pattern.

  The electrode layer may be a part of a component of a touch sensor that detects a touch position.

  Further, a blackening layer having an antireflection function or a blackening function may be formed on the upper surface of the electrode layer.

  A transparent insulating layer may be formed on the upper surface of the electrode layer.

  Another example of means for solving the problems of the present invention is a display device using the above-described color filter substrate with electrodes.

Still another example of means for solving the problems of the present invention is a step of preparing a laminate in which a color filter layer, a transparent substrate, a photosensitive resin layer, and an electrode precursor layer are laminated in this order,
Irradiating the photosensitive resin layer with light through a photomask from the electrode precursor layer side;
Conducting the conductive treatment of the electrode precursor layer;
A step of developing the photosensitive resin layer, wherein the electrode precursor layer contains metal nanoparticles, metal oxide nanoparticles, or metal complexes having a particle diameter of 100 nm or less, and manufacture of a color filter substrate with an electrode Is the method.

  Here, it is preferable that the conductive treatment is performed by light energy of the light irradiation, and the light irradiation step and the conductive treatment step are performed simultaneously.

  Alternatively, the conductive treatment may be performed by heat treatment or further light irradiation.

  The metal nanoparticles are preferably formed from at least one selected from the group consisting of gold, silver, copper, aluminum, iron, titanium, molybdenum, indium, tin, and niobium.

  The metal oxide nanoparticles are preferably formed of at least one oxide selected from the group consisting of gold, silver, copper, aluminum, iron, titanium, molybdenum, indium, tin, and niobium. .

  Moreover, it is preferable that the said metal complex is at least 1 sort (s) chosen from the group which consists of a gold complex, a silver complex, and a copper complex.

Still another example of means for solving the problems of the present invention is a method for manufacturing a display device, including the above-described method for manufacturing a color filter substrate with electrodes.
A TFT substrate is bonded in advance to the surface of the color filter layer opposite to the transparent substrate,
The display device manufacturing method further includes a step of forming an electrode layer by the conductive treatment and electrically connecting the electrode layer to a drive circuit of a touch sensor.

  According to the present invention, there are provided a color filter substrate with electrodes, which operates stably with high yield, and has versatility corresponding to various display designs, a display device using the same, and a manufacturing method thereof.

An example of the typical partial longitudinal cross-sectional view of the color filter substrate with an electrode of this invention is shown. An example of a schematic partial cross-sectional view showing a step of irradiating the photosensitive resin layer with light from the photomask side is shown. The other example of the typical fragmentary longitudinal cross-section of the color filter substrate with an electrode of this invention is shown. An example of the typical partial top view which shows the electrode shape of the color filter substrate with an electrode of this invention is shown. The another example of the typical partial top view which shows the electrode shape of the color filter substrate with an electrode of this invention is shown. An example of the typical partial longitudinal cross-sectional view of the display apparatus using the color filter substrate with an electrode of this invention is shown. The other example of the typical fragmentary longitudinal cross-section of the display apparatus using the color filter substrate with an electrode of this invention is shown. An example of the typical partial longitudinal cross-sectional view of the organic electroluminescent display using the color filter substrate with an electrode of this invention is shown.

  Hereinafter, embodiments for carrying out the present invention will be described with reference to the drawings. It should be noted that the present invention is not limited to the embodiments described below, and design changes and the like can be added based on the knowledge of those skilled in the art. For example, the present invention includes a configuration in which a further additional layer is provided between any two layers described below.

  FIG. 1 shows an example of a schematic partial longitudinal sectional view of a color filter substrate with electrodes of the present invention. The color filter substrate 10 with an electrode shown in FIG. 1 includes a color filter layer 11, a transparent substrate 12, a cured resin layer 13, and an electrode layer 14 in this order.

  As the transparent substrate 12, glass or a plastic film can be used. The transparent substrate 12 is not particularly limited as long as it has sufficient strength in the film forming step and the subsequent step, has excellent transparency, and has good surface smoothness. As the glass, alkali-free glass for display applications is preferably used, and as the plastic film, for example, polyethylene terephthalate film, polybutylene terephthalate film, polyethylene naphthalate film, polycarbonate film, polyethersulfone film, polysulfone film, polyarylate film, A cyclic polyolefin film, a polyimide film, etc. are mentioned. Further, since the transparent substrate 12 is typically used for a color filter of a display device, it needs to have high transparency, and a substrate having a total light transmittance of 85% or more is preferably used. The transparent substrate 12 may be subjected to corona treatment, low temperature plasma treatment, ion bombardment treatment, chemical treatment, etc. as pretreatment in order to improve adhesion with each layer.

  A color filter layer 11 is formed on one surface of the transparent substrate 12. The color filter layer 11 typically refers to a layer including at least a black matrix and colored layers of each color of red, green, and blue. The color filter layer 11 can be formed by applying a colored photosensitive ink by a method such as spin coating, spinless coating, and inkjet, and then exposing and baking. Further, a transparent electrode may be formed so as to cover the black matrix and the colored layer. The colored layer is made of, for example, an acrylic resin having a thickness of 0.5 to 3.0 μm in which pigments of various colors are dispersed. The black matrix is formed of, for example, an acrylic resin having a thickness of 0.5 to 3.0 μm in which a black pigment is dispersed or a metal film having a thickness of 10 to 200 nm. As the color filter layer, a yellow, cyan, magenta, or white (colorless) layer may be used. The transparent electrode is made of, for example, ITO having a thickness of 10 to 200 nm. Further, a transparent resin layer may be formed on the color filter layer 11 for the purpose of flattening and protection.

  A cured resin layer 13 is formed on the other surface of the transparent substrate 12. The cured resin layer 13 is a layer obtained by exposing and curing a photosensitive resin layer (also referred to as an unexposed photosensitive resin layer) 13x described later. The photosensitive resin layer 13x may be a negative photosensitive resin or a positive photosensitive resin. The negative photosensitive resin is generally composed of a resin material serving as a binder, a photopolymerizable material, and a material containing at least a photopolymerization initiator, but is not particularly limited. As the negative photosensitive resin, for example, the materials described in Patent Documents 4 to 6 can be used. The positive photosensitive resin is generally formed from a material containing an alkali-soluble resin material, a photoacid generating material, an acid-decomposable functional group-containing compound, etc., but is not particularly limited. As the positive photosensitive resin, for example, the materials described in Patent Documents 7 to 9 can be used.

  The photosensitive resin layer 13x is coated with the above materials by a known coating method such as a die coater, curtain flow coater, roll coater, reverse roll coater, gravure coater, knife coater, bar coater, spin coater, micro gravure coater, It can be formed by drying. The film thickness of the photosensitive resin layer 13x is preferably 0.1 μm or more and 25 μm or less, for example, 5 μm, but is not limited thereto. Since the photosensitive resin layer 13x has almost no change in film thickness before and after curing, the film thickness after curing will be described hereinafter. When the film thickness is 25 μm or less, high-definition pattern formation becomes easy, and when the film thickness is 0.1 μm or more, appearance distortion such as formation unevenness does not occur and sufficient adhesion with an adjacent layer is obtained. The effect of showing is obtained. The photosensitive resin layer 13x has a portion soluble in the developer and an insoluble portion by light irradiation through the photomask 15. A portion soluble in the developer of the photosensitive resin layer 13x is dissolved by development, and a pattern of the cured resin layer 13 composed of an insoluble portion can be formed. The developer can be appropriately selected depending on the type of the photosensitive resin layer 13x or its material, and can generally be an alkaline aqueous solution or an organic solvent.

  The electrode layer 14 is a layer formed by conducting a conductive treatment on the electrode precursor layer 14x. The electrode precursor layer 14x contains metal nanoparticles or metal oxide nanoparticles having a particle size of 100 nm or less, for example, a particle size of 60 nm. Here, the particle diameter is an average particle diameter (conforming to JIS Z 8825: 2013) measured by a laser diffraction method. Since the metal nanoparticles or metal oxide nanoparticles have a particle diameter of 100 nm or less, the resistance is sufficiently low as a color filter substrate. For example, the resistance is 0.01Ω / □ or more and 10Ω / □ or less, which is clearly different from the resistivity (100Ω / □ or more and 500Ω / □ or less) of conventional metal nanowires and carbon nanotubes. In the present application, the metal nanoparticles or metal oxide nanoparticles can be used as a transparent electrode layer having properties equivalent to those of a bulk metal by light firing or heat firing and exhibiting low resistance. An electrode layer in which metal nanoparticles, metal oxide nanoparticles, or a metal complex to be described later is formed by light firing or heat firing partially has gaps, but is substantially similar to a bulk metal. In addition, metal nanoparticles or metal oxide nanoparticles have the advantage of being superior in terms of light transmittance when formed in a mesh shape with a line width of 10 μm or less, compared to normal particles. The metal nanoparticles or metal oxide nanoparticles are preferably particles containing at least one element selected from the group consisting of gold, silver, copper, aluminum, iron, titanium, molybdenum, indium, tin, and niobium. . Specific examples of the metal nanoparticles or metal oxide nanoparticles include copper nanoparticles, silver nanoparticles, indium tin oxide nanoparticles, titanium nanoparticles, and the like.

  Alternatively, the electrode precursor layer 14x contains a metal complex. Examples of the metal complex include a gold complex, a silver complex, and a copper complex.

  The electrode precursor layer 14x has a light transmittance that allows the photosensitive resin layer 13x to be exposed through the electrode precursor layer 14x. According to the present invention, it is possible to produce a color filter substrate with electrodes having a transparent substrate, a cured resin layer, and an electrode layer in this order and having an extremely low resistance (for example, 0.01Ω / □ or more and 10Ω / □ or less). Usually, when the concentration of the particles is increased in the electrode precursor layer, the light transmittance is lost, so that exposure through the electrode precursor layer becomes difficult. On the other hand, if the concentration of the particles is lowered in the electrode precursor layer, it becomes difficult to form the electrode layer itself. When nanowires are aggregated, they form a network structure, but exhibit high resistance (for example, 150Ω / □). One finding by the present inventor is the case where metal nanoparticles, metal oxide nanoparticles or metal complexes are aggregated to such an extent that they have optical transparency (at first glance low concentration). In other words, it has been found that the conductive layer can function as an extremely low resistance electrode layer.

  As an electrode precursor layer material for forming the electrode precursor layer 14x, a dispersion ink or paste such as a metal of the metal nanoparticles, an oxide thereof, an ion thereof, or a complex thereof is used in an aqueous solution or an organic solvent. Those dissolved or dispersed can be used. The concentration (solid content concentration) of the metal nanoparticles or metal oxide nanoparticles in the electrode precursor layer material is 10 wt% or more and 90 wt% or less, for example 50 wt%, based on the electrode precursor layer material. The concentration (solid content concentration) of the metal nanoparticles or metal oxide nanoparticles in the electrode precursor layer material is appropriately selected according to the properties of the ink and the target film thickness. The electrode precursor layer material is applied by a known application method such as a die coater, curtain flow coater, roll coater, reverse roll coater, gravure coater, knife coater, bar coater, spin coater, micro gravure coater, and then dried or heated. Thus, the electrode precursor layer 14x can be formed. The film thickness of the electrode precursor layer 14x varies depending on the solid content concentration and the film thickness after firing, but is formed to be, for example, 500 nm or more and 10 μm or less. Since the film thickness of the electrode precursor layer 14x is 500 nm or more, it is easy to form a film, and since it is 10 μm or less, it is difficult to crack due to stress. Since the electrode precursor layer 14x is typically non-conductive at the time of coating formation, the electrode precursor layer 14x does not show metallic luster due to metal free electrons, and shows light transmission between ultraviolet and visible wavelengths. Thus, the effect that the photosensitive resin layer 13x is easily exposed through the electrode precursor layer 14x can be obtained. In addition, the film thickness of the electrode layer 14 is 100 nm or more and 300 nm or less, for example, 200 nm. When the film thickness of the electrode layer 14 is 100 nm or more, an effect that the film is easily formed is obtained, and when it is 300 nm or less, an effect that cracks hardly occur due to stress is obtained.

  The electrode layer 14 is formed by exposing and developing the photosensitive resin layer 13x to form a pattern, or at the same time as exposing the photosensitive resin layer 13x, and simultaneously firing the electrode precursor layer 14x to be conductive, for example. The firing method can be appropriately selected according to the material and properties of the electrode precursor layer 14x. A hot air oven, an IR heater, a hot plate, or the like can be used for the thermal firing, and a xenon flash lamp is generally used for the light firing. Moreover, you may provide electroconductivity by a chemical | medical solution process. When the photosensitive resin layer 13x is irradiated with light, since the light is irradiated through the electrode precursor layer 14x, the electrode precursor layer 14x is formed so as to transmit a certain amount of light in the sensitive wavelength region of the photosensitive resin layer 13x. good.

  In order to form the cured resin layer 13 and the electrode layer 14, for example, the photosensitive resin layer 13x and the electrode precursor layer 14x are formed on the transparent substrate 12 on which the color filter layer 11 is formed. In this case, the photosensitive resin layer 13x and the electrode precursor layer 14x are first formed on the surface of the transparent substrate 12 where the color filter layer 11 is not formed. The photosensitive resin layer 13x and the electrode precursor layer 14x may be formed in this order on the transparent substrate 12, or the electrode precursor layer 14x and the photosensitive resin layer 13x formed in this order on a support film substrate (not shown). After preparing and bonding this to the transparent substrate 12 using a laminator etc., you may form by peeling the said support film base material.

  When the electrode precursor layer 14x and the photosensitive resin layer 13x are formed on the support film substrate, for example, the electrode precursor layer 14x and the photosensitive resin layer 13x are formed on the surface of the transparent substrate 12 where the color filter layer 11 is not formed. Paste together. The support film substrate is not particularly limited as long as it is a film having good releasability. For example, releasability is imparted to a film substrate such as polyethylene, polypropylene, polyethylene terephthalate (PET), and polycarbonate (PC). For this purpose, a thin film made of a resin containing a silicone material or a fluorine material is preferably used. If there are irregularities on the surface of the support film substrate, the traces of the irregularities may be transferred to the photosensitive resin layer 13x after peeling, or problems such as defects in peeling of the support film substrate may occur, The surface is preferably smooth.

  Depending on the heat resistance, the cured resin layer 13 and the electrode layer 14 may be formed on a color filter substrate (a laminate of the color filter layer 11 and the transparent substrate 12) in advance and then a display may be manufactured. Then, it may be formed on the back surface of the color filter substrate (the surface on the transparent substrate 12 side of the laminate). When the latter process is used, it is possible to reduce the thickness by dissolving both the glass of the color filter substrate (transparent substrate 12) and the glass to be the TFT substrate in a cell display with a chemical solution such as hydrofluoric acid. The cured resin layer 13 and the electrode layer 14 may be formed in a display device in which the transparent substrate 12 on which the color filter layer 11 is formed is bonded to a TFT substrate to form a cell.

The photosensitive resin layer 13x and the electrode precursor layer 14x formed on the transparent substrate 12 are irradiated with light through the photomask 15 as indicated by an arrow P in FIG. The photomask 15 can be formed by a conventionally known method. FIG. 2 shows an example in which light irradiation through a photomask 15 is performed on a laminated body 10x in which a color filter layer 11, a transparent substrate 12, a photosensitive resin layer 13x, and an electrode precursor layer 14x are laminated in this order. Has been. Light irradiation is performed using a light source capable of irradiating a light wavelength sensitive to a photopolymerization initiator or a photoacid generating material of the photosensitive resin layer 13x, such as an ultrahigh pressure mercury lamp, a high pressure mercury lamp, a xenon lamp, or a metal halide lamp. Can be used. Energy of light irradiation, 1000 mJ / cm ² or more 8000 mJ / cm ² or less, such as 4000 mJ / cm ^2. When the energy of light irradiation is 1000 mJ / cm ² or more, an effect that the exposure of the photosensitive resin layer 13x and the electrical conductivity of the electrode precursor layer 14x by photo-baking are sufficiently promoted is obtained, and the energy is 8000 mJ / cm ² or less. If it exists, the effect that the influence of the oxidation of the electrode layer 14 electrically conductive and the heat | fever to a foundation | substrate can be suppressed is acquired. After light irradiation, a pattern in which the electrode precursor layer 14x or the electrode layer 14 is formed on the cured resin layer 13 can be produced by developing the dissolved portion of the cured resin layer 13 with a developer.

  After the pattern is formed, the electrode precursor layer 14x may be made conductive by light baking with xenon flash or the like, or heat baking with a hot-air oven, IR heater, or the like. Alternatively, when the photosensitive resin layer 13x and the electrode precursor layer 14x before patterning described above are irradiated with light through a photomask, a photosensitive resin layer 13x can be obtained by using a light irradiating apparatus such as xenon flash. The electrode precursor layer 14x may be used as the conductive electrode layer 4 by simultaneously performing the above exposure and photo-baking of the electrode precursor layer 14x. Typically, the cured resin layer 13 and the electrode layer 14 have substantially the same predetermined pattern in plan view, and the electrode layer 14 is formed on the convex portion of the pattern of the cured resin layer 13. . In this application, the cured resin layer and the electrode layer have substantially the same predetermined pattern in plan view that the cured resin layer and the electrode layer have substantially the same predetermined pattern with respect to the cross-sectional shape. Meaning, or the meaning that the surface shape of the predetermined pattern of the electrode layer is substantially the same as the surface shape of the predetermined pattern of the cured resin layer. Here, “substantially the same” means that differences caused by errors or the like at the time of layer or pattern formation are also included in the same way.

  FIG. 3 shows another example of a schematic partial longitudinal sectional view of the color filter substrate with an electrode of the present invention. In the following drawings, members that are the same as or similar to the members in FIG. 1 are given the same reference numerals, or added with reference numerals A, and description thereof is omitted. In the example shown in FIG. 3, after the cured resin layer 13 and the electrode layer 14 are formed on the transparent substrate 12, a further cured resin layer 23 and a further electrode layer 24 are formed. The formation method of the further cured resin layer 23 and the further electrode layer 24 can be performed similarly to the cured resin layer 13 and the electrode layer 14, respectively. In addition, the electrode formed on the color filter substrate 20 with an electrode shown in FIG. 3 is formed by pairing an electrode layer 14 formed in one direction with a further electrode layer 24 formed in a direction crossing the electrode layer 14. It can be used as an electrode of a capacitive touch sensor. In this case, the electrode layer 14 and the further electrode layer 24 can have a pseudo diamond pattern in plan view. The inside of the pseudo diamond pattern is composed of thin line-shaped electrodes, and a light-transmissive electrode pattern can be obtained by setting the thin line width to 5 μm or less.

  The electrode-attached color filter substrate 10 or 20 produced as described above may be a plurality of surfaces on a single glass substrate. In this case, it is possible to efficiently manufacture a plurality of pieces by cutting the color filter substrate with electrodes 10 or a state in which the color filter substrate 10 is bonded to the TFT substrate 30 into pieces. Examples of the singulation method include diamond cutter scribe processing, dicing processing, water jet processing, etching processing, and laser processing. After singulation, the wiring connected to the electrode layer 14 or 24 is connected to a driving IC or the like via an anisotropic conductive adhesive (ACF) and a printed circuit board (FPC), and operates as a capacitive touch panel Can be made. At this time, the FPC is thermocompression bonded to the wiring drawn from the electrode layer 14 or the electrode layer 24 via the ACF, and the FPC is connected to the drive IC of the touch sensor. The TFT substrate 30 is connected to the drive IC and the FPC and is connected to the drive circuit.

  When the electrode-attached color filter substrate 10 shown in FIG. 1 is used as a component of a display device, the electrode layer 14 is paired with an electrode (not shown) formed on another layer to form a capacitive touch sensor. Can be used. At this time, a plan view of the electrode layer 14 can use a pseudo-rectangular pattern as shown in FIG. By forming the pseudo rectangular pattern with the thin electrode layer 14 and setting the thin line width to, for example, 5 μm or less, it is possible to obtain an electrode pattern having light transmittance. The electrode layer 14 shown in FIG. 4 is connected to a drive circuit via a wiring portion extended from the end (not shown), and forms a capacitance with the electrodes formed in the other layers described above. Functions as a capacitive touch sensor. The electrodes formed on the other layers can be formed by appropriately selecting, for example, the inside of the TFT circuit on the TFT substrate, the inside of the color filter on the color filter substrate, the cover glass, or the polarizing plate.

  FIG. 5 shows another example of a schematic partial top view showing the electrode shape of the color filter substrate with electrodes of the present invention. The electrode layer 14A and the further electrode layer 24A shown in FIG. 5 are connected to a drive circuit via a wiring portion extended from the end portion, and function as a capacitive touch sensor.

  Examples of the display device having the color filter substrate with an electrode of the present invention include a liquid crystal display, an organic EL display, an electronic paper, a MEMS display, a reflective type or a transflective type liquid crystal display.

  As an example of a display device having a liquid crystal layer, one having a structure as shown in FIG. 6 or FIG. In the display device 100, a liquid crystal layer 40 is formed between the color filter substrate with electrode 10 and the TFT substrate 30, and in the display device 200, a liquid crystal layer is provided between the color filter substrate with electrode 20 and the TFT substrate 30. Layer 40 is formed. A polarizing plate 50 and a cover glass 70 are sequentially formed on the surface of the color filter substrate with electrode 20 opposite to the liquid crystal layer 40. A polarizing plate 50 and a backlight 60 are sequentially formed on the surface of the TFT substrate 30 opposite to the liquid crystal layer 40.

  A plurality of scanning lines are formed on the TFT substrate 30 at regular intervals. A plurality of signal lines are formed at regular intervals on the scanning lines. The scanning line and the signal line are arranged so as to intersect with each other via an insulating film. A thin film transistor (TFT) that is a switching element is disposed in the vicinity of the intersection of the scanning line and the signal line. A display signal is supplied from the signal line to the pixel electrode via the TFT. The pixel electrode is formed from a transparent conductive film such as ITO, for example. The display area of the liquid crystal display element is composed of a plurality of pixels. The display area is usually formed in a shape close to a rectangle. Further, a frame area provided so as to surround the display area is arranged in the display element.

  The liquid crystal layer 40 can be formed using a known material, and is sealed between the color filter substrate with electrode 10 or 20 and the TFT substrate 30. At this time, an alignment film is formed on the surface of the color filter substrate 10 or 20 of the electrode-attached color filter layer 11 or 20 and the TFT substrate 30 by a method such as flexographic printing, and after the rubbing process is performed, the liquid crystal layer 40 is sealed. Thus, the liquid crystal molecules can be arranged in a certain direction.

  The polarizing plates 50 arranged on both surfaces of the liquid crystal cell have absorption axes in directions almost orthogonal to each other. The lighting, gray scale, and extinguishing of each pixel are determined by the direction of linearly polarized light controlled by the liquid crystal.

  The backlight 60 is attached to the anti-visible (back) side polarizing plate 50 with an adhesive or the like. The backlight 60 irradiates the polarizing plate 50 with planar light. As the backlight 60, the thing of the general structure provided with the light source, the light-guide plate, the prism sheet etc. is used, for example.

  The cover glass 70 may be adhered to the four sides of the polarizing plate 50 on the viewing side or the four sides of the display housing with a double-sided tape or the like, or the entire surface including the display portion of the liquid crystal display is bonded using a transparent optical adhesive. Also good. The cover glass 70 is made of chemically strengthened glass or transparent resin. Thereby, the display device 100 or 200 is completed.

  When manufacturing the display devices 100 and 200, for example, a liquid crystal cell formed of the color filter substrate with electrode 10 or 20, the TFT substrate 30, and the liquid crystal layer 40 is sandwiched between the polarizing plate layers 50. Thereafter, the backlight 60 is disposed on the back surface and the cover glass 70 is disposed on the display surface, whereby a display device 100 or 200, that is, a capacitive touch sensor integrated liquid crystal display can be provided.

  An example of the structure of the organic EL display is shown in FIG. A white organic light emitting layer 80 is formed on the TFT substrate 30 on which TFTs are formed on glass. Thus, an organic EL light emitting element structure is formed by forming a transparent upper electrode layer. Thereafter, the electrode-attached color filter substrate 20 is bonded through a sealant having moisture absorption ability. In this way, the organic EL display 300 can be obtained by forming a layer that doubles as a capacitive touch sensor, a color filter, and sealing glass. The white organic light emitting layer 80 includes a hole transport layer, a hole injection layer, a light emitting layer, an electron injection layer, an electron transport layer, and the like, and can be formed using a known material.

[Example]
Hereinafter, the present invention will be described in detail by way of specific examples. The examples are for illustrative purposes and the invention is not limited to the examples.

<Example 1>
A display device corresponding to the display device 200 of FIG. 7 was produced.

Aluminosilicate glass was used as a transparent substrate, and a black photosensitive coloring composition was applied on one surface with a spin coater, and dried on a hot plate at 100 ° C. for 5 minutes to dry the coating film. Thereafter, exposure is performed through a photomask having a desired opening at 100 mJ / cm ² using a high-pressure mercury lamp as a light source, followed by shower development for 30 seconds with a 0.2% by mass aqueous sodium hydrogen carbonate solution. Carried out. After washing with water, heat treatment was performed at 230 ° C. for 30 minutes in a hot air circulation oven to form a black matrix pattern. Thereafter, except for changing the type of the photosensitive coloring composition, similarly, red, green and blue patterns are formed in sequence, a color filter layer is formed, and a color filter substrate including a transparent substrate and a color filter layer is formed. did.

  Subsequently, an orientation film was formed by printing on the surface of the TFT substrate on which the color filter layer and the TFT circuit of the color filter substrate were formed, and then baked at 230 ° C., followed by a rubbing treatment. Thereafter, the color filter substrate and the TFT substrate were bonded together with a sealing material, and a liquid crystal material was injected into the gap to form a liquid crystal layer.

  Next, a photosensitive resin layer and an electrode precursor layer were formed on the surface of the transparent substrate where the color filter layer was not formed. The photosensitive resin layer and the electrode precursor layer were formed by pasting together a support film substrate with a laminator. A PET film in which a silicone resin was formed to a thickness of about 200 nm was prepared as a support film substrate, and copper nanoparticles having an average particle diameter of 60 nm were applied to the silicone resin surface and dried to form a 150 nm thickness. The copper nanoparticles were applied by slit die coating using an alcohol-based dispersion ink having a solid content concentration of 50 wt% and dried at 120 ° C. Subsequently, a photosensitive resin material (manufactured by Tokyo Ohka Kogyo Co., Ltd.) was applied with a thickness of 5 μm. The obtained photosensitive resin material was bonded to a PET film as a cover film.

The surface of the transparent substrate on which the color filter layer is not formed is bonded to the copper nanoparticle and photosensitive resin material laminate previously formed on the support film substrate after the cover film is peeled off, and high pressure mercury is passed through a photomask. Light irradiation was performed at 4000 mJ / cm ² using a lamp, and the photosensitive resin layer in the light irradiated portion was cured. Subsequently, with 0.2% by weight aqueous sodium hydrogen carbonate solution, shower development is performed for 30 seconds, and after washing with water, heat treatment is performed at 120 ° C. for 30 minutes in a hot-air oven to make the copper nanoparticles conductive. It was formed as a certain electrode layer. At this time, the plan view of the electrode layer was formed in a diamond shape with a mesh structure as shown in FIG. 4, and the line width of the mesh structure was 4 μm and the distance between the lines was 250 μm.

  Subsequently, a further photosensitive resin layer and a further electrode precursor layer were formed in the same manner. The plan view of the electrode layer and the further electrode layer has a mesh structure as shown in FIG. 5, and is arranged at a distance of 120 μm so that the diamond shape of the further electrode layer does not overlap with the diamond shape of the electrode layer. . The line width and distance between lines of the mesh structure of the further electrode layer were the same as those of the electrode layer.

  Furthermore, using a flexible printed wiring board (FPC), the FPC terminal and the wiring connected to the electrode layer and the further electrode layer were electrically connected via the ACF to connect the touch sensor driving IC. In addition, the FPC and the liquid crystal driving IC were connected also at the end of the TFT substrate. Then, the polarizing plate was affixed on the upper surface of the further electrode layer of a color filter board | substrate with an electrode, and the lower surface of TFT base | substrate, respectively using the adhesive material. Furthermore, a backlight was attached to the polarizing plate on the anti-visible (back) side, and chemically strengthened glass was bonded as a cover glass on the visual side (upper) polarizing plate using an optical adhesive. As a result, a liquid crystal display integrated with a capacitive touch sensor was produced. The display was good and the touch sensor could be operated well.

  The color filter substrate with an electrode of the present invention can be used as a touch panel display in which a liquid crystal display or organic EL display using a color filter and a capacitive touch sensor are integrated, for example, a smartphone, a tablet, a notebook PC, etc. It can be used as a display and user interface.

10, 10A, 20, 20A ... Color filter substrate with electrode 11 ... Color filter layer 12, 12A ... Transparent substrate 13 ... Cured resin layer 13x ... Photosensitive resin layer (first photosensitive resin layer)
14, 14A ... electrode layer (first electrode layer)
14x ... electrode precursor layer (first electrode precursor layer)
15 ... Photomask 23 ... Further cured resin layer (second cured resin layer)
24, 24A ... Further electrode layer (second electrode layer)
30 ... TFT substrate 40 ... Liquid crystal layer 50 ... Polarizing plate 60 ... Backlight 70 ... Cover lens 80 ... White organic light emitting layer 100, 200 ... Display device 300 ... Organic EL display

Claims (15)

A color filter layer, a transparent substrate, a cured resin layer, and an electrode layer are provided in this order,
The cured resin layer is formed by irradiating and curing the photosensitive resin layer,
The cured resin layer and the electrode layer have substantially the same predetermined pattern in plan view,
A color filter substrate with an electrode, wherein the electrode layer is formed of a substantially bulk metal or conductive metal oxide.   The electrode layer is formed of at least one selected from the group consisting of gold, silver, copper, aluminum, iron, titanium, molybdenum, indium, tin, niobium, and oxides thereof. Color filter substrate with electrodes.   The color filter substrate with an electrode according to claim 1 or 2, wherein the electrode layer has a resistivity of 0.01Ω / □ or more and 10Ω / □ or less.   The cured resin layer and the electrode layer have substantially the same predetermined pattern in a plan view, and are further provided with a further cured resin layer and a further electrode layer in the order, the further cured resin layer and the further layer. 4. The electrode layer according to claim 1, wherein the further predetermined pattern is substantially the same and the further predetermined pattern intersects the predetermined pattern. 5. Color filter substrate with electrodes.   The color filter substrate with an electrode according to any one of claims 1 to 4, wherein the electrode layer is a part of a component of a touch sensor that detects a touch position.   The color filter substrate with an electrode according to any one of claims 1 to 5, wherein a blackening layer having an antireflection function or a blackening function is formed on an upper surface of the electrode layer.   The color filter substrate with an electrode according to any one of claims 1 to 6, wherein a transparent insulating layer is formed on an upper surface of the electrode layer.   The display apparatus using the color filter substrate with an electrode of any one of Claims 1-7. A step of preparing a laminate in which a color filter layer, a transparent substrate, a photosensitive resin layer, and an electrode precursor layer are laminated in this order;
Irradiating the photosensitive resin layer with light through a photomask from the electrode precursor layer side;
Conducting the conductive treatment of the electrode precursor layer;
A step of developing the photosensitive resin layer, wherein the electrode precursor layer contains metal nanoparticles, metal oxide nanoparticles, or metal complexes having a particle diameter of 100 nm or less, and manufacture of a color filter substrate with an electrode Method.   The method for producing a color filter substrate with an electrode according to claim 9, wherein the conductive treatment is performed by light energy of the light irradiation, and the light irradiation step and the conductive treatment step are performed simultaneously.   The method for manufacturing a color filter substrate with an electrode according to claim 9, wherein the conductive treatment is performed by heat treatment or further light irradiation.   The metal nanoparticles are formed of at least one selected from the group consisting of gold, silver, copper, aluminum, iron, titanium, molybdenum, indium, tin, and niobium. The production method according to item.   The metal oxide nanoparticles are formed of at least one oxide selected from the group consisting of gold, silver, copper, aluminum, iron, titanium, molybdenum, indium, tin, and niobium. 11. The production method according to any one of 11 above.   The manufacturing method according to any one of claims 9 to 11, wherein the metal complex is at least one selected from the group consisting of a gold complex, a silver complex, and a copper complex. A method for manufacturing a display device, comprising the method for manufacturing a color filter substrate with an electrode according to any one of claims 9 to 14,
A TFT substrate is bonded in advance to the surface of the color filter layer opposite to the transparent substrate,
A method for manufacturing a display device, further comprising forming an electrode layer by the step of conducting the conductive treatment and electrically connecting the electrode layer to a drive circuit of a touch sensor.

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