JP2015529648A - アルケニルハロゲン化シランの製造法およびそのために適した反応器 - Google Patents
アルケニルハロゲン化シランの製造法およびそのために適した反応器 Download PDFInfo
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- 150000004756 silanes Chemical class 0.000 title claims abstract description 53
- 238000000034 method Methods 0.000 title claims abstract description 33
- 125000003342 alkenyl group Chemical group 0.000 title abstract description 13
- 238000004519 manufacturing process Methods 0.000 title description 7
- 238000006243 chemical reaction Methods 0.000 claims abstract description 84
- -1 alkenyl halide Chemical class 0.000 claims abstract description 45
- 239000000376 reactant Substances 0.000 claims abstract description 30
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 13
- 229910000077 silane Inorganic materials 0.000 claims abstract description 10
- 238000010574 gas phase reaction Methods 0.000 claims abstract description 4
- 229920002554 vinyl polymer Polymers 0.000 claims abstract description 4
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 claims description 35
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 claims description 30
- 239000005052 trichlorosilane Substances 0.000 claims description 27
- 239000000047 product Substances 0.000 claims description 20
- 239000011541 reaction mixture Substances 0.000 claims description 18
- OSDWBNJEKMUWAV-UHFFFAOYSA-N Allyl chloride Chemical compound ClCC=C OSDWBNJEKMUWAV-UHFFFAOYSA-N 0.000 claims description 7
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 5
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 claims description 5
- 239000007788 liquid Substances 0.000 claims description 5
- 238000003860 storage Methods 0.000 claims description 5
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 claims description 4
- 239000012043 crude product Substances 0.000 claims description 4
- SXZSFWHOSHAKMN-UHFFFAOYSA-N 2,3,4,4',5-Pentachlorobiphenyl Chemical compound C1=CC(Cl)=CC=C1C1=CC(Cl)=C(Cl)C(Cl)=C1Cl SXZSFWHOSHAKMN-UHFFFAOYSA-N 0.000 claims description 3
- BHELZAPQIKSEDF-UHFFFAOYSA-N allyl bromide Chemical compound BrCC=C BHELZAPQIKSEDF-UHFFFAOYSA-N 0.000 claims description 3
- INLLPKCGLOXCIV-UHFFFAOYSA-N bromoethene Chemical compound BrC=C INLLPKCGLOXCIV-UHFFFAOYSA-N 0.000 claims description 3
- 238000001816 cooling Methods 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- IBOKZQNMFSHYNQ-UHFFFAOYSA-N tribromosilane Chemical compound Br[SiH](Br)Br IBOKZQNMFSHYNQ-UHFFFAOYSA-N 0.000 claims description 3
- 125000000950 dibromo group Chemical group Br* 0.000 claims 1
- 239000004071 soot Substances 0.000 abstract description 8
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 22
- 239000005050 vinyl trichlorosilane Substances 0.000 description 22
- 239000000460 chlorine Substances 0.000 description 8
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 7
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 7
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 239000005049 silicon tetrachloride Substances 0.000 description 7
- 239000006227 byproduct Substances 0.000 description 6
- 238000010438 heat treatment Methods 0.000 description 6
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 5
- 229910052801 chlorine Inorganic materials 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 238000007086 side reaction Methods 0.000 description 5
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 4
- 229910052794 bromium Inorganic materials 0.000 description 4
- 150000004820 halides Chemical class 0.000 description 4
- XEWHJXVSMRAVAV-UHFFFAOYSA-N CC.Cl[SiH](Cl)Cl.Cl[SiH](Cl)Cl Chemical compound CC.Cl[SiH](Cl)Cl.Cl[SiH](Cl)Cl XEWHJXVSMRAVAV-UHFFFAOYSA-N 0.000 description 3
- 101100450129 Caenorhabditis elegans hal-3 gene Proteins 0.000 description 3
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 3
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 3
- SLLGVCUQYRMELA-UHFFFAOYSA-N chlorosilicon Chemical compound Cl[Si] SLLGVCUQYRMELA-UHFFFAOYSA-N 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 239000012495 reaction gas Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- FTYZKCCJUXJFLT-UHFFFAOYSA-N bromosilicon Chemical compound Br[Si] FTYZKCCJUXJFLT-UHFFFAOYSA-N 0.000 description 2
- VJIYRPVGAZXYBD-UHFFFAOYSA-N dibromosilane Chemical compound Br[SiH2]Br VJIYRPVGAZXYBD-UHFFFAOYSA-N 0.000 description 2
- 238000009776 industrial production Methods 0.000 description 2
- 229910052740 iodine Inorganic materials 0.000 description 2
- 239000011630 iodine Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000010791 quenching Methods 0.000 description 2
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 1
- VFRMAHVDXYSEON-UHFFFAOYSA-N 1,1-diiodoethene Chemical compound IC(I)=C VFRMAHVDXYSEON-UHFFFAOYSA-N 0.000 description 1
- QCMKXHXKNIOBBC-UHFFFAOYSA-N 3-fluoroprop-1-ene Chemical compound FCC=C QCMKXHXKNIOBBC-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- BFHXLRDUQISVTP-UHFFFAOYSA-N Cl[SiH](Cl)Cl.CC Chemical compound Cl[SiH](Cl)Cl.CC BFHXLRDUQISVTP-UHFFFAOYSA-N 0.000 description 1
- 239000004971 Cross linker Substances 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- HFEHLDPGIKPNKL-UHFFFAOYSA-N allyl iodide Chemical compound ICC=C HFEHLDPGIKPNKL-UHFFFAOYSA-N 0.000 description 1
- YPOWJPHSOHGSTI-UHFFFAOYSA-N bromo(chloro)silane Chemical compound Cl[SiH2]Br YPOWJPHSOHGSTI-UHFFFAOYSA-N 0.000 description 1
- YBFJZDDPQHRNPH-UHFFFAOYSA-N bromo(dichloro)silane Chemical compound Cl[SiH](Cl)Br YBFJZDDPQHRNPH-UHFFFAOYSA-N 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- KVRXUBCNDACNHK-UHFFFAOYSA-N chloro(fluoro)silicon Chemical compound F[Si]Cl KVRXUBCNDACNHK-UHFFFAOYSA-N 0.000 description 1
- NVGGRBCUNKCAAY-UHFFFAOYSA-N chloro(iodo)silane Chemical compound Cl[SiH2]I NVGGRBCUNKCAAY-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- IGALWLDALMOLJH-UHFFFAOYSA-N dibromo(chloro)silane Chemical compound Cl[SiH](Br)Br IGALWLDALMOLJH-UHFFFAOYSA-N 0.000 description 1
- PUUOOWSPWTVMDS-UHFFFAOYSA-N difluorosilane Chemical compound F[SiH2]F PUUOOWSPWTVMDS-UHFFFAOYSA-N 0.000 description 1
- AIHCVGFMFDEUMO-UHFFFAOYSA-N diiodosilane Chemical compound I[SiH2]I AIHCVGFMFDEUMO-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical compound FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 description 1
- XPBBUZJBQWWFFJ-UHFFFAOYSA-N fluorosilane Chemical compound [SiH3]F XPBBUZJBQWWFFJ-UHFFFAOYSA-N 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 239000013462 industrial intermediate Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- IDIOJRGTRFRIJL-UHFFFAOYSA-N iodosilane Chemical compound I[SiH3] IDIOJRGTRFRIJL-UHFFFAOYSA-N 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000001282 organosilanes Chemical class 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 230000000171 quenching effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- WPPVEXTUHHUEIV-UHFFFAOYSA-N trifluorosilane Chemical compound F[SiH](F)F WPPVEXTUHHUEIV-UHFFFAOYSA-N 0.000 description 1
- DNAPJAGHXMPFLD-UHFFFAOYSA-N triiodosilane Chemical compound I[SiH](I)I DNAPJAGHXMPFLD-UHFFFAOYSA-N 0.000 description 1
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- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
- C07F7/14—Preparation thereof from optionally substituted halogenated silanes and hydrocarbons hydrosilylation reactions
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- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/26—Nozzle-type reactors, i.e. the distribution of the initial reactants within the reactor is effected by their introduction or injection through nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
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- B01J4/00—Feed or outlet devices; Feed or outlet control devices
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- B01J4/002—Nozzle-type elements
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- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
- C07F7/121—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20
- C07F7/122—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20 by reactions involving the formation of Si-C linkages
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Abstract
Description
C2H3Cl (I) + SiHCl3 (II) → C2H3SiCl3 (III) + HCl (IV) (1)
アルケニルハロゲン化シラン、例えばビニルトリクロロシラン(III)、殊に前記化合物(III)からエステル化反応により製造されるビニルトリアルコキシシラン類は、有機シラン化学において重要な工業用の中間生成物または最終製品である。前記ビニルトリアルコキシシラン類は、例えばプラスチック、例えばPVC、PPおよびPEにおいて架橋剤として使用される。
A)次の反応式(2)に従った四塩化ケイ素(V)の形成:
SiHCl3 (II) + HCl (IV) → SiCl4 (V) + H2 (VI) (2)
B)次の反応式(3)に従ったビス(トリクロロシラン)エタン(VII)の形成:
SiHCl3 (II) + C2H3SiCl3 (III) → Cl3SiC2H4SiCl3 (VII) (3)
C)次の反応式(4)に従った煤(VIII)の形成:
C2H3Cl (I) → 2 C (VIII) + HCl (IV) + H2 (VI) (4)
塩化ビニルとトリクロロシランとのラジカル的に進行する発熱的置換反応は、典型的には高温反応器中で400〜700℃の温度範囲内および1〜2バール(絶対圧力)で行なわれる。通常の方法は、管状反応器かまたは回転式ディスプレーサーを有する反応器が使用されることによって特徴付けられている。そのための例は、欧州特許出願公開第0438666号明細書A2、ドイツ連邦共和国特許出願公開第19918114号明細書A1およびドイツ連邦共和国特許出願公開第19918115号明細書A1中に見出せる。
塩化ビニル=14.9kg/時間 トリクロロシラン=495.2kg/時間
ビニルトリクロロシラン=193.3kg/時間 塩化水素=43.6kg/時間
四塩化ケイ素=38.1kg/時間 高沸点物/さらなる副成分=15.1kg/時間。
塩化ビニル=9.8kg/時間 トリクロロシラン=274.8kg/時間
ビニルトリクロロシラン=138.5kg/時間 塩化水素=32.2kg/時間
四塩化ケイ素=20.8kg/時間 高沸点物/さらなる副成分=15.5kg/時間。
B)一方の管側での入口(2)と、
C)他方の管側での出口(3)と、
D)一方の反応体(7)のための中心の供給部(5)およびこの中心の供給部(5)を包囲する、他方の反応体(8)のための供給部(6)を有し、および入口(2)に取り付けられかつ反応管(1)に開口する、環状間隙を備えたノズル(4)とを有する、
A)反応管(1)。
塩化ビニル=17.0kg/時間 トリクロロシラン=457.1kg/時間
ビニルトリクロロシラン=197.3kg/時間 塩化水素=44.5kg/時間
四塩化ケイ素=20.6kg/時間 高沸点物/さらなる副成分=13.5kg/時間。
Claims (16)
- ビニルハロゲン化物、ビニリデンハロゲン化物またはアリルハロゲン化物の群から選択されたアルケニルハロゲン化物と、モノハロゲン化シラン、ジハロゲン化シランまたはトリハロゲン化シランの群から選択されたハロゲン化シランとを、気相中で、
一方の管端部に入口(2)を装備しかつ他方の管端部に出口(3)を装備した反応管(1)を含み、ならびに、一方の反応体(7)のための中心の供給部(5)およびこの中心の供給部(5)を包囲する、他方の反応体(8)のための供給部(6)を有し、かつ入口(2)に取り付けられかつ反応管(1)に開口する、環状間隙を備えたノズル(4)を有する反応器中で反応させることによるアルケニルハロゲン化シランの製造法であって、
前記の中心の供給部(5)を通るアルケニルハロゲン化物および前記の包囲する供給部(6)を通るハロゲン化シランが、反応管(1)中に噴入され、かつこの反応管(1)を通って出口(3)の方向に流れる、前記方法。 - アルケニルハロゲン化物として、塩化ビニル、臭化ビニル、塩化ビニリデン、臭化ビニリデン、塩化アリルまたは臭化アリル、殊に塩化ビニルまたは塩化アリルを使用し、およびハロゲン化シランとして、ジクロロシランもしくはトリクロロシランまたはジブロモシランもしくはトリブロモシラン、特にジクロロシランもしくはトリクロロシランを使用することを特徴とする、請求項1記載の方法。
- アルケニルハロゲン化物として、塩化ビニルまたは塩化アリルを使用し、およびハロゲン化シランとして、トリクロロシランを使用することを特徴とする、請求項1記載の方法。
- 前記の環状間隙を備えたノズル(4)は二物質流ノズルであることを特徴とする、請求項1記載の方法。
- 前記の中心の供給部(5)に、および/またはこの中心の供給部(5)を包囲する供給部(6)に、単数または複数の反応体の流れの量を変えうる手段が設けられていることを特徴とする、請求項1記載の方法。
- モノハロゲン化シラン、ジハロゲン化シランまたはトリハロゲン化シラン対アルケニルハロゲン化物の使用比は、1.0〜10モル:1モル、有利に2.0〜4.0モル:1モルであることを特徴とする、請求項1記載の方法。
- 前記反応管(1)の生成物側の端部で、熱い反応混合物を、液状粗製生成物を用いて急冷することを特徴とする、請求項1記載の方法。
- 前記反応管(1)の内部の温度は、400〜700℃、有利に500〜650℃であることを特徴とする、請求項1記載の方法。
- 前記反応管(1)の内部の圧力は、1.0〜2.0バール(絶対圧力)、有利に1.0〜1.5バール(絶対圧力)であることを特徴とする、請求項1記載の方法。
- 前記の中心の供給部(5)中のアルケニルハロゲン化物の流れの量を温度調節回路により制御することを特徴とする、請求項1記載の方法。
- 前記の環状間隙を備えたノズル(4)の開口部から出口(3)までの反応器中での反応混合物の滞留時間は、0.5〜10秒、有利に1.5〜4秒の範囲内にあることを特徴とする、請求項1記載の方法。
- 気相反応のための反応器であって、少なくとも1つの次の機素:
B)一方の管側での入口(2)と、
C)他方の管側での出口(3)と、
D)一方の反応体(7)のための中心の供給部(5)およびこの中心の供給部(5)を包囲する、他方の反応体(8)のための供給部(6)を有し、および入口(2)に取り付けられかつ反応管(1)に開口する、環状間隙を備えたノズル(4)とを有する、
A)反応管(1)
が存在することを特徴とする、前記反応器。 - 前記の中心の供給部(5)に、および/または前記の包囲する供給部(6)に、環状間隙を備えたノズル(4)中の単数または複数の反応体の流れの量を変えうる手段が設けられていることを特徴とする、請求項12記載の反応器。
- 前記入口(2)に引き続いて、反応体(7、8)が必要な反応温度に加熱される予熱帯域(9)が存在することを特徴とする、請求項12記載の反応器。
- 前記出口(3)が冷却された生成物(11)のための貯蔵容器(10)に開口することを特徴とする、請求項12記載の反応器。
- 導管(12)が設けられており、この導管(12)を通して、生成物(11)の一部分が、出口(3)の近くに返送され、かつそこに存在する反応混合物中に噴入され、それによって反応混合物の衝撃的な冷却および冷却された生成物(11)の形成を生じさせることを特徴とする、請求項15記載の反応器。
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DE102012212913.8 | 2012-07-24 | ||
PCT/EP2013/060906 WO2014016013A1 (de) | 2012-07-24 | 2013-05-28 | Verfahren zur herstellung von alkenylhalogensilanen und dafür geeigneter reaktor |
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