JP6607820B2 - Filter startup device, treatment liquid supply device, jig unit, and filter startup method - Google Patents

Description

  The present invention relates to a filter startup device, a processing liquid supply device, a jig unit, and a filter startup method for starting up a filter that removes impurities in a processing solution on a substrate before being attached to the processing liquid supply device.

  In the photolithography process in the manufacturing process of a semiconductor device or the like, a resist or development is used to form a coating film such as an antireflection film or a resist film on a substrate such as a semiconductor wafer or to develop a resist film after exposure. A treatment liquid such as a liquid is used.

  The processing liquid may contain foreign matter (particles). In addition, even if there are no particles in the original processing liquid, if particles adhere to the system path such as the pump, valve, or pipe of the apparatus that supplies the processing liquid, the particles are mixed in the processing liquid to be supplied. Sometimes. Therefore, a filter is disposed in the system path of the apparatus for supplying the processing liquid, and particles are removed by the filter.

  At the time of delivery from the filter manufacturer, the product is delivered in a sufficiently clean state. However, when the filter is actually incorporated into the apparatus and the processing liquid is allowed to flow, particles may be detected. Therefore, before operating the semiconductor device manufacturing apparatus, first, the filter attached to the processing liquid supply apparatus is subjected to a liquid passing process for passing the processing liquid and cleaned until the filter actually conforms to the manufacturing process. (Starting up the filter)

  In addition, during the lithography process and / or after the lithography process, the presence or absence of particles or defects on the substrate is inspected. Patent Document 1 discloses a technique for inspecting defects on a substrate.

Japanese Patent Laying-Open No. 2015-62022

  By the way, by using the technique disclosed in Patent Document 1, the detection sensitivity of particles on the substrate has been increased. For example, fine particles of 20 nm or less can be detected. In order to remove such fine particles from the filter, a large amount of processing liquid is required in the liquid passing process as described above.

  The present invention has been made in view of such points, and an object of the present invention is to enable a filter attached to a processing liquid supply apparatus that supplies a processing liquid onto a substrate to be started up by passing a small amount of liquid. To do.

  In order to achieve the above object, the present invention provides a circulation path through which a liquid for cleaning a filter excluding foreign matters in a substrate processing liquid circulates, and a pump for supplying the liquid to the circulation path. The filter and a purification filter for purifying the liquid are attached to the circulation system path so that the liquid passes in the order of the pump, the filter, and the purification filter. During the start-up process for cleaning the filter prior to use in a system outside the circulation system path, the liquid is circulated until a predetermined condition is satisfied with the filter and the purification filter attached, It is configured to allow liquid to pass through the filter.

  According to the filter start-up device of the present invention, since the liquid for starting up the filter is circulated and used, the consumption of the liquid can be suppressed, and the impurities in the circulating liquid are purified by the purification filter. The cleanliness of the pump etc. can be maintained.

  The liquid may be the treatment liquid or may be different from the treatment liquid. The liquid may be a mixed liquid of the processing liquid and another solution.

  A filter start-up device includes a degassing mechanism for degassing the processing liquid or the liquid, and the processing liquid or the liquid degassed by the degassing mechanism after the circulation of the processing liquid or the liquid after the circulation. It is preferable to provide a highly degassed liquid supply mechanism that passes through the liquid.

  Further, the filter startup device determines whether or not the predetermined condition is satisfied based on a detection device that detects impurities contained in the liquid in the circulation system and a detection result of the detection device. And a control unit that automatically ends the passage to the filter based on the determination result.

  Further, the filter start-up device includes a drain pipe for passing the liquid through the purification filter before circulating the liquid and discharging the liquid without circulating in the circulation system path. Good.

  The filter startup device passes the liquid through the filter before circulating the liquid, and discharges the passed solution without passing through the purification filter and without circulating in the circulation path. It is preferable to provide a drainage pipe.

  In the filter start-up device, it is preferable that the circulation system path is configured such that a plurality of the filters are attached in parallel, and the liquid can be simultaneously passed through the plurality of filters.

  Another aspect of the present invention includes a processing liquid supply pipe connected to a nozzle that supplies a processing liquid to a substrate, the processing liquid supply pipe having a pump that supplies the processing liquid to the nozzle, and the processing A treatment liquid supply apparatus in which a filter for removing foreign matter in the treatment liquid is attached between the pump and the nozzle in a liquid supply pipe, and a purification filter for purifying the treatment liquid passed through the filter A circulation pipe to be attached, and the circulation pipe is connected to the treatment liquid supply pipe so as to form a circulation path through which the treatment liquid passes and circulates in the order of the pump, the filter, and the purification filter; The system path circulates the processing liquid until a predetermined condition is satisfied in a state where the filter and the purification filter are attached during the startup process for cleaning the filter, It is characterized in that it is configured to passed through the filter.

  The processing liquid supply device determines whether or not the predetermined condition is satisfied based on a detection device that detects impurities contained in the processing liquid circulating in the circulation system path, and a detection result of the detection device, It is preferable to include a control unit that automatically ends the start-up process based on the determination result.

  The processing liquid supply device includes a drain pipe for passing the processing liquid through the purification filter before circulating the processing liquid and discharging the processed processing liquid without circulating it in the circulation path. Good.

  The processing liquid supply device passes the processing liquid through the filter before circulating the processing liquid, and does not pass the processed processing liquid through the purification filter without passing through the purification filter. You may provide the other drainage pipe | tube to discharge | emit.

  According to still another aspect, the present invention is a jig unit that is detachably attached to the processing liquid supply apparatus, and includes a pipe provided with the purification filter, and the pipe includes the jig unit. Is formed in the circulation path when attached to the treatment liquid supply apparatus.

  The jig unit passes the processing liquid through the filter before circulating the processing liquid, and discharges the processed processing liquid without passing through the purification filter and without circulating in the circulation path. It is preferable to have a drainage pipe.

  Further, according to another aspect, the present invention includes a processing liquid supply pipe connected to a nozzle that supplies a processing liquid to the substrate, and the processing liquid supply pipe includes a pump that supplies the processing liquid to the nozzle. A process liquid supply apparatus in which a filter for removing foreign matter in the process liquid is attached between the pump and the nozzle in the process liquid supply pipe, wherein the process liquid supply apparatus includes: And a piping to which a purification filter for purifying the processing liquid passed through the filter is attached, and the piping is a circulation system through which the processing liquid passes and circulates in the order of the pump, the filter, and the purification filter. Connected to the treatment liquid supply pipe so as to form a path, and a method for starting up the filter includes attaching the purification filter to the pipe forming the circulation path, Attaching the filter to the processing liquid supply pipe forming a ring system path, supplying the processing liquid to the circulation system path, circulating the processing liquid in the circulation system path until a predetermined condition is satisfied, Passing the liquid through the filter.

  The step of passing the liquid through the filter detects whether or not the predetermined condition is satisfied based on a step of detecting impurities contained in the processing liquid circulating in the circulation system and a detection result in the detecting step. Determining and automatically ending the step of passing through the filter based on the determination result may be included.

  The method for starting up the filter includes the step of passing the treatment liquid through the purification filter before the step of passing through the filter, and discharging the passed treatment liquid without circulating it in the circulation system. May be included.

  In the method for starting up the filter, before the step of passing through the filter, the processing system is passed through the filter, and the passed processing liquid is circulated within the circulation path without passing through the purification filter. There may be included a step of discharging without performing.

  The step of attaching the purification filter in the filter startup method is, for example, a step of attaching the purification filter using a jig unit, and the jig unit is provided with the purification filter, and the jig unit Is attached to the processing liquid supply device, and the processing liquid is passed through the filter before the processing liquid is circulated, and the purification process is performed. A drainage pipe for discharging without passing through the filter and without circulating in the circulation system path.

  According to the present invention, the filter attached to the processing liquid supply device that supplies the processing liquid onto the substrate can be started up with a small amount of liquid.

It is a top view which shows the outline of a structure of the substrate processing system which concerns on embodiment of this invention. It is a front view which shows the outline of a structure of the substrate processing system which concerns on embodiment of this invention. It is a rear view which shows the outline of a structure of the substrate processing system which concerns on embodiment of this invention. It is a piping system figure showing the outline of the composition of the filter starting device concerning a 1st embodiment of the present invention. It is explanatory drawing of the state which showed the piping system for demonstrating the outline of a structure of a filter starting apparatus, and implemented the liquid storage process for a circulation. It is explanatory drawing of the state which showed the piping system for demonstrating the outline of a structure of a filter starting apparatus, and implemented the circulating liquid passing process. It is explanatory drawing of the state which showed the piping system for demonstrating the outline of a structure of a filter starting apparatus, and implemented the circulating liquid passing process. It is explanatory drawing of the state which showed the piping system for demonstrating the outline of a structure of a filter starting apparatus, and implemented the purification | cleaning filter cleaning process. It is explanatory drawing of the state which showed the piping system for demonstrating the outline of a structure of a filter starting apparatus, and implemented the pre-processing process. It is explanatory drawing of the state which showed the piping system for demonstrating the outline of a structure of a filter starting apparatus, and implemented the circulating fluid replacement | exchange process. FIG. 2 is a diagram illustrating a piping system for explaining an outline of the configuration of a filter startup device, and is an explanatory diagram of a highly degassed liquid passing process. It is a piping system diagram which shows the outline of a structure of the filter starting apparatus which concerns on the 2nd Embodiment of this invention. It is a figure which shows the outline of a structure of the filter starting-up apparatus which concerns on the 3rd Embodiment of this invention. It is explanatory drawing of the state which showed the piping system for showing and explaining the outline of the structure of the filter starting apparatus which concerns on the 4th Embodiment of this invention, and implemented the liquid storage process for circulation. It is explanatory drawing of the state which showed the piping system for showing and explaining the outline of the structure of the filter starting apparatus which concerns on the 4th Embodiment of this invention, and implemented the substitution process. It is a figure which shows the outline of a structure of the filter starting-up apparatus which concerns on the 5th Embodiment of this invention. It is a piping system diagram which shows the outline of a structure of the developing solution supply apparatus which concerns on the 6th Embodiment of this invention.

  Embodiments of the present invention will be described below. FIG. 1 is an explanatory diagram showing an outline of a configuration of a substrate processing system 1 used together with a filter startup device according to the present embodiment. 2 and 3 are a front view and a rear view, respectively, schematically showing the outline of the internal configuration of the substrate processing system 1. In the present specification and drawings, elements having substantially the same functional configuration are denoted by the same reference numerals, and redundant description is omitted.

  As shown in FIG. 1, the substrate processing system 1 includes a cassette station 10 in which a cassette C containing a plurality of wafers W is loaded and unloaded, and a processing station 11 having a plurality of various processing apparatuses for performing predetermined processing on the wafers W. And an interface station 13 that transfers the wafer W to and from the exposure apparatus 12 adjacent to the processing station 11 is integrally connected.

  The cassette station 10 is provided with a cassette mounting table 20. The cassette mounting table 20 is provided with a plurality of cassette mounting plates 21 on which the cassette C is mounted when the cassette C is carried into and out of the substrate processing system 1.

  As shown in FIG. 1, the cassette station 10 is provided with a wafer transfer device 23 that is movable on a transfer path 22 that extends in the X direction. The wafer transfer device 23 is also movable in the vertical direction and the vertical axis direction (θ direction), and includes a cassette C on each cassette mounting plate 21 and a delivery device for a third block G3 of the processing station 11 described later. The wafer W can be transferred between the two.

  The processing station 11 is provided with a plurality of, for example, four blocks G1, G2, G3, and G4 having various devices. For example, the first block G1 is provided on the front side of the processing station 11 (X direction negative direction side in FIG. 1), and the second block is provided on the back side of the processing station 11 (X direction positive direction side in FIG. 1). Block G2 is provided. A third block G3 is provided on the cassette station 10 side (Y direction negative direction side in FIG. 1) of the processing station 11, and the interface station 13 side (Y direction positive direction side in FIG. 1) of the processing station 11 is provided. Is provided with a fourth block G4.

  For example, in the first block G1, as shown in FIG. 2, a plurality of liquid processing apparatuses, for example, a development processing apparatus 30 that develops the wafer W, an antireflection film (hereinafter referred to as “lower antireflection”) under the resist film of the wafer W. A lower antireflection film forming device 31 for forming a film), a resist coating device 32 for applying a resist solution to the wafer W to form a resist film, and an antireflection film (hereinafter referred to as “upper reflection” on the resist film of the wafer W). An upper antireflection film forming device 33 for forming an “antireflection film” is arranged in this order from the bottom.

  For example, three development processing devices 30, a lower antireflection film forming device 31, a resist coating device 32, and an upper antireflection film forming device 33 are arranged in a horizontal direction. The number and arrangement of the development processing device 30, the lower antireflection film forming device 31, the resist coating device 32, and the upper antireflection film forming device 33 can be arbitrarily selected.

  In the liquid processing apparatuses such as the development processing apparatus 30, the lower antireflection film forming apparatus 31, the resist coating apparatus 32, and the upper antireflection film forming apparatus 33, for example, spin coating for applying a predetermined processing liquid onto the wafer W is performed. In spin coating, for example, the processing liquid is discharged onto the wafer W from an application nozzle, and the wafer W is rotated to diffuse the processing liquid to the surface of the wafer W. The configuration of these liquid processing apparatuses will be described later.

  For example, in the second block G2, as shown in FIG. 3, a heat treatment apparatus 40 for performing heat treatment such as heating and cooling of the wafer W, an adhesion apparatus 41 for improving the fixability between the resist solution and the wafer W, and the wafer W A peripheral exposure device 42 for exposing the outer peripheral portion is provided side by side in the vertical direction and the horizontal direction. The number and arrangement of the heat treatment apparatus 40, the adhesion apparatus 41, and the peripheral exposure apparatus 42 can be arbitrarily selected.

  For example, in the third block G3, a plurality of delivery devices 50, 51, 52, 53, 54, 55, and 56 are provided in order from the bottom. The fourth block G4 is provided with a plurality of delivery devices 60, 61, 62 in order from the bottom.

  As shown in FIG. 1, a wafer transfer region D is formed in a region surrounded by the first block G1 to the fourth block G4. In the wafer transfer region D, for example, a plurality of wafer transfer devices 70 having transfer arms that are movable in the Y direction, the X direction, the θ direction, and the vertical direction are arranged. The wafer transfer device 70 moves in the wafer transfer area D and transfers the wafer W to a predetermined device in the surrounding first block G1, second block G2, third block G3, and fourth block G4. it can.

  Further, in the wafer transfer region D, a shuttle transfer device 80 that transfers the wafer W linearly between the third block G3 and the fourth block G4 is provided.

  The shuttle conveyance device 80 is linearly movable in the Y direction of FIG. 3, for example. The shuttle transfer device 80 moves in the Y direction while supporting the wafer W, and can transfer the wafer W between the transfer device 52 of the third block G3 and the transfer device 62 of the fourth block G4.

  As shown in FIG. 1, a wafer transfer apparatus 100 is provided next to the third block G3 on the positive side in the X direction. The wafer transfer apparatus 100 has a transfer arm that is movable in the X direction, the θ direction, and the vertical direction, for example. The wafer transfer device 100 can move up and down while supporting the wafer W, and can transfer the wafer W to each delivery device in the third block G3.

  The interface station 13 is provided with a wafer transfer device 110 and a delivery device 111. The wafer transfer device 110 has a transfer arm that is movable in the Y direction, the θ direction, and the vertical direction, for example. The wafer transfer device 110 can transfer the wafer W between each transfer device, the transfer device 111, and the exposure device 12 in the fourth block G4, for example, by supporting the wafer W on a transfer arm.

  Each liquid processing apparatus such as the development processing apparatus of the substrate processing system 1 configured as described above is connected to a processing liquid supply apparatus (not shown) that supplies each processing liquid. A filter described later is attached to these processing liquid supply devices. It is the filter start-up device M1 shown in FIG. 1 that cleans the filter before attaching it to the processing liquid supply device, that is, this filter is started up. In the present embodiment, the filter startup device M1 is configured as a separate body from the substrate processing system 1.

4 to 9 are piping system diagrams showing an outline of the configuration of the filter start-up device according to the first embodiment of the present invention.
The filter 200 in FIG. 4 removes particles from the processing liquid used in the photolithography process, and is used by being attached to a processing liquid supply apparatus that supplies the processing liquid to the substrate. In the following example, the processing solution is assumed to be a developing solution for developing the resist film exposed in the photolithography process.

The filter startup device M1 performs a process of cleaning the filter 200 before actually using it in the processing liquid supply device, that is, a startup process. The filter startup device M1 is a filter 200 to be started up. A circulation system 201 is provided in which a liquid for cleaning (which may hereinafter be abbreviated as a startup filter 200) circulates. The liquid for start-up processing is the same as the processing liquid in this example, that is, a developer.

  The filter startup device M1 includes pumps P1 and P2 that supply a startup processing liquid to the startup filter 200 via the circulation system 201. Each of the pumps P1 and P2 functions as a container for pumping up the liquid for the startup process to the startup filter 200 and temporarily storing the liquid. Each of the pumps P1 and P2 includes a storage chamber P11 having a variable volume, and a pressure chamber P12 that is adjacent to the storage chamber P11 and changes the volume of the storage chamber P11 by supplying and exhausting, for example, nitrogen gas. Yes.

  The start-up filter 200 is attached to the downstream side of the pumps P1 and P2 in the circulation path 201. In the following description, among the pipes constituting the circulation system path 201, the pipe upstream of the startup filter 200 is referred to as upstream pipe 201a, and the upstream pipe is referred to as downstream pipe 201b.

  The upstream pipe 201a of the circulation path 201 is branched and connected to the storage chamber P11 of each pump P1, P2. Switching valves 202 and 203 are provided on the upstream side of the branch portion of the upstream pipe 201a. By opening and closing the switching valves 202 and 203, the connection state between the upstream pipe 201a and the storage chamber P11 can be operated.

  A supply / exhaust pipe 300 is connected to the pressure chamber P12 of each pump P1, P2. An air supply pipe 301 that supplies, for example, nitrogen as a pressure gas to the pressure chamber P12 and an exhaust pipe 302 that exhausts the inside of the pressure chamber P12 are connected to the air supply / exhaust pipe 300, respectively.

  The supply / exhaust pipe 300 connected to the pressure chamber P12 of each pump P1, P2 is joined at, for example, the end opposite to the pressure chamber P12 side. A tube 302 is connected. An air ejector 303 is connected to the exhaust pipe 302. A drive air source 304 that drives the air ejector 303 is connected to the air ejector 303 via a drive air pipe 305.

  The drive air pipe 305 is provided with regulators 305a and 305b for adjusting the flow rate of the drive air flowing through the drive air pipe 305 in parallel. Switching valves 306a and 306b are provided on the downstream side of the regulators 305a and 305b. The regulators 305a and 305b are set to different flow rates, and the flow rate of driving air supplied to the air ejector 303 can be adjusted by opening and closing the switching valves 306a and 306b. Thereby, the vacuum pressure generated by the air ejector 303 can be adjusted. Further, a switching valve 307 is provided on the pump P1 side and a switching valve 308 is provided on the pump P2 side of the supply / exhaust pipe 300 where it joins the exhaust pipe 302, and the switching valves 307 and 308 are opened and closed. By doing so, it can be selected which pressure chamber P12 of the pump P1 or the pump P2 is exhausted.

  Two supply pipes 301 are connected between the switching valve 307 and the pump P1 and between the switching valves 308 and P2 in the supply / exhaust pipe 300, respectively. That is, in this embodiment, as shown in FIG. 4, a total of four supply pipes 301 are provided. The supply pipe 301 connected between the switching valve 307 and the pump P1 and the supply pipe 301 connected between the switching valve 308 and the pump P2 have an end opposite to the supply / exhaust pipe 300 side. The gas supply pipes 309 that supply pressurizing gas are connected to the respective supply pipes 301 that have joined together.

  Each gas supply pipe 309 is provided with regulators 310 and 311 for adjusting the flow rate of the pressurizing gas flowing through the gas supply pipe 309. Each regulator 310, 311 is set to a different flow rate. Each gas supply pipe 309 joins upstream of the regulators 310 and 311, and a gas supply source 312 that supplies a gas for pressurization to the gas supply pipe 309 is connected to the gas supply pipe 309 after joining. It is connected. In addition, switching valves 313, 314, 315, and 316 are provided on the supply / exhaust pipe 300 side of the connection between the supply pipe 301 and the gas supply pipe 309. Therefore, by operating each switching valve 313, 314, 315, 316, the flow rate of the pressurizing gas supplied to each air supply / exhaust pipe 300 via the air supply pipe 301 can be adjusted.

Similarly to the upstream side pipe 201a, the downstream side pipe 201b of the circulation system path 201 branches off and is connected to the storage chamber P11 of each pump P1, P2.
A switching valve 203 is provided on the pump P1 side and a switching valve 204 is provided on the pump P2 side of the downstream pipe 201b branching to the pumps P1 and P2. Therefore, for example, after the circulation switching valve 217 (described later) is opened, the switching valve 204 on the pump P1 side is closed, the switching valve 205 on the pump P2 side is opened, and the developer is supplied from the pump P1. When discharged, the developer can be circulated into the storage chamber P11 of the pump P2.

  A replenishment pipe 206 is connected to the upstream side of the branch part of the downstream pipe 201b of the circulation system 201 to each pump P1, P2. A developer supply source 207 is connected to the replenishment pipe 206. Therefore, the developer as the liquid for the start-up process can be supplied from the developer supply source 207 to the pumps P1 and P2 via the replenishment pipe 206 and the downstream pipe 201b. A replenishment valve 208 for controlling the supply of the developer from the developer supply source 207 is provided in the replenishment pipe 206.

  The filter startup device M1 is attached so that the purification filter 209 for purifying the liquid circulating in the circulation system path 201 passes through the pumps P1 and P2, the startup filter 200, and the purification filter 209 in this order. In other words, the purification filter 209 is attached to the downstream side of the start-up filter 200 in the downstream side pipe 201b. Specifically, the purification filter 209 is attached between the start-up filter 200 and the connection portion to the supplementary pipe 206 in the downstream pipe 201b.

  A flow rate measuring mechanism 210 is provided between the startup filter 200 and the purification filter 209 in the downstream pipe 201b. Therefore, the flow rate of the liquid passing through the rising filter 200 can be measured by the flow rate measuring mechanism 210.

A drainage pipe 211 for discharging the liquid in the circulation system 201 out of the system is connected between the purification filter 209 and the connection part of the replenishment pipe 206 in the downstream pipe 201b. The drainage pipe 211 is provided with a drainage valve 212. Further, a drainage switching valve 213 is provided between the connection part of the drainage pipe 211 and the connection part of the replenishment pipe 206 in the downstream pipe 201b. Therefore, the liquid in the circulation path 201 can be discharged out of the system by closing the drainage switching valve 213 and opening the drainage valve 212.
Note that a check valve 214 is provided between the purification filter 209 and the drain pipe 211 in the downstream pipe 201b to prevent the back-up liquid from flowing backward.

  In addition, a drainage pipe 215 that discharges the liquid that has passed through the purification filter 209 outside the system without circulating in the circulation system 201 is connected between the purification filter 209 and the check valve 214 in the downstream pipe 201b. Has been. A drain valve 216 is provided in the drain pipe 215. A circulation switching valve 217 is provided between the connection portion of the drain pipe 215 and the check valve 214 in the downstream pipe 201b. Therefore, before the liquid is circulated in the circulation system path 201, the drainage valve 216 is opened and the circulation switching valve 217 is closed. Can be discharged out of the system without being circulated. Therefore, the purification filter 209 can be cleaned before the circulating fluid is passed through the start-up filter 200.

  Further, between the flow rate measuring mechanism 210 and the purification filter 209 in the downstream pipe 201b, the liquid that has passed through the start-up filter 200 is discharged outside the circulation path 201 without passing through the purification filter 209. A tube 218 is connected. The drain pipe 218 is provided with a drain valve 219. Therefore, before the liquid is circulated in the circulation path 201, the liquid that has passed through the start-up filter 200 by closing the drain valve 216 and the circulation switching valve 217 and opening the drain valve 219, for example. Can be discharged out of the circulation system 201 without passing through the purification filter 209. Therefore, particularly dirty liquid that passes through the start-up filter 200 at the initial start-up time can be directly discharged out of the system, and the cleanliness of the purification filter 209 and the like can be maintained.

A vent pipe 220 is connected to a drain port (not shown) of the start-up filter 200. The vent pipe 220 is for discharging the gas accumulated in the rising filter 200 out of the system. The vent pipe 220 is provided with a vent valve 221.
Similarly, a vent pipe 222 is connected to a drain port (not shown) of the purification filter 209. The vent pipe 220 is for discharging the gas accumulated in the purification filter 209 to the outside of the system. The vent pipe 222 is provided with a vent valve 223.

  Further, the filter startup device M1 is provided with a control unit (not shown). As each valve provided in the filter startup device M1, an electromagnetic valve or an air operated valve that can be controlled by the control unit is used. With this configuration, a series of start-up processes in the filter start-up device M1 can be automatically performed under the control of the control unit.

  An example of the start-up process in the filter start-up device M1 having the main part as described above will be described in detail.

(Purification filter installation process)
First, all the valves such as the circulation switching valve 217 are closed, and then the purification filter 209 is attached to a predetermined portion of the circulation system 201. In FIG. 4 and the subsequent drawings, the valve in the open state is painted white, the valve in the closed state is painted black, and the pipe through which a fluid such as a developer flows is shown by a bold line, Description of the open / closed state of is omitted.

(Start-up filter installation process)
Next, the start-up filter 200 is attached to a predetermined location of the circulation system 201.

(Liquid storage process for circulation)
Then, as shown in FIG. 5, the switching valves 307 and 306a are opened, and the pressure chamber P12 is made negative by driving the air ejector 303 using the system of the regulator 305a, for example, and the volume of the storage chamber P11 is expanded. Let At this time, for example, by opening the replenishment valve 208 and the switching valve 204, the developer is supplied from the developer supply source 207 into the pump P1. As a result, the developer as the start-up processing liquid is stored in the storage chamber P11 of the pump P1.

(Circulation process)
Next, as shown in FIG. 6, the refill valve 208 and the switching valve 204 are closed, and the switching valves 202 and 205, the circulation switching valve 217, and the drainage switching valve 213 are opened. At the same time, the switching valve 307 is closed, the switching valve 313 is opened, the pressurization gas is supplied from the gas supply source 312 using the system of the regulator 310, the pressure chamber P12 of the pump P1 is pressurized, and the pump P1 The developer in the storage chamber P11 is pumped to the circulation path 201. The pumped developer flows in the order of the start-up filter 200 and the purification filter 209, and is transferred to the storage chamber P11 of the pump P2. At this time, the switching valve 308 may be opened to depressurize the pressure chamber of the pump P2.

  Thereafter, for example, before the developer in the storage chamber P11 of the pump P1 becomes almost empty, the switching valves 202 and 205 are closed and the switching valves 203 and 204 are opened as shown in FIG. At the same time, the switching valves 313 and 308 are closed, the switching valves 314 and 307 are opened, the pressure chamber P12 of the pump P2 is pressurized, the pressure chamber P12 of the pump P1 is depressurized, and the storage chamber P11 is supplied from the pump P2. The developer inside is pumped to the circulation system 201. The developer pumped from the pump P2 also flows in the order of the startup filter 200 and the purification filter 209, and is transferred to the storage chamber P11 of the pump P1.

By repeating these alternately, the developer can be circulated in the circulation system path 201 to which the start-up filter 200 and the purification filter 209 are attached. Then, the developer is circulated in the circulation system 201 until a predetermined condition is satisfied, and is passed through the start-up filter 200, whereby the start-up filter 200 can be cleaned, that is, the start-up filter 200 can be started up. .
The aforementioned predetermined condition is, for example, that the developer is circulated at a predetermined flow rate for a predetermined time. The flow rate can be adjusted using regulators 310 and 311.

  After completion of the circulating liquid passing process, the cleaned start-up filter 200 is removed after all the valves are closed, for example, and used in the processing liquid supply apparatus of the substrate processing system 1.

  As described above, in the filter start-up device M1, since the developer is circulated and passed through the start-up filter 200, the amount of the developer used for the start-up process can be greatly reduced. In addition, since the purification filter 209 is provided in the circulation system 201 downstream of the rising filter 200, if particles exist in the developer after flowing through the rising filter 200, the developing filter 209 causes the development to occur. Particles can be removed from the system. Therefore, it is possible to prevent the developer containing particles from circulating, and the cleanliness of the pumps P1 and P2 can be maintained.

  Next, processing that is preferably included in the startup processing in the filter startup device M1 will be described. In the following drawings, the illustration of the mechanism relating to the storage of the liquid into the pump and the delivery of the liquid from the pump, that is, the mechanism for adjusting the pressure in the pressurizing chamber of the pump (the reference number 300 series) is omitted as appropriate. To do.

(Purification filter cleaning process)
The purification filter 209 has a high cleanliness when it is attached to the filter startup device M1, for example, by being cleaned with another filter startup device before being attached to the filter startup device M1. However, the cleanliness of the purification filter 209 may decrease when it is transported from another filter startup device to the filter startup device M1. Accordingly, a purification filter cleaning step for cleaning the purification filter 209 may be performed before the above-described circulation liquid storage step.

In the purification filter cleaning step, the developer is stored in the storage chamber P11 of the pump P1, for example, in the same manner as in the above-described circulation liquid storage step after the purification filter attachment step and before the startup filter attachment step.
Then, as shown in FIG. 8, the replenishing valve 208 and the switching valve 204 are closed, the switching valve 202 and the drainage valve 216 are opened, and the developer is passed through the purification filter 209 from the pump P1. To do. As a result, the developer passed through the purification filter 209 is discharged outside the system via the drain pipe 215 without circulating through the circulation path 201.
The cleanliness of the purification filter 209 can be increased by passing a predetermined amount of developer.

  The circulation path 201 is in communication between the pumps P1 and P2 and the purification filter 209 without the start-up filter 200 being attached. Further, this purification filter cleaning step may be performed after the startup filter attaching step.

(Pretreatment process)
The developing solution that has passed through the rising filter 200 immediately after the start of liquid passage through the rising filter 200 may contain a large amount of particles. When such a developing solution is circulated in the circulation path 201, the cleanliness of the purification filter 209 and the like may be reduced. Therefore, a pretreatment step of passing the developer through the start-up filter 200 without circulating the developer may be performed before the above-described circulation liquid storage step.

In the pretreatment step, first, the developer is stored in the storage chamber P11 of the pump P1 in the same manner as the circulation liquid storage step before the above-described circulation liquid storage step.
Then, as shown in FIG. 9, the replenishing valve 208 and the switching valve 204 are closed, the switching valve 202 and the drainage valve 219 are opened, and the developer is raised from the pump P1 and passed through the filter 200. Liquid. As a result, the developer passed through the start-up filter 200 is discharged out of the system via the drainage pipe 218 without circulating through the circulation path 201 and without passing through the purification filter 209. Is done.
As described above, a predetermined amount of the developer is started up and passed through the filter 200 before the circulating liquid passing process, so that it is possible to prevent a decrease in the cleanliness of the purification filter 209 during the circulating liquid passing process.

(Circulating fluid replacement process)
The developer circulating in the circulation path 201 may be gradually deteriorated. Therefore, in the circulating liquid passing process, it is preferable to perform a circulating liquid replacing process in which the developer in the circulating path 201 is replaced at regular intervals.
In the circulating fluid replacement process, for example, if the state of each valve immediately before replacement is as shown in FIG. 6, the drainage switching valve 213 and switching valve 205 are closed and the drainage valve 212 is opened as shown in FIG. For example, the developer in the storage chamber P11 of the pump P1 is drained. After the completion of drainage from the pump P1, if the developer is also stored in the storage chamber P11 of the pump P2, the switching valve 202 is closed and the switching valve 203 is opened. The developer in the storage chamber P11 is also drained.

  After the drainage of the pumps P1 and P2, the developer in the circulation path 201 can be renewed by storing and circulating the developer in the storage chamber P11 of the pump P1 in the same manner as in the circulation liquid storage step. it can.

(Highly degassed liquid flow process)
The pumps P1 and P2 can be provided with a degassing nozzle (not shown) as a degassing mechanism for degassing the processing liquid, that is, the developer. In the circulation liquid storage process, the degassing is performed in the storage chamber P11 of the pumps P1 and P2. The developed developer can be stored.
The filter startup device M1 is a high degassed liquid supply mechanism that allows the developer degassed by the degassing nozzle to pass through the filter 200 after being circulated through the developer 200, which is the liquid for startup processing. And comprising. The specific configuration of the high degassed liquid supply mechanism is as follows.

  The pressure set in the regulator 305b is larger than the pressure set in the regulator 305a. For this reason, when the developer is stored in the pumps P1 and P2, the pressure chamber P12 of the pumps P1 and P2 is further reduced by using the regulator 305b rather than using the regulator 305a. Is drawn into the storage chamber P11 of the pumps P1, P2 at a faster flow rate. As a result, the pressure of the developer is further reduced, and more gas dissolved in the developer is degassed from the developer.

  This more deaerated developer is distinguished from the developer (usually deaerated) deaerated using the regulator 305a, and may be referred to as a highly deaerated liquid in this specification. Note that the degassing pressure of the normal degassed liquid is about −35 kPa, for example, and the degassing pressure of the high degassed liquid is about −80 kPa, for example.

  As described above, the filter start-up device M1 capable of producing a highly degassed liquid is supplied from the pump P1 via, for example, a drain pipe (not shown) provided in the pumps P1 and P2 after the completion of the circulating liquid passing process. , The developer in the P2 storage chamber P11 is discharged. Thereafter, as shown in FIG. 11, the switching valves 307 and 306b are opened, and the air ejector 303 is driven using the system of the regulator 305b to make the pressure chamber P12 have a negative pressure as compared with the case where the regulator 305a is used. The volume of the storage chamber P11 is expanded. At this time, the developer is supplied from the developer supply source 207 into the pump P1 by opening the refill valve 208 and the switching valve 204. Thereby, while a high deaeration liquid is produced | generated by a deaeration nozzle, a high deaeration liquid is stored in the storage chamber P11 of pump P1.

  9, the refill valve 208 is closed, the switching valve 202 and the drain valve 219 are opened, and the filter startup device M1 passes the highly degassed liquid in the pump P1 to the startup filter 200. Liquid.

By passing the highly degassed liquid through the rising filter 200 in this way, it is possible to remove microbubbles that could not be removed by the normal degassing liquid present in the rising filter 200.
Note that the highly degassed liquid that has passed through the start-up filter 200 is drained from, for example, the drain pipe 218 without being circulated through the circulation path 201.

FIG. 12 is a piping system diagram showing an outline of the configuration of the filter start-up device according to the second embodiment of the present invention.
12 includes a submerged particle counter 230 as a detection device that detects impurities contained in the liquid in the circulation system, in addition to the configuration of the filter starter M1 of FIG. A submerged particle counter (hereinafter abbreviated as a counter) 230 is provided downstream of the drain valve 219 in the drain pipe 218 and counts the number of particles in the developer introduced into the drain pipe 218.

As described above, in the circulation flow step of the filter starting device M1 in FIG. 4, it is determined whether or not to end the circulation flow step based on whether or not the developer is circulated for a predetermined time at a predetermined flow rate. Was.
On the other hand, in the circulation flow process of the filter startup device M2 in FIG. 10, the circulation switching valve 217 is closed and the drain valve 219 is opened and the startup filter 200 is passed through every certain period of time. The developer is passed through the drainage pipe 218, that is, the counter 230. And the control part of filter starting-up apparatus M2 determines whether a circulation liquid passing process is complete | finished based on the measurement result in the counter 230. FIG. Specifically, if the number of particles in the developer counted by the counter 230 is equal to or less than a predetermined number, the control unit of the filter startup device M2 automatically ends the circulation liquid passing process.

  When the circulation liquid passing process is terminated based on whether or not it has been circulated for a predetermined time at a predetermined flow rate, when the cleanliness is already high before the predetermined time elapses, or when the cleanness is not sufficient even after the predetermined time elapses is there. On the other hand, in the filter start-up device M2, the circulating liquid passing process is terminated based on the number of particles in the circulating developer, that is, the actual cleanliness, so that, for example, when the original cleanliness of the start-up filter 200 is high The startup filter 200 can be started in a shorter time, and when the original cleanliness of the startup filter 200 is low, for example, the startup filter 200 having a desired cleanliness can be obtained more reliably.

FIG. 13 is a diagram showing an outline of the configuration of a filter start-up device according to the third embodiment of the present invention.
13 is provided with a thinner supply source 240 in the refilling pipe 206 in place of the developer supply source 207 having the configuration of the filter startup device M1 in FIG.

Further, in the filter startup device M4, a developer supply pipe 241 is connected between the startup filter 200 and a branching portion of the upstream pipe 201a of the circulation system path 201 to the pumps P1 and P2. A developer supply source 207 that supplies a developer that is a processing solution is connected to the developer supply pipe 241.
Further, a pump P3 is provided between the connecting portion of the developer supply pipe 241 to the upstream pipe 201a and the developer supply source 207. The configuration of the pump P3 is the same as that of the pumps P1 and P2. A supply valve 242 is provided between the developer supply source 207 and the pump P3 in the developer supply pipe 241, and a switching valve 243 is provided between the connection to the circulation path 201 and the pump P3. .

In the filter startup device M4, the thinner supplied from the thinner supply source 240 is stored in, for example, the pump P1 in the circulation liquid storage step, and the thinner is circulated in the circulation liquid passing step and passed through the startup filter 200. Liquid. In the circulation liquid passing process, the supply valve 242 and the switching valve 243 are closed.
For example, the switching valve 202 and the circulation switching valve 217 are closed, the supply valve 242 is opened, and the developer is stored in the pump P3 after the circulation liquid passing process is completed and before the start-up filter 200 is removed. Then, as shown in FIG. 12, the supply valve 242 is closed, the switching valve 243 and the drain valve 219 are opened, and the developer is supplied from the pump P3 to the start-up filter 200. By supplying the developer for a predetermined time, the thinner, which is the liquid for the start-up process in the start-up filter 200, can be replaced with the developer. Alcohol may be used instead of thinner.

  As described above, in the circulation liquid passing step, thinner or alcohol is used as the start-up treatment liquid and the liquid is passed through the start-up filter 200, whereby the time required for the step can be shortened. This is because thinner or alcohol is easier to remove foreign substances from the start-up filter 200 than the developer. Further, the filter performance of the start-up filter 200 can be enhanced by passing thinner or alcohol before the developer is passed through the start-up filter 200.

FIG.14 and FIG.15 is a piping system diagram which shows the outline of a structure of the filter starting-up apparatus which concerns on the 4th Embodiment of this invention.
The filter start-up device M4 in FIG. 14 has another refilling pipe between the connection portion of the refilling pipe 206 and the drainage switching valve 213 in the downstream pipe 201b of the circulation system 201 of the filter start-up device M1 in FIG. 250 is connected.
A thinner supply source 240 for supplying thinner is connected to the supplementary pipe 250. A replenishing valve 251 is provided between the connecting part of the replenishing pipe 250 to the downstream pipe 201 b and the thinner supply source 240.

The filter startup device M4 includes a bypass pipe 252 that supplies the developer to the startup filter 200 from the developer supply source 207 without passing through the pumps P1 and P2. One end of the bypass pipe 252 is connected between the replenishment pipe 206 connected to the circulation path 201 and the refill valve 208, and the other end is connected to each pump P1, P2 in the upstream pipe 201a of the circulation path 201. It is connected between the branch part and the start-up filter 200.
The bypass pipe 252 is provided with a pump P4. The configuration of the pump P4 is the same as that of the pumps P1 and P2. In the bypass pipe 252, a supply valve 253 is provided on the replenishment pipe 206 side from the pump P4, and a switching valve 254 is provided on the upstream pipe 201a side of the circulation path from the pump P4.

  In this filter startup device M4, in the circulating liquid storage step, as shown in FIG. 14, the replenishing valves 208 and 251 and the switching valve 204 are opened to develop the developer from the developer supply source 207 into the pump P1. While supplying the liquid, the thinner is supplied from the thinner supply source 240 into the pump P1. Thereby, the mixed solution of the developer and the thinner is stored in the storage chamber P11 of the pump P1.

  Then, in the circulating liquid passing step, the replenishing valves 208 and 251 are closed, the other valves are in the same state as in FIG. 6, and then in the state of FIG. The mixed solution is circulated and passed through the startup filter 200.

  As shown in FIG. 15, after the circulation liquid passing step is completed and before the start-up filter 200 is removed, the switching valves 202 and 203, the circulation switching valve 217, and the drainage switching valve 213 are closed, the replenishing valve 208, the supply The valve 253 is opened and the developer is stored in the pump P4. Thereafter, the replenishing valve 208 and the supply valve 253 are closed, the switching valve 254 and the drain valve 219 are opened, and the developer is supplied from the pump P4 to the start-up filter 200. By supplying the developing solution for a predetermined time, the above-mentioned mixed solution, which is a start-up processing liquid in the start-up filter 200, can be replaced with the developing solution. In this embodiment, alcohol may be used instead of thinner.

  With the above-described configuration, the filter startup device M4 can reduce the time required for the startup filter liquid passing process as in the filter startup device according to the third embodiment. Filter capability can be increased. Further, in the filter start-up device M5, the time required for the replacement can be shortened when replacing with the developer after the start-up filter liquid passing processing.

FIG. 16 is a piping system diagram showing an outline of a configuration of a filter start-up device according to the fifth embodiment of the present invention.
The filter startup device M5 in FIG. 16 can attach a plurality of startup filters 200a to 200c in parallel to the circulation system 201, and can start up the plurality of startup filters 200a to 200c simultaneously. . The startup filters 200a to 200c are the same as the startup filter 200 shown in FIG.

  One end of the branch pipe 260 is connected between the branching section to the pumps P1 and P2 in the upstream pipe 201a of the circulation system 201 and the startup filter 200a, and the filter startup apparatus M5 is installed in the downstream pipe 201b. The other end of the branch pipe 260 is connected between the raising filter 200a and the flow rate measuring mechanism 210. Another rising filter 200b can be attached to the branch pipe 260. Another branch pipe 261 is connected to the branch pipe 260 so as to connect the upstream part and the downstream part of the other rising filter 200b in the branch pipe 260. A separate rising filter 200c can be attached to the branch pipe 261.

In the filter startup device M5, a plurality of startup filters 200a to 200c are attached in the startup filter attachment process.
And in a circulation liquid flow process, these can be simultaneously started by flowing a circulation liquid simultaneously to several filter 200a-200c. Therefore, the time required to start up a large number of filters can be shortened while suppressing the chemical solution required for startup.

  In the above example, the substrate processing system 1 and the filter startup device are configured as separate devices. However, as described below, the filter startup device is a processing liquid supply device of the substrate processing system 1. It can be incorporated into a liquid supply device.

FIG. 16 is a piping system diagram showing an outline of the configuration of the developer supply apparatus according to the sixth embodiment of the present invention.
The developer supply device M6 shown in the figure is an example of a processing solution supply device, and includes a circulation system path 201, similar to the filter startup device M1 shown in FIG. In the developer supply apparatus M6, the circulation path 201 is composed of a developer supply pipe 270 described later and a circulation pipe 271 connected to the developer supply pipe 270. The circulation pipe 271 is shown in gray in the figure.

The developer supply pipe 270 is for supplying a developer as a processing solution to the substrate via the developer supply nozzle N.
The developer supply pipe 270 is branched and connected to the storage chamber P11 of each pump P1, P2. A filter 200 for removing particles in the developing solution flowing through the developing solution supply pipe 270 is provided between the branching portions of the developing solution supply pipe 270 to the pumps P1 and P2 and the developing solution supply nozzle N. . Further, a flow rate measuring mechanism 210 is provided between the filter 200 and the developer supply nozzle N in the developer supply pipe 270.

  The circulation pipe 271 is for circulating the developer in the developer supply device M6. One end of the circulation pipe 271 is connected between the flow rate measuring mechanism 210 and the developer supply nozzle N in the developer supply pipe 270, and the other end is branched in the same manner as the upstream pipe 201a. It is connected to the storage chamber P11 of P1 and P2. A purification filter 209 for removing particles in the developer flowing through the circulation pipe 271 is provided between the connection part to the developer supply pipe 270 in the circulation pipe 271 and the branch part to each of the pumps P1 and P2. .

  The developer supply device M6 switches the developer supply pipe 270 in order to switch between the supply of the developer via the developer supply pipe 270 and the developer supply nozzle N and the circulation of the developer in the circulation path 201. A switching valve 272 is provided between the connection portion of the circulation pipe 271 and the developer supply nozzle N. By switching the open / close state of the switching valve 272 and the circulation switching valve 217, the circulation of the developing solution and the supply (discharge) of the developing solution to the substrate can be switched.

Next, a method for starting up the filter 200 in the developing solution supply apparatus M6 will be described. The developer supply device M6 has a control unit similar to the control unit of the filter starting device M1.
First, all the valves such as the circulation switching valve 217 are closed, and then the purification filter 209 is attached to a predetermined location of the circulation pipe 271. Next, the filter 200 is attached to a predetermined portion of the developer supply pipe 270. As a result, the purification filter 209 and the filter 200 are attached to the circulation system path 201.

  When the filter start-up mode is selected via the operation panel or the like, the control unit of the developer supply device M6 opens the replenishment valve 208 or the like as in FIG. The developer is supplied from 207 into the pump P1. As a result, the startup processing developer is stored in the storage chamber P11 of the pump P1.

  Next, as in FIG. 6, the controller of the developer supply device M6 closes the replenishing valve 208 and the switching valve 204, and opens the switching valves 202 and 205, the circulation switching valve 217, and the drainage switching valve 213. As a state, the developer is pumped from the pump P1 to the developer supply pipe 270. The developer fed under pressure is passed through the rising filter 200 in the developer supply pipe 270 and the purification filter 209 in the circulation pipe 271 in this order, and is transferred to the storage chamber P11 of the pump P2.

  Thereafter, for example, before the developer in the storage chamber P11 of the pump P1 becomes almost empty, as shown in FIG. 7, the switching valves 202 and 205 are closed, the switching valves 203 and 204 are opened, and the pump P2 The developer in the storage chamber P11 is pumped to the developer supply pipe 270. The developer sent from the pump P2 is also passed through the rising filter 200 in the developer supply pipe 270 and the purification filter 209 in the circulation pipe 271 in this order, and is transferred to the storage chamber P11 of the pump P2.

  By repeating these alternately, the developer can be circulated in the circulation system path 201 to which the start-up filter 200 and the purification filter 209 are attached. Then, the developer is circulated in the circulation system 201 until a predetermined condition is satisfied, and is passed through the start-up filter 200, whereby the start-up filter 200 can be cleaned, that is, the start-up filter 200 can be started up. .

  The controller of the developer supply apparatus M6 circulates the developer in the circulation path 201 to which the filter 200 and the purification filter 209 are attached by alternately repeating the above-described flow, and starts up until a predetermined condition is satisfied. Liquid is passed through the filter 200. If the predetermined condition is satisfied, the control unit shifts from the filter startup mode to the normal mode in which the developer is discharged by closing the circulation switching valve 217 and opening the switching valve 272.

As described above, the developer supply apparatus M6 can clean the filter 200 before using it in the normal mode, that is, start up the filter 200.
As described above, since the developing solution supply apparatus M6 circulates the developing solution and passes it through the filter 200 when the filter 200 is started up, the filter 200 can be started up with a small amount of developing solution. Further, since the purification filter 209 is provided upstream of the inlets of the pumps P1 and P2 in the circulation pipe 271, the developer supply device M6 circulates the developer when the start-up filter 200 is started up. In this case, since the particles can be removed from the developer flowing into the pumps P1 and P2, the cleanliness of the pumps P1 and P2 can be maintained.

  In the developer supply device M6, when the start-up process of the filter 200 is performed, the developer used for the start-up is drained through the drain pipe 211 or the like, and a new developer is supplied to the substrate. Is preferably replenished.

  In the developer supply device M6, when the supply of the developer (discharge from the developer supply nozzle N) is started after the start-up of the filter 200 is completed, the developer is supplied during the period between the discharge and the next discharge. Is preferably circulated in the circulation system 201. This is because the film of the filter 200 can be prevented from eluting from the staying developer.

  Note that the developer supply device M6 does not circulate the nozzle N without circulating the developer passing through the purification filter 209 in the circulation path 201 for the same process as the purification filter cleaning process in the filter startup device M1. A drainage pipe 273 is provided for discharging to the outside through the system. One end of the drainage pipe 273 is connected between the purification filter 209 and the circulation switching valve 217 in the circulation pipe 271, and the other end is connected to the connection part of the circulation pipe 271 and the switching valve 272 in the developer supply pipe 270. Connected between. A drain valve may be provided in the drain pipe 273.

  The configurations of the first to fifth embodiments described above can also be incorporated in the developer supply apparatus.

  Another embodiment of the present invention is a jig unit that is detachably attached to a developer supply device, and has a pipe to which the above-described purification filter 209 is attached, and the pipe unit includes the developer unit. A part of the circulation pipe 271 is configured when attached to the supply device. This jig unit corresponds to a portion U surrounded by a dotted line in FIG. As shown in the figure, this jig unit preferably also includes a drain pipe 218 that discharges the developer passing through the filter 200 out of the circulation system 201 without passing through the purification filter 209. Further, the pipe of the jig unit is configured to be attached to and removed from the pipe in the developer supply apparatus.

  In the above embodiment, the case where the processing liquid is a developer has been described as an example, but what kind of liquid is used as the processing liquid is not limited to the contents of the present embodiment, For example, a resist solution may be used, and the present invention can also be applied to a resist solution supply apparatus or the like.

  The preferred embodiments of the present invention have been described above with reference to the accompanying drawings, but the present invention is not limited to such examples. It is obvious for those skilled in the art that various modifications or modifications can be conceived within the scope of the idea described in the claims, and these naturally belong to the technical scope of the present invention. It is understood.

  The present invention is useful for a technique for applying a treatment liquid onto a substrate.

P1, P2 ... Pump P11 ... Reservoir chamber P12 ... Pressure chambers M1-M5 ... Filter startup device 1 ... Substrate processing system 200 (200a-200c) ... Startup filter 201 ... Circulation system 201a ... Upstream piping 201b ... Downstream side Pipe 207 ... Developer supply source 209 ... Purification filter 210 ... Flow rate measuring mechanism 230 ... Liquid particle counter 240 ... Thinner supply source 270 ... Developer supply pipe 271 ... Circulation pipe

Claims (20)

A circulation system path through which a liquid for cleaning a filter excluding foreign matters in the substrate processing liquid circulates, and a pump for supplying the liquid to the circulation system path,
In the circulation path, the filter and a purification filter for purifying the liquid are attached so that the liquid passes through the pump, the filter, and the purification filter in this order.
The circulation path is in a state in which the filter and the purification filter are attached during a start-up process for cleaning the filter prior to use in a system outside the circulation path until a predetermined condition is satisfied. A filter start-up device configured to circulate the liquid and pass the liquid through the filter.   The filter startup device according to claim 1, wherein the liquid is the processing liquid.   The apparatus for raising a filter according to claim 1, wherein the liquid is different from the processing liquid.   The filter raising apparatus according to claim 3, wherein the liquid is a mixed liquid of the processing liquid and another solution. A degassing mechanism for degassing the treatment liquid or the liquid;
A high degassing liquid supply mechanism for passing the treatment liquid or the liquid degassed by the degassing mechanism after the liquid circulation than the time of the circulation through the filter. Item 5. The filter start-up device according to any one of Items 1 to 4. A detection device for detecting impurities contained in the liquid in the circulation path;
A control unit that determines whether or not the predetermined condition is satisfied based on a detection result of the detection device, and that automatically circulates the liquid based on the determination result. The filter start-up device according to any one of claims 1 to 5.   2. A drainage pipe for passing the liquid through the purification filter before circulating the liquid and discharging the liquid without circulating the liquid in the circulation system. The filter starting-up apparatus of any one of -6.   Before the liquid is circulated, the liquid is passed through the filter, and the drained solution is discharged without passing through the purification filter and without being circulated in the circulation system. The filter start-up device according to claim 1, wherein   9. The circulation system according to claim 1, wherein a plurality of the filters are attached in parallel, and the liquid can be passed through the plurality of filters at the same time. The filter start-up device according to the item. A treatment liquid supply pipe connected to a nozzle for supplying a treatment liquid to the substrate, the treatment liquid supply pipe having a pump for supplying the treatment liquid to the nozzle, and the pump in the treatment liquid supply pipe and the pump A processing liquid supply apparatus to which a filter that removes foreign matters in the processing liquid is attached between a nozzle and a nozzle,
A circulation pipe to which a purification filter for purifying the processing liquid passed through the filter is attached;
The circulation pipe is connected to the processing liquid supply pipe so as to form a circulation system path through which the processing liquid passes and circulates in the order of the pump, the filter, and the purification filter.
The circulation path circulates the treatment liquid until a predetermined condition is satisfied and allows the treatment liquid to pass through the filter in a state in which the filter and the purification filter are attached in the start-up process for cleaning the filter. A treatment liquid supply apparatus configured as described above. A detection device for detecting impurities contained in the treatment liquid circulating in the circulation system path;
A control unit that determines whether or not the predetermined condition is satisfied based on a detection result of the detection device, and that automatically ends the start-up process based on the determination result. The processing liquid supply apparatus according to claim 10.   Before the treatment liquid is circulated, the treatment liquid is passed through the purification filter, and the drainage pipe for discharging the treatment liquid without circulation in the circulation system path is provided. The processing liquid supply apparatus according to claim 10 or 11.   Other waste liquid that passes the treatment liquid through the filter before circulating the treatment liquid and discharges the treated liquid without passing through the purification filter and without being circulated in the circulation path. The processing liquid supply device according to claim 10, further comprising a tube. A jig unit detachably attached to the processing liquid supply apparatus according to any one of claims 10 to 13,
Having a pipe provided with the purification filter;
The pipe unit forms the circulation system path when the jig unit is attached to the processing liquid supply apparatus.   A drainage pipe for passing the processing liquid through the filter before circulating the processing liquid and discharging the processed processing liquid without passing through the purification filter and without circulating in the circulation system path; The jig unit according to claim 14, comprising: a jig unit. A treatment liquid supply pipe connected to a nozzle for supplying a treatment liquid to the substrate, the treatment liquid supply pipe having a pump for supplying the treatment liquid to the nozzle, and the pump in the treatment liquid supply pipe and the pump A method for starting up a filter in a processing liquid supply apparatus in which a filter that removes foreign matters in the processing liquid is attached between the nozzle and a nozzle,
The processing liquid supply device includes a pipe to which a purification filter for purifying the processing liquid passed through the filter is attached, and the processing liquid passes through the pipe in the order of the pump, the filter, and the purification filter. And connected to the treatment liquid supply pipe so as to form a circulating circulation path,
The method for starting up the filter is as follows:
Attaching the purification filter to the pipe forming the circulation path;
Attaching the filter to the treatment liquid supply pipe forming the circulation path;
Supplying the treatment liquid to the circulation path, circulating the treatment liquid in the circulation path until a predetermined condition is satisfied, and passing the solution through the filter. Startup method. The step of passing through the filter includes:
Detecting impurities contained in the treatment liquid circulating in the circulation path;
Determining whether or not the predetermined condition is satisfied based on a detection result in the detecting step, and automatically ending the step of passing through the filter based on the determination result. The method for starting up a filter according to claim 16, wherein the filter is activated.   Before the step of passing through the filter, the step of passing the processing solution through the purification filter and discharging the passed processing solution without circulating it in the circulation system path is included. 18. A method for starting up a filter according to claim 16 or 17.   Before the step of passing through the filter, the step of passing the processing solution through the filter and discharging the passed processing solution without passing through the purification filter and without circulating in the circulation system path The method for starting up a filter according to any one of claims 16 to 18, characterized by comprising: The step of attaching the purification filter is a step of attaching the purification filter to the pipe using a jig unit,
The jig unit is provided with the purification filter, and when the jig unit is attached to the processing liquid supply device, before the processing liquid is circulated, a pipe that forms the circulation path A drainage pipe for passing the processing liquid through the filter and discharging the processed processing liquid without passing through the purification filter and without being circulated in the circulation system. The method for starting up the filter according to claim 16.