JP2016025134A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2016025134A5 JP2016025134A5 JP2014146582A JP2014146582A JP2016025134A5 JP 2016025134 A5 JP2016025134 A5 JP 2016025134A5 JP 2014146582 A JP2014146582 A JP 2014146582A JP 2014146582 A JP2014146582 A JP 2014146582A JP 2016025134 A5 JP2016025134 A5 JP 2016025134A5
- Authority
- JP
- Japan
- Prior art keywords
- resist
- unit
- liquid
- resist stripping
- stripping solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000007788 liquid Substances 0.000 claims description 29
- 238000010438 heat treatment Methods 0.000 claims description 14
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 9
- 238000000746 purification Methods 0.000 claims description 4
- 238000003756 stirring Methods 0.000 claims 2
- QOSATHPSBFQAML-UHFFFAOYSA-N hydrogen peroxide;hydrate Chemical compound O.OO QOSATHPSBFQAML-UHFFFAOYSA-N 0.000 claims 1
- 230000002093 peripheral effect Effects 0.000 claims 1
- 239000000243 solution Substances 0.000 description 17
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000011403 purification operation Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014146582A JP6426388B2 (ja) | 2014-07-17 | 2014-07-17 | レジスト剥離液浄化装置及び基板処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014146582A JP6426388B2 (ja) | 2014-07-17 | 2014-07-17 | レジスト剥離液浄化装置及び基板処理装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2016025134A JP2016025134A (ja) | 2016-02-08 |
| JP2016025134A5 true JP2016025134A5 (https=) | 2017-08-31 |
| JP6426388B2 JP6426388B2 (ja) | 2018-11-21 |
Family
ID=55271688
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014146582A Active JP6426388B2 (ja) | 2014-07-17 | 2014-07-17 | レジスト剥離液浄化装置及び基板処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP6426388B2 (https=) |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5145010Y2 (https=) * | 1973-05-26 | 1976-11-01 | ||
| JPH11174692A (ja) * | 1997-08-27 | 1999-07-02 | Motorola Inc | 半導体基板上のフォトレジストを除去する装置および方法 |
| JP4753596B2 (ja) * | 2004-05-19 | 2011-08-24 | 大日本スクリーン製造株式会社 | 基板処理装置 |
| JP2007103565A (ja) * | 2005-10-03 | 2007-04-19 | Dainippon Screen Mfg Co Ltd | 剥離液回収再利用システムおよび剥離液回収再利用方法 |
-
2014
- 2014-07-17 JP JP2014146582A patent/JP6426388B2/ja active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP6970791B2 (ja) | 基板処理装置及び基板処理方法 | |
| JP6302708B2 (ja) | ウェットエッチング装置 | |
| RU2016142584A (ru) | Узел выработки аэрозоля | |
| JP6022431B2 (ja) | 基板液処理装置及び基板液処理方法 | |
| JP2014500016A5 (https=) | ||
| JP2012044204A5 (ja) | メンテナンス方法、露光装置、及びデバイス製造方法 | |
| JP2022507400A5 (https=) | ||
| JP2015092538A5 (https=) | ||
| JP2014209581A5 (https=) | ||
| KR20160014535A (ko) | 기판 처리 장치 및 기판 처리 방법 | |
| JP2016072613A5 (https=) | ||
| JP2016032030A (ja) | 基板処理装置および基板処理方法 | |
| JP2016512163A5 (https=) | ||
| JP2016185542A5 (https=) | ||
| JP2010212293A5 (https=) | ||
| JP2015192148A5 (https=) | ||
| CN107847987A (zh) | 用于清洁饮料灌装设施的要清洁的设施部件的设备 | |
| JP6371716B2 (ja) | 基板液処理装置及び基板液処理方法並びに基板液処理プログラムを記録したコンピュータ読み取り可能な記録媒体 | |
| JP2016025134A5 (https=) | ||
| JP6304674B2 (ja) | 乾燥装置および乾燥方法 | |
| JP6529625B2 (ja) | ウェットエッチング装置 | |
| JP5393873B2 (ja) | スケール析出方法及び給湯器及びスケール析出装置 | |
| JP6426388B2 (ja) | レジスト剥離液浄化装置及び基板処理装置 | |
| CN103418569B (zh) | 一种除油池 | |
| WO2016024478A1 (ja) | 冷却装置 |