JP2012176339A - Light treatment apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a light treatment apparatus in which the breakage of an excimer lamp by the movement of an optical radiation unit can be prevented, and that can reliably perform expected ultraviolet irradiation treatment.SOLUTION: The light treatment apparatus includes: a light radiation unit configured by disposing a long excimer lamp in the inside of a casing; and a light radiation unit-moving mechanism making the light radiation unit perform reciprocating horizontal movement to be able to approach and retreat to a light treating region, wherein both ends in the longitudinal direction of the excimer lamp is fixed to the casing in the condition in which the longitudinal direction agrees with the moving direction of the light radiation unit.

Description

  The present invention relates to an optical processing apparatus suitable for performing, for example, a dry cleaning process on a template surface in a nanoimprint apparatus.

In recent years, in the manufacture of semiconductor chips and biochips, optical nanoimprint technology has attracted attention as a method that can be manufactured at a lower cost than conventional pattern formation methods using photolithography and etching.
In the pattern forming method using this optical nanoimprint technology, a pattern forming material layer is formed by applying a liquid photocurable resin on a substrate on which a pattern is to be formed, for example, a wafer, and this pattern forming material layer is formed. In this state, a template (mold) on which a pattern serving as a negative of the pattern to be formed is brought into contact and cured by irradiating the pattern forming material layer with ultraviolet rays, and then the obtained cured resin The process of peeling a template from a layer is performed (refer patent document 1 and patent document 2).

In such a pattern forming method, if a foreign substance or the like is present on the surface of the template, a defect is generated in the obtained pattern.
Thus, as a method for cleaning the template, a wet cleaning method using a chemical such as an organic solvent, alkali, or acid is known (see Patent Document 3).
However, in such a wet cleaning method, there is a possibility that a part of the template is dissolved by an organic solvent or chemicals and the pattern shape is deformed. Also, when the template is removed from the cured resin layer, if a residue such as a photocurable resin adheres to the template, it is necessary to perform a template cleaning process every time pattern formation is completed. Since a considerably long time is required for the processing, there is a problem that productivity is remarkably lowered.
On the other hand, for example, in the manufacture of a liquid crystal display element, an optical cleaning processing apparatus is used as a means for cleaning a glass substrate (see Patent Document 4).

JP 2000-194142 A JP 2008-91782 A JP 2009-266841 A JP-A-8-236492

  Thus, the present inventors have moved the light emitting unit having a long excimer lamp so that the light emitting unit is arranged so as to be opposed to the pattern surface of the template in the nanoimprint apparatus by the light emitting unit moving mechanism. Thus, an optical processing apparatus used for optically cleaning the surface of the template has been proposed (see Japanese Patent Application No. 2010-046127).

However, it has been found that the following new problem occurs in the optical processing apparatus having such a configuration.
As shown in FIG. 11, when the light emitting unit 20 is reciprocally moved horizontally in a direction (indicated by a white arrow) perpendicular to the longitudinal direction of the excimer lamp 30 by a light emitting unit moving mechanism (not shown), the excimer is moved. The central portion of the discharge vessel 31 in the longitudinal direction of the lamp 30 is affected by the acceleration caused by the reciprocating movement, and the central portion is distorted. There is a problem that leads to damage. Further, from the viewpoint of improving the throughput, it is desirable that the light emitting unit 20 is reciprocated at a high speed. However, since the light emitting unit 20 is suddenly started and stopped repeatedly, the above problem occurs. It becomes easy.

  The present invention has been made based on the above circumstances, and can prevent the excimer lamp from being damaged by moving the light emitting unit, and can reliably perform the intended ultraviolet irradiation treatment. An object of the present invention is to provide an optical processing device that can be used.

The light processing apparatus of the present invention includes a light radiating unit in which a long excimer lamp is disposed inside a casing, and a light radiating unit moving mechanism for reciprocating and horizontally moving the light radiating unit so as to enter and leave the light processing region. And
The excimer lamp is characterized in that both ends in the longitudinal direction are fixed to the casing in a state where the longitudinal direction thereof coincides with the moving direction of the light emitting unit.

  In the light processing apparatus of the present invention, the light radiating unit has a shape that is long in one direction, and the light radiating unit moving mechanism is configured such that the longitudinal direction of the light radiating unit coincides with the moving direction of the light radiating unit. It is preferable that it is the structure connected with.

  Moreover, in the light processing apparatus of the present invention, the light emitting unit is formed with a light extraction window having ultraviolet transparency, and the light emission unit is a pattern surface of a template in the nanoimprint apparatus. It is preferable that it is set as the structure arrange | positioned so that it may oppose.

  According to the light processing apparatus of the present invention, the light emitting unit reciprocally moved horizontally so as to be able to enter and leave the light processing region by the light emitting unit moving mechanism is a long excimer lamp, and the longitudinal direction thereof is the light emitting unit. In this state, both ends in the longitudinal direction are fixed to the casing, so that the influence of acceleration caused by the reciprocating movement of the light emitting unit (starting and stopping of the light emitting unit) is excimer lamp. Therefore, it is possible to reliably prevent the discharge vessel of the excimer lamp from being distorted, and to perform the intended ultraviolet irradiation treatment with certainty. In addition, the light emitting unit can be reciprocated at high speed, and the throughput can be improved.

  Further, the light emitting unit has a configuration that is long in one direction, and is configured to be connected to the light emitting unit moving mechanism so that the longitudinal direction of the light emitting unit matches the moving direction of the light emitting unit. The area of the moving path necessary for reciprocating the light emitting unit (area of the region through which the light emitting unit passes) can be reduced, and the apparatus can be downsized.

It is a perspective view which shows the outline of a structure in an example of the optical processing apparatus of this invention. It is a perspective view which shows the outline of a structure in an example of the light emission unit in the optical processing apparatus shown in FIG. It is sectional drawing for description along the longitudinal direction which cut | disconnects and shows the light emission unit shown in FIG. 2 by the plane perpendicular | vertical to a light extraction window. It is sectional drawing for description which cut | disconnects and shows the light emission unit shown in FIG. 2 by the plane along a light extraction window. It is explanatory drawing which shows the outline of a structure in an example of the light emission unit moving mechanism in the optical processing apparatus shown in FIG. It is a perspective view which shows the outline of a structure of the excimer lamp in the light emission unit shown in FIG. It is a perspective view which shows an example of the support structure of the excimer lamp in the light emission unit shown in FIG. It is explanatory drawing which shows the outline of a structure in an example of the nanoimprint apparatus carrying the optical processing apparatus of this invention. In the nanoimprint apparatus shown in FIG. 8, the light emission unit is an explanatory view showing a state in which the light extraction window is arranged to face the pattern surface of the template with a gap. It is sectional drawing for description which shows the outline of a structure of the light emission unit in the other example of the optical processing apparatus concerning this invention. It is explanatory drawing which shows the structure of the light emission unit with which the excimer lamp was fixed to the casing in the state where the longitudinal direction was orthogonal to the moving direction of a light emission unit.

Hereinafter, embodiments of the present invention will be described in detail.
FIG. 1 is a perspective view showing an outline of the configuration of an example of the optical processing apparatus of the present invention, FIG. 2 is a perspective view showing the outline of the configuration of an example of a light emitting unit in the optical processing apparatus shown in FIG. FIG. 4 is a sectional view for explaining the light emitting unit shown in FIG. 2 along the longitudinal direction cut by a plane perpendicular to the light extraction window, and FIG. 4 is a plan view of the light emitting unit shown in FIG. 2 along the light extraction window. FIG. 5 is an explanatory diagram showing an outline of the configuration of an example of the light radiating unit moving mechanism in the optical processing apparatus shown in FIG. 1.
The light processing apparatus 10 is used for performing a light cleaning process on the surface of a template in a nanoimprint apparatus, and includes a light emitting unit 20 including an excimer lamp 30 and the light emitting unit 20 with respect to a light processing region. The light emission unit moving mechanism 40 that linearly reciprocates horizontally so as to enter and leave, and the power supply unit 11 that turns on the excimer lamp 30 and drives the light emission unit moving mechanism 40 are provided. In FIG. 1, reference numeral 39 denotes a power supply line for the excimer lamp 30.

  The light radiating unit moving mechanism 40 in the light processing apparatus 10 according to this embodiment includes a flat unit support base 41 extending in the horizontal direction on which the light radiating unit 20 is fixed, and the light of the unit support base 41. The cylinder device 45 is connected to an end portion (left end portion in FIG. 5) on the rear side in the approach direction with respect to the processing region, and is configured to expand and contract in the horizontal direction. A piston (not shown) in the cylinder device 45 and By moving the piston rod 47 back and forth in the horizontal direction in the cylinder 46, the light emitting unit 20 is moved (within a horizontal plane) while maintaining the same height position.

The light emitting unit 20 includes a substantially rectangular parallelepiped metal casing 21 whose outer shape is long in one direction. In the casing 21, the lamp housing chamber S1 and the circuit chamber S2 are disposed, and the lamp housing chamber S1 is light-treated. It is formed so as to be arranged in the longitudinal direction of the casing 21 through the partition wall 22 in a state of being positioned on the front side in the approach direction with respect to the region.
A rectangular opening K is formed in the upper wall of the casing 21 forming the lamp housing chamber S1, and a light extraction window 23 made of a material having ultraviolet transparency, such as quartz glass, is formed in a frame shape in the opening K. The fixing plate 24 is fixed and provided. Here, as a metal material constituting the casing 21, for example, aluminum, stainless steel, or the like can be used.

Further, the casing 21 is a rectangular cylinder through which the cooling gas is circulated, connected to the cooling gas supply mechanism 15 via the cooling gas circulation pipe 14 along the upper edge portion of each of both side surfaces thereof. A gas flow path member 12 is provided. More specifically, each of the gas flow path members 12 has a plurality of gas flow ports 13 formed so as to be aligned along the upper edge portion 12a on one side surface thereof, One side surface is arranged and fixed so as to contact the side surface of the casing 21 except for the upper edge portion 12 a, whereby the gas circulation port 13 is positioned around the light extraction window 23 in the casing 21.
Further, the casing 21 is provided with a purge gas supply pipe 17 for supplying a purge gas into the lamp storage chamber S1 and a purge gas discharge pipe 18 for discharging the gas from the lamp storage chamber S1. Are connected to the purge gas supply / discharge mechanism 16.

An excimer lamp 30 is disposed in the lamp housing chamber S1 of the casing 21, and a step-up transformer 38 and other electrical components are disposed in the circuit chamber S2.
As shown in FIG. 6, the excimer lamp 30 includes a plate-like discharge vessel 31 having a discharge space formed therein and elongated in one direction as a whole. Excimer gas is hermetically sealed. Of the four peripheral side surfaces extending along the longitudinal direction of the discharge vessel 31, a mesh-like high-voltage side electrode 32 is disposed on the outer surface of one wide peripheral side surface 31a, and faces the one wide peripheral side surface 31a. On the outer surface of the other wide peripheral side surface 31b, a net-like ground side electrode 33 is disposed. Further, a cap 35 is attached to each of both ends of the discharge vessel 31 in a state where a part of the discharge vessel 31 is received and held.

As a material constituting the discharge vessel 31, a material that can transmit vacuum ultraviolet rays satisfactorily, specifically, silica glass such as synthetic quartz glass, sapphire glass, or the like can be used.
As a material constituting the high voltage side electrode 32 and the ground side electrode 33, a metal material such as aluminum, nickel, gold or the like can be used. Further, the high voltage side electrode 32 and the ground side electrode 33 can also be formed by screen printing a conductive paste containing the above metal material or by vacuum vapor deposition of the above metal material.
As the excimer gas sealed in the discharge space of the discharge vessel 31, a gas capable of generating excimer that emits vacuum ultraviolet rays, specifically, a rare gas such as xenon, argon, krypton, or a rare gas, A mixed gas in which a halogen gas such as bromine, chlorine, iodine, or fluorine is mixed can be used. When a specific example of the excimer gas is shown together with the wavelength of emitted ultraviolet light, it is 172 nm for xenon gas, 191 nm for a mixed gas of argon and iodine, and 193 nm for a mixed gas of argon and fluorine.
Moreover, the sealing pressure of the excimer gas is, for example, 10 to 100 kPa.
As the step-up transformer 38, a power supply voltage of a lamp lighting power source (not shown) in the power supply unit 11, for example, 200 V can be boosted to, for example, 3 kV and supplied to the excimer lamp 30.

  In this light emitting unit 20, the excimer lamp 30 has one wide peripheral side surface 31 a on which the high-voltage side electrode 32 in the discharge vessel 31 is disposed facing the light extraction window 23 in the casing 21, and the light emitting unit 30. Both ends in the longitudinal direction are fixed to the casing 21 in a posture (horizontal direction of the discharge vessel 31 coincides with the movement direction of the light emitting unit 20) extending horizontally along the movement direction of the light emission unit 20. Specifically, as shown in FIG. 7, the base 35 of the excimer lamp 30 is connected to the housing recess 51 of the lamp support member 50 having the housing recess 51 that receives and holds the base 35 in the excimer lamp 30. The fixing member 52 is mounted so as to protrude from the upper surface of the support member 50, and a band plate-like fixing member 52 is fixed to the lamp support member 50 by screws on the upper surface of the base 35 of the excimer lamp 30. The lamp support member 50 is screwed and fixed to the lower wall of the casing 21 forming the lamp housing chamber S1, and the high-voltage side electrode 32 of the excimer lamp 30 is substantially fixed to the casing 21 as shown in FIG. It is set to the state located in the center position Lc of the height direction (up-down direction in FIG. 3).

  FIG. 8 is an explanatory diagram showing an outline of the configuration of an example of a nanoimprint apparatus equipped with the optical processing apparatus of the present invention. In FIG. 8, 61 is a template, 62 is a template holding mechanism for holding the template 61, and 63 is a chamber. Reference numeral 64 denotes a movable wafer stage. A wafer chuck 64 a for holding the wafer W is disposed on the wafer stage 64. Reference numeral 65 denotes an ink jet type application means for applying a liquid photocurable resin, which is a pattern forming material (imprint material), to the surface of the wafer W; 66, a pressurizing mechanism; 67, a vibration isolation table; A board 69 is an ultraviolet light source that irradiates the pattern forming material layer made of a photocurable resin formed on the wafer W with ultraviolet rays. Reference numeral 20 denotes a light emitting unit configured as shown in FIGS. 2 to 4. The light emitting unit 20 is horizontally moved by the light emitting unit moving mechanism 40 so as to be able to enter and leave under the template 61 (light processing region). .

In such a nanoimprint apparatus, the wafer stage 64, on which the wafer W is held on the wafer chuck 64a, is moved to a position below the coating unit 65, and a liquid photocurable resin is coated on the surface of the wafer W by the coating unit 65. As a result, a pattern forming material layer made of a photocurable resin is formed on the wafer W. Next, the wafer stage 64 is moved to a position below the template 61, and the template 61 is brought into contact with the pattern forming material layer formed on the wafer W by the pressing mechanism 66 to pressurize it. The pattern forming material layer is cured by irradiating the forming material layer with ultraviolet light from the ultraviolet light source 69 through the template 61, and then the template 61 is peeled off from the obtained cured resin layer. Formation is achieved.
When the pattern formation on the wafer W is completed once or a plurality of times, the wafer stage 64 on which the wafer W is placed is moved from the lower position of the template 61 to the side position as shown in FIG. While being retracted, the light emitting unit 20 is horizontally moved to a position below the template 61 by the light emitting unit moving mechanism 40, and the light extraction window 23 is arranged to face the pattern surface of the template 61 with a gap.
Here, the separation distance between the outer surface of the light extraction window 23 and the pattern surface of the template 61 is, for example, 0.3 to 10.0 mm.

In the light processing apparatus 10, the cooling gas supply mechanism 15 is operated, thereby supplying the cooling gas to the gas flow path member 12 via the cooling gas flow pipe 14. The cooling gas discharged from the gas flow port 13 formed in 12 is circulated in the gap between the light extraction window 23 and the template 61. In this state, the high-frequency voltage is boosted from the power supply unit 11 by the step-up transformer 38 disposed in the circuit chamber S2, supplied to the excimer lamp 30, and the excimer lamp 30 is turned on, whereby the ultraviolet light from the excimer lamp 30 is turned on. Is irradiated to the pattern surface of the template 61 through the light extraction window 23, and thus the optical cleaning process of the template 61 is achieved.
Thereafter, the light emitting unit 20 is horizontally moved by the light emitting unit moving mechanism 40 so as to be retracted from the lower position of the template 61, and the wafer stage 64 on which the wafer W is placed horizontally moves to the lower position of the template 61. Then, pattern formation on the wafer W is executed.

In the above, the flow rate of the cooling gas flowing in the gap between the light extraction window 23 and the template 61 is, for example, 100 to 1000 liters / min, and the temperature of the cooling gas is, for example, 10 to 35 ° C. .
Moreover, the irradiation time of the ultraviolet-ray with respect to the template 61 is 3 to 3600 second, for example.

  Thus, according to the light processing apparatus 10 described above, the light radiation unit 20 that is reciprocally moved horizontally so as to enter and leave the light processing area by the light radiation unit moving mechanism 40 is an excimer lamp that is long in one direction. 30 is configured to extend horizontally along the moving direction of the light emitting unit 20 and both end portions in the longitudinal direction are fixed to the casing 21, so that the light emitting unit 20 is reciprocated (light emitting unit). The influence of acceleration due to the start and stop of the light is applied to the lamp support portion (fixed portion) formed at a position aligned in the moving direction of the light emitting unit 20, and the lamp support portion due to the influence of the acceleration serves as a fulcrum. Since the applied moment does not act on the central portion of the discharge vessel 31, it is possible to reliably prevent the discharge vessel 31 of the excimer lamp 30 from being distorted. , It can be reliably expected ultraviolet irradiation treatment. In addition, the light emitting unit 20 can be reciprocated at high speed, and the throughput can be improved.

  Further, the light emitting unit 20 has a shape that is long in one direction, and is configured to be connected to the light emitting unit moving mechanism 40 so that the longitudinal direction of the light emitting unit 20 coincides with the transport direction of the light emitting unit 20. Therefore, the area of the moving path (area of the area through which the light emitting unit passes) necessary for reciprocating and horizontally moving the light emitting unit 20 can be reduced, and the light processing apparatus 10 can be downsized. Can do.

Furthermore, according to the light processing apparatus 10 described above, the following effects are achieved.
(1) In the casing 21 of the light emitting unit 20, the excimer lamp 30 is disposed at a position on the front side in the approach direction with respect to the light processing region, so that the light is emitted from the retracted position of the light emitting unit 20. Since the moving distance to the processing position where the light extraction window 23 in the radiation unit 20 is arranged facing the template 61 can be reduced, the tact time can be shortened.
(2) The power supply line 39 is led out from the rear end of the light emitting unit 20 with respect to the light processing area in the approach direction and connected to the lamp lighting power supply, so that the lamp lighting power supply and the light processing area Since the distance to the step-up transformer 38 arranged at the position on the rear side in the approach direction with respect to the can be reduced, it is possible to simplify the routing of the feeder line.
(3) Since the step-up transformer having a relatively large weight is arranged at a position on the rear side in the approach direction with respect to the light processing region in the casing 21, the cylinder device 45 constituting the light emitting unit moving mechanism 40 is provided. Since the inclination of the unit support base 41 caused by the moment acting on the light emitting unit 20 with the fixing portion for the power supply unit 11 as a fulcrum can be suppressed, the height position of the light emitting unit 20 can be stabilized. Further, it is possible to suppress an increase in the distance between the light extraction window 23 and the template 61, and thus it is possible to reliably perform the intended ultraviolet irradiation process.

(4) By circulating the cooling gas through the gap between the light extraction window 23 and the template 61, which is the object to be processed, through the gas distribution port 13 positioned around the light extraction window 23 of the casing 21, Since the light extraction window 23 and the template 61 are cooled, the ultraviolet irradiation of the template 61 is performed while reliably suppressing the temperature of the template 61 from rising due to the irradiation of ultraviolet light and the radiant heat from the light extraction window 23. Can do.
(5) In the excimer lamp 30, one wide peripheral side surface 31 a on which the high voltage side electrode 32 is disposed in the discharge vessel 31 faces the light extraction window 23, and the high voltage side electrode 32 is accommodated in the lamp in the casing 21. By being arranged so as to be positioned at the center position Lc in the height direction of the chamber S1, the separation distance between the high voltage side electrode 32 and the inner surface of the upper wall forming the lamp housing chamber S1 is increased. While ensuring as large as possible, the dimension of the casing 21 itself in the height direction can be reduced. Therefore, the entire apparatus can be reduced in size, and the high-voltage side electrode 32 in the excimer lamp 30 can be reduced. External discharge between the casing 21 and the casing 21 can be prevented, and the intended ultraviolet irradiation process can be reliably performed, and the temperature rise of the light extraction window 23 can be further suppressed. It is possible.

As mentioned above, although embodiment of this invention was described, this invention is not limited to said embodiment, A various change can be added.
For example, as shown in FIG. 10, the light emitting unit 20 can have a configuration in which a plurality of excimer lamps 30 are arranged in the lamp housing chamber S <b> 1 in the casing 21. The respective excimer lamps 30 are arranged in parallel with each other so that the longitudinal direction thereof coincides with the moving direction of the light emitting unit 20, and both end portions in the longitudinal direction are fixed to the casing 21.
Moreover, the processing target of the optical processing apparatus of the present invention is not limited to the template in the nanoimprint apparatus, and can be applied to various types that require ultraviolet irradiation processing.

DESCRIPTION OF SYMBOLS 10 Optical processing apparatus 11 Power supply unit 12 Gas flow path member 12a Upper edge part 13 Gas distribution port 14 Cooling gas distribution pipe 15 Cooling gas supply mechanism 16 Purge gas supply / discharge mechanism 17 Purge gas supply pipe 18 Purge gas Exhaust tube 20 Light emitting unit 21 Casing 22 Bulkhead 23 Light extraction window 24 Fixing plate K opening S1 Lamp housing chamber S2 Circuit chamber 30 Excimer lamp 31 Discharge vessel 31a One wide peripheral side surface 31b The other wide peripheral side surface 32 High voltage side Electrode 33 Ground side electrode 35 Base 38 Step-up transformer 39 Feed line 40 Light emission unit moving mechanism 41 Unit support base 45 Cylinder device 46 Cylinder 47 Piston rod 50 Lamp support member 51 Housing recess 52 Fixing member 61 Template 62 Template holding mechanism 63 Chamber 64 Wafer stage 64a Wafer chuck 65 Application means 66 Pressure mechanism 67 Vibration isolation table 68 Stage surface plate 69 Ultraviolet light source W Wafer

Claims (3)

A light emitting unit in which a long excimer lamp is arranged inside the casing, and a light emitting unit moving mechanism for reciprocating horizontally moving the light emitting unit so as to be able to enter and leave the light processing area;
The excimer lamp is characterized in that the longitudinal direction of the excimer lamp coincides with the moving direction of the light emitting unit, and both end portions in the longitudinal direction are fixed to the casing.   The light emitting unit has a shape that is long in one direction, and is connected to the light emitting unit moving mechanism so that the longitudinal direction of the light emitting unit matches the moving direction of the light emitting unit. The optical processing apparatus according to claim 1.   The light emission unit is formed with a light extraction window having ultraviolet transparency, and the light emission unit is arranged so that the light extraction window faces the pattern surface of the template in the nanoimprint apparatus. The optical processing apparatus according to claim 1 or 2.

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