JP2015513788A - 高度ｘジブロックコポリマーの製造、精製及び使用 - Google Patents
高度ｘジブロックコポリマーの製造、精製及び使用 Download PDFInfo
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- JP2015513788A JP2015513788A JP2014556769A JP2014556769A JP2015513788A JP 2015513788 A JP2015513788 A JP 2015513788A JP 2014556769 A JP2014556769 A JP 2014556769A JP 2014556769 A JP2014556769 A JP 2014556769A JP 2015513788 A JP2015513788 A JP 2015513788A
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- XTXNWQHMMMPKKO-UHFFFAOYSA-N tert-butyl 2-phenylethenyl carbonate Chemical compound CC(C)(C)OC(=O)OC=CC1=CC=CC=C1 XTXNWQHMMMPKKO-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 238000012876 topography Methods 0.000 description 1
- 125000004205 trifluoroethyl group Chemical group [H]C([H])(*)C(F)(F)F 0.000 description 1
- 239000012989 trithiocarbonate Substances 0.000 description 1
- PXXNTAGJWPJAGM-UHFFFAOYSA-N vertaline Natural products C1C2C=3C=C(OC)C(OC)=CC=3OC(C=C3)=CC=C3CCC(=O)OC1CC1N2CCCC1 PXXNTAGJWPJAGM-UHFFFAOYSA-N 0.000 description 1
- 238000010626 work up procedure Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F265/00—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00
- C08F265/04—Macromolecular compounds obtained by polymerising monomers on to polymers of unsaturated monocarboxylic acids or derivatives thereof as defined in group C08F20/00 on to polymers of esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F293/00—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule
- C08F293/005—Macromolecular compounds obtained by polymerisation on to a macromolecule having groups capable of inducing the formation of new polymer chains bound exclusively at one or both ends of the starting macromolecule using free radical "living" or "controlled" polymerisation, e.g. using a complexing agent
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L53/00—Compositions of block copolymers containing at least one sequence of a polymer obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y10/00—Processes of additive manufacturing
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2438/00—Living radical polymerisation
- C08F2438/03—Use of a di- or tri-thiocarbonylthio compound, e.g. di- or tri-thioester, di- or tri-thiocarbamate, or a xanthate as chain transfer agent, e.g . Reversible Addition Fragmentation chain Transfer [RAFT] or Macromolecular Design via Interchange of Xanthates [MADIX]
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Graft Or Block Polymers (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201261597558P | 2012-02-10 | 2012-02-10 | |
| US61/597,558 | 2012-02-10 | ||
| PCT/US2013/025510 WO2013120052A1 (en) | 2012-02-10 | 2013-02-11 | Preparation, purification and use of high-x diblock copolymers |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2015513788A true JP2015513788A (ja) | 2015-05-14 |
| JP2015513788A5 JP2015513788A5 (OSRAM) | 2016-03-31 |
Family
ID=47741328
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014556769A Abandoned JP2015513788A (ja) | 2012-02-10 | 2013-02-11 | 高度ｘジブロックコポリマーの製造、精製及び使用 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20150337068A1 (OSRAM) |
| EP (1) | EP2812383A1 (OSRAM) |
| JP (1) | JP2015513788A (OSRAM) |
| CN (1) | CN104105750A (OSRAM) |
| WO (1) | WO2013120052A1 (OSRAM) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015507066A (ja) * | 2012-02-10 | 2015-03-05 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニーＥ．Ｉ．Ｄｕ Ｐｏｎｔ Ｄｅ Ｎｅｍｏｕｒｓ Ａｎｄ Ｃｏｍｐａｎｙ | 高度ｘジブロックコポリマーの製造、精製及び使用 |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2014152211A1 (en) | 2013-03-14 | 2014-09-25 | Moderna Therapeutics, Inc. | Formulation and delivery of modified nucleoside, nucleotide, and nucleic acid compositions |
| FR3008986B1 (fr) * | 2013-07-25 | 2016-12-30 | Arkema France | Procede de controle de la periode caracterisant la morphologie obtenue a partir d'un melange de copolymere a blocs et de (co) polymeres de l'un des blocs |
| WO2015034925A1 (en) | 2013-09-03 | 2015-03-12 | Moderna Therapeutics, Inc. | Circular polynucleotides |
| US20160194625A1 (en) | 2013-09-03 | 2016-07-07 | Moderna Therapeutics, Inc. | Chimeric polynucleotides |
| US9109067B2 (en) * | 2013-09-24 | 2015-08-18 | Xerox Corporation | Blanket materials for indirect printing method with varying surface energies via amphiphilic block copolymers |
| WO2015051214A1 (en) | 2013-10-03 | 2015-04-09 | Moderna Therapeutics, Inc. | Polynucleotides encoding low density lipoprotein receptor |
| AU2015289583A1 (en) | 2014-07-16 | 2017-02-02 | Modernatx, Inc. | Chimeric polynucleotides |
| EP3171895A1 (en) | 2014-07-23 | 2017-05-31 | Modernatx, Inc. | Modified polynucleotides for the production of intrabodies |
| JP6538157B2 (ja) * | 2014-09-30 | 2019-07-03 | エルジー・ケム・リミテッド | ブロック共重合体 |
| TW201729836A (zh) | 2015-10-22 | 2017-09-01 | 現代公司 | 呼吸道融合病毒疫苗 |
| EP3718565B1 (en) | 2015-10-22 | 2022-04-27 | ModernaTX, Inc. | Respiratory virus vaccines |
| CA3002922A1 (en) | 2015-10-22 | 2017-04-27 | Modernatx, Inc. | Human cytomegalovirus vaccine |
| MA46024A (fr) | 2015-10-22 | 2019-07-03 | Modernatx Inc | Vaccin contre le virus de l'herpès simplex |
| MA46080A (fr) | 2015-10-22 | 2019-07-10 | Modernatx Inc | Vaccins à base d'acide nucléique contre le virus varicelle-zona (vzv) |
| MA46023A (fr) | 2015-10-22 | 2019-07-03 | Modernatx Inc | Vaccin contre le virus de la grippe à large spectre |
| SI3394093T1 (sl) | 2015-12-23 | 2022-05-31 | Modernatx, Inc. | Metode uporabe liganda OX40, ki kodira polinukleotid |
| WO2017120612A1 (en) | 2016-01-10 | 2017-07-13 | Modernatx, Inc. | Therapeutic mrnas encoding anti ctla-4 antibodies |
| US10600656B2 (en) | 2017-11-21 | 2020-03-24 | International Business Machines Corporation | Directed self-assembly for copper patterning |
| WO2019212889A1 (en) * | 2018-04-30 | 2019-11-07 | Trustees Of Tufts College | Chemoselective nanoporous membranes |
| WO2023161350A1 (en) | 2022-02-24 | 2023-08-31 | Io Biotech Aps | Nucleotide delivery of cancer therapy |
| EP4520345A1 (en) | 2023-09-06 | 2025-03-12 | Myneo Nv | Product |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6746825B2 (en) * | 2001-10-05 | 2004-06-08 | Wisconsin Alumni Research Foundation | Guided self-assembly of block copolymer films on interferometrically nanopatterned substrates |
| US8133534B2 (en) | 2004-11-22 | 2012-03-13 | Wisconsin Alumni Research Foundation | Methods and compositions for forming patterns with isolated or discrete features using block copolymer materials |
| US7553760B2 (en) | 2006-10-19 | 2009-06-30 | International Business Machines Corporation | Sub-lithographic nano interconnect structures, and method for forming same |
| US7521094B1 (en) * | 2008-01-14 | 2009-04-21 | International Business Machines Corporation | Method of forming polymer features by directed self-assembly of block copolymers |
| WO2010096363A2 (en) * | 2009-02-19 | 2010-08-26 | Arkema Inc. | Nanofabrication method |
| US8398868B2 (en) | 2009-05-19 | 2013-03-19 | International Business Machines Corporation | Directed self-assembly of block copolymers using segmented prepatterns |
| NL2006639A (en) | 2010-06-04 | 2011-12-06 | Asml Netherlands Bv | Self-assemblable polymer and method for use in lithography. |
-
2013
- 2013-02-11 WO PCT/US2013/025510 patent/WO2013120052A1/en not_active Ceased
- 2013-02-11 US US14/377,676 patent/US20150337068A1/en not_active Abandoned
- 2013-02-11 CN CN201380008212.8A patent/CN104105750A/zh active Pending
- 2013-02-11 EP EP13705364.1A patent/EP2812383A1/en not_active Withdrawn
- 2013-02-11 JP JP2014556769A patent/JP2015513788A/ja not_active Abandoned
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015507066A (ja) * | 2012-02-10 | 2015-03-05 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニーＥ．Ｉ．Ｄｕ Ｐｏｎｔ Ｄｅ Ｎｅｍｏｕｒｓ Ａｎｄ Ｃｏｍｐａｎｙ | 高度ｘジブロックコポリマーの製造、精製及び使用 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2013120052A1 (en) | 2013-08-15 |
| US20150337068A1 (en) | 2015-11-26 |
| EP2812383A1 (en) | 2014-12-17 |
| CN104105750A (zh) | 2014-10-15 |
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