JP2015537239A5 - - Google Patents

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Publication number
JP2015537239A5
JP2015537239A5 JP2015537177A JP2015537177A JP2015537239A5 JP 2015537239 A5 JP2015537239 A5 JP 2015537239A5 JP 2015537177 A JP2015537177 A JP 2015537177A JP 2015537177 A JP2015537177 A JP 2015537177A JP 2015537239 A5 JP2015537239 A5 JP 2015537239A5
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JP
Japan
Prior art keywords
actuator
holder
plane
force
coupled
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JP2015537177A
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English (en)
Japanese (ja)
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JP2015537239A (ja
JP6198837B2 (ja
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Priority claimed from PCT/EP2013/069547 external-priority patent/WO2014063871A1/en
Publication of JP2015537239A publication Critical patent/JP2015537239A/ja
Publication of JP2015537239A5 publication Critical patent/JP2015537239A5/ja
Application granted granted Critical
Publication of JP6198837B2 publication Critical patent/JP6198837B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2015537177A 2012-10-23 2013-09-20 パターニングデバイス操作システム及びリソグラフィ装置 Expired - Fee Related JP6198837B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201261717208P 2012-10-23 2012-10-23
US61/717,208 2012-10-23
PCT/EP2013/069547 WO2014063871A1 (en) 2012-10-23 2013-09-20 Patterning device manipulating system and lithographic apparatuses

Publications (3)

Publication Number Publication Date
JP2015537239A JP2015537239A (ja) 2015-12-24
JP2015537239A5 true JP2015537239A5 (cg-RX-API-DMAC7.html) 2016-06-16
JP6198837B2 JP6198837B2 (ja) 2017-09-20

Family

ID=49237199

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015537177A Expired - Fee Related JP6198837B2 (ja) 2012-10-23 2013-09-20 パターニングデバイス操作システム及びリソグラフィ装置

Country Status (4)

Country Link
US (1) US9910368B2 (cg-RX-API-DMAC7.html)
JP (1) JP6198837B2 (cg-RX-API-DMAC7.html)
KR (1) KR101670314B1 (cg-RX-API-DMAC7.html)
WO (1) WO2014063871A1 (cg-RX-API-DMAC7.html)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160099737A (ko) 2012-08-29 2016-08-22 에이에스엠엘 홀딩 엔.브이. 실시간 레티클 만곡 감지
US10289007B2 (en) * 2014-07-10 2019-05-14 Nikon Corporation Lithography tool having a reticle stage capable of dynamic reticle bending to compensate for distortion
JP6656267B2 (ja) 2015-06-22 2020-03-04 エーエスエムエル ネザーランズ ビー．ブイ． 基板サポート、基板の上面の非平坦性を補償する方法、リソグラフィ装置及びデバイス製造方法
KR102653016B1 (ko) * 2018-09-18 2024-03-29 삼성전자주식회사 척 구동 장치 및 기판 처리 장치
JP7271978B2 (ja) * 2019-02-05 2023-05-12 株式会社ニューフレアテクノロジー ステージ装置及び荷電粒子ビーム処理装置
WO2024213378A1 (en) * 2023-04-10 2024-10-17 Asml Netherlands B.V. Systems and methods for clamping a patterning device in a lithography apparatus

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3271760B2 (ja) * 1999-03-31 2002-04-08 株式会社ニコン 走査露光方法、走査型露光装置、及び前記方法を用いるデバイス製造方法
JP3626888B2 (ja) 1999-10-08 2005-03-09 日立ハイテク電子エンジニアリング株式会社 基板露光装置におけるマスク撓み補正機構及びマスク撓み補正方法並びにパターン形成方法
US7675607B2 (en) 2006-07-14 2010-03-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7675201B2 (en) 2006-07-25 2010-03-09 Asml Netherlands B.V. Lithographic apparatus with planar motor driven support
NL1036511A1 (nl) 2008-02-13 2009-08-14 Asml Netherlands Bv Movable support, position control system, lithographic apparatus and method of controlling a position of an exchangeable object.
US8553207B2 (en) * 2008-12-31 2013-10-08 Asml Holdings N.V. Optically compensated unidirectional reticle bender
NL2006190A (en) 2010-03-11 2011-09-13 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
KR20150013570A (ko) 2012-04-27 2015-02-05 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치

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