JP2015199148A - Glass plate polishing device and glass plate polishing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a glass plate polishing device and a glass plate polishing method capable of polishing of the whole edge part of a glass plate in a short time.SOLUTION: An insertion recess 15a where an end edge part 10 of a glass plate 10 together with a polishing tape 14 can be inserted is formed in a pressure receiving pad 15, then polishing of the end edge part 10a of the glass plate 10 by the polishing tape 14 is performed so that the whole end edge part 10a of the glass plate 10 is covered with the polishing tape 14 in the insertion recess 15a.

Description

  The present invention relates to a glass plate polishing apparatus and a glass plate polishing method for polishing an edge portion of a glass plate.

  In glass plates used for displays, etc., since minute unevenness (scratches) at the edge of the glass plate that occurs when cutting from the mother glass, etc., is a source of stress concentration and cracks are likely to occur from here. Polishing of the edge of the plate is performed.

  For example, as disclosed in the patent document 1 and the patent document 2, a polishing tape in which abrasive grains are fixed to the tape surface is used, and the polishing tape and the glass plate are moved relative to each other in a contact state. Polishing of the edge part of this is performed. In this case, it is desirable to polish the entire end edge of the glass plate, specifically both the ridge and the end face, in order to eliminate as much as possible the minute irregularities (scratches) that become the starting point of the crack. Therefore, for example, polishing the edge of the glass plate, such as polishing one ridge, polishing the other ridge, and polishing the end face, while changing the posture of the glass plate against the polishing tape each time. Has been done.

Japanese Patent No. 2857817 JP 2013-99821 A

  However, gradual polishing of the edge and end surface of the edge of the glass plate means that the polishing time becomes longer, and there is still room for improvement in response to a request for shortening the polishing process. there were.

  The present invention has been made to solve the above-mentioned problems, and an object thereof is to provide a glass plate polishing apparatus and a glass plate polishing method capable of polishing the entire edge portion of a glass plate in a short time. There is to do.

  A glass plate polishing apparatus that solves the above-described problems causes the glass plate and the polishing tape to move relative to each other in a state where the edge of the portion to be polished in the glass plate is pressed against the pressure receiving pad via the polishing tape. A glass plate polishing apparatus for polishing an edge portion of the glass plate, wherein the pressure receiving pad has an insertion recess into which the edge portion of the glass plate can be inserted together with the polishing tape. It is formed continuously in a direction in which the polishing tape is moved relative to the polishing tape, and is configured to polish the edge of the glass plate with the polishing tape in the insertion recess.

  According to this configuration, the edge of the glass plate is polished by the polishing tape in the insertion recess of the pressure receiving pad in which the edge of the glass plate can be inserted together with the polishing tape. In other words, since the entire edge of the glass plate is polished in the insertion recess so as to be wrapped by the polishing tape, the entire edge (ridge and end surface) is polished at once, reducing the time required for polishing. It becomes possible to be time.

In the glass plate polishing apparatus, it is preferable that the insertion recessed portion of the pressure receiving pad has a pair of convex curved portions facing each other in the thickness direction of the glass plate.
According to this configuration, since the insertion recess of the pressure receiving pad has a pair of convex curved portions facing each other in the thickness direction of the glass plate, polishing interposed between the pressure receiving pad and the edge portion of the glass plate. The area where a large load is applied to the tape is reduced, and heat generation at various places where the frictional force acts is suppressed. Thereby, the tearing etc. by the heat_generation | fever of a polishing tape are suppressed, and the continuous operation | movement of a grinding | polishing apparatus can be anticipated.

  In the glass plate polishing apparatus, a slit is formed in the pressure receiving pad in a direction intersecting the relative movement direction in the pressure receiving portion of the insertion recess that receives a pressing force from the edge side of the glass plate. Preferably it is.

  According to this configuration, since the slit extending in the direction intersecting the relative movement direction of the glass plate and the polishing tape is formed in the pressure receiving portion of the insertion concave portion that receives the pressing force from the edge side of the glass plate, the glass plate Even if the pressing force received from the end edge side of the tape is locally increased, the pressure receiving pad (insertion recess) can be partially flexibly deformed, and the effect of reducing the load on the polishing tape can be expected.

  In the above glass plate polishing apparatus, the pressure receiving pad is constituted by first and second pad members arranged to face each other in the plate thickness direction of the glass plate, and the insertion recess is the first and second pad members. It is preferable to be configured between the two.

  According to this configuration, since the insertion recess of the pressure receiving pad is configured to straddle between the first and second pad members that are arranged to face each other in the thickness direction of the glass plate, the boundary between the first and second pad members It is easy to form the insertion recess, such as chamfering the part.

In the above glass plate polishing apparatus, it is preferable that the pressure receiving pad is configured such that the recess shape of the insertion recess including the gap between the first and second pad members can be adjusted.
According to this configuration, since the concave shape of the insertion concave portion can be adjusted including the gap between the first and second pad members, it is easy to adjust the concave shape according to the shape of the edge portion of the glass plate. is there.

  In the glass plate polishing apparatus, the polishing tape is driven to run in a direction intersecting with the extending direction of the edge of the glass plate, and the pressure receiving pad moves relative to the glass plate together with the polishing tape. It is preferable.

  According to this configuration, the pressure receiving pad moves relative to the glass plate together with the polishing tape that travels in a direction intersecting with the extending direction of the edge portion of the glass plate. Polishing is performed.

  Further, the glass plate polishing method for solving the above-described problems is a method in which the glass plate and the polishing tape are relatively moved in a state where the edge of the portion to be polished in the glass plate is pressed against the pressure receiving pad through the polishing tape. A glass plate polishing method for polishing an edge portion of the glass plate, wherein an insertion recess capable of inserting the edge portion of the glass plate together with the polishing tape makes the glass plate and the polishing tape relative to each other. Using the pressure receiving pad formed continuously in the moving direction, the edge of the glass plate is polished by the polishing tape in the insertion recess.

  According to this configuration, since the entire edge portion of the glass plate is polished in the insertion recess of the pressure receiving pad so as to be wrapped by the polishing tape, the entire edge portion (ridge portion and end surface) is polished at a time. The time required for polishing can be shortened.

  ADVANTAGE OF THE INVENTION According to this invention, the glass plate grinding | polishing apparatus and glass plate grinding | polishing method which can grind the whole edge part of a glass plate in a short time can be provided.

The schematic structure of the glass plate grinding | polishing apparatus in 1st Embodiment is shown, (a) is the side view, (b) is a front view, (c) is a front view of the pressure receiving pad of a grinding | polishing apparatus. The schematic structure of the glass plate grinding | polishing apparatus in 2nd Embodiment is shown, (a) is the front view, (b) is a side view, (c) is a front view of the pressure receiving pad of a grinding | polishing apparatus.

(First embodiment)
Hereinafter, a first embodiment of a glass plate polishing apparatus (glass plate polishing method) will be described.
As shown in FIGS. 1 (a) and 1 (b), the glass plate polishing apparatus 11 of the present embodiment for polishing the end edge portion 10a (including the ridge portion 10b and the end surface 10c) of the glass plate 10 is an object to be polished. A holding table 12 that holds the glass plate 10, and a polishing mechanism unit 13 that polishes the edge 10 a of the glass plate 10 held on the holding table 12.

  The glass plate 10 is placed on the holding base 12 so that the plane direction of the glass plate 10 is in the horizontal direction (the plate thickness direction is the vertical direction). In the glass plate 10 having a rectangular plate shape, four edges are provided. The edge portion 10a to be polished in the portion 10a is directed and held toward the polishing mechanism portion 13 side. The holding table 12 and the polishing mechanism unit 13 reciprocate relatively in the horizontal direction (the plane direction of the glass plate 10) relatively close to and away from each other and in the direction perpendicular to the contacting and separating directions in the horizontal direction. It is configured to perform a linear operation, that is, a polishing operation.

  The polishing mechanism unit 13 includes a polishing tape 14 and a pressure receiving pad 15. The polishing tape 14 is made of, for example, a polyester tape formed continuously in a belt shape, and abrasive grains having a material and a particle size suitable for the glass plate 10 to be polished are fixed to the tape surface. The polishing tape 14 is held by a pair of reels 16 and 17 so that the longitudinal direction thereof is directed in the vertical direction, is fed from one (for example, the upper side) reel 16, and is wound around the other (for example, the lower side) reel 17. Taken. That is, the polishing tape 14 is driven to travel in a direction orthogonal to the extending direction of the end edge portion 10a of the glass plate 10 held by the holding table 12 (drives for the reels 16 and 17 are not shown). . The length in the width direction of the polishing tape 14 is set longer than the length of the long side of the glass plate 10, in other words, longer than the polishing operation range of the glass plate 10.

  The pressure receiving pad 15 is installed on the opposite side of the glass plate 10 held by the holding table 12 with the polishing tape 14 in between, and when the glass plate 10 is pressed against the polishing tape 14 in the horizontal direction, the glass plate is placed on the opposite side. 10 pressing force is received. The width direction length of the pressure receiving pad 15 is set to be equal to or slightly longer than the width direction length of the polishing tape 14. The pressure receiving pad 15 is configured by combining the first and second pad members 18 and 19 in the vertical direction, and each of the pad members 18 and 19 has an elastic force suitable for polishing the glass plate 10. For example, it is made of a urethane material having a predetermined hardness.

  The pressure receiving pad 15 is formed with an insertion recess 15a into which the edge 10a of the portion to be polished in the glass plate 10 is inserted together with the polishing tape 14, and receives a pressing force from the glass plate 10 at the insertion recess 15a. It is like that. The insertion recess 15 a is formed across the first and second pad members 18 and 19 constituting the pressure receiving pad 15.

  Specifically, the lower side corner portion of the first pad member 18 disposed on the upper side and the upper side corner portion of the second pad member 19 disposed on the lower side are viewed from the side (see FIG. 1A). The chamfered portions 18a and 19a chamfered in a convex curved shape are formed, and the chamfered portions 18a and 19a facing each other in the thickness direction of the glass plate 10 integrally constitute an insertion concave portion 15a. In the insertion recess 15a, the gap 20 between the first and second pad members 18 and 19 is one of the components. In other words, the opening shape of the insertion recess 15a can be changed by adjusting the gap 20 including zero. In this case, the curved surface shape of the chamfered portions 18a and 19a is maintained.

  Incidentally, the chamfered portions 18a and 19a and the gap 20 are respectively set to predetermined curvature radii and gap dimensions in consideration of the thickness of the glass plate 10, the shape of the edge portion 10a before polishing, the polishing mode of the edge portion 10a, and the like. Has been. And the insertion recessed part 15a comprised by such a chamfering part 18a, 19a etc. is continuing in the same shape from the width direction one end to the other end of the pressure receiving pad 15 (except the below-mentioned slits 18b and 19b part). ).

  A plurality of slits 18b and 19b are formed in the chamfered portions 18a and 19a constituting the insertion recess 15a at predetermined intervals (for example, equal intervals) in the width direction (see FIG. 1C). The slits 18 b and 19 b have shapes extending in directions orthogonal to the extending direction of the end edge portion 10 a of the glass plate 10 held by the holding table 12. The slits 18b and 19b can be partially and flexibly deformed when the pressing force received from the edge 10a of the glass plate 10 via the polishing tape 14 is locally increased in the width direction of the chamfers 18a and 19a. It is provided for the purpose of doing so.

In FIG. 1, the glass plate 10 and the insertion recess 15 a (the chamfered portions 18 a and 19 a and the gap 20) of the pressure receiving pad 15 have portions that are illustrated with slightly different actual dimensions and shapes.
Next, the operation (action) of the glass plate polishing apparatus 11 of this embodiment will be described.

The glass plate 10 is positioned and held on the holding table 12 so that the edge 10a of the glass plate 10 to be polished faces the polishing tape 14 (pressure receiving pad 15).
Next, at least one of the polishing mechanism part 13 including the polishing tape 14 and the pressure receiving pad 15 and the holding base 12 is operated in a direction close to each other. Then, the edge portion 10 a of the glass plate 10 to be polished comes into contact with the polishing tape 14, and the edge portion 10 a of the glass plate 10 is inserted into the insertion recess 15 a of the pressure receiving pad 15 together with the polishing tape 14.

  Next, in a state where the edge 10a of the glass plate 10 through the polishing tape 14 is pressed against the pressure receiving pad 15 (insertion recess 15a) with a predetermined pressing force, at least one of the polishing mechanism unit 13 and the holding table 12 has a width. Move back and forth in the direction. That is, the polishing tape 14 (pressure receiving pad 15) and the edge portion 10a of the glass plate 10 move relative to each other in a pressed state, and the edge portion 10a of the glass plate 10 is polished. At this time, since the entire edge portion 10a of the glass plate 10 is polished in the insertion recess 15a so as to be wrapped by the polishing tape 14, the entire edge portion 10a, that is, the ridge portion 10b and the end surface 10c are polished at a time. It has come to be.

  When the polishing of the edge portion 10a to be polished of the glass plate 10 is completed, at least one of the polishing mechanism portion 13 and the holding base 12 operates in a direction away from each other, and the glass plate 10 can be taken out after being arranged at a predetermined position. Become. Then, the glass plate 10 after the rearrangement of the glass plate 10 or the polishing of all the edge portions 10a is completed so that the edge portion 10a to be polished next in the glass plate 10 faces the polishing tape 14 side is the next glass plate. Is replaced by 10.

  As for the feeding of the polishing tape 14, the polishing portion of the polishing tape 14 is new after polishing one or more edge portions 10a of the glass plate 10 or after polishing one or more glass plates 10. It will be sent to the position that will be a part. Further, it is possible to adopt a mode in which the polishing tape 14 is fed during the polishing of the edge portion 10a of the glass plate 10.

Next, characteristic effects of the present embodiment will be described.
(1) The edge 10 a of the glass plate 10 is polished by the polishing tape 14 in the insertion recess 15 a of the pressure receiving pad 15 in which the edge 10 a of the glass plate 10 can be inserted together with the polishing tape 14. That is, since the entire edge portion 10a of the glass plate 10 is polished in the insertion recess 15a so as to be wrapped by the polishing tape 14, the entire edge portion 10a (ridge portion 10b and end surface 10c) can be polished at a time. The time required for polishing can be shortened.

  (2) Since the insertion recessed portion 15a of the pressure receiving pad 15 has a pair of convex curved surface portions (the chamfered portions 18a and 19a) facing each other in the thickness direction of the glass plate 10, the pressure receiving pad 15 and the glass plate 10 The area where a large load is applied to the polishing tape 14 interposed between the end edge portion 10a is reduced, and heat generation at various places where the frictional force acts can be suppressed. Thereby, the tearing etc. by the heat_generation | fever of the grinding | polishing tape 14 can be suppressed, and the continuous operation | movement of the grinding | polishing apparatus 11 can be expected.

  (3) Slits 18b and 19b are formed in the pressure receiving portion (the chamfered portions 18a and 19a) of the insertion recess 15a that receives the pressing force from the edge 10a side of the glass plate 10. Therefore, even if the pressing force received from the edge 10a side of the glass plate 10 is locally increased, the pressure receiving pad 15 (insertion recess 15a) can be partially flexibly deformed, and the load on the polishing tape 14 can be reduced. Can be expected.

  (4) Since the insertion recess 15a of the pressure receiving pad 15 is formed across the first and second pad members 18 and 19 constituting the pressure receiving pad 15, the boundary portion between the first and second pad members 18 and 19 is provided. The insertion recess 15a can be easily formed by the chamfered portions 18a, 19a and the like.

  (5) Since the recess shape of the insertion recess 15a can be adjusted including the gap 20 between the first and second pad members 18, 19, the recess shape matched to the shape of the edge portion 10a of the glass plate 10 is provided. Adjustment can be performed easily.

(6) The glass plate polishing apparatus 11 of the present embodiment can be configured compactly in the width direction.
(Second Embodiment)
Hereinafter, a second embodiment of the glass plate polishing apparatus (glass plate polishing method) will be described. In the present embodiment, the same components as those in the first embodiment are denoted by the same reference numerals, and detailed description thereof is omitted.

  As shown in FIGS. 2 (a) and 2 (b), the glass plate polishing apparatus 21 of the present embodiment differs from the first embodiment in the manner in which the polishing tape 14 is applied to the glass plate 10, and two sheets. The edge 10a of the glass plate 10 can be polished at the same time. In FIG. 2 as well, there are portions where the actual dimensions and shapes of each member (each portion) are slightly different.

  The holding table 12 of the glass plate polishing apparatus 21 of the present embodiment is configured to be able to hold two glass plates 10 side by side at a predetermined interval with the plane direction of the glass plate 10 being the horizontal direction. Although not shown in FIG. 2 in particular, the holding table 12 is configured to hold the two glass plates 10 together with one table that is long in the width direction, or holds the two glass plates 10 individually. It consists of two units.

  The pressure receiving pad 15 of the polishing mechanism portion 13 is formed long in the width direction (horizontal direction) so that it can be pressed and contacted simultaneously when polishing the edge portions 10a of the two glass plates 10 arranged side by side. Yes. Similarly to the first embodiment, the pressure receiving pad 15 of the present embodiment is configured by the first and second pad members 18 and 19, and an insertion recess 15 a is formed across the pad members 18 and 19. . The insertion recess 15a includes a chamfer 18a at the lower corner of the first pad member 18, a chamfer 19a at the upper corner of the second pad member 19, and a gap 20 between the pad members 18 and 19 (the gap dimension is zero). Included). The insertion recess 15a is continuous in the same shape from one end to the other in the width direction, and a plurality of slits 18b, 19b are formed in the chamfered portions 18a, 19a constituting the insertion recess 15a in the width direction at predetermined intervals (for example, etc. (See FIG. 2C).

  Further, the polishing tape 14 of the present embodiment is held by the reels 16 and 17 so that the longitudinal direction thereof is oblique with respect to the vertical direction (or horizontal direction), specifically, obliquely held in a manner close to the horizontal direction. Then, a sequential feeding operation by both reels 16 and 17 is performed. That is, the polishing tape 14 of the present embodiment is driven to run obliquely with respect to the extending direction of the end edge portion 10 a of the glass plate 10 held on the holding table 12. Then, the edge portions 10 a to be polished of the two glass plates 10 are respectively inserted into the insertion recesses 15 a of the pressure receiving pad 15 together with the polishing tape 14, and the entire edge portion 10 a is polished so as to be wrapped by the polishing tape 14. . Further, as a configuration in which the wide polishing tape 14 is not used, the two glass plates 10 can be simultaneously polished on the polishing tape 14 (polishing while polishing using the entire width direction of the polishing tape 14). Areas do not overlap each other).

Next, characteristic effects of the present embodiment will be described.
(1) to (5) Also in the present embodiment, the same effects as the effects (1) to (5) of the first embodiment can be obtained.

  (6) The glass plate polishing apparatus 21 of this embodiment can simultaneously polish the two glass plates 10. At this time, by disposing the polishing tape 14 obliquely without using the wide polishing tape 14, it is possible to prevent the polishing regions from overlapping each other while polishing using the entire width direction of the polishing tape 14. When the polishing regions overlap, the polishing tape 14 is easily worn out in the regions. However, if configured as in this embodiment, the wear of the polishing tape 14 can be suppressed. In addition, when the polishing tape 14 has sufficient strength, the polishing regions of the two glass plates 10 in the polishing tape 14 may overlap each other.

In addition, you may change the said embodiment as follows.
-Although the pressure receiving pad 15 was comprised by the 1st and 2nd pad members 18 and 19, you may comprise by one pad member and three or more pad members.

-Although the insertion recessed part 15a of the pressure receiving pad 15 was comprised including the convex curve part, you may comprise an insertion recessed part using a concave curved surface, a plane, etc. FIG.
-Although the recessed part shape of the insertion recessed part 15a was adjusted also including the gap | interval 20 between the 1st and 2nd pad members 18 and 19, you may adjust other than the gap | interval 20. FIG. In this case, the gap 20 becomes unnecessary.

-Although slit 18b, 19b was formed in chamfer 18a, 19a of insertion recessed part 15a, it is not necessary to form.
The relative movement of the glass plate 10 side (holding base 12) and the polishing tape 14 and pressure receiving pad 15 side (polishing mechanism part 13) on and away from each other and the polishing operation may be performed only on one side. May be operated.

  -It is good also as an aspect which grinds two or more glass plates 10 simultaneously in the grinding | polishing apparatus 11 of 1st Embodiment. In the polishing apparatus 21 of the second embodiment, one or three or more glass plates 10 may be simultaneously polished.

-The material of the member which comprises the polishing tape 14, the pressure receiving pad 15, etc. may be changed suitably.
-The edge part 10a of the glass plate 10 may be the cut surface formed by cut | disconnecting the glass plate 10 by arbitrary methods. For example, it may be a cut section that is cut after a scribe is formed on the glass plate 10 using a cutter, a wheel chip, a laser, or the like, or a melted section that is cut out of the glass plate 10 with a laser. Further, the end edge portion 10a may be an end surface obtained by roughly polishing the cut surface of the glass plate 10 with a grindstone or the like in advance.

  The above polishing apparatus and polishing method can be applied to polishing a glass plate having an arbitrary composition and application. For example, it can be applied to polishing non-alkali glass or chemically strengthened glass. In particular, in polishing glass having high strength and hardness, such as chemically strengthened glass, which easily wears the polishing tool, the wear can be suppressed, which is preferable. It can be applied to polishing glass for display applications, touch panel applications, photoelectric conversion panel applications, electronic device applications, window glass applications, building material applications, vehicle applications, and the like.

  DESCRIPTION OF SYMBOLS 10 ... Glass plate, 10a ... Edge edge part, 14 ... Polishing tape, 15 ... Pressure receiving pad, 15a ... Insertion recessed part, 18, 19 ... 1st and 2nd pad member, 18a, 19a ... Chamfering part (convex curved surface part, Pressure-receiving portion), 18b, 19b... Slit, 20.

Claims (7)

The edge of the glass plate is polished by moving the glass plate and the polishing tape relative to each other while the edge of the polishing target portion of the glass plate is pressed against the pressure receiving pad via the polishing tape. A glass plate polishing apparatus for performing
In the pressure receiving pad, an insertion recess capable of inserting the edge of the glass plate together with the polishing tape is continuously formed in a direction in which the glass plate and the polishing tape are moved relative to each other. A glass plate polishing apparatus configured to polish an edge portion of the glass plate with the polishing tape. In the glass plate grinding | polishing apparatus of Claim 1,
The glass plate polishing apparatus, wherein the insertion recess of the pressure receiving pad has a pair of convex curved portions facing each other in the thickness direction of the glass plate. In the glass plate grinding | polishing apparatus of Claim 1 or 2,
In the pressure receiving pad, a slit is formed in a direction intersecting the relative movement direction in a pressure receiving portion of the insertion recess that receives a pressing force from an edge side of the glass plate. Polishing equipment. In the glass plate grinding | polishing apparatus of any one of Claims 1-3,
The pressure receiving pad is configured by first and second pad members arranged to face each other in the thickness direction of the glass plate, and the insertion recess is configured to straddle between the first and second pad members. A glass plate polishing apparatus characterized by the above. In the glass plate grinding | polishing apparatus of Claim 4,
The glass plate polishing apparatus, wherein the pressure receiving pad is configured such that a recess shape of the insertion recess including a gap between the first and second pad members is adjustable. In the glass plate grinding | polishing apparatus of any one of Claims 1-5,
The polishing tape is driven to travel in a direction intersecting with the extending direction of the edge of the glass plate,
The pressure receiving pad moves relative to the glass plate together with the polishing tape. The edge of the glass plate is polished by moving the glass plate and the polishing tape relative to each other while the edge of the polishing target portion of the glass plate is pressed against the pressure receiving pad via the polishing tape. A glass plate polishing method for performing
Using the pressure receiving pad in which an insertion recess capable of inserting the edge of the glass plate together with the polishing tape is continuously formed in a direction in which the glass plate and the polishing tape are moved relative to each other in the insertion recess. A method for polishing a glass plate, comprising polishing an edge portion of the glass plate with the polishing tape.