JP5500515B2 - Manufacturing method of color filter substrate with touch panel electrode - Google Patents

Manufacturing method of color filter substrate with touch panel electrode Download PDF

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JP5500515B2
JP5500515B2 JP2013087321A JP2013087321A JP5500515B2 JP 5500515 B2 JP5500515 B2 JP 5500515B2 JP 2013087321 A JP2013087321 A JP 2013087321A JP 2013087321 A JP2013087321 A JP 2013087321A JP 5500515 B2 JP5500515 B2 JP 5500515B2
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electrode
color filter
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淳一郎 田中
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本発明は、タッチパネル付き液晶表示装置に用いられるタッチパネル電極付カラーフィルタ基板の製造方法に関する。   The present invention relates to a method for manufacturing a color filter substrate with a touch panel electrode used in a liquid crystal display device with a touch panel.

近年、携帯電話機や携帯ゲーム機をはじめとする様々な電子機器の表示装置として、入力装置の機能を兼ね備えたタッチパネル付液晶表示装置が広く用いられている。このタッチパネル付液晶表示装置は、例えば、ガラス基板の一方面にタッチパネル電極層、他方面にカラーフィルタ層を有するタッチパネル電極付カラーフィルタ基板を用いて構成される場合がある。タッチパネル電極付カラーフィルタ基板は、例えば以下のような方法により作製される。   In recent years, a liquid crystal display device with a touch panel having a function of an input device has been widely used as a display device of various electronic devices such as a mobile phone and a portable game machine. This liquid crystal display device with a touch panel may be configured using, for example, a color filter substrate with a touch panel electrode having a touch panel electrode layer on one side of the glass substrate and a color filter layer on the other side. The color filter substrate with a touch panel electrode is produced, for example, by the following method.

図2は、タッチパネル電極付カラーフィルタ基板の従来の製造方法を示す断面図である。   FIG. 2 is a cross-sectional view showing a conventional method for manufacturing a color filter substrate with a touch panel electrode.

タッチパネル電極付カラーフィルタ基板101を製造するには、まず、(a)に示すように、ガラス基板102の一方面にタッチパネル電極層103を形成する。より詳細には、ガラス基板102上に透明電極131と、絶縁膜141と、透明電極132とを順に積層し、透明電極131及び透明電極132に接続される金属電極133を形成する。その後、透明電極132と金属電極133の一部とを覆うように、絶縁膜142を形成する。金属電極133の内、絶縁膜142に覆われていない部分は、制御装置(図示せず)と接続するためのものである。   In order to manufacture the color filter substrate 101 with a touch panel electrode, first, as shown in (a), the touch panel electrode layer 103 is formed on one surface of the glass substrate 102. More specifically, the transparent electrode 131, the insulating film 141, and the transparent electrode 132 are sequentially stacked on the glass substrate 102 to form the transparent electrode 131 and the metal electrode 133 connected to the transparent electrode 132. Thereafter, an insulating film 142 is formed so as to cover the transparent electrode 132 and a part of the metal electrode 133. A portion of the metal electrode 133 that is not covered with the insulating film 142 is for connection to a control device (not shown).

次に、(b)に示すように、タッチパネル電極層103の全体を覆うように、保護膜106を形成する。この保護膜106は、カラーフィルタ層105の形成時に、タッチパネル電極103の損傷を防止するためのものである。   Next, as shown in (b), a protective film 106 is formed so as to cover the entire touch panel electrode layer 103. This protective film 106 is for preventing damage to the touch panel electrode 103 when the color filter layer 105 is formed.

次に、(c)に示すように、ガラス基板102の他方面にカラーフィルタ層105を形成する。図の例に係るカラーフィルタ層105は、例えば、着色層151と、ブラックマトリクス152と、透明電極153とを含む。   Next, as shown in (c), a color filter layer 105 is formed on the other surface of the glass substrate 102. The color filter layer 105 according to the illustrated example includes, for example, a colored layer 151, a black matrix 152, and a transparent electrode 153.

最後に、保護膜106の全てを剥離して除去すると、(d)に示すタッチパネル電極付カラーフィルタ101が形成される。   Finally, when all of the protective film 106 is peeled and removed, the color filter 101 with a touch panel electrode shown in FIG.

特開2008−9750号公報JP 2008-9750 A

上述した従来の製造方法では、保護膜の形成及び剥離工程が不可欠である。しかしながら、保護膜自体はタッチパネル付カラーフィルタ基板にとって必要なものではないため、保護膜の形成及び剥離工程を行うことは、製造コストの増大を招くという問題があった。   In the conventional manufacturing method described above, a protective film formation and peeling step are indispensable. However, since the protective film itself is not necessary for the color filter substrate with a touch panel, there is a problem that the formation of the protective film and the peeling process increase the manufacturing cost.

それ故に、本発明は、効率的にタッチパネル電極付カラーフィルタ基板を得ることができる製造方法を提供することを目的とする。   Therefore, an object of the present invention is to provide a manufacturing method capable of efficiently obtaining a color filter substrate with a touch panel electrode.

本発明は、基板の一方面上に、1層以上の透明電極と、透明電極に接続され、透明電極の形成領域の周辺部分に配置される電極と、最上層の透明電極を覆う少なくとも1層の透明絶縁膜とが積層されたタッチパネル電極層を有すると共に、基板の他方面上にカラーフィルタ層を有するタッチパネル電極付カラーフィルタ基板の製造方法に関する。タッチパネル電極付カラーフィルタ基板は、基板の一方面上に、透明電極と透明電極の形成領域の周辺部分に配置される電極とを形成し、最上層の透明電極と透明電極の形成領域の周辺部分に配置される電極との表面全体を覆うように透明絶縁膜を形成し、基板の他方面上にカラーフィルタ層を形成し、カラーフィルタの形成後に、透明電極の形成領域の周辺部分に配置される電極を覆う透明絶縁膜の少なくとも一部を選択的に除去することで製造される。   The present invention provides at least one layer covering one or more transparent electrodes on one surface of a substrate, an electrode connected to the transparent electrode and disposed in a peripheral portion of the transparent electrode forming region, and an uppermost transparent electrode. The present invention relates to a method of manufacturing a color filter substrate with a touch panel electrode having a touch panel electrode layer laminated with a transparent insulating film and having a color filter layer on the other surface of the substrate. The color filter substrate with a touch panel electrode is formed on one surface of the substrate with a transparent electrode and an electrode disposed in a peripheral portion of the transparent electrode forming region, and a peripheral portion of the uppermost transparent electrode and the transparent electrode forming region. A transparent insulating film is formed so as to cover the entire surface of the electrode disposed on the substrate, a color filter layer is formed on the other surface of the substrate, and after the color filter is formed, the transparent electrode is disposed in the peripheral portion of the transparent electrode formation region. It is manufactured by selectively removing at least a part of the transparent insulating film covering the electrode.

本発明のタッチパネル電極付カラーフィルタ基板の製造方法を用いれば、保護膜形成及び剥離といった余分な工程を経ることなく、タッチパネル電極付カラーフィルタ基板を作製することができる。これにより、製造コストの低減が実現される。   If the manufacturing method of the color filter substrate with a touch-panel electrode of this invention is used, a color filter substrate with a touch-panel electrode can be produced, without passing through extra processes, such as protective film formation and peeling. Thereby, reduction of manufacturing cost is realized.

本発明の実施形態に係るタッチパネル電極付カラーフィルタ基板の製造方法を示す断面図Sectional drawing which shows the manufacturing method of the color filter substrate with a touch-panel electrode which concerns on embodiment of this invention. タッチパネル電極付カラーフィルタ基板の従来の製造方法を示す断面図Sectional drawing which shows the conventional manufacturing method of the color filter substrate with a touch panel electrode

図1は、本発明の実施形態に係るタッチパネル電極付カラーフィルタ基板の製造方法を示す断面図である。   FIG. 1 is a cross-sectional view illustrating a method for manufacturing a color filter substrate with a touch panel electrode according to an embodiment of the present invention.

まず、ガラス基板の一方面にタッチパネル電極層を形成する。より詳細には、(a)に示すように、ガラス基板2の一方面に、1層目の第1透明電極31と、2層目の第1絶縁膜41と、3層目の第2透明電極32とを順に積層する。また、第1透明電極31及び第2透明電極32に接続される金属電極33を形成する。金属電極33は、ガラス基板2上の第1透明電極31及び第2透明電極32の形成領域の周辺部分に配置される。第1透明電極31及び第2透明電極32は、例えば厚み100〜2000ÅのITO(Indium Tin Oxide)よりなる。第1絶縁膜41は、例えば厚み0.5〜5.0μmの透明アクリル樹脂よりなる。金属電極33は、例えば銀合金やモリブデンとアルミニウムの積層体(Mo/Al/Mo)により形成される。   First, a touch panel electrode layer is formed on one surface of a glass substrate. More specifically, as shown in (a), the first transparent electrode 31 of the first layer, the first insulating film 41 of the second layer, and the second transparent of the third layer are formed on one surface of the glass substrate 2. The electrode 32 is laminated in order. Further, the metal electrode 33 connected to the first transparent electrode 31 and the second transparent electrode 32 is formed. The metal electrode 33 is disposed in the peripheral portion of the formation region of the first transparent electrode 31 and the second transparent electrode 32 on the glass substrate 2. The first transparent electrode 31 and the second transparent electrode 32 are made of, for example, ITO (Indium Tin Oxide) having a thickness of 100 to 2000 mm. The first insulating film 41 is made of, for example, a transparent acrylic resin having a thickness of 0.5 to 5.0 μm. The metal electrode 33 is formed of, for example, a silver alloy or a laminate of molybdenum and aluminum (Mo / Al / Mo).

次に、(b)に示すように、最上層の第2透明電極32と、金属電極33との表面全体を覆うように、第2絶縁膜42を形成する。第2絶縁膜42は、例えば厚み0.5〜5.0μmの透明アクリル系樹脂により形成される。   Next, as shown in (b), the second insulating film 42 is formed so as to cover the entire surface of the uppermost second transparent electrode 32 and the metal electrode 33. The second insulating film 42 is formed of, for example, a transparent acrylic resin having a thickness of 0.5 to 5.0 μm.

次に、(c)に示すように、ガラス基板2の他方面上に、カラーフィルタ層5を形成する。カラーフィルタ層5は、ブラックマトリクス52と、赤、緑及び青色の各色の着色層51とを含む層をいう。図1の例では、更にブラックマトリクス52及び着色層51を覆うように透明電極53が形成されている。着色層51は、例えば各色の顔料を分散させた厚み0.5〜3.0μmのアクリル系樹脂よりなる。ブラックマトリクスは、例えば黒色顔料を分散させた厚み0.5〜3.0μmのアクリル系樹脂や、厚み100〜2000Åの金属膜により形成される。透明電極は、例えば厚み100〜2000ÅのITOよりなる。カラーフィルタ層5の形成時においては、第2透明電極32を絶縁するための第2絶縁膜42が、金属電極33の保護膜としても機能するため、金属電極33の損傷が防止される。   Next, as shown in (c), the color filter layer 5 is formed on the other surface of the glass substrate 2. The color filter layer 5 is a layer including a black matrix 52 and colored layers 51 of red, green, and blue colors. In the example of FIG. 1, a transparent electrode 53 is further formed so as to cover the black matrix 52 and the colored layer 51. The colored layer 51 is made of, for example, an acrylic resin having a thickness of 0.5 to 3.0 μm in which pigments of various colors are dispersed. The black matrix is formed of, for example, an acrylic resin having a thickness of 0.5 to 3.0 μm in which a black pigment is dispersed or a metal film having a thickness of 100 to 2000 mm. The transparent electrode is made of, for example, ITO having a thickness of 100 to 2000 mm. When the color filter layer 5 is formed, the second insulating film 42 for insulating the second transparent electrode 32 also functions as a protective film for the metal electrode 33, so that the metal electrode 33 is prevented from being damaged.

最後に、(d)に示すように、第2透明絶縁膜42のうち、金属電極33を覆う少なくとも一部を選択的に除去する。この第2透明絶縁膜42の部分的除去は、例えば、266nm、355nm、532nmのいずれかの短波長レーザー、またはこれらのいくつかを組み合わせたレーザーを照射することによって行うことができる。但し、これらに限らず、第2絶縁膜42の種類に応じて最適な波長を選択すれば良い。第2絶縁膜42が剥離された部分の金属電極33は、図示しない制御装置に接続するためのものである。   Finally, as shown in (d), at least part of the second transparent insulating film 42 covering the metal electrode 33 is selectively removed. The partial removal of the second transparent insulating film 42 can be performed by irradiating, for example, a short wavelength laser of 266 nm, 355 nm, or 532 nm, or a combination of these. However, the present invention is not limited thereto, and an optimal wavelength may be selected according to the type of the second insulating film 42. The portion of the metal electrode 33 from which the second insulating film 42 has been peeled is for connection to a control device (not shown).

以上のように、カラーフィルタ層5を形成する間に、タッチパネル電極層3の構成部材である第2透明絶縁膜42で金属電極33を覆っておくことによって、別途保護膜を形成することなく、タッチパネル電極付カラーフィルタ基板1を形成することが可能となる。これにより、設備投資、材料費、光熱費及び労務費が削減される。また、保護膜の形成及び剥離工程で発生するロスを低減して、歩留まりを向上させることができる。この結果、製造コストの低減が実現される。   As described above, by covering the metal electrode 33 with the second transparent insulating film 42 that is a constituent member of the touch panel electrode layer 3 while forming the color filter layer 5, without forming a protective film separately, It becomes possible to form the color filter substrate 1 with a touch panel electrode. This reduces capital investment, material costs, utility costs, and labor costs. In addition, it is possible to reduce the loss generated in the formation and peeling process of the protective film and improve the yield. As a result, a reduction in manufacturing cost is realized.

尚、本実施形態では、ストライプ状の第1透明電極31(1層目)と、ストライプ状の第2透明電極32(3層目)とが第1透明絶縁膜41を挟んで交差するように形成されているが、必ずしもこのように2層に分けて透明電極を形成する必要はなく、透明電極の層数や形状は任意で良い。例えば、複数の透明電極を同一層に配列し、ジャンパ配線等で所定方向に整列する透明電極を接続した構成でも本発明を適用することができる。この場合でも、カラーフィルタ層の形成時に、最上層に位置する透明電極を覆う透明絶縁膜で金属電極を保護することにより、効率的にタッチパネル電極付カラーフィルタ基板を作製できる。   In the present embodiment, the stripe-shaped first transparent electrode 31 (first layer) and the stripe-shaped second transparent electrode 32 (third layer) cross each other with the first transparent insulating film 41 interposed therebetween. Although it is formed, it is not always necessary to divide the transparent electrode into two layers in this way, and the number and shape of the transparent electrode may be arbitrary. For example, the present invention can be applied to a configuration in which a plurality of transparent electrodes are arranged in the same layer and transparent electrodes aligned in a predetermined direction by jumper wirings or the like are connected. Even in this case, when the color filter layer is formed, the color filter substrate with a touch panel electrode can be efficiently produced by protecting the metal electrode with the transparent insulating film covering the transparent electrode located in the uppermost layer.

また、本実施形態では、図示の都合上、第2絶縁膜をガラス基板の端まで形成しているが、第2絶縁膜が最上層の透明電極と金属電極の全体を覆っていれば、その形成範囲は任意で良い。   In the present embodiment, for convenience of illustration, the second insulating film is formed up to the end of the glass substrate. However, if the second insulating film covers the entire uppermost transparent electrode and metal electrode, The formation range may be arbitrary.

更に、本実施形態では、第2透明絶縁膜の除去は、レーザーを照射することで行っているが、これ以外でも、必要な工程数を大幅に増加することなく、第2透明絶縁膜を選択的に除去できるものであれば、例えば研磨等の様々な手法を採用できる。   Furthermore, in this embodiment, the removal of the second transparent insulating film is performed by irradiating a laser. However, other than this, the second transparent insulating film can be selected without significantly increasing the number of necessary steps. For example, various techniques such as polishing can be adopted as long as they can be removed.

本発明は、例えばタッチパネル付き液晶表示装置等における、カラーフィルタ基板の製造方法として用いることができる。   The present invention can be used as a method for producing a color filter substrate in, for example, a liquid crystal display device with a touch panel.

1 タッチパネル電極付カラーフィルタ基板
2 ガラス基板
3 タッチパネル電極層
5 カラーフィルタ層
31 第1透明電極
32 第2透明電極
33 金属電極
41 第1透明絶縁膜
42 第2透明絶縁膜
51 着色層
52 ブラックマトリクス
53 透明電極
DESCRIPTION OF SYMBOLS 1 Color filter substrate with a touch panel electrode 2 Glass substrate 3 Touch panel electrode layer 5 Color filter layer 31 1st transparent electrode 32 2nd transparent electrode 33 Metal electrode 41 1st transparent insulating film 42 2nd transparent insulating film 51 Colored layer 52 Black matrix 53 Transparent electrode

Claims (4)

基板の一方面上に、1層以上の透明電極と、前記透明電極に接続され、前記透明電極の形成領域の周辺部分に配置される電極と、最上層の前記透明電極を覆う少なくとも1層の透明絶縁膜とが積層されたタッチパネル電極層を有すると共に、前記基板の他方面上にカラーフィルタ層を有するタッチパネル電極付カラーフィルタ基板の製造方法であって、
前記基板の一方面上に、前記透明電極と前記透明電極の形成領域の周辺部分に配置される電極とを形成し、
最上層の前記透明電極と前記透明電極の形成領域の周辺部分に配置される電極との表面全体を覆うように前記透明絶縁膜を形成し、
前記基板の前記他方面上に前記カラーフィルタ層を形成し、
前記カラーフィルタの形成後に、前記透明電極の形成領域の周辺部分に配置される電極を覆う前記透明絶縁膜の少なくとも一部を選択的に除去する、タッチパネル電極付カラーフィルタ基板の製造方法。
One or more layers of transparent electrodes on one surface of the substrate, electrodes connected to the transparent electrodes and disposed in a peripheral portion of the transparent electrode forming region, and at least one layer covering the uppermost transparent electrode A method for producing a color filter substrate with a touch panel electrode having a touch panel electrode layer laminated with a transparent insulating film and having a color filter layer on the other surface of the substrate,
On one surface of the substrate, the transparent electrode and an electrode disposed in a peripheral portion of the transparent electrode forming region are formed,
Forming the transparent insulating film so as to cover the entire surface of the transparent electrode of the uppermost layer and the electrode disposed in the peripheral part of the formation region of the transparent electrode;
Forming the color filter layer on the other surface of the substrate;
A method for manufacturing a color filter substrate with a touch panel electrode, wherein after the formation of the color filter, at least a part of the transparent insulating film covering an electrode disposed in a peripheral portion of the transparent electrode forming region is selectively removed.
前記基板がガラス基板であることを特徴とする、請求項1に記載のタッチパネル電極付カラーフィルタ基板の製造方法。   The method for manufacturing a color filter substrate with a touch panel electrode according to claim 1, wherein the substrate is a glass substrate. 前記透明電極の形成領域の周辺部分に配置される電極は、制御装置に接続するためのものであることを特徴とする、請求項1または2に記載のタッチパネル電極付カラーフィルタ基板の製造方法。   3. The method for manufacturing a color filter substrate with a touch panel electrode according to claim 1, wherein an electrode disposed in a peripheral portion of the transparent electrode forming region is for connection to a control device. 前記第2透明絶縁膜の除去は、レーザーを照射することにより行う、請求項1〜3のいずれかに記載のタッチパネル電極付カラーフィルタ基板の製造方法。   The method for producing a color filter substrate with a touch panel electrode according to claim 1, wherein the removal of the second transparent insulating film is performed by irradiating a laser.
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