JP2015201749A - Crystal vibration element and method of manufacturing the same - Google Patents

Crystal vibration element and method of manufacturing the same Download PDF

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JP2015201749A
JP2015201749A JP2014079363A JP2014079363A JP2015201749A JP 2015201749 A JP2015201749 A JP 2015201749A JP 2014079363 A JP2014079363 A JP 2014079363A JP 2014079363 A JP2014079363 A JP 2014079363A JP 2015201749 A JP2015201749 A JP 2015201749A
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thin
base
extended
crystal resonator
vibration element
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JP6279386B2 (en
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井上 憲司
Kenji Inoue
憲司 井上
孝宏 尾賀
Takahiro Oga
孝宏 尾賀
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Kyocera Crystal Device Corp
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Abstract

PROBLEM TO BE SOLVED: To suppress creeping-up of a conductive adhesive in a slit of a crystal vibration element including a base, a vibration part and a slit.SOLUTION: A base 11 has an upper surface 111 and a lower surface 112 in the thickness direction, where the lower surface 112 is fixed to an element mounting member 32 by a conductive adhesive 31. Vibration arms 12a, 12b are extending from the base 11. Slits 16a, 16b are formed in the outer periphery of the base 11, so as to be depressed from the upper surface 111 and lower surface 112 in the thickness direction. A virtual surface extending the upper surface 111 is the extension upper surface, and a virtual surface extending the lower surface 112 is the extension lower surface. Thin wall portions 17a, 17b are provided, respectively, in the slits 16a, 16b, and projecting while separated from at least one of the extension upper surface and extension lower surface.

Description

本発明は、例えば基準信号源やクロック信号源に用いられる水晶振動素子、及びその製造方法に関する。以下、水晶振動素子の一例として、音叉型屈曲水晶振動素子(以下「振動素子」と略称する。)について説明する。   The present invention relates to a crystal resonator element used for, for example, a reference signal source and a clock signal source, and a manufacturing method thereof. Hereinafter, a tuning fork-type bending quartz crystal vibrating element (hereinafter abbreviated as “vibrating element”) will be described as an example of a quartz crystal vibrating element.

図8は、関連技術1の振動素子を示す斜視図である。以下、この図面に基づき説明する。   FIG. 8 is a perspective view showing a vibration element of Related Art 1. FIG. Hereinafter, description will be given based on this drawing.

本関連技術1の振動素子210は、基部211と、振動腕部212a,212bと、切れ込み部216a,216bとを備えている。このような構造の振動素子210は、例えば特許文献1に開示されている。   The vibration element 210 of the related technology 1 includes a base 211, vibration arm portions 212a and 212b, and cut portions 216a and 216b. The vibration element 210 having such a structure is disclosed in Patent Document 1, for example.

基部211は、上面241側及び下面242側から見て四角形状であり、下面242が導電性接着剤231によって素子搭載部材(図示せず)に固定される。振動腕部212a,212bは、基部211から延設され、それぞれ溝部213a,213bが形成されている。切れ込み部216a,216bは、基部211の上面241から下面242までを貫いており、基部211の対向側面にそれぞれ形成されている。   The base 211 has a rectangular shape when viewed from the upper surface 241 side and the lower surface 242 side, and the lower surface 242 is fixed to an element mounting member (not shown) by the conductive adhesive 231. The vibrating arm portions 212a and 212b are extended from the base portion 211 and formed with groove portions 213a and 213b, respectively. The notches 216a and 216b penetrate from the upper surface 241 to the lower surface 242 of the base 211, and are formed on opposite side surfaces of the base 211, respectively.

基部211及び振動腕部212a,212bは、水晶振動片215からなる。振動素子210は、水晶振動片215の他に、パッド電極221a,221b、励振電極222a,222b、周波数調整用金属膜223a,223b、配線パターン224a,224bなども備えている。   The base portion 211 and the vibrating arm portions 212 a and 212 b are made of a crystal vibrating piece 215. The vibration element 210 includes pad electrodes 221a and 221b, excitation electrodes 222a and 222b, frequency adjustment metal films 223a and 223b, and wiring patterns 224a and 224b in addition to the crystal vibrating piece 215.

ここで、切れ込み部216a,216bは、導電性接着剤231の付着面積を増やすことにより、導電性接着剤231と振動素子210との接着強度を高めている。   Here, the notches 216 a and 216 b increase the adhesion strength between the conductive adhesive 231 and the vibration element 210 by increasing the adhesion area of the conductive adhesive 231.

WO2006/114936号公報WO2006 / 114936

しかしながら、関連技術1の振動素子210には、次のような問題があった。   However, the vibration element 210 of Related Art 1 has the following problems.

例えば導電性接着剤231の供給量が多くなった場合などに、導電性接着剤231が表面張力によって切れ込み部216a,216bを這い上がって上面241に達することがあった。上面241に達した導電性接着剤231は、配線パターン224a,224bをショートさせたり、実装時の吸着ピンを介して他の振動素子の配線をショートさせたりする原因となる。   For example, when the supply amount of the conductive adhesive 231 increases, the conductive adhesive 231 may scoop up the notches 216a and 216b due to surface tension and reach the upper surface 241. The conductive adhesive 231 that has reached the upper surface 241 causes the wiring patterns 224a and 224b to be short-circuited or the wiring of other vibration elements to be short-circuited via the suction pins at the time of mounting.

近年、振動素子10の小型化の進展に伴い、切れ込み部216a,216bも微細化することにより、導電性接着剤231が這い上がりやすくなっているので、この問題もますます深刻化している。   In recent years, with the progress of miniaturization of the vibration element 10, the notches 216a and 216b are also miniaturized, so that the conductive adhesive 231 is likely to crawl up, and this problem becomes more serious.

そこで、本発明の目的は、切れ込み部における導電性接着剤の這い上がりを抑制し得る、振動素子及びその製造方法を提供することにある。   Therefore, an object of the present invention is to provide a vibration element and a method for manufacturing the same that can suppress the creeping of the conductive adhesive in the cut portion.

本発明に係る振動素子は、
厚さ方向に上面及び下面を有するとともに、この下面が導電性接着剤によって素子搭載部材に固定される基部と、
この基部から延設された振動部と、
前記上面と前記下面とから前記厚さ方向に窪んだ状態になるように前記基部の外周に形成された切れ込み部と、
を備えた振動素子において、
前記上面が延長された仮想的な面を延長上面とし、前記下面が延長された仮想的な面を延長下面としたとき、
前記切れ込み部内に設けられ、前記延長上面及び前記延長下面の少なくとも一方から離れた状態で突出する薄肉部を、
更に備えたことを特徴とする。
The vibration element according to the present invention is
A base having an upper surface and a lower surface in the thickness direction, and the lower surface fixed to the element mounting member by a conductive adhesive;
A vibrating portion extending from the base, and
A notch formed on the outer periphery of the base so as to be recessed in the thickness direction from the upper surface and the lower surface;
In a vibration element comprising
When the virtual surface with the upper surface extended is an extended upper surface, and the virtual surface with the lower surface extended is an extended lower surface,
A thin portion that is provided in the notch and protrudes away from at least one of the extended upper surface and the extended lower surface;
It is further provided with the feature.

本発明に係る製造方法は、
前記振動部に前記延設方向に沿って溝部が形成された本発明に係る振動素子を製造する方法であって、
前記溝部を形成する際に、同時に前記切れ込み部及び前記薄肉部を形成する、
ことを特徴とする。
The manufacturing method according to the present invention includes:
A method of manufacturing a vibration element according to the present invention in which a groove is formed along the extending direction in the vibration part,
When forming the groove portion, simultaneously form the cut portion and the thin portion,
It is characterized by that.

本発明によれば、切れ込み部内で突出する薄肉部を設けたことにより、切れ込み部内を這い上がろうとする導電性接着剤に対して薄肉部が障壁となるので、切れ込み部における導電性接着剤の這い上がりを抑制できる。   According to the present invention, by providing the thin wall portion that protrudes in the cut portion, the thin wall portion serves as a barrier against the conductive adhesive that attempts to scoop up the cut portion. Crawling can be suppressed.

実施形態1の振動素子を示す斜視図である。FIG. 3 is a perspective view illustrating a vibration element according to the first embodiment. 図2[A]は図1におけるIIa−IIa線断面図であり、図2[B]は図1におけるIIb−IIb線断面図であり、図2[C]は図1の振動素子を素子搭載部材に実装した状態を示す概略断面図である。2 [A] is a cross-sectional view taken along the line IIa-IIa in FIG. 1, FIG. 2 [B] is a cross-sectional view taken along the line IIb-IIb in FIG. 1, and FIG. It is a schematic sectional drawing which shows the state mounted in the member. 実施形態1の変形例における切れ込み部及び薄肉部を示す斜視図である。It is a perspective view which shows the cut | notch part and thin part in the modification of Embodiment 1. FIG. 実施形態2の製造方法における各工程を示す断面図であり、図4[A]、図4[B]、図4[C]の順に工程が進行する。It is sectional drawing which shows each process in the manufacturing method of Embodiment 2, and a process progresses in order of FIG. 4 [A], FIG. 4 [B], and FIG. 4 [C]. 実施形態2の製造方法における各工程を示す断面図であり、図5[D]、図5[E]、図5[F]の順に工程が進行する。It is sectional drawing which shows each process in the manufacturing method of Embodiment 2, and a process progresses in order of FIG. 5 [D], FIG. 5 [E], and FIG. 5 [F]. 実施形態2の製造方法における各工程を示す断面図であり、図6[G]、図6[H]、図6[I]の順に工程が進行する。It is sectional drawing which shows each process in the manufacturing method of Embodiment 2, and a process progresses in order of FIG. 6 [G], FIG. 6 [H], and FIG. 6 [I]. 実施形態2の製造方法における各工程を示す断面図であり、図7[J]、図7[K]、図7[L]の順に工程が進行する。It is sectional drawing which shows each process in the manufacturing method of Embodiment 2, and a process progresses in order of FIG. 7 [J], FIG. 7 [K], and FIG. 7 [L]. 関連技術の振動素子を示す斜視図である。It is a perspective view which shows the vibration element of related technology.

以下、添付図面を参照しながら、本発明を実施するための形態(以下「実施形態」という。)について説明する。なお、本明細書及び図面において、実質的に同一の構成要素については同一の符号を用いる。また、図面に描かれた形状は、当業者が理解しやすいように描かれているため、実際の寸法及び比率とは必ずしも一致していない。   DESCRIPTION OF EMBODIMENTS Hereinafter, embodiments for carrying out the present invention (hereinafter referred to as “embodiments”) will be described with reference to the accompanying drawings. In the present specification and drawings, the same reference numerals are used for substantially the same components. Moreover, since the shape drawn on drawing is drawn so that those skilled in the art can understand easily, it does not necessarily correspond with an actual dimension and ratio.

図1は、実施形態1の振動素子を示す平面図である。図2[A]は、図1におけるIIa−IIa線断面図である。図2[B]は、図1におけるIIb−IIb線断面図である。図2[C]は、図1の振動素子を素子搭載部材に実装した状態を示す概略断面図である。以下、これらの図面に基づき説明する。なお、延長上面113、延長下面114、薄肉部上面171及び薄肉部下面172については、図2[B]にのみ符合を付す。   FIG. 1 is a plan view illustrating the vibration element according to the first embodiment. 2A is a cross-sectional view taken along line IIa-IIa in FIG. 2B is a cross-sectional view taken along line IIb-IIb in FIG. FIG. 2C is a schematic cross-sectional view illustrating a state where the vibration element of FIG. 1 is mounted on an element mounting member. Hereinafter, description will be given based on these drawings. Note that the extension upper surface 113, the extension lower surface 114, the thin-walled upper surface 171 and the thin-walled lower surface 172 are denoted by reference numerals only in FIG.

本実施形態1の振動素子10は、基部11と、振動部としての二本の振動腕部12a,12bと、切れ込み部16a,16bと、薄肉部17a,17bとを備えている。基部11は、厚さ方向に上面111及び下面112を有するとともに、下面112が導電性接着剤31によって素子搭載部材32に固定される。振動腕部12a,12bは、基部11から延設されている。切れ込み部16a,16bは、上面111と下面112とから厚さ方向に窪んだ状態になるように、基部11の外周に形成されている。上面111が延長された仮想的な面を延長上面113とし、下面112が延長された仮想的な面を延長下面114とする。このとき、薄肉部17a,17bは、それぞれ切れ込み部16a,16b内に設けられ、延長上面113及び延長下面114の少なくとも一方から離れた状態で突出する。   The vibration element 10 according to the first embodiment includes a base 11, two vibration arm portions 12a and 12b as vibration portions, cut portions 16a and 16b, and thin portions 17a and 17b. The base 11 has an upper surface 111 and a lower surface 112 in the thickness direction, and the lower surface 112 is fixed to the element mounting member 32 by the conductive adhesive 31. The vibrating arm portions 12 a and 12 b are extended from the base portion 11. The notches 16a and 16b are formed on the outer periphery of the base 11 so as to be recessed from the upper surface 111 and the lower surface 112 in the thickness direction. A virtual surface with the upper surface 111 extended is referred to as an extended upper surface 113, and a virtual surface with the lower surface 112 extended is referred to as an extended lower surface 114. At this time, the thin portions 17a and 17b are provided in the cut portions 16a and 16b, respectively, and protrude in a state separated from at least one of the extended upper surface 113 and the extended lower surface 114.

薄肉部17a,17bは薄肉部上面171及び薄肉部下面172を有し、薄肉部上面171は延長上面113から離れた面であり、薄肉部下面172は延長下面114から離れた面である。基部11は、上面111側及び下面112側から見て四角形状である。切れ込み部16a,16bは、基部11の振動腕部12a,12b側の反対側の頂点11a,11bを含む部分にそれぞれ設けられている。   The thin-walled portions 17 a and 17 b have a thin-walled upper surface 171 and a thin-walled lower surface 172. The thin-walled upper surface 171 is a surface away from the extended upper surface 113, and the thin-walled lower surface 172 is a surface away from the extended lower surface 114. The base 11 has a rectangular shape when viewed from the upper surface 111 side and the lower surface 112 side. The notches 16a and 16b are provided in portions including the apexes 11a and 11b on the opposite side of the base 11 on the vibrating arm portions 12a and 12b side, respectively.

振動腕部12a,12bは、それぞれ基部11から同じ方向に延設され、その延設方向に沿って溝部13a,13bが設けられている。基部11及び振動腕部12a,12bは、水晶振動片15からなる。振動素子10は、水晶振動片15の他に、パッド電極21a,21b、励振電極22a,22b、周波数調整用金属膜23a,23b、配線パターン24a,24bなども備えている。   The vibrating arm portions 12a and 12b are extended from the base portion 11 in the same direction, and groove portions 13a and 13b are provided along the extending direction. The base 11 and the vibrating arm portions 12 a and 12 b are made of a crystal vibrating piece 15. In addition to the crystal vibrating piece 15, the vibration element 10 includes pad electrodes 21a and 21b, excitation electrodes 22a and 22b, frequency adjusting metal films 23a and 23b, wiring patterns 24a and 24b, and the like.

次に、振動素子10の構成について更に詳しく説明する。   Next, the configuration of the vibration element 10 will be described in more detail.

基部11は、平面視略四角形の平板となっている。水晶振動片15は、基部11と振動腕部12a,12bとが一体となって音叉形状をなしており、成膜技術、フォトリソグラフィ技術、ウェットエッチング技術によって製造される。   The base 11 is a flat plate having a substantially rectangular shape in plan view. The quartz crystal resonator element 15 has a tuning fork shape in which the base 11 and the vibrating arms 12a and 12b are integrated, and is manufactured by a film forming technique, a photolithography technique, and a wet etching technique.

溝部13a,13bは、振動腕部12aの表裏面に二本ずつ及び振動腕部12bの表裏面に二本ずつ、基部11との境界部分から振動腕部12a,12bの先端に向って、振動腕部12a,12bの長さ方向と平行に所定の長さで設けられる。なお、溝部13a,13bは、本実施形態1では振動腕部12aの表裏面に二本ずつ及び振動腕部12bの表裏面に二本ずつ設けられているが、それらの本数に制限はなく、例えば振動腕部12aの表裏面に一本ずつ及び振動腕部12bの表裏面に一本ずつ設けてもよく、また、表裏のどちらか片面にのみ設けてもよい。   The groove portions 13a, 13b vibrate from the boundary portion with the base 11 toward the tips of the vibrating arm portions 12a, 12b, two on the front and back surfaces of the vibrating arm portion 12a and two on the front and back surfaces of the vibrating arm portion 12b. The arm portions 12a and 12b are provided with a predetermined length parallel to the length direction of the arms 12a and 12b. In the first embodiment, two grooves 13a and 13b are provided on the front and back surfaces of the vibrating arm 12a and two grooves on the front and back surfaces of the vibrating arm 12b. However, the number of the grooves 13a and 13b is not limited. For example, one may be provided on the front and back surfaces of the vibrating arm portion 12a and one on each of the front and back surfaces of the vibrating arm portion 12b, or may be provided on only one side of the front and back surfaces.

振動腕部12aには、水晶を挟んで対向する平面同士が同極となるように、両側面に励振電極22aが設けられ、表裏面の溝部13aの内側に励振電極22bが設けられる。同様に、振動腕部12bには、水晶を挟んで対向する平面同士が同極となるように、両側面に励振電極22bが設けられ、表裏面の溝部13bの内側に励振電極22aが設けられる。したがって、振動腕部12aにおいては両側面に設けられた励振電極22aと溝部13a内に設けられた励振電極22bとが異極同士となり、振動腕部12bにおいては両側面に設けられた励振電極22bと溝部13b内に設けられた励振電極22aとが異極同士となる。   The vibrating arm 12a is provided with excitation electrodes 22a on both side surfaces so that the planes facing each other across the crystal have the same polarity, and an excitation electrode 22b is provided inside the groove 13a on the front and back surfaces. Similarly, the vibrating arm portion 12b is provided with excitation electrodes 22b on both side surfaces so that the planes facing each other across the crystal have the same polarity, and the excitation electrode 22a is provided inside the groove portion 13b on the front and back surfaces. . Accordingly, in the vibrating arm portion 12a, the excitation electrode 22a provided on both side surfaces and the excitation electrode 22b provided in the groove portion 13a have different polarities, and in the vibrating arm portion 12b, the excitation electrode 22b provided on both side surfaces. And the excitation electrode 22a provided in the groove 13b have different polarities.

基部11には、パッド電極21a,21bと配線パターン24a,24bとが設けられる。配線パターン24aはパッド電極21aと励振電極22aとの間を電気的に接続し、配線パターン24bは、パッド電極21bと励振電極22bとの間をそれぞれ電気的に接続する。パッド電極21a、励振電極22a、周波数調整用金属膜23a及び配線パターン24aは、互いに電気的に導通している。パッド電極21b、励振電極22b、周波数調整用金属膜23b及び配線パターン24bも、互いに電気的に導通している。   The base 11 is provided with pad electrodes 21a and 21b and wiring patterns 24a and 24b. The wiring pattern 24a electrically connects the pad electrode 21a and the excitation electrode 22a, and the wiring pattern 24b electrically connects the pad electrode 21b and the excitation electrode 22b. The pad electrode 21a, the excitation electrode 22a, the frequency adjusting metal film 23a, and the wiring pattern 24a are electrically connected to each other. The pad electrode 21b, the excitation electrode 22b, the frequency adjusting metal film 23b, and the wiring pattern 24b are also electrically connected to each other.

振動素子10は、パッド電極21a,21b及び導電性接着剤31を介して、素子搭載部材32側のパッド電極33に固定されると同時に電気的に接続される。   The vibration element 10 is fixed and electrically connected to the pad electrode 33 on the element mounting member 32 side via the pad electrodes 21 a and 21 b and the conductive adhesive 31.

水晶の結晶は三方晶系である。水晶の頂点を通る結晶軸をZ軸、Z軸に垂直な平面内の稜線を結ぶ三つの結晶軸をX軸、X軸及びZ軸に直交する座標軸をY軸とする。ここで、これらのX軸、Y軸及びZ軸からなる座標系をX軸を中心として±5度の範囲で回転させたときの回転後のY軸及びZ軸を、それぞれY’軸及びZ’軸とする。この場合、本実施形態1では、二本の振動腕部12a,12bの延設方向がY’軸の方向であり、二本の振動腕部12a,12bの並ぶ方向がX軸の方向である。   Quartz crystals are trigonal. A crystal axis passing through the crystal apex is defined as a Z axis, three crystal axes connecting ridge lines in a plane perpendicular to the Z axis are defined as an X axis, and a coordinate axis orthogonal to the X axis and the Z axis is defined as a Y axis. Here, when the coordinate system consisting of these X, Y, and Z axes is rotated within a range of ± 5 degrees around the X axis, the rotated Y axis and Z axis are respectively represented as Y ′ axis and Z axis. 'As axis. In this case, in the first embodiment, the extending direction of the two vibrating arm portions 12a and 12b is the Y′-axis direction, and the direction in which the two vibrating arm portions 12a and 12b are arranged is the X-axis direction. .

次に、振動素子10の動作を説明する。音叉型の振動素子10を振動させる場合、パッド電極21a,21bに交番電圧を印加する。印加後のある電気的状態を瞬間的に捉えると、振動腕部12aの表裏の溝部13aに設けられた励振電極22bはプラス電位となり、振動腕部12aの両側面に設けられた励振電極22aはマイナス電位となり、プラスからマイナスに電界が生じる。このとき、振動腕部12bの表裏の溝部13bに設けられた励振電極22aはマイナス電位となり、振動腕部12bの両側面に設けられた励振電極22bはプラス電位となり、振動腕部12aに生じた極性とは反対の極性となり、プラスからマイナスに電界が生じる。この交番電圧で生じた電界によって、振動腕部12a,12bに伸縮現象が生じ、所定の共振周波数の屈曲振動モードが得られる。   Next, the operation of the vibration element 10 will be described. When the tuning fork type vibration element 10 is vibrated, an alternating voltage is applied to the pad electrodes 21a and 21b. When an electrical state after application is instantaneously captured, the excitation electrodes 22b provided in the groove portions 13a on the front and back of the vibrating arm portion 12a have a positive potential, and the excitation electrodes 22a provided on both side surfaces of the vibrating arm portion 12a are A negative electric potential is generated, and an electric field is generated from positive to negative. At this time, the excitation electrode 22a provided in the groove 13b on the front and back sides of the vibrating arm portion 12b has a negative potential, and the excitation electrode 22b provided on both side surfaces of the vibrating arm portion 12b has a positive potential, and is generated in the vibrating arm portion 12a. The polarity is opposite to the polarity, and an electric field is generated from plus to minus. The electric field generated by the alternating voltage causes a stretching phenomenon in the vibrating arm portions 12a and 12b, and a flexural vibration mode having a predetermined resonance frequency is obtained.

次に、振動素子10の作用及び効果について説明する。   Next, the operation and effect of the vibration element 10 will be described.

(1)本実施形態1によれば、切れ込み部16a,16b内で突出する薄肉部17a,17bを設けたことにより、切れ込み部16a,16b内を這い上がろうとする導電性接着剤31に対して薄肉部17a,17bが障壁となるので、切れ込み部16a,16bにおける導電性接着剤31の這い上がりを抑制できる。   (1) According to the first embodiment, by providing the thin-walled portions 17a and 17b protruding in the cut portions 16a and 16b, the conductive adhesive 31 that tries to scoop up the cut portions 16a and 16b. Since the thin portions 17a and 17b serve as a barrier, the creeping of the conductive adhesive 31 at the cut portions 16a and 16b can be suppressed.

また、切れ込み部16a,16b内で突出する薄肉部17a,17bを設けたことにより、切れ込み部16a,16bだけを設けた場合に比べて、導電性接着剤31の付着面積を更に増やすことができるので、導電性接着剤31と振動素子10との接着強度を更に高めることができる。   In addition, by providing the thin portions 17a and 17b protruding in the cut portions 16a and 16b, the adhesion area of the conductive adhesive 31 can be further increased compared to the case where only the cut portions 16a and 16b are provided. Therefore, the adhesive strength between the conductive adhesive 31 and the vibration element 10 can be further increased.

(2)薄肉部上面171が延長上面113から離れた面であり、薄肉部下面172が延長下面114から離れた面である場合は、基部11を上下対称に形成できるので、基部11の上面111及び下面112のどちらを素子搭載部材32に接着しても同様の振動特性が得られる。したがって、上面111及び下面112を確認する手間を省けるので、実装工程を簡易化できる。   (2) When the thin-walled upper surface 171 is a surface away from the extended upper surface 113 and the thin-walled lower surface 172 is a surface away from the extended lower surface 114, the base 11 can be formed vertically symmetrical, so the upper surface 111 of the base 11 The same vibration characteristic can be obtained regardless of which of the lower surface 112 and the lower surface 112 is bonded to the element mounting member 32. Therefore, the trouble of checking the upper surface 111 and the lower surface 112 can be saved, so that the mounting process can be simplified.

(3)関連技術1では、図8に示すように、切れ込み部216aが基部211の対向側面に設けられていることにより、導電性接着剤231の這い上がりの確認作業が−X軸方向からに限られる。これに対し、本実施形態1では、図1に示すように、切れ込み部16aが頂点11aを含む部分に設けられていることにより、導電性接着剤231の這い上がりの確認作業が−X軸方向からY’軸方向までの範囲であればどこからでも可能となる。したがって、本実施形態1によれば、切れ込み部16a,16bにおける導電性接着剤31の這い上がりの確認が容易となる。   (3) In the related art 1, as shown in FIG. 8, the notch portion 216a is provided on the opposite side surface of the base portion 211, so that the work for confirming the scooping up of the conductive adhesive 231 is performed from the −X axis direction. Limited. On the other hand, in the first embodiment, as shown in FIG. 1, the notch portion 16a is provided in the portion including the apex 11a, so that the confirmation work of scooping up the conductive adhesive 231 is performed in the −X axis direction. To Y ′ axis direction is possible from anywhere. Therefore, according to the first embodiment, it is easy to confirm the scooping of the conductive adhesive 31 in the cut portions 16a and 16b.

次に、実施形態1の変形例における切れ込み部及び薄肉部を、図3に基づき説明する。   Next, the notch part and thin part in the modification of Embodiment 1 are demonstrated based on FIG.

図3[A]には、変形例Aにおける切れ込み部66a及び薄肉部67aが示されている。薄肉部67aは、頂点(図1における頂点11a)に相当する部分が除去されており、平面視略三角形状の平板になっている。図1に示すように、実施形態1における薄肉部17aでは、頂点11aが尖っているため、先端が欠けるおそれがある。これに対し、変形例Aにおける薄肉部67aでは、頂点に相当する部分が除去されていることにより、先端が欠けるおそれがないので、歩留りを向上できる。   FIG. 3A shows the cut portion 66a and the thin portion 67a in the modified example A. The thin-walled portion 67a has a portion corresponding to the vertex (vertex 11a in FIG. 1) removed, and is a flat plate having a substantially triangular shape in plan view. As shown in FIG. 1, in the thin part 17a in Embodiment 1, since the vertex 11a is sharp, there exists a possibility that a front-end | tip may be missing. On the other hand, in the thin-walled portion 67a in the modified example A, since the portion corresponding to the apex is removed, there is no possibility that the tip is lost, so that the yield can be improved.

図3[B]には、変形例Bにおける切れ込み部66b及び薄肉部67bが示されている。薄肉部67bは、頂点(図1における頂点11a)に相当する部分が除去されており、平面視略三角状(三辺のうち一辺が円弧状)の平板になっている。図1に示すように、実施形態1における薄肉部17aでは、頂点11aが尖っているため、先端が欠けるおそれがある。これに対し、変形例Bにおける薄肉部67bでは、頂点に相当する部分が除去されていることにより、先端が欠けるおそれがないので、歩留りを向上できる。   FIG. 3B shows the cut portion 66b and the thin portion 67b in the modified example B. The thin-walled portion 67b has a portion corresponding to the apex (vertex 11a in FIG. 1) removed, and is a flat plate having a substantially triangular shape (one side of which is an arc) in plan view. As shown in FIG. 1, in the thin part 17a in Embodiment 1, since the vertex 11a is sharp, there exists a possibility that a front-end | tip may be missing. On the other hand, in the thin-walled portion 67b in the modified example B, since the portion corresponding to the apex is removed, there is no possibility that the tip is lost, so that the yield can be improved.

図3[C]には、変形例Cにおける切れ込み部66c及び薄肉部67cが示されている。薄肉部67cは、図2[B]で言えば延長下面114と薄肉部下面172とが一致した構造である。   FIG. 3C shows a cut portion 66c and a thin portion 67c in Modification C. In FIG. 2B, the thin portion 67c has a structure in which the extended lower surface 114 and the thin portion lower surface 172 coincide.

図3[D]には、変形例Dにおける切れ込み部66d及び薄肉部67dが示されている。薄肉部67dは、図2[B]で言えば延長上面113と薄肉部上面171とが一致した構造である。   FIG. 3D shows a cut portion 66d and a thin portion 67d in Modification D. The thin-walled portion 67d has a structure in which the extended upper surface 113 and the thin-walled upper surface 171 coincide with each other in FIG. 2B.

図3[E]には、変形例Eにおける切れ込み部66e及び薄肉部67eが示されている。切れ込み部66eは、図1で言えば基部11の対向側面に形成されている。   FIG. 3E shows a cut portion 66e and a thin-walled portion 67e in Modification E. The notch 66e is formed on the opposite side surface of the base 11 in FIG.

図3[F]には、変形例Fにおける切れ込み部66f,66g及び薄肉部67f,66gが示されている。切れ込み部66f及び薄肉部67fと切れ込み部66g及び薄肉部66gとは、頂点11aを挟んで一組ずつ形成されている。   FIG. 3F shows notches 66f and 66g and thin portions 67f and 66g in Modification F. The cut portion 66f and the thin portion 67f, and the cut portion 66g and the thin portion 66g are formed one by one with the apex 11a interposed therebetween.

上記変形例A〜Fに示すように、切れ込み部及び薄肉部の形状、個数及び位置は任意である。   As shown in the modified examples A to F, the shape, number, and position of the cut portion and the thin portion are arbitrary.

次に、実施形態1の振動素子を製造する方法を実施形態2の製造方法として説明する。図4乃至図7は、実施形態2の製造方法における各工程を示す断面図である。以下、図1及び図2に図4乃至図7を加えて、本実施形態2の製造方法について説明する。   Next, a method for manufacturing the resonator element according to the first embodiment will be described as a manufacturing method according to the second embodiment. 4 to 7 are cross-sectional views showing each step in the manufacturing method of the second embodiment. Hereinafter, the manufacturing method of the second embodiment will be described with reference to FIG. 1 and FIG.

図1に示すように、振動腕部12aと振動腕部12bとは対称的に同じ構造であり、基部11の振動腕部12a側と振動腕部12b側とも対称的に同じ構造である。そこで、図4乃至図7では、図1におけるIIa−IIa線断面及びIIb−IIb線断面において、振動腕部12a側のみ、及び、基部11の振動腕部12a側のみの製造工程を示す。   As shown in FIG. 1, the vibrating arm portion 12a and the vibrating arm portion 12b have the same structure symmetrically, and the vibrating arm portion 12a side and the vibrating arm portion 12b side of the base 11 have the same symmetrical structure. 4 to 7 show manufacturing steps only on the vibrating arm portion 12a side and only on the vibrating arm portion 12a side of the base 11 in the IIa-IIa line cross section and the IIb-IIb line cross section in FIG.

本実施形態2の製造方法は、実施形態1の振動素子10を製造する方法であって、溝部13aを形成する際に、同時に切れ込み部16a及び薄肉部17aを形成する、ことを特徴とする。以下に詳しく説明する。   The manufacturing method according to the second embodiment is a method for manufacturing the vibration element 10 according to the first embodiment, and is characterized in that, when the groove portion 13a is formed, the cut portion 16a and the thin portion 17a are formed at the same time. This will be described in detail below.

まず、図4[A]に示すように、例えば水晶Z板からなる基板41の表面及び裏面に耐食膜42を形成し、耐食膜42の上にフォトレジスト膜43を形成し、振動腕部となる領域52及び基部となる領域51にのみにフォトレジスト膜43が残るようにフォトレジスト膜43の一部を除去することにより、外形パターニングを行う。耐食膜42は、水晶のエッチング液に対して耐食性を有する金属からなり、例えばクロムからなる単一層でもクロム及び金からなる複数層でもよい。フォトレジスト膜43は、例えばスピンコート法によって塗布される。   First, as shown in FIG. 4A, for example, a corrosion-resistant film 42 is formed on the front and back surfaces of a substrate 41 made of a quartz Z plate, a photoresist film 43 is formed on the corrosion-resistant film 42, and a vibrating arm portion and The external patterning is performed by removing a part of the photoresist film 43 so that the photoresist film 43 remains only in the region 52 and the base region 51. The corrosion-resistant film 42 is made of a metal having corrosion resistance against the crystal etching solution, and may be a single layer made of chromium or a plurality of layers made of chromium and gold, for example. The photoresist film 43 is applied by, for example, a spin coat method.

続いて、図4[B]に示すように、図4[A]でフォトレジスト膜43が形成されなかった部分の耐食膜42を、エッチングにより除去する。例えば、専用のエッチング液を用いたウェットエッチングで、フォトレジスト膜43に覆われていない耐食膜42を除去する。これにより、耐食膜42が除去された部分には、基板41が現れることになる。   Subsequently, as shown in FIG. 4B, the portion of the corrosion resistant film 42 where the photoresist film 43 is not formed in FIG. 4A is removed by etching. For example, the corrosion-resistant film 42 not covered with the photoresist film 43 is removed by wet etching using a dedicated etching solution. Thereby, the substrate 41 appears in the portion where the corrosion-resistant film 42 is removed.

続いて、図4[C]に示すように、図4[B]で残っていたフォトレジスト膜43を全て除去する。   Subsequently, as shown in FIG. 4C, all of the photoresist film 43 remaining in FIG. 4B is removed.

続いて、図5[D]に示すように、耐食膜42も含めた基板41の全面にフォトレジスト膜44を形成する。   Subsequently, as shown in FIG. 5D, a photoresist film 44 is formed on the entire surface of the substrate 41 including the corrosion resistant film 42.

続いて、図5[E]に示すように、フォトレジスト膜44の一部を除去する。このとき、振動腕部となる領域52及び基部となる領域51以外の部分のフォトレジスト膜44を除去するだけでなく、溝部となる領域53及び切れ込み部となる領域56のフォトレジスト膜44も除去することにより、溝部及び切れ込み部パターニングを行う。   Subsequently, as shown in FIG. 5E, a part of the photoresist film 44 is removed. At this time, not only the portions 52 other than the region 52 serving as the vibrating arm portion and the region 51 serving as the base portion are removed, but also the photoresist film 44 in the region 53 serving as the groove portion and the region 56 serving as the cut portion is removed. By doing so, patterning of a groove part and a notch part is performed.

続いて、図5[F]に示すように、外形エッチングを行う。すなわち、水晶Z板からなる基板41において、振動腕部となる領域52及び基部となる領域51のみを残してエッチングする。これにより、耐食膜42に覆われていない基板41すなわち水晶の露出面を、バッファードフッ酸(HF+NH4F)を用いて完全に抜くことにより、振動腕部12a及び基部11の外形を形成する。   Subsequently, as shown in FIG. 5 [F], outer shape etching is performed. That is, in the substrate 41 made of a quartz Z plate, the etching is performed leaving only the region 52 serving as the vibrating arm portion and the region 51 serving as the base portion. As a result, the substrate 41 that is not covered by the corrosion-resistant film 42, that is, the exposed surface of the crystal, is completely removed using buffered hydrofluoric acid (HF + NH4F), thereby forming the outer shape of the vibrating arm portion 12a and the base portion 11.

続いて、図6[G]に示すように、溝部となる領域53及び切れ込み部となる領域56の耐食膜42を除去する。   Subsequently, as shown in FIG. 6G, the corrosion-resistant film 42 in the region 53 to be a groove and the region 56 to be a notch is removed.

続いて、図6[H]に示すように、溝部及び切れ込み部エッチングを行う。すなわち、水晶Z板からなる基板41において、溝部となる領域53及び切れ込み部となる領域56を一定の深さにエッチングする。これにより、耐食膜42に覆われていない基板41すなわち水晶の露出面を、バッファードフッ酸(HF+NH4F)を用いてハーフエッチングすることにより、溝部13aと同時に切れ込み部16a及び薄肉部17aを形成する。   Subsequently, as shown in FIG. 6H, etching of the groove and the cut portion is performed. That is, in the substrate 41 made of a quartz Z plate, the region 53 to be a groove and the region 56 to be a notch are etched to a certain depth. As a result, the substrate 41 that is not covered with the corrosion-resistant film 42, that is, the exposed surface of the crystal is half-etched using buffered hydrofluoric acid (HF + NH4F), thereby forming the cut portion 16a and the thin portion 17a simultaneously with the groove portion 13a. .

続いて、図6[I]に示すように、耐食膜42及びフォトレジスト膜44を全て除去する。   Subsequently, as shown in FIG. 6I, all of the corrosion-resistant film 42 and the photoresist film 44 are removed.

続いて、図7[J]に示すように、基板41の表裏全面に電極膜46を形成する。電極膜46は、例えばクロム又はチタンの単層膜や、その上にパラジウム又は金を形成した積層膜などであり、例えばスパッタリングや蒸着で成膜する。   Subsequently, as shown in FIG. 7J, an electrode film 46 is formed on the entire front and back surfaces of the substrate 41. The electrode film 46 is, for example, a single layer film of chromium or titanium, or a laminated film in which palladium or gold is formed thereon, and is formed by sputtering or vapor deposition, for example.

続いて、図7[K]に示すように、電極膜46の全面に電着法によりフォトレジスト膜45を形成し、電極パターンを露光及び現像する。このとき、基部となる領域51では、電極となる領域58がフォトレジスト膜45で覆われる。なお、溝部となる領域53のように微細な凹凸にまでフォトレジスト膜45を形成するには、電着法が適している。電極となる領域58には、図7[L]に示すパッド電極21bとなる領域に加え、図1に示すパッド電極21a及び配線パターン24a,24bとなる領域も含まれる。   Subsequently, as shown in FIG. 7K, a photoresist film 45 is formed on the entire surface of the electrode film 46 by electrodeposition, and the electrode pattern is exposed and developed. At this time, in the region 51 serving as the base, the region 58 serving as the electrode is covered with the photoresist film 45. In addition, the electrodeposition method is suitable for forming the photoresist film 45 to the minute unevenness like the region 53 to be the groove. The region 58 serving as an electrode includes the region serving as the pad electrode 21a and the wiring patterns 24a and 24b illustrated in FIG. 1 in addition to the region serving as the pad electrode 21b illustrated in FIG.

最後に、図7[L]に示すように、フォトレジスト膜45で覆われていない電極膜46をエッチングにより除去し、その後フォトレジスト膜45も除去する。これにより、振動腕部12a及び溝部13aに励振電極22a,22bが形成され、基部11、切れ込み部16a及び薄肉部17aにパッド電極21bが形成される。このとき、図1に示すように、パッド電極21a及び配線パターン24a,24bも形成され、振動素子10が完成する。なお、周波数調整用金属膜23a,23bは、例えば別途メタルマスク及び蒸着で形成してもよい。   Finally, as shown in FIG. 7L, the electrode film 46 not covered with the photoresist film 45 is removed by etching, and then the photoresist film 45 is also removed. Thereby, excitation electrodes 22a and 22b are formed in the vibrating arm portion 12a and the groove portion 13a, and a pad electrode 21b is formed in the base portion 11, the cut portion 16a, and the thin portion 17a. At this time, as shown in FIG. 1, the pad electrode 21a and the wiring patterns 24a and 24b are also formed, and the vibration element 10 is completed. The frequency adjusting metal films 23a and 23b may be formed by, for example, a separate metal mask and vapor deposition.

本実施形態2の製造方法によれば、図6[H]に示すように、溝部13a,13bと同時に切れ込み部16a,16b及び薄肉部17a,17bを形成することにより、溝部形成時のフォトマスク(図5[E])を変更するだけで既存の工程をそのまま使用できる。   According to the manufacturing method of the second embodiment, as shown in FIG. 6H, the cut portions 16a and 16b and the thin portions 17a and 17b are formed at the same time as the groove portions 13a and 13b. An existing process can be used as it is only by changing (FIG. 5E).

なお、本実施形態2の製造方法は、溝部13a,13bと同時に切れ込み部16a,16b及び薄肉部17a,17bを形成する工程が含まれていれば、他の工程はどのようなものであってもよい。例えば、溝部、切れ込み部及び薄肉部はエッチング抑制パターンを用いて外形と同時に形成してもよいし、電極はリフトオフ法によって形成してもよいし、フォトレジスト膜はポジ型における潜像を利用することによって塗布及び剥離の回数を減らしてもよい。本実施形態2のその他の構成、作用及び効果は、実施形態1のそれらと同様である。   In addition, the manufacturing method of this Embodiment 2 will be what is the other process if the process of forming the notches 16a and 16b and the thin parts 17a and 17b is included simultaneously with the groove parts 13a and 13b. Also good. For example, the groove portion, the cut portion, and the thin portion may be formed simultaneously with the outer shape using an etching suppression pattern, the electrode may be formed by a lift-off method, and the photoresist film uses a positive latent image. Depending on the situation, the number of coating and peeling may be reduced. Other configurations, operations, and effects of the second embodiment are the same as those of the first embodiment.

以上、上記各実施形態を参照して本発明を説明したが、本発明は上記各実施形態に限定されるものではない。本発明の構成や詳細については、当業者が理解し得るさまざまな変更を加えることができる。また、本発明には、上記各実施形態の構成の一部又は全部を相互に適宜組み合わせたものも含まれる。   Although the present invention has been described with reference to the above embodiments, the present invention is not limited to the above embodiments. Various changes that can be understood by those skilled in the art can be made to the configuration and details of the present invention. Further, the present invention includes a combination of some or all of the configurations of the above-described embodiments as appropriate.

本発明は、基部と振動部と切れ込み部とを備える振動素子であればどのようなものにでも利用でき、例えば音叉型屈曲振動素子、厚みすべり振動素子などの他に、ジャイロセンサなどのセンサ素子にも利用可能である。   The present invention can be used for any vibration element provided with a base, a vibration part, and a notch. For example, in addition to a tuning fork type bending vibration element and a thickness shear vibration element, a sensor element such as a gyro sensor Also available.

<実施形態1>
10 振動素子
11 基部
11a,11b 頂点
111 上面
112 下面
113 延長上面
114 延長下面
12a,12b 振動腕部
13a,13b 溝部
15 水晶振動片
16a,16b 切れ込み部
17a,17b 薄肉部
171 薄肉部上面
172 薄肉部下面
21a,21b パッド電極
22a,22b 励振電極
23a,23b 周波数調整用金属膜
24a,24b 配線パターン
31 導電性接着剤
32 素子搭載部材
33 パッド電極
66a,66b,66c,66d,66e,66f 切れ込み部
67a,67b,67c,67d,67e,67f 薄肉部
<実施形態2>
41 基板
42 耐食膜
43,44,45 フォトレジスト膜
46 電極膜
51 基部となる領域
52 振動腕部となる領域
53 溝部となる領域
56 切れ込み部となる領域
58 電極となる領域
<関連技術1>
210 振動素子
211 基部
241 上面
242 下面
212a,212b 振動腕部
213a,213b 溝部
215 水晶振動片
216a,216b 切れ込み部
221a,221b パッド電極
222a,222b 励振電極
223a,223b 周波数調整用金属膜
224a,224b 配線パターン
231 導電性接着剤
<Embodiment 1>
DESCRIPTION OF SYMBOLS 10 Vibration element 11 Base part 11a, 11b Vertex 111 Upper surface 112 Lower surface 113 Extension upper surface 114 Extension lower surface 12a, 12b Vibration arm part 13a, 13b Groove part 15 Crystal vibrating piece 16a, 16b Cut part 17a, 17b Thin part 171 Thin part upper part 172 Thin part Lower surface 21a, 21b Pad electrode 22a, 22b Excitation electrode 23a, 23b Frequency adjustment metal film 24a, 24b Wiring pattern 31 Conductive adhesive 32 Element mounting member 33 Pad electrode 66a, 66b, 66c, 66d, 66e, 66f Notch 67a , 67b, 67c, 67d, 67e, 67f Thin portion <Embodiment 2>
41 Substrate 42 Corrosion Resistant Film 43, 44, 45 Photoresist Film 46 Electrode Film 51 Base Area 52 Vibrating Arm Area 53 Groove Area 56 Cut Area 58 Electrode Area <Related Technology 1>
210 Vibration element 211 Base 241 Upper surface 242 Lower surface 212a, 212b Vibration arm portion 213a, 213b Groove portion 215 Quartz vibration piece 216a, 216b Notch portion 221a, 221b Pad electrode 222a, 222b Excitation electrode 223a, 223b Frequency adjustment metal film 224a, 224b Pattern 231 conductive adhesive

Claims (5)

厚さ方向に上面及び下面を有するとともに、この下面が導電性接着剤によって素子搭載部材に固定される基部と、
この基部から延設された振動部と、
前記上面と前記下面とから前記厚さ方向に窪んだ状態になるように前記基部の外周に形成された切れ込み部と、
を備えた水晶振動素子において、
前記上面が延長された仮想的な面を延長上面とし、前記下面が延長された仮想的な面を延長下面としたとき、
前記切れ込み部内に設けられ、前記延長上面及び前記延長下面の少なくとも一方から離れた状態で突出する薄肉部を、
更に備えたことを特徴とする水晶振動素子。
A base having an upper surface and a lower surface in the thickness direction, and the lower surface fixed to the element mounting member by a conductive adhesive;
A vibrating portion extending from the base, and
A notch formed on the outer periphery of the base so as to be recessed in the thickness direction from the upper surface and the lower surface;
In the crystal resonator element with
When the virtual surface with the upper surface extended is an extended upper surface, and the virtual surface with the lower surface extended is an extended lower surface,
A thin portion that is provided in the notch and protrudes away from at least one of the extended upper surface and the extended lower surface;
A crystal resonator element, further comprising:
前記薄肉部は薄肉部上面及び薄肉部下面を有し、
前記薄肉部上面は前記延長上面から離れた面であり、
前記薄肉部下面は前記延長下面から離れた面である、
請求項1記載の水晶振動素子。
The thin portion has a thin portion upper surface and a thin portion lower surface,
The thin-walled upper surface is a surface away from the extended upper surface,
The thin wall lower surface is a surface away from the extended lower surface,
The crystal resonator element according to claim 1.
前記基部は、前記上面側及び下面側から見て四角形状であり、
前記切れ込み部は、前記基部の前記振動部側の反対側の頂点を含む部分に設けられた、
請求項2記載の水晶振動素子。
The base is rectangular when viewed from the upper surface side and the lower surface side,
The cut portion is provided in a portion including a vertex on the opposite side of the vibration portion side of the base portion,
The crystal resonator element according to claim 2.
前記薄肉部は前記頂点に相当する部分が除去された、
請求項3記載の水晶振動素子。
The thin portion has a portion corresponding to the apex removed,
The crystal resonator element according to claim 3.
前記振動部に前記延設方向に沿って溝部が形成された請求項1乃4のいずれか一つに記載の水晶振動素子を製造する方法であって、
前記溝部を形成する際に、同時に前記切れ込み部及び前記薄肉部を形成する、
ことを特徴とする水晶振動素子の製造方法。
The method for manufacturing a crystal resonator element according to any one of claims 1 to 4, wherein a groove portion is formed along the extending direction in the vibrating portion.
When forming the groove portion, simultaneously form the cut portion and the thin portion,
A method for manufacturing a quartz crystal resonator element.
JP2014079363A 2014-04-08 2014-04-08 Quartz vibrating element and method for manufacturing the same Expired - Fee Related JP6279386B2 (en)

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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002009576A (en) * 2000-06-20 2002-01-11 Seiko Epson Corp Piezoelectric device and its package structure
JP2004260718A (en) * 2003-02-27 2004-09-16 Seiko Epson Corp Tuning fork type vibration pieces, manufacturing method of tuning fork type vibration pieces, and piezoelectric device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002009576A (en) * 2000-06-20 2002-01-11 Seiko Epson Corp Piezoelectric device and its package structure
JP2004260718A (en) * 2003-02-27 2004-09-16 Seiko Epson Corp Tuning fork type vibration pieces, manufacturing method of tuning fork type vibration pieces, and piezoelectric device

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