JP2015531691A - マイクロキャリアの製造方法 - Google Patents
マイクロキャリアの製造方法 Download PDFInfo
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- 238000004519 manufacturing process Methods 0.000 title abstract description 21
- 238000005530 etching Methods 0.000 claims abstract description 31
- 229920000642 polymer Polymers 0.000 claims abstract description 18
- 238000000151 deposition Methods 0.000 claims abstract description 14
- 239000010410 layer Substances 0.000 claims description 148
- 238000000034 method Methods 0.000 claims description 39
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 26
- 230000003287 optical effect Effects 0.000 claims description 15
- 235000012239 silicon dioxide Nutrition 0.000 claims description 14
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- 238000004458 analytical method Methods 0.000 description 20
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
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- TWFZGCMQGLPBSX-UHFFFAOYSA-N carbendazim Chemical compound C1=CC=C2NC(NC(=O)OC)=NC2=C1 TWFZGCMQGLPBSX-UHFFFAOYSA-N 0.000 description 1
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- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 1
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Abstract
Description
(a)底部層、上部層、及び、上記底部層と上部層との間に位置する絶縁層を含むサンドイッチ構造を有するウエハーを提供する段階、
(b)上部層をエッチング除去して、マイクロキャリアのボディの外側壁を画定する段階、
(c)少なくともボディの上面上に第1の活性層を堆積する段階、
(d)第1の活性層上に連続的なポリマー層を適用する段階、
(e)底部層及び絶縁層をエッチング除去する段階、
(f)ポリマー層を除去して、マイクロキャリアを解放する段階。
Claims (12)
- (a)底部層(7)、上部層(8)、及び、前記底部層(7)と上部層(8)との間に位置する絶縁層(9)を含むサンドイッチ構造を有するウエハー(6)を提供する段階、
(b)上部層(8)をエッチング除去して、マイクロキャリア(19、20)のボディ(11)の外側壁(12)を画定する段階、
(c)ボディ(11)の少なくとも上面(14)上に第1の活性層(13)を堆積する段階、
(d)第1の活性層(13)上に連続的なポリマー層(16、22)を適用する段階、
(e)底部層(7)及び絶縁層(9)をエッチング除去する段階、
(f)ポリマー層(16、22)を除去して、マイクロキャリア(19、20)を解放する段階、
を含むマイクロキャリア(19、20)の製造方法。 - 段階(e)が、底部層(7)を選択的にエッチングするための第1のエッチングによって、例えばエッチング浴を用いることによって、且つ、絶縁層(9)を選択的にエッチングするための第2のエッチングによって、例えばドライエッチングによって為される、請求項1に記載の方法。
- ポリマー層(16)が、ドライエッチングによって除去される、請求項1又は2に記載の方法。
- 独特のマーク、例えば符号(2、3)が、例えば段階(b)と(c)との間で、マイクロキャリア(19、20)上に刻まれる、請求項1から3の何れか一項に記載の方法。
- 底部層(7)及び/又は上部層(8)が単結晶シリコンを含む、請求項1から4の何れか一項に記載の方法。
- 絶縁層(9)が二酸化ケイ素を含む、請求項1から5の何れか一項に記載の方法。
- ポリマー層(16)がパリレンを含む、請求項1から6の何れか一項に記載の方法。
- ポリマー層は、サポート(21)、例えばシリコン、石英又はガラスで作製されたウエハーを、ウエハー(6)へ結合させる接着剤層(22)である、請求項1、2及び4から6の何れか一項に記載の方法。
- 第2の活性層(17)が、例えば段階(e)と(f)との間で、マイクロキャリア(19)のボディ(11)の少なくとも底面(18)上に堆積される、請求項1から8の何れか一項に記載の方法。
- 第1の活性層(13)及び/又は第2の活性層(17)が、光学特性若しくは磁気特性を有する材料、多結晶シリコン及び/又はポリテトラフルオロエチレン、又は、高屈折率を有する金属層を含む、請求項1から9の何れか一項に記載の方法。
- 第1の活性層(13)及び/又は第2の活性層(17)が、酸化物、又は窒化物、例えば二酸化ケイ素、又は金属層を含む、請求項1から10の何れか一項に記載の方法。
- 第1の活性層(13)によって覆われた上面(14)、及び、第2の活性層(17)によって覆われた底面(18)を有するボディ(11)を含む、請求項9に記載の方法によって得られたマイクロキャリア(19)。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP12177718.9A EP2690059A1 (en) | 2012-07-24 | 2012-07-24 | Method for producing microcarriers |
EP12177718.9 | 2012-07-24 | ||
PCT/EP2013/065442 WO2014016262A1 (en) | 2012-07-24 | 2013-07-22 | Method for producing microcarriers |
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US (1) | US9349545B2 (ja) |
EP (2) | EP2690059A1 (ja) |
JP (1) | JP6277188B2 (ja) |
KR (1) | KR20150040939A (ja) |
CN (1) | CN104736470B (ja) |
AU (1) | AU2013295081B2 (ja) |
BR (1) | BR112015001463A2 (ja) |
CA (1) | CA2879150C (ja) |
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Publication number | Priority date | Publication date | Assignee | Title |
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EP2690058A1 (en) * | 2012-07-24 | 2014-01-29 | Biocartis SA | Method for producing microcarriers and for performing biological assays |
US9978644B1 (en) * | 2016-09-07 | 2018-05-22 | Amkor Technology, Inc. | Semiconductor device and manufacturing method |
KR102348180B1 (ko) | 2019-02-19 | 2022-01-07 | 전남대학교산학협력단 | 색전술용 마이크로캐리어 및 그 제조방법 |
CN110484129B (zh) * | 2019-07-02 | 2022-01-25 | 昆山联滔电子有限公司 | 带有防护涂层的产品及其制备方法 |
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2013
- 2013-07-22 RU RU2015101761A patent/RU2631526C2/ru not_active IP Right Cessation
- 2013-07-22 AU AU2013295081A patent/AU2013295081B2/en not_active Ceased
- 2013-07-22 ES ES13739449T patent/ES2787857T3/es active Active
- 2013-07-22 JP JP2015523519A patent/JP6277188B2/ja not_active Expired - Fee Related
- 2013-07-22 EP EP13739449.0A patent/EP2877423B1/en active Active
- 2013-07-22 BR BR112015001463A patent/BR112015001463A2/pt not_active Application Discontinuation
- 2013-07-22 WO PCT/EP2013/065442 patent/WO2014016262A1/en active Application Filing
- 2013-07-22 KR KR20157004439A patent/KR20150040939A/ko not_active Application Discontinuation
- 2013-07-22 CN CN201380049104.5A patent/CN104736470B/zh not_active Expired - Fee Related
- 2013-07-22 US US14/414,174 patent/US9349545B2/en active Active
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2015
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Also Published As
Publication number | Publication date |
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WO2014016262A1 (en) | 2014-01-30 |
JP6277188B2 (ja) | 2018-02-07 |
US9349545B2 (en) | 2016-05-24 |
KR20150040939A (ko) | 2015-04-15 |
IN2015DN00439A (ja) | 2015-06-19 |
EP2690059A1 (en) | 2014-01-29 |
BR112015001463A2 (pt) | 2017-07-04 |
AU2013295081A1 (en) | 2015-02-05 |
EP2877423A1 (en) | 2015-06-03 |
RU2631526C2 (ru) | 2017-09-25 |
ES2787857T3 (es) | 2020-10-19 |
CN104736470A (zh) | 2015-06-24 |
RU2015101761A (ru) | 2016-08-10 |
US20150162141A1 (en) | 2015-06-11 |
AU2013295081B2 (en) | 2016-10-06 |
CA2879150C (en) | 2020-07-14 |
CN104736470B (zh) | 2016-08-17 |
CA2879150A1 (en) | 2014-01-30 |
EP2877423B1 (en) | 2020-03-11 |
ZA201500438B (en) | 2017-11-29 |
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