JP2012176341A - Light processing device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a light processing device preventing external discharge between a high voltage side electrode and a casing of an excimer lamp to surely perform desired ultraviolet ray irradiation processing while promoting downsizing of the device.SOLUTION: The light processing device includes a light radiation unit including the metallic casing with a lamp containing chamber having a light extracting window formed within it, and the excimer lamp which is arranged within the lamp containing chamber of the casing and in which a pair of electrodes, the high voltage side electrode and an earth side electrode, are arranged in opposition to an outer surface of a discharge container. The excimer lamp is arranged with the high voltage side electrode positioned within a range of ±1.5T centering on the heightwise central position of the lamp container when the thickness of a tube wall of the discharge container is T [mm].

Description

  The present invention relates to an optical processing apparatus suitable for performing, for example, a dry cleaning process on a template surface in a nanoimprint apparatus.

In recent years, in the manufacture of semiconductor chips and biochips, optical nanoimprint technology has attracted attention as a method that can be manufactured at a lower cost than conventional pattern formation methods using photolithography and etching.
In the pattern forming method using this optical nanoimprint technology, a pattern forming material layer is formed by applying a liquid photocurable resin on a substrate on which a pattern is to be formed, for example, a wafer, and this pattern forming material layer is formed. In this state, a template (mold) on which a pattern serving as a negative of the pattern to be formed is brought into contact and cured by irradiating the pattern forming material layer with ultraviolet rays, and then the obtained cured resin The process of peeling a template from a layer is performed (refer patent document 1 and patent document 2).

In such a pattern forming method, if a foreign substance or the like is present on the surface of the template, a defect is generated in the obtained pattern.
Thus, as a method for cleaning the template, a wet cleaning method using a chemical such as an organic solvent, alkali, or acid is known (see Patent Document 3).
However, in such a wet cleaning method, there is a possibility that a part of the template is dissolved by an organic solvent or chemicals and the pattern shape is deformed. Also, when the template is removed from the cured resin layer, if a residue such as a photocurable resin adheres to the template, it is necessary to perform a template cleaning process every time pattern formation is completed. Since a considerably long time is required for the processing, there is a problem that productivity is remarkably lowered.
On the other hand, for example, in the manufacture of a liquid crystal display element, an optical cleaning processing apparatus is used as a means for cleaning a glass substrate (see Patent Document 4).

JP 2000-194142 A JP 2008-91782 A JP 2009-266841 A JP-A-8-236492

Thus, the inventors have moved the light emitting unit including the excimer lamp so that the light emitting unit moving mechanism is disposed so as to be opposed to the pattern surface of the template in the nanoimprint apparatus via the gap, An optical processing apparatus used for optically cleaning the surface of a template has been proposed (see Japanese Patent Application No. 2010-046127).
This optical processing apparatus will be described with reference to FIG. 3. The power supply line connected to the high voltage side of the step-up transformer (38) for excimer lamp lighting is shortened to prevent a decrease in lamp efficiency due to a voltage drop. For this purpose, an excimer lamp (30) and a step-up transformer (38) are provided with a light emitting unit (20) having a structure arranged in a common casing (21). The excimer lamp (30) includes a discharge vessel. A structure is used in which a pair of external electrodes of a high voltage side electrode (32) and a ground side electrode (33) are arranged on the outer surface of (31).

However, it has been found that the following new problem occurs in the optical processing apparatus having such a configuration.
Since the casing (21) in the light emitting unit (20) is made of metal such as aluminum or stainless steel, it is between the high voltage side electrode (32) of the excimer lamp (30) and the inner surface of the casing (21). In order to prevent the occurrence of external discharge in the case, it is necessary to secure a sufficient distance between the inner surface of the casing (21) and the high voltage side electrode (32). The problem of becoming.

  The present invention has been made based on the above circumstances, and the apparatus can be configured to be miniaturized, and an external discharge is generated between the high-voltage side electrode and the casing in the excimer lamp. It is an object of the present invention to provide an optical processing apparatus that can prevent the occurrence of irradiance and can reliably perform an intended ultraviolet irradiation process.

The light processing apparatus of the present invention includes a metal casing in which a lamp housing chamber having a light extraction window is formed, and a pair of a high voltage side electrode and a ground side electrode disposed in the lamp housing chamber in the casing. A light emitting unit comprising an excimer lamp having an electrode disposed opposite to the outer surface of the discharge vessel,
In the excimer lamp, when the thickness of the tube wall of the discharge vessel is T [mm], the high-voltage side electrode is in a range of ± 1.5 T around the center position in the height direction of the lamp housing chamber. It is arrange | positioned in the state located inside.

The light processing apparatus of the present invention further comprises a light radiating unit moving mechanism for reciprocally moving the light radiating unit so as to enter and leave the light processing region,
The light extraction window is formed on an upper wall forming a lamp housing chamber in the casing,
The excimer lamp may be arranged in a state where the high voltage side electrode faces the light extraction window and is located below a center position in the height direction of the lamp housing chamber. preferable.

  In the light processing apparatus of the present invention, a plurality of the excimer lamps may be arranged in the lamp housing chamber of the casing.

  Furthermore, in the light processing apparatus of the present invention, it is preferable that the light emitting unit is arranged so that the light extraction window faces the pattern surface of the template in the nanoimprint apparatus.

  According to the light processing apparatus of the present invention, in the light emitting unit, the excimer lamp is arranged such that the high-voltage side electrode is located within a specific range centering on the central position in the height direction of the lamp housing chamber in the casing. By being configured, the height dimension of the casing itself can be reduced while ensuring the separation distance between the high voltage side electrode and the inner surface of the wall forming the lamp housing chamber as large as possible. Therefore, it is possible to prevent external discharge from occurring between the high-voltage side electrode and the casing in the excimer lamp while reducing the size of the entire apparatus, and to achieve the intended ultraviolet irradiation. Processing can be performed reliably.

  The excimer lamp further includes a moving mechanism for reciprocating and horizontally moving the light emitting unit so as to be able to enter and leave the light processing region. The excimer lamp has the high voltage side electrode facing the light extraction window, and the height of the lamp housing chamber. Since the arrangement is made in a state of being positioned below the central position in the vertical direction, the separation distance between the excimer lamp and the light extraction window can be increased. In addition, the object to be processed, for example, the template in the nanoimprint apparatus, is prevented from being heated by the radiant heat from the excimer lamp, and the object to be processed can be subjected to the ultraviolet irradiation process. Since it will be located below the central position in the height direction of the storage chamber, the light emission unit moving mechanism can be operated stably, The ultraviolet irradiation treatment period can be reliably performed.

It is a perspective view which shows the outline of a structure in an example of the optical processing apparatus of this invention. It is a perspective view which shows the outline of a structure in an example of the light emission unit in the optical processing apparatus shown in FIG. It is sectional drawing for description along the longitudinal direction which cut | disconnects and shows the light emission unit shown in FIG. 2 by the plane perpendicular | vertical to a light extraction window. It is the sectional view on the AA line in FIG. It is explanatory drawing which shows the outline of a structure in an example of the light emission unit moving mechanism in the optical processing apparatus shown in FIG. It is a perspective view which shows the outline of a structure of the excimer lamp in the light emission unit shown in FIG. It is a perspective view which shows an example of the support structure of the excimer lamp in the light emission unit shown in FIG. It is explanatory drawing which shows the outline of a structure in an example of the nanoimprint apparatus carrying the optical processing apparatus of this invention. In the nanoimprint apparatus shown in FIG. 8, the light emission unit is an explanatory view showing a state in which the light extraction window is arranged to face the pattern surface of the template with a gap. It is sectional drawing for description which cut | disconnects and shows the outline of a structure of the light emission unit in the other example of the light processing apparatus which concerns on this invention by the plane parallel to a light extraction window. It is sectional drawing for description which cut | disconnects and shows the light emission unit shown in FIG. 10 by the plane along the arrangement direction of an excimer lamp. It is sectional drawing for description which shows the structure of the light emission unit with which the excimer lamp is arrange | positioned so that a ground side electrode may oppose the light extraction window in a casing. It is sectional drawing which shows the other example of the cross-sectional shape of the discharge vessel of the excimer lamp used in the optical processing apparatus of this invention.

Hereinafter, embodiments of the present invention will be described in detail.
FIG. 1 is a perspective view showing an outline of the configuration of an example of the optical processing apparatus of the present invention, FIG. 2 is a perspective view showing the outline of the configuration of an example of a light emitting unit in the optical processing apparatus shown in FIG. FIG. 4 is a sectional view for explaining the light emitting unit shown in FIG. 2 along the longitudinal direction cut by a plane perpendicular to the light extraction window, FIG. 4 is a sectional view taken along line AA in FIG. 3, and FIG. FIG. 2 is an explanatory diagram showing an outline of a configuration in an example of a light radiating unit moving mechanism in the light processing apparatus shown in FIG.
The light processing apparatus 10 is used for performing a light cleaning process on the surface of a template in a nanoimprint apparatus, and includes a light emitting unit 20 including an excimer lamp 30 and the light emitting unit 20 with respect to a light processing region. The light emission unit moving mechanism 40 that linearly reciprocates horizontally so as to enter and leave, and the power supply unit 11 that turns on the excimer lamp 30 and drives the light emission unit moving mechanism 40 are provided.

  The light radiating unit moving mechanism 40 in the light processing apparatus 10 according to this embodiment includes a flat unit support base 41 extending in the horizontal direction on which the light radiating unit 20 is fixed, and the light of the unit support base 41. The cylinder device 45 is connected to an end portion (left end portion in FIG. 5) on the rear side in the approach direction with respect to the processing region, and is configured to expand and contract in the horizontal direction. A piston (not shown) in the cylinder device 45 and By moving the piston rod 47 back and forth in the horizontal direction in the cylinder 46, the light emitting unit 20 is moved (within a horizontal plane) while maintaining the same height position.

The light emitting unit 20 includes a substantially rectangular parallelepiped metal casing 21 whose outer shape is long in one direction. In the casing 21, the lamp housing chamber S1 and the circuit chamber S2 are disposed, and the lamp housing chamber S1 is light-treated. It is formed so as to be arranged in the longitudinal direction of the casing 21 through the partition wall 22 in a state of being positioned on the front side in the approach direction with respect to the region.
A rectangular opening K is formed in the upper wall 21a forming the lamp housing chamber S1 in the casing 21, and a light extraction window 23 made of a material having ultraviolet transparency, such as quartz glass, is provided in the opening K. It is fixed by a fixed plate 24 having a shape. Here, as a metal material constituting the casing 21, for example, aluminum, stainless steel, or the like can be used.

Further, the casing 21 is a rectangular cylinder through which the cooling gas is circulated, connected to the cooling gas supply mechanism 15 via the cooling gas circulation pipe 14 along the upper edge portion of each of both side surfaces thereof. A gas flow path member 12 is provided. More specifically, each of the gas flow path members 12 has a plurality of gas flow ports 13 formed so as to be aligned along the upper edge portion 12a on one side surface thereof, One side surface is arranged and fixed so as to contact the side surface of the casing 21 except for the upper edge portion 12 a, whereby the gas circulation port 13 is positioned around the light extraction window 23 in the casing 21.
Further, the casing 21 is provided with a purge gas supply pipe 17 for supplying a purge gas into the lamp storage chamber S1 and a purge gas discharge pipe 18 for discharging the gas from the lamp storage chamber S1. Are connected to the purge gas supply / discharge mechanism 16.

A step-up transformer 38 and other electrical components are disposed in the circuit chamber S2 of the casing 21. The step-up transformer 38 includes a high-frequency power source in the power supply unit 11 on the low-voltage side (primary side) via the feeder line 39. A high voltage side (secondary side) is connected to a high voltage side electrode 32 and a ground side electrode 33 in an excimer lamp 30 to be described later via a feeder line (not shown). Has been.
Therefore, the light emitting unit 20 is configured such that the step-up transformer 38 having a relatively large weight is disposed at a position on the rear side in the approach direction with respect to the light processing region.
As the step-up transformer 38, a power supply voltage of the lamp lighting power source in the power supply unit 11, for example, 200V can be boosted to, for example, 3 kV and supplied to the excimer lamp 30.

  As shown in FIG. 6, the excimer lamp 30 includes a plate-like discharge vessel 31 having a discharge space formed therein and elongated in one direction as a whole. Excimer gas is hermetically sealed. Of the four peripheral side surfaces extending along the longitudinal direction of the discharge vessel 31, a mesh-like high-voltage side electrode 32 is disposed on the outer surface of one wide peripheral side surface 31a, and faces the one wide peripheral side surface 31a. On the outer surface of the other wide peripheral side surface 31b, a net-like ground side electrode 33 is disposed. Further, a cap 35 is attached to each of both ends of the discharge vessel 31 in a state where a part of the discharge vessel 31 is received and held.

As a material constituting the discharge vessel 31, a material that can transmit vacuum ultraviolet rays satisfactorily, specifically, silica glass such as synthetic quartz glass, sapphire glass, or the like can be used.
As a material constituting the high voltage side electrode 32 and the ground side electrode 33, a metal material such as aluminum, nickel, gold or the like can be used. Further, the high voltage side electrode 32 and the ground side electrode 33 can also be formed by screen printing a conductive paste containing the above metal material or by vacuum vapor deposition of the above metal material.
As the excimer gas sealed in the discharge space of the discharge vessel 31, a gas capable of generating excimer that emits vacuum ultraviolet rays, specifically, a rare gas such as xenon, argon, krypton, or a rare gas, A mixed gas in which a halogen gas such as bromine, chlorine, iodine, or fluorine is mixed can be used. When a specific example of the excimer gas is shown together with the wavelength of emitted ultraviolet light, it is 172 nm for xenon gas, 191 nm for a mixed gas of argon and iodine, and 193 nm for a mixed gas of argon and fluorine. Moreover, the sealing pressure of the excimer gas is, for example, 10 to 100 kPa.

Thus, in this light emitting unit 20, the excimer lamp 30 has one wide peripheral side surface 31 a on which the high-voltage side electrode 32 in the discharge vessel 31 is disposed facing the light extraction window 23 in the casing 21, and The both ends in the longitudinal direction are fixed to the casing 21 in a posture that extends horizontally along the moving direction of the light emitting unit 20 (the longitudinal direction of the discharge vessel 31 coincides with the moving direction of the light emitting unit 20). .
When the wall thickness of the tube of the discharge vessel 31 is T [mm], the high voltage side electrode 32, specifically, the uppermost surface of the high voltage side electrode 32 is the center position in the height direction of the lamp housing chamber S1. Lc (h1 = h2) is arranged in a state of being located within a range of ± 1.5T. Accordingly, the excimer lamp 30 is lower than the center position Lc in the height direction of the lamp housing chamber S1. It is set as the position located in. The excimer lamp 30 is arranged so that the tube axis of the discharge vessel 31 is positioned at the center position Bc (b1 = b2) in the width direction of the lamp housing chamber S1 (direction perpendicular to the paper surface in FIG. 4).
Since the excimer lamp 30 is arranged in a state satisfying the above conditions, the high-voltage side electrode 32 and the upper wall 21a of the casing 21 and the side walls 21c and 21d can be reduced in size while reducing the size of the casing 21 itself. It is possible to secure a maximum separation distance between the high-voltage side electrode 32 and the upper wall 21a of the casing 21 and the side walls 21c and 21d. On the other hand, when the high voltage side electrode 32 is positioned outside the above range in the height direction, the light emitting unit is used to ensure a sufficiently large separation distance between the high voltage side electrode 32 and the casing 21. 20 will be enlarged.

  The fixing method of the excimer lamp 30 with respect to the casing 21 will be specifically described. As shown in FIG. 7, the housing recess 51 of the lamp support member 50 having the housing recess 51 that receives and holds the base 35 in the excimer lamp 30 is provided. On the other hand, the base 35 of the excimer lamp 30 is mounted in a state of protruding from the upper surface of the lamp support member 50, and the belt-like fixing member 52 is screwed to the lamp support member 50 on the upper surface of the base 35 of the excimer lamp 30. Has been fixed. The lamp support member 50 is fixed to the lower wall 21b of the casing 21 that forms the lamp housing chamber S1 by screwing.

  In the above, when a configuration example of the light irradiation unit 20 is shown, for example, the height dimension (the vertical dimension in FIG. 3) in the lamp housing chamber S1 in the casing is 50 to 100 mm, and the width dimension (in FIG. 4). (Dimension in the left-right direction) is 50 to 100 mm, the height dimension of the excimer lamp 30 is 10 to 20 mm, the dimension in the width direction is 30 to 80 mm, and the thickness of the tube wall of the discharge vessel 31 is 1 to 5 mm.

  FIG. 8 is an explanatory diagram showing an outline of the configuration of an example of a nanoimprint apparatus equipped with the optical processing apparatus of the present invention. In FIG. 8, 61 is a template, 62 is a template holding mechanism for holding the template 61, and 63 is a chamber. Reference numeral 64 denotes a movable wafer stage. A wafer chuck 64 a for holding the wafer W is disposed on the wafer stage 64. Reference numeral 65 denotes an ink jet type application means for applying a liquid photocurable resin, which is a pattern forming material (imprint material), to the surface of the wafer W; 66, a pressurizing mechanism; 67, a vibration isolation table; A board 69 is an ultraviolet light source that irradiates the pattern forming material layer made of a photocurable resin formed on the wafer W with ultraviolet rays. Reference numeral 20 denotes a light emitting unit configured as shown in FIGS. 2 to 4. The light emitting unit 20 is horizontally moved by the light emitting unit moving mechanism 40 so as to be able to enter and leave under the template 61 (light processing region). .

In such a nanoimprint apparatus, the wafer stage 64, on which the wafer W is held on the wafer chuck 64a, is moved to a position below the coating unit 65, and a liquid photocurable resin is coated on the surface of the wafer W by the coating unit 65. As a result, a pattern forming material layer made of a photocurable resin is formed on the wafer W. Next, the wafer stage 64 is moved to a position below the template 61, and the template 61 is brought into contact with the pattern forming material layer formed on the wafer W by the pressing mechanism 66 to pressurize it. The pattern forming material layer is cured by irradiating the forming material layer with ultraviolet light from the ultraviolet light source 69 through the template 61, and then the template 61 is peeled off from the obtained cured resin layer. Formation is achieved.
When the pattern formation on the wafer W is completed once or a plurality of times, the wafer stage 64 on which the wafer W is placed is moved from the lower position of the template 61 to the side position as shown in FIG. While being retracted, the light emitting unit 20 is horizontally moved to a position below the template 61 by the light emitting unit moving mechanism 40, and the light extraction window 23 is arranged to face the pattern surface of the template 61 with a gap.
Here, the separation distance between the outer surface of the light extraction window 23 and the pattern surface of the template 61 is, for example, 0.3 to 10.0 mm.

In the light processing apparatus 10, the cooling gas supply mechanism 15 is operated, thereby supplying the cooling gas to the gas flow path member 12 via the cooling gas flow pipe 14. The cooling gas discharged from the gas flow port 13 formed in 12 is circulated in the gap between the light extraction window 23 and the template 61. In this state, the high-frequency voltage is boosted by the step-up transformer 38 disposed in the circuit chamber S2 from the lamp lighting power source, supplied to the excimer lamp 30, and the excimer lamp 30 is turned on. Ultraviolet rays are applied to the pattern surface of the template 61 through the light extraction window 23, whereby the optical cleaning process of the template 61 is achieved.
Thereafter, the light emitting unit 20 is horizontally moved so as to be retracted from the lower position of the template 61 by the light emitting unit moving mechanism, and the wafer stage 64 on which the wafer W is placed is horizontally moved to the lower position of the template 61. Then, pattern formation on the wafer W is executed.

In the above, the flow rate of the cooling gas flowing in the gap between the light extraction window 23 and the template 61 is, for example, 100 to 1000 liters / min, and the temperature of the cooling gas is, for example, 10 to 35 ° C. .
Moreover, the irradiation time of the ultraviolet-ray with respect to the template 61 is 3 to 3600 second, for example.

Thus, according to the above-described light processing apparatus 10, in the light emitting unit 20, the excimer lamp 30 has the high-voltage side electrode 32 specified with the center position Lc in the height direction of the lamp housing chamber S 1 in the casing 21. By being arranged so as to be positioned within the range, the separation distance between the high voltage side electrode 32 and the inner surface of the upper wall 21a forming the lamp accommodating chamber S1 is ensured as large as possible. However, the dimension in the height direction of the casing 21 itself can be reduced. Therefore, the entire apparatus can be reduced in size, but the high voltage side electrode 32 and the casing 21 in the excimer lamp 30 can be reduced. Thus, it is possible to prevent the external discharge from occurring, and to reliably perform the intended ultraviolet irradiation treatment.
In addition, the excimer lamp 30 is disposed at the center position Bc in the width direction of the lamp housing chamber S1 in the casing 21, and the high voltage side electrode 32 and each of the side walls 21c and 21d in the width direction forming the lamp housing chamber S1. Since the distance between them is as large as possible, it is possible to reliably prevent external discharge between the high voltage side electrode 32 and the casing 21.

  Furthermore, a light radiation unit moving mechanism 40 for reciprocating and horizontally moving the light radiation unit 20 to and from the light processing area is provided. The excimer lamp 30 has a high voltage side electrode 32 connected to the light extraction window 23. The separation distance between the excimer lamp 30 and the light extraction window 23 is such that it is disposed in a state of being opposed and positioned below the central position Lc in the height direction of the lamp housing chamber S1. Since the template 61 in the nanoimprint apparatus, which is the object to be processed, is suppressed from being heated by the radiant heat from the light extraction window 23 and the excimer lamp 30, the ultraviolet irradiation process of the template 61 is performed. In addition, the center of gravity of the light emitting unit 20 is positioned below the center position Lc in the height direction of the casing 21. Since the be location, the light-emitting unit moving mechanism 40 can be stably operated, it can be reliably expected ultraviolet irradiation treatment.

Furthermore, according to the light processing apparatus 10 described above, the following effects are achieved.
(1) The light emitting unit 20 reciprocally moved horizontally so as to be able to enter and leave the light processing area by the light emitting unit moving mechanism 40 is replaced by the excimer lamp 30 that is long in one direction in the moving direction of the light emitting unit 20. Since both ends in the longitudinal direction are fixed to the casing 21 in a posture extending horizontally along the light, the influence of acceleration due to the reciprocating movement of the light emitting unit 20 (starting and stopping of the light emitting unit) is light. It acts on the lamp support part (fixed part) formed at a position aligned in the moving direction of the radiation unit 20, and a moment about the lamp support part due to the influence of the acceleration acts on the central part of the discharge vessel 31. Therefore, it is possible to surely prevent the discharge vessel 31 of the excimer lamp 30 from being distorted and to reliably perform the intended ultraviolet irradiation treatment. Ukoto can. In addition, the light emitting unit 20 can be reciprocated at high speed, and the throughput can be improved.

(2) In the casing 21 of the light emitting unit 20, the excimer lamp 30 is disposed at a position on the front side in the approach direction with respect to the light processing region, so that the light is emitted from the retracted position of the light emitting unit 20. Since the moving distance to the processing position where the light extraction window 23 in the radiation unit 20 is arranged facing the template 61 can be reduced, the tact time can be shortened.
(3) The power supply line 39 is led out from the rear end of the light emitting unit 20 with respect to the light processing area in the approach direction, and is connected to the lamp lighting power supply. Since the distance to the step-up transformer 38 arranged at the position on the rear side in the approach direction with respect to the can be reduced, it is possible to simplify the routing of the feeder line.
(4) Since the step-up transformer having a relatively large weight is arranged at a position on the rear side in the approach direction with respect to the light processing region in the casing 21, the cylinder device 45 constituting the light emitting unit moving mechanism 40 is configured. Since the inclination of the unit support base 41 caused by the moment acting on the light emitting unit 20 with the fixing portion for the power supply unit 11 as a fulcrum can be suppressed, the height position of the light emitting unit 20 can be stabilized. Further, it is possible to suppress an increase in the distance between the light extraction window 23 and the template 61, and thus it is possible to reliably perform the intended ultraviolet irradiation process.

  (5) By circulating the cooling gas through the gap between the light extraction window 23 and the template 61 that is the object to be processed through the gas distribution port 13 positioned around the light extraction window 23 of the casing 21, Since the light extraction window 23 and the template 61 are cooled, the ultraviolet irradiation of the template 61 is performed while reliably suppressing the temperature of the template 61 from rising due to the irradiation of ultraviolet light and the radiant heat from the light extraction window 23. be able to.

As mentioned above, although embodiment of this invention was described, this invention is not limited to said embodiment, A various change can be added.
For example, as shown in FIG. 10 and FIG. 11, the light emitting unit 20 can have a configuration in which a plurality of excimer lamps 30 are arranged. When the wall thickness of the tube of the discharge vessel 31 is T [mm], the high voltage side electrode 32 is in a range of ± 1.5 T [mm] around the center position Lc in the height direction of the lamp housing chamber S1. It is set as the structure arrange | positioned in the state located inside.

  In addition, as shown in FIG. 12, the excimer lamp 30 has the high voltage side electrode 32 positioned within a specific range centering on the central position Lc in the height direction of the lamp housing chamber S1, and in the lamp housing chamber S1, The ground-side electrode 33 may be arranged so as to face the light extraction window 23 in the casing 21. In such a configuration, the intensity of the ultraviolet light from the excimer lamp 30 emitted from the light extraction window 23 can be made higher than that of the configuration shown in FIGS. For example, it is possible to satisfactorily perform the ultraviolet irradiation treatment of the template in the nanoimprint apparatus.

Furthermore, the excimer lamp used in the light processing apparatus of the present invention is limited to the one having the discharge vessel 31 having a rectangular cross-sectional shape according to the above-described embodiment as shown in FIG. Instead, it may be provided with a discharge vessel having a cross-sectional shape as shown in FIGS. 13 (b) and 13 (c).
In the discharge vessel 31 having the cross-sectional shape shown in FIG. 13B, for example, a high-voltage side electrode is provided on the outer surface of the flat surface 31c, and a curved region facing the region where the high-voltage side electrode is disposed. An earth-side electrode is provided on the outer surface, and the high-voltage side electrode is arranged so as to be located within a specific range centering on the center position in the height direction of the lamp housing chamber.
Further, in the discharge vessel 31 having the cross-sectional shape shown in FIG. 13 (c), the high voltage side electrode and the ground side electrode are disposed on the tube wall of the discharge vessel on the outer surface regions facing each other across the tube axis CL of the discharge vessel 31. In this case, the uppermost surface of the high-voltage side electrode is disposed so as to be located within a specific range around the center position in the height direction of the lamp housing chamber.

  Furthermore, the processing target of the optical processing apparatus of the present invention is not limited to the template in the nanoimprint apparatus, and can be applied to various types that require ultraviolet irradiation processing.

Hereinafter, experimental examples performed for confirming the effects of the light processing apparatus of the present invention will be described.
<Experimental example 1>
A light emitting unit having the following specifications was produced according to the configuration of FIGS.
[Case (21)]
The height dimension (vertical dimension in FIG. 3) of the lamp storage chamber (S1) is 70 mm, the width dimension (horizontal dimension in FIG. 4) is 80 mm, the total length (horizontal dimension in FIG. 3) is 350 mm, The material is aluminum, and the light extraction window is made of quartz glass. The vertical and horizontal dimensions are 60 mm × 60 mm and the thickness is 4 mm.
[Excimer lamp (30)]
The material of the discharge vessel (31) is quartz glass, the height dimension is 15 mm, the width dimension is 50 mm, the total length is 100 mm, xenon gas is enclosed inside, the emission length is 50 mm, and the emission width is 40 mm. The output is 15W.
This excimer lamp has a horizontal plane in which the wide peripheral side surface in which the high voltage side electrode is disposed in the discharge vessel is opposed to the light extraction window and the uppermost surface of the high voltage side electrode is positioned. The displacement amount (X in FIGS. 3 and 4) with respect to the horizontal plane where the center position in the height direction is located is 4.5 mm (X = −1.5 T) on the lower side.

  When a power supply voltage of 200 V from a high frequency power supply was boosted to 3 kV by a step-up transformer and supplied to the excimer lamp, it was confirmed that the excimer lamp could be lit reliably.

<Comparative Experimental Example 1>
In Experimental Example 1, the excimer lamp in the lamp housing chamber is a horizontal plane in which the wide peripheral side surface where the high voltage side electrode is disposed in the discharge vessel is opposed to the light extraction window, and the uppermost surface of the high voltage side electrode is located. The same as the experimental example 1 except that the lamp housing chamber is disposed in a state where the displacement amount (X) with respect to the horizontal plane where the center position in the height direction of the lamp chamber is located is 6 mm (X = + 2T) on the upper side. When the light emitting unit having the above structure was manufactured and the voltage from the high frequency power source was supplied to the excimer lamp under the same conditions as in Experimental Example 1, the excimer lamp could not be turned on. The reason for this is that an external discharge between the high voltage side electrode and the casing cannot be ensured because a sufficiently large separation distance cannot be secured between the high voltage side electrode and the upper wall forming the lamp housing chamber. This is probably because of In the case where the excimer lamp is arranged in this way, in order to light the excimer lamp stably, the distance between the uppermost surface of the high voltage side electrode and the inner surface of the upper wall forming the lamp accommodating chamber is at least 60 mm. It was confirmed that it was necessary.

DESCRIPTION OF SYMBOLS 10 Optical processing apparatus 11 Power supply unit 12 Gas flow path member 12a Upper edge part 13 Gas distribution port 14 Cooling gas distribution pipe 15 Cooling gas supply mechanism 16 Purge gas supply / discharge mechanism 17 Purge gas supply pipe 18 Purge gas Exhaust pipe 20 Light emitting unit 21 Casing 21a Upper wall 21b Lower wall 21c, 21d Side wall 22 Partition wall 23 Light extraction window 24 Fixing plate K opening S1 Lamp housing chamber S2 Circuit chamber 30 Excimer lamp 31 Discharge vessel 31a One wide peripheral side surface 31b Other wide peripheral side surface 31c Flat surface 32 High voltage side electrode 33 Ground side electrode 35 Base 38 Step-up transformer 39 Feeding line 40 Light emission unit moving mechanism 41 Unit support base 45 Cylinder device 46 Cylinder 47 Piston rod 50 Lamp support member 51 Housing recess 52 Fixing member 61 Template 62 Template holding mechanism 63 Chamber 64 Wafer stage 64a Wafer chuck 65 Application means 66 Pressure mechanism 67 Vibration isolation table 68 Stage surface plate 69 Ultraviolet light source W Wafer

Claims (4)

A metal casing in which a lamp housing chamber having a light extraction window is formed, and a pair of electrodes of a high voltage side electrode and a ground side electrode disposed in the lamp housing chamber in the casing are an outer surface of the discharge vessel Comprising a light emitting unit comprising an excimer lamp arranged opposite to the
In the excimer lamp, when the thickness of the tube wall of the discharge vessel is T [mm], the high-voltage side electrode is in a range of ± 1.5 T around the center position in the height direction of the lamp housing chamber. An optical processing apparatus, wherein the optical processing apparatus is arranged in a state of being located inside. A light emission unit moving mechanism for reciprocating the light emission unit so as to enter and leave the light processing area;
The light extraction window is formed on an upper wall forming a lamp housing chamber in the casing,
The excimer lamp is disposed in a state where the high-voltage side electrode faces the light extraction window and is located below a central position in the height direction of the lamp housing chamber. Item 4. The optical processing apparatus according to Item 1.   The optical processing apparatus according to claim 1, wherein a plurality of the excimer lamps are arranged in the casing.   4. The light processing apparatus according to claim 1, wherein the light emitting unit is arranged so that the light extraction window faces a pattern surface of a template in the nanoimprint apparatus. 5.

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