JP2015135300A5 - - Google Patents
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- Publication number
- JP2015135300A5 JP2015135300A5 JP2014007429A JP2014007429A JP2015135300A5 JP 2015135300 A5 JP2015135300 A5 JP 2015135300A5 JP 2014007429 A JP2014007429 A JP 2014007429A JP 2014007429 A JP2014007429 A JP 2014007429A JP 2015135300 A5 JP2015135300 A5 JP 2015135300A5
- Authority
- JP
- Japan
- Prior art keywords
- voltage
- inspection
- output
- current
- measurement device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007689 inspection Methods 0.000 claims 6
- 238000006243 chemical reaction Methods 0.000 claims 5
- 238000001514 detection method Methods 0.000 claims 5
- 238000005259 measurement Methods 0.000 claims 5
- 230000001678 irradiating effect Effects 0.000 claims 1
- 239000004065 semiconductor Substances 0.000 claims 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014007429A JP6259669B2 (ja) | 2014-01-20 | 2014-01-20 | 検査装置および計測装置 |
| US15/109,726 US9779912B2 (en) | 2014-01-20 | 2014-12-08 | Inspection device and measurement device |
| PCT/JP2014/082359 WO2015107795A1 (ja) | 2014-01-20 | 2014-12-08 | 検査装置および計測装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014007429A JP6259669B2 (ja) | 2014-01-20 | 2014-01-20 | 検査装置および計測装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2015135300A JP2015135300A (ja) | 2015-07-27 |
| JP2015135300A5 true JP2015135300A5 (enExample) | 2017-02-02 |
| JP6259669B2 JP6259669B2 (ja) | 2018-01-10 |
Family
ID=53542699
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014007429A Expired - Fee Related JP6259669B2 (ja) | 2014-01-20 | 2014-01-20 | 検査装置および計測装置 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US9779912B2 (enExample) |
| JP (1) | JP6259669B2 (enExample) |
| WO (1) | WO2015107795A1 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2017132789A1 (en) * | 2016-02-01 | 2017-08-10 | Shenzhen Xpectvision Technology Co.,Ltd. | X-ray detectors capable of managing charge sharing |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58143251A (ja) * | 1982-02-22 | 1983-08-25 | Fuji Electric Corp Res & Dev Ltd | 板状物体の欠陥検出方法 |
| US6999183B2 (en) * | 1998-11-18 | 2006-02-14 | Kla-Tencor Corporation | Detection system for nanometer scale topographic measurements of reflective surfaces |
| JP4719972B2 (ja) * | 2000-12-11 | 2011-07-06 | 富士電機システムズ株式会社 | 充放電電流測定装置 |
| US6833913B1 (en) | 2002-02-26 | 2004-12-21 | Kla-Tencor Technologies Corporation | Apparatus and methods for optically inspecting a sample for anomalies |
| JP2007248255A (ja) * | 2006-03-15 | 2007-09-27 | Omron Corp | 光強度計測方法及び光強度計測装置並びに偏光解析装置およびこれを用いた製造管理装置 |
| US7710557B2 (en) * | 2007-04-25 | 2010-05-04 | Hitachi High-Technologies Corporation | Surface defect inspection method and apparatus |
| JP5341440B2 (ja) * | 2008-09-10 | 2013-11-13 | 株式会社日立ハイテクノロジーズ | 検査装置 |
| JP5357509B2 (ja) * | 2008-10-31 | 2013-12-04 | 株式会社日立ハイテクノロジーズ | 検査装置、検査方法および検査装置の校正システム |
| JP2012135096A (ja) | 2010-12-20 | 2012-07-12 | High Energy Accelerator Research Organization | 電圧調整装置、電圧調整方法、電圧調整システム |
| JP2013228254A (ja) * | 2012-04-25 | 2013-11-07 | Hitachi High-Technologies Corp | 光学式表面欠陥検査装置及び光学式表面欠陥検査方法 |
| JP5773939B2 (ja) * | 2012-04-27 | 2015-09-02 | 株式会社日立ハイテクノロジーズ | 欠陥検査装置および欠陥検査方法 |
| JP5918009B2 (ja) * | 2012-05-11 | 2016-05-18 | 株式会社日立ハイテクノロジーズ | 欠陥検査方法および欠陥検査装置 |
-
2014
- 2014-01-20 JP JP2014007429A patent/JP6259669B2/ja not_active Expired - Fee Related
- 2014-12-08 WO PCT/JP2014/082359 patent/WO2015107795A1/ja not_active Ceased
- 2014-12-08 US US15/109,726 patent/US9779912B2/en active Active
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