JP2015103545A - Light source device, and desmear treatment device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a light source device capable of efficiently treating an object to be treated, in which recessed parts are formed and which is made of a wiring board material, in a short time, and a desmear treatment device equipped with the light source device.SOLUTION: This light source device includes an ultraviolet radiation lamp for radiating vacuum ultraviolet rays toward the object to be treated, in which the recessed parts are formed and which is made of the wiring board material, a light-transmissive window unit disposed between the treated surface of the object to be treated and the ultraviolet radiation lamp. The light-transmissive window unit includes a first plate member disposed on the ultraviolet radiation lamp side and made of silica glass and a second plate member disposed on the side of the object to be treated, a gas introduction part for introducing treatment gas into a gap between the plate members is provided, a gas supply port by a through hole passing through the second plate member in the thickness direction thereof is formed in the second plate member, and treatment gas to which vacuum ultraviolet rays from the ultraviolet radiation lamp are radiated is supplied to the treated surface of the object to be treated from the gas supply port.

Description

  The present invention relates to a light source device and a desmear processing apparatus. More specifically, the present invention relates to a light source device suitable for, for example, smear removal (desmear) processing in a printed circuit board manufacturing process, and a desmear processing device including the light source device.

  Currently, for example, photo-ashing of resist in the manufacturing process of semiconductors, liquid crystals, etc., removal of resist adhering to the pattern surface of the template in the nanoimprint apparatus, or dry cleaning processing of glass substrates and silicon wafers for liquid crystals, printed circuit board manufacturing processes A dry cleaning method using ultraviolet rays is known as a method for performing smear removal processing, i.e., desmear processing. And as a processing apparatus for performing these processes, what used the light source device provided with the ultraviolet radiation lamp which radiates | emits vacuum ultraviolet rays, such as an excimer lamp, as an ultraviolet light source is proposed (for example, patent documents 1-1). (See Patent Document 3). These processing apparatuses utilize active species (specifically, for example, ozone and active oxygen) generated by vacuum ultraviolet rays.

For example, as shown in FIG. 3, a certain type of processing apparatus using vacuum ultraviolet rays uses light from an ultraviolet radiation lamp 51 that emits vacuum ultraviolet rays, for example, an atmosphere of a processing gas containing oxygen gas. The surface to be processed Wa of the workpiece (work) W disposed below is configured to irradiate through the light transmissive window member 58.
In this processing apparatus, a light source unit 50 is constituted by a plurality of ultraviolet radiation lamps 51. The light source unit 50 includes a box-shaped casing 52 having an opening on one side (downward in FIG. 3), and the opening of the casing 52 has a plate-like light so as to airtightly close the opening. A transmissive window member 58 is provided. In the casing 52, a plurality of bar-shaped ultraviolet radiation lamps 51 are arranged with their lamp central axes extending parallel to each other in the same horizontal plane. Further, a reflection mirror 54 and a cooling block 55 for cooling the plurality of ultraviolet radiation lamps 51 are provided.
Further, this processing apparatus is provided with a nozzle 59 for supplying a processing gas into a gap between a processing object support base (not shown) on which the processing object W is placed and a light transmissive window member 58. ing. The nozzle 59 allows the processing gas to flow in one direction (rightward in FIG. 3) along the processing surface Wa of the workpiece W, and a certain amount of processing gas is light-transmissive. It supplies so that it may spray on the window member 58. FIG.
In FIG. 3, 56 is an inert gas supply unit for introducing an inert gas such as nitrogen gas into the casing 52, and 57 is an inert gas discharge unit.
In FIG. 3, the supply direction of the processing gas from the nozzle 59 is indicated by an arrow.

In such a processing apparatus, when the wiring board material is the processing object W, the processing from the nozzle 59 is performed in order to perform processing with high uniformity on the processing surface Wa of the processing object W. Gas supply conditions are controlled.
Specifically, in the gas flow path formed by the gap between the light transmissive window member 58 and the workpiece W, when the gas flow rate is large, the upstream side (left side in FIG. 3) is caused by vacuum ultraviolet rays. The generated active species (ozone and active oxygen) are largely moved to the downstream side (right side in FIG. 3) by the gas flow. As a result, on the surface Wa to be processed W, the portion located on the upstream side of the gas flow path is insufficiently processed compared to the portion located on the downstream side, and thus the portion to be processed The object W cannot be processed uniformly. Therefore, the processing gas is supplied from the nozzle 59 at a relatively low gas flow rate.
In addition, when the processing gas is supplied at a relatively small gas flow rate, turbulent flow is less likely to occur in the gas flow path, and a laminar flow of the gas flow is achieved. Uniformity can be obtained in the flow velocity distribution of the gas on the surface Wa.

However, in such a processing apparatus, where there is a request for shortening the processing time of the workpiece W, particularly when the workpiece W is made of a wiring board material and has a recess such as a via hole, There is a problem that the request cannot be met.
More specifically, when the workpiece W has a recess, the gas flow in the gas flow path is laminarized, so that the processing flow flows through the gas flow path. It is difficult for the gas to flow into the inside of the recess, so that the reaction product gas (specifically, for example, carbon dioxide gas) generated by processing the surface Wa is likely to stay without being discharged from the recess. In addition, since the reaction product gas contains a gas that absorbs vacuum ultraviolet rays, the amount of vacuum ultraviolet rays reaching the bottom surface of the recess is reduced. Therefore, at the bottom surface of the concave portion, the amount of irradiation with vacuum ultraviolet rays is small, and the amount of ozone and active oxygen used for processing the bottom surface is reduced, so that it takes more time to process the workpiece W. It becomes.
Further, in the gas flow path, that is, in the gap between the light transmissive window member 58 and the workpiece W, in the process until the vacuum ultraviolet rays emitted from the light transmissive window member 58 reach the workpiece W, the processing is performed. Ozone and active oxygen are generated by being absorbed by oxygen in the working gas. For this reason, since more ozone and active oxygen are produced | generated in the vicinity of the light transmissive window member 58, the production | generation amount of ozone and the active oxygen near the to-be-processed object W will become relatively small. Moreover, due to the laminar flow of the gas in the gas flow path, the ozone and active oxygen generated in the vicinity of the light transmissive window member 58 are on the surface Wa side of the object W to be processed. Therefore, it cannot be effectively used for processing the workpiece W. Even due to such factors, it takes a lot of time to process the workpiece W.

Japanese Patent No. 2705023 JP-A-8-180757 JP 2004-152842 A

  The present invention has been made on the basis of the circumstances as described above, and the object thereof is a light source device capable of efficiently and quickly processing an object to be processed made of a wiring board material in which a recess is formed, Another object is to provide a desmear processing apparatus including the light source device.

The light source device of the present invention includes an ultraviolet radiation lamp that emits vacuum ultraviolet light having a wavelength of 220 nm or less toward a workpiece made of a wiring board material having recesses, and a treatment surface of the workpiece and the ultraviolet radiation. In a light source device including a light-transmitting window unit that transmits vacuum ultraviolet light from the ultraviolet radiation lamp, which is disposed between the lamp and the surface to be processed and the ultraviolet radiation lamp,
The light transmissive window unit includes a first plate member made of quartz glass disposed on the ultraviolet radiation lamp side, and a second plate disposed on the workpiece side in a state of being separated from the first plate member. And a processing gas containing at least 50% by volume of an active species source that generates active species by vacuum ultraviolet radiation from the ultraviolet radiation lamp in a gap between the first plate member and the second plate member. Is provided with a gas introduction part,
In the second plate member, a gas supply port is formed by a through-hole penetrating the second plate member in the thickness direction, and from the gas supply port to the processing surface of the object to be processed, A processing gas irradiated with vacuum ultraviolet rays from the ultraviolet radiation lamp is supplied.

  In the light source device of the present invention, it is preferable that the second plate member is made of quartz glass.

The desmear processing apparatus of the present invention is a desmear processing apparatus including the light source device of the present invention and a workpiece support base on which the workpiece is disposed.
For processing where vacuum ultraviolet rays from the ultraviolet radiation lamp supplied from the gas supply port are irradiated between the workpiece support base on which the workpiece is disposed and the light transmissive window unit. A space in which a gas flows is formed, and a gas discharge portion for discharging the gas from the space is provided at a peripheral position of the object to be processed.

In the light source device of the present invention, ultraviolet rays are emitted in the process of being introduced from the gas introduction portion into the gap between the first plate member and the second plate member with respect to the surface to be processed of the workpiece, and flowing through the gap. The processing gas irradiated with the vacuum ultraviolet rays from the lamp is supplied from a gas supply port formed in the second plate member. Since the gas supply port is provided so as to face the surface to be processed of the object to be processed, from the gas supply port, the processing gas irradiated with vacuum ultraviolet rays is supplied to the object to be processed. It can be ejected toward the surface to be processed.
Therefore, since the processing gas irradiated with vacuum ultraviolet rays can flow into the recesses on the surface to be processed of the object to be processed, the reaction product gas generated by processing the surface to be processed in the recesses There is no stagnation. Therefore, due to the reaction product gas staying in the recess, the amount of irradiation of the vacuum ultraviolet rays reaching the bottom surface of the recess is reduced, or the active species generated by the vacuum ultraviolet rays used for the treatment of the bottom surface Therefore, the surface to be processed can be uniformly processed.
Further, in the gap between the first plate member and the second plate member, a gas flow also occurs in the direction from the first plate member to the second plate member. Therefore, in the vicinity of the first plate member. The generated active species can be moved toward the surface of the object to be processed, and can be effectively used for processing the object to be processed.
Therefore, according to the light source device of the present invention, it is possible to efficiently process an object to be processed made of the wiring board material having the recesses formed in a short time.

  In the desmear treatment apparatus of the present invention, the light source device of the present invention is provided, and a gas discharge unit is provided at the peripheral position of the workpiece. Therefore, the processing gas introduced into the gap between the first plate member and the second plate member from the gas introduction portion and irradiated with the vacuum ultraviolet rays from the ultraviolet radiation lamp is processed from the gas supply port. It can be guided to flow toward the surface and further flow along the surface to be processed of the object to be processed. Therefore, it is possible to efficiently process an object to be processed made of the wiring board material having the recesses formed in a short time.

It is sectional drawing for description which shows the cross section of the direction perpendicular | vertical to the tube-axis direction of the ultraviolet radiation lamp which comprises the said desmear processing apparatus in an example of a structure of the desmear processing apparatus of this invention. It is sectional drawing for description which shows the cross section of the tube-axis direction of the ultraviolet radiation lamp in the desmear processing apparatus of FIG. It is sectional drawing for description which shows an example of a structure of the conventional processing apparatus.

Embodiments of the present invention will be described below.
FIG. 1 is an explanatory cross-sectional view showing a cross section in a direction perpendicular to the tube axis direction of an ultraviolet radiation lamp constituting the desmear treatment apparatus in an example of the configuration of the desmear treatment apparatus of the present invention, and FIG. It is sectional drawing for description which shows the cross section of the tube-axis direction of the ultraviolet radiation lamp in the 1 desmear processing apparatus.
The desmear treatment apparatus 10 treats a wiring board material in which a concave portion Wb such as a via hole is formed as a workpiece (workpiece) W.
This workpiece W has a multilayer structure and is formed with a plurality of recesses Wb.
In the example of this figure, the workpiece W has a substantially rectangular flat plate shape.

The desmear treatment apparatus 10 is disposed above the workpiece support base 11 (upward in FIGS. 1 and 2) and a holding device having a rectangular parallelepiped workpiece support base 11 on which the workpiece W is disposed. The light source device 20 is provided.
In the desmear treatment apparatus 10, the light source device 20 includes a light source unit 21 having a plurality of (eight in the illustrated example) ultraviolet radiation lamps 22, and a plurality of ultraviolet radiation lamps 22 and the object support 11 to be processed. A light transmissive window unit 30 is provided between the workpiece surface (upper surface) Wa of the workpiece W placed on the object placement surface 11a.
Further, the desmear processing apparatus 10 is provided with a rectangular annular light source unit support base 14 so as to surround the side surface of the workpiece support base 11, and the light source unit 21 is disposed on the upper surface of the light source unit support base 14. Has been. And the light source unit 21 is opposingly arranged in the state parallel to the to-be-processed object mounting surface 11a. The light source unit support 14 is provided with an accommodation space for accommodating the workpiece support 11 so as to be slidable in the vertical direction (the vertical direction in FIGS. 1 and 2). A light transmissive window unit arrangement portion is formed by a recess 14a extending over the circumference. The light transmissive window unit 30 is disposed in the light transmissive window unit arrangement portion, so that the light transmissive window unit 30 is disposed opposite to the workpiece placement surface 11a. In this manner, a processing space S having a certain thickness is formed between the light transmissive window unit 30 and the workpiece support base 11. That is, the processing space S is partitioned and sealed by the workpiece support base 11, the light transmissive window unit 30, and the light source unit support base 14. In the processing space S, the processing surface Wa of the processing object W is processed on the processing object mounting surface 11a with vacuum ultraviolet rays and active species (specifically, for example, ozone and active oxygen). An effective processing area that can be formed is formed. In this effective processing area, the workpiece W is disposed such that the processing surface Wa faces the light transmissive window unit 30 through a gap.

The workpiece support table 11 that constitutes the holding device has a workpiece mounting surface 11a that is a flat surface and has larger vertical and horizontal dimensions than the workpiece surface Wa of the workpiece W.
The holding device is provided with a drive mechanism for driving the workpiece support base 11 in the vertical direction. By moving the workpiece support 11 up and down by this drive mechanism, the separation distance between the workpiece W and the light transmissive window unit 30 can be adjusted. That is, in the desmear treatment apparatus 10, the separation distance between the workpiece W and the light transmissive window unit 30 can be set to an intended size regardless of the thickness of the workpiece W.
Here, the separation distance between the workpiece W and the light transmissive window unit 30 is 1 mm or less, preferably 0.1 to 1.0 mm, more preferably 0.1 to 0.5 mm, Especially preferably, it is 0.3-0.5 mm.
Since the separation distance between the workpiece W and the light transmissive window unit 30 is 1 mm or less, active species can be stably generated in the processing space S, and the surface to be processed of the workpiece W is processed. The vacuum ultraviolet rays reaching Wa can be set to a sufficiently large intensity (light quantity).
In the example of this figure, the separation distance between the workpiece W and the light transmissive window unit 30 is 0.5 mm.

The light source unit 21 constituting the light source device includes a substantially rectangular parallelepiped box-shaped casing 23 having an opening on one side (downward in FIGS. 1 and 2). A plurality of bar-shaped ultraviolet radiation lamps 22 are arranged in the casing 23. The plurality of ultraviolet radiation lamps 22 are arranged in parallel at regular intervals (equal intervals in FIG. 2) so that the central axes extend in parallel with each other in the same horizontal plane. The casing 23 is provided with an inert gas purge means (not shown) for purging an inert gas such as nitrogen gas. By providing this inert gas purge means, the vacuum ultraviolet rays from the ultraviolet radiation lamp 22 can be effectively used as the emitted light from the light source unit 21. That is, in the casing 23, it is possible to prevent the vacuum ultraviolet rays from the ultraviolet radiation lamp 22 from being absorbed by the gas constituting the atmosphere in the casing 23.
The light source unit 21 is arranged on the upper surface of the light source unit support base 14, so that the opening of the casing 23 is closed by the light transmissive window unit 30, the light source unit support base 14, and the workpiece support base 11. A sealed lamp housing space is formed inside the casing 23. Further, the plurality of ultraviolet radiation lamps 22 are in a state of being opposed to the processing surface Wa of the workpiece W through the light transmissive window unit 30.

As the ultraviolet radiation lamp 22, various known lamps can be used according to the type of the workpiece W as long as they emit vacuum ultraviolet light having a wavelength of 220 nm or less. Specifically, examples of the ultraviolet radiation lamp 22 include a xenon excimer lamp that emits vacuum ultraviolet light having a center wavelength of 172 nm.
In the example of this figure, as the ultraviolet radiation lamp 22, a square excimer lamp that irradiates light in a specific direction (downward direction in FIGS. 1 and 2) is used.

The light transmissive window unit 30 constituting the light source device 20 includes a first plate member 31 made of quartz glass, and a second plate member 32 disposed to face the first plate member 31 while being spaced apart from the first plate member 31. And a gas introduction part 45 for introducing a processing gas into a gap between the first plate member 31 and the second plate member 32 (hereinafter also referred to as “gas flow gap”). It is a thing.
In the light transmissive window unit 30, the first plate member 31 and the second plate member 32 are such that the first plate member 31 is located on the ultraviolet radiation lamp 22 side (the upper side in FIGS. 1 and 2). The second plate member 32 is supported by a rectangular annular support member 41 so that the second plate member 32 is located on the workpiece support base 11 side (the lower side in FIGS. 1 and 2). The first plate member 31 and the second plate member 32 are disposed to face the plurality of ultraviolet radiation lamps 22 and the workpiece placement surface 11a, respectively.
Further, the gas flow gap may have a certain thickness, or the thickness may change continuously or intermittently.
In the example of this figure, the first plate member 31 and the second plate member 32 are in a state parallel to the workpiece placement surface 11a, and thus the first plate member 31 and the second plate member. 32 is parallel to the gas flow gap and has a certain thickness.

The first plate member 31 is made of quartz glass and has transparency to vacuum ultraviolet rays from the ultraviolet radiation lamp 22.
The first plate member 31 has a rectangular flat plate shape, and separates the gas flow gap in the light transmissive window unit 30 from the lamp housing space in the light source unit 21.
The thickness of the first plate member 31 is determined in consideration of the distance between the first plate member 31 and the second plate member 32, and is 2 mm, for example.
In the example of this figure, the 1st board member 31 has a slightly larger vertical and horizontal dimension than the to-be-processed object mounting surface 11a. Further, the gas flow gap and the lamp housing space are separated by the first plate member 31, the support member 41, and the light source unit support base 14.

The second plate member 32 has a substantially rectangular flat plate shape, and is a perforated plate in which a plurality of through holes 33 penetrating the second plate member 32 in the thickness direction are formed. Then, in the state in which the ultraviolet radiation lamp 22 is lit by the plurality of through holes 33, a processing gas (hereinafter referred to as vacuum ultraviolet light from the ultraviolet radiation lamp 22) introduced from the gas introduction part 45 into the gas flow gap. , Also referred to as “active species generated gas”) is configured to supply a gas supply port to the surface Wa of the workpiece W.
In the second plate member 32, the plurality of through holes 33 are arranged at a fixed interval (equal intervals in FIGS. 1 and 2) at least in a region facing the effective processing region in the workpiece placement surface 11a. Dimensionally arranged.
In the example of this figure, the second plate member 32 has the same vertical and horizontal dimensions as the first plate member 31. The plurality of through holes 33 extend in a direction perpendicular to the workpiece placement surface 11a.

The form of the porous body constituting the second plate member 32 may be a porous plate in which a through hole 33 as shown in FIGS. 1 and 2 is formed, and the through hole is constituted by a mesh. It may be a reticulated plate.
In addition, in the plurality of through holes 33 constituting the gas supply port, the size of the through holes 33 and the distance between the adjacent through holes 33 are determined by the shape of the surface Wa to be processed W (specifically, Depending on the shape and the like of the concave portion Wb and the formation position of the concave portion Wb), the material and thickness of the second plate member 32, etc., and the size of the effective processing region can be set as appropriate. The shape of the through-hole 33 can be set to a circle, a polygon such as a rectangle, or any other appropriate shape, but the cross-sectional shape in the thickness direction of the second plate member 32 may be a rectangle or a trapezoid. preferable.
Furthermore, it is preferable that all of the plurality of through holes 33 constituting the gas supply port have the same size. For example, gas supply conditions (specifically, gas flow rate, etc.) by the gas supply mechanism, etc. Some of them may have different sizes. Specifically, the through hole located in the vicinity of the gas introduction part 45, that is, the upstream side (right side in FIG. 1) of the gas circulation gap is the through hole located downstream (left side in FIG. 1) of the gas circulation gap. It may be smaller than that.
Here, when the second plate member 32 is made of a porous plate in which a plurality of through holes 33 are arranged at equal intervals, and the shape of the plurality of through holes 33 is circular, the size of the through holes 33 and As an example of the separation distance between the through holes 33 adjacent to each other, the inner diameter of the through holes 33 is 1 to 3 mm, and the equally spaced pitch is 3 to 5 mm.
In the example of this figure, the second plate member 32 has a plurality of circular through holes 33 having a rectangular cross-sectional shape in the thickness direction of the second plate member 32 and an inner diameter of 2 mm. They are arranged two-dimensionally at an equal interval of 5 mm).

  The thickness of the second plate member 32 is determined in consideration of the material of the second plate member 32, the separation distance between the first plate member 31 and the second plate member 32, and the like, for example, 2 mm. .

The material of the second plate member 32 is resistant to the vacuum ultraviolet rays from the ultraviolet radiation lamp 22 and is generated by processing the processing gas, the active species generated by the vacuum ultraviolet rays, and the surface Wa to be processed. Those having resistance to the reaction product gas may be mentioned.
Further, the material of the second plate member 32 is preferably one having transparency to vacuum ultraviolet rays from the ultraviolet radiation lamp 22, but may be one having no transparency.
Since the material of the second plate member 32 is permeable to vacuum ultraviolet rays, the second plate member 32 does not shield the vacuum ultraviolet rays from the ultraviolet radiation lamp 22, and therefore the ultraviolet radiation lamp 22. The vacuum ultraviolet rays from can be used effectively. In addition, since the through hole 33 can be reduced in diameter and the distance between the adjacent through holes 33 can be increased without adversely affecting the vacuum ultraviolet rays from the ultraviolet radiation lamp 22, the second plate The member 32 can have a large degree of design freedom.

A preferable specific example of the material of the second plate member 32 is quartz glass.
In the example of this figure, the second plate member 32 is a porous plate made of quartz glass. Therefore, the second plate member 32 is similar to the first plate member 31 with respect to vacuum ultraviolet rays from the ultraviolet radiation lamp 22. It has permeability.

In the light transmissive window unit 30, the distance between the first plate member 31 and the second plate member 32 is preferably 0.3 to 1 mm, and more preferably 0.3 to 0.5 mm. .
When the distance between the first plate member 31 and the second plate member 32 is in the above range, active species can be stably generated in the gas flow gap, and the workpiece W is treated. The vacuum ultraviolet rays reaching the surface Wa can be set to a sufficiently large intensity (light quantity). Furthermore, the active species can be stably generated in the processing space S.

The support member 41 has a rectangular annular shape, and is provided with a first sandwiching portion 43 and a second sandwiching portion 44 that are concave portions extending over the entire circumference of the inner peripheral surface thereof. The support member 41 tightly clamps the outer peripheral edge portion of the first plate member 31 by the first plate holding portion 43, and closely contacts the outer peripheral edge portion of the second plate member 32 by the second holding portion 44. It is pinched.
The material of the support member 41 is resistant to vacuum ultraviolet rays from the ultraviolet radiation lamp 22, processing gas, and active species generated by the vacuum ultraviolet rays, and the surface Wa is to be treated as necessary. Those having resistance to the reaction product gas generated by the above. Specific examples of the material of the support member 41 include metals having corrosion resistance such as stainless steel (SUS) and titanium.

The light source device 20 is provided with a gas supply mechanism that supplies the activated species generation gas to the processing space S when the ultraviolet radiation lamp 22 is lit.
This gas supply mechanism is composed of a gas introduction part 45, a gas flow gap, and a gas supply port. When the ultraviolet radiation lamp 22 is lit, activated species generated gas is introduced into the processing space S. When the ultraviolet radiation lamp 22 is not turned on, the processing gas is supplied to the processing space S.

The gas introduction part 45 introduces a processing gas into the gas flow gap, and is provided so as not to block light including vacuum ultraviolet rays from the ultraviolet radiation lamp 22.
The gas introduction part 45 introduces the processing gas into the gas flow gap in one direction (left direction in FIG. 1), and is one of the four sides of the support member 41. The processing gas flow through hole 46 formed in the portion 42A and a cylindrical gas introduction pipe 47 connected to the process gas flow through hole 46 are configured.
The processing gas flow through-hole 46 is formed so that the support member 41 extends in a direction perpendicular to the thickness direction (left and right in FIG. 1) at a position between the two concave portions constituting the first clamping portion 43 and the second clamping portion 44. Direction).
Further, the processing gas flow through hole 46 is a horizontally long inner opening disposed on the inner surface of the side portion 42A facing the gas flow gap along the direction in which the side portion 42A extends (direction perpendicular to the paper surface in FIG. 1). 46a. In addition, an outer opening 46b is provided on the outer surface facing the inner surface of the side portion 42A. The processing gas distribution through hole 46 is connected to a processing gas supply source (not shown) via a gas introduction pipe 47 connected to the outer opening 46b.
Here, the processing gas flow through hole 46 may be formed by one horizontally long slit, or may be formed by a plurality of slits. Further, the inner opening 46a may have a larger area than the outer opening 46b.
In the example of this figure, the gas introduction part 45 supplies a processing gas to the gas flow gap in the direction of the tube axis of the ultraviolet radiation lamp 22. Further, in the processing gas flow through hole 46, the inner opening 46a is formed by a horizontally long slit as compared with the outer opening 46b.

As the processing gas, a gas containing 50% by volume or more of an active species source that generates active species when irradiated with vacuum ultraviolet rays having a wavelength of 220 nm or less is used. Here, examples of the active species source include oxygen gas.
Specific examples of the processing gas include oxygen gas and a mixed gas of oxygen gas and ozone gas. Among these, a mixed gas of oxygen gas and ozone gas is preferable from the viewpoint of shortening the processing time. The processing gas may contain water vapor.

The concentration of the active species source gas in the processing gas is 50% by volume or more, preferably 88% by volume or more.
By setting the concentration of the activated species gas in the treatment gas within the above range, the amount of activated species generated by the vacuum ultraviolet rays from the ultraviolet radiation lamp 22 can be increased, and the intended treatment is reliably performed. be able to. In particular, when the processing gas is a mixed gas of oxygen gas and ozone gas, high safety can be obtained when the concentration of oxygen gas is 88% by volume or more, that is, the concentration of ozone gas is 12% by volume or less.

  The gas supply conditions by the gas supply mechanism include the size of the surface Wa of the workpiece W, the shape of the second plate member 32 (specifically, the shape and size of the through hole 33, and the through holes adjacent to each other). In accordance with the distance between the holes 33 and the distance between the first plate member and the second plate member, the type of the workpiece W, the type and composition of the processing gas, and the like are determined as appropriate. .

The desmear treatment apparatus 10 is provided with a gas discharge part for discharging gas from the processing space S. This gas discharge part is arrange | positioned in the peripheral position of the to-be-processed object.
This gas discharge part is constituted by gas discharge through holes 16, 17, 18, 19 formed in the four sides 15 A, 15 B, 15 C, 15 D of the light source unit support 14. The gas discharge through-hole 16 is a horizontally long gas discharge opening 16a disposed on the inner surface of the side portion 15A facing the processing space S along the direction in which the side portion 15A extends (direction perpendicular to the paper surface in FIG. 1). It is what has. The gas discharge through-hole 18 is a horizontally long gas discharge disposed on the inner surface of the side portion 15C facing the processing space S along the direction in which the side portion 15C extends (the direction perpendicular to the paper surface in FIG. 1). It has an opening 18a. That is, the gas discharge opening 18a is disposed opposite to the gas discharge opening 16a.
Further, the gas discharge through hole 17 is a horizontally long gas discharge disposed on the inner surface of the side portion 15B facing the processing space S along the direction in which the side portion 15B extends (direction perpendicular to the paper surface in FIG. 2). It has an opening 17a. Further, the gas discharge through-hole 19 is disposed on the inner surface of the side portion 15D facing the processing space S along the extending direction of the side portion 15D (the direction perpendicular to the paper surface in FIG. 2). It has an opening 19a. That is, the gas discharge opening 19a is disposed opposite to the gas discharge opening 17a.
Here, each of the gas discharge openings 16, 17, 18, 19 may be formed by one horizontally long slit, or may be formed by a plurality of slits.
In the example of this figure, the gas discharge openings 16a, 17a, 18a, and 19a are formed by horizontally elongated slits that extend over the entire region of the inner surfaces of the side portions 15A, 15B, 15C, and 15D that face the workpiece support base 11. Is.

Moreover, it is preferable that the desmear treatment apparatus 10 has a configuration in which a heating means (not shown) for heating the workpiece W is provided on the workpiece support 11.
According to such a configuration, since the action of the active species can be promoted as the temperature of the processing surface Wa of the workpiece W is increased, the processing can be performed efficiently.
Further, in the workpiece support table 11, the vertical and horizontal dimensions of the workpiece mounting surface 11a are larger than the vertical and horizontal dimensions of the workpiece surface Wa of the workpiece W, so that the workpiece surface Wa of the workpiece W is made uniform. Can be heated.
The heating condition by the heating means is a condition in which the temperature of the workpiece placement surface 11a is, for example, 100 to 150 ° C.

In the desmear processing apparatus 10 having such a configuration, light including vacuum ultraviolet rays from the ultraviolet radiation lamp 22 is passed through the light transmissive window unit 30 to the workpiece W arranged in the processing space S. By irradiating, the processing space S is made an active species product gas atmosphere, and the surface treatment of the workpiece W is performed.
More specifically, first, the processing space S is supplied to the processing space S in which the workpiece W is disposed under the desired gas supply conditions by the gas supply mechanism. (Specifically, for example, oxygen gas) atmosphere. Next, the plurality of ultraviolet radiation lamps 22 constituting the light source unit 21 are turned on simultaneously while continuously introducing the processing gas from the gas introduction part 45 into the gas circulation gap, whereby vacuums from the plurality of ultraviolet radiation lamps 22 are obtained. Ultraviolet rays are irradiated toward the surface Wa of the workpiece W through the first plate member 31, the gas flow gap and the second plate member 32.
In this way, by applying vacuum ultraviolet light to the processing gas flowing in the gas flow gap along the first plate member 31 and the second plate member 32 in the tube axis direction of the ultraviolet radiation lamp 22, Active species (specifically, for example, ozone gas and active oxygen) are generated in the gas flow gap. Then, the gas in which the active species are generated (active species generating gas) is supplied from the gas flow gap to the processing space S through the gas supply port, and the processing space S is set as the active species generating gas atmosphere. . Further, in the processing space S, active species are generated by irradiating vacuum ultraviolet rays to the gas constituting the atmosphere (the processing gas and the active species generating gas supplied before the ultraviolet radiation lamp 22 is turned on). Is done. At the same time, in the process of passing through the gas flow gap and the gas processing space S, vacuum ultraviolet rays that have reached the processing surface Wa of the processing object W without being absorbed by the active species source (specifically, oxygen gas) The processed surface Wa of the workpiece W is processed by the generated active species. Furthermore, in the processing space S, it is generated by processing the surface Wa to be processed in the process in which the active species generating gas supplied from the gas supply port flows in the processing space S. Reaction product gas (specifically, for example, carbon dioxide gas) is mixed. The gas mixed with the reaction product gas (hereinafter also referred to as “exhaust gas”) is discharged to the outside of the processing space S through the gas discharge unit.
In FIG. 1, the flow direction of the gas in the desmear treatment apparatus 10 is indicated by an arrow.

Thus, in the desmear processing apparatus 10, a gas flow path from the gas introduction part 45 to the processing space S is formed by the gas flow gap and the gas supply port, and the gas supply port serves as the processing object W. It is provided so as to face the processing surface Wa. Therefore, the processing surface Wa of the workpiece W to be processed is introduced from the gas supply port into the processing gas (active species generation gas) introduced from the gas introduction part 45 into the gas flow gap and irradiated with the vacuum ultraviolet rays from the ultraviolet radiation lamp 22. Can be ejected toward That is, the activated species generation gas can be sprayed on the surface Wa of the workpiece W.
As a result, since the active species product gas can be caused to flow into the recess Wb in the surface Wa of the workpiece W, the reaction product gas generated by processing the surface Wa in the recess Wb is generated. There is no stagnation. Therefore, due to the reaction product gas remaining in the recess Wb, the irradiation amount of the vacuum ultraviolet rays reaching the bottom surface of the recess Wb is reduced, and the amount of active species used for the processing of the bottom surface is reduced. Therefore, the processing surface Wa of the workpiece W can be uniformly processed.
Further, in the gas flow gap, gas flows along the first plate member 31 and the second plate member 32, and also in the direction from the first plate member 31 toward the second plate member 32. A gas flow occurs. Therefore, since the active species generated in the vicinity of the first plate member 31 can be moved toward the processing surface Wa of the workpiece W, it can be effectively used for processing the workpiece W. it can.
Moreover, since most of the active species generated in the gas flow gap are moved to the through-hole 33 in the vicinity of the generated position, even if the gas flow velocity is relatively high, The active species generated on the upstream side are largely prevented from moving to the downstream side. Therefore, high uniformity is obtained in the amount of active species contained in the gas ejected from the plurality of through holes 33 constituting the gas supply port.
Further, since the gas discharge portion is provided at the peripheral position of the workpiece W, the processing gas (active gas) introduced into the gas flow gap from the gas introduction portion 45 and irradiated with the vacuum ultraviolet rays from the ultraviolet radiation lamp 22 is activated. The seed production gas) can be guided from the gas supply port toward the surface to be processed of the object to be processed and further flow along the surface to be processed of the object to be processed.
Therefore, according to the desmear processing apparatus 10, the workpiece W made of the wiring board material in which the concave portion Wb is formed can be efficiently processed in a short time.

The light source device and desmear processing apparatus of the present invention are not limited to the above-described embodiment, and various modifications can be made.
For example, the light source device is not limited to being used as an ultraviolet light source of a desmear treatment apparatus, but can also be used as an ultraviolet light source of an apparatus other than the desmear treatment apparatus using a wiring board material having a recess as an object to be processed. Specifically, in a processing apparatus for performing processing by a dry cleaning method using ultraviolet rays such as removal of resist adhered to a pattern surface of a template in a nanoimprint apparatus or dry cleaning processing of a glass substrate for liquid crystal or a silicon wafer. Can be used. When used as an ultraviolet light source of such an apparatus, the ultraviolet radiation lamp emits vacuum ultraviolet light having a wavelength of 185 nm in addition to a xenon excimer lamp that emits vacuum ultraviolet light having a center wavelength of 172 nm, depending on the type of object to be processed. It is possible to use a low-pressure mercury lamp or a fluorescent excimer lamp in which xenon gas is sealed in the arc tube and a phosphor emitting a vacuum ultraviolet ray having a wavelength of, for example, 190 nm is applied to the inner surface of the arc tube.

DESCRIPTION OF SYMBOLS 10 Desmear processing apparatus 11 To-be-processed object support stand 11a To-be-processed object mounting surface 14 Light source unit support stand 14a Recessed part 15A, 15B, 15C, 15D Side part 16, 17, 18, 19 Gas exhaust through-hole 16a, 17a, 18a , 19a Gas discharge opening 20 Light source device 21 Light source unit 22 Ultraviolet radiation lamp 23 Casing 30 Light transmissive window unit 31 First plate member 32 Second plate member 33 Through hole 41 Support member 42A Side portion 43 First clamping Part 44 second clamping part 45 gas introduction part 46 processing gas flow through hole 46a inner opening 46b outer opening 47 gas introduction pipe 50 light source unit 51 ultraviolet radiation lamp 52 casing 54 reflecting mirror 55 cooling block 56 inert gas supply part 57 Inert gas discharge portion 58 Light transmissive window member 59 Nozzle W Object Wa Wafer surface Wb Recess S Processing space

Claims (3)

An ultraviolet radiation lamp that emits vacuum ultraviolet light having a wavelength of 220 nm or less toward the object to be processed made of the wiring board material in which the recess is formed, and between the surface to be processed of the object to be processed and the ultraviolet radiation lamp, In a light source device provided with a light-transmitting window unit that transmits vacuum ultraviolet light from the ultraviolet radiation lamp, which is disposed so as to face the surface to be treated and the ultraviolet radiation lamp,
The light transmissive window unit includes a first plate member made of quartz glass disposed on the ultraviolet radiation lamp side, and a second plate disposed on the workpiece side in a state of being separated from the first plate member. And a processing gas containing at least 50% by volume of an active species source that generates active species by vacuum ultraviolet radiation from the ultraviolet radiation lamp in a gap between the first plate member and the second plate member. Is provided with a gas introduction part,
The second plate member is formed with a gas supply port by a through-hole penetrating the second plate member in the thickness direction, and from the gas supply port to the processing surface of the object to be processed, A light source device, wherein a processing gas irradiated with vacuum ultraviolet rays from the ultraviolet radiation lamp is supplied.   The light source device according to claim 1, wherein the second plate member is made of quartz glass. In the desmear processing apparatus provided with the light source device according to claim 1 and a processing object support base for arranging the processing object.
For processing where vacuum ultraviolet rays from the ultraviolet radiation lamp supplied from the gas supply port are irradiated between the workpiece support base on which the workpiece is disposed and the light transmissive window unit. A desmear treatment apparatus, wherein a space in which a gas flows is formed, and a gas discharge portion for discharging the gas from the space is provided at a peripheral position of the workpiece.

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