JP2015125295A - 表示装置 - Google Patents
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- JP2015125295A JP2015125295A JP2013269928A JP2013269928A JP2015125295A JP 2015125295 A JP2015125295 A JP 2015125295A JP 2013269928 A JP2013269928 A JP 2013269928A JP 2013269928 A JP2013269928 A JP 2013269928A JP 2015125295 A JP2015125295 A JP 2015125295A
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- 239000004642 Polyimide Substances 0.000 claims description 10
- 229920001721 polyimide Polymers 0.000 claims description 10
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 9
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 6
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 6
- 230000002093 peripheral effect Effects 0.000 claims description 4
- 238000009413 insulation Methods 0.000 abstract description 5
- 230000002542 deteriorative effect Effects 0.000 abstract description 4
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- 239000010410 layer Substances 0.000 description 39
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- 239000011521 glass Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 239000010409 thin film Substances 0.000 description 9
- 230000007797 corrosion Effects 0.000 description 6
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- 230000035699 permeability Effects 0.000 description 3
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
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- 238000001764 infiltration Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
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- 239000004033 plastic Substances 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1345—Conductors connecting electrodes to cell terminals
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/481—Internal lead connections, e.g. via connections, feedthrough structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1248—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition or shape of the interlayer dielectric specially adapted to the circuit arrangement
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
- H10K59/1213—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements the pixel elements being TFTs
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
- G02F2201/42—Arrangements for providing conduction through an insulating substrate
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/123—Connection of the pixel electrodes to the thin film transistors [TFT]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/10—OLED displays
- H10K59/12—Active-matrix OLED [AMOLED] displays
- H10K59/131—Interconnections, e.g. wiring lines or terminals
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Nonlinear Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Theoretical Computer Science (AREA)
- Optics & Photonics (AREA)
- Geometry (AREA)
- Electroluminescent Light Sources (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Liquid Crystal (AREA)
Abstract
Description
以下、図2乃至図7を参照し、本発明の第1の実施形態に係る表示装置100の構成及びその製造工程について説明する。図2乃至図7は、本発明の第1の実施形態に係る表示装置100の製造工程を説明するための図である。
次に、図8を参照し、本発明の第2の実施形態に係る表示装置100について説明する。図8は、本発明の第2の実施形態に係る表示装置100の概略構成を説明するための断面図である。
次に、図9を参照し、本発明の第3の実施形態に係る表示装置100について説明する。図9は、本発明の第3の実施形態に係る表示装置100の概略構成を説明するための断面図である。
Claims (11)
- 第1面にトランジスタを含む表示素子と前記トランジスタに接続された第1配線を備える複数の画素が配置された第1基板と、
前記第1基板の前記第1面に対向する第2面側から前記第1配線を開口する第1コンタクトホールに設けられた貫通電極と、
前記貫通電極と接続する第2配線と、
前記第1基板の前記第2面側に前記第2配線を覆って配置される第1絶縁膜と、
前記第1絶縁膜に配置された第2コンタクトホールにおいて前記第2配線と接続する端子と、を備えることを特徴とする表示装置。 - 前記第1基板は、樹脂を含むことを特徴とする請求項1に記載の表示装置。
- 前記樹脂はポリイミドを含むことを特徴とする請求項2に記載の表示装置。
- 前記第1コンタクトホールと前記第2コンタクトホールとは相互に離間して配置されることを特徴とする請求項1乃至3のいずれか一項に記載の表示装置。
- 前記第1基板の前記第2面には、第2絶縁膜が配置され、
前記第1コンタクトホールは、前記第2絶縁膜を貫通して前記第1配線を開口することを特徴とする請求項1乃至4のいずれか一項に記載の表示装置。 - 前記第2絶縁膜は、窒化シリコンまたは酸化シリコンを含むことを特徴とする請求項5に記載の表示装置。
- 前記第1絶縁膜は、窒化シリコンまたは酸化シリコンを含むことを特徴とする請求項1乃至6のいずれか一項に記載の表示装置。
- 前記第2コンタクトホールは、前記第1コンタクトホールよりも前記第1基板の周縁部側に配置されることを特徴とする請求項1乃至7のいずれか一項に記載の表示装置。
- 前記第1基板の前記第1面を間に挟んで前記第1基板と対向して第2基板が配置されることを特徴とする請求項1乃至8のいずれか一項に記載の表示装置。
- 前記端子には、フレキシブルプリント回路基板が接続されていることを特徴とする請求項1乃至9のいずれか一項に記載の表示装置。
- 前記端子には、ドライバICが接続されていることを特徴とする請求項1乃至9のいずれか一項に記載の表示装置。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013269928A JP6305759B2 (ja) | 2013-12-26 | 2013-12-26 | 表示装置 |
US14/574,706 US9419023B2 (en) | 2013-12-26 | 2014-12-18 | Display device |
US15/208,705 US9761654B2 (en) | 2013-12-26 | 2016-07-13 | Display device |
US15/658,542 US10032848B2 (en) | 2013-12-26 | 2017-07-25 | Display device |
US16/015,312 US10340328B2 (en) | 2013-12-26 | 2018-06-22 | Display device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013269928A JP6305759B2 (ja) | 2013-12-26 | 2013-12-26 | 表示装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2015125295A true JP2015125295A (ja) | 2015-07-06 |
JP6305759B2 JP6305759B2 (ja) | 2018-04-04 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013269928A Active JP6305759B2 (ja) | 2013-12-26 | 2013-12-26 | 表示装置 |
Country Status (2)
Country | Link |
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US (4) | US9419023B2 (ja) |
JP (1) | JP6305759B2 (ja) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9508784B2 (en) | 2014-07-11 | 2016-11-29 | Japan Display Inc. | Organic electro-luminescent display device |
JP2017116928A (ja) * | 2015-12-18 | 2017-06-29 | 株式会社半導体エネルギー研究所 | 表示パネル、入出力装置、情報処理装置、表示パネルの作製方法 |
JP2017187580A (ja) * | 2016-04-04 | 2017-10-12 | 株式会社ジャパンディスプレイ | 表示装置 |
US9960317B2 (en) | 2016-08-26 | 2018-05-01 | Japan Display Inc. | Method for manufacturing display device |
JP2018081197A (ja) * | 2016-11-16 | 2018-05-24 | 株式会社ジャパンディスプレイ | 表示装置 |
WO2018179265A1 (ja) * | 2017-03-30 | 2018-10-04 | シャープ株式会社 | 表示デバイス、表示デバイスの製造方法、表示デバイスの製造装置 |
JP2022191297A (ja) * | 2017-07-18 | 2022-12-27 | エルジー ディスプレイ カンパニー リミテッド | 表示装置 |
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US10537939B2 (en) * | 2015-01-21 | 2020-01-21 | Hewlett-Packard Development Company, L.P. | Method of manufacturing a honeycomb structure for an electronic device |
TWI727041B (zh) | 2016-05-20 | 2021-05-11 | 日商半導體能源研究所股份有限公司 | 顯示裝置 |
CN108254979A (zh) * | 2016-12-29 | 2018-07-06 | 南京瀚宇彩欣科技有限责任公司 | 显示面板及其制作方法 |
KR101930742B1 (ko) | 2017-05-29 | 2019-03-11 | 주식회사 이오테크닉스 | 휨 감소 장치 및 휨 감소 방법 |
CN107256870A (zh) * | 2017-06-09 | 2017-10-17 | 京东方科技集团股份有限公司 | 一种阵列基板及制作方法、柔性显示面板、显示装置 |
JP2019066604A (ja) * | 2017-09-29 | 2019-04-25 | 株式会社ジャパンディスプレイ | 表示装置、及び表示装置の製造方法 |
CN107833978B (zh) | 2017-10-31 | 2021-12-10 | 昆山国显光电有限公司 | 一种显示器件 |
CN113937091A (zh) * | 2018-02-28 | 2022-01-14 | 京瓷株式会社 | 显示装置、玻璃基板及玻璃基板的制造方法 |
KR20210006923A (ko) * | 2018-05-11 | 2021-01-19 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 표시 패널, 표시 장치, 입출력 장치, 정보 처리 장치 |
WO2020137342A1 (ja) * | 2018-12-26 | 2020-07-02 | 京セラ株式会社 | 配線基板、それを用いた発光装置及び表示装置 |
CN109523924B (zh) * | 2019-01-04 | 2021-04-20 | 苏州佳世达电通有限公司 | 显示装置及框架组合 |
CN109585462A (zh) * | 2019-01-23 | 2019-04-05 | 京东方科技集团股份有限公司 | 一种阵列基板及其制作方法、柔性显示面板、拼接屏 |
CN110391200B (zh) | 2019-08-09 | 2021-10-01 | 京东方科技集团股份有限公司 | 显示结构及其制备方法、显示装置 |
CN110491919B (zh) * | 2019-08-14 | 2021-09-24 | 深圳市华星光电半导体显示技术有限公司 | 显示面板的侧面绑定结构 |
KR20210022308A (ko) * | 2019-08-20 | 2021-03-03 | 삼성전자주식회사 | 디스플레이 모듈 및 이를 포함하는 디스플레이 장치 |
CN110910774A (zh) * | 2019-11-04 | 2020-03-24 | 深圳市华星光电半导体显示技术有限公司 | 显示面板、制造方法以及拼接显示面板 |
EP4095911A4 (en) * | 2020-01-22 | 2023-10-25 | BOE Technology Group Co., Ltd. | DRIVE BACKPACK AND PREPARATION METHOD THEREFOR, DISPLAY PANEL AND DISPLAY APPARATUS |
WO2022027506A1 (zh) * | 2020-08-06 | 2022-02-10 | 京东方科技集团股份有限公司 | 显示面板及显示装置 |
KR20220031803A (ko) * | 2020-09-04 | 2022-03-14 | 삼성디스플레이 주식회사 | 표시 장치 및 이를 포함하는 타일형 표시 장치 |
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2013
- 2013-12-26 JP JP2013269928A patent/JP6305759B2/ja active Active
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2014
- 2014-12-18 US US14/574,706 patent/US9419023B2/en active Active
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2016
- 2016-07-13 US US15/208,705 patent/US9761654B2/en active Active
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2017
- 2017-07-25 US US15/658,542 patent/US10032848B2/en active Active
-
2018
- 2018-06-22 US US16/015,312 patent/US10340328B2/en active Active
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Cited By (11)
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Also Published As
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US20150187807A1 (en) | 2015-07-02 |
US9419023B2 (en) | 2016-08-16 |
US9761654B2 (en) | 2017-09-12 |
JP6305759B2 (ja) | 2018-04-04 |
US10340328B2 (en) | 2019-07-02 |
US20180301525A1 (en) | 2018-10-18 |
US10032848B2 (en) | 2018-07-24 |
US20160322452A1 (en) | 2016-11-03 |
US20170323935A1 (en) | 2017-11-09 |
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