JP2015088743A - 静電チャック - Google Patents

静電チャック Download PDF

Info

Publication number
JP2015088743A
JP2015088743A JP2014195518A JP2014195518A JP2015088743A JP 2015088743 A JP2015088743 A JP 2015088743A JP 2014195518 A JP2014195518 A JP 2014195518A JP 2014195518 A JP2014195518 A JP 2014195518A JP 2015088743 A JP2015088743 A JP 2015088743A
Authority
JP
Japan
Prior art keywords
dielectric substrate
ceramic dielectric
outer periphery
electrode layer
interval
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2014195518A
Other languages
English (en)
Japanese (ja)
Other versions
JP2015088743A5 (enExample
Inventor
和輝 穴田
Kazuteru Anada
和輝 穴田
健太 富岡
Kenta Tomioka
健太 富岡
雄一 吉井
Yuichi Yoshii
雄一 吉井
琢真 和田
Takuma Wada
琢真 和田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toto Ltd
Original Assignee
Toto Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toto Ltd filed Critical Toto Ltd
Priority to JP2014195518A priority Critical patent/JP2015088743A/ja
Publication of JP2015088743A publication Critical patent/JP2015088743A/ja
Publication of JP2015088743A5 publication Critical patent/JP2015088743A5/ja
Pending legal-status Critical Current

Links

Images

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2014195518A 2013-09-27 2014-09-25 静電チャック Pending JP2015088743A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2014195518A JP2015088743A (ja) 2013-09-27 2014-09-25 静電チャック

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013201240 2013-09-27
JP2013201240 2013-09-27
JP2014195518A JP2015088743A (ja) 2013-09-27 2014-09-25 静電チャック

Publications (2)

Publication Number Publication Date
JP2015088743A true JP2015088743A (ja) 2015-05-07
JP2015088743A5 JP2015088743A5 (enExample) 2017-11-02

Family

ID=53051172

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014195518A Pending JP2015088743A (ja) 2013-09-27 2014-09-25 静電チャック

Country Status (1)

Country Link
JP (1) JP2015088743A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016207806A (ja) * 2015-04-21 2016-12-08 Toto株式会社 静電チャックおよびウェーハ処理装置
JP2021153202A (ja) * 2018-04-05 2021-09-30 ラム リサーチ コーポレーションLam Research Corporation 冷却ガス区画および対応する溝ならびに単極静電クランプ電極パターンを備える静電チャック
WO2025070517A1 (ja) * 2023-09-29 2025-04-03 芝浦メカトロニクス株式会社 ターゲットの接合状態検出方法及び成膜装置
KR20250050904A (ko) 2022-08-16 2025-04-15 도쿄엘렉트론가부시키가이샤 정전 척 및 기판 처리 장치

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001219331A (ja) * 2000-02-07 2001-08-14 Ibiden Co Ltd 静電チャック
JP2003060017A (ja) * 2001-08-10 2003-02-28 Kyocera Corp 電極内蔵セラミック部材及びその製造方法
JP2004022889A (ja) * 2002-06-18 2004-01-22 Anelva Corp 静電吸着装置
JP2005093919A (ja) * 2003-09-19 2005-04-07 Ngk Insulators Ltd 静電チャック及びその製造方法
JP2009238949A (ja) * 2008-03-26 2009-10-15 Ngk Insulators Ltd 静電チャック及びその製造方法
JP2010042967A (ja) * 2008-08-18 2010-02-25 Ngk Insulators Ltd セラミックス部材、セラミックス部材の作成方法及び静電チャック
WO2013051713A1 (ja) * 2011-10-05 2013-04-11 京セラ株式会社 試料保持具

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001219331A (ja) * 2000-02-07 2001-08-14 Ibiden Co Ltd 静電チャック
JP2003060017A (ja) * 2001-08-10 2003-02-28 Kyocera Corp 電極内蔵セラミック部材及びその製造方法
JP2004022889A (ja) * 2002-06-18 2004-01-22 Anelva Corp 静電吸着装置
JP2005093919A (ja) * 2003-09-19 2005-04-07 Ngk Insulators Ltd 静電チャック及びその製造方法
JP2009238949A (ja) * 2008-03-26 2009-10-15 Ngk Insulators Ltd 静電チャック及びその製造方法
JP2010042967A (ja) * 2008-08-18 2010-02-25 Ngk Insulators Ltd セラミックス部材、セラミックス部材の作成方法及び静電チャック
WO2013051713A1 (ja) * 2011-10-05 2013-04-11 京セラ株式会社 試料保持具

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016207806A (ja) * 2015-04-21 2016-12-08 Toto株式会社 静電チャックおよびウェーハ処理装置
JP2021153202A (ja) * 2018-04-05 2021-09-30 ラム リサーチ コーポレーションLam Research Corporation 冷却ガス区画および対応する溝ならびに単極静電クランプ電極パターンを備える静電チャック
JP7231669B2 (ja) 2018-04-05 2023-03-01 ラム リサーチ コーポレーション 冷却ガス区画および対応する溝ならびに単極静電クランプ電極パターンを備える静電チャック
US11664262B2 (en) 2018-04-05 2023-05-30 Lam Research Corporation Electrostatic chucks with coolant gas zones and corresponding groove and monopolar electrostatic clamping electrode patterns
US11942351B2 (en) 2018-04-05 2024-03-26 Lam Research Corporation Electrostatic chucks with coolant gas zones and corresponding groove and monopolar electrostatic clamping electrode patterns
US12237201B2 (en) 2018-04-05 2025-02-25 Lam Research Corporation Electrostatic chucks with coolant gas zones and corresponding groove and monopolar electrostatic clamping electrode patterns
KR20250050904A (ko) 2022-08-16 2025-04-15 도쿄엘렉트론가부시키가이샤 정전 척 및 기판 처리 장치
WO2025070517A1 (ja) * 2023-09-29 2025-04-03 芝浦メカトロニクス株式会社 ターゲットの接合状態検出方法及び成膜装置

Similar Documents

Publication Publication Date Title
JP6124156B2 (ja) 静電チャックおよびウェーハ処理装置
US11743973B2 (en) Placing table and plasma processing apparatus
US10373854B2 (en) Electrostatic chuck
TWI761621B (zh) 靜電夾盤組件、靜電夾盤及聚焦環
TWI614791B (zh) 電漿處理裝置
CN111566797B (zh) 用于晶片处理的升降销系统及升降销总成
CN102737940B (zh) 等离子体处理装置
CN107004629B (zh) 静电吸盘及晶片处理装置
TWI666679B (zh) 電漿處理裝置及電漿處理方法
TWI776800B (zh) 具有射頻耦合的高功率靜電吸盤設計
TWI488236B (zh) Focusing ring and plasma processing device
JP7337064B2 (ja) 静電チャックヒータおよびその製造方法
KR102636538B1 (ko) 정전 척 장치
CN110120329A (zh) 等离子体处理装置
JPWO2015076369A1 (ja) 静電チャック
TW202207306A (zh) 電漿處理裝置
JP2015088743A (ja) 静電チャック
TWI585816B (zh) A plasma processing apparatus, and a plasma processing apparatus
JP2021057572A (ja) 基板支持器及びプラズマ処理装置
TWI823273B (zh) 靜電吸盤及等離子體反應裝置
US20170084477A1 (en) Substrate support unit and substrate treatment apparatus comprising the same
CN110504205A (zh) 高温静电吸盘
CN111819663A (zh) 液处理装置和液处理方法
JP5965676B2 (ja) 処理対象物の保持方法
TWI850832B (zh) 靜電吸盤

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20170919

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20170919

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20180426

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20180507

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20180705

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20180821