JP2015514663A - 酸化亜鉛コーティングを蒸着させるための化学蒸着過程、導電性ガラス物品を形成するための方法、およびそれによって生成されるコーティングされたガラス物品 - Google Patents
酸化亜鉛コーティングを蒸着させるための化学蒸着過程、導電性ガラス物品を形成するための方法、およびそれによって生成されるコーティングされたガラス物品 Download PDFInfo
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- 238000000576 coating method Methods 0.000 title claims abstract description 312
- 239000011248 coating agent Substances 0.000 title claims abstract description 301
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 title claims abstract description 238
- 239000011521 glass Substances 0.000 title claims abstract description 205
- 239000011787 zinc oxide Substances 0.000 title claims abstract description 119
- 238000000034 method Methods 0.000 title claims abstract description 111
- 230000008569 process Effects 0.000 title claims abstract description 75
- 238000000151 deposition Methods 0.000 title claims abstract description 33
- 238000005229 chemical vapour deposition Methods 0.000 title claims description 47
- 150000001875 compounds Chemical class 0.000 claims abstract description 128
- 239000000758 substrate Substances 0.000 claims abstract description 96
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 66
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 60
- 239000001301 oxygen Substances 0.000 claims abstract description 60
- 239000011261 inert gas Substances 0.000 claims abstract description 35
- 239000008246 gaseous mixture Substances 0.000 claims abstract description 22
- 238000002156 mixing Methods 0.000 claims abstract description 15
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 47
- 229910001887 tin oxide Inorganic materials 0.000 claims description 47
- 239000000654 additive Substances 0.000 claims description 24
- 230000000996 additive effect Effects 0.000 claims description 24
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 claims description 23
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 18
- 239000011701 zinc Substances 0.000 claims description 18
- 229910052725 zinc Inorganic materials 0.000 claims description 18
- 239000005329 float glass Substances 0.000 claims description 13
- 230000015572 biosynthetic process Effects 0.000 claims description 12
- 229910052731 fluorine Inorganic materials 0.000 claims description 11
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 10
- AXAZMDOAUQTMOW-UHFFFAOYSA-N dimethylzinc Chemical compound C[Zn]C AXAZMDOAUQTMOW-UHFFFAOYSA-N 0.000 claims description 10
- 239000011737 fluorine Substances 0.000 claims description 10
- 239000011229 interlayer Substances 0.000 claims description 10
- -1 diketone compound Chemical class 0.000 claims description 9
- 238000005816 glass manufacturing process Methods 0.000 claims description 8
- 230000001629 suppression Effects 0.000 claims description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 4
- 238000007599 discharging Methods 0.000 claims 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 77
- 239000002243 precursor Substances 0.000 description 24
- 239000011247 coating layer Substances 0.000 description 22
- 230000008021 deposition Effects 0.000 description 21
- 239000007789 gas Substances 0.000 description 19
- 229910004298 SiO 2 Inorganic materials 0.000 description 11
- 239000010410 layer Substances 0.000 description 11
- 238000000137 annealing Methods 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 9
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 238000001816 cooling Methods 0.000 description 5
- 238000009792 diffusion process Methods 0.000 description 5
- 239000012159 carrier gas Substances 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 150000003606 tin compounds Chemical class 0.000 description 4
- 230000004888 barrier function Effects 0.000 description 3
- YMLFYGFCXGNERH-UHFFFAOYSA-K butyltin trichloride Chemical compound CCCC[Sn](Cl)(Cl)Cl YMLFYGFCXGNERH-UHFFFAOYSA-K 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000005137 deposition process Methods 0.000 description 3
- PKKGKUDPKRTKLJ-UHFFFAOYSA-L dichloro(dimethyl)stannane Chemical compound C[Sn](C)(Cl)Cl PKKGKUDPKRTKLJ-UHFFFAOYSA-L 0.000 description 3
- HQWPLXHWEZZGKY-UHFFFAOYSA-N diethylzinc Chemical compound CC[Zn]CC HQWPLXHWEZZGKY-UHFFFAOYSA-N 0.000 description 3
- 239000002019 doping agent Substances 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- 150000003752 zinc compounds Chemical class 0.000 description 3
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 238000006124 Pilkington process Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000003570 air Substances 0.000 description 2
- 238000001505 atmospheric-pressure chemical vapour deposition Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 230000001934 delay Effects 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000006060 molten glass Substances 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- SHXHPUAKLCCLDV-UHFFFAOYSA-N 1,1,1-trifluoropentane-2,4-dione Chemical compound CC(=O)CC(=O)C(F)(F)F SHXHPUAKLCCLDV-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 1
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- CUJRVFIICFDLGR-UHFFFAOYSA-N acetylacetonate Chemical compound CC(=O)[CH-]C(C)=O CUJRVFIICFDLGR-UHFFFAOYSA-N 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 238000007507 annealing of glass Methods 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 238000005094 computer simulation Methods 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- QAMFBRUWYYMMGJ-UHFFFAOYSA-N hexafluoroacetylacetone Chemical compound FC(F)(F)C(=O)CC(=O)C(F)(F)F QAMFBRUWYYMMGJ-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 230000006911 nucleation Effects 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000001429 visible spectrum Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45595—Atmospheric CVD gas inlets with no enclosed reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/90—Other aspects of coatings
- C03C2217/94—Transparent conductive oxide layers [TCO] being part of a multilayer coating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
- C03C2218/1525—Deposition methods from the vapour phase by cvd by atmospheric CVD
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
Landscapes
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Inorganic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
Description
Claims (29)
- 酸化亜鉛コーティングを蒸着させるための化学蒸着過程であって、
移動ガラス基板を提供することと、
第1の流れとして、アルキル亜鉛化合物および不活性ガスからなるガス状混合物を形成することと、
第2の流れにおいて、第1のガス状無機酸素含有化合物を提供することと、
前記第2の流れ、第3の流れ、または前記第2および第3の流れの両方において、第2のガス状無機酸素含有化合物を提供することと、
前記移動ガラス基板の表面またはその近くで、前記ガス状流れを混合し、その上に酸化亜鉛コーティングを形成することと、
を含む、過程。 - 前記流れは、前記酸化亜鉛コーティングを形成する前に、コーティング装置を通るように方向付けられる、請求項1に記載の過程。
- 流れにおいて、ガス状添加化合物を提供することをさらに含む、請求項1に記載の過程。
- 前記第1の無機酸素含有化合物は水であり、前記第2の無機酸素含有化合物は酸素である、請求項1に記載の過程。
- 前記酸化亜鉛コーティングは、熱分解コーティングである、請求項1に記載の過程。
- 前記酸化亜鉛コーティングは、本質的に大気圧で、フロートガラス製造過程においてガラスリボン上に形成される、請求項1に記載の過程。
- 前記酸化亜鉛コーティングを形成する前に、前記ガラス基板の前記表面上にフッ素ドープ酸化スズコーティングが蒸着される、請求項1に記載の過程。
- 前記ガス状流れは、混合される前に、コーティング装置を通るように別々に方向付けられる、請求項2に記載の過程。
- 前記ガラス基板上の所定距離で、前記コーティング装置から前記ガス状流れを排出することをさらに含む、請求項2に記載の過程。
- 前記ガス状添加化合物はジケトン化合物である、請求項3に記載の過程。
- 前記アルキル亜鉛化合物はジメチル亜鉛であり、前記ガス状添加化合物はアセチルアセトンであり、前記第1および第2の無機酸素含有化合物は水および酸素である、請求項3に記載の過程。
- 前記酸化亜鉛コーティングを形成する前に、前記フッ素ドープ酸化スズコーティング上に、酸化スズコーティングが蒸着される、請求項7に記載の過程。
- コーティングされたガラス物品を形成するための方法であって、
その上に導電性酸化スズコーティングが蒸着されたガラス基板を提供することと、
ガス状亜鉛含有化合物、第1のガス状無機酸素含有化合物、第2のガス状無機酸素含有化合物、および不活性ガスを含む、ガス状混合物を、前記導電性酸化スズコーティング上に形成することと、
前記ガス状混合物を反応させ、前記導電性酸化スズコーティング上に酸化亜鉛コーティングを蒸着させ、前記シート抵抗を0.5オーム/スクエア以内で維持することと、
を含む、方法。 - 前記コーティングされたガラス物品は、11オーム/スクエア未満のシート抵抗を有する、請求項13に記載の方法。
- 前記ガス状混合物はまた、ガス状添加化合物を含む、請求項13に記載の方法。
- 前記導電性酸化スズコーティングは、400〜440nmの厚さで蒸着された、ドープされた酸化スズコーティングである、請求項13に記載の方法。
- 前記第1および第2のガス状無機酸素含有化合物は水および酸素である、請求項13に記載の方法。
- 前記ガラス基板の表面は、本質的に大気圧であり、前記ガラス基板は、前記酸化亜鉛コーティングの形成時に移動する、請求項13に記載の方法。
- 前記亜鉛含有化合物を含むガス状流れと、前記第1および第2の無機酸素含有化合物を含む1つ以上のガス状流れを、コーティング装置を通るように別々に方向付けることをさらに含む、請求項13に記載の方法。
- 前記ドープされた酸化スズコーティングは、フッ素でドープされる、請求項16に記載の方法。
- コーティングされたガラス物品であって、
ガラス基板と、
前記ガラス基板上に蒸着された、フッ素ドープ酸化スズコーティングと、
前記フッ素ドープ酸化スズコーティング上に蒸着された、酸化亜鉛コーティングと、
を含み、
15オーム/スクエア未満のシート抵抗を示す、
コーティングされたガラス物品。 - 前記フッ素ドープ酸化スズコーティングの厚さは、少なくとも400nmである、請求項21に記載のコーティングされたガラス物品。
- 前記フッ素ドープ酸化スズコーティングと酸化亜鉛コーティングとの間に蒸着された、酸化スズコーティングの被覆をさらに含む、請求項21に記載のコーティングされたガラス物品。
- 前記フッ素ドープ酸化スズコーティングと前記ガラス基板の表面との間に形成される、色抑制中間層をさらに含む、請求項21に記載のコーティングされたガラス物品。
- 前記酸化亜鉛コーティングの厚さは、30〜60nmの間である、請求項21に記載のコーティングされたガラス物品。
- 前記酸化亜鉛コーティングの厚さは、30〜60nmの間である、請求項23に記載のコーティングされたガラス物品。
- 前記酸化スズコーティングの厚さは、50〜80nmの間である、請求項23に記載のコーティングされたガラス物品。
- 前記コーティングされたガラス物品のシート抵抗は、11オーム/スクエア未満である、請求項26に記載のコーティングされたガラス物品。
- 前記コーティングされたガラス物品のシート抵抗は、10オーム/スクエア未満である、請求項26に記載のコーティングされたガラス物品。
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GB201521165D0 (en) * | 2015-12-01 | 2016-01-13 | Pilkington Group Ltd | Method for depositing a coating |
US11485678B2 (en) | 2017-08-31 | 2022-11-01 | Pilkington Group Limited | Chemical vapor deposition process for forming a silicon oxide coating |
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