JP2015501552A5 - - Google Patents
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- JP2015501552A5 JP2015501552A5 JP2014540338A JP2014540338A JP2015501552A5 JP 2015501552 A5 JP2015501552 A5 JP 2015501552A5 JP 2014540338 A JP2014540338 A JP 2014540338A JP 2014540338 A JP2014540338 A JP 2014540338A JP 2015501552 A5 JP2015501552 A5 JP 2015501552A5
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- JP
- Japan
- Prior art keywords
- deflection element
- beam deflection
- irradiance
- location
- distribution along
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 230000003247 decreasing effect Effects 0.000 description 1
- 210000001747 pupil Anatomy 0.000 description 1
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/EP2012/004212 WO2014056513A1 (en) | 2012-10-08 | 2012-10-08 | Illumination system of a microlithographic projection exposure apparatus |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015501552A JP2015501552A (ja) | 2015-01-15 |
| JP2015501552A5 true JP2015501552A5 (enExample) | 2015-08-13 |
| JP5864771B2 JP5864771B2 (ja) | 2016-02-17 |
Family
ID=47178539
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014540338A Active JP5864771B2 (ja) | 2012-10-08 | 2012-10-08 | マイクロリソグラフィ投影露光装置の照明系 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9261695B2 (enExample) |
| JP (1) | JP5864771B2 (enExample) |
| KR (1) | KR101591155B1 (enExample) |
| TW (1) | TWI536122B (enExample) |
| WO (1) | WO2014056513A1 (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106502055B (zh) * | 2015-09-06 | 2019-04-19 | 中芯国际集成电路制造(上海)有限公司 | 光刻失焦的检测方法 |
| CN116414010B (zh) * | 2023-04-06 | 2024-04-26 | 上海镭望光学科技有限公司 | 一种自由光瞳产生装置及其产生自由光瞳照明的方法 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4401060B2 (ja) * | 2001-06-01 | 2010-01-20 | エーエスエムエル ネザーランズ ビー．ブイ． | リトグラフ装置、およびデバイス製造方法 |
| KR100480620B1 (ko) * | 2002-09-19 | 2005-03-31 | 삼성전자주식회사 | 마이크로 미러 어레이를 구비한 노광 장치 및 이를 이용한노광 방법 |
| JP4717813B2 (ja) * | 2003-09-12 | 2011-07-06 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィ投影露光設備のための照明系 |
| US20060087634A1 (en) * | 2004-10-25 | 2006-04-27 | Brown Jay M | Dynamic illumination uniformity and shape control for lithography |
| US8937706B2 (en) * | 2007-03-30 | 2015-01-20 | Asml Netherlands B.V. | Lithographic apparatus and method |
| KR20180072841A (ko) | 2007-11-06 | 2018-06-29 | 가부시키가이샤 니콘 | 조명 광학계, 노광 장치 및 노광 방법 |
| DE102008054582A1 (de) | 2007-12-21 | 2009-07-09 | Carl Zeiss Smt Ag | Mikrolithographische Projektionsbelichtungsanlage |
| CN105606344B (zh) * | 2008-05-28 | 2019-07-30 | 株式会社尼康 | 照明光学系统、照明方法、曝光装置以及曝光方法 |
| EP2202580B1 (en) * | 2008-12-23 | 2011-06-22 | Carl Zeiss SMT GmbH | Illumination system of a microlithographic projection exposure apparatus |
| NL2004429A (en) * | 2009-08-25 | 2011-02-28 | Asml Netherlands Bv | Illumination system, lithographic apparatus and method of adjusting an illumination mode. |
| US8335999B2 (en) * | 2010-06-11 | 2012-12-18 | Orbotech Ltd. | System and method for optical shearing |
| DE102010030089A1 (de) * | 2010-06-15 | 2011-12-15 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die Mikro-Lithografie sowie Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik |
| WO2012034571A1 (en) * | 2010-09-14 | 2012-03-22 | Carl Zeiss Smt Gmbh | Illumination system of a microlithographic projection exposure apparatus |
| JP2012099686A (ja) * | 2010-11-04 | 2012-05-24 | Nikon Corp | 光源形成方法、露光方法、及びデバイス製造方法 |
| JP6016169B2 (ja) * | 2011-01-29 | 2016-10-26 | カール・ツァイス・エスエムティー・ゲーエムベーハー | マイクロリソグラフィ投影露光装置の照明系 |
| JP6120001B2 (ja) * | 2011-10-24 | 2017-04-26 | 株式会社ニコン | 照明光学系、露光装置、およびデバイス製造方法 |
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2012
- 2012-10-08 JP JP2014540338A patent/JP5864771B2/ja active Active
- 2012-10-08 KR KR1020137026834A patent/KR101591155B1/ko active Active
- 2012-10-08 WO PCT/EP2012/004212 patent/WO2014056513A1/en not_active Ceased
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2013
- 2013-09-12 US US14/025,216 patent/US9261695B2/en active Active
- 2013-10-04 TW TW102135976A patent/TWI536122B/zh active