JP6426388B2 - レジスト剥離液浄化装置及び基板処理装置 - Google Patents

レジスト剥離液浄化装置及び基板処理装置 Download PDF

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JP6426388B2
JP6426388B2 JP2014146582A JP2014146582A JP6426388B2 JP 6426388 B2 JP6426388 B2 JP 6426388B2 JP 2014146582 A JP2014146582 A JP 2014146582A JP 2014146582 A JP2014146582 A JP 2014146582A JP 6426388 B2 JP6426388 B2 JP 6426388B2
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resist
stripping solution
resist stripping
liquid storage
unit
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JP2016025134A5 (https=
JP2016025134A (ja
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松下　淳
淳 松下
裕次 長嶋
裕次 長嶋
林　航之介
航之介 林
邦浩 宮崎
邦浩 宮崎
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Shibaura Mechatronics Corp
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Shibaura Mechatronics Corp
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JP2014146582A 2014-07-17 2014-07-17 レジスト剥離液浄化装置及び基板処理装置 Active JP6426388B2 (ja)

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JP2014146582A JP6426388B2 (ja) 2014-07-17 2014-07-17 レジスト剥離液浄化装置及び基板処理装置

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JP2014146582A JP6426388B2 (ja) 2014-07-17 2014-07-17 レジスト剥離液浄化装置及び基板処理装置

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JP2016025134A JP2016025134A (ja) 2016-02-08
JP2016025134A5 JP2016025134A5 (https=) 2017-08-31
JP6426388B2 true JP6426388B2 (ja) 2018-11-21

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Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5145010Y2 (https=) * 1973-05-26 1976-11-01
JPH11174692A (ja) * 1997-08-27 1999-07-02 Motorola Inc 半導体基板上のフォトレジストを除去する装置および方法
JP4753596B2 (ja) * 2004-05-19 2011-08-24 大日本スクリーン製造株式会社 基板処理装置
JP2007103565A (ja) * 2005-10-03 2007-04-19 Dainippon Screen Mfg Co Ltd 剥離液回収再利用システムおよび剥離液回収再利用方法

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