JP2015194582A - Irradiation device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide an irradiation device capable of suppressing the influence of reflection or refraction by a mask holding member, when a mask is not used.SOLUTION: An irradiation device 1 in which a mask holding member 40 is arranged in a light emission opening 3A for emitting the light of a light source 10 and a light blocking mask 50 for blocking the light of the light source 10 is held by the mask holding member 40 is configured so that the mask holding member 40 is elevatably supported.

Description

  The present invention relates to an irradiation apparatus including a mask holding member that holds a light shielding mask.

  Conventionally, as an irradiation device, a sealing material made of an ultraviolet curable resin is provided between two light-transmitting substrates, and a liquid crystal panel in which liquid crystal is sealed in the sealing material is irradiated with ultraviolet rays to cure the sealing material. An irradiation apparatus for bonding two substrates is known (see, for example, Patent Document 1). When irradiating the sealing material with ultraviolet light, if the liquid crystal is irradiated with ultraviolet light, the characteristics of the liquid crystal change. Therefore, in this ultraviolet curing device, a light shielding mask that blocks light from the light source at a position corresponding to the liquid crystal. The light shielding mask is held on a holding bar (mask holding member). The holding bar is formed using a light-transmitting material (quartz) and is provided across the light exit opening.

JP 2004-77583 A

The irradiation device may irradiate without using a light shielding mask. In this case, if there is a holding bar at the light exit opening, the illuminance distribution on the irradiated surface deteriorates due to the light reflected or refracted by the holding bar. End up. However, attaching and detaching the holding bar each time the shading mask is not used is cumbersome and may cause damage to the relatively expensive holding bar when attaching and detaching. Also, a safe storage space for the holding bar Need.
The present invention has been made in view of the above-described circumstances, and an object thereof is to provide an irradiation apparatus capable of suppressing the influence of reflection or refraction on a mask holding member when a light shielding mask is not used.

  In order to achieve the above-described object, the present invention provides an irradiation apparatus in which a mask holding member is disposed in a light emitting opening for emitting light from a light source, and a light shielding mask for shielding light from the light source is held on the mask holding member. And a lifting means for lifting and lowering the mask holding member.

In the above-described configuration, the mask holding member may include a holding portion made of a light transmissive material and a frame body that supports an edge portion of the holding portion, and may support the frame body so as to be movable up and down.
In the above-described configuration, a driving unit that automatically raises and lowers the mask holding member may be provided.
In the above-described configuration, the light source is a linear light source, and includes a main reflecting mirror that reflects light toward the periphery of the linear light source to an irradiated body, and the mask is provided between the mask holding member and the linear light source. An auxiliary reflecting mirror surrounding the irradiated body may be provided, and a space for raising and lowering the mask holding member may be provided between the auxiliary reflecting mirror and the irradiated body.
In the above-described configuration, when irradiating without using the light shielding mask, the mask holding member may be raised by 20 mm or more from the irradiation position using the light shielding mask.

  According to the present invention, since the mask holding member is supported to be movable up and down, when the light shielding mask is not used, the influence of reflection or refraction on the mask holding member is suppressed by separating the mask holding member from the irradiated surface. it can.

It is a figure which shows typically the irradiation apparatus of embodiment of this invention. It is a figure which shows typically the illumination intensity distribution of the workpiece | work by irradiation of only an ultraviolet lamp and a main reflector. It is a figure which shows a workpiece | work and a light shielding mask, (A) is sectional drawing of a workpiece | work, (B) is a perspective view which shows a workpiece | work and a light shielding mask. It is a perspective view which shows a mask holding member. It is a perspective view which shows a holding | maintenance bar. It is a figure which shows a holding | maintenance bar, (A) is a top view, (B) is AA sectional drawing of (A). It is BB sectional drawing of FIG. It is a figure which shows typically the irradiation apparatus which raised the mask holding member. It is a figure which shows the relationship between the lift-up position of a mask holding member, and illumination intensity, (A) is a figure which shows a measurement location, (B) is a graph which shows the maximum illumination intensity Max and the minimum illumination intensity Min in the measurement location B, (C). Is a graph showing the maximum illuminance Max and the minimum illuminance at the measurement location C, and (D) is a graph showing the maximum illuminance Max and the minimum illuminance Min at the measurement location D.

Hereinafter, embodiments of the present invention will be described with reference to the drawings.
FIG. 1 is a diagram schematically illustrating an irradiation apparatus according to the present embodiment. FIG. 2 is a diagram schematically showing the illuminance distribution of the workpiece by irradiation of only the ultraviolet lamp and the main reflector.
As shown in FIG. 1, the irradiation device 1 is a device that incorporates an ultraviolet lamp 10 and can irradiate the entire area of the work 2 that is an irradiation region with uniform illuminance (that is, good uniformity). The irradiation apparatus 1 is also used as a photocuring apparatus that cures a photocurable resin used for the work 2 by irradiating the work 2 with light using a substrate such as a liquid crystal panel as the work 2. The irradiation device 1 irradiates the work 2 with a plurality of (in this embodiment, five) linear light sources. In the irradiation device 1, the straight tube type high-output ultraviolet lamp 10 is used as the ultraviolet light source. It is used.

  The irradiation apparatus 1 includes a plurality of (in the present embodiment, five) irradiators 1A to 1E in a housing 3 having a light exit opening 3A on the lower surface. Each of the irradiators 1 </ b> A to 1 </ b> E includes a single ultraviolet lamp 10 and a main reflector (main reflector) 12 that controls the emitted light of the ultraviolet lamp 10 in the case 11. Are arranged in parallel in the lamp width direction (light source parallel direction) W orthogonal to the. Moreover, the irradiation apparatus 1 is provided with a square cylindrical auxiliary reflector (auxiliary reflector) 14 below the irradiators 1A to 1E. The main reflecting plate 12 and the auxiliary reflecting plate 14 constitute a reflecting mirror of the irradiation device 1. Further, the irradiation apparatus 1 includes a mask holding member 40 below the auxiliary reflecting plate 14, and the mask holding member 40 holds a light shielding mask 50 that blocks the ultraviolet rays of the ultraviolet lamp 10.

The workpiece 2 is placed on an irradiation stage 4 configured to be movable up and down, and when the irradiation stage 4 is raised to the irradiation position, a gap δ (in this embodiment) is directly below the light emission opening 3A of the housing 3. 2 mm), and is an area having approximately the same size as the light exit opening 3A. In the irradiation apparatus 1, the workpiece 2 is set at a position relatively close to the light exit opening 3A.
The ultraviolet lamps 10 extend in parallel directly above the workpiece 2, and the ultraviolet lamps 10 at both ends are arranged directly above the edge of the workpiece 2. The long side La of the workpiece 2 is set to be substantially the same length as the tube length of the ultraviolet lamp 10 or less than the tube length, and a long arc lamp having a long tube length is used for the ultraviolet lamp 10 so that the workpiece 2 The area is being increased.

As described above, the irradiation device 1 includes the main reflector 12 and the auxiliary reflector 14, and makes the workpiece 2 uniform with direct light from the ultraviolet lamp 10 and reflected light from the main reflector 12 and the auxiliary reflector 14. Irradiation is possible with illuminance.
Here, when the workpiece 2 is irradiated only by the direct light of the ultraviolet lamp 10, the illuminance distribution in the vicinity including the major axis K (FIG. 2) of the workpiece 2 has luminance in the lamp tube axis direction (longitudinal direction) of the ultraviolet lamp 10. Distribution is reflected almost directly.
Therefore, the light emitted from the ultraviolet lamp 10 and deviating from the work 2 is reflected by the main reflection plate 12 and the auxiliary reflection plate 14 and illuminated so as to compensate for the illuminance distribution of the direct light in the work 2, so that the uniformity of the work 2 is increased. Has been enhanced.

  The main reflector 12 reflects light radiated around the ultraviolet lamp 10 (more precisely, in the horizontal direction) toward the workpiece 2 to improve the illuminance of the irradiated surface 2A and make the illuminance uniform. It aims to make it easier. The main reflection plate 12 is formed in a bowl shape extending along the tube axis of the ultraviolet lamp 10, and a surface facing the ultraviolet lamp 10 is formed as a reflection surface. As shown in FIG. 2, the workpiece 2 has the same illuminance extending along with the region Xa on both sides of the region Xa extending directly below the ultraviolet lamp 10 by the reflection of the main reflector 12. Region Xb appears. Thereby, the illuminance immediately below the ultraviolet lamp 10 is distributed and illuminated in the direction of the short side Lb of the workpiece 2.

  As shown in FIG. 1, a rectangular irradiation opening 11 </ b> A in a plan view is formed in the case 11 immediately below the ultraviolet lamp 10, and the longitudinal direction coincides with the longitudinal direction (axial direction) of the ultraviolet lamp 10. It is provided as follows. A wavelength selection filter 13 for selecting the wavelength of light to be transmitted is provided inside the irradiation opening 11A, and the irradiation apparatus 1 emits light of a desired wavelength by the wavelength selection filter 13. In this embodiment, the wavelength selection filter 13 is provided. However, when the ultraviolet lamp 10 itself can emit light having a desired wavelength, the wavelength selection filter 13 may be omitted. A single wavelength selection filter may be disposed between the ultraviolet lamp 10 and the light emission opening 3A. The case 11 may be omitted.

The auxiliary reflecting plate 14 is provided between the main reflecting plate 12 and the work 2, and reflects the light leaking out of the work 2 toward the work 2, thereby illuminance due to irradiation of the ultraviolet lamp 10 and the main reflecting plate 12. It supplements the distribution.
More specifically, in this irradiation apparatus 1, when irradiation is performed only with the ultraviolet lamp 10 and the main reflector 12, as shown in FIG. 2, the region Xc corresponding to both ends of the ultraviolet lamp 10 and the ultraviolet lamp 10 Illuminance is insufficient in the region Xd on both sides of the region Xa in the lamp width direction W. In the irradiation apparatus 1, the auxiliary reflector 14 is configured to compensate for the insufficient illuminance in the regions Xc and Xd with reflected light.

Specifically, as shown in FIG. 1, the auxiliary reflector 14 has a pair of auxiliary end plates 20 facing both ends of the ultraviolet lamp 10 and a pair of auxiliary side plates 21 facing both sides of the ultraviolet lamp 10. doing. The auxiliary end plate 20 and the auxiliary side plate 21 are assembled in a rectangular tube shape surrounding the work 2 and its inner wall surface is configured as a reflecting surface. Irradiators 1 </ b> A to 1 </ b> E are provided on the base end portion 14 </ b> A side of the auxiliary reflecting plate 14 with a space S <b> 1 having a predetermined distance (about 50 mm). The side of the front end portion 14B of the auxiliary reflecting plate 14 is opened in a rectangular shape in plan view, and a mask holding member 40 is provided immediately below the opening with a space S2 of a predetermined distance (about 50 to 70 mm).
Under such a configuration, the pair of auxiliary end plates 20 reflects light toward the region Xc, and the pair of auxiliary side plates 21 reflects light toward the region Xd, and these reflected lights cause the region Xc, The Xd illuminance is compensated.

3A and 3B are views showing the work 2 and the light shielding mask 50, FIG. 3A is a cross-sectional view of the work 2, and FIG. 3B is a perspective view showing the work 2 and the light shielding mask 50.
As shown in FIG. 3, the work 2 is provided with a sealing material (liquid crystal sealing material) 2C made of an ultraviolet curable resin between two substrates 2B, and a liquid crystal panel in which the liquid crystal 2D is sealed in the sealing material 2C. It is. The workpiece 2 is formed by irradiating the sealing material 2C with ultraviolet rays so that the sealing material 2C is cured and the two substrates 2B are bonded together. One substrate 2B is an array substrate having a TFT (thin film transistor) circuit (not shown) at a position corresponding to the liquid crystal 2D, and the other substrate 2B is a color filter having a color filter (not shown) at a position corresponding to the liquid crystal 2D. It is a substrate. FIG. 3 shows the work 2 arranged so that the substrate 2B having the TFT circuit becomes the irradiated surface 2A. Here, when the liquid crystal 2D is irradiated with ultraviolet rays when the sealing material 2C is irradiated with ultraviolet rays, the characteristics of the liquid crystal 2D change. Therefore, the irradiation apparatus 1 is provided with a light shielding mask 50 that shields light traveling toward the liquid crystal 2D.

  The light shielding mask 50 includes a light shielding portion 51 formed at a position corresponding to the liquid crystal 2D and a light transmitting portion 52 formed at a position corresponding to the sealing material 2C. In the light shielding mask 50, one or more (four in the present embodiment) openings 50A are formed in a single light shielding material (for example, a metal plate), so that the edge forming the openings 50A has the light shielding parts 51 formed therein. The inside of the opening 50 </ b> A constitutes the light transmitting part 52. As shown in FIG. 1, the light shielding mask 50 is attracted and held on the lower surface of the mask holding member 40.

FIG. 4 is a perspective view showing the mask holding member 40. FIG. 5 is a perspective view showing the holding bar. 6A and 6B are views showing the holding bar, FIG. 6A is a plan view, and FIG. 6B is a cross-sectional view taken along line AA in FIG. 6A. 7 is a cross-sectional view taken along line BB in FIG. FIG. 8 is a diagram schematically showing the irradiation apparatus 1 with the mask holding member 40 raised.
As shown in FIG. 4, the mask holding member 40 includes a frame-shaped mask holder (frame body) 41 formed in a substantially rectangular shape in plan view, and the mask holder 41 includes a plurality of rod-shaped masks (in this embodiment, 8 ) Holding bar (holding portion) 42 is supported. The mask holder 41 is made of a material having rigidity capable of supporting the holding bar 42 (for example, a metal such as aluminum, stainless steel, iron, or aluminum in the present embodiment), and the inner surface 41A is the size of the light emission opening 3A. It is formed to have the above size.

The plurality of holding bars 42 are formed to have a length over the light emission opening 3A using a light transmissive material (preferably a transparent member, quartz in the present embodiment), arranged in the lamp width direction W, 42A is supported by the mask holder 41.
In this way, by configuring the mask holding member 40 using the plurality of holding bars 42, it is not necessary to use a single large quartz plate with high processing accuracy, so the members constituting the mask holding member 40 can be downsized. As a result, weight reduction and cost reduction can be realized. Note that the plurality of holding bars 42 may be formed of a single quartz plate. In the present embodiment, the holding bars 42 are arranged at equal intervals. However, the arrangement interval is not limited to the equal intervals, and is appropriately set according to the size of the work 2 and the arrangement of the liquid crystal cells inside the work 2. Is done.

  As shown in FIGS. 5 and 6, the holding bar 42 is formed in a substantially rectangular tube shape, and includes a suction groove 43 </ b> A on the lower surface (surface on the irradiated surface 2 </ b> A side). As shown in FIG. 5, the suction grooves 43 </ b> A of the present embodiment are provided in two rows along the longitudinal direction of the holding bar 42, and each row is divided into two at the approximate center in the longitudinal direction of the holding bar 42. However, it is not limited to the number and arrangement of the adsorption grooves 43A. At both ends in the longitudinal direction of the holding bar 42, a passage 43B communicating with the suction groove 43A is formed.

  Both ends in the longitudinal direction of the holding bar 42 are supported by the mask holder 41 by a support body 44 as shown in FIGS. The support body 44 includes a support block 44B having an insertion groove 44A for inserting the holding bar 42, and a pressing member 44C for pressing the upper surface (surface on the ultraviolet lamp 10 side) of the holding bar 42 inserted into the insertion groove 44A. Yes. A sheet 44D made of an elastic material (for example, silicon rubber) is disposed between the pressing member 44C and the upper surface of the holding bar 42, and is fixed to the upper surface of the support block 44B by a fixing tool 44E (for example, a bolt). The holding bar 42 is fixed to the support 44. The support body 44 is fixed to the mask holder 41 via a linear bearing 44F (for example, a linear bush) that supports the mask holder 41 in a vertical direction (vertical direction). In FIG. 7, reference numeral 44G is a fixing tool (for example, a bolt) for positioning and fixing the support body 44, and reference numeral 44H is a retaining tool (for example, a bolt) for the linear bearing 44F. The linear bearing 44F is supported by a circular hole 44J in a plan view on the support body 44 on one end side in the longitudinal direction of the holding bar 42, and the linear bearing 44F is supported on the support body 44 on the other end side in the longitudinal direction of the holding bar 42. The hole 44J to be formed is formed in a long hole shape. Further, in the support body 44 on the other end side, the end face of the linear bearing 44F is in contact with the support body 44, and therefore the stopper 44H is omitted.

  As shown in FIG. 6, a connecting portion 44 </ b> K that connects the air tube 45 is attached to the support body 44 at a position corresponding to the passage 43 </ b> B of the holding bar 42. The air tube 45 is connected to a decompressor (not shown), and when the decompressor is driven, the passage 43B of the holding bar 42 is decompressed, and the light shielding mask 50 is adsorbed to the holding bar 42 by suction from the adsorption groove 43A. Held.

  In the irradiation apparatus 1 shown in FIG. 1, for example, when the workpiece 2 is arranged so that the substrate 2B having the color filter becomes the irradiated surface 2A, the ultraviolet light is irradiated without using the light shielding mask 50. There is. In this case, if there is the holding bar 42 in the light exit opening 3A, the illuminance distribution on the irradiated surface 2A deteriorates due to the influence of the light reflected or refracted by the holding bar 42. In particular, when the ultraviolet light reflected or refracted by the holding bar 42 is condensed on the liquid crystal 2D, the characteristics of the liquid crystal 2D change, which is a problem.

Therefore, in this embodiment, the mask holding member 40 is supported so as to be movable up and down. More specifically, the mask holder 41 is supported by an elevating mechanism (driving means) 46 such as an air cylinder, for example, and the mask holding member 40 is a mask that supports a holding bar 42 as shown in FIG. The holder 41 is moved up and down.
The ultraviolet lamp 10, the elevating mechanism 46, the linear motion mechanism (not shown) that elevates and lowers the irradiation stage 4, and the decompressor are connected to the control device 60 of the irradiation apparatus 1. Under the control of the control device 60, the lighting of the ultraviolet lamp 10 and the driving of the elevating mechanism 46, the linear motion mechanism, and the decompressor are controlled.

The light shielding mask 50 is attached and detached while the irradiation stage 4 is lowered. When removing the light shielding mask 50, the decompressor is stopped to release the pressure reduction, and the light shielding mask 50 is removed from the mask holding member 40. Then, the elevating mechanism 46 is driven to raise the mask holding member 40 to a predetermined height H. As a result, the mask holding member 40 is separated from the irradiated surface 2A, so that the light having nonuniform intensity due to reflection and refraction at the holding bar 42 is between the mask holding member 40 and the irradiated surface 2A. It is mixed with other light, and uneven illuminance on the irradiated surface 2A by the holding bar 42 can be suppressed.
When the light shielding mask 50 is attached or detached, the ultraviolet lamp 10 may remain on or may be turned off.

FIG. 9 shows a result of simulating the illuminance at a predetermined measurement location on the irradiated surface 2A by changing the lift-up position of the mask holding member 40. In FIG.
FIG. 9 is a diagram illustrating the relationship between the lift-up position (lifting height) of the mask holding member 40 and the illuminance. FIG. 9 (A) is a diagram illustrating the measurement location, and FIG. 9 (B) is the measurement location B. 9C is a graph showing the maximum illuminance Max and the minimum illuminance at the measurement location C, and FIG. 9D is a graph showing the maximum illuminance Max and the minimum illuminance Min at the measurement location D. It is a graph. 9B to 9D, the horizontal axis represents the lift-up position, and the vertical axis represents the illuminance (mW / cm ² ). The reference position (0 mm) of the lift-up position is the position of the mask holding member 40 when irradiating using the light shielding mask 50, and a space S2 of a predetermined distance is provided between the auxiliary reflector 14 shown in FIG. Position.

  As shown in FIG. 9A, in the irradiated surface 2A whose effective irradiation area is 1500 m wide × 1280 m long, when the center position in the lamp length direction L in the lamp width direction W is 0 mm, the lamp width Regarding the direction W, the measurement points B to D are at positions of 0 to 750 mm. Moreover, about the lamp length direction L, the measurement location B is 0 mm, the measurement location C is 300 mm, and the measurement location D is 640 mm.

  As shown in FIGS. 9B to 9D, the minimum illuminance Min increases and the uniformity improves only by raising the mask holding member 40 by 20 mm from the reference position (0 mm). When the lift-up position is 20 to 40 mm, it does not change much, but when the mask holding member 40 is lifted 60 mm, the minimum illuminance Min increases and the maximum illuminance Max decreases, so the uniformity improves. The degree of uniformity gradually improves when the lift-up position is 60 to 120 mm, but is almost unchanged after 140 mm.

  Therefore, even if the mask holding member 40 is raised by 20 mm from the reference position, the uniformity can be greatly improved. If the mask holding member 40 is raised 60 mm from the reference position, the uniformity can be further improved. In the present embodiment, when irradiating without using the light shielding mask 50, the space S <b> 2 between the front end portion 14 </ b> B of the auxiliary reflector 14 and the upper surface of the mask holding member 40 is 20 mm or more depending on the type of the work 2. The mask holding member 40 is raised within a range equal to or less than this distance.

  As described above, according to the present embodiment, since the mask holding member 40 is supported so as to be movable up and down, the mask holding member 40 is separated from the irradiated surface 2A when the light shielding mask 50 is not used. The influence of reflection or refraction at the holding bar 42 of the holding member 40 can be suppressed.

  In addition, according to the present embodiment, the mask holding member 40 includes the holding bar 42 made of a light-transmitting material and the mask holder 41 that supports the edge 42A of the holding bar 42, and the mask holder 41 can be moved up and down. It was set as the structure supported by. With this configuration, it is possible to support the mask holder 41 that can be formed more robustly than the holding bar 42, and it is not necessary to support the holding mechanism 42 that is relatively easily damaged and expensive on the lifting mechanism 46. The breakage of the holding bar 42 due to can be suppressed.

  Moreover, according to this embodiment, since the raising / lowering mechanism 46 which raises / lowers the mask holding member 40 automatically was provided, the mask holding member 40 can be raised / lowered easily. Further, since the mask holding member 40 can be raised and lowered without turning off the ultraviolet lamp 10, the manufacturing process can be shortened.

  In addition, according to the present embodiment, the ultraviolet lamp 10 is used as a linear light source, and the main reflection plate 12 that reflects the light toward the periphery of the ultraviolet lamp 10 to the workpiece 2 is provided, and between the mask holding member 40 and the ultraviolet lamp 10. An auxiliary reflecting plate 14 surrounding the work 2 is provided therebetween, and a space S2 for moving the mask holding member 40 up and down is provided between the auxiliary reflecting plate 14 and the work 2. With this configuration, the mask holding member 40 can be raised not under the auxiliary reflecting plate 14 but under the auxiliary reflecting plate 14, so compared with the case where the mask holding member 40 is raised inside the auxiliary reflecting plate 14. Irradiance unevenness at the work 2 can be further reduced.

  Further, according to the present embodiment, when irradiating without using the light shielding mask 50, the mask holding member 40 is raised by 20 mm or more from the position irradiated with the light shielding mask 50, so that the uniformity can be greatly improved. .

However, the above-described embodiment is an aspect of the present invention, and it is needless to say that the embodiment can be appropriately changed without departing from the gist of the present invention.
For example, in the above-described embodiment, the holding bar 42 is separated from the irradiated surface 2A. In addition to this, for example, a light interference film is formed on the upper surface or the lower surface of the holding bar 42 to reduce light reflection. And generation | occurrence | production of uneven illumination may be suppressed.

In the above-described embodiment, the lifting mechanism 46 is described as an air cylinder, but the lifting mechanism 46 is not limited to this.
In the above-described embodiment, the lifting mechanism 46 that automatically lifts and lowers the mask holding member 40 is provided. However, the mask holding member 40 may be configured to be lifted and lowered manually.

In the embodiment described above, the auxiliary reflector 14 is provided, but the auxiliary reflector 14 may be omitted.
In the above-described embodiment, the five ultraviolet lamps 10 are used as the linear light sources, but the number of linear light sources is not limited to this. Instead of the ultraviolet lamp 10, a linear light source in which light emitting elements such as ultraviolet LEDs are linearly arranged can be used. Further, the light emitted from the linear light source is not limited to ultraviolet rays.

  Moreover, although embodiment mentioned above demonstrated the irradiation apparatus 1 as a photocuring apparatus, this invention is applicable to various irradiation apparatuses.

DESCRIPTION OF SYMBOLS 1 Irradiation device 3A Light emission opening 10 Ultraviolet lamp (light source)
12 Main reflector 14 Auxiliary reflector (auxiliary reflector)
40 Mask holding member 41 Mask holder (frame)
42 Holding bar (holding part)
42A Edge 44 Lifting mechanism (drive means)
50 Shading mask 60 Controller S2 Space

Claims (5)

In an irradiation apparatus in which a mask holding member is disposed in a light emission opening that emits light of a light source, and a light shielding mask that shields light of the light source is held on the mask holding member.
An irradiation apparatus, wherein the mask holding member is supported to be movable up and down. The mask holding member includes a holding portion made of a light-transmitting material, and a frame body that supports an edge of the holding portion,
The irradiation apparatus according to claim 1, wherein the frame body is supported to be movable up and down.   The irradiation apparatus according to claim 1, further comprising a driving unit that automatically moves the mask holding member up and down. The light source is a linear light source, and includes a main reflecting mirror that reflects light toward the periphery of the linear light source to the irradiated object, and surrounds the irradiated object between the mask holding member and the linear light source. An auxiliary reflector is provided,
The irradiation apparatus according to claim 1, wherein a space for raising and lowering the mask holding member is provided between the auxiliary reflecting mirror and the irradiated object.   5. The irradiation apparatus according to claim 1, wherein when irradiating without using the light shielding mask, the mask holding member is raised by 20 mm or more from a position to be irradiated using the light shielding mask. .

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