JP2015510029A - 無膈膜電解槽 - Google Patents
無膈膜電解槽 Download PDFInfo
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 70
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims abstract description 65
- 238000010790 dilution Methods 0.000 claims abstract description 63
- 239000012895 dilution Substances 0.000 claims abstract description 63
- QWPPOHNGKGFGJK-UHFFFAOYSA-N hypochlorous acid Chemical compound ClO QWPPOHNGKGFGJK-UHFFFAOYSA-N 0.000 claims abstract description 35
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 claims abstract description 32
- 238000005868 electrolysis reaction Methods 0.000 claims abstract description 16
- 238000005192 partition Methods 0.000 claims description 23
- 238000007599 discharging Methods 0.000 claims description 11
- 230000002093 peripheral effect Effects 0.000 claims description 6
- 238000007865 diluting Methods 0.000 claims description 5
- 238000000354 decomposition reaction Methods 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 2
- 239000012528 membrane Substances 0.000 claims description 2
- 238000000638 solvent extraction Methods 0.000 claims description 2
- 239000011248 coating agent Substances 0.000 claims 1
- 230000002378 acidificating effect Effects 0.000 abstract description 13
- 239000000126 substance Substances 0.000 description 10
- 238000010586 diagram Methods 0.000 description 4
- 238000001816 cooling Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 206010021143 Hypoxia Diseases 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- XTEGARKTQYYJKE-UHFFFAOYSA-N chloric acid Chemical compound OCl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-N 0.000 description 1
- 229940005991 chloric acid Drugs 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- QBWCMBCROVPCKQ-UHFFFAOYSA-N chlorous acid Chemical compound OCl=O QBWCMBCROVPCKQ-UHFFFAOYSA-N 0.000 description 1
- 229940077239 chlorous acid Drugs 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007954 hypoxia Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002366 mineral element Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/24—Halogens or compounds thereof
- C25B1/26—Chlorine; Compounds thereof
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
- C02F1/46104—Devices therefor; Their operating or servicing
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
- C02F1/467—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction
- C02F1/4672—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction by electrooxydation
- C02F1/4674—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction by electrooxydation with halogen or compound of halogens, e.g. chlorine, bromine
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/22—Inorganic acids
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/02—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B15/00—Operating or servicing cells
- C25B15/08—Supplying or removing reactants or electrolytes; Regeneration of electrolytes
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
- C25B9/17—Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
- C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
- C02F1/46104—Devices therefor; Their operating or servicing
- C02F1/4618—Devices therefor; Their operating or servicing for producing "ionised" acidic or basic water
- C02F2001/46185—Devices therefor; Their operating or servicing for producing "ionised" acidic or basic water only anodic or acidic water, e.g. for oxidizing or sterilizing
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- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/46—Apparatus for electrochemical processes
- C02F2201/461—Electrolysis apparatus
- C02F2201/46105—Details relating to the electrolytic devices
- C02F2201/46155—Heating or cooling
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- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/46—Apparatus for electrochemical processes
- C02F2201/461—Electrolysis apparatus
- C02F2201/46105—Details relating to the electrolytic devices
- C02F2201/4618—Supplying or removing reactants or electrolyte
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Abstract
Description
密閉された内部空間を有する外装ケース22;
前記外装ケース22の内部に互いに対向するように離隔して配置される一対の電極板10,10’;及び
前記一対の電極板10,10’の間に配置されて前記外装ケース22の内部空間を電解空間16と、希釈空間24とに区画する区画部材12;を含んでなり、
前記電解空間16の一側には塩酸が投入される塩酸投入口18が形成され、
前記区画部材12には前記塩酸が電解分解されて発生される塩素ガスを前記希釈空間24に排出させる通孔20が形成され、
前記希釈空間24の一側には前記塩素ガスを溶解及び希釈するための希釈水が供給される希釈水供給口26が形成され、他側には前記塩素ガスが希釈水に溶解されて生成された次亜塩素酸水を外部に排出させる次亜塩素酸水排出口28が形成されるものであって、
前記電極板10,10’には前記希釈空間24に延長される延長部10a,10’aが形成され、
前記希釈空間24に流入される希釈水が前記電極板10,10’の延長部10a,10’aと接触されて電極板10,10’が冷却されることを特徴とする無膈膜電解槽が提供される。
密閉された内部空間を有する外装ケース22;
前記外装ケース22の内部に互いに対向するように離隔して配置される一対の電極板10,10’;及び
前記一対の電極板10,10’の周縁部に沿って電極板10,10’の間に配置され、前記外装ケース22の内部空間を電解空間16と希釈空間24とに区画する区画部材12;を含んでなり、
前記電解空間16の一側には塩酸が投入される塩酸投入口18が形成され、
前記区画部材12には前記塩酸が電解分解されて発生される塩素ガスを前記希釈空間24に排出させる通孔20が形成され、
前記希釈空間24の一側には前記塩素ガスを溶解及び希釈するための希釈水が供給される希釈水供給口26が形成され、他側には前記塩素ガスが希釈水に溶解されて生成された次亜塩素酸水を外部に排出させる次亜塩素酸水排出口28が形成され、
前記電極板10,10’は、前記外装ケース22の内側面から離隔するように配置され、前記希釈空間24が前記電極板10,10’を包むように前記電解空間16の周縁部に形成されることを特徴とする無膈膜電解槽が提供される。
ところが、次亜塩素酸水はpH5〜6.5の微酸性水準で最高の殺菌力を有する。したがって、微酸性の次亜塩素酸水を製造するためには次亜塩素酸水のpHを上げなければならない。しかし、次亜塩素酸水のpHを上げるために希釈水の供給量を増加させると、次亜塩素酸水の次亜塩素酸濃度が低下する問題が発生する。
Claims (4)
- 塩酸を電気分解するための無膈膜電解槽において、
密閉された内部空間を有する外装ケース22;
前記外装ケース22の内部に互いに対向するように離隔して配置される一対の電極板10,10’;及び
前記一対の電極板10,10’の間に配置されて前記外装ケース22の内部空間を電解空間16と、希釈空間24とに区画する区画部材12;を含んでなり、
前記電解空間16の一側には塩酸が投入される塩酸投入口18が形成され、
前記区画部材12には前記塩酸が電解分解されて発生される塩素ガスを前記希釈空間24に排出させる通孔20が形成され、
前記希釈空間24の一側には前記塩素ガスを溶解及び希釈するための希釈水が供給される希釈水供給口26が形成され、他側には前記塩素ガスが希釈水に溶解されて生成された次亜塩素酸水を外部に排出させる次亜塩素酸水排出口28が形成され、
前記電極板10,10’には前記希釈空間24に延長される延長部10a,10’aが形成され、
前記希釈空間24に流入される希釈水が前記電極板10,10’の延長部10a,10’aと接触されて電極板10,10’が冷却されることを特徴とする無膈膜電解槽。 - 前記希釈空間24は前記電解空間16の上側に形成され、前記区画部材12の前記電解空間16に向かう底面には塩素ガスを前記通孔20に排出されるようにガイドする傾斜面30が形成され、前記電解空間16の上端部が上方に向かうほど幅が狭くなる形状を有することを特徴とする請求項1に記載の無膈膜電解槽。
- 前記電極板10,10’の延長部10a,10’aは、前記外部ケース22の内側面から離隔するように形成されたことを特徴とする請求項1又は2に記載の無膈膜電解槽。
- 塩酸を電気分解するための無膈膜電解槽において、
密閉された内部空間を有する外装ケース22;
前記外装ケース22の内部に互いに対向するように離隔して配置される一対の電極板10,10’;及び
前記一対の電極板10,10’の周縁部に沿って電極板10,10’の間に配置され、前記外装ケース22の内部空間を電解空間16と希釈空間24とに区画する区画部材12;を含んでなり、
前記電解空間16の一側には塩酸が投入される塩酸投入口18が形成され、
前記区画部材12には前記塩酸が電解分解されて発生される塩素ガスを前記希釈空間24に排出させる通孔20が形成され、
前記希釈空間24の一側には前記塩素ガスを溶解及び希釈するための希釈水が供給される希釈水供給口26が形成され、他側には前記塩素ガスが希釈水に溶解されて生成された次亜塩素酸水を外部に排出させる次亜塩素酸水排出口28が形成され、
前記電極板10,10’は、前記外装ケース22の内側面から離隔するように配置され、前記希釈空間24が前記電極板10,10’を包むように前記電解空間16の周縁部に形成されることを特徴とする無膈膜電解槽。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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KR20120024844 | 2012-03-12 | ||
KR10-2012-0024844 | 2012-03-12 | ||
PCT/KR2013/001983 WO2013137624A1 (ko) | 2012-03-12 | 2013-03-12 | 무격막 전해조 |
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JP2015510029A true JP2015510029A (ja) | 2015-04-02 |
JP5817071B2 JP5817071B2 (ja) | 2015-11-18 |
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JP2014548697A Expired - Fee Related JP5817071B2 (ja) | 2012-03-12 | 2013-03-12 | 無膈膜電解槽 |
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US (1) | US20150027880A1 (ja) |
EP (1) | EP2826888B8 (ja) |
JP (1) | JP5817071B2 (ja) |
KR (2) | KR101360079B1 (ja) |
CN (1) | CN104080954B (ja) |
AU (1) | AU2013232938B2 (ja) |
DK (1) | DK2826888T3 (ja) |
ES (1) | ES2641370T3 (ja) |
SG (1) | SG11201405653TA (ja) |
WO (1) | WO2013137624A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2019189887A (ja) * | 2018-04-18 | 2019-10-31 | 株式会社微酸研 | 微酸性次亜塩素酸水の生成方法 |
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KR101268040B1 (ko) * | 2012-08-01 | 2013-06-03 | 한국코스믹라운드(주) | 미산성 차아염소산수 생성장치 |
CN103771636B (zh) * | 2014-01-17 | 2015-04-15 | 浙江大学 | 基于微酸性电解处理养殖水的处理方法 |
WO2015152611A1 (ko) * | 2014-03-31 | 2015-10-08 | (주)미라클인 | 용수배관 직결형 차아염소산 제조장치 |
WO2016163800A1 (ko) * | 2015-04-08 | 2016-10-13 | 박시춘 | 전해조가 구비된 급수펌프 |
CN105749308B (zh) * | 2016-03-03 | 2018-08-07 | 中国农业科学院农产品加工研究所 | 一种食用菌菌种液体培养基的灭菌方法 |
ZA201707084B (en) * | 2016-10-21 | 2018-11-28 | Ultrapure Hocl Pty Ltd | Hypochlorous acid |
CN107439589A (zh) * | 2017-07-21 | 2017-12-08 | 天津瑞艾化工贸易有限公司 | 无隔膜式电解槽制备的环保抗菌液 |
CN109423661A (zh) * | 2017-09-04 | 2019-03-05 | 株式会社北越 | 高浓度微酸性电解水生成方法及装置 |
CN108265313A (zh) * | 2018-03-27 | 2018-07-10 | 浙江长控电气科技有限公司 | 电解装置及用其电解稀食盐水制取酸性和碱性溶液的方法 |
KR101964791B1 (ko) * | 2018-12-10 | 2019-04-02 | 황순환 | 차아염소산 생성장치 |
KR101965212B1 (ko) * | 2019-01-23 | 2019-04-03 | 농업회사법인 주식회사 대율시스템 | 전기분해 장치 |
KR102300757B1 (ko) | 2019-09-24 | 2021-09-10 | 박시춘 | 격벽이 구비된 차아염소산수 제조용 무격막 전해장치 |
JP7483481B2 (ja) * | 2020-04-27 | 2024-05-15 | 森永乳業株式会社 | 電解水製造装置及び電解水の製造方法 |
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- 2013-03-12 WO PCT/KR2013/001983 patent/WO2013137624A1/ko active Application Filing
- 2013-03-12 US US14/373,686 patent/US20150027880A1/en not_active Abandoned
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JP2019189887A (ja) * | 2018-04-18 | 2019-10-31 | 株式会社微酸研 | 微酸性次亜塩素酸水の生成方法 |
JP7093541B2 (ja) | 2018-04-18 | 2022-06-30 | 株式会社微酸研 | 微酸性次亜塩素酸水の生成方法 |
Also Published As
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KR101360079B1 (ko) | 2014-02-21 |
KR20130105466A (ko) | 2013-09-25 |
ES2641370T3 (es) | 2017-11-08 |
AU2013232938A1 (en) | 2014-10-02 |
CN104080954B (zh) | 2016-07-20 |
EP2826888A4 (en) | 2015-11-25 |
KR20130108234A (ko) | 2013-10-02 |
SG11201405653TA (en) | 2014-11-27 |
US20150027880A1 (en) | 2015-01-29 |
WO2013137624A1 (ko) | 2013-09-19 |
EP2826888B1 (en) | 2017-07-12 |
JP5817071B2 (ja) | 2015-11-18 |
EP2826888A1 (en) | 2015-01-21 |
EP2826888B8 (en) | 2017-08-30 |
KR101363346B1 (ko) | 2014-02-14 |
DK2826888T3 (en) | 2017-10-16 |
CN104080954A (zh) | 2014-10-01 |
AU2013232938B2 (en) | 2015-09-17 |
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