JP2015531491A - ナノワイヤプラットフォームに基づく広いダイナミックレンジを持つ流体センサ - Google Patents
ナノワイヤプラットフォームに基づく広いダイナミックレンジを持つ流体センサ Download PDFInfo
- Publication number
- JP2015531491A JP2015531491A JP2015536256A JP2015536256A JP2015531491A JP 2015531491 A JP2015531491 A JP 2015531491A JP 2015536256 A JP2015536256 A JP 2015536256A JP 2015536256 A JP2015536256 A JP 2015536256A JP 2015531491 A JP2015531491 A JP 2015531491A
- Authority
- JP
- Japan
- Prior art keywords
- nanowires
- nanowire
- different
- substance
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002070 nanowire Substances 0.000 title claims abstract description 259
- 239000012530 fluid Substances 0.000 title claims abstract description 39
- 239000000126 substance Substances 0.000 claims abstract description 57
- 238000001514 detection method Methods 0.000 claims abstract description 42
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 239000011810 insulating material Substances 0.000 claims abstract description 20
- 239000000463 material Substances 0.000 claims abstract description 20
- 239000010410 layer Substances 0.000 claims description 60
- 230000035945 sensitivity Effects 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 16
- 229920006395 saturated elastomer Polymers 0.000 claims description 11
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 2
- 239000002346 layers by function Substances 0.000 claims 1
- 239000012212 insulator Substances 0.000 abstract description 8
- 239000004065 semiconductor Substances 0.000 abstract description 4
- 239000012774 insulation material Substances 0.000 abstract 1
- 239000000523 sample Substances 0.000 description 37
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 9
- 229910052710 silicon Inorganic materials 0.000 description 9
- 239000010703 silicon Substances 0.000 description 9
- 230000008859 change Effects 0.000 description 8
- 238000005259 measurement Methods 0.000 description 8
- 238000000151 deposition Methods 0.000 description 7
- 239000007789 gas Substances 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 230000008021 deposition Effects 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000008878 coupling Effects 0.000 description 4
- 238000010168 coupling process Methods 0.000 description 4
- 238000005859 coupling reaction Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 230000005669 field effect Effects 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000007306 functionalization reaction Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000000059 patterning Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- 229910008051 Si-OH Inorganic materials 0.000 description 2
- 229910006358 Si—OH Inorganic materials 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000010790 dilution Methods 0.000 description 2
- 239000012895 dilution Substances 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 238000012935 Averaging Methods 0.000 description 1
- 229910005855 NiOx Inorganic materials 0.000 description 1
- 229910018557 Si O Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000004847 absorption spectroscopy Methods 0.000 description 1
- 239000013543 active substance Substances 0.000 description 1
- 230000006978 adaptation Effects 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000003915 air pollution Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 208000006673 asthma Diseases 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000012620 biological material Substances 0.000 description 1
- 239000008280 blood Substances 0.000 description 1
- 210000004369 blood Anatomy 0.000 description 1
- 238000011088 calibration curve Methods 0.000 description 1
- 150000001720 carbohydrates Chemical class 0.000 description 1
- 235000014633 carbohydrates Nutrition 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000002526 effect on cardiovascular system Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 239000012777 electrically insulating material Substances 0.000 description 1
- 238000000835 electrochemical detection Methods 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 208000019622 heart disease Diseases 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000002032 lab-on-a-chip Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000004949 mass spectrometry Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012806 monitoring device Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920000052 poly(p-xylylene) Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 102000004169 proteins and genes Human genes 0.000 description 1
- 108090000623 proteins and genes Proteins 0.000 description 1
- 229910001404 rare earth metal oxide Inorganic materials 0.000 description 1
- 239000013074 reference sample Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 238000011896 sensitive detection Methods 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 231100000925 very toxic Toxicity 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
- G01N27/403—Cells and electrode assemblies
- G01N27/414—Ion-sensitive or chemical field-effect transistors, i.e. ISFETS or CHEMFETS
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
- G01N27/403—Cells and electrode assemblies
- G01N27/414—Ion-sensitive or chemical field-effect transistors, i.e. ISFETS or CHEMFETS
- G01N27/4146—Ion-sensitive or chemical field-effect transistors, i.e. ISFETS or CHEMFETS involving nanosized elements, e.g. nanotubes, nanowires
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/0004—Gaseous mixtures, e.g. polluted air
- G01N33/0009—General constructional details of gas analysers, e.g. portable test equipment
- G01N33/0027—General constructional details of gas analysers, e.g. portable test equipment concerning the detector
- G01N33/0031—General constructional details of gas analysers, e.g. portable test equipment concerning the detector comprising two or more sensors, e.g. a sensor array
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0657—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body
- H01L29/0665—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body the shape of the body defining a nanostructure
- H01L29/0669—Nanowires or nanotubes
- H01L29/0673—Nanowires or nanotubes oriented parallel to a substrate
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Pathology (AREA)
- Immunology (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Nanotechnology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Molecular Biology (AREA)
- Power Engineering (AREA)
- Food Science & Technology (AREA)
- Medicinal Chemistry (AREA)
- Combustion & Propulsion (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
- Thin Film Transistor (AREA)
- Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
Abstract
Description
前記複数のナノワイヤのうちの各ナノワイヤの電気的特性を決定し、
前記複数のナノワイヤのうちの各ナノワイヤについて、前記電気的特性が、該ナノワイヤが飽和していることを示しているか否かを決定し、
該ナノワイヤが飽和していない前記複数のナノワイヤのうちのナノワイヤのサブセットを特定し、
前記ナノワイヤのサブセットから、最も高い感度を持つナノワイヤを特定し、
前記最も高い感度を持つナノワイヤの前記決定された電気的特性に基づいて、前記流体中の前記物質の量を決定する
ように構成される。
Claims (19)
- 流体サンプル中の物質の量的な検出のための装置であって、前記装置は、
基板と、
前記基板上に配置された、電気的に絶縁性の層と、
前記電気的に絶縁性の層上に配置された複数の個別にアドレス可能なナノワイヤであって、前記複数のナノワイヤの各ナノワイヤは、絶縁材料により被覆され、前記複数のナノワイヤは、前記複数のナノワイヤのうちの1つのナノワイヤの電気的な特性の測定によって、前記流体サンプル中の前記物質の存在を検出するよう構成された、ナノワイヤと、
前記流体サンプルを有し、前記複数のナノワイヤの各ナノワイヤの少なくとも一部をカバーするように配置された、サンプル区画と、
を有し、前記複数のナノワイヤの各ナノワイヤは、前記物質のための異なる検出範囲を持つよう構成された装置。 - 前記複数のナノワイヤの各ナノワイヤの異なる検出範囲が、各々の異なる検出範囲よりも大きな略連続する検出範囲を合わせて形成するように、前記複数のナノワイヤのナノワイヤが構成された、請求項1に記載の装置。
- 前記複数のナノワイヤの各ナノワイヤは、表面積及びナノワイヤ体積を有し、前記表面積と前記体積との比は、前記複数のナノワイヤのうちの異なるナノワイヤについて異なる、請求項1又は2に記載の装置。
- 前記複数のナノワイヤの各ナノワイヤは、長さ、幅及び厚さを有し、前記複数のナノワイヤのナノワイヤの厚さは略等しく、前記複数のナノワイヤの各ナノワイヤの幅及び厚さの少なくとも一方は異なる、請求項3に記載の装置。
- 前記絶縁材料は、前記複数のナノワイヤの各ナノワイヤについて同一であり、前記絶縁材料は、前記複数のナノワイヤの各ナノワイヤについて異なる厚さを有する、請求項1乃至4のいずれか一項に記載の装置。
- 前記複数のナノワイヤのうちの少なくとも1つのナノワイヤは、前記物質と相互作用するための少なくとも1つの機能化層を有する、請求項1乃至5のいずれか一項に記載の装置。
- 前記複数のナノワイヤのうちの少なくとも2つのナノワイヤの各々は、前記物質と相互作用するための機能化層を有し、少なくとも2つの機能化層が互いと異なる、請求項1乃至6のいずれか一項に記載の装置。
- 少なくとも1つの前記機能化層がTiO2を有するか又はTiO2から成る、請求項6又は7に記載の装置。
- 前記サンプル区画は、前記複数のナノワイヤ上を流体が流れることを可能とするよう構成される、請求項1乃至8のいずれか一項に記載の装置。
- 前記ナノワイヤのうちの少なくとも2つは、異なる感度を持つ、請求項1乃至9のいずれか一項に記載の装置。
- 前記ナノワイヤのうちの少なくとも2つは、異なるドープ及び/又は異なるドープ濃度を持つ、請求項1乃至10のいずれか一項に記載の装置。
- 前記複数のナノワイヤのうちの少なくとも1つのナノワイヤは、トランジスタのチャネルを形成し、前記基板の一部が、前記トランジスタのゲート端子として用いられる、請求項1乃至11のいずれか一項に記載の装置。
- 更なるサンプル区画を有する、請求項1乃至12のいずれか一項に記載の装置。
- 前記ナノワイヤの読み出しのため前記複数のナノワイヤの各ナノワイヤに接続された電気回路を有する、請求項1乃至13のいずれか一項に記載の装置。
- 流体サンプル中の物質の量的検出のための、請求項1乃至14のいずれか一項に記載の装置の使用。
- 複数の個別にアドレス可能なナノワイヤを有する装置を用いた、サンプル流体中の物質の量的な検出のための方法であって、前記ナノワイヤの各々は、異なる検出範囲を持ち、前記方法は、
前記複数のナノワイヤの各ナノワイヤの電気的特性を決定するステップと、
前記複数のナノワイヤの各ナノワイヤについて、前記電気的特性が、該ナノワイヤが飽和していることを示すか否かを決定するステップと、
前記複数のナノワイヤのうち、飽和していないナノワイヤのサブセットを特定するステップと、
最も高い感度を持つ前記ナノワイヤの前記決定された電気的特性に基づいて、前記流体中の前記物質の量を決定するステップと、
を有する方法。 - 前記ナノワイヤの前記決定される前記電気的特性は、印加される電圧の関数としての電流である、請求項16に記載の方法。
- 前記複数のナノワイヤはトランジスタのチャネルを形成し、前記トランジスタはゲートを有し、前記方法は更に、前記ゲートにゲート電圧を印加して、前記複数のナノワイヤのナノワイヤに付着した物質が、該ナノワイヤから少なくとも部分的に除去されるようにすることにより、前記装置をリセットするステップを有する、請求項16又は17に記載の方法。
- 前記装置を加熱して、前記複数のナノワイヤのナノワイヤに付着した物質が、該ナノワイヤから少なくとも部分的に除去されるようにすることにより、前記装置をリセットするステップを更に有する、請求項16乃至18のいずれか一項に記載の装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201261714418P | 2012-10-16 | 2012-10-16 | |
US61/714,418 | 2012-10-16 | ||
PCT/IB2013/059160 WO2014060894A2 (en) | 2012-10-16 | 2013-10-07 | Wide dynamic range fluid sensor based on nanowire platform |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2015531491A true JP2015531491A (ja) | 2015-11-02 |
JP2015531491A5 JP2015531491A5 (ja) | 2016-11-24 |
JP6533465B2 JP6533465B2 (ja) | 2019-06-19 |
Family
ID=49917673
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015536256A Active JP6533465B2 (ja) | 2012-10-16 | 2013-10-07 | ナノワイヤプラットフォームに基づく広いダイナミックレンジを持つ流体センサ |
Country Status (8)
Country | Link |
---|---|
US (1) | US10126263B2 (ja) |
EP (1) | EP2909617A2 (ja) |
JP (1) | JP6533465B2 (ja) |
CN (1) | CN104737009B (ja) |
BR (1) | BR112015008202B1 (ja) |
MX (1) | MX356580B (ja) |
RU (1) | RU2638130C2 (ja) |
WO (1) | WO2014060894A2 (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2017104130A1 (ja) * | 2015-12-16 | 2017-06-22 | パナソニックIpマネジメント株式会社 | ガスセンサ及びガスセンシングシステム |
WO2018042748A1 (ja) * | 2016-08-31 | 2018-03-08 | シャープ株式会社 | ナノファイバーセンサ |
WO2019107165A1 (ja) * | 2017-11-30 | 2019-06-06 | 東レ株式会社 | 回路、検知器、無線通信デバイス、水分検知システム、おむつ、報知システムおよび回路の製造方法 |
JP2022511068A (ja) * | 2018-12-05 | 2022-01-28 | フェムトドクス | 差分センサの測定方法及び装置 |
JP2022540248A (ja) * | 2019-07-12 | 2022-09-14 | キューラブ・メディカル・リミテッド | 電気化学fetセンサ |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6063604B2 (ja) * | 2013-03-14 | 2017-01-18 | ヒューレット−パッカード デベロップメント カンパニー エル.ピー.Hewlett‐Packard Development Company, L.P. | 物質を検出するための装置及び該装置を製造する方法 |
EP2972236A4 (en) * | 2013-03-14 | 2016-09-28 | Hewlett Packard Development Co | DEVICES FOR DETECTING A SUBSTANCE AND METHOD FOR PRODUCING SUCH A DEVICE |
WO2017002854A1 (ja) | 2015-06-30 | 2017-01-05 | 富士通株式会社 | ガスセンサ及びその使用方法 |
EP3350559B1 (en) | 2015-09-16 | 2021-01-06 | Systems and Software Enterprises, LLC | Enhanced liquid detection mechanisms for circuit cards |
CN105424780B (zh) * | 2015-11-26 | 2018-06-22 | 深圳代尔夫特电子科技有限公司 | 一种氮化镓传感器、制备方法和多传感器系统 |
FR3046243B1 (fr) * | 2015-12-24 | 2017-12-22 | Commissariat Energie Atomique | Capteur nw-fet comportant au moins deux detecteurs distincts a nanofil de semi-conducteur |
CN106290525B (zh) * | 2016-08-04 | 2018-08-28 | 北京大学 | 一种带正面栅极调控的纳米线生物传感器件及其制备方法 |
JP6880930B2 (ja) * | 2017-03-30 | 2021-06-02 | セイコーエプソン株式会社 | センサー |
US10788375B2 (en) * | 2017-12-07 | 2020-09-29 | Tower Semiconductor Ltd. | Apparatus, system and method of a temperature sensor |
EP3540422B1 (en) * | 2018-03-14 | 2024-01-03 | Sciosense B.V. | Monolithic gas sensor arrangement, manufacturing method and measurement method |
EP3864400A4 (en) * | 2018-11-20 | 2022-07-20 | National Research Council Of Canada | SENSOR PLATFORM |
RU2749070C1 (ru) * | 2020-09-17 | 2021-06-03 | Общество С Ограниченной Ответственностью "Крокус Наноэлектроника" (Ооо "Крокус Наноэлектроника") | Способ формирования активных структур для микроэлектронных устройств и микроэлектронное устройство, содержащее активные структуры |
US11840921B2 (en) | 2021-03-02 | 2023-12-12 | Saudi Arabian Oil Company | Detecting carbon dioxide leakage in the field |
US11414986B1 (en) * | 2021-03-02 | 2022-08-16 | Saudi Arabian Oil Company | Detecting carbon dioxide leakage in the field |
RU2764722C1 (ru) * | 2021-08-04 | 2022-01-19 | Общество С Ограниченной Ответственностью "Крокус Наноэлектроника" (Ооо "Крокус Наноэлектроника") | Способ формирования активных структур для микроэлектронных устройств на кремниевой подложке и микроэлектронное устройство, содержащее сформированные активные структуры |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009505045A (ja) * | 2005-08-08 | 2009-02-05 | ミクロガン ゲーエムベーハー | 半導体センサ |
US20090152598A1 (en) * | 2007-12-17 | 2009-06-18 | Electronics And Telecommunications Research Institute | Biosensor using silicon nanowire and method of manufacturing the same |
JP2009229341A (ja) * | 2008-03-25 | 2009-10-08 | Hiroshima Univ | バイオセンサーおよびその製造方法 |
JP2012088326A (ja) * | 2008-11-29 | 2012-05-10 | Korea Electronics Telecommun | バイオセンサチップ |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3000711B2 (ja) * | 1991-04-16 | 2000-01-17 | エヌオーケー株式会社 | ガスセンサ |
EP1342075B1 (en) | 2000-12-11 | 2008-09-10 | President And Fellows Of Harvard College | Device contaning nanosensors for detecting an analyte and its method of manufacture |
US8152991B2 (en) | 2005-10-27 | 2012-04-10 | Nanomix, Inc. | Ammonia nanosensors, and environmental control system |
WO2004003535A1 (en) * | 2002-06-27 | 2004-01-08 | Nanosys Inc. | Planar nanowire based sensor elements, devices, systems and methods for using and making same |
US7051945B2 (en) | 2002-09-30 | 2006-05-30 | Nanosys, Inc | Applications of nano-enabled large area macroelectronic substrates incorporating nanowires and nanowire composites |
US7163659B2 (en) * | 2002-12-03 | 2007-01-16 | Hewlett-Packard Development Company, L.P. | Free-standing nanowire sensor and method for detecting an analyte in a fluid |
US7910064B2 (en) * | 2003-06-03 | 2011-03-22 | Nanosys, Inc. | Nanowire-based sensor configurations |
US20070269924A1 (en) | 2006-05-18 | 2007-11-22 | Basf Aktiengesellschaft | Patterning nanowires on surfaces for fabricating nanoscale electronic devices |
JP4928865B2 (ja) * | 2006-08-11 | 2012-05-09 | 株式会社アツミテック | 水素ガス濃度センサ及び水素ガス濃度測定装置 |
US8236595B2 (en) * | 2006-08-11 | 2012-08-07 | Agency For Science, Technology And Research | Nanowire sensor, nanowire sensor array and method of fabricating the same |
US7846786B2 (en) | 2006-12-05 | 2010-12-07 | Korea University Industrial & Academic Collaboration Foundation | Method of fabricating nano-wire array |
US7437938B2 (en) * | 2007-03-21 | 2008-10-21 | Rosemount Inc. | Sensor with composite diaphragm containing carbon nanotubes or semiconducting nanowires |
FR2924108B1 (fr) | 2007-11-28 | 2010-02-12 | Commissariat Energie Atomique | Procede d'elaboration, sur un materiau dielectrique, de nanofils en materiaux semi-conducteur connectant deux electrodes |
KR100906154B1 (ko) | 2007-12-05 | 2009-07-03 | 한국전자통신연구원 | 반도체 나노선 센서 소자 및 이의 제조 방법 |
IL189576A0 (en) * | 2008-02-18 | 2008-12-29 | Technion Res & Dev Foundation | Chemically sensitive field effect transistors for explosive detection |
US7963148B2 (en) | 2008-09-03 | 2011-06-21 | National Formosa Univeristy | Gas sensor made of field effect transistor based on ZnO nanowires |
JP5371453B2 (ja) * | 2009-01-09 | 2013-12-18 | ミツミ電機株式会社 | 電界効果トランジスタおよびその製造方法 |
CN101847581A (zh) * | 2009-03-25 | 2010-09-29 | 中国科学院微电子研究所 | 顶栅ZnO多纳米线场效应晶体管的制作方法 |
WO2011017077A2 (en) * | 2009-07-27 | 2011-02-10 | Trustees Of Boston University | Nanochannel-based sensor system with controlled sensitivity |
EP2434278A1 (en) * | 2010-08-31 | 2012-03-28 | Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. | Apparatus for detecting one or more analytes comprising an elongated nano-structure and method for manufacturing said apparatus |
US10436745B2 (en) * | 2011-07-12 | 2019-10-08 | University of Pittsburgh— of the Commonwealth System of Higher Education | PH sensor system and methods of sensing pH |
-
2013
- 2013-10-07 JP JP2015536256A patent/JP6533465B2/ja active Active
- 2013-10-07 WO PCT/IB2013/059160 patent/WO2014060894A2/en active Application Filing
- 2013-10-07 RU RU2015118169A patent/RU2638130C2/ru active
- 2013-10-07 US US14/435,592 patent/US10126263B2/en active Active
- 2013-10-07 EP EP13817722.5A patent/EP2909617A2/en not_active Withdrawn
- 2013-10-07 MX MX2015004671A patent/MX356580B/es active IP Right Grant
- 2013-10-07 CN CN201380053956.1A patent/CN104737009B/zh active Active
- 2013-10-07 BR BR112015008202-5A patent/BR112015008202B1/pt active IP Right Grant
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009505045A (ja) * | 2005-08-08 | 2009-02-05 | ミクロガン ゲーエムベーハー | 半導体センサ |
US20090152598A1 (en) * | 2007-12-17 | 2009-06-18 | Electronics And Telecommunications Research Institute | Biosensor using silicon nanowire and method of manufacturing the same |
JP2009229341A (ja) * | 2008-03-25 | 2009-10-08 | Hiroshima Univ | バイオセンサーおよびその製造方法 |
JP2012088326A (ja) * | 2008-11-29 | 2012-05-10 | Korea Electronics Telecommun | バイオセンサチップ |
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10845348B2 (en) | 2015-12-16 | 2020-11-24 | Panasonic Intellectual Property Management Co., Ltd. | Gas sensor and gas sensing system |
JPWO2017104130A1 (ja) * | 2015-12-16 | 2018-06-07 | パナソニックIpマネジメント株式会社 | ガスセンサ及びガスセンシングシステム |
CN108369200A (zh) * | 2015-12-16 | 2018-08-03 | 松下知识产权经营株式会社 | 气体传感器以及气体传感系统 |
WO2017104130A1 (ja) * | 2015-12-16 | 2017-06-22 | パナソニックIpマネジメント株式会社 | ガスセンサ及びガスセンシングシステム |
WO2018042748A1 (ja) * | 2016-08-31 | 2018-03-08 | シャープ株式会社 | ナノファイバーセンサ |
WO2019107165A1 (ja) * | 2017-11-30 | 2019-06-06 | 東レ株式会社 | 回路、検知器、無線通信デバイス、水分検知システム、おむつ、報知システムおよび回路の製造方法 |
JPWO2019107165A1 (ja) * | 2017-11-30 | 2020-11-19 | 東レ株式会社 | 回路、検知器、無線通信デバイス、水分検知システム、おむつ、報知システムおよび回路の製造方法 |
TWI768155B (zh) * | 2017-11-30 | 2022-06-21 | 日商東麗股份有限公司 | 水分檢測電路、檢測器、無線通訊元件、水分檢測系統、尿布、通報系統以及水分檢測電路的製造方法 |
JP7103230B2 (ja) | 2017-11-30 | 2022-07-20 | 東レ株式会社 | 回路、検知器、無線通信デバイス、水分検知システム、おむつ、報知システムおよび回路の製造方法 |
US11534347B2 (en) | 2017-11-30 | 2022-12-27 | Toray Industries, Inc. | Circuit, detector, wireless communication device, moisture sensing system, diaper, notification system, and circuit manufacturing method |
JP2022511068A (ja) * | 2018-12-05 | 2022-01-28 | フェムトドクス | 差分センサの測定方法及び装置 |
JP2022540248A (ja) * | 2019-07-12 | 2022-09-14 | キューラブ・メディカル・リミテッド | 電気化学fetセンサ |
JP7455187B2 (ja) | 2019-07-12 | 2024-03-25 | キューラブ・メディカル・リミテッド | 電気化学fetセンサ |
Also Published As
Publication number | Publication date |
---|---|
WO2014060894A3 (en) | 2014-07-24 |
US20160003770A1 (en) | 2016-01-07 |
CN104737009A (zh) | 2015-06-24 |
MX2015004671A (es) | 2015-08-07 |
JP6533465B2 (ja) | 2019-06-19 |
CN104737009B (zh) | 2018-07-13 |
RU2015118169A (ru) | 2016-12-10 |
BR112015008202A2 (pt) | 2017-07-04 |
MX356580B (es) | 2018-06-05 |
US10126263B2 (en) | 2018-11-13 |
RU2638130C2 (ru) | 2017-12-11 |
WO2014060894A2 (en) | 2014-04-24 |
EP2909617A2 (en) | 2015-08-26 |
BR112015008202B1 (pt) | 2021-02-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6533465B2 (ja) | ナノワイヤプラットフォームに基づく広いダイナミックレンジを持つ流体センサ | |
US9170225B2 (en) | Obtaining selectivity in gas sensors via a sensor array system composed of P and N type material | |
Reddy et al. | High-k dielectric Al 2 O 3 nanowire and nanoplate field effect sensors for improved pH sensing | |
US20060263255A1 (en) | Nanoelectronic sensor system and hydrogen-sensitive functionalization | |
US20140234981A1 (en) | Double gate ion sensitive field effect transistor | |
US20110031986A1 (en) | Sub-Threshold Capfet Sensor for Sensing Analyte, A Method and System Thereof | |
RU2650087C2 (ru) | Интегральная схема с матрицей сенсорных транзисторов, сенсорное устройство и способ измерения | |
CN105699463B (zh) | 一种化学场效应晶体管气敏传感器及其制造方法 | |
US8384136B2 (en) | Demultiplexed nanowire sensor array for detection of chemical and biological species | |
EP3045902A1 (en) | Electrolyte-gated sensor for species detection | |
CN105705942B (zh) | 用于测量在生物的、化学的或者其他试样处的小的电压和电势的设备和方法 | |
CN110672666B (zh) | 一种电子鼻器件及其制备方法 | |
WO2016205814A1 (en) | Gas detection systems and methods using graphene field effect transistors | |
CN106525921B (zh) | 一种电化学检测器及其制造方法和检测目标物质的方法 | |
EP3887816A1 (en) | Ion-sensitive field effect transistor | |
Knopfmacher | Sensing with silicon nanowire field-effect transistors | |
US20070095660A1 (en) | Sensor | |
Zaborowski et al. | Development of si nanowire chemical sensors | |
Peres et al. | Evaluation of the Electrical Resistance Response of Insulating Glass Surface to Sense and Classify Humidity and VOCs Vapors | |
US20240027350A1 (en) | Method for inspecting probe molecule | |
Rollo | A new design of an electrochemical (bio) sensor: High Aspect Ratio Fin-FET | |
Wipf | Chemical and biochemical sensors based on silicon nanowire field-effect transistor arrays | |
Ruediger et al. | 3D INTEGRATION OF SINGLE ELECTRON TRANSISTORS IN THE BACK-END-OF-LINE OF 28 nm CMOS TECHNOLOGY FOR THE DEVELOPMENT OF ULTRA-LOW POWER SENSORS | |
Ionescu et al. | Development of an extremely selective e-nose employing a single polycyclic aromatic hydrocarbon-based chemFET |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20161004 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20161004 |
|
RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20170214 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20170628 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20170711 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20170919 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20171208 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20180524 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20180814 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20181109 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20190507 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20190524 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6533465 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |