JP2016087546A - Processing liquid supply device and cleaning method for the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To save an amount of cleaning fluid and shorten a cleaning time when cleaning a processing liquid supply device including processing liquid flow passages and nozzles.SOLUTION: Cleaning is performed by supplying cleaning fluid from a cleaning fluid tank 10 into intermediate tanks 22, 32 and 42, pressurizing the inside of the intermediate tanks 22, 32, and 42 by nitrogen gas so as to move the cleaning fluid to portions closer to nozzles 21, 31, and 41 through processing liquid flow passages 1 to 4, and moving the cleaning fluid to be returned to the cleaning fluid tank 10 via circulation passages 6, 61 to 63. The circulation passage 6 includes a cleaning filter section 64 and the cleaning fluid, from which foreign matter is removed by the filter section 64, is returned to the cleaning fluid tank 10 and is reused, thereby enabling saving of the amount of the cleaning fluid. Further, because the amount of the cleaning fluid is saved, cleaning processing can be performed by simultaneously supplying the cleaning fluid from the cleaning fluid tank 10 to a plurality of processing liquid flow passages 1 to 4. Therefore, the overall cleaning time is shortened.SELECTED DRAWING: Figure 1

Description

  The present invention relates to a technique for cleaning a processing liquid supply device that supplies a processing liquid from a processing liquid supply source to a target object via a processing liquid channel and a nozzle.

  A single wafer type liquid processing apparatus used in a semiconductor manufacturing process is configured, for example, to discharge a processing liquid from a nozzle onto the surface of a substrate held by a spin chuck. Liquid processing includes processing for applying a resist solution to a substrate to form a resist pattern, processing for supplying a developing solution to the substrate after exposure, or processing for applying a coating solution containing a silicon oxide film precursor to the substrate. Etc. A processing liquid supply apparatus used in such a liquid processing apparatus has a nozzle connected to a tip portion thereof, and a processing liquid tank connected to a base end side of a pipe provided with devices such as a valve, a filter section, and a pump in the middle. Connected to and configured.

If particles (foreign matter) are attached to a flow path including piping and equipment, the particles are supplied to the substrate together with the processing liquid. For this reason, for example, when the liquid processing apparatus is started up, a cleaning liquid supply source (cleaning liquid tank) such as thinner liquid is connected to the upstream side of the pipe, and the cleaning liquid is supplied from the upstream side of the flow path and discharged from the nozzle. Is being removed. The inner diameter of the pipe is as small as about 2 mm, for example. When a predetermined amount of cleaning liquid is passed through, the particles adhering to the inner wall of the flow path are peeled off by the flow of the cleaning liquid, and flows downstream along with the cleaning liquid. Is discharged through.

  Then, the particles in the cleaning liquid discharged from the nozzle are inspected, and the cleaning liquid continues to flow from the cleaning liquid supply source toward the nozzle until the particle becomes a set value or less. In the processing liquid supply apparatus that has performed the cleaning process in this way, a processing liquid supply source is connected instead of the cleaning liquid supply source, and the liquid processing apparatus performs liquid processing on an object to be processed, such as a semiconductor wafer (hereinafter referred to as “wafer”). Done.

By the way, the cleaning liquid discharged from the nozzle is discarded, but it is necessary to allow the cleaning liquid to flow through the flow path for a longer period of time in response to the demand for higher cleanliness of piping as the circuit becomes finer. The consumption of the cleaning liquid increases. Therefore, in view of cost and environment, the conventional method of discarding the cleaning liquid is not a good idea.
Further, in the method of causing a large amount of cleaning liquid to flow through the flow path, the number of flow paths that can simultaneously supply the cleaning liquid from the cleaning liquid supply source is limited due to the capacity of the cleaning liquid supply source. Therefore, when the number of nozzles of the liquid processing apparatus is large, it is necessary to clean a certain flow path and then perform cleaning by changing the cleaning liquid supply source to another flow path. It takes time and labor.

In Patent Document 1, a flow blocking means consisting of a three-way valve is provided on the upstream side and downstream side of piping parts such as a filter part and a pump to be cleaned in the pipe, respectively, and a cleaning pipe is connected to the three-way valve, A method is described in which a cleaning liquid is supplied to piping parts for cleaning. This method does not take into consideration the liquid saving of the cleaning liquid and the shortening of the cleaning time, and thus the problem of the present invention cannot be solved.

JP 2003-257924 A

The present invention has been made in such circumstances, and its purpose is to clean a processing liquid supply apparatus that supplies a processing liquid from a processing liquid supply source to a target object via a processing liquid flow path and a nozzle. Another object of the present invention is to provide a technique capable of reducing the amount of cleaning liquid and shortening the cleaning time.

Therefore, the processing liquid supply apparatus of the present invention is a processing liquid supply apparatus that supplies a processing liquid from a processing liquid supply source to a target object via a processing liquid channel and a nozzle.
A cleaning liquid supply source for supplying a cleaning liquid into the processing liquid flow path;
An operation of moving the cleaning liquid in the processing liquid flow path from the portion near the processing liquid supply source toward the portion near the nozzle, and then returning the cleaning liquid from the portion near the nozzle to the portion near the processing liquid supply source A liquid movement mechanism for performing
A cleaning filter for removing foreign matter, provided in a flow path through which the cleaning liquid moves;
A controller that supplies a cleaning liquid from the cleaning liquid supply source into the processing liquid flow path and outputs a control signal to perform the operation, and
The liquid moving mechanism includes a tank provided in a flow path through which the cleaning liquid moves, and a pressurizing mechanism that pressurizes a liquid surface in the tank and discharges the cleaning liquid from the tank.
A processing liquid supply apparatus according to another invention is a processing liquid supply apparatus for supplying a processing liquid from a processing liquid supply source to a target object via a processing liquid channel and a nozzle.
A cleaning liquid supply source for supplying a cleaning liquid into the processing liquid flow path;
One end is connected to the portion near the nozzle in the processing liquid flow path, and provided to bypass the processing liquid flow path from the one end to return the cleaning liquid to the portion near the processing liquid supply source in the processing liquid flow path. The circuit,
A liquid moving mechanism for circulating the cleaning liquid through the circulation path;
A cleaning filter for removing foreign matter, provided in a flow path through which the cleaning liquid moves;
A controller that supplies a cleaning liquid from the cleaning liquid supply source into the processing liquid flow path and outputs a control signal so that the liquid moving mechanism performs an operation for moving the cleaning liquid;
The liquid moving mechanism includes a cleaning liquid tank, a pressurizing mechanism that pressurizes the liquid surface in the cleaning liquid tank and discharges the cleaning liquid from the cleaning liquid tank, and an intermediate in which the cleaning liquid discharged from the cleaning liquid tank is sent through a flow path. The tank and the liquid level in the intermediate tank are pressurized, and the cleaning liquid is discharged from the intermediate tank to one end side of the circulation path through the processing liquid flow path, and from the one end side of the circulation path to the cleaning liquid tank. And a pressurizing mechanism for returning.

The cleaning method of the processing liquid supply apparatus of the present invention is a cleaning method of a processing liquid supply apparatus that supplies a processing liquid from a processing liquid supply source to a target object via a processing liquid channel and a nozzle.
The cleaning liquid is supplied into the processing liquid flow path, the cleaning liquid is moved from the part near the processing liquid supply source toward the part near the nozzle in the processing liquid flow path, and then the processing from the part near the nozzle A cleaning step of returning the cleaning liquid to a site near the liquid supply source and cleaning the processing liquid flow path;
The cleaning liquid used in the cleaning process includes a cleaning process in which the cleaning liquid is cleaned through a filter unit for removing foreign substances.

  According to the present invention, the cleaning liquid is moved from the portion near the processing liquid supply source toward the portion near the nozzle by the liquid movement mechanism in the processing liquid flow path, and then the portion near the processing liquid supply source from the portion near the nozzle. It is moved to return to the cleaning. A cleaning filter part is provided in the flow path through which the cleaning liquid moves, and the cleaning liquid from which foreign matters have been removed by the filter part is returned to the site near the processing supply source and reused, thereby reducing the amount of cleaning liquid. be able to. Further, since the amount of the cleaning liquid is reduced, the cleaning liquid can be simultaneously supplied to the plurality of processing liquid channels from the cleaning liquid supply source, so that the cleaning process can be performed in parallel in the plurality of processing liquid channels. Cleaning time is reduced.

1 is a configuration diagram of a processing liquid supply apparatus according to a first embodiment of the present invention. 1 is a configuration diagram of a processing liquid supply apparatus according to a first embodiment of the present invention. 1 is a configuration diagram of a processing liquid supply apparatus according to a first embodiment of the present invention. 1 is a configuration diagram of a processing liquid supply apparatus according to a first embodiment of the present invention. 1 is a configuration diagram of a processing liquid supply apparatus according to a first embodiment of the present invention. 1 is a configuration diagram of a processing liquid supply apparatus according to a first embodiment of the present invention. 1 is a configuration diagram of a processing liquid supply apparatus according to a first embodiment of the present invention. 1 is a configuration diagram of a processing liquid supply apparatus according to a first embodiment of the present invention. 1 is a configuration diagram of a processing liquid supply apparatus according to a first embodiment of the present invention. FIG. 5 is a configuration diagram of a modified example of the processing liquid supply apparatus according to the first embodiment of the present invention. It is a block diagram of the process liquid supply apparatus which concerns on the 2nd Embodiment of this invention. It is a block diagram of the process liquid supply apparatus which concerns on the 2nd Embodiment of this invention. It is a block diagram of the process liquid supply apparatus which concerns on the 2nd Embodiment of this invention. It is a block diagram of the process liquid supply apparatus which concerns on the 2nd Embodiment of this invention. It is a block diagram of the process liquid supply apparatus which concerns on the 2nd Embodiment of this invention. It is a block diagram of the process liquid supply apparatus which concerns on the 3rd Embodiment of this invention. It is a block diagram of the process liquid supply apparatus which concerns on the 3rd Embodiment of this invention. It is a block diagram of the process liquid supply apparatus which concerns on the 3rd Embodiment of this invention. It is a block diagram of the process liquid supply apparatus which concerns on the 3rd Embodiment of this invention. It is a block diagram of the process liquid supply apparatus which concerns on the 3rd Embodiment of this invention. It is a block diagram of the process liquid supply apparatus which concerns on the 3rd Embodiment of this invention. It is a block diagram which shows the other example of a pump flow path system. It is a block diagram which shows the other example of a pump flow path system. It is a block diagram which shows the other example of a pump flow path system.

(First embodiment)
FIGS. 1 and 2 show a processing liquid supply apparatus that forms part of the liquid processing apparatus according to the first embodiment of the present invention. In FIG. 1 and FIG. 2, reference numeral 10 denotes a cleaning liquid that stores the cleaning liquid. A tank (cleaning liquid supply source). As the cleaning liquid, for example, a thinner liquid that is a solvent of the resist liquid, a developer, hydrochloric acid, pure water, or the like is used, and the upstream end of the processing liquid flow path 1 is provided in the cleaning liquid tank 10. The cleaning liquid tank 10 is detachably provided in the processing liquid flow path 1 and is removed after the cleaning of the processing liquid flow path 1 is completed, and a processing liquid such as a resist liquid is provided at the upstream end of the processing liquid flow path 1. Is connected to a resist solution tank (processing solution supply source). The cleaning liquid tank 10 is connected to a supply source 50 of an inert gas such as nitrogen (N ₂ ) gas via a gas supply path 5 having a valve V5. The nitrogen gas supply source 50 and the gas supply path 5 constitute a pressurizing mechanism that pressurizes the liquid surface in the cleaning liquid tank 10 and discharges the cleaning liquid from the cleaning liquid tank 10. In addition, a nitrogen gas exhaust path 501 is connected to the gas supply path 5 between the nitrogen gas supply source 50 and the valve V5.

  As shown in FIG. 1, the processing liquid flow path 1 is branched into a plurality of, for example, three downstream from the connecting portion 60 of the circulation path 6 described later. These are referred to as a single flow path 2, a second flow path 3, and a third flow path 4. Nozzles 21, 31, and 41 are provided at the downstream ends of the first flow path 2, the second flow path 3, and the third flow path 4, respectively. These nozzles 21, 31, and 41 are for supplying a resist solution, which is the same type of processing liquid, to the wafer transferred to the liquid processing module 100 (see FIGS. 8 and 9). The liquid processing module 100 supplies the resist solution from the nozzles 21 (31, 41) to the wafer held rotatably around the vertical axis by the substrate holder 110, for example, and the resist solution is applied by the rotational centrifugal force. It is configured to advance to the wafer surface and form a coating film.

  The first flow path 2 is provided with a valve V21, a first intermediate tank 22, a pump flow path system 23, a dispense valve (liquid discharge valve) V22, and a valve V23 in this order from the upstream side, and the dispense valve V22. And one end of a circulation path 61 provided with a valve V61 is connected between the valve V23 and the valve V23. The dispense valve V22 has a function of discharging a preset amount of resist solution, and is a supply device for discharging a set amount of processing solution. Similarly, the second flow path 3 is provided with a valve V31, a second intermediate tank 32, a pump flow path system 33, a dispense valve V32, and a valve V33 in order from the upstream side, and between the dispense valve V32 and the valve V33. The one end side of the circulation path 62 provided with the valve V62 is connected to. In addition, the third flow path 4 is provided with a valve V41, a third intermediate tank 42, a pump flow path system 43, a dispense valve V42, and a valve V43 in order from the upstream side, and between the dispense valve V42 and the valve V43. Is connected to one end of a circulation path 63 having a valve V63.

  The circulation paths 61, 62, 63 merge at the downstream side of the valves V61, V62, V63. The merged circulation path 6 is provided with a filter portion 64, and the other end side of the circulation path 6 is connected to the processing liquid flow. The first to third flow paths 2 to 4 in the path 1 are connected to the upstream side of the junction point via the connection part 60. The circulation paths 6 and 61 to 63 return the cleaning liquid from the position near the nozzles 21, 31, and 41 in the processing liquid flow path (one end of the circulation path) to the position near the cleaning liquid tank 10 in the processing liquid flow path. Bypass the treatment liquid flow path. The filter unit 64 is a cleaning filter unit for removing particles having a size of, for example, 5 nm or more contained in the cleaning liquid, and includes a discharge path 641.

The circulation paths 6 and 61 to 63 are, for example, branched into two at one end side, and one branched path and the other branched path can be freely connected to and separated from the first flow path 2 (treatment liquid flow path). It is provided so that it can be attached to and detached from the divided ends, and the other end side is configured to be detachably connected to the processing liquid flow path 1 by the connecting portion 60. In other words, taking the first flow path 2 as an example, one end side of the circulation path 61 is provided with one branch path that is attached to and detached from a divided end made of, for example, a dispense valve V22, and the other branch path that includes the valve V23. ing. When the circulation path 61 is attached to the first flow path 2, one branch path is connected to the first flow path 2 via the dispense valve V22, and the other branch path is connected to the first flow path via the valve V23. Connect to the flow path 2, and connect the other end of the circulation path 6 to the connection portion 60. When the circulation paths 61 and 6 are removed, the nozzle 21 is attached to the dispense valve V22 via a pipe (see FIGS. 8 and 9). The same applies to the circulation paths 6, 62, and 63 provided in the second flow path 3 and the third flow path 4.

  The first to third intermediate tanks 22, 32, 42 are connected to a nitrogen gas supply source 50 through gas supply paths 51, 52, 53 having a valve V 51, V 52, V 53 and a common gas supply path 54, respectively. It is connected. The nitrogen gas supply source 50 and the gas supply path 54 pressurize the liquid surfaces in the intermediate tanks 22, 32, 42, respectively, and supply cleaning liquid from the intermediate tanks 22, 32, 42 to one end side of the circulation paths 61-63, 6. The pressure mechanism is configured to discharge the liquid toward the cleaning liquid tank 10 from one end side of the circulation paths 61 to 63 and 6. By supplying nitrogen gas to the first to third intermediate tanks 22, 32, and pressurizing in this way, the cleaning liquid in these tanks 22, 32, and 42 is respectively supplied to the first to third flow paths 2 to 4. It is comprised so that a liquid may be sent downstream.

Since the first to third intermediate tanks 22, 32, and 42 are configured in the same manner, the first intermediate tank 22 shown in FIG. 2 will be described as an example. The first intermediate tank 22 has a liquid level sensor 221 for detecting the upper limit level of the liquid level in the tank 22 and a lower limit level of the liquid level in the tank 22 in order to grasp the amount of the cleaning liquid in the tank 22. A liquid level sensor 222 for detection is provided. As will be described later, the cleaning liquid is supplied from the cleaning liquid tank 10 to the first intermediate tank 22. When the liquid level in the tank 22 reaches the upper limit level, the supply of the cleaning liquid from the cleaning liquid tank 10 is stopped, When the liquid level becomes lower than the lower limit level, the supply of the cleaning liquid from the cleaning liquid tank 10 is controlled to start. As shown in FIG. 2, the first intermediate tank 22 is provided with a discharge path 223 having a valve V64 and an exhaust path 224 having a valve V65 and connected to an exhaust system of a factory. . The second intermediate tank 32 and the third intermediate tank 42 are configured similarly to the first intermediate tank 22.

The pump flow path systems 23, 33, and 43 shown in FIG. 1 are simplified for convenience of illustration. Specifically, when the pump flow path system 23 is taken as an example, a configuration as shown in FIG. Has been. For example, the pump flow path system 23 includes, in order from the downstream side, a pump 71, a cleaning liquid trap portion 72, a filter mounting portion 73, and a first valve V 7. In this example, the filter unit 64 provided in the circulation path 6 functions as a cleaning filter unit for cleaning the cleaning liquid. Therefore, a dummy filter is mounted on the filter mounting unit 73 when the flow path is cleaned. . This dummy filter is a casing that does not contain a filter medium. When the cleaning process of the flow path is completed, a filter medium (filter) for removing particles in the processing liquid is mounted on the filter mounting portion 73 instead of the dummy filter, and then the processing liquid flows into the processing liquid flow path 1. Then, the liquid processing module 100 performs liquid processing.

The pump 71 is for discharging the processing liquid to the nozzle 21 and is composed of, for example, a diaphragm pump. In FIG. 2, the pump 71 is illustrated in a simplified manner. In FIG. 2, 711 is a diaphragm, and 712 is a flow path for the cleaning liquid. The pump 71 is provided with a liquid supply valve V71, a liquid discharge valve V72, and a vent valve V73. The vent valve V73 and the trap portion 72 are connected by a flow path 74. ing. Further, between the upstream side of the first valve V7 in the first flow path 2 and the pump 71, the filter mounting part 73 is bypassed via the trap part 72 and the bypass path 75 including the second valve V75 is provided. Is provided. Further, the filter mounting portion 73 and the trap portion 72 are connected to the discharge path 76 via vent valves V76 and V77, respectively. The pump flow path system 33 provided in the second flow path 3 and the pump flow path system 43 provided in the third flow path 4 are similarly configured.

  In this example, the valves other than the dispense valves V22, V32, and V42 are constituted by, for example, air operated valves. The valves V21, V31, V41 communicate with the other end side (the side connected to the processing liquid flow path 1) of the circulation path 6 and the cleaning liquid tank 10, and within the cleaning liquid tank 10 and the first intermediate tank 21 ( This corresponds to a valve for switching communication between the second intermediate tank 31 and the third intermediate tank 41).

Further, the processing liquid supply device moves the cleaning liquid in the processing liquid flow path from the portion near the cleaning liquid tank 10 toward the portion near the nozzle 21 (31, 41), and then from the portion near the nozzle 21 (31, 41). A liquid movement mechanism is provided for returning the cleaning liquid to a portion near the cleaning liquid tank 10. In this embodiment, the liquid moving mechanism includes a cleaning liquid tank 10, a pressurizing mechanism in the cleaning liquid tank 10, and an intermediate so that the cleaning liquid is circulated through the processing liquid flow paths 1 to 4 and the circulation paths 61 to 63 and 6. The tanks 22, 32, 42, the pressurizing mechanism for these intermediate tanks 22, 32, 42, and circulation paths 61-63, 6 are configured.

  The liquid processing apparatus is provided with a control unit C including a computer, and the control unit C has a program storage unit 200. The program storage unit 200 stores, for example, a program made of software in which instructions are set so that the cleaning process of the processing liquid supply apparatus and the liquid processing in the liquid processing module, which will be described later, are performed. When this program is read by the control unit C, the control unit C outputs a control signal to each unit of the liquid processing apparatus including the processing liquid supply device and the liquid processing module. Thereby, operations such as opening / closing of the valve, driving of the pump, movement of the nozzle, and driving of the substrate holding unit are controlled, and cleaning processing and liquid processing described later are performed. This program is stored in the program storage unit 200 while being stored in a storage medium such as a hard disk, a compact disk, a magnetic optical disk, or a memory card.

  Further, the controller C supplies the cleaning liquid from the cleaning liquid tank 10 into the processing liquid flow path 1 during the cleaning process, and closes the processing liquid flow path 1 closer to the nozzles 21, 31, 41 from the portion closer to the cleaning liquid tank 10. A step of moving the cleaning liquid toward the part and then returning the cleaning liquid from the part close to the nozzles 21, 31, 41 to the part close to the cleaning liquid tank 10, and a control signal for executing the control signal is output. .

Further, in the control unit C, when the cleaning liquid is moving in the processing liquid flow path 1, a control is performed to turn on and off a valve provided in the cleaning liquid flow path a plurality of times in order to promote dust generation from the valve. It is configured to output a signal. Specifically, taking the first flow path 2 as an example, the valves V7, V71, V72, and V22 are configured to be opened and closed at a predetermined timing at high speed. The high-speed opening / closing operation of these valves V7, V71, V72, and V22 is performed, for example, by repeatedly opening (ON) and closing (OFF) the valve at intervals of 1 second. When the valve is closed, the flow of the cleaning liquid is cut off. However, since the valve is opened immediately after the valve is closed, the opening and closing of the valve does not hinder the flow of the cleaning liquid.

Then, the effect | action of this embodiment is demonstrated. The cleaning timing of the processing liquid supply apparatus is, for example, after assembling the pipes that constitute the processing liquid flow path when the liquid processing apparatus is started up. First, the circulation path 61 provided with the filter unit 64 in the processing liquid flow path 1. To 63 and 6, the cleaning liquid tank 10 is connected to the upstream end of the processing liquid flow path 1, and a dummy filter is mounted on the filter mounting portion 73.
Then, the cleaning liquid is supplied from the cleaning liquid tank 10 to each of the first intermediate tank 22, the second intermediate tank 32, and the third intermediate tank 42, and the first flow path 2, the second flow path 3, and the third flow path. The cleaning process is performed in parallel in the flow path 4. Since the cleaning process is similarly performed in the first flow path 2, the second flow path 3, and the third flow path 4, the first flow path 2 will be described as an example here.

  The supply of the cleaning liquid to the first intermediate tank 22 corresponds to a step of supplying the cleaning liquid from the cleaning liquid tank 10 (cleaning liquid supply source) into the processing liquid flow path. As shown in FIG. It is implemented by opening V21 and V65 and closing the other valves. As a result, nitrogen gas is supplied into the cleaning liquid tank 10, the liquid level of the cleaning liquid is pressurized, and the cleaning liquid in the cleaning liquid tank 10 is supplied toward the downstream side. The liquid level of the cleaning liquid in the first intermediate tank 22 is monitored by the liquid level sensors 221 and 222. When the liquid level of the cleaning liquid reaches the upper limit level, the supply of the cleaning liquid is stopped by closing the valves V5 and V51.

  Subsequently, the cleaning liquid is moved from the portion near the cleaning liquid tank (processing liquid supply source) 10 toward the portion near the nozzle 21 in the processing liquid flow path, and then the cleaning liquid is moved from the portion near the nozzle 21 to the portion near the cleaning liquid tank 10. A step for performing the returning operation is executed. In this step, as shown in FIG. 4, by opening the valves V51, V7, V71, V72, V22, V61 and closing the other valves, supplying nitrogen gas into the first intermediate tank 22, This is performed by pumping the cleaning liquid in the intermediate tank 22 toward the downstream side.

As a result, as shown in FIG. 4, the cleaning liquid in the first intermediate tank 22 flows through the first flow path 2, and the filter mounting portion (a dummy filter in this example) 73 of the pump flow path system 23. It is supplied to the pump 71 via the trap part 72, further flows through the filter part 64 via the circulation paths 61 and 6, and is sent to the cleaning liquid tank 10. When supplying the cleaning liquid into the cleaning liquid tank 10, a valve (not shown) of the exhaust passage 501 of the cleaning liquid tank 10 is kept open. 3 and 4 schematically show the flow of the cleaning liquid. The closed valve is indicated by “C”, and the flow path through which the cleaning liquid flows is shown in bold. The same applies to the subsequent drawings.
Due to the flow of the cleaning liquid, particles adhering to the pipe immediately after assembly are peeled off from the pipe and the processing liquid flow path is cleaned. On the other hand, particles are mixed in the cleaning liquid, but when the cleaning liquid passes through the filter 64, the particles are captured by the filter 64 and removed from the cleaning liquid to be cleaned. In this way, the cleaning liquid is allowed to flow through the processing liquid flow path, whereby particles are removed from the processing liquid flow path for cleaning, and the cleaning liquid cleaned by passing through the filter 64 is returned to the cleaning liquid tank 10 by the circulation path 6. It will be.

  When the supply of the cleaning liquid from the first intermediate tank 22 to the downstream side is started, the control unit C opens and closes the valves V7, V71, V72, and V22 a plurality of times at high speed. This promotes and forcibly generates particles that may be generated by opening and closing the valves V7, V71, V72, and V22, and removes them together with the particles adhering to the pipe. The opening / closing operation of the valve V7 or the like may be started at the timing when the valve V51 is opened and nitrogen gas is introduced into the first intermediate tank 22, or after a predetermined time has elapsed since the valve V51 was opened, or the valve V51 You may start before opening. In addition, the number of times of performing the high-speed opening / closing operation of the valve and the time during which the high-speed opening / closing operation is performed can be appropriately set.

In this way, the supply of the cleaning liquid from the first intermediate tank 22 to the downstream side is continued, and when the liquid level of the cleaning liquid in the first intermediate tank 22 falls to the lower limit level, the valves V5, V21, V65 are opened and the cleaning liquid tank 10 is opened. Start supplying the cleaning liquid. When supplying the cleaning liquid to the first intermediate tank 22, in the flow path downstream of the first intermediate tank 22, for example, the valves V7, V71, V72, V22, and V61 are opened, and the other valves are closed. Although it is in a state, the valves V7, V71, V72, V22, V61 may also be closed. Further, when the cleaning liquid is supplied to the first intermediate tank 22, the high-speed opening / closing operation of the valves V7, V71, V72, V22 may be stopped or continued.
When the level of the cleaning liquid in the first intermediate tank 22 reaches the upper limit level, the valves V7, V71, V72, V22, V61 and the exhaust passage 501 are opened, the other valves are closed, and the first intermediate tank is closed. The cleaning liquid feeding to the downstream side of 22 is started.

  In this way, the cleaning liquid is supplied from the cleaning liquid tank 10 to each of the first to third intermediate tanks 22, 32, and 42, and the first to third intermediate tanks 22, 32, and 42 are connected to the first to third intermediate tanks. The flow of the cleaning liquid to the downstream side of each of the flow paths 2 to 4 is repeatedly performed, and the flow rate is set to the first to third flow paths 2 to 4 at a predetermined flow rate, for example, 50 ml / min, for a predetermined time, for example, 10 hours. The cleaning liquid is allowed to flow and particles are removed by the filter unit 64.

Subsequently, a cleaning process is performed by driving the pump 71. In this step, for example, as shown in FIG. 5, the first valve V7 and the valve V71 are opened, the other valves are closed, the pump 71 is driven, and the cleaning liquid in the first intermediate tank 22 is filtered. The air is sucked into the pump 71 through 73 and the trap part 72. When the cleaning liquid is sucked by the pump 71, for example, the first valve V7 and the valve V71 are opened and closed by the control unit C at high speed.
Next, as shown in FIG. 6, the valves V72, V22, V61 and the exhaust passage 501 are opened, the other valves are closed, the pump 71 is driven, and the cleaning liquid in the pump 71 is discharged to the downstream side. To do. When the cleaning liquid is being discharged by the pump 71, for example, the valves V72 and V22 are opened and closed at high speed by the control unit C. The discharged cleaning liquid flows through the circulation path 61 and passes through, for example, the filter unit 64 and is returned to the cleaning liquid tank 10.

  Thus, one cycle of suction and discharge by the pump 71 is performed in, for example, 2 seconds. By repeating this cycle, dust generation by driving the pump 71 is promoted and removed by the filter unit 64. In this step, since the cleaning liquid is moved by driving the pump 71, the pump 71 also forms a liquid movement mechanism. After driving the pump 71 for 5 hours, for example, as shown in FIG. 7, the valves V51, V7, V71, V72, V22, V23 are opened, the other valves are closed, and the cleaning liquid in the first intermediate tank 22 is opened. Is fed downstream and discharged from the nozzle 21. And the particle | grains in this discharged cleaning liquid are test | inspected, and a cleaning process will be complete | finished if a particle is below a preset value. On the other hand, when the particle exceeds the set value, at least one of the above-described cleaning process by pressurization of nitrogen gas and the cleaning process by the pump operation is performed, the cleaning liquid is discharged from the nozzle 21 again, and the particle is inspected. Since the flow path on the downstream side of the dispense valve V22 is actually extremely short, the particles in the flow path are removed by feeding the cleaning liquid to the nozzle 21.

  After the cleaning process is performed on each of the first flow path 2, the second flow path 3, and the third flow path 4 in this way, the circulation paths 6, 61 to 63 are processed as shown in FIG. It removes from the liquid flow path 1, and connects the piping provided with the nozzles 21, 31, and 41 to the dispense valves V22, V32, and V42. Thereafter, the cleaning liquid may be supplied to the nozzles 21, 31, 41 through the processing liquid flow path for a predetermined time, and the cleaning liquid may be discharged from the nozzles 21, 31, 41. On the other hand, the removed circulation paths 6 and 61 to 63 are cleaned.

In addition, the cleaning liquid tank 10 is removed from the processing liquid flow path 1, and a resist solution supply source (processing liquid supply source) 120 is connected to the upstream side of the processing liquid flow path 1 instead of the cleaning liquid tank 10, and a filter mounting portion. A filter for removing particles in the processing liquid is attached to 73. Then, as shown in FIG. 9, liquid processing is performed in the liquid processing module 100 by supplying the processing liquid to the wafer W through the processing liquid flow paths 1 and 2 and the nozzles 21 (31 and 41). . FIG. 9 shows a state in which the processing liquid is supplied from the nozzle 21 to the wafer W. For example, in the liquid processing module 100, when a plurality of, for example, three substrate holders are prepared and liquid processing can be performed on three wafers W, three wafers from the nozzles 21, 31, 41 are provided. A treatment liquid is supplied to each of W, and a liquid treatment is performed.

  According to the above-described embodiment, the cleaning liquid is passed through the filter unit 64 to remove particles in the cleaning liquid, and then returned to the cleaning liquid tank 10 via the circulation path 6. Then, the cleaning liquid is again sent to the intermediate tanks 22, 32, and 42 and is passed through the processing liquid channels 1 to 4. In this way, after removing particles from the cleaning liquid once passed through the flow path, the cleaning liquid is reused for cleaning the flow path again, so compared with the case where the cleaning liquid is discarded as in the past. The amount of cleaning liquid used can be reduced to, for example, 1/10 or less.

  Further, since the cleaning liquid is reused and the amount of the cleaning liquid used is reduced, the time required for the cleaning process can be shortened as compared with the conventional technique. That is, when the amount of the cleaning liquid used is large, as described in the background art section, there is a limit to the number of processing liquid channels that can be connected to the cleaning liquid tank 10, and when the number of processing liquid channels is large. , It is not possible to wash all the processing liquid flow paths at the same time. On the other hand, according to the present embodiment, since the cleaning liquid is reused, the number of processing liquid channels that can be connected to the cleaning liquid tank 10 is increased as compared with the conventional configuration. Since all of the processing liquid flow paths connected to the cleaning liquid tank 10 can be simultaneously cleaned, the number of man-hours is greatly reduced, and as a result, the total processing time is reduced to, for example, about 1/4. The

In the above-described embodiment, the valve disposed in the flow path through which the cleaning liquid flows is forcibly opened and closed at a high speed. Therefore, not only particles adhering to the pipe but also the valve is opened and closed. Particles that may be dusty can also be removed. Furthermore, by opening and closing the valve at a high speed, the valve operation test can be performed simultaneously with the cleaning process, and the time of the process performed before the operation of the apparatus can be shortened.
Furthermore, when performing the cleaning process by driving the pump 71, particles that may generate dust by driving the pump 71 can be removed. In addition, since nitrogen gas is not pressurized, generation of surface particles on piping, valves, the inner wall of the pump 71 and the like due to excessive dissolution of nitrogen can be suppressed.

Furthermore, if one circulation path 6, 61-63 is prepared by providing the circulation paths 6, 61-63 in a detachable manner, it can be used for cleaning a plurality of processing liquid supply devices. Moreover, since it can remove after washing | cleaning of a process liquid supply apparatus, while performing the liquid process in the liquid process module 100, the circulation paths 6, 61-63, and the filter part 64 can be cleaned. it can. However, the circulation paths 6 and 61 to 63 need not be removed when the liquid treatment module 100 performs the liquid treatment. The timing for removing the circulation paths 6 and 61 to 63 is to dispense the cleaning liquid in the final process of the washing process. It may be before being supplied to the downstream side of the valve V22 and discharged from the nozzle 21. In this case, the circulation paths 6 and 61 to 63 are removed, the nozzle 21 is attached to the dispense valve V22, and then the cleaning liquid is supplied to the nozzle 21. Next, a processing liquid supply source is connected to the upstream side of the processing liquid flow path 1, and a filter for removing foreign substances in the processing liquid is mounted on the filter mounting portion 73 to perform liquid processing. The circulation paths 6 and 61 to 63 are not necessarily provided so as to be detachable with respect to the processing liquid flow path 1.

  Furthermore, in this embodiment, the cleaning process by high-speed opening / closing of the valve and the pump drive is not necessarily performed, and the cleaning process may be performed only by the movement of the cleaning liquid by pressurization of nitrogen gas. Further, the cleaning process by pressurization of nitrogen gas and the high-speed opening and closing of the valve may be performed without performing the cleaning process by driving the pump, or the pressurization of the nitrogen gas without performing the high-speed opening and closing of the valve. Alternatively, only the cleaning process by the pump and the cleaning process by driving the pump may be performed.

  As described above, in this embodiment, as shown in FIG. 10, particles in the cleaning liquid may be removed by the filter mounting portion 73 provided in the pump flow path systems 23, 33, and 43. This example is different from the example shown in FIG. 1 described above in that a filter medium (filter) for removing particles in the processing liquid is provided in the filter mounting portion 73 and a filter portion 64 is provided in the circulation path 6. There is no point. The filter mounting portion 73 of this example serves as both a filter portion for removing particles in the cleaning liquid and a filter portion for removing particles in the processing liquid. Other configurations and cleaning treatment techniques are the same as in the above-described embodiment.

(Second Embodiment)
Next, a second embodiment of the present invention will be described with reference to FIGS. This embodiment differs from the first embodiment described above in that a pressure reducing mechanism 8 for reducing the pressure in the first to third intermediate tanks 22, 32, and 42 is provided, and the first to third flow paths. The circulation paths 61 to 63 and 6 are not connected to 2 to 4, and the filter mounting portion 73 is mounted with a filter for removing particles in the processing liquid. The filter mounted on the filter mounting portion 73 in this example serves as both a filter portion for removing particles in the cleaning liquid and a filter portion for removing particles in the processing liquid.

For example, a suction exhaust path 81 is connected to the exhaust paths 224, 324, and 424 of the first to third intermediate tanks 22, 32, and 42 via valves V66, V67, and V68, respectively. A decompression mechanism 8 is connected to the end side. Each of the first to third flow paths 2 to 4 includes only the dispense valves V22, V32, and V42 between the pump flow path systems 23, 33, and 43 and the nozzles 21, 31, and 41.

Further, the control unit C opens the first valve V7 and closes the second valve V75 with respect to the pump flow path systems 23, 33, 43, and supplies the cleaning liquid to the pump 71 via the filter of the filter mounting unit 73. Inhale. Next, a control signal for discharging the cleaning liquid from the pump 71 to the bypass passage 75 side is output with the first valve V7 closed and the second valve V75 opened.
Furthermore, a liquid level sensor 223 is provided at a height position between the liquid level sensor 221 and the liquid level sensor 222 in each of the first to third intermediate tanks 22, 32, and 42. Other configurations are the same as those of the first embodiment, and the same components are denoted by the same reference numerals and description thereof is omitted.

Next, the operation of this embodiment will be described using the first flow path 2 as an example. The cleaning liquid is supplied from the cleaning liquid tank 10 to the first intermediate tank 22, the second intermediate tank 32, and the third intermediate tank 42 from the cleaning liquid tank 10. The point that the cleaning process is performed in parallel in each of the second flow path 3 and the third flow path 4 is the same as in the first embodiment.
As in the first embodiment, the cleaning liquid is supplied from the cleaning liquid tank 10 until the level of the cleaning liquid in the first intermediate tank 22 reaches the upper limit level. Then, as shown in FIG. 12, the valves V51, V7, V71, V72, V22 are opened, the other valves are closed, and nitrogen gas is supplied into the first intermediate tank 22 to pressurize, for example, the first The cleaning liquid is supplied from the intermediate tank 22 to the flow path inside the nozzle 21. In this way, the cleaning liquid is passed through the processing liquid flow path to clean the flow path, and particles mixed in the cleaning liquid are removed when the cleaning liquid passes through the filter of the filter mounting portion 73. The valves provided in the flow path through which the cleaning liquid flows, that is, V7, V71, V72, and V22 are opened and closed at high speed.

  Subsequently, as shown in FIG. 13, the valves V66, V75, V71, V72, V22 are opened, the other valves are closed, the inside of the first intermediate tank 22 is sucked by the decompression mechanism 8, and the inside of the intermediate tank 22 is filled. Reduce pressure. As a result, the cleaning liquid in the first flow path 2 moves to the first intermediate tank 22 side through the path of the pump 71 → the trap section 72 → the bypass path 75, and the cleaning liquid in the first flow path 2 becomes the first Sucked into the intermediate tank 22. In this way, the cleaning liquid in the first flow path 2 is sucked, for example, immediately downstream of the valve V72 of the pump 71. That is, in the first flow path 2, there is a cleaning liquid in the valve V72, but there is no cleaning liquid downstream of the valve V72. Thus, when the cleaning liquid is moved to the first intermediate tank 22 side, for example, the valves provided in the flow path, that is, the valves V71, V75, V72, and V22 are opened and closed at high speed.

  In this way, the cleaning liquid is pressurized in the first intermediate tank 22 with nitrogen gas to move in the processing liquid flow path from the first intermediate tank 22 toward the nozzle 21, and in the first intermediate tank 22, a pressure reducing mechanism. When the pressure is reduced by 8, the nozzle 21 moves back to the downstream side of the pump flow path system 23. Therefore, the liquid movement mechanism of this example operates to reciprocate the cleaning liquid in the processing liquid flow path. For example, the cleaning liquid tank 10, a pressurizing mechanism for pressurizing the cleaning liquid tank 10, an intermediate tank 22, 32 and 42, a mechanism for pressurizing the inside of the intermediate tanks 22, 32 and 42, and a pressure reducing mechanism 8.

  In this example, for example, when the liquid level of the cleaning liquid in the first intermediate tank 22 is sent downstream from the upper limit level to the lower limit level, the entire flow path extending from the first intermediate tank 22 to the inside of the nozzle 21. It is set so that the cleaning liquid can be distributed. When the cleaning liquid in the first intermediate tank 22 is sucked up from the lower limit level to the intermediate level detected by the liquid level sensor 223, the cleaning liquid in the flow path on the downstream side of the valve V72 of the pump 71 is sucked back. It is like that. Therefore, the supply of the cleaning liquid from the cleaning liquid tank 10 to the first intermediate tank 22 is controlled by controlling the opening and closing of the valves V5, V21, V51, and V66 based on the detection signals of the liquid level sensors 221 to 223. Supply of the cleaning liquid from the intermediate tank 22 to the nozzle 21 and suction of the cleaning liquid in the flow path on the downstream side of the pump 71 are performed.

In this way, the step of supplying the cleaning liquid to the flow path of the cleaning liquid from the first intermediate tank 22 to the inside of the nozzle 21 and the step of sucking the cleaning liquid in the flow path on the downstream side of the pump 71 are repeated a plurality of times. 21 and the pump 71 are moved back and forth to remove particles in the cleaning liquid.
Thereafter, a cleaning process by driving the pump is performed. This step includes, for example, the step of sucking the cleaning liquid in the flow path on the downstream side of the valve V72 of the pump 71 by the decompression mechanism 8 and then driving the pump 71 to suck the cleaning liquid into the pump 71 and the cleaning liquid from the pump 71. It is carried out by alternately repeating the discharging step a plurality of times.

First, in the step of sucking the cleaning liquid into the pump 71, for example, as shown in FIG. 14, the first valve V7 and the valve V71 are opened, the other valves are closed, and the pump 71 is driven to suck the cleaning liquid into the pump. As a result, the cleaning liquid in the first intermediate tank 22 moves in the forward direction, that is, to the nozzle 21 side so as to pass through the filter of the filter mounting portion 73, and particles are removed. At this time, the first valve V7 and the valve V71 are opened and closed at high speed.
Next, in the step of discharging the cleaning liquid from the pump 71, for example, as shown in FIG. 15, the valve V71, the second valve V75, and the valve V65 are opened and the other valves are closed, and the pump 71 is directed toward the trap portion 72. Discharge the cleaning solution. Accordingly, the cleaning liquid in the pump 71 moves through the bypass 75 in the reverse direction, that is, toward the first intermediate tank 22 side. At this time, the valve V71 and the second valve V75 are opened and closed at high speed. Thus, the process of sucking the cleaning liquid into the pump 71 and the process of discharging the cleaning liquid from the pump 71 are repeated a plurality of times. In this step, since the cleaning liquid is moved by driving the pump 71, the pump 71 also forms a liquid moving mechanism.

Subsequently, the valves V51, V7, V71, V72, and V22 are opened, the other valves are closed, the cleaning liquid is supplied from the first intermediate tank 22 to the downstream side via the first flow path 2, and discharged from the nozzle 21. Let At this time, the valves V51, V7, V71, V72, and V22 may be opened and closed at high speed. And the particle | grains in this discharged cleaning liquid are test | inspected, and a cleaning process will be complete | finished if a particle is below a preset value. On the other hand, when the particle exceeds the set value, at least one of the aforementioned cleaning process by pressurization of nitrogen gas and the cleaning process by the pump operation is repeated for a predetermined time, and the cleaning liquid is discharged from the nozzle 21 again to inspect the particle. Do.

  After the cleaning process is performed for each of the first flow path 2, the second flow path 3, and the third flow path 4 in this manner, the cleaning liquid tank 10 is removed from the processing liquid flow path 1, and instead of the cleaning liquid tank 10. The processing liquid supply source is connected to the upstream side of the processing liquid channel 1. Then, the processing liquid is supplied to the nozzles 21, 31, 41 through the processing liquid supply paths 1 to 4, and the processing liquid is supplied to the wafer W in the liquid processing module 100 to perform liquid processing.

According to the second embodiment, the cleaning liquid is reciprocated in the flow path by the forward movement of the cleaning liquid by pressurization of nitrogen gas and the reverse movement of the cleaning liquid by the pressure reduction of the decompression mechanism 8, and the forward direction. The cleaning liquid passes through the filter of the filter mounting portion 73 when moving to. Accordingly, the cleaning liquid from which particles have been removed can be reused, and the amount of cleaning liquid used can be reduced compared to the conventional case. In addition, since the amount of the cleaning liquid used is reduced, the cleaning process can be performed in parallel in the plurality of process liquid channels, and the cleaning process time is shortened. Furthermore, since the decompression mechanism 8 and the suction / exhaust passage 81 may be added to the existing equipment, there is an advantage that the equipment can be easily remodeled. The effect of forcibly opening and closing the valve disposed in the flow path through which the cleaning liquid flows and the effect of the cleaning process by driving the pump 71 are the same as in the first embodiment.

  In the second embodiment, the high-speed opening / closing of the valve and the cleaning process by driving the pump are not necessarily required, and the cleaning process is performed only by pumping the cleaning liquid to the downstream side of the first intermediate tank 22 using nitrogen gas. You may make it perform. In other words, the cleaning process by pump driving may not be performed, and the cleaning process by pressurizing nitrogen gas and only the valve opening and closing may be performed at high speed. Only the cleaning step and the pump-driven cleaning step may be performed. Moreover, the timing of high-speed valve opening and closing can be set as appropriate. Further, in the apparatus for moving the cleaning liquid through the circulation paths 6 and 61 to 63 as in the processing liquid supply apparatus of the first embodiment, the cleaning liquid is moved by the decompression mechanism 8 as in the second embodiment. Alternatively, the cleaning process may be performed by reciprocating the cleaning liquid by driving the pump.

(Third embodiment)
Next, a third embodiment of the present invention will be described with reference to FIGS. This embodiment is different from the first embodiment described above in that the circulation paths 61 to 63 and 6 are not connected to the first to third channels 2 to 4, and the processing liquid is provided to the filter mounting portion 73. A filter for removing particles inside is attached. The filter of the filter mounting portion 73 in this example serves as both a filter portion for removing particles in the cleaning liquid and a filter portion for removing particles in the processing liquid. Further, only the dispense valves V22, V32, V43 are provided between the pump flow path systems 23, 33, 43 and the nozzles 21, 31, 41.

  In addition, the control unit C opens the first valve V7 and closes the second valve V75 with respect to the pump flow path systems 23, 33, and 43. Inhale. Next, a control signal for discharging the cleaning liquid from the pump 71 to the bypass passage 75 side is output with the first valve V7 closed and the second valve V75 opened. Other configurations are the same as those of the first embodiment, and the same components are denoted by the same reference numerals and description thereof is omitted.

The operation of this example will be described using the first flow path 2 as an example. The cleaning liquid is supplied from the cleaning liquid tank 10 to the first intermediate tank 22, the second intermediate tank 32, and the third intermediate tank 42 from the cleaning liquid tank 10. The point that the cleaning process is performed in parallel in each of the second flow path 3 and the third flow path 4 is the same as in the first embodiment.
First, as in the first embodiment, the cleaning liquid is supplied from the cleaning liquid tank 10 into the first intermediate tank 22 until the cleaning liquid reaches the upper limit level. Then, the valves V51, V7, V71, V72, V22 are opened, the other valves are closed, and the cleaning liquid is supplied from the first intermediate tank 22 to, for example, the flow path inside the nozzle 21 by pressurizing nitrogen gas.

  Subsequently, a series of set operations including a suction process → first retrograde process → filtration process → second retrograde process is executed. In the suction process, as shown in FIG. 17, the valves V 72 and V 22 are opened, the other valves are closed, and the cleaning liquid on the downstream side of the pump 71 is sucked into the pump 71 by the suction operation of the pump 71. The valves V72 and V22 are opened and closed at high speed. FIG. 17 shows a state immediately after the suction process is started, and FIG. 18 shows a state immediately after the suction process is finished, that is, a state immediately after the next first reverse process is started.

  Next, the first retrograde process shown in FIG. 18 is performed. In this step, the valves V73, V75, and V65 are opened, the other valves are closed, and the discharge liquid of the pump 71 causes the cleaning liquid in the pump 71 to flow upstream of the pump 71 via the flow path 74 and the bypass path 75. Deliver liquid. As a result, the cleaning liquid moves in the reverse direction in the first flow path 2 and is returned to the inside of the first intermediate tank 22. The valves V73 and V75 are opened and closed at high speed.

Subsequently, the filtration process shown in FIG. 19 is implemented. FIG. 19 shows a state immediately after starting the filtration process (immediately after finishing the first retrograde process). In this process, the valves V7 and V71 are opened, the other valves are closed, and the suction operation of the pump 71 is performed. The cleaning liquid in the flow path upstream of the first intermediate tank 22 and the pump flow path system 23 is moved in the forward direction and sucked into the pump 71. At this time, since the cleaning liquid passes through the filter portion of the filter mounting portion 73, particles in the cleaning liquid are removed. The valves V7 and V71 are opened and closed at high speed.

Subsequently, as shown in FIG. 20, a second retrograde process is performed. In this process, as in the first retrograde process, the valves V73, V75, V65 are opened, the other valves are closed, and the discharge liquid of the pump 71 causes the cleaning liquid in the pump 71 to flow through the flow path 74 and the bypass path 75. To feed through. As a result, the cleaning liquid moves in the reverse direction in the first flow path 2 and is returned to the inside of the first intermediate tank 22. The valves V73 and V75 are opened and closed at high speed. In the first retrograde process and the second retrograde process, the valves V71, V75, and V65 are opened, the other valves are closed, and the cleaning liquid in the pump 71 is sent to the upstream side of the pump 71 via the bypass path 75. You may make it do.

In this way, the set of the suction process → the first retrograde process → the filtration process → the second retrograde process is repeated a plurality of times. As the cleaning liquid flows through the flow path, the flow path is cleaned, and the cleaning liquid passes through the filter of the filter mounting portion 73, whereby particles are removed from the cleaning liquid and the cleaning liquid is cleaned. Further, since the cleaning liquid gradually moves to the pump 71 side in the flow path on the downstream side of the pump 71 each time the suction process is performed, for example, until the cleaning liquid moves to the vicinity of the valve V72 of the pump 71, the above-described set is performed. repeat. In this example, since the cleaning liquid is reciprocated in the processing liquid flow path by driving the pump 71, the pump 71 forms a liquid moving mechanism.

Thereafter, as shown in FIG. 21, the valves V51, V7, V71, V72, and V22 are opened, the other valves are closed, and the cleaning liquid is passed downstream from the first intermediate tank 22 via the first flow path 2. Is discharged from the nozzle 21. And the particle | grains in this discharged cleaning liquid are test | inspected, and a cleaning process will be complete | finished if a particle is below a preset value. On the other hand, when the particle exceeds the set value, the above-described cleaning process is repeated for a predetermined time, and the cleaning liquid is discharged from the nozzle 21 again to inspect the particle.
After the cleaning process is performed for each of the first flow path 2, the second flow path 3, and the third flow path 4 in this manner, the cleaning liquid tank 10 is removed from the processing liquid flow path 1, and instead of the cleaning liquid tank 10. The processing liquid supply source is connected to the upstream side of the processing liquid channel 1. Then, by supplying the processing liquid to the nozzles 21, 31, and 41 through the processing liquid channels 1 to 4, the liquid processing module 100 supplies the processing liquid to the wafer W and performs liquid processing.

According to the third embodiment, the cleaning liquid is reciprocated into the flow path by the pump operation, and the cleaning liquid passes through the filter of the filter mounting portion 73 when moving in the forward direction. Therefore, the cleaning liquid from which particles have been removed can be reused, and the amount of cleaning liquid used can be reduced compared to the conventional case. In addition, since the amount of the cleaning liquid used is reduced, the cleaning process can be performed simultaneously in a plurality of process liquid flow paths, and the cleaning process time is shortened. Furthermore, there is an advantage that it is not necessary to modify existing facilities and is easy to implement. The effect of opening and closing the valve disposed in the flow path through which the cleaning liquid flows and the effect of performing the cleaning process by driving the pump are the same as in the first embodiment, but the valve is not necessarily opened and closed at high speed. There is no need. Moreover, the timing of high-speed valve opening and closing can be set as appropriate. Further, in the apparatus for moving the cleaning liquid through the circulation paths 6 and 61 to 63 like the processing liquid supply apparatus of the first embodiment, the cleaning liquid is reciprocated by driving the pump as in the third embodiment. May be performed.
In this embodiment, the pump 71 is driven to move the cleaning liquid in the forward direction in the flow path from the first intermediate tank 22 side toward the nozzle 21 side. This forward movement is changed to the first intermediate tank. Alternatively, nitrogen gas may be supplied to 22 and the inside of the intermediate tank 22 may be pressurized.

Next, another example of the pump flow path system will be briefly described with reference to FIGS. 22 to 24, taking the configuration provided in the first flow path 2 as an example. FIG. 22 shows an example in which a pump flow path system 91 composed of a two-stage pump is provided. The pump flow path system 91 includes a dispense pump 911 and a feed pump 912 that are independent of each other, and a filter unit 913 is provided between them. The dispense pump 911 and the feed pump 912 are connected by a flow path 914 including a purge valve V81. The filter unit 913 is connected to the feed pump 912 by a flow path 915 having a valve V82, and is connected to the dispense pump 911 by a flow path 916 having a valve V83. Further, the feed pump 912 is connected to the first intermediate tank 22 by the first flow path 2 having the liquid supply valve V84, and the dispense pump 911 is connected to the first pump via the liquid discharge valve V85. It is connected to the dispense valve V22 of the flow path 2. Reference numeral 910 denotes an exhaust passage provided with a vent valve V80.

In this example, the cleaning liquid in the first intermediate tank 22 flows toward the downstream side through the path of the feed pump 912 → the filter unit 913 → the dispense pump 911. In this pump flow path system 91, since the feed pump 912 and the dispense pump 911 are provided independently of each other, the speed of the cleaning liquid flowing through the filter unit 913 (filtration speed), and the cleaning liquid downstream from the dispensing pump 911. The discharge speed when discharging the ink can be set independently of each other.

FIG. 23 shows an example in which a pump flow path system 92 composed of a tube diaphragm pump is provided. The pump flow path system 92 includes a tube frame 922 and a secondary fluid portion 923 for pressure transmission in a housing 921, and a stepping motor 926 is connected to the secondary fluid portion 923 via a plunger 924 and a piston 925. Has been. The tube frame 922 is connected to the first intermediate tank 22 via the first flow path 2 provided with the liquid supply valve V86, and is connected to the filter unit 928 via the flow path 927. The filter unit 928 is connected to a nozzle 21 (not shown) via a flow path 929 provided with a dispense valve V22, and an exhaust path 920 provided with a vent valve V87 is provided. Reference numeral 930 denotes an exhaust passage provided with a vent valve V88, and 939 denotes a pressure sensor. In this pump flow path system 92, the volume change generated by the plunger 924 directly connected to the stepping motor 926 is transmitted to the tube frame 922 via the secondary fluid part 923 so that the cleaning liquid is sucked and discharged. It is configured.

FIG. 24 shows an example in which a pump flow path system 93 including a bellows pump is provided. In FIG. 24, 931 is a bellows, 932 is a bellows shaft, 933 is a stepping motor, and 934 is a belt mechanism. A filter portion 935 is connected to the bellows 931 via a flow path 936 provided with a liquid supply valve V91, and to the dispense valve V22 (not shown) by the first flow path 2 via a liquid discharge valve V92. It is connected. The first intermediate tank 22 is connected to the filter unit 935 through the first flow path 2. Reference numeral 937 denotes a discharge path of the filter unit 935, and reference numeral 938 denotes a pressure sensor. In this example, the stepping motor 933 is configured to expand and contract the bellows 931 to suck in the cleaning liquid, and to drive the bellows 931 in the opposite direction, thereby discharging the cleaning liquid.

As described above, in the above-described embodiment, the cleaning liquid is passed through the filter unit for removing particles from the cleaning liquid in the forward direction (the direction from the cleaning liquid tank side toward the nozzle) to remove the particles, and the cleaning liquid after the particle removal is performed. The cleaning liquid may be returned to the cleaning liquid tank by passing through the filter portion in the opposite direction again.
Further, the branch path of the processing liquid flow path connected to the cleaning liquid tank is not limited to the first to third flow paths, and three or more branch paths are connected and the cleaning process is performed in parallel in each branch path. You may do it. Further, it is not necessary to branch the processing liquid flow path, and one nozzle may be connected to the cleaning liquid tank via one processing liquid flow path. Furthermore, even when the treatment liquid flow path is branched into a plurality of branch paths, it is not always necessary to clean all the branch paths, and the cleaning process may be performed on only some of the branch paths.
Furthermore, it is preferable to supply the cleaning liquid to the bypass path 75 and the flow path 74 at the timing of supplying the cleaning liquid to the first to third intermediate tanks 22, 32, and 42 to clean these flow paths. However, every time the cleaning liquid is supplied to the first to third intermediate tanks 22, 32, 42, it is not necessary to pass the cleaning liquid through the bypass path 75 and the flow path 74, and the timing of supplying the cleaning liquid to these flow paths Can be set as appropriate.

W wafer 100 liquid processing module 1 processing liquid flow path 10 cleaning liquid tank 2 first flow path 21, 31, 41 nozzle 23, 33, 43 pump flow path system 3 second flow path 4 third flow path 6, 61 62, 63 Circulation path 64 Filter part 71 Pump

Claims (14)

In a processing liquid supply apparatus for supplying a processing liquid from a processing liquid supply source to a target object via a processing liquid channel and a nozzle,
A cleaning liquid supply source for supplying a cleaning liquid into the processing liquid flow path;
An operation of moving the cleaning liquid in the processing liquid flow path from the portion near the processing liquid supply source toward the portion near the nozzle, and then returning the cleaning liquid from the portion near the nozzle to the portion near the processing liquid supply source A liquid movement mechanism for performing
A cleaning filter for removing foreign matter, provided in a flow path through which the cleaning liquid moves;
A controller that supplies a cleaning liquid from the cleaning liquid supply source into the processing liquid flow path and outputs a control signal to perform the operation, and
The liquid movement mechanism includes a tank provided in a flow path through which the cleaning liquid moves, and a pressure mechanism that pressurizes the liquid surface in the tank and discharges the cleaning liquid from the tank. Liquid supply device.   The processing liquid supply apparatus according to claim 1, wherein the liquid movement mechanism includes an intermediate tank provided in the middle of the flow path, and a decompression mechanism that depressurizes the inside of the intermediate tank. In a processing liquid supply apparatus for supplying a processing liquid from a processing liquid supply source to a target object via a processing liquid channel and a nozzle,
A cleaning liquid supply source for supplying a cleaning liquid into the processing liquid flow path;
One end is connected to the portion near the nozzle in the processing liquid flow path, and provided to bypass the processing liquid flow path from the one end to return the cleaning liquid to the portion near the processing liquid supply source in the processing liquid flow path. The circuit,
A liquid moving mechanism for circulating the cleaning liquid through the circulation path;
A cleaning filter for removing foreign matter, provided in a flow path through which the cleaning liquid moves;
A controller that supplies a cleaning liquid from the cleaning liquid supply source into the processing liquid flow path and outputs a control signal so that the liquid moving mechanism performs an operation for moving the cleaning liquid;
The liquid moving mechanism includes a cleaning liquid tank, a pressurizing mechanism that pressurizes the liquid surface in the cleaning liquid tank and discharges the cleaning liquid from the cleaning liquid tank, and an intermediate in which the cleaning liquid discharged from the cleaning liquid tank is sent through a flow path. The tank and the liquid level in the intermediate tank are pressurized, and the cleaning liquid is discharged from the intermediate tank to one end side of the circulation path through the processing liquid flow path, and from the one end side of the circulation path to the cleaning liquid tank. And a pressurizing mechanism for returning the processing liquid supply device. A plurality of the treatment liquid channels are provided,
One end side of the circulation path is branched into a plurality, and each branch path of the branched circulation path is connected to each processing liquid flow path,
The processing liquid supply apparatus according to claim 3, wherein the cleaning filter section is provided on the other end side of the branch path on the one end side in the circulation path.   The processing liquid supply apparatus according to claim 3, wherein the circulation path is configured to be detachable from the processing liquid supply path.   One end side of the circulation path is branched into two, and one branch path and the other branch path are configured to be attachable to and detachable from a split end that detachably separates the treatment liquid supply path. The processing liquid supply apparatus according to claim 5, wherein A first valve and a pump respectively provided on the upstream side and the downstream side of the filter unit;
A bypass path having one end connected to the upstream side of the first valve and the other end connected to the pump, bypassing the filter unit and provided with a second valve;
The control unit sucks cleaning liquid into the pump through the filter unit in a state where the first valve is opened and the second valve is closed, and then the first valve is closed and the second valve is closed. 7. The processing liquid supply apparatus according to claim 1, wherein a control signal is output so that the cleaning liquid is discharged from the pump to the bypass path side in a state where the pump is opened.   When the operation is being performed by the liquid movement mechanism, the control unit outputs a control signal to turn on and off a valve provided in the flow path of the cleaning liquid a plurality of times in order to promote dust generation from the valve. The processing liquid supply apparatus according to claim 1, wherein the processing liquid supply apparatus outputs the processing liquid. In a cleaning method of a processing liquid supply apparatus for supplying a processing liquid from a processing liquid supply source to a target object via a processing liquid channel and a nozzle,
The cleaning liquid is supplied into the processing liquid flow path, the cleaning liquid is moved from the part near the processing liquid supply source toward the part near the nozzle in the processing liquid flow path, and then the processing from the part near the nozzle A cleaning step of returning the cleaning liquid to a site near the liquid supply source and cleaning the processing liquid flow path;
A cleaning method for a processing liquid supply apparatus, comprising: a cleaning process in which the cleaning liquid used in the cleaning process passes through a filter unit for removing foreign matter and is cleaned.   The method for cleaning a processing liquid supply apparatus according to claim 9, wherein the cleaning step includes a step of pressurizing a tank provided in a flow path in which the cleaning solution moves and storing the cleaning solution.   The method for cleaning a processing liquid supply apparatus according to claim 9 or 10, wherein the cleaning step includes a step of depressurizing a tank provided in a flow path in which the cleaning solution moves and storing the cleaning solution.   The method for cleaning a processing liquid supply apparatus according to any one of claims 9 to 11, wherein the cleaning step includes a step of operating a pump provided in a flow path through which the cleaning liquid moves.   In the cleaning step, the cleaning liquid is moved in the processing liquid flow path from the portion near the processing liquid supply source toward the portion near the nozzle, and then the cleaning liquid is moved from the portion near the nozzle to the portion near the processing liquid supply source. The method for cleaning a processing liquid supply apparatus according to claim 9, further comprising a step of returning to the processing liquid flow path via a circulation path provided by bypassing the processing liquid flow path.   In the cleaning step, the cleaning liquid is moved in the processing liquid flow path from the portion near the processing liquid supply source toward the portion near the nozzle, and then the cleaning liquid is moved from the portion near the nozzle to the portion near the processing liquid supply source. The method for cleaning a treatment liquid supply apparatus according to claim 9, further comprising a step of returning through the treatment liquid flow path.

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