JP2015037124A5 - - Google Patents

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Publication number
JP2015037124A5
JP2015037124A5 JP2013168336A JP2013168336A JP2015037124A5 JP 2015037124 A5 JP2015037124 A5 JP 2015037124A5 JP 2013168336 A JP2013168336 A JP 2013168336A JP 2013168336 A JP2013168336 A JP 2013168336A JP 2015037124 A5 JP2015037124 A5 JP 2015037124A5
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JP
Japan
Prior art keywords
controller
control unit
stage controller
lens
unit
Prior art date
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Granted
Application number
JP2013168336A
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English (en)
Japanese (ja)
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JP2015037124A (ja
JP6381188B2 (ja
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Publication date
Application filed filed Critical
Priority to JP2013168336A priority Critical patent/JP6381188B2/ja
Priority claimed from JP2013168336A external-priority patent/JP6381188B2/ja
Priority to KR1020140100267A priority patent/KR101823725B1/ko
Priority to US14/453,944 priority patent/US9348235B2/en
Publication of JP2015037124A publication Critical patent/JP2015037124A/ja
Publication of JP2015037124A5 publication Critical patent/JP2015037124A5/ja
Application granted granted Critical
Publication of JP6381188B2 publication Critical patent/JP6381188B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2013168336A 2013-08-13 2013-08-13 露光装置およびデバイスの製造方法 Expired - Fee Related JP6381188B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2013168336A JP6381188B2 (ja) 2013-08-13 2013-08-13 露光装置およびデバイスの製造方法
KR1020140100267A KR101823725B1 (ko) 2013-08-13 2014-08-05 노광 장치 및 디바이스의 제조 방법
US14/453,944 US9348235B2 (en) 2013-08-13 2014-08-07 Exposure apparatus and method of manufacturing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2013168336A JP6381188B2 (ja) 2013-08-13 2013-08-13 露光装置およびデバイスの製造方法

Publications (3)

Publication Number Publication Date
JP2015037124A JP2015037124A (ja) 2015-02-23
JP2015037124A5 true JP2015037124A5 (enExample) 2016-09-29
JP6381188B2 JP6381188B2 (ja) 2018-08-29

Family

ID=52466620

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2013168336A Expired - Fee Related JP6381188B2 (ja) 2013-08-13 2013-08-13 露光装置およびデバイスの製造方法

Country Status (3)

Country Link
US (1) US9348235B2 (enExample)
JP (1) JP6381188B2 (enExample)
KR (1) KR101823725B1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017538156A (ja) 2014-12-02 2017-12-21 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ方法及び装置
JP6613074B2 (ja) * 2015-08-20 2019-11-27 キヤノン株式会社 決定方法、露光装置、プログラム、および物品の製造方法
NL2017368A (en) * 2015-09-24 2017-03-30 Asml Netherlands Bv Method of reducing effects of reticle heating and/or cooling in a lithographic process, computer program, computer readable product, lithographic apparatus and device manufacturing method
JP6554141B2 (ja) * 2017-05-26 2019-07-31 キヤノン株式会社 決定方法、露光方法、情報処理装置、プログラム及び物品の製造方法
JP6944323B2 (ja) * 2017-09-21 2021-10-06 キヤノン株式会社 計算方法、露光方法、プログラム、露光装置、および物品の製造方法
JP7054365B2 (ja) * 2018-05-25 2022-04-13 キヤノン株式会社 評価方法、露光方法、および物品製造方法
EP3702839B1 (en) * 2019-02-27 2021-11-10 ASML Netherlands B.V. Method of reducing effects of lens heating and/or cooling in a lithographic process
JP2020187334A (ja) * 2019-05-17 2020-11-19 キヤノン株式会社 露光装置、および物品製造方法
JP7213757B2 (ja) 2019-05-31 2023-01-27 キヤノン株式会社 露光装置、および物品製造方法
JP7431694B2 (ja) * 2020-07-28 2024-02-15 キヤノン株式会社 情報処理装置、膜形成装置、物品の製造方法、およびプログラム

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58179834A (ja) 1982-04-14 1983-10-21 Canon Inc 投影露光装置及び方法
JP3720582B2 (ja) * 1998-06-04 2005-11-30 キヤノン株式会社 投影露光装置及び投影露光方法
TW500987B (en) 2000-06-14 2002-09-01 Asm Lithography Bv Method of operating an optical imaging system, lithographic projection apparatus, device manufacturing method, and device manufactured thereby
JP2002184687A (ja) * 2000-10-02 2002-06-28 Canon Inc 露光装置
JP2006019561A (ja) * 2004-07-02 2006-01-19 Canon Inc 露光方法
US7403264B2 (en) * 2004-07-08 2008-07-22 Asml Netherlands B.V. Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus
JP5264116B2 (ja) * 2007-07-26 2013-08-14 キヤノン株式会社 結像特性変動予測方法、露光装置、並びにデバイス製造方法
JP2013115348A (ja) * 2011-11-30 2013-06-10 Canon Inc 投影光学系の結像特性の変動量の算出方法、露光装置およびデバイス製造方法

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